CN103170376B - Double-layer-flow purification working table - Google Patents
Double-layer-flow purification working table Download PDFInfo
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- CN103170376B CN103170376B CN201310120021.2A CN201310120021A CN103170376B CN 103170376 B CN103170376 B CN 103170376B CN 201310120021 A CN201310120021 A CN 201310120021A CN 103170376 B CN103170376 B CN 103170376B
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- air
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- working chamber
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Abstract
The invention relates to a double-layer-flow purification working table which comprises an air intake system and an air discharging system, wherein an air diffusion plate is arranged below the air intake system; a working chamber is arranged below the air diffusion plate; large holes are formed along the transverse direction on the front side of the air diffusion plate; small holes are formed along the transverse direction at other parts of the air diffusion plate; the air discharging system comprises an air collecting plate which is positioned inside the working chamber and is vertically arranged; the holes in the air collecting plate are increased gradually from top to bottom; an air collecting hood is installed on the outer side of the air collecting plate; the lower part of the air collecting hood is connected with an air discharging device through an air discharging tube; the air flow inside the working chamber is collected by the air collecting hood after horizontally passing through the air collecting plate and is discharged out by the air discharging device through the air discharging tube. By adopting a mutation hole mode, two positive pressure areas are formed at the working chamber, wherein the air pressure on one side close to working personnel is greater than the air pressure on the inner side; the air discharging system is put on the inner side of the working chamber; and by adopting a gradual change hole mode, the air flow inside the working chamber is collected by the air collecting hood after horizontally passing through the air connecting plate, and the phenomenon that the air flow rebounds below the working chamber is avoided.
Description
Technical field
The present invention relates to clean work station, particularly a kind of two layers flow clean work station.
Background technology
In industrial production, scientific research, the environment of dustless work need to be used in a lot of places.Clean work station can provide effective working environment for these objects, improves and produces and scientific research efficiency.But current used workbench exists some defects, in general clean work station district all keeps malleation to atmosphere, exists so in the course of the work volatilizable material to be directly discharged on operating personnel's body.This has a strong impact on operating personnel's health.Meanwhile, in operating process, the positions such as operating personnel's hand enter into clean workspace, also can bring a large amount of dust granules into, and impact purifies the cleanliness factor of workspace.
Applicant has applied for Chinese invention patent CN200910211063.0 in 2009, " air wall sealing type double positive pressure purification workbench ", it divides and in nip, water conservancy diversion is set and divides pressing plate at water conservancy diversion, make to there is stronger air pressure near staff's one side, form high pressure gas wall, this high pressure gas wall is effectively cut apart low zone of positive pressure and atmosphere, has prevented that the volatile materials in low-pressure area is to human injury, prevents that external dust particle from entering workbench simultaneously.This workbench has solved the problems referred to above well, and is convenient to existing clean work station to transform.
Work on hand platform extract system is all bled from the below of low zone of positive pressure, the air-flow passing through from diffuser plate tends to get to bounce-back (air-flow rebound phenomena) working cavity bottom surface, cause working cavity internal gas flow comparatively chaotic, be unfavorable for the rapid discharge of volatizable material.
Summary of the invention
The object of the invention is to: overcome the defect of above-mentioned prior art, propose a kind of two layers flow clean work station, it is rational in infrastructure, guarantee working cavity cleanliness factor and operating personnel's safety, and the air-flow rebound phenomena of avoiding working cavity below to occur.
In order to achieve the above object, a kind of two layers flow clean work station that the present invention proposes, comprise gas handling system, gas extraction system, gas handling system below is provided with diffuser plate, diffuser plate below is working cavity, it is characterized in that: described diffuser plate is laterally offered macropore near staff one side edge, the pore diameter range of described macropore is 18-22mm, all the other positions of diffuser plate are along laterally offering aperture, the pore diameter range of aperture is 9-11mm, described gas extraction system comprises the collector plate that is positioned at working cavity and vertically places, the perforate of described collector plate increases from top to bottom gradually, collecting cover is equipped with in the outside of described collector plate, described collecting cover bottom is connected with exhaust apparatus by blast pipe, flow level ground in working cavity is by being collected by collecting cover after collector plate, then through blast pipe, being deflated device discharges.
Two layers flow clean work station of the present invention, further improves and is:
1, described collector plate is positioned at working cavity away from staff's a side.
