CN105398154A - Blue light-filtering radiation-proof wear-resistant lampshade and manufacturing method thereof - Google Patents
Blue light-filtering radiation-proof wear-resistant lampshade and manufacturing method thereof Download PDFInfo
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- CN105398154A CN105398154A CN201511032029.9A CN201511032029A CN105398154A CN 105398154 A CN105398154 A CN 105398154A CN 201511032029 A CN201511032029 A CN 201511032029A CN 105398154 A CN105398154 A CN 105398154A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
- B32B17/061—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of metal
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B33/00—Layered products characterised by particular properties or particular surface features, e.g. particular surface coatings; Layered products designed for particular purposes not covered by another single class
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/14—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
- B32B37/24—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with at least one layer not being coherent before laminating, e.g. made up from granular material sprinkled onto a substrate
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B38/00—Ancillary operations in connection with laminating processes
- B32B38/0008—Electrical discharge treatment, e.g. corona, plasma treatment; wave energy or particle radiation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B38/00—Ancillary operations in connection with laminating processes
- B32B38/16—Drying; Softening; Cleaning
- B32B38/162—Cleaning
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
- B32B9/04—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V3/00—Globes; Bowls; Cover glasses
- F21V3/04—Globes; Bowls; Cover glasses characterised by materials, surface treatments or coatings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/14—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
- B32B37/24—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with at least one layer not being coherent before laminating, e.g. made up from granular material sprinkled onto a substrate
- B32B2037/246—Vapour deposition
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- Ceramic Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a blue light-filtering radiation-proof wear-resistant lampshade and a manufacturing method thereof. The lampshade comprises a substrate; and the external surface of the substrate is successively provided with, from interior to exterior, a first film, a second film, a third film, a fourth film and a fifth film, wherein the first film is a trititanium pentoxide layer, the second film is a silicon dioxide layer, the third film is a metal layer, the fourth film is an ITO layer, and the fifth film is a high-hardness layer. The manufacturing method comprises the following steps: 1) cleaning the substrate; and 2) coating the external surface of the substrate with the films. The lampshade provided by the invention can effectively filter out more than 33% of harmful blue light, has high integral sharpness, effectively cuts off electron radiation, ultraviolet rays and far infrared rays harmful to the human body and exerts radiation-proof effect; and the outer layer of the lampshade is a high-hardness layer formed from a high-hardness material, so the lampshade has high wear resistance.
Description
Technical field
The present invention relates to the radiation-resistant wear-resisting lampshade of a kind of filter blue light and manufacture method thereof.
Background technology
Along with the generally use of modern life lighting apparatus, people are chronically exposed in light environment, the uncomfortable symptom such as sour and astringent, pain easily appears in eyes of long duration, shed tears, more there will be severe visual impairment, these uncomfortable symptoms are because eyes are in light environment, caused by the harmful light come out by light for a long time.Our eyes of light prolonged exposure also can cause vision system to lack of proper care, because the high energy shortwave blue light containing a large amount of irregular frequency inside these light, these shortwave blue lights have eyeglass that energy can penetrate us and to go directly retina, shortwave blue light prolonged exposure retina can produce a large amount of radical ion, these radical ions can make amphiblestroid pigment epithelial cell become feeble and die, and epithelial decline can make photosensory cell lack nutrient and cause vision impairment; These shortwave blue lights are also the main causes causing macular diseases, our every days, the long-time blue light produced in the face of light stimulated, hardly realize that the short energy of blue light wavelength is high, easily cause dry and astringent, early onset cataract, the spontaneous macular diseases such as photophobia, fatigue on ocular vision.Blue light accounts for 50 ~ 60% of visible ray, and blue light is also the one of the main reasons causing macular diseases, seriously may cause blind.Blue light can stimulate retina to produce a large amount of radical ion, makes the atrophy of retinal pigment epithelium, then causes the decline of photaesthesia cell.
In addition light also can constantly produce harmful electron radiation, ultraviolet and far infrared, along with the raising of people ' s health consciousness, how effectively to lower or to prevent radiation injury from more and more having come into one's own.
At present, mainly by arranging lampshade outside light fixture, in order to optically focused, weather proof and solve the problem, but the effect of existing lampshade filter blue light is unsatisfactory, in addition, the rarer radiation-resistant function of existing lampshade, people are chronically exposed in light environment, and health receives great impact.In addition, lampshade is in use easy to scratched or rub flower, affects attractive in appearance, and more seriously, after the surface of lampshade scratches or rubs and spends, internal layer exposes in atmosphere, holds corrosion-vulnerable, affects service life.
