CN105568226A - Lampshade for filtering out blue light for sterilization and manufacturing method thereof - Google Patents

Lampshade for filtering out blue light for sterilization and manufacturing method thereof Download PDF

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Publication number
CN105568226A
CN105568226A CN201511031929.1A CN201511031929A CN105568226A CN 105568226 A CN105568226 A CN 105568226A CN 201511031929 A CN201511031929 A CN 201511031929A CN 105568226 A CN105568226 A CN 105568226A
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rete
film material
silver
evaporation
lampshade
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Inventor
吴晓彤
方俊勇
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Ott Road (zhangzhou) Optical Technology Co Ltd
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Ott Road (zhangzhou) Optical Technology Co Ltd
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Priority to CN201511031929.1A priority Critical patent/CN105568226A/en
Publication of CN105568226A publication Critical patent/CN105568226A/en
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V3/00—Globes; Bowls; Cover glasses
    • F21V3/04—Globes; Bowls; Cover glasses characterised by materials, surface treatments or coatings
    • F21V3/06—Globes; Bowls; Cover glasses characterised by materials, surface treatments or coatings characterised by the material
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V9/00—Elements for modifying spectral properties, polarisation or intensity of the light emitted, e.g. filters

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • General Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention discloses a lampshade for filtering out blue light for sterilization and a manufacturing method thereof. The lampshade comprises a substrate; the outer surface of the substrate is sequentially provided with a first film layer, a second film layer, a third film layer and a fourth film layer from inside to outside; the first film layer is a trititanium pentoxide layer; the second film layer is a silicon dioxide layer; the third film layer is a metal layer; and the fourth film layer is a nanosilver layer. The manufacturing method of the lampshade includes the following steps that firstly, the substrate is cleaned; and secondly, the outer surface of the substrate is coated with a film. The lampshade can effectively filter out 33% or higher harmful blue light, the overall definition is high, the lampshade makes a good contribution to definition and authenticity of vision, vision fatigue can be effectively relieved by filtering out the harmful blue light, and meanwhile, the lampshade has high sterilization performance.

Description

A kind of lampshade of filter blue light sterilization and manufacture method thereof
Technical field
The present invention relates to a kind of lampshade and manufacture method thereof of filter blue light sterilization.
Background technology
Along with the generally use of modern life set lights, people are chronically exposed in light environment, the uncomfortable symptom such as sour and astringent, pain easily appears in eyes of long duration, shed tears, more there will be severe visual deterioration, these uncomfortable symptoms are because eyes are in light environment, caused by the harmful light come out by light for a long time.Our eyes of light prolonged exposure also can cause vision system to lack of proper care, because the high energy shortwave blue light containing a large amount of irregular frequency inside these light, these shortwave blue lights have eyeglass that energy can penetrate us and to go directly retina, shortwave blue light prolonged exposure retina can produce a large amount of radical ion, these radical ions can make amphiblestroid pigment epithelial cell become feeble and die, and epithelial decline can make photosensory cell lack nutrient and cause vision impairment; These shortwave blue lights are also the main causes causing macular diseases, our every days, the long-time blue light produced in the face of light stimulated, hardly realize that the short energy of blue light wavelength is high, easily cause dry and astringent, early onset cataract, the spontaneous macular diseases such as photophobia, fatigue on ocular vision.Blue light accounts for the 50-60% of visible ray, and blue light is also the one of the main reasons causing macular diseases, seriously may cause blind.Blue light can stimulate retina to produce a large amount of radical ion, makes the atrophy of retinal pigment epithelium, then causes the decline of photaesthesia cell.
At present, by arranging lampshade outside light fixture, in order to optically focused, weather proof and solve the problem, but the effect of existing lampshade filter blue light is unsatisfactory, in addition, the rarer sterilizing function of existing lampshade, people are chronically exposed in light environment, healthyly receive great impact.
Summary of the invention
The object of the present invention is to provide a kind of lampshade and manufacture method thereof of filter blue light sterilization, the produced lampshade of the method can prevent harmful blue light to the injury of human body, and has sterilizing function.
For achieving the above object, the present invention is by the following technical solutions:
A lampshade for filter blue light sterilization, comprises substrate, and the outside surface of described substrate is sequentially provided with the first rete, the second rete, third membrane layer and the 4th rete from the inside to surface, and described first rete is five oxidation three titanium layers, and the thickness of the first rete is 10-100nm; Described second rete is silicon dioxide layer, and the thickness of the second rete is 50-100nm; Third membrane layer is metal level, and the thickness of third membrane layer is 5-30nm; Described 4th rete is nano-silver layer, and the thickness of the 4th rete is 5-20nm.
