CN103547946A - 氟化抗反射涂层 - Google Patents
氟化抗反射涂层 Download PDFInfo
- Publication number
- CN103547946A CN103547946A CN201280016154.9A CN201280016154A CN103547946A CN 103547946 A CN103547946 A CN 103547946A CN 201280016154 A CN201280016154 A CN 201280016154A CN 103547946 A CN103547946 A CN 103547946A
- Authority
- CN
- China
- Prior art keywords
- coating
- optical clear
- polymkeric substance
- base material
- coating solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000006117 anti-reflective coating Substances 0.000 title abstract description 4
- 238000000576 coating method Methods 0.000 claims abstract description 105
- 239000011248 coating agent Substances 0.000 claims abstract description 97
- 238000000034 method Methods 0.000 claims abstract description 15
- -1 fluoropropene compound Chemical class 0.000 claims abstract description 7
- 230000003287 optical effect Effects 0.000 claims description 35
- 239000000463 material Substances 0.000 claims description 27
- 239000000126 substance Substances 0.000 claims description 23
- 229920000642 polymer Polymers 0.000 claims description 9
- FXRLMCRCYDHQFW-UHFFFAOYSA-N 2,3,3,3-tetrafluoropropene Chemical compound FC(=C)C(F)(F)F FXRLMCRCYDHQFW-UHFFFAOYSA-N 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 7
- 229910052731 fluorine Inorganic materials 0.000 claims description 6
- CDOOAUSHHFGWSA-OWOJBTEDSA-N (e)-1,3,3,3-tetrafluoroprop-1-ene Chemical compound F\C=C\C(F)(F)F CDOOAUSHHFGWSA-OWOJBTEDSA-N 0.000 claims description 3
- QBTUCBKAWGUMMK-UHFFFAOYSA-N C=CC.[F] Chemical class C=CC.[F] QBTUCBKAWGUMMK-UHFFFAOYSA-N 0.000 claims description 3
- 229920002313 fluoropolymer Polymers 0.000 abstract description 12
- 239000004811 fluoropolymer Substances 0.000 abstract description 12
- 239000000243 solution Substances 0.000 description 30
- 239000000523 sample Substances 0.000 description 20
- 239000011521 glass Substances 0.000 description 15
- 238000006243 chemical reaction Methods 0.000 description 12
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- 239000004094 surface-active agent Substances 0.000 description 8
- 230000005540 biological transmission Effects 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 7
- 239000010408 film Substances 0.000 description 7
- 239000000178 monomer Substances 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- 230000000977 initiatory effect Effects 0.000 description 6
- 238000006116 polymerization reaction Methods 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 238000002474 experimental method Methods 0.000 description 5
- 150000002430 hydrocarbons Chemical class 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000011068 loading method Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000011541 reaction mixture Substances 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 239000006172 buffering agent Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- JRKICGRDRMAZLK-UHFFFAOYSA-L peroxydisulfate Chemical compound [O-]S(=O)(=O)OOS([O-])(=O)=O JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 description 3
