CN108018527A - A kind of anti glare anti static coatings lens coating method - Google Patents

A kind of anti glare anti static coatings lens coating method Download PDF

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Publication number
CN108018527A
CN108018527A CN201711353476.3A CN201711353476A CN108018527A CN 108018527 A CN108018527 A CN 108018527A CN 201711353476 A CN201711353476 A CN 201711353476A CN 108018527 A CN108018527 A CN 108018527A
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substrate
film layer
layer
vacuum
deposited
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吴晓彤
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Ott Road (zhangzhou) Optical Technology Co Ltd
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Ott Road (zhangzhou) Optical Technology Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/081—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/20—Metallic material, boron or silicon on organic substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • C23C28/3455—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer with a refractory ceramic layer, e.g. refractory metal oxide, ZrO2, rare earth oxides or a thermal barrier system comprising at least one refractory oxide layer
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02C—SPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
    • G02C7/00—Optical parts

Abstract

The present invention discloses a kind of anti glare anti static coatings lens coating method, and manufacture method is that membrane system is deposited respectively in the molding substrate outer surface of macromolecule resin material and inner surface to form anti-blue light optical mirror slip, and manufacture method specifically includes following steps：1）Substrate is cleaned；2）Drying after substrate cleaning：3）Cleaning again before substrate coating in the vacuum chamber of vacuum evaporation plating machine：4）The plated film of substrate：The plated film of substrate is included in the outer surface plating membrane system of substrate and plates membrane system in the inner surface of substrate.The present invention can reach the reflection for reducing lens surface so as to increase the good result that the transmitance of light improves wear comfort, and AR film layers include amber layer, and amber has wear-resisting, erosion-resisting characteristic, and evaporation amber layer can play good anti glare anti static coatings effect.