2, macropore has 3 rows along lateral arrangement, and row's spacing is 1-2mm, and row's spacing of aperture is 2-3mm.
3, perforate aperture, described collector plate top is 5mm, and perforate aperture, middle and upper part is 10mm, and perforate aperture, middle and lower part is 15mm, and perforate aperture, bottom is 20mm.
Diffuser plate of the present invention adopts sudden change well format, (near staff's one side) wide-bore in diffuser plate front side, all the other open aperture, will form like this front side air inflow large, the form that rear side air inflow is little, make working cavity form two barotropic fields, wherein near staff's one side air pressure, be greater than inner side air pressure; Simultaneously gas extraction system is placed on working cavity inner side, and adopts the form in gradual change hole, makes flow level in working cavity by being collected by collecting cover after collector plate, the air-flow rebound phenomena that so just can avoid gas extraction system to occur below working cavity.
The present invention adopts technique scheme tool to have the following advantages:
1, the diffuser plate needing only at existing clean work station changes macropore near staff's one side, just can reach the object of controlling air inflow, thereby can in working cavity, form two barotropic fields, wherein high-pressure area forms the function of high pressure gas wall, very economical and effective;
2, high pressure gas wall can effectively be separated atmospheric pressure region and low zone of positive pressure, has prevented the injury of the volatile materials of low zone of positive pressure to human body;
When 3, operating personnel operate, by high pressure gas wall, reduced the dust granule that operating personnel bring clean bench face into;
4, collector plate is equipped with in working cavity inner side, in working cavity inner side, forms horizontal flow, has both reached exhaust object, the air-flow reflex in the time of can avoiding again gas extraction system to be arranged on working cavity below;
5, inner low zone of positive pressure can guarantee that the cleanliness factor of working cavity reaches designing requirement.
Accompanying drawing explanation
Below in conjunction with accompanying drawing, the present invention is further illustrated.
Fig. 1 is two layers flow clean work station structural representation of the present invention.
Fig. 2 is the diffuser plate structural representation of two layers flow clean work station of the present invention.
Fig. 3 is the collector plate structural representation of two layers flow clean work station of the present invention.
The specific embodiment
Below in conjunction with the drawings and specific embodiments, the present invention will be further described.
As shown in Figure 1, embodiment of the present invention two layers flow clean work station, comprise gas handling system 1, gas extraction system, gas handling system 1 below is provided with diffuser plate 3, diffuser plate 3 belows are working cavity 7, working cavity 7 outsides are glass sliding door 8, working cavity 7 belows are support 9, diffuser plate 3 is laterally offered macropore near staff one side edge, the aperture of macropore is 20mm, diffuser plate 3 all the other positions are along laterally offering aperture, the aperture of aperture is 10mm, gas extraction system comprises the collector plate 4 that is positioned at working cavity 7 and vertically places, collector plate 4 is positioned at working cavity 7 away from staff's a side, the perforate of collector plate 4 increases from top to bottom gradually, collecting cover 5 is equipped with in the outside of collector plate 4, collecting cover 5 bottoms are connected with exhaust apparatus by blast pipe 6, flow level ground in working cavity 7 is collected by collecting cover 5 by collector plate 4 is rear, then through blast pipe 6, being deflated device discharges.
As shown in Figure 2, be the diffuser plate structural representation of this two layers flow clean work station, diffuser plate has 3 rows near the macropore of staff's one side, and row's spacing is 2mm, and row's spacing of aperture is 3mm.Under identical air inlet speed, front side air inflow is large, and rear side air inflow is little, will form in working cavity inner side two barotropic fields like this, and front side air pressure is greater than rear side air pressure.
As shown in Figure 3, be the collector plate structural representation of this two layers flow clean work station, it adopts the form in gradual change hole, and varying aperture is 5mm, 10mm, 15mm, 20mm from top to bottom, will form horizontal flow like this, so that gas is fully discharged in working cavity inner side.
In addition to the implementation, the present invention can also have other embodiments.All employings are equal to the technical scheme of replacement or equivalent transformation formation, all drop on the protection domain of requirement of the present invention.