- 230000002829 reductive effect Effects 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 230000002146 bilateral effect Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 239000004446 fluoropolymer coating Substances 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- SURQXAFEQWPFPV-UHFFFAOYSA-L iron(2+) sulfate heptahydrate Chemical compound O.O.O.O.O.O.O.[Fe+2].[O-]S([O-])(=O)=O SURQXAFEQWPFPV-UHFFFAOYSA-L 0.000 description 2
- 229910000403 monosodium phosphate Inorganic materials 0.000 description 2
- 235000019799 monosodium phosphate Nutrition 0.000 description 2
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- AJPJDKMHJJGVTQ-UHFFFAOYSA-M sodium dihydrogen phosphate Chemical compound [Na+].OP(O)([O-])=O AJPJDKMHJJGVTQ-UHFFFAOYSA-M 0.000 description 2
- CHQMHPLRPQMAMX-UHFFFAOYSA-L sodium persulfate Chemical compound [Na+].[Na+].[O-]S(=O)(=O)OOS([O-])(=O)=O CHQMHPLRPQMAMX-UHFFFAOYSA-L 0.000 description 2
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 2
- 239000002689 soil Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- MIZLGWKEZAPEFJ-UHFFFAOYSA-N 1,1,2-trifluoroethene Chemical group FC=C(F)F MIZLGWKEZAPEFJ-UHFFFAOYSA-N 0.000 description 1
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- OUUQCZGPVNCOIJ-UHFFFAOYSA-M Superoxide Chemical compound [O-][O] OUUQCZGPVNCOIJ-UHFFFAOYSA-M 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000002671 adjuvant Substances 0.000 description 1
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium peroxydisulfate Substances [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 1
- VAZSKTXWXKYQJF-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)OOS([O-])=O VAZSKTXWXKYQJF-UHFFFAOYSA-N 0.000 description 1
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- ABDBNWQRPYOPDF-UHFFFAOYSA-N carbonofluoridic acid Chemical compound OC(F)=O ABDBNWQRPYOPDF-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 238000001723 curing Methods 0.000 description 1
- 238000004147 desorption mass spectrometry Methods 0.000 description 1
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical group CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 1
- 238000000113 differential scanning calorimetry Methods 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000005329 float glass Substances 0.000 description 1
