CN103606508A - Processing device for granular material surface plasma - Google Patents
Processing device for granular material surface plasma Download PDFInfo
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- CN103606508A CN103606508A CN201310607410.8A CN201310607410A CN103606508A CN 103606508 A CN103606508 A CN 103606508A CN 201310607410 A CN201310607410 A CN 201310607410A CN 103606508 A CN103606508 A CN 103606508A
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- surface plasma
- granular materials
- outer shell
- shell
- processing device
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Abstract
The invention relates to a processing device for granular material surface plasma. The processing device for the granular material surface plasma comprises an outer shell, a power source, an electrode component, a vibrating plate and a vibrating mechanism connected with the vibrating plate. A cover body is detachably arranged above the outer shell. A gas inlet and an extraction opening are formed in the wall body of the outer shell, wherein reaction gas enters the outer shell through the gas inlet, and the extraction opening is used for vacuum extraction. A reaction cavity is formed inside the outer shell. The electrode component is arranged inside the reaction cavity and connected with the power source. The vibrating plate is arranged inside the reaction cavity. According to the processing device for the granular material surface plasma, the electrode component is powered on to form a high-frequency electric field so as to ionize the reaction gas, surface processing is carried out on granular materials in the high-frequency electric field, vibration of the vibrating plate is combined, the granular materials turn over under the vibration, even processing can be achieved, and the processing effect is good.
Description
Technical field
The present invention relates to plasma processing apparatus, relate in particular to a kind of granular materials surface plasma processing unit.
Background technology
Lower temperature plasma technology is as a kind of new surface modification means, can fast, efficiently, contamination-freely improve the surface property of material, give new feature, do not change again the body feature of material simultaneously, more and more by the researcher of countries in the world, paid attention to, plasma surface treatment is that the plasma that utilizes gas discharge to produce carries out physical and chemical reaction to material surface.What participate in reaction has excited state particle, free radical and an ion, also comprises the ultraviolet effect of plasma resonance.By surface reaction, likely on surface, introduce particular functional group, produce surface active and etching, form cross-linked structure or generate surface free radical.These effects are not generally single, and often certain act as master, and several effects are also deposited.These effects have determined the validity of plasma surface treatment just.
In prior art, conventionally adopt plate electrode as electrode assemblie, material carries out surface treatment between electrode assemblie, pending material remains static, for granular materials, due to the fill characteristic of granular materials, easily cause material stacking, cause material processed inhomogeneous, treatment effect is undesirable.
Therefore, need a kind of granular materials surface plasma processing unit badly.
Summary of the invention
The object of the invention is to overcome the defect that prior art exists, a kind of granular materials surface plasma processing unit is provided.
The technical scheme that realizes the object of the invention is: a kind of granular materials surface plasma processing unit, comprise shell, power supply, electrode assemblie, vibrating disc and the percussion mechanism being connected with described vibrating disc, described shell top is detachably provided with lid, on described shell wall body, be provided with for reacting gas and enter gas access and the bleeding point for vacuumizing in shell, in described shell, be provided with reaction chamber, described electrode assemblie is arranged in described reaction chamber and is connected with described power supply, and described vibrating disc is arranged in described reaction chamber.
Further, described lid is cover glass.
Further, described electrode assemblie is a pair of plate electrode being vertically arranged in described reaction chamber, and described vibrating disc is arranged between two plate electrodes.
The present invention has positive effect: in the present invention, electrode assemblie energising formation high-frequency electric field ionizes reacting gas, granular materials carries out surface treatment in high-frequency electric field, and in conjunction with vibrating disc vibrations, granular materials is upset under vibrations, can realize uniform treatment, treatment effect is good.
Accompanying drawing explanation
For content of the present invention is more easily expressly understood, according to specific embodiment also by reference to the accompanying drawings, the present invention is further detailed explanation below, wherein:
Fig. 1 is structural representation of the present invention.
Wherein: 1, percussion mechanism, 2, vibrating disc, 3, reaction chamber, 4, lid, 5, electrode assemblie, 6, shell.
Embodiment
As shown in Figure 1, first embodiment of the invention provides a kind of granular materials surface plasma processing unit, comprise shell 6, power supply (not shown), electrode assemblie 5, vibrating disc 2 and the percussion mechanism 1 being connected with vibrating disc 2, shell 6 tops are detachably provided with lid 4, on shell 6 wall bodies, be provided with for reacting gas and enter gas access and the bleeding point for vacuumizing in shell, in shell 6, be provided with reaction chamber 3, electrode assemblie 5 is a pair of plate electrode being vertically arranged in reaction chamber 3, this is connected with power supply respectively plate electrode, vibrating disc 2 is arranged in reaction chamber 3 and is arranged between two plate electrodes.
The present embodiment middle plateform electrifying electrodes forms high-frequency electric field reacting gas is ionized, and granular materials carries out surface treatment in high-frequency electric field, and in conjunction with vibrating disc 2 vibrations, granular materials is upset under vibrations, can realize uniform treatment, and treatment effect is good.