The film material of described metal level is gold and silver, platinum, neodymium, copper, zinc or nickel, and shaping by electron beam gun evaporation.
The film material of described metal level is au-alloy, silver alloys, platinum alloy, neodymium alloy, copper alloy, zinc alloy or nickelalloy, and shaping by electron beam gun evaporation.
The film material of described nano-silver layer is the oxide compound of silver, and shaping by electron beam gun evaporation.
The oxide compound of described silver is Ag 2o, AgO or Ag 2o 3.
Described substrate is resin or glass ware forming.
When the substrate of described lampshade is resin forming, the manufacture method of the lampshade of this filter blue light sterilization specifically comprises the following steps:
1) outside surface of substrate is cleaned;
2) plated film is carried out to the outside surface of substrate;
A, plate the first rete:
Vacuum tightness in vacuum plating cabin is adjusted to and is more than or equal to 5.0 × 10 -3handkerchief, and the temperature controlled in vacuum plating cabin is 50-70 DEG C, electron beam gun is adopted to bombard the film material of the first rete, be deposited on the outside surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, thickness after first rete is finally formed is 10-100nm, and wherein the film material of the first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
The vacuum tightness in vacuum plating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum plating cabin to be 50-70 DEG C simultaneously, electron beam gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, thickness after second rete is finally formed is 50-100nm, and wherein the film material of the second rete is silicon-dioxide, forms silicon dioxide layer;
C, plating third membrane layer:
The vacuum tightness in vacuum plating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum plating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron beam gun bombardment third membrane layer, be deposited on the surface of the second rete in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 1/S, thickness after third membrane layer is finally formed is 5-20nm, wherein the film material of third membrane layer is gold and silver, platinum, neodymium, copper, zinc, nickel, au-alloy, silver alloys, platinum alloy, neodymium alloy, copper alloy, zinc alloy or nickelalloy, forms metal level;
D, plating the 4th rete:
The vacuum tightness in vacuum plating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum plating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron beam gun bombardment the 4th rete, wherein the film material of the 4th rete is the oxide compound of silver, under the effect of electron beam gun evaporation, the peroxide breaks down of silver is attached to the surface of third membrane layer in above-mentioned steps C with the form of nanometer silver, the speed simultaneously controlling the 4th rete evaporation is 1/S, and the 4th rete finally forms the nano-silver layer that thickness is 5-20nm; The oxide compound of wherein said silver is Ag 2o, AgO or Ag 2o 3.
In described step 1), as follows to the concrete grammar of base-plate cleaning: substrate to be placed in vacuum chamber, with the outside surface 3 minutes of ion gun bombardment substrate.
When the substrate of described lampshade is glass ware forming, the manufacture method of the lampshade of this filter blue light sterilization specifically comprises the following steps:
1) outside surface of substrate is cleaned;
2) plated film is carried out to the outside surface of substrate;
A, plate the first rete:
Vacuum tightness in vacuum plating cabin is adjusted to and is more than or equal to 5.0 × 10 -3handkerchief, and the temperature controlled in vacuum plating cabin is 200-300 DEG C, electron beam gun is adopted to bombard the film material of the first rete, be deposited on the outside surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, thickness after first rete is finally formed is 10-100nm, and wherein the film material of the first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
The vacuum tightness in vacuum plating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum plating cabin to be 200-300 DEG C simultaneously, electron beam gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, thickness after second rete is finally formed is 50-100nm, and wherein the film material of the second rete is silicon-dioxide, forms silicon dioxide layer;
C, plating third membrane layer:
The vacuum tightness in vacuum plating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum plating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron beam gun bombardment third membrane layer, be deposited on the surface of the second rete in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 1/S, thickness after third membrane layer is finally formed is 5-20nm, wherein the film material of third membrane layer is gold and silver, platinum, neodymium, copper, zinc, nickel, au-alloy, silver alloys, platinum alloy, neodymium alloy, copper alloy, zinc alloy or nickelalloy, forms metal level;
D, plating the 4th rete:
The vacuum tightness in vacuum plating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum plating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron beam gun bombardment the 4th rete, wherein the film material of the 4th rete is the oxide compound of silver, under the effect of electron beam gun evaporation, the peroxide breaks down of silver is attached to the surface of third membrane layer in above-mentioned steps C with the form of nanometer silver, the speed simultaneously controlling the 4th rete evaporation is 1/S, and the 4th rete finally forms the nano-silver layer that thickness is 5-20nm; The oxide compound of wherein said silver is Ag 2o, AgO or Ag 2o 3.