Summary of the invention
The object of the present invention is to provide the radiation-resistant wear-resisting lampshade of a kind of filter blue light and manufacture method thereof, the produced lampshade of the method has the injury preventing harmful blue light and electron radiation etc. to human body, and has high-wearing feature.
For achieving the above object, the present invention is by the following technical solutions:
The radiation-resistant wear-resisting lampshade of a kind of filter blue light, comprise substrate, the outer surface of described substrate is sequentially provided with the first rete, the second rete, third membrane layer, the 4th rete and the 5th rete from the inside to surface, and described first rete is five oxidation three titanium layers, and the thickness of the first rete is 10-100nm; Described second rete is silicon dioxide layer, and the thickness of the second rete is 50-100nm; Described third membrane layer is metal level, and the thickness of third membrane layer is 5-20nm; Described 4th rete is ITO layer, and the thickness of the 4th rete is 10-100nm; Described 5th rete is high rigidity layer, and the thickness of the 5th rete is 10-50nm.
Described metal tunic material is gold, silver, platinum, neodymium, copper, zinc or nickel, and uses electron gun evaporation shaping.
Described metal tunic material is billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, and uses electron gun evaporation shaping.
Described high rigidity tunic material is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, and uses electron gun evaporation shaping.
Described substrate is resin or glass ware forming.
When to the invention discloses described substrate be resin forming, the manufacture method of the radiation-resistant wear-resisting lampshade of described filter blue light, specifically comprises the following steps:
1) outer surface of substrate is cleaned;
2) plated film is carried out to the outer surface of substrate;
A, plate the first rete:
Vacuum in vacuum coating cabin is adjusted to and is more than or equal to 5.0 × 10
-3handkerchief, and the temperature controlled in vacuum coating cabin is 50-70 DEG C, electron gun is adopted to bombard the film material of the first rete, be deposited on the outer surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, thickness after first rete is finally formed is 10-100nm, and wherein the film material of the first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, electron gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, thickness after second rete is finally formed is 50-100nm, and wherein the film material of the second rete is silica, forms silicon dioxide layer;
C, plating third membrane layer:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment third membrane layer, be deposited on the surface of the second rete in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 1/S, thickness after third membrane layer is finally formed is 5-20nm, wherein the film material of third membrane layer is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, forms metal level;
D, plating the 4th rete:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 4th rete, be deposited on the surface of third membrane layer in above-mentioned steps C with nanoscale molecular form after the film material evaporation of the 4th rete, the speed simultaneously controlling the 4th rete evaporation is 1/S, thickness after 4th rete is finally formed is 10-100nm, and wherein the film material of the 4th rete is ITO material, forms ITO layer;
E, plating the 5th rete:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 5th rete, be deposited on the surface of the 4th rete in above-mentioned steps D with nanoscale molecular form after the film material evaporation of the 5th rete, the speed simultaneously controlling the 5th rete evaporation is 7/S, thickness after 5th rete is finally formed is 10-50nm, and wherein the film material of the 5th rete is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, forms high rigidity layer.
In described step 1), as follows to the concrete grammar of base-plate cleaning: substrate to be placed in vacuum chamber, with the outer surface 3 minutes of ion gun bombardment substrate.
When to the invention also discloses described substrate be glass ware forming, the manufacture method of the radiation-resistant wear-resisting lampshade of described filter blue light, specifically comprises the following steps:
1) outer surface of substrate is cleaned;
2) plated film is carried out to the outer surface of substrate;
A, plate the first rete:
Vacuum in vacuum coating cabin is adjusted to and is more than or equal to 5.0 × 10
-3handkerchief, and the temperature controlled in vacuum coating cabin is 200-300 DEG C, electron gun is adopted to bombard the film material of the first rete, be deposited on the outer surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, thickness after first rete is finally formed is 10-100nm, and wherein the film material of the first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, electron gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, thickness after second rete is finally formed is 50-100nm, and wherein the film material of the second rete is silica, forms silicon dioxide layer;
C, plating third membrane layer:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment third membrane layer, be deposited on the surface of the second rete in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 1/S, thickness after third membrane layer is finally formed is 5-20nm, wherein the film material of third membrane layer is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, forms metal level;
D, plating the 4th rete:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 4th rete, be deposited on the surface of third membrane layer in above-mentioned steps C with nanoscale molecular form after the film material evaporation of the 4th rete, the speed simultaneously controlling the 4th rete evaporation is 1/S, thickness after 4th rete is finally formed is 10-100nm, and wherein the film material of the 4th rete is ITO material, forms ITO layer;
E, plating the 5th rete:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 5th rete, be deposited on the surface of the 4th rete in above-mentioned steps D with nanoscale molecular form after the film material evaporation of the 5th rete, the speed simultaneously controlling the 5th rete evaporation is 7/S, thickness after 5th rete is finally formed is 10-50nm, and wherein the film material of the 5th rete is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, forms high rigidity layer.
