CN104525287A - Microelectronic experimental workbench - Google Patents
Microelectronic experimental workbench Download PDFInfo
- Publication number
- CN104525287A CN104525287A CN201410680619.1A CN201410680619A CN104525287A CN 104525287 A CN104525287 A CN 104525287A CN 201410680619 A CN201410680619 A CN 201410680619A CN 104525287 A CN104525287 A CN 104525287A
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- collector plate
- working chamber
- diffuser plate
- aperture
- plate
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Abstract
A microelectronic experimental workbench includes an air intake system and an exhaust system, a diffuser plate is arranged below the air intake system, a working chamber is arranged below the diffuser plate, the front side edge of the diffuser plate is provided with large holes along horizontal direction, the rest parts of the diffuser plate is provided with small holes along horizontal direction, the exhaust system includes a vertically-placed collector plate which is in the working chamber, collector plate holes increase gradually from top to bottom, outer side of the collector plate is provided with a collecting hood, the lower part of the collecting hood is connected with an exhaust device by an exhaust pipe, airflow in the working chamber horizontally passes through the collector plate, and is collected by the collecting hood, and exhausted via the exhaust pipe by the exhaust device. The diffuser plate adopts the mutation hole form, so that two positive pressure areas are formed in the working chamber, air pressure in the side close to the staff is greater than the inner side air pressure; the exhaust system is placed in the working chamber, the working chamber adopts gradual change hole form, airflow in the working chamber horizontally passes through the collector plate, and is collected by the collecting hood, and the airflow rebound phenomenon below the working chamber can be avoided.
Description
Technical field
The present invention relates to a kind of workbench being applied to microelectronics experiment.
Background technology
In industrial production, scientific research, a lot of place needs the environment using dustless work.Clean work station can provide effective working environment for these objects, improves and produces and scientific research efficiency.But current used workbench exists some defects, and in general clean work station district all keeps malleation to air, there is volatilizable material so in the course of the work will directly be discharged on the body of operating personnel.This has a strong impact on the health of operating personnel.Meanwhile, in operation, the positions such as the hand of operating personnel enter into clean workspace, also can bring a large amount of dust granules into, the cleanliness factor of impact purification workspace.
Applicant applied for Chinese invention patent CN200910211063.0 in 2009, " air wall sealing type double positive pressure purification workbench ", it divides in nip at water conservancy diversion and arranges water conservancy diversion and divide pressing plate, make, near staff side, there is stronger air pressure, form high pressure gas wall, this high pressure gas wall effectively splits low zone of positive pressure and air, prevents volatile materials in low-pressure area to human injury, prevents external dust particle from entering workbench simultaneously.This workbench solves the problems referred to above well, and is convenient to transform existing clean work station.
Work on hand platform extract system is all bled from the below of low zone of positive pressure, the air-flow passed through from diffuser plate often gets to bounce-back (air-flow rebound phenomena) after working cavity bottom surface, cause working cavity internal gas flow comparatively chaotic, be unfavorable for the rapid discharge of volatizable material.
Summary of the invention
The object of the invention is to: the defect overcoming above-mentioned prior art, a kind of workbench being applied to microelectronics experiment is proposed, it is rational in infrastructure, ensures the safety of working cavity cleanliness factor and operating personnel, and avoids the air-flow rebound phenomena that occurs below working cavity.
In order to achieve the above object, a kind of workbench being applied to microelectronics experiment that the present invention proposes, comprise gas handling system, gas extraction system, diffuser plate is provided with below gas handling system, it is working cavity below diffuser plate, it is characterized in that: described diffuser plate transversely offers macropore near staff side, the pore diameter range of described macropore is 18-22mm, aperture is transversely offered in all the other positions of diffuser plate, the pore diameter range of aperture is 9-11mm, described gas extraction system comprises and is positioned at working cavity and the collector plate of vertically placing, the perforate of described collector plate increases from top to bottom gradually, collecting cover is equipped with in the outside of described collector plate, described collecting cover bottom is connected with exhaust apparatus by blast pipe, flow level ground in working cavity is by being collected by collecting cover after collector plate, then discharged by exhaust apparatus through blast pipe.
The present invention is applied to the workbench of microelectronics experiment, further improves being:
1, described collector plate is positioned at the side of working cavity away from staff.
2, macropore is transversely furnished with 3 rows, and trestle column is 1-2mm, and the trestle column of aperture is 2-3mm.