In described step 1), as follows to the concrete grammar of base-plate cleaning: substrate to be placed in vacuum chamber, with the outside surface 5-10 minute of ion gun bombardment substrate.
The present invention adopts the principle of electron beam vacuum evaporation, there is after utilizing charged particle to accelerate in the electric field the feature of certain kinetic energy, ion is guided into the electrode for being made by the substrate of plated film, and make it move to substrate and the final method depositing film forming on substrate along certain direction by the nano molecular that high purity metal, metal alloy or other oxide compound that simple substance exists by electron gun with high temperature bombardment are evaporated.The technology of the present invention combines the trajectory of electron motion utilizing the special distribution in magnetic field to control in electric field, improves the technique of plated film with this, make coating film thickness and homogeneity controlled, and the rete compactness of preparation is good, cohesive force strong and high purity.
When lampshade substrate of the present invention is by resin forming, the sticking power of each rete of the lampshade obtained by manufacture method of the present invention subzero 20 DEG C time is 2-4hrs, and the sticking power 80 DEG C time is 2-4hrs; When lampshade substrate of the present invention is by glass ware forming, the sticking power of each rete of the lampshade obtained by manufacture method of the present invention subzero 20 DEG C time is 6-9hrs, and the sticking power 80 DEG C time is 6-9hrs.Multiple retes that the present invention is coated with on the substrate of lampshade, five oxidation three titanium layers, silicon dioxide layer, metal level cooperatively interact, mainly play the effect of controlled filter blue light, effective filter 23 more than 3% harmful blue light of energy, metal level can promote sharpness effectively simultaneously, thus improve the overall sharpness of lampshade, there is good contribution, by effectively eye strain can be alleviated to the filtration of harmful blue light for the sharpness of vision and verity.Nano-silver layer has strong suppression and killing action to tens of kinds of pathogenic microorganisms such as intestinal bacteria, gonococcus, chlamydia trachomatises, and can not produce resistance.The inventive method obtains the rete of high adhesive force by parameters such as control pressure, temperature, plated film speed, cleaning durations, and the lampshade of manufacture possesses good filter blue light and bactericidal property.
Accompanying drawing explanation
Below in conjunction with the drawings and specific embodiments, the present invention is described in further details:
Fig. 1 is the exploded view of the lampshade of filter blue light sterilization of the present invention.
Embodiment
As shown in Figure 1, the lampshade of filter blue light sterilization of the present invention, comprises substrate 1, and the outside surface of described substrate 1 is sequentially provided with the first rete 2, second rete 3, third membrane layer 4 and the 4th rete 5 from the inside to surface, described first rete 2 is five oxidation three titanium layers, and the thickness of the first rete 2 is 10-100nm; Described second rete 3 is silicon dioxide layer, and the thickness of the second rete 3 is 50-100nm; Third membrane layer 4 is metal level, and the thickness of third membrane layer 4 is 5-30nm; Described 4th rete 5 is nano-silver layer, and the thickness of the 4th rete 5 is 5-20nm.
Wherein, the film material of metal level is gold and silver, platinum, neodymium, copper, zinc or nickel, and shaping by electron beam gun evaporation.The film material of metal level also can be au-alloy, silver alloys, platinum alloy, neodymium alloy, copper alloy, zinc alloy or nickelalloy, and shaping by electron beam gun evaporation.The film material of described nano-silver layer is the oxide compound of silver, and shaping by electron beam gun evaporation, and the oxide compound of described silver is Ag 2o, AgO or Ag 2o 3.
In addition, described substrate 1 is resin or glass ware forming.