In described step 1), as follows to the concrete grammar of base-plate cleaning: substrate to be placed in vacuum chamber, with the outer surface 5-10 minute of ion gun bombardment substrate.
The present invention adopts the principle of electron beam vacuum evaporation, there is after utilizing charged particle to accelerate in the electric field the feature of certain kinetic energy, ion is guided into the electrode for being made by the substrate of plated film, and make it move to substrate and the final method depositing film forming on substrate along certain direction by the nano molecular that high purity metal, metal alloy or other oxide that simple substance exists by electron gun with high temperature bombardment are evaporated.This invention combine with technique utilizes the trajectory of electron motion in the special distributed controll electric field in magnetic field, improves the technique of plated film with this, make coating film thickness and uniformity controlled, and good, the cohesive force of rete compactness of preparation is strong and high purity.
When lampshade substrate of the present invention is by resin forming, the adhesive force of each rete of the lampshade obtained by manufacture method of the present invention subzero 20 DEG C time is 2-4hrs, and the adhesive force 80 DEG C time is 2-4hrs; When lampshade substrate of the present invention is by glass ware forming, the adhesive force of each rete of the lampshade obtained by manufacture method of the present invention subzero 20 DEG C time is 6-9hrs, and the adhesive force 80 DEG C time is 6-9hrs.Multiple retes that the present invention is coated with on the substrate of lampshade, five oxidation three titanium layers, silicon dioxide layer, metal level cooperatively interact, mainly play the effect of controlled filter blue light, effective filter 23 more than 3% harmful blue light of energy, metal level can promote definition effectively simultaneously, thus improve the overall definition of lampshade, there is good contribution, by effectively visual fatigue can be alleviated to the filtration of harmful blue light for the definition of vision and authenticity.Arranging of ITO layer effectively cuts off harmful electron radiation, ultraviolet and far infrared, serves radiation-resistant effect, arranges the wearability that high rigidity layer can significantly improve lampshade in addition.The inventive method obtains the rete of high adhesion force by controlled pressure, temperature, plated film speed, parameter such as cleaning duration etc., and the lampshade of manufacture possesses good filter blue light and radiation proof, anti-wear performance.
Accompanying drawing explanation
Below in conjunction with the drawings and specific embodiments, the present invention is described in further details:
Fig. 1 is the exploded view of the radiation-resistant wear-resisting lampshade of filter blue light of the present invention.
Detailed description of the invention
As shown in Figure 1, the present invention includes substrate 1, it is five oxidation three titanium layers that the outer surface of substrate 1 is sequentially provided with the first rete 2, second rete 3, third membrane layer 4, the 4th rete 5 and the 5th rete 6, first rete 2 from the inside to surface, and the thickness of the first rete 2 is 10-100nm; Second rete 3 is silicon dioxide layer, and the thickness of the second rete 3 is 50-100nm; Third membrane layer 4 is metal level, and the thickness of third membrane layer 4 is 5-20nm; Described 4th rete 5 is ITO layer, and the thickness of the 4th rete 5 is 10-100nm; 5th rete 6 is high rigidity layer, and the thickness of the 5th rete 6 is 10-50nm.
Wherein, metal tunic material is gold, silver, platinum, neodymium, copper, zinc or nickel, and uses electron gun evaporation shaping.Metal level can film material be also billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, and uses electron gun evaporation shaping.
High rigidity tunic material is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, and uses electron gun evaporation shaping.
In addition, substrate 1 is resin or glass ware forming.