3, described collector plate top open pore size is 5mm, and middle and upper part open pore size is 10mm, and middle and lower part open pore size is 15mm, and bottom open pore size is 20mm.
Diffuser plate of the present invention adopts sudden change well format, (near staff side) wide-bore on front side of diffuser plate, all the other open aperture, front side air inflow will be formed so large, the form that rear side air inflow is little, make working cavity form two barotropic fields, be wherein greater than inner side air pressure near staff side air pressure; Gas extraction system is placed on inside working cavity simultaneously, and adopts the form in gradual change hole, with making the flow level in working cavity by being collected by collecting cover after collector plate, so just can avoid the air-flow rebound phenomena that gas extraction system occurs below working cavity.
The present invention adopts technique scheme tool to have the following advantages:
As long as 1 changes macropore at the diffuser plate of existing clean work station near staff side, just can reach the object controlling air inflow, thus two barotropic field can be formed in working cavity, wherein high-pressure area forms the function of high pressure gas wall, very economical and effective;
2, high pressure gas wall effectively can separate atmospheric pressure region and low zone of positive pressure, prevents the injury of volatile materials to human body of low zone of positive pressure;
3, when operating personnel operate, decrease by high pressure gas wall the dust granule that operating personnel bring clean bench face into;
4, inside working cavity, collector plate is housed, inside working cavity, forms horizontal flow, both reached exhaust object, air-flow reflex when gas extraction system can be avoided again to be arranged on below working cavity;
5, inner low zone of positive pressure can ensure that the cleanliness factor of working cavity reaches designing requirement.
Accompanying drawing explanation
Below in conjunction with accompanying drawing, the present invention is further illustrated.
Fig. 1 is the Working table structure schematic diagram that the present invention is applied to microelectronics experiment.
Fig. 2 is the diffuser plate structural representation that the present invention is applied to the workbench of microelectronics experiment.
Fig. 3 is the collector plate structural representation that the present invention is applied to the workbench of microelectronics experiment.
Detailed description of the invention
Below in conjunction with the drawings and specific embodiments, the present invention will be further described.
As shown in Figure 1, the embodiment of the present invention is applied to the workbench of microelectronics experiment, comprise gas handling system 1, gas extraction system, diffuser plate 3 is provided with below gas handling system 1, it is working cavity 7 below diffuser plate 3, it is glass sliding door 8 outside working cavity 7, it is support 9 below working cavity 7, diffuser plate 3 transversely offers macropore near staff side, the aperture of macropore is 20mm, aperture is transversely offered in all the other positions of diffuser plate 3, the aperture of aperture is 10mm, gas extraction system comprises and is positioned at working cavity 7 and the collector plate 4 of vertically placing, collector plate 4 is positioned at the side of working cavity 7 away from staff, the perforate of collector plate 4 increases from top to bottom gradually, collecting cover 5 is equipped with in the outside of collector plate 4, collecting cover 5 bottom is connected with exhaust apparatus by blast pipe 6, flow level ground in working cavity 7 is by being collected by collecting cover 5 after collector plate 4, then discharged by exhaust apparatus through blast pipe 6.
As shown in Figure 2, for being used for the diffuser plate structural representation of the workbench of microelectronics experiment, the macropore of diffuser plate near staff side has 3 rows, and trestle column is 2mm, and the trestle column of aperture is 3mm.Under identical feed rate, front side air inflow is large, and rear side air inflow is little, will form two barotropic field like this inside working cavity, and front side air pressure is greater than rear side air pressure.
As shown in Figure 3, for being used for the collector plate structural representation of the workbench of microelectronics experiment, it adopts the form in gradual change hole, and varying aperture is 5mm, 10mm, 15mm, 20mm from top to bottom, will horizontal flow be formed like this inside working cavity, fully discharge to make gas.
In addition to the implementation, the present invention can also have other embodiments.All employings are equal to the technical scheme of replacement or equivalent transformation formation, all drop on the protection domain of application claims.
Claims (2)
1. one kind is applied to the workbench of microelectronics experiment, comprise gas handling system, gas extraction system, diffuser plate is provided with below gas handling system, it is working cavity below diffuser plate, it is characterized in that: described diffuser plate transversely offers 3 row's macropores near staff side, trestle column is 2mm, the aperture of described macropore is 20mm, aperture is transversely offered in all the other positions of diffuser plate, the aperture of aperture is 10mm, described gas extraction system comprises and is positioned at working cavity and the collector plate of vertically placing, the perforate of described collector plate increases from top to bottom gradually, collecting cover is equipped with in the outside of described collector plate, described collecting cover bottom is connected with exhaust apparatus by blast pipe, flow level ground in working cavity is by being collected by collecting cover after collector plate, then discharged by exhaust apparatus through blast pipe, described collector plate top open pore size is 5mm, and middle and upper part open pore size is 10mm, and middle and lower part open pore size is 15mm, and bottom open pore size is 20mm.