Description

A kind of anti glare anti static coatings lens coating method
Technical field
The present invention relates to a kind of anti glare anti static coatings lens coating method.
Background technology
With people's culture, the continuous improvement of living standard, the development of sight protection work, glasses as correcting defects of vision or Protect eyes and the simple optics made, played an important role in people's sphere of life.Glasses are typically by mirror Piece and mirror holder composition, from functionally saying for eyeglass, it has the light quantity adjusted into eyes, increases eyesight, protect eyes safety Acted on clinical treatment illness in eye etc..
For example, with vehicle be on the increase and vehicle existing imperfection in itself, traffic accident is also more and more, special It is not the traffic accident that driving at night occurs, when the traffic accident that vehicle running in the night occurs is intersected often caused by two cars, the car of both sides Lantern festival makes one to produce dazzling, dizziness, and eye is narrowed in the meeting of driver's instinct, or even can lose blind several seconds because of lamp from dazzling, so It is easy for causing traffic accident, in the market occurs being directed to the sunglasses, such as half sunglasses, sunglasses that the strong light offends our eyes for this Deng, but this kind of glasses are mostly to use eyeglass made of polarized-light technique, can only reduce diffusing reflection light irradiation and can not The intensity of incident ray is really reduced, sunburst on daytime causes people's Eye irritation dazzling to have certain anti-dazzle and be in the light work With, but in dark night, it is bad to reducing strong light stimulus effect caused by driver meets at night.
The content of the invention
It is an object of the invention to provide a kind of anti glare anti static coatings lens coating method, anti glare anti static coatings optics that this method manufactures Eyeglass have prevent injury of the strong light to human body, while also have the function of anti-blue light and from main optical regulation and control.
To achieve the above object, the present invention uses following technical scheme：
A kind of anti glare anti static coatings lens coating method, it is included in substrate outer surface and inner surface and membrane system formation anti glare anti static coatings light is deposited respectively Eyeglass is learned, the film plating process specifically includes following steps：
1）Substrate is cleaned；
2）Drying after substrate cleaning：Substrate after cleaning is taken off with isopropanol it is dry, it is de- it is dry after substrate drawn slowly using isopropanol It is dry, then be placed in dustless plated film constant temperature roaster more than when 60 DEG C~75 DEG C bakings 8 are small；
3）Stiffened processing：By eyeglass substrate immerse methyl silicon resin reinforced solution in, 115-125 DEG C of stiffened treatment temperature, 2 it is small when Eyeglass substrate is taken out afterwards and is sent to dry solidification in drying baker, 120 DEG C of drying temperature, 60 minutes hardening times；
4）Annealing：Eyeglass after stiffened is handled is made annealing treatment：
5）Secondary cleaning：Eyeglass substrate after annealing is placed in vacuum coating cabin, with hall ion source to eyeglass substrate Carry out ion bombardment 3-5 minutes；
6）Plate AR films：AR films are plated to the eyeglass substrate after secondary cleaning by the way of vacuum evaporation.
Step 6）Plating AR films comprise the following steps that：
A, the first film layer is plated：
Vacuum in vacuum coating cabin is adjusted to more than or equal to 5.0 × 10-3 pas, and controls the temperature in vacuum coating cabin Spend for 50-70 DEG C, silica is bombarded using hall ion source, mirror is deposited in the form of nanoscale molecular after silica evaporation The outer surface of piece substrate, while the speed for controlling the first film layer to be deposited is 7/S, the thickness after the first film layer is formed is 5-15nm, Ultimately form silicon dioxide layer；
B, the second film layer is plated：
Keep the vacuum in vacuum coating cabin to be greater than or equal to 5.0 × 10-3 pas, while keep the temperature in vacuum coating cabin For 50-70 DEG C, using five oxidation Tritanium/Trititanium of hall ion source bombardment, it is deposited on after five oxidation Tritanium/Trititanium evaporations in the form of nanoscale molecular The outer surface of first film layer, while the speed for controlling the second film layer to be deposited is 2.5/S, the thickness after the second film layer is formed is 10- 20nm, ultimately forms five oxidations, three titanium layer；
C, third membrane layer is plated：
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10-3Pa, while keep the temperature in vacuum coating cabin For 200-300 DEG C, the membrane material of the second film layer is bombarded using electron gun, after the membrane material evaporation of the second film layer in the form of nanoscale molecular The surface of the first film layer in above-mentioned steps A is deposited on, while the speed for controlling the second film layer to be deposited is 1.5/S, the second film layer is most Thickness of the end form after is 10-50nm；Wherein, the membrane material of second film layer is chromium or silver, forms high reflecting metal layer；
D, the 4th film layer is plated：
The vacuum in vacuum coating cabin is kept to be greater than or equal to 5.0 × 10-3Pa, while keep the temperature in vacuum coating cabin For 200-300 DEG C, using the membrane material of electron gun bombardment third membrane layer, after the membrane material evaporation of third membrane layer in the form of nanoscale molecular The surface of the second film layer in above-mentioned steps B is deposited on, while the speed for controlling third membrane layer to be deposited is 7/S, third membrane layer is final Thickness after formation is 10-50nm；Wherein, the membrane material of the third membrane layer is alundum (Al2O3), zirconium oxide, silica crystals Or silicon monoxide crystal, form high rigidity layer.
E, the 5th film layer is plated：
Vacuum in vacuum coating cabin is adjusted to less than or equal to 5.0 × 10-3Pa, and control the temperature in vacuum coating cabin Spend for 50-70 DEG C, the membrane material of the first film layer is bombarded using electron gun, wherein oxide of the membrane material of the first film layer for silver, in electricity The oxonium ion of the membrane material of the first film layer separates under the action of sub- rifle evaporation, and the silver in the membrane material of the first film layer is with nanoscale molecular shape Formula is deposited on the outer surface of substrate, while the speed for controlling the first film layer to be deposited is 1/S, the first film layer ultimately form after thickness Spend for 5-20nm；Wherein, the silver-colored oxide is Ag2O, AgO or Ag2O3；
The step 1）In, the cleaning to substrate comprises the following steps that：
A, substrate is cleaned using organic cleaning solvent, and aids in cleaning with ultrasonic wave；