- 108010025899 gelatin film Proteins 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 230000002045 lasting effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 238000010943 off-gassing Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- SNGREZUHAYWORS-UHFFFAOYSA-N perfluorooctanoic acid Chemical compound OC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F SNGREZUHAYWORS-UHFFFAOYSA-N 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 150000004968 peroxymonosulfuric acids Chemical class 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 238000000710 polymer precipitation Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 239000013074 reference sample Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000010183 spectrum analysis Methods 0.000 description 1
- 238000012430 stability testing Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/02168—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells the coatings being antireflective or having enhancing optical properties for the solar cells
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D127/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers
- C09D127/02—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment
- C09D127/12—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
- H01L31/0392—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Sustainable Development (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Sustainable Energy (AREA)
- Paints Or Removers (AREA)
Abstract
描述了抗反射涂层和涂渍溶液、光学透明元件以及用于制备AR涂层和涂渍溶液的改进方法。该抗反射涂层由衍生自至少一种氟代丙烯化合物的含氟聚合物形成。该含氟聚合物可作为可低温固化的涂渍溶液涂敷。
Description
技术领域
本发明总体上涉及用于光学透明元件的抗反射涂层，更具体地涉及用于在光伏电池应用中使用的玻璃罩的抗反射含氟聚合物涂层。
背景技术
抗反射(AR)涂层被用于多种工业，包括用于制造光伏(PV)模块，以减少当光通过光学透明元件例如玻璃时入射光的反射部分(fraction)。AR涂层的目的是获得尽可能接近1.23的折射率以在宽的光波长谱带上使光透射最大化。
用一层或多层低折射率涂层涂敷光学透明元件，可以在宽的波长范围内和大范围的入射角下获得改进的透射率。这样的涂层已经作为溶胶-凝胶材料用常规涂布技术沉积在玻璃保护罩上，并且据报道在光谱的可见光部分能提高日光透射率大约二到三个百分点。然而，由这样的涂层形成的AR涂层具有对于某些基材来说可能过高的固化温度(600℃-700℃)，所述基材包括塑料基材和在玻璃不能经受回火温度的应用中所使用的玻璃基材。
发明内容
本文公开的实施方式涉及AR涂层和涂渍溶液、光敏元件例如使用AR涂层的光伏模块、以及用于制备AR涂层和涂渍溶液的改进方法。
一种实施方式是光学透明元件，包括光学透明基材和布置在该光学透明基材的至少一个表面的一部分(例如局部或全部)上的AR涂层。该AR涂层包括至少一种下式所示的含氟聚合物：
其中n＝10到2500，R1、R2和R3各自选自H和F，并且该聚合物具有2000到200,000的分子量。另一实施方式是光伏模块，其包括至少一个如上所述的光学透明元件。
另一实施方式提供了生产含氟聚合物的方法，其通过在反应溶液中在至少一种引发剂存在下使式CF3CR1=CR2R3表示的化合物聚合，其中R1、R2和R3各自选自H和F，并且从反应溶液中提取所得的含氟聚合物来实施。另一实施方式提供了AR涂渍溶液，其包括分散或溶解在至少一种溶剂中的如上所示和所述的含氟聚合物。
一种实施方式还提供了通过在光学透明基材上涂敷所述AR涂渍溶液并固化来形成光学透明元件的方法。固化可以在小于350℃，更特别地在不超过300℃的温度下进行。
附图说明
图1是根据本发明实施方式的生产包括AR涂层的光学透明元件的方法的流程图。
图2提供了根据本发明实施方式的包括AR涂层的光伏电池的示意图。
图3是显示示例性实施方式的排气(out-gas)性能的图表。
具体实施方式
图1是图示根据一个实施方式形成AR涂渍溶液和光学透明元件的方法10的流程图。根据方法10，通过在引发剂存在和适合的反应条件下聚合通式为CF3CR1=CR2R3的氟代烃化合物来形成AR涂渍溶液(方框20)。所得聚合物如下式所示：
其中n＝10-2500，R1、R2和R3各自选自H和F，并且该聚合物具有2000到200,000道尔顿的分子量。在形成聚合物之后，可以添加酸以沉淀该聚合物(方框30)。然后可过滤、干燥该沉淀的聚合物，并且与另一溶剂合并(combined)以形成AR涂渍溶液(方框40)。然后将该AR涂渍溶液涂敷到光学透明基材(方框50)并且固化以形成可以用于光伏电池应用的光学透明元件(方框60)。
可以使用多种商业上可获得的氢氟烯烃或(“HFOs”)来形成所述含氟聚合物。适合的HFOs可以具有通式CF3CR1=CR2R3，其中R1、R2和R3各自选自H和F。适合的HFOs的例子包括四氟丙烯化合物和五氟丙烯化合物。特别适合的四氟丙烯化合物是2,3,3,3-四氟-1-丙烯(HFO-1234yf)，其形成具有下式的聚合物：
其中n=10-2500。
其他适合的四氟丙烯化合物包括HFO-1234zf和HFO-1234ze。适合的五氟丙烯化合物包括HFO-1225。任何上述化合物的立体异构体可能也适合。
