CN202363428U - Ultra-clean microenvironment device - Google Patents
Ultra-clean microenvironment device Download PDFInfo
- Publication number
- CN202363428U CN202363428U CN 201120382492 CN201120382492U CN202363428U CN 202363428 U CN202363428 U CN 202363428U CN 201120382492 CN201120382492 CN 201120382492 CN 201120382492 U CN201120382492 U CN 201120382492U CN 202363428 U CN202363428 U CN 202363428U
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- device body
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- blower fan
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- pore layer
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Abstract
The utility model relates to the semiconductor wafer manufacturing field, and discloses an ultra-clean microenvironment device which includes a device body, fans, an air hole layer, and a filter plate. The air hole layer is provided with a plurality of air holes. The fans are arranged on a side wall in the device body. The air hole layer is arranged in the device body. The filter plate is arranged on a bottom surface of the device body. The ultra-clean microenvironment device arranges the fans on a side face of the device body, so the air supply mode is side air supply mode, and the device is suitable for a double-layer or multi-layer process chamber semiconductor wafer manufacturing facility. Through the specific air hole shape and the arrangement design, the device can provide a stable and even vertical laminar flow for the semiconductor wafer manufacturing facility.
Description
Technical field
The utility model relates to semiconductor crystal wafer and makes the field, is specifically related to a kind of ultra clean microenvironment device that is used for the semiconductor crystal wafer manufacturing equipment.
Background technology
Ultra clean microenvironment device is used to the semiconductor crystal wafer manufacturing equipment provides vertical laminar flow, and ultra clean microenvironment device of the prior art all is last air intake mode, and blower fan wherein all is arranged on the upper surface of ultra clean microenvironment device.This device is suitable for the situation of air inlet clear, is suitable for the equipment of semiconductor crystal wafer manufacturing equipment individual layer processing chamber, and is then inapplicable for the equipment of bilayer or multilayer technology chamber.Based on this present situation, the yield per unit area of semiconductor crystal wafer manufacturing equipment has received certain influence.
The utility model content
The technical problem that (one) will solve
The utility model technical problem to be solved is: how a kind of ultra clean microenvironment device that is suitable for bilayer or multilayer technology chamber semiconductor crystal wafer manufacturing equipment is provided.
(2) technical scheme
For solving the problems of the technologies described above; The utility model provides a kind of ultra clean microenvironment device; Comprise device body, blower fan, pore layer and filter, be furnished with a plurality of pores on the said pore layer, said blower fan is arranged on the inner sidewall of said device body; Said pore layer is arranged on the inside of said device body, and said filter is arranged on the bottom surface of said device body.
Preferably, said device body is the chamber of rectangular shape, and said pore layer is positioned at the below of said blower fan, and said filter is positioned at the below of said pore layer.
Preferably, said blower fan is arranged on the inner sidewall of said device body.
Preferably, the size of pore and arrangement mode are on the said pore layer: from a side to the relative opposite side that blower fan is set, the size of pore is changed from small to big, and stomatal frequency from dense to sparse.
Preferably, said blower fan is distributed on two inner relative sidewalls of said device body.
Preferably, the size of pore and arrangement mode are on the said pore layer: from the centre of both sides to pore layer that blower fan is set, pore opening changes from small to big, and stomatal frequency from dense to sparse.
(3) beneficial effect
The utility model is arranged at the side of device body with blower fan, makes that the air intake mode is a side air inlet, and therefore device is suitable in bilayer or multilayer technology chamber semiconductor crystal wafer manufacturing equipment, using; Through the special pore shape and the design of arranging, make device stable, uniform vertical laminar flow to be provided for the semiconductor crystal wafer manufacturing equipment.
Description of drawings
Fig. 1 is the one-sided air outlet axis side view of the device of the utility model embodiment one;
Fig. 2 is the one-sided air outlet view of the device of the utility model embodiment one;
Fig. 3 is the bilateral air outlet axis side view of the device of the utility model embodiment two;
Fig. 4 is the bilateral air outlet view of the device of the utility model embodiment two.
Wherein, 101,201 device bodies; 102,202 blower fans; 103,203 filters; 104,204 pore layers.
Embodiment
Regard to a kind of ultra clean microenvironment device that the utility model proposes down, specify in conjunction with accompanying drawing and embodiment.
Embodiment 1
As shown in Figure 1, a kind of ultra clean microenvironment device comprises device body 101, blower fan 102, filter 103, pore layer 104.
This device is different from traditional last air-intake device, and the utility model is a side air inlet, and blower fan 102 invests on the device body 101 inner sidewalls, brings extraneous air into device body inside, forms malleation; Device body 101 inner air are discharged (as shown in Figure 2) by the pore on the pore layer 104 that is positioned at device body 101 bottoms again; Form stable, uniform vertical laminar flow; Filter through filter 103 again and (comprise molecular filtration and particle filtration etc.; The material of filter is a prior art), form stable, even, as to meet the lustration class that requires vertical laminar flow.