B, the substrate cleaned through step a is cleaned using aqueous cleaning agent, and aids in cleaning with ultrasonic wave；
C, the substrate for handling step b sequentially carries out tap water rinse and distilled water rinsing.
The substrate is molded for macromolecule resin.
The present invention uses the principle of electron beam vacuum evaporation, has after being accelerated in the electric field using electrically charged particle certain The characteristics of kinetic energy, ion is guided into and is intended to the electrode made of the substrate of plated film, and by electron gun with high temperature bombardment that high-purity is golden Belong to oxide component, the nano molecular being evaporated makes it move to substrate and finally in deposition on substrate along certain direction The method of film forming.This invention technology is combined the trajectory of electron motion in the special distributed controll electric field in magnetic field, is changed with this Into the technique of plated film so that coating film thickness and uniformity are controllable, and the film layer compactness prepared is good, cohesive force is strong and degree of purity It is high.
The high reflecting metal layer of present invention vacuum evaporation on substrate, has excellent high reflectivity energy, can be major part Light wave reflection goes back, so as to prevent strong light from being damaged to human eye.Eyeglass can significantly improve made from preparation method of the present invention The wearability of eyeglass and growth effectively is inhibited bacteria, the performance and anti glare anti static coatings performance with excellent killing harmful bacteria.
Brief description of the drawings
The present invention is described in further details below in conjunction with the drawings and specific embodiments：
Fig. 1 is the overall exploded view of the present invention.
Embodiment
As shown in Figure 1, the present invention is included in 1 outer surface of substrate and inner surface is deposited membrane system and forms anti glare anti static coatings optical frames respectively Piece, the film plating process specifically include following steps：
1）Substrate 1 is cleaned；
2）Drying after the cleaning of substrate 1：Substrate 1 after cleaning is taken off with isopropanol it is dry, take off it is dry after substrate 1 it is slow using isopropanol Drying is drawn, then is placed in dustless plated film constant temperature roaster more than when 60 DEG C~75 DEG C bakings 8 are small；
3）Stiffened processing：Eyeglass substrate 1 is immersed in methyl silicon resin reinforced solution, 115-125 DEG C of stiffened treatment temperature, 2 is small When after eyeglass substrate 1 taken out and send to dry solidification in drying baker, 120 DEG C of drying temperature, 60 minutes hardening times；
4）Annealing：Eyeglass after stiffened is handled is made annealing treatment：
5）Secondary cleaning：Eyeglass substrate 1 after annealing is placed in vacuum coating cabin, with hall ion source to eyeglass substrate 1 carries out ion bombardment 3-5 minutes；
6）Plate AR films：AR films are plated to the eyeglass substrate 1 after secondary cleaning by the way of vacuum evaporation.
A kind of machining eyeglass method according to claim 1, it is characterised in that：Step 6）Plate the specific steps of AR films It is as follows：
A, the first film layer 2 is plated：
Vacuum in vacuum coating cabin is adjusted to more than or equal to 5.0 × 10-3 pas, and controls the temperature in vacuum coating cabin Spend for 50-70 DEG C, silica is bombarded using hall ion source, mirror is deposited in the form of nanoscale molecular after silica evaporation The outer surface of piece substrate 1, while the speed for controlling the first film layer to be deposited is 7/S, the thickness after the first film layer is formed is 5- 15nm, ultimately forms silicon dioxide layer；
B, the second film layer 3 is plated：
Keep the vacuum in vacuum coating cabin to be greater than or equal to 5.0 × 10-3 pas, while keep the temperature in vacuum coating cabin For 50-70 DEG C, using five oxidation Tritanium/Trititanium of hall ion source bombardment, it is deposited on after five oxidation Tritanium/Trititanium evaporations in the form of nanoscale molecular The outer surface of first film layer, while the speed for controlling the second film layer to be deposited is 2.5/S, the thickness after the second film layer is formed is 10- 20nm, ultimately forms five oxidations, three titanium layer；
C, third membrane layer 4 is plated：
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10-3Pa, while keep the temperature in vacuum coating cabin For 200-300 DEG C, the membrane material of the second film layer is bombarded using electron gun, after the membrane material evaporation of the second film layer in the form of nanoscale molecular The surface of the first film layer in above-mentioned steps A is deposited on, while the speed for controlling the second film layer to be deposited is 1.5/S, the second film layer is most Thickness of the end form after is 10-50nm；Wherein, the membrane material of second film layer is chromium or silver, forms high reflecting metal layer；
D, the 4th film layer 5 is plated：
The vacuum in vacuum coating cabin is kept to be greater than or equal to 5.0 × 10-3Pa, while keep the temperature in vacuum coating cabin For 200-300 DEG C, using the membrane material of electron gun bombardment third membrane layer, after the membrane material evaporation of third membrane layer in the form of nanoscale molecular The surface of the second film layer in above-mentioned steps B is deposited on, while the speed for controlling third membrane layer to be deposited is 7/S, third membrane layer is final Thickness after formation is 10-50nm；Wherein, the membrane material of the third membrane layer is alundum (Al2O3), zirconium oxide, silica crystals Or silicon monoxide crystal, form high rigidity layer.
E, the 5th film layer 6 is plated：
Vacuum in vacuum coating cabin is adjusted to less than or equal to 5.0 × 10-3Pa, and control the temperature in vacuum coating cabin Spend for 50-70 DEG C, the membrane material of the first film layer is bombarded using electron gun, wherein oxide of the membrane material of the first film layer for silver, in electricity The oxonium ion of the membrane material of the first film layer separates under the action of sub- rifle evaporation, and the silver in the membrane material of the first film layer is with nanoscale molecular shape Formula is deposited on the outer surface of substrate 1, while the speed for controlling the first film layer to be deposited is 1/S, the first film layer ultimately form after thickness Spend for 5-20nm；Wherein, the silver-colored oxide is Ag2O, AgO or Ag2O3；
The step 1）In, the cleaning to substrate 1 comprises the following steps that：
A, substrate 1 is cleaned using organic cleaning solvent, and aids in cleaning with ultrasonic wave；
B, the substrate 1 cleaned through step a is cleaned using aqueous cleaning agent, and aids in cleaning with ultrasonic wave；
C, the substrate 1 for handling step b sequentially carries out tap water rinse and distilled water rinsing.
The substrate 1 is molded for macromolecule resin.

