CN203588972U - Capillary glass tube inner wall plasma processing device - Google Patents
Capillary glass tube inner wall plasma processing device Download PDFInfo
- Publication number
- CN203588972U CN203588972U CN201320808162.9U CN201320808162U CN203588972U CN 203588972 U CN203588972 U CN 203588972U CN 201320808162 U CN201320808162 U CN 201320808162U CN 203588972 U CN203588972 U CN 203588972U
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- electrode piece
- glass tube
- electrode member
- electrode
- plasma processing
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Abstract
The utility model relates to a capillary glass tube inner wall plasma processing device. The capillary glass tube inner wall plasma processing device comprises an electrode assembly, a high-frequency power source and a negative pressure device, wherein the electrode assembly comprises a first electrode member and a second electrode member, the second electrode member is provided with a second chamber penetrating through the second electrode member, the first electrode member is sleeved in the second chamber to form a reaction chamber between an outer surface of the first electrode member and a wall of the second chamber, the first electrode member is connected with an anode of the high-frequency power source, the second electrode member is in grounding connection, and the negative pressure device is connected with one end of a capillary glass tube. According to the capillary glass tube inner wall plasma processing device, the capillary glass tube is disposed in the reaction chamber, one end of the capillary glass tube is connected with the negative pressure device for realizing vacuum, the other end of the capillary glass tube is connected with an air source, the reactant air is let in, the first electrode member is driven by the high-frequency power source to form an electric field between the first electrode member and the second electrode member, moving processing on an inner wall of the capillary glass tube is carried out by the reactant air, and a uniform processing effect is realized.
Description
Technical field
The utility model belongs to plasma processing apparatus field, relates in particular a kind of glass capillary inwall plasma processing apparatus.
Background technology
Atom after plasma is deprived of by portions of electronics and atom are ionized the ionized gas shape material that the positron-electron of rear generation forms, and it is extensively present in universe, are often considered to be and remove outside solid, liquid, gas, the 4th state that material exists.
At present, what plasma device was general is two electrodes to be set in airtight container form electric field, realize certain vacuum degree with vacuum pump, along with gas is more and more thin, the free movement distance of intermolecular distance and molecule or ion is also more and more long, be subject to electric field action, they bump and form gas ions, the activity of these ions is very high, its energy is enough to destroy nearly all chemical bond, material surface in any exposure causes chemical reaction, thereby structure, composition and the group of material surface are changed, and is met the surface of actual requirement.Plasma reaction speed is fast, treatment effeciency is high, and modification occurs over just material surface, the performance of material internal bulk material is not affected, and be desirable surface modification means.
In prior art, glass capillary is applied in all trades and professions, for example the chromatographic column adopting glass capillary spiral in gas chromatograph forms, need to be to glass capillary inner wall washing, etching and plasma activation processing during production, because glass capillary diameter is less and spiral forms, when processing, plasma activation is difficult to process evenly.
Therefore, need a kind of plasma processing apparatus of uniform treatment glass capillary inwall badly.
Utility model content
The purpose of this utility model is to overcome the defect that prior art exists, and a kind of glass capillary inwall plasma processing apparatus is provided.
The technical scheme that realizes the utility model object is: a kind of glass capillary inwall plasma processing apparatus, comprise electrode assemblie, high frequency electric source and negative pressure device, described electrode assemblie comprises the first electrode piece and the second electrode piece, on described the second electrode piece, be provided with the second cavity that connects described the second electrode piece, described the first electrode piece is sheathed in described the second cavity, between described the first electrode piece outer surface and described the second cavity wall, be formed for placing the reaction chamber of glass capillary, described the first electrode piece is connected with described high frequency electric source is anodal, described the second electrode piece ground connection, described negative pressure device is connected with glass capillary one end.
Further, on described the first electrode piece, be provided with the first cavity that connects described the first electrode piece.
Further, described the first electrode piece and described the second electrode piece are that hollow circular cylinder shape and cylinder axle center are on same straight line.
Further, also comprise the insulator foot for placing said electrodes assembly, described electrode assemblie is arranged on described insulator foot.
The utlity model has positive effect: in the utility model, glass capillary is positioned in reaction chamber, glass capillary one end is connected and vacuumizes with negative pressure device, the other end is connected and passes into reacting gas with source of the gas, high frequency electric source drives between the first electrode piece and the second electrode piece and forms electric field, reacting gas carries out activation processing to glass capillary inwall, reaches the effect of uniform treatment.
Accompanying drawing explanation
For content of the present utility model is more easily expressly understood, according to specific embodiment also by reference to the accompanying drawings, the utility model is described in further detail below, wherein:
Fig. 1 is the structural representation of the utility model the first embodiment;
Fig. 2 is the structural representation of the utility model the second embodiment.
Wherein: 1, insulator foot, 2, the second electrode piece, 3, reaction chamber, 4, the first electrode piece, 5, the first cavity, 6, high frequency electric source.