Embodiment 1
When the substrate 1 of lampshade is resin forming, described manufacture method specifically comprises the following steps:
1) outside surface of substrate 1 is cleaned;
2) plated film is carried out to the outside surface of substrate 1;
A, plate the first rete 2:
Vacuum tightness in vacuum plating cabin is adjusted to and is more than or equal to 5.0 × 10 -3handkerchief, and the temperature controlled in vacuum plating cabin is 50-70 DEG C, electron beam gun is adopted to bombard the film material of the first rete 2, be deposited on the outside surface of substrate 1 with nanoscale molecular form after the film material evaporation of the first rete 2, the speed simultaneously controlling the first rete 2 evaporation is 2.5/S, thickness after first rete 2 is finally formed is 10-100nm, and wherein the film material of the first rete 2 is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete 3:
The vacuum tightness in vacuum plating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum plating cabin to be 50-70 DEG C simultaneously, electron beam gun is adopted to bombard the film material of the second rete 3, be deposited on the surface of the first rete 2 in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete 3, the speed simultaneously controlling the second rete 3 evaporation is 7/S, thickness after second rete 3 is finally formed is 50-100nm, and wherein the film material of the second rete 3 is silicon-dioxide, forms silicon dioxide layer;
C, plating third membrane layer 4:
The vacuum tightness in vacuum plating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum plating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron beam gun bombardment third membrane layer 4, be deposited on the surface of the second rete 3 in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer 4, the speed simultaneously controlling third membrane layer 4 evaporation is 1/S, thickness after third membrane layer 4 is finally formed is 5-20nm, wherein the film material of third membrane layer 4 is gold and silver, platinum, neodymium, copper, zinc, nickel, au-alloy, silver alloys, platinum alloy, neodymium alloy, copper alloy, zinc alloy or nickelalloy, forms metal level;
D, plating the 4th rete 5:
The vacuum tightness in vacuum plating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum plating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron beam gun bombardment the 4th rete 5, wherein the film material of the 4th rete 5 is the oxide compound of silver, under the effect of electron beam gun evaporation, be attached to the surface of third membrane layer 4 in above-mentioned steps C after the peroxide breaks down of silver with the form of nanometer silver, the speed simultaneously controlling the 4th rete 5 evaporation is 1/S, and it is the nano-silver layer of 5-20nm that the 4th rete 5 finally forms thickness; The oxide compound of wherein said silver is Ag 2o, AgO or Ag 2o 3.
In described step 1), as follows to the concrete grammar of base-plate cleaning: substrate to be placed in vacuum chamber, with the outside surface 3 minutes of ion gun bombardment substrate.
The sticking power of each rete on the lampshade obtained by aforesaid method subzero 20 DEG C time is 2-4hrs, and the sticking power 80 DEG C time is 2-4hrs, has very strong adhesive ability, simultaneously good, the high purity of the compactness of each rete.And this lampshade can effective filter 23 more than 3% harmful blue light, and overall sharpness, there is good contribution, by effectively eye strain can be alleviated to the filtration of harmful blue light for the sharpness of vision and verity.Meanwhile, nano-silver layer makes this lampshade to have microbe killing properties energy.
Embodiment 2
When the substrate 1 of lampshade is glass ware forming, the manufacture method of this lampshade specifically comprises the following steps:
1) outside surface of substrate 1 is cleaned;
2) plated film is carried out to the outside surface of substrate 1;
A, plate the first rete 2:
Vacuum tightness in vacuum plating cabin is adjusted to and is more than or equal to 5.0 × 10 -3handkerchief, and the temperature controlled in vacuum plating cabin is 200-300 DEG C, electron beam gun is adopted to bombard the film material of the first rete 2, be deposited on the outside surface of substrate 1 with nanoscale molecular form after the film material evaporation of the first rete 2, the speed simultaneously controlling the first rete 2 evaporation is 2.5/S, thickness after first rete 2 is finally formed is 10-100nm, and wherein the film material of the first rete 2 is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete 3:
The vacuum tightness in vacuum plating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum plating cabin to be 200-300 DEG C simultaneously, electron beam gun is adopted to bombard the film material of the second rete 3, be deposited on the surface of the first rete 2 in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete 3, the speed simultaneously controlling the second rete 3 evaporation is 7/S, thickness after second rete 3 is finally formed is 50-100nm, and wherein the film material of the second rete 3 is silicon-dioxide, forms silicon dioxide layer;
C, plating third membrane layer 4:
The vacuum tightness in vacuum plating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum plating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron beam gun bombardment third membrane layer 4, be deposited on the surface of the second rete 3 in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer 4, the speed simultaneously controlling third membrane layer 4 evaporation is 1/S, thickness after third membrane layer 4 is finally formed is 5-20nm, wherein the film material of third membrane layer 4 is gold and silver, platinum, neodymium, copper, zinc, nickel, au-alloy, silver alloys, platinum alloy, neodymium alloy, copper alloy, zinc alloy or nickelalloy, forms metal level;
D, plating the 4th rete 5:
The vacuum tightness in vacuum plating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum plating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron beam gun bombardment the 4th rete 5, wherein the film material of the 4th rete 5 is the oxide compound of silver, under the effect of electron beam gun evaporation, be attached to the surface of third membrane layer 4 in above-mentioned steps C after the peroxide breaks down of silver with the form of nanometer silver, the speed simultaneously controlling the 4th rete 5 evaporation is 1/S, and it is the nano-silver layer of 5-20nm that the 4th rete 5 finally forms thickness; The oxide compound of wherein said silver is Ag 2o, AgO or Ag 2o 3.