Embodiment 1
When the substrate 1 of lampshade is resin forming, the manufacture method of this lampshade specifically comprises the following steps:
1) outer surface of substrate 1 is cleaned;
2) plated film is carried out to the outer surface of substrate 1;
A, plate the first rete 2:
Vacuum in vacuum coating cabin is adjusted to and is more than or equal to 5.0 × 10
-3handkerchief, and the temperature controlled in vacuum coating cabin is 50-70 DEG C, electron gun is adopted to bombard the film material of the first rete 2, be deposited on the outer surface of substrate 1 with nanoscale molecular form after the film material evaporation of the first rete 2, the speed simultaneously controlling the first rete 2 evaporation is 2.5/S, thickness after first rete 2 is finally formed is 10-100nm, and wherein the film material of the first rete 2 is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete 3:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, electron gun is adopted to bombard the film material of the second rete 3, be deposited on the surface of the first rete 2 in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete 3, the speed simultaneously controlling the second rete 3 evaporation is 7/S, thickness after second rete 3 is finally formed is 50-100nm, and wherein the film material of the second rete 3 is silica, forms silicon dioxide layer;
C, plating third membrane layer 4:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment third membrane layer 4, be deposited on the surface of the second rete 3 in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer 4, the speed simultaneously controlling third membrane layer 4 evaporation is 1/S, thickness after third membrane layer 4 is finally formed is 5-20nm, wherein the film material of third membrane layer 4 is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, forms metal level;
D, plating the 4th rete 5:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 4th rete 5, be deposited on the surface of third membrane layer 4 in above-mentioned steps C with nanoscale molecular form after the film material evaporation of the 4th rete 5, the speed simultaneously controlling the 4th rete 5 evaporation is 1/S, thickness after 4th rete 5 is finally formed is 10-100nm, and wherein the film material of the 4th rete 5 is ITO material, forms ITO layer;
E, plating the 5th rete 6:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 5th rete 6, be deposited on the surface of the 4th rete in above-mentioned steps D with nanoscale molecular form after the film material evaporation of the 5th rete 6, the speed simultaneously controlling the 5th rete evaporation is 7/S, thickness after 5th rete 6 is finally formed is 10-50nm, and wherein the film material of the 5th rete 6 is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, forms high rigidity layer.
In step 1), as follows to the cleaning tool body method of substrate 1: substrate 1 is placed in vacuum chamber, with the outer surface 3 minutes of ion gun bombardment substrate 1.
The adhesive force of each rete on the lampshade obtained by said method subzero 20 DEG C time is 2-4hrs, and the adhesive force 80 DEG C time is 2-4hrs, has very strong adhesive ability, simultaneously good, the high purity of the compactness of each rete.And, this lampshade can filter 23 more than 3% harmful blue light effectively, and overall definition, good contribution is had for the definition of vision and authenticity, by effectively alleviating visual fatigue to the filtration of harmful blue light, arranging of ITO layer effectively cuts off harmful electron radiation, ultraviolet and far infrared, serves radiation-resistant effect, meanwhile, outermost layer is use the shaping high rigidity layer of high hardness material to make this lampshade have higher wearability.
Embodiment 2
When the substrate 1 of lampshade is glass ware forming, the manufacture method of this lampshade specifically comprises the following steps:
1) outer surface of substrate 1 is cleaned;
2) plated film is carried out to the outer surface of substrate 1;
A, plate the first rete 2:
Vacuum in vacuum coating cabin is adjusted to and is more than or equal to 5.0 × 10
-3handkerchief, and the temperature controlled in vacuum coating cabin is 200-300 DEG C, electron gun is adopted to bombard the film material of the first rete 2, be deposited on the outer surface of substrate 1 with nanoscale molecular form after the film material evaporation of the first rete 2, the speed simultaneously controlling the first rete 2 evaporation is 2.5/S, thickness after first rete 2 is finally formed is 10-100nm, and wherein the film material of the first rete 2 is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete 3:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, electron gun is adopted to bombard the film material of the second rete 3, be deposited on the surface of the first rete 2 in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete 3, the speed simultaneously controlling the second rete 3 evaporation is 7/S, thickness after second rete 3 is finally formed is 50-100nm, and wherein the film material of the second rete 3 is silica, forms silicon dioxide layer;
C, plating third membrane layer 4:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment third membrane layer 4, be deposited on the surface of the second rete 3 in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer 4, the speed simultaneously controlling third membrane layer 4 evaporation is 1/S, thickness after third membrane layer 4 is finally formed is 5-20nm, wherein the film material of third membrane layer 4 is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, forms metal level;
D, plating the 4th rete 5:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 4th rete 5, be deposited on the surface of third membrane layer 4 in above-mentioned steps C with nanoscale molecular form after the film material evaporation of the 4th rete 5, the speed simultaneously controlling the 4th rete 5 evaporation is 1/S, thickness after 4th rete 5 is finally formed is 10-100nm, and wherein the film material of the 4th rete 5 is ITO material, forms ITO layer;
E, plating the 5th rete 6:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 5th rete 6, be deposited on the surface of the 4th rete in above-mentioned steps D with nanoscale molecular form after the film material evaporation of the 5th rete 6, the speed simultaneously controlling the 5th rete evaporation is 7/S, thickness after 5th rete 6 is finally formed is 10-50nm, and wherein the film material of the 5th rete 6 is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, forms high rigidity layer.