Claims (4)

1. a kind of anti glare anti static coatings lens coating method, it is included in substrate outer surface and inner surface and membrane system formation anti glare anti static coatings is deposited respectively Optical mirror slip, it is characterised in that：The film plating process specifically includes following steps：
1）Substrate is cleaned；
2）Drying after substrate cleaning：Substrate after cleaning is taken off with isopropanol it is dry, it is de- it is dry after substrate drawn slowly using isopropanol It is dry, then be placed in dustless plated film constant temperature roaster more than when 60 DEG C~75 DEG C bakings 8 are small；
3）Stiffened processing：By eyeglass substrate immerse methyl silicon resin reinforced solution in, 115-125 DEG C of stiffened treatment temperature, 2 it is small when Eyeglass substrate is taken out afterwards and is sent to dry solidification in drying baker, 120 DEG C of drying temperature, 60 minutes hardening times；
4）Annealing：Eyeglass after stiffened is handled is made annealing treatment：
5）Secondary cleaning：Eyeglass substrate after annealing is placed in vacuum coating cabin, with hall ion source to eyeglass substrate Carry out ion bombardment 3-5 minutes；
6）Plate AR films：AR films are plated to the eyeglass substrate after secondary cleaning by the way of vacuum evaporation.
A kind of 2. machining eyeglass method according to claim 1, it is characterised in that：Step 6）Plate the specific steps of AR films such as Under：
A, the first film layer is plated：
Vacuum in vacuum coating cabin is adjusted to more than or equal to 5.0 × 10-3 pas, and controls the temperature in vacuum coating cabin Spend for 50-70 DEG C, silica is bombarded using hall ion source, mirror is deposited in the form of nanoscale molecular after silica evaporation The outer surface of piece substrate, while the speed for controlling the first film layer to be deposited is 7/S, the thickness after the first film layer is formed is 5-15nm, Ultimately form silicon dioxide layer；
B, the second film layer is plated：
Keep the vacuum in vacuum coating cabin to be greater than or equal to 5.0 × 10-3 pas, while keep the temperature in vacuum coating cabin For 50-70 DEG C, using five oxidation Tritanium/Trititanium of hall ion source bombardment, it is deposited on after five oxidation Tritanium/Trititanium evaporations in the form of nanoscale molecular The outer surface of first film layer, while the speed for controlling the second film layer to be deposited is 2.5/S, the thickness after the second film layer is formed is 10- 20nm, ultimately forms five oxidations, three titanium layer；
C, third membrane layer is plated：
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10-3Pa, while keep the temperature in vacuum coating cabin to be 200-300 DEG C, the membrane material of the second film layer is bombarded using electron gun, is sunk after the membrane material evaporation of the second film layer in the form of nanoscale molecular The surface of product first film layer in above-mentioned steps A, while the speed for controlling the second film layer to be deposited is 1.5/S, the second film layer is final Thickness after formation is 10-50nm；Wherein, the membrane material of second film layer is chromium or silver, forms high reflecting metal layer；
D, the 4th film layer is plated：
The vacuum in vacuum coating cabin is kept to be greater than or equal to 5.0 × 10-3Pa, while keep the temperature in vacuum coating cabin to be 200-300 DEG C, using the membrane material of electron gun bombardment third membrane layer, sunk after the membrane material evaporation of third membrane layer in the form of nanoscale molecular The surface of product second film layer in above-mentioned steps B, while the speed for controlling third membrane layer to be deposited is 7/S, third membrane layer most end form Thickness after is 10-50nm；Wherein, the membrane material of the third membrane layer for alundum (Al2O3), zirconium oxide, silica crystals or Person's silicon monoxide crystal, forms high rigidity layer；
E, the 5th film layer is plated：
Vacuum in vacuum coating cabin is adjusted to less than or equal to 5.0 × 10-3Pa, and control the temperature in vacuum coating cabin For 50-70 DEG C, the membrane material of the first film layer is bombarded using electron gun, wherein oxide of the membrane material of the first film layer for silver, in electronics The oxonium ion of the membrane material of the first film layer separates under the action of rifle evaporation, and the silver in the membrane material of the first film layer is in the form of nanoscale molecular Be deposited on the outer surface of substrate, while the speed for controlling the first film layer to be deposited is 1/S, the first film layer ultimately form after thickness For 5-20nm；Wherein, the silver-colored oxide is Ag2O, AgO or Ag2O3。
A kind of 3. anti glare anti static coatings lens coating method according to claim 1, it is characterised in that：The step 1）In, to base The cleaning of piece comprises the following steps that：
A, substrate is cleaned using organic cleaning solvent, and aids in cleaning with ultrasonic wave；
B, the substrate cleaned through step a is cleaned using aqueous cleaning agent, and aids in cleaning with ultrasonic wave；
C, the substrate for handling step b sequentially carries out tap water rinse and distilled water rinsing.
A kind of 4. anti glare anti static coatings lens coating method according to claim 1, it is characterised in that：The substrate is high score subtree Fat is molded.
CN201711353476.3A 2017-12-15 2017-12-15 A kind of anti glare anti static coatings lens coating method Pending CN108018527A (en)