As preferred embodiment, all the other are identical with embodiment 1, and difference is, the lid 4 that the present embodiment provides is cover glass, can conveniently check the working condition of granular materials in processing procedure.
Above-described specific embodiment; object of the present invention, technical scheme and beneficial effect are further described; institute is understood that; the foregoing is only specific embodiments of the invention; be not limited to the present invention; within the spirit and principles in the present invention all, any modification of making, be equal to replacement, improvement etc., within all should being included in protection scope of the present invention.
Claims (3)
1. a granular materials surface plasma processing unit, it is characterized in that, comprise shell, power supply, electrode assemblie, vibrating disc and the percussion mechanism being connected with described vibrating disc, described shell top is detachably provided with lid, on described shell wall body, be provided with for reacting gas and enter gas access and the bleeding point for vacuumizing in shell, in described shell, be provided with reaction chamber, described electrode assemblie is arranged in described reaction chamber and is connected with described power supply, and described vibrating disc is arranged in described reaction chamber.
2. granular materials surface plasma processing unit according to claim 1, is characterized in that, described lid is cover glass.
3. granular materials surface plasma processing unit according to claim 1 and 2, is characterized in that, described electrode assemblie is a pair of plate electrode being vertically arranged in described reaction chamber, and described vibrating disc is arranged between two plate electrodes.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310607410.8A CN103606508A (en) | 2013-11-27 | 2013-11-27 | Processing device for granular material surface plasma |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310607410.8A CN103606508A (en) | 2013-11-27 | 2013-11-27 | Processing device for granular material surface plasma |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103606508A true CN103606508A (en) | 2014-02-26 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310607410.8A Pending CN103606508A (en) | 2013-11-27 | 2013-11-27 | Processing device for granular material surface plasma |
Country Status (1)
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| CN (1) | CN103606508A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106373852A (en) * | 2016-11-21 | 2017-02-01 | 青岛理工大学 | Plasma processing device |
| CN114934266A (en) * | 2022-06-28 | 2022-08-23 | 中国地质大学（北京） | Nanometer core-shell structure material preparation device |
Citations (7)
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|---|---|---|---|---|
| US5436424A (en) * | 1992-06-25 | 1995-07-25 | Matsushita Electric Industrial Co., Ltd. | Plasma generating method and apparatus for generating rotating electrons in the plasma |
| EP1094130A2 (en) * | 1999-10-22 | 2001-04-25 | Robert Bosch Gmbh | Method and apparatus for plasma processing of surfaces |
| CN1559077A (en) * | 2001-09-28 | 2004-12-29 | ����ͨѶ�ɷ�����˾ | Procedure and device for the production of a plasma |
| CN1670241A (en) * | 2005-03-03 | 2005-09-21 | 西华大学 | Method and device for producing membrane on magnetic refrigeration material surface |
| CN1838381A (en) * | 2005-03-25 | 2006-09-27 | 东京毅力科创株式会社 | Method for electrically discharging substrate, substrate processing apparatus and program |
| US20070131167A1 (en) * | 2005-12-14 | 2007-06-14 | Tokyo Electron Limited | Substrate processing apparatus and lid supporting apparatus for the substrate processing apparatus |
| CN101366099A (en) * | 2006-06-16 | 2009-02-11 | 东京毅力科创株式会社 | Placement table construction, and heat treatment equipment |
-
2013
- 2013-11-27 CN CN201310607410.8A patent/CN103606508A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5436424A (en) * | 1992-06-25 | 1995-07-25 | Matsushita Electric Industrial Co., Ltd. | Plasma generating method and apparatus for generating rotating electrons in the plasma |
| EP1094130A2 (en) * | 1999-10-22 | 2001-04-25 | Robert Bosch Gmbh | Method and apparatus for plasma processing of surfaces |
| CN1559077A (en) * | 2001-09-28 | 2004-12-29 | ����ͨѶ�ɷ�����˾ | Procedure and device for the production of a plasma |
| CN1670241A (en) * | 2005-03-03 | 2005-09-21 | 西华大学 | Method and device for producing membrane on magnetic refrigeration material surface |
| CN1838381A (en) * | 2005-03-25 | 2006-09-27 | 东京毅力科创株式会社 | Method for electrically discharging substrate, substrate processing apparatus and program |
| US20070131167A1 (en) * | 2005-12-14 | 2007-06-14 | Tokyo Electron Limited | Substrate processing apparatus and lid supporting apparatus for the substrate processing apparatus |
| CN101366099A (en) * | 2006-06-16 | 2009-02-11 | 东京毅力科创株式会社 | Placement table construction, and heat treatment equipment |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106373852A (en) * | 2016-11-21 | 2017-02-01 | 青岛理工大学 | Plasma processing device |
| CN114934266A (en) * | 2022-06-28 | 2022-08-23 | 中国地质大学（北京） | Nanometer core-shell structure material preparation device |
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| PB01 | Publication | ||
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| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20140226 |