In described step 1), as follows to the concrete grammar of base-plate cleaning: substrate to be placed in vacuum chamber, with the outside surface 5-10 minute of ion gun bombardment substrate.
The sticking power of each rete on the lampshade obtained by aforesaid method subzero 20 DEG C time is 6-9hrs, and the sticking power 80 DEG C time is 6-9hrs, has very strong adhesive ability, simultaneously good, the high purity of the compactness of each rete.And this lampshade can effective filter 23 more than 3% harmful blue light, and overall sharpness, there is good contribution, by effectively eye strain can be alleviated to the filtration of harmful blue light for the sharpness of vision and verity.Meanwhile, nano-silver layer makes this lampshade to have microbe killing properties energy.

Claims (10)

1. the lampshade of a filter blue light sterilization, comprise substrate, it is characterized in that: the outside surface of described substrate is sequentially provided with the first rete, the second rete, third membrane layer and the 4th rete from the inside to surface, described first rete is five oxidation three titanium layers, and the thickness of the first rete is 10-100nm; Described second rete is silicon dioxide layer, and the thickness of the second rete is 50-100nm; Described third membrane layer is metal level, and the thickness of third membrane layer is 5-30nm; Described 4th rete is nano-silver layer, and the thickness of the 4th rete is 5-20nm.
2. the lampshade of a kind of filter blue light sterilization according to claim 1, is characterized in that: the film material of described metal level is gold and silver, platinum, neodymium, copper, zinc or nickel, and shaping by electron beam gun evaporation.
3. the lampshade of a kind of filter blue light sterilization according to claim 1, is characterized in that: the film material of described metal level is au-alloy, silver alloys, platinum alloy, neodymium alloy, copper alloy, zinc alloy or nickelalloy, and shaping by electron beam gun evaporation.
4. the lampshade of a kind of filter blue light sterilization according to claim 1, is characterized in that: the film material of described nano-silver layer is the oxide compound of silver, and shaping by electron beam gun evaporation.
5. the lampshade of a kind of filter blue light sterilization according to claim 4, is characterized in that: the oxide compound of described silver is Ag 2o, AgO or Ag 2o 3.
6. the lampshade of a kind of filter blue light sterilization according to claim 1, is characterized in that: described substrate is resin or glass ware forming.
7. the manufacture method of the lampshade of a kind of filter blue light sterilization according to claim 6, it is characterized in that: when the substrate of described lampshade is resin forming, described manufacture method specifically comprises the following steps:
1) outside surface of substrate is cleaned;
2) plated film is carried out to the outside surface of substrate;
A, plate the first rete:
Vacuum tightness in vacuum plating cabin is adjusted to and is more than or equal to 5.0 × 10 -3handkerchief, and the temperature controlled in vacuum plating cabin is 50-70 DEG C, electron beam gun is adopted to bombard the film material of the first rete, be deposited on the outside surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, thickness after first rete is finally formed is 10-100nm, and wherein the film material of the first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
The vacuum tightness in vacuum plating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum plating cabin to be 50-70 DEG C simultaneously, electron beam gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, thickness after second rete is finally formed is 50-100nm, and wherein the film material of the second rete is silicon-dioxide, forms silicon dioxide layer;
C, plating third membrane layer:
The vacuum tightness in vacuum plating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum plating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron beam gun bombardment third membrane layer, be deposited on the surface of the second rete in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 1/S, thickness after third membrane layer is finally formed is 5-20nm, wherein the film material of third membrane layer is gold and silver, platinum, neodymium, copper, zinc, nickel, au-alloy, silver alloys, platinum alloy, neodymium alloy, copper alloy, zinc alloy or nickelalloy, forms metal level;
D, plating the 4th rete:
The vacuum tightness in vacuum plating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum plating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron beam gun bombardment the 4th rete, wherein the film material of the 4th rete is the oxide compound of silver, under the effect of electron beam gun evaporation, the peroxide breaks down of silver is attached to the surface of third membrane layer in above-mentioned steps C with the form of nanometer silver, the speed simultaneously controlling the 4th rete evaporation is 1/S, and the 4th rete finally forms the nano-silver layer that thickness is 5-20nm; The oxide compound of wherein said silver is Ag 2o, AgO or Ag 2o 3.