Claims (4)
1. a two layers flow clean work station, comprise gas handling system, gas extraction system, gas handling system below is provided with diffuser plate, diffuser plate below is working cavity, it is characterized in that: described diffuser plate is laterally offered macropore near staff one side edge, the pore diameter range of described macropore is 18-22mm, all the other positions of diffuser plate are along laterally offering aperture, the pore diameter range of aperture is 9-11mm, described gas extraction system comprises the collector plate that is positioned at working cavity and vertically places, the perforate of described collector plate increases from top to bottom gradually, collecting cover is equipped with in the outside of described collector plate, described collecting cover bottom is connected with exhaust apparatus by blast pipe, flow level ground in working cavity is by being collected by collecting cover after collector plate, then through blast pipe, being deflated device discharges.
2. two layers flow clean work station according to claim 1, is characterized in that: described collector plate is positioned at working cavity away from staff's a side.
3. two layers flow clean work station according to claim 1, is characterized in that: macropore has 3 rows along lateral arrangement, and row's spacing is 1-2mm, and row's spacing of aperture is 2-3mm.
4. two layers flow clean work station according to claim 1, is characterized in that: perforate aperture, described collector plate top is 5mm, and perforate aperture, middle and upper part is 10mm, and perforate aperture, middle and lower part is 15mm, and perforate aperture, bottom is 20mm.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410610282.7A CN104307589B (en) | 2013-04-08 | 2013-04-08 | A kind of clean work station device |
| CN201310120021.2A CN103170376B (en) | 2013-04-08 | 2013-04-08 | Double-layer-flow purification working table |
| CN201410680619.1A CN104525287B (en) | 2013-04-08 | 2013-04-08 | A kind of clean work station |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310120021.2A CN103170376B (en) | 2013-04-08 | 2013-04-08 | Double-layer-flow purification working table |
Related Child Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410610282.7A Division CN104307589B (en) | 2013-04-08 | 2013-04-08 | A kind of clean work station device |
| CN201410680619.1A Division CN104525287B (en) | 2013-04-08 | 2013-04-08 | A kind of clean work station |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103170376A CN103170376A (en) | 2013-06-26 |
| CN103170376B true CN103170376B (en) | 2014-12-10 |
Family
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Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410680619.1A Expired - Fee Related CN104525287B (en) | 2013-04-08 | 2013-04-08 | A kind of clean work station |
| CN201310120021.2A Expired - Fee Related CN103170376B (en) | 2013-04-08 | 2013-04-08 | Double-layer-flow purification working table |
| CN201410610282.7A Expired - Fee Related CN104307589B (en) | 2013-04-08 | 2013-04-08 | A kind of clean work station device |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410680619.1A Expired - Fee Related CN104525287B (en) | 2013-04-08 | 2013-04-08 | A kind of clean work station |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410610282.7A Expired - Fee Related CN104307589B (en) | 2013-04-08 | 2013-04-08 | A kind of clean work station device |
Country Status (1)
| Country | Link |
|---|---|
| CN (3) | CN104525287B (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104060783A (en) * | 2014-05-15 | 2014-09-24 | 昆山协多利洁净科技有限公司 | Clean room guardrail |
| CN105327721A (en) * | 2015-11-30 | 2016-02-17 | 冯义文 | Auxiliary jig applied to purifying workbench |
| CN108214235B (en) * | 2018-01-03 | 2019-07-02 | 京东方科技集团股份有限公司 | Burnishing device |
| CN110860152A (en) * | 2019-11-22 | 2020-03-06 | 江苏徐工工程机械研究院有限公司 | Additive mixing system and method and dust suppression vehicle |
| CN112379730B (en) * | 2020-11-24 | 2022-04-01 | 南通大学 | Computer memory bank with air cooling device and computer |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01239329A (en) * | 1988-03-18 | 1989-09-25 | Hitachi Ltd | Clean air circulation type pass box |