Embodiment
As shown in Figure 1, as the first preferred embodiment, the present embodiment provides a kind of glass capillary inwall plasma processing apparatus, comprise electrode assemblie, high frequency electric source 6 and negative pressure device, electrode assemblie comprises the first electrode piece 4 and the second electrode piece 2, on the second electrode piece 2, be provided with the second cavity (not shown) that connects the second electrode piece 2, the first electrode piece 4 is sheathed in the second cavity, between the first electrode piece 4 outer surfaces and the second cavity wall, be formed for placing the reaction chamber 3 of glass capillary, the first electrode piece 4 is connected with high frequency electric source 6 is anodal, the second electrode piece 2 ground connection, negative pressure device is connected with glass capillary one end.
In the present embodiment, glass capillary is positioned in reaction chamber 3, glass capillary one end is connected and vacuumizes with negative pressure device, the other end is connected and passes into reacting gas with source of the gas, high frequency electric source 6 drives between the first electrode piece 4 and the second electrode piece 2 and forms electric field, reacting gas carries out activation processing to glass capillary inwall, reaches the effect of uniform treatment.
As shown in Figure 2, as the second preferred embodiment, all the other are identical with embodiment 1, difference is, on the first electrode piece 4 that the present embodiment provides, being provided with and connecting the first cavity 5, the first electrode pieces 4 of the first electrode piece 4 and the second electrode piece 2 is that hollow circular cylinder shape and cylinder axle center are on same straight line; The present embodiment also comprises the insulator foot 1 for electrodes assembly, and electrode assemblie is arranged on insulator foot 1.
In the present embodiment the first electrode piece 4 and the second electrode piece 2 be hollow circular cylinder shape and cylinder axle center on same straight line, the electric field space forming in reaction chamber 3 is evenly distributed, thereby guarantees that treatment effect is even.
Above-described specific embodiment; the purpose of this utility model, technical scheme and beneficial effect are further described; institute is understood that; the foregoing is only specific embodiment of the utility model; be not limited to the utility model; all within spirit of the present utility model and principle, any modification of making, be equal to replacement, improvement etc., within all should being included in protection range of the present utility model.
Claims (4)
1. a glass capillary inwall plasma processing apparatus, it is characterized in that, comprise electrode assemblie, high frequency electric source and negative pressure device, described electrode assemblie comprises the first electrode piece and the second electrode piece, on described the second electrode piece, be provided with the second cavity that connects described the second electrode piece, described the first electrode piece is sheathed in described the second cavity, between described the first electrode piece outer surface and described the second cavity wall, be formed for placing the reaction chamber of glass capillary, described the first electrode piece is connected with described high frequency electric source is anodal, described the second electrode piece ground connection, described negative pressure device is connected with glass capillary one end.
2. glass capillary inwall plasma processing apparatus according to claim 1, is characterized in that, is provided with the first cavity that connects described the first electrode piece on described the first electrode piece.
3. glass capillary inwall plasma processing apparatus according to claim 2, is characterized in that, described the first electrode piece and described the second electrode piece are that hollow circular cylinder shape and cylinder axle center are on same straight line.
4. glass capillary inwall plasma processing apparatus according to claim 3, is characterized in that, also comprise the insulator foot for placing said electrodes assembly, described electrode assemblie is arranged on described insulator foot.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320808162.9U CN203588972U (en) | 2013-12-11 | 2013-12-11 | Capillary glass tube inner wall plasma processing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320808162.9U CN203588972U (en) | 2013-12-11 | 2013-12-11 | Capillary glass tube inner wall plasma processing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203588972U true CN203588972U (en) | 2014-05-07 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320808162.9U Withdrawn - After Issue CN203588972U (en) | 2013-12-11 | 2013-12-11 | Capillary glass tube inner wall plasma processing device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203588972U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103681197A (en) * | 2013-12-11 | 2014-03-26 | 苏州市奥普斯等离子体科技有限公司 | Device for treating plasmas on inner wall of capillary glass tube |
| CN106498702A (en) * | 2016-11-09 | 2017-03-15 | 南通大学 | Plasma device and its using method that tubing surfaces externally and internally is processed simultaneously |
-
2013
- 2013-12-11 CN CN201320808162.9U patent/CN203588972U/en not_active Withdrawn - After Issue
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103681197A (en) * | 2013-12-11 | 2014-03-26 | 苏州市奥普斯等离子体科技有限公司 | Device for treating plasmas on inner wall of capillary glass tube |
| CN103681197B (en) * | 2013-12-11 | 2016-02-17 | 苏州市奥普斯等离子体科技有限公司 | A kind of capillary glass inside pipe wall plasma processing apparatus |
| CN106498702A (en) * | 2016-11-09 | 2017-03-15 | 南通大学 | Plasma device and its using method that tubing surfaces externally and internally is processed simultaneously |
| CN106498702B (en) * | 2016-11-09 | 2019-10-11 | 南通大学 | The plasma device and its application method that tubing surfaces externally and internally is handled simultaneously |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20140507 Effective date of abandoning: 20160217 |
|
| C25 | Abandonment of patent right or utility model to avoid double patenting |