2. be applied to the workbench of microelectronics experiment according to claim 1, it is characterized in that: the trestle column of aperture is 3mm.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310120021.2A CN103170376B (en) | 2013-04-08 | 2013-04-08 | Double-layer-flow purification working table |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310120021.2A Division CN103170376B (en) | 2013-04-08 | 2013-04-08 | Double-layer-flow purification working table |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104525287A true CN104525287A (en) | 2015-04-22 |
| CN104525287B CN104525287B (en) | 2016-04-27 |
Family
ID=48630821
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410680619.1A Expired - Fee Related CN104525287B (en) | 2013-04-08 | 2013-04-08 | A kind of clean work station |
| CN201410610282.7A Expired - Fee Related CN104307589B (en) | 2013-04-08 | 2013-04-08 | A kind of clean work station device |
| CN201310120021.2A Expired - Fee Related CN103170376B (en) | 2013-04-08 | 2013-04-08 | Double-layer-flow purification working table |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410610282.7A Expired - Fee Related CN104307589B (en) | 2013-04-08 | 2013-04-08 | A kind of clean work station device |
| CN201310120021.2A Expired - Fee Related CN103170376B (en) | 2013-04-08 | 2013-04-08 | Double-layer-flow purification working table |
Country Status (1)
| Country | Link |
|---|---|
| CN (3) | CN104525287B (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104060783A (en) * | 2014-05-15 | 2014-09-24 | 昆山协多利洁净科技有限公司 | Clean room guardrail |
| CN105327721A (en) * | 2015-11-30 | 2016-02-17 | 冯义文 | Auxiliary jig applied to purifying workbench |
| CN108214235B (en) * | 2018-01-03 | 2019-07-02 | 京东方科技集团股份有限公司 | Burnishing device |
| CN110860152A (en) * | 2019-11-22 | 2020-03-06 | 江苏徐工工程机械研究院有限公司 | Additive mixing system and method and dust suppression vehicle |
| CN112379730B (en) * | 2020-11-24 | 2022-04-01 | 南通大学 | Computer memory bank with air cooling device and computer |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63248449A (en) * | 1987-04-03 | 1988-10-14 | Tadahiro Omi | Draft chamber |
| JP2010084989A (en) * | 2008-09-30 | 2010-04-15 | Airtech Japan Ltd | Clean bench |
| CN101711999A (en) * | 2009-11-11 | 2010-05-26 | 南通大学 | Air wall sealing type double positive pressure purification workbench |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01239329A (en) * | 1988-03-18 | 1989-09-25 | Hitachi Ltd | Clean air circulation type pass box |
| JP4941415B2 (en) * | 2007-09-04 | 2012-05-30 | 三菱マテリアル株式会社 | Clean bench |
| CN202363428U (en) * | 2011-10-10 | 2012-08-01 | 北京七星华创电子股份有限公司 | Ultra-clean microenvironment device |
-
2013
- 2013-04-08 CN CN201410680619.1A patent/CN104525287B/en not_active Expired - Fee Related
- 2013-04-08 CN CN201410610282.7A patent/CN104307589B/en not_active Expired - Fee Related
- 2013-04-08 CN CN201310120021.2A patent/CN103170376B/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63248449A (en) * | 1987-04-03 | 1988-10-14 | Tadahiro Omi | Draft chamber |
| JP2010084989A (en) * | 2008-09-30 | 2010-04-15 | Airtech Japan Ltd | Clean bench |
| CN101711999A (en) * | 2009-11-11 | 2010-05-26 | 南通大学 | Air wall sealing type double positive pressure purification workbench |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104525287B (en) | 2016-04-27 |
| CN103170376A (en) | 2013-06-26 |
| CN104307589A (en) | 2015-01-28 |
| CN103170376B (en) | 2014-12-10 |
| CN104307589B (en) | 2016-01-13 |
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| C14 | Grant of patent or utility model | ||
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| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20160427 Termination date: 20170408 |
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| CF01 | Termination of patent right due to non-payment of annual fee |