| US4976815A (en) * | 1987-04-03 | 1990-12-11 | Tadahiro Ohmi | Draft chamber |
| CN101385986A (en) * | 2007-09-04 | 2009-03-18 | 三菱麻铁里亚尔株式会社 | Clean bench and method of producing raw material for single crystal silicon |
| JP2010084989A (en) * | 2008-09-30 | 2010-04-15 | Airtech Japan Ltd | Clean bench |
| CN101711999A (en) * | 2009-11-11 | 2010-05-26 | 南通大学 | Air wall sealing type double positive pressure purification workbench |
| CN202363428U (en) * | 2011-10-10 | 2012-08-01 | 北京七星华创电子股份有限公司 | Ultra-clean microenvironment device |
-
2013
- 2013-04-08 CN CN201410680619.1A patent/CN104525287B/en not_active Expired - Fee Related
- 2013-04-08 CN CN201310120021.2A patent/CN103170376B/en not_active Expired - Fee Related
- 2013-04-08 CN CN201410610282.7A patent/CN104307589B/en not_active Expired - Fee Related
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4976815A (en) * | 1987-04-03 | 1990-12-11 | Tadahiro Ohmi | Draft chamber |
| JPH01239329A (en) * | 1988-03-18 | 1989-09-25 | Hitachi Ltd | Clean air circulation type pass box |
| CN101385986A (en) * | 2007-09-04 | 2009-03-18 | 三菱麻铁里亚尔株式会社 | Clean bench and method of producing raw material for single crystal silicon |
| JP2010084989A (en) * | 2008-09-30 | 2010-04-15 | Airtech Japan Ltd | Clean bench |
| CN101711999A (en) * | 2009-11-11 | 2010-05-26 | 南通大学 | Air wall sealing type double positive pressure purification workbench |
| CN202363428U (en) * | 2011-10-10 | 2012-08-01 | 北京七星华创电子股份有限公司 | Ultra-clean microenvironment device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104525287B (en) | 2016-04-27 |
| CN103170376A (en) | 2013-06-26 |
| CN104525287A (en) | 2015-04-22 |
| CN104307589B (en) | 2016-01-13 |
| CN104307589A (en) | 2015-01-28 |
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Inventor after: Wang Qiang Inventor after: Zhong Beixin Inventor after: Hu Chuanzhi Inventor after: Hua Guoran Inventor after: Cheng Shi Inventor after: Deng Jie Inventor after: Zhang Yu Inventor after: Wang Lei Inventor after: Su Boyong Inventor before: Hua Guoran Inventor before: Wang Qiang Inventor before: Su Boyong Inventor before: Zhang Yu Inventor before: Deng Jie |
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Free format text: CORRECT: INVENTOR; FROM: HUA GUORAN WANG QIANG SU BOYONG ZHANG YU DENG JIE TO: WANG QIANG ZHONG BEIXIN HU CHUANZHI HUA GUORAN CHENG SHI DENG JIE ZHANG YU WANG LEI SU BOYONG |
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Inventor after: Wang Qiang Inventor after: Zhong Beixin Inventor after: Hu Chuanzhi Inventor after: Hua Gyoran Inventor after: Cheng Shi Inventor after: Deng Jie Inventor after: Zhang Yu Inventor after: Wang Lei Inventor after: Su Boyong Inventor before: Hua Guoran Inventor before: Wang Qiang Inventor before: Su Boyong Inventor before: Zhang Yu Inventor before: Deng Jie |
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Free format text: CORRECT: INVENTOR; FROM: HUA GUORAN WANG QIANG SU BOYONG ZHANG YU DENG JIE TO: WANG QIANG ZHONG BEIXIN HU CHUANZHI HUA GUORAN CHENG SHI DENG JIE ZHANG YU WANG LEI SU BOYONG |
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| C14 | Grant of patent or utility model | ||
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Inventor after: Wang Qiang Inventor after: Zhu Haifeng Inventor after: Zhong Beixin Inventor after: Hu Chuanzhi Inventor after: Hua Guoran Inventor after: Cheng Shi Inventor after: Deng Jie Inventor after: Zhang Yu Inventor after: Wang Lei Inventor after: Su Boyong Inventor before: Wang Qiang Inventor before: Zhong Beixin Inventor before: Hu Chuanzhi Inventor before: Hua Guoran Inventor before: Cheng Shi Inventor before: Deng Jie Inventor before: Zhang Yu Inventor before: Wang Lei Inventor before: Su Boyong |
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Free format text: CORRECT: INVENTOR; FROM: WANG QIANG ZHONG BEIXIN HU CHUANZHI HUA GUORAN CHENG SHI DENG JIE ZHANG YU WANG LEI SU BOYONG TO: WANG QIANG ZHONG BEIXIN HU CHUANZHI HUA GUORAN CHENG SHI DENG JIE ZHANG YU WANG LEI SU BOYONG ZHU HAIFENG |
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| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20141210 Termination date: 20160408 |
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| CF01 | Termination of patent right due to non-payment of annual fee |