In step 1), as follows to the cleaning tool body method of substrate 1: substrate 1 is placed in vacuum chamber, with the outer surface 5-10 minute of ion gun bombardment substrate 1.
The adhesive force of each rete on the lampshade obtained by said method subzero 20 DEG C time is 6-9hrs, and the adhesive force 80 DEG C time is 6-9hrs, has very strong adhesive ability, simultaneously good, the high purity of the compactness of each rete.And, this lampshade can filter 23 more than 3% harmful blue light effectively, and overall definition, good contribution is had for the definition of vision and authenticity, by effectively alleviating visual fatigue to the filtration of harmful blue light, arranging of ITO layer effectively cuts off harmful electron radiation, ultraviolet and far infrared, serves radiation-resistant effect, meanwhile, outermost layer is use the shaping high rigidity layer of high hardness material to make this lampshade have higher wearability.
Claims (9)
1. the radiation-resistant wear-resisting lampshade of filter blue light, comprise substrate, it is characterized in that: the outer surface of described substrate is sequentially provided with the first rete, the second rete, third membrane layer, the 4th rete and the 5th rete from the inside to surface, described first rete is five oxidation three titanium layers, and the thickness of the first rete is 10-100nm; Described second rete is silicon dioxide layer, and the thickness of the second rete is 50-100nm; Described third membrane layer is metal level, and the thickness of third membrane layer is 5-20nm; Described 4th rete is ITO layer, and the thickness of the 4th rete is 10-100nm; Described 5th rete is high rigidity layer, and the thickness of the 5th rete is 10-50nm.
2. the radiation-resistant wear-resisting lampshade of a kind of filter blue light according to claim 1, is characterized in that: the film material of described metal level is gold, silver, platinum, neodymium, copper, zinc or nickel, and uses electron gun evaporation shaping.
3. the radiation-resistant wear-resisting lampshade of a kind of filter blue light according to claim 1, is characterized in that: the film material of described metal level is billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, and uses electron gun evaporation shaping.
4. the radiation-resistant wear-resisting lampshade of a kind of filter blue light according to claim 1, is characterized in that: the film material of described high rigidity layer is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, and uses electron gun evaporation shaping.
5. the radiation-resistant wear-resisting lampshade of a kind of filter blue light according to claim 1, is characterized in that: described substrate is resin or glass ware forming.
6. a manufacture method for the radiation-resistant wear-resisting lampshade of filter blue light according to claim 5, it is characterized in that: when the substrate of described lampshade is resin forming, described manufacture method specifically comprises the following steps:
1) outer surface of substrate is cleaned;
2) plated film is carried out to the outer surface of substrate;
A, plate the first rete:
Vacuum in vacuum coating cabin is adjusted to and is more than or equal to 5.0 × 10
-3handkerchief, and the temperature controlled in vacuum coating cabin is 50-70 DEG C, electron gun is adopted to bombard the film material of the first rete, be deposited on the outer surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, thickness after first rete is finally formed is 10-100nm, and wherein the film material of the first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, electron gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, thickness after second rete is finally formed is 50-100nm, and wherein the film material of the second rete is silica, forms silicon dioxide layer;
C, plating third membrane layer:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment third membrane layer, be deposited on the surface of the second rete in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 1/S, thickness after third membrane layer is finally formed is 5-20nm, wherein the film material of third membrane layer is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, forms metal level;
D, plating the 4th rete:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 4th rete, be deposited on the surface of third membrane layer in above-mentioned steps C with nanoscale molecular form after the film material evaporation of the 4th rete, the speed simultaneously controlling the 4th rete evaporation is 1/S, thickness after 4th rete is finally formed is 10-100nm, and wherein the film material of the 4th rete is ITO material, forms ITO layer;
E, plating the 5th rete:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 5th rete, be deposited on the surface of the 4th rete in above-mentioned steps D with nanoscale molecular form after the film material evaporation of the 5th rete, the speed simultaneously controlling the 5th rete evaporation is 7/S, thickness after 5th rete is finally formed is 10-50nm, and wherein the film material of the 5th rete is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, forms high rigidity layer.