8. the manufacture method of the lampshade of a kind of filter blue light sterilization according to claim 7, is characterized in that: in described step 1), as follows to the concrete grammar of base-plate cleaning: to be placed on by substrate in vacuum chamber, with the outside surface 3 minutes of ion gun bombardment substrate.
9. the manufacture method of the lampshade of a kind of filter blue light sterilization according to claim 6, it is characterized in that: when the substrate of described lampshade is glass ware forming, described manufacture method specifically comprises the following steps:
1) outside surface of substrate is cleaned;
2) plated film is carried out to the outside surface of substrate;
A, plate the first rete:
Vacuum tightness in vacuum plating cabin is adjusted to and is more than or equal to 5.0 × 10 -3handkerchief, and the temperature controlled in vacuum plating cabin is 200-300 DEG C, electron beam gun is adopted to bombard the film material of the first rete, be deposited on the outside surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, thickness after first rete is finally formed is 10-100nm, and wherein the film material of the first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
The vacuum tightness in vacuum plating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum plating cabin to be 200-300 DEG C simultaneously, electron beam gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, thickness after second rete is finally formed is 50-100nm, and wherein the film material of the second rete is silicon-dioxide, forms silicon dioxide layer;
C, plating third membrane layer:
The vacuum tightness in vacuum plating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum plating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron beam gun bombardment third membrane layer, be deposited on the surface of the second rete in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 1/S, thickness after third membrane layer is finally formed is 5-20nm, wherein the film material of third membrane layer is gold and silver, platinum, neodymium, copper, zinc, nickel, au-alloy, silver alloys, platinum alloy, neodymium alloy, copper alloy, zinc alloy or nickelalloy, forms metal level;
D, plating the 4th rete:
The vacuum tightness in vacuum plating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum plating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron beam gun bombardment the 4th rete, wherein the film material of the 4th rete is the oxide compound of silver, under the effect of electron beam gun evaporation, the peroxide breaks down of silver is attached to the surface of third membrane layer in above-mentioned steps C with the form of nanometer silver, the speed simultaneously controlling the 4th rete evaporation is 1/S, and the 4th rete finally forms the nano-silver layer that thickness is 5-20nm; The oxide compound of wherein said silver is Ag 2o, AgO or Ag 2o 3.
10. the manufacture method of the lampshade of a kind of filter blue light sterilization according to claim 9, it is characterized in that: in described step 1), as follows to the concrete grammar of base-plate cleaning: substrate to be placed in vacuum chamber, with the outside surface 5-10 minute of ion gun bombardment substrate.
CN201511031929.1A 2015-12-31 2015-12-31 Lampshade for filtering out blue light for sterilization and manufacturing method thereof Pending CN105568226A (en)

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Application Number Priority Date Filing Date Title
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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN201251654Y (en) * 2008-07-24 2009-06-03 甄兆忠 Multifunctional healthcare spectacles
CN103984120A (en) * 2014-05-30 2014-08-13 奥特路（漳州）光学科技有限公司 Method for manufacturing blue light-resistant optical lens
CN104339749A (en) * 2013-08-06 2015-02-11 三星显示有限公司 Multi-layer optical coating structure having an antibacterial coating layer

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN201251654Y (en) * 2008-07-24 2009-06-03 甄兆忠 Multifunctional healthcare spectacles
CN104339749A (en) * 2013-08-06 2015-02-11 三星显示有限公司 Multi-layer optical coating structure having an antibacterial coating layer
CN103984120A (en) * 2014-05-30 2014-08-13 奥特路（漳州）光学科技有限公司 Method for manufacturing blue light-resistant optical lens

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Application publication date: 20160511