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* Cited by examiner, † Cited by third party
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CN109628880A (en) * 2018-12-28 2019-04-16 厦门美澜光电科技有限公司 Anti-oxidant anticorrosive patterned eyeglass of one kind and preparation method thereof
CN110865427A (en) * 2019-11-28 2020-03-06 厦门朵彩光学科技有限公司 Seawater-resistant coated sunglasses and preparation method thereof
CN111962026A (en) * 2020-07-30 2020-11-20 苏州瑞康真空科技有限公司 Film coating method for spectacle lens
CN112609161A (en) * 2020-11-20 2021-04-06 厦门腾诺光学科技有限公司 Preparation method of seawater corrosion resistant coated lens

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CN105404022A (en) * 2015-12-31 2016-03-16 奥特路（漳州）光学科技有限公司 Blue light-filtering sterilizing wear-resistant lens and manufacturing method thereof
CN105425416A (en) * 2015-12-31 2016-03-23 奥特路（漳州）光学科技有限公司 Blue light filtering, high light preventing and wear resisting lens and preparation method thereof

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CN105404022A (en) * 2015-12-31 2016-03-16 奥特路（漳州）光学科技有限公司 Blue light-filtering sterilizing wear-resistant lens and manufacturing method thereof
CN105425416A (en) * 2015-12-31 2016-03-23 奥特路（漳州）光学科技有限公司 Blue light filtering, high light preventing and wear resisting lens and preparation method thereof

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109628880A (en) * 2018-12-28 2019-04-16 厦门美澜光电科技有限公司 Anti-oxidant anticorrosive patterned eyeglass of one kind and preparation method thereof
CN109628880B (en) * 2018-12-28 2021-02-26 厦门美澜光电科技有限公司 Anti-oxidation and anti-corrosion lens with patterns and preparation method thereof
CN110865427A (en) * 2019-11-28 2020-03-06 厦门朵彩光学科技有限公司 Seawater-resistant coated sunglasses and preparation method thereof
CN110865427B (en) * 2019-11-28 2021-06-01 厦门朵彩光学科技有限公司 Seawater-resistant coated sunglasses and preparation method thereof
CN111962026A (en) * 2020-07-30 2020-11-20 苏州瑞康真空科技有限公司 Film coating method for spectacle lens
CN112609161A (en) * 2020-11-20 2021-04-06 厦门腾诺光学科技有限公司 Preparation method of seawater corrosion resistant coated lens

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Application publication date: 20180511