7. the manufacture method of the radiation-resistant wear-resisting lampshade of a kind of filter blue light according to claim 6, it is characterized in that: in described step 1), as follows to the concrete grammar of base-plate cleaning: substrate to be placed in vacuum chamber, with the outer surface 3 minutes of ion gun bombardment substrate.
8. a manufacture method for the radiation-resistant wear-resisting lampshade of filter blue light according to claim 5, it is characterized in that: when the substrate of described lampshade is glass ware forming, described manufacture method specifically comprises the following steps:
1) outer surface of substrate is cleaned;
2) plated film is carried out to the outer surface of substrate;
A, plate the first rete:
Vacuum in vacuum coating cabin is adjusted to and is more than or equal to 5.0 × 10
-3handkerchief, and the temperature controlled in vacuum coating cabin is 200-300 DEG C, electron gun is adopted to bombard the film material of the first rete, be deposited on the outer surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, thickness after first rete is finally formed is 10-100nm, and wherein the film material of the first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, electron gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, thickness after second rete is finally formed is 50-100nm, and wherein the film material of the second rete is silica, forms silicon dioxide layer;
C, plating third membrane layer:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment third membrane layer, be deposited on the surface of the second rete in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 1/S, thickness after third membrane layer is finally formed is 5-20nm, wherein the film material of third membrane layer is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, forms metal level;
D, plating the 4th rete:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 4th rete, be deposited on the surface of third membrane layer in above-mentioned steps C with nanoscale molecular form after the film material evaporation of the 4th rete, the speed simultaneously controlling the 4th rete evaporation is 1/S, thickness after 4th rete is finally formed is 10-100nm, and wherein the film material of the 4th rete is ITO material, forms ITO layer;
E, plating the 5th rete:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 5th rete, be deposited on the surface of the 4th rete in above-mentioned steps D with nanoscale molecular form after the film material evaporation of the 5th rete, the speed simultaneously controlling the 5th rete evaporation is 7/S, thickness after 5th rete is finally formed is 10-50nm, and wherein the film material of the 5th rete is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, forms high rigidity layer.
9. the manufacture method of the radiation-resistant wear-resisting lampshade of a kind of filter blue light according to claim 8, it is characterized in that: in described step 1), as follows to the concrete grammar of base-plate cleaning: substrate to be placed in vacuum chamber, with the outer surface 5-10 minute of ion gun bombardment substrate.
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| CN201511032029.9A CN105398154A (en) | 2015-12-31 | 2015-12-31 | Blue light-filtering radiation-proof wear-resistant lampshade and manufacturing method thereof |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN109027966A (en) * | 2018-08-10 | 2018-12-18 | 海宁市现代五金有限公司 | A kind of processing technology of wear-resisting scratch-resisting type lampshade |
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| CN203376492U (en) * | 2013-07-23 | 2014-01-01 | 厦门虹泰光学有限公司 | Blue light-resistant coated eyeglass |
| CN103984120A (en) * | 2014-05-30 | 2014-08-13 | 奥特路（漳州）光学科技有限公司 | Method for manufacturing blue light-resistant optical lens |
| CN104950358A (en) * | 2015-07-27 | 2015-09-30 | 江苏万新光学有限公司 | Resin lens with anti-fogging and electromagnetic shielding functions and manufacturing method of resin lens |
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| CN101266309A (en) * | 2008-04-25 | 2008-09-17 | 同济大学 | Single peak narrowband reflection filter possessing broad low reflecting bypass belt |
| CN203376492U (en) * | 2013-07-23 | 2014-01-01 | 厦门虹泰光学有限公司 | Blue light-resistant coated eyeglass |
| CN103984120A (en) * | 2014-05-30 | 2014-08-13 | 奥特路（漳州）光学科技有限公司 | Method for manufacturing blue light-resistant optical lens |
| CN104950358A (en) * | 2015-07-27 | 2015-09-30 | 江苏万新光学有限公司 | Resin lens with anti-fogging and electromagnetic shielding functions and manufacturing method of resin lens |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN109027966A (en) * | 2018-08-10 | 2018-12-18 | 海宁市现代五金有限公司 | A kind of processing technology of wear-resisting scratch-resisting type lampshade |
| CN109027966B (en) * | 2018-08-10 | 2023-03-28 | 海宁市现代五金有限公司 | Processing technology of wear-resistant scratch-resistant lampshade |
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