As shown in Figure 2, the right side is an air inlet, and the air-out pore from right to left; Pore opening changes from small to big, stomatal frequency from dense to sparse, this kind particular design; Can guarantee gas after device body 101 inner discharges, the each several part air displacement is even, thereby forms stable, uniform vertical laminar flow.
Embodiment 2
As shown in Figure 3, this installs widenable to the two-way air intake mouth.Comprise device body 201, blower fan 202, filter 203, pore layer 204.
As shown in Figure 4, both sides are air inlet, and the air-out pore is in the middle of two side direction; Pore opening changes from small to big, stomatal frequency from dense to sparse, this kind particular design; Can guarantee gas after device body 201 inner discharges, the each several part air displacement is even, thereby forms stable uniform vertical laminar flow.
Above execution mode only is used to explain the utility model; And be not the restriction to the utility model; The those of ordinary skill in relevant technologies field under the situation of spirit that does not break away from the utility model and scope, can also be made various variations and modification; Therefore all technical schemes that are equal to also belong to the category of the utility model, and the scope of patent protection of the utility model should be defined by the claims.
Claims (6)
1. ultra clean microenvironment device; It is characterized in that; Comprise device body, blower fan, pore layer and filter, be furnished with a plurality of pores on the said pore layer, said blower fan is arranged on the inner sidewall of said device body; Said pore layer is arranged on the inside of said device body, and said filter is arranged on the bottom surface of said device body.
2. device as claimed in claim 1 is characterized in that, said device body is the chamber of rectangular shape, and said pore layer is positioned at the below of said blower fan, and said filter is positioned at the below of said pore layer.
3. device as claimed in claim 2 is characterized in that, said blower fan is arranged on the inner sidewall of said device body.
4. device as claimed in claim 3 is characterized in that, the size of pore and arrangement mode are on the said pore layer: from a side to the relative opposite side that blower fan is set, the size of pore is changed from small to big, and stomatal frequency from dense to sparse.
5. device as claimed in claim 2 is characterized in that, said blower fan is distributed on two inner relative sidewalls of said device body.
6. device as claimed in claim 5 is characterized in that, the size of pore and arrangement mode are on the said pore layer: from the centre of both sides to pore layer that blower fan is set, pore opening changes from small to big, and stomatal frequency from dense to sparse.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201120382492 CN202363428U (en) | 2011-10-10 | 2011-10-10 | Ultra-clean microenvironment device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201120382492 CN202363428U (en) | 2011-10-10 | 2011-10-10 | Ultra-clean microenvironment device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202363428U true CN202363428U (en) | 2012-08-01 |
Family
ID=46574591
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201120382492 Expired - Lifetime CN202363428U (en) | 2011-10-10 | 2011-10-10 | Ultra-clean microenvironment device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202363428U (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103170376A (en) * | 2013-04-08 | 2013-06-26 | 南通大学 | Double-layer-flow purification working table |
| CN104617009A (en) * | 2013-11-05 | 2015-05-13 | 沈阳芯源微电子设备有限公司 | Air filter device for semiconductor equipment |
| CN105321839A (en) * | 2014-07-08 | 2016-02-10 | 沈阳芯源微电子设备有限公司 | Wind-filtering rectification device for semiconductor device |
| CN105983456A (en) * | 2015-01-28 | 2016-10-05 | 南通大学 | Clean chemical work station |
-
2011
- 2011-10-10 CN CN 201120382492 patent/CN202363428U/en not_active Expired - Lifetime
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103170376A (en) * | 2013-04-08 | 2013-06-26 | 南通大学 | Double-layer-flow purification working table |
| CN103170376B (en) * | 2013-04-08 | 2014-12-10 | 南通大学 | Double-layer-flow purification working table |
| CN104307589A (en) * | 2013-04-08 | 2015-01-28 | 南通大学 | Cleaning workbench device |
| CN104307589B (en) * | 2013-04-08 | 2016-01-13 | 南通大学 | A kind of clean work station device |
| CN104617009A (en) * | 2013-11-05 | 2015-05-13 | 沈阳芯源微电子设备有限公司 | Air filter device for semiconductor equipment |
| CN105321839A (en) * | 2014-07-08 | 2016-02-10 | 沈阳芯源微电子设备有限公司 | Wind-filtering rectification device for semiconductor device |
| CN105321839B (en) * | 2014-07-08 | 2018-06-19 | 沈阳芯源微电子设备有限公司 | A kind of semiconductor equipment filter wind fairing |
| CN105983456A (en) * | 2015-01-28 | 2016-10-05 | 南通大学 | Clean chemical work station |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20120801 |