在一实施方式中，以上提到的化合物可以与另外的单体化合物、特别是另外的氟代烃化合物共聚合。适合的另外的氟代烃化合物包括直链氟代烃化合物例如偏二氟乙烯、三氟乙烯、四氟亚甲基(tetrafluoromethylene)和氟代丙烯。在其他实施方式中，实施该方法而不添加其他单体，从而形成均聚物。
在一种或多种自由基引发剂存在下进行聚合。适合的引发剂包括偶氮二氰基丙烯酸酯(azobiscyanoacrylates)，脂族过酸酯例如过辛酸叔丁酯和过辛酸叔戊酯，脂族过氧化物例如叔丁基过氧化物，脂族氢过氧化物例如叔丁基过氧化氢、过硫酸盐例如过硫酸钠、过硫酸钾、过硫酸铵和过硫酸铁，以及上述的组合。过硫酸盐引发剂可能特别适用于本发明。基于单体的总重量，引发剂可以小于20wt％的浓度包括在反应溶液中，更特别地小于12wt％，尤其特别地小于1.0wt％。
聚合物和引发剂之间的反应可以在包括水、缓冲剂、和/或表面活性剂的溶液中进行。适合的缓冲剂包括Na2HPO4、NaH2PO4、FeSO4及它们的组合。特别适合的缓冲剂包括七水合磷酸氢二钠、磷酸二氢钠、七水硫酸亚铁及它们的组合。适合的表面活性剂包括含氟表面活性剂，更特别地包括全氟羧酸表面活性剂，例如C8HF15O2和C7F15CO2(NH4)。也可以添加还原剂例如Na2S2O5和另外的溶剂/稀释剂。
该反应可以在例如高压釜或夹套式搅拌釜反应器(STR)中、经由间歇或半间歇模式、在20℃到85℃，更特别地约40℃到约60℃的温度下进行。反应时间可为30分钟到大约48小时，更特别地大约10小时到大约24小时。所得聚合物可以具有大约2000到200,000道尔顿的分子量，更特别地大约15,000到大约100,000道尔顿。
在一实施方式中，在聚合反应基本终止之后，可以添加少量的过氧化物作为精整(finishing)步骤。这样的精整步骤有去除少量未反应的单体和辅助剂的目的。在完成聚合之后，通过加酸，使聚合物从乳液中沉淀出来。然后过滤并干燥聚合物沉淀。
然后通过在适合的有机溶剂中溶解或分散所述聚合物来形成AR涂渍溶液。适合的有机溶剂通常包括例如丙酮、乙酸甲酯、乙酸乙酯和各种酮溶剂。该AR涂渍溶液还可以包含各种添加剂例如商业上可从BYK获得的表面活性剂。
然后将该AR涂渍溶液涂敷到光学透明基材例如玻璃基材(例如碱石灰(sodalime)玻璃、浮法玻璃、硼硅酸盐玻璃和低铁碱石灰玻璃)、塑料盖、亚克力菲涅尔(acrylic Fresnel)透镜或其他光学透明基材的表面的至少一部分上(方框50)。然后固化该AR涂渍溶液以在该光学透明基材上形成AR涂层(方框60)。该AR涂渍溶液可以涂敷到基材的任何部分，也可以涂敷到基材的一侧或两侧。基材可以是预涂敷的，从而将AR涂渍溶液涂敷到已有的涂层之上。
该AR涂渍溶液可以通过各种通常已知的涂敷方法涂敷到光学透明元件上，所述涂敷方法包括旋涂、狭缝式涂布(slot die)、喷涂、浸涂、辊涂及其他涂布技术。用以形成AR涂渍溶液的溶剂的量可以得到大约1到大约25重量百分比的固形物浓度，更特别地大约1-10重量百分比，再特别地大约1-5重量百分比，取决于涂布方法和/或性能要求。在一些实施方式中，在STR中形成更浓缩的批次，继而稀释到期望浓度，可能有制造方面的优势。在可选实施方式中，稀释可以在初始混合阶段之前或者期间进行。对于浸涂，大约10到20重量百分比的固形物浓度可能是适合的。对于其他涂布方法例如旋涂、狭缝式涂布和喷涂，大约1至5重量百分比的更低固形物浓度可能是适合的。本发明的实施方式可能特别适合于喷涂，因为含氟聚合物相对较小的聚合物粒子尺寸。所得涂渍溶液的粘度可以在大约0.5cP到大于500cP之间变化，更特别地为大约0.5cP到大约10cP，更加特别地为大约0.75cP到大约2.0cP。
在涂敷之后，固化涂敷的AR涂渍溶液以形成光学透明基材(方框60)。当涂敷到玻璃基材时，AR涂渍溶液可以经受低温热固化步骤，温度为大约75℃到大约350℃，更特别地大约150℃到大约325℃，更加特别地大约200℃到大约300℃。固化可以进行大约1分钟到大约1小时，更特别地，大约1分钟到大约15分钟以固化该涂层。根据某些实施方式，所得涂层可以是基本上无孔的。
在一实施方式中，将AR涂渍溶液涂敷到经预先涂布的光学透明基材上，例如溶胶凝胶或其他抗反射材料。示例性的溶胶凝胶材料描述于例如US申请12/796,199中，其通过引用方式全文并入本文。在其他实施方式中，将AR涂渍溶液涂敷到基材两侧的至少一部分。
根据本发明实施方式的AR涂布的光学透明元件可以具有改进的透光率特性。例如，AR涂层可以具有在大约13(例如1.25到1.35)范围内的折射率并在光谱的可见光部分(350到1100纳米)中具有高达大约2.5百分比的透射增益(通过紫外-可见光光谱仪测量)。如果涂布光学透明基材的两侧，则可以在光谱的可见光部分实现高达大约5百分比的透射增益。在一些实施方式中，只要将AR膜的厚度调准(tuned)到入射光的波长(AR膜厚度是入射光波长的大约1/4)，则透射率的绝对增益与使用的涂布方法无关。
抗沾污性能是本发明涂层的特殊特性。由于示例性涂层的疏水性，污物不会以与在未涂覆玻璃上相同的程度积聚在该光学透明元件上。结果是无需清洁玻璃表面，透射率即可保持更长的一段时间。
图2是根据本发明的实施方式，用于将光转换为电的光伏模块(例如太阳能电池)的截面图。来自太阳等的输入或入射光首先入射在AR涂层1上，穿过它，然后穿过玻璃基材2和前透明电极3，之后到达模块的光伏半导体(有源膜)4。该模块还可以包括，但不是必需，反射增强氧化物和/或EVA膜5，和/或背部金属接点和/或反射器6，如图2所示。当然，可以使用其他类型的光伏设备，而图2的模块仅仅是为举例和理解的目的而提供的。还可以理解，模块可以包括单一的AR涂布的光学透明基材，其覆盖多个串联的光伏电池。
如以上所述，AR涂层1降低了入射光的反射并且允许更多的光到达光伏模块的薄膜半导体膜4，从而使得该设备能更有效地运行。虽然以上所述的某些AR涂层1用于光伏设备/模块环境中，但是本发明不限于此。根据本发明的AR涂层可以使用在其他应用中。而且，其他层(或多层)可以设置在玻璃基材上于AR涂层之下，从而即使在其间提供了其他层，也认为AR涂层是布置在玻璃基材上。
实施例1-5：2,3,3,3-四氟-1-丙烯(HFO-1234vf)的聚合
压力反应器装载0.4L水，2.58g(9.64x10-3摩尔)七水合磷酸氢二钠，1.35g(113×10-2摩尔)磷酸二氢钠，0.0148g(5.32×10-5摩尔)七水硫酸亚铁，4.80g(0.011摩尔)全氟辛酸铵(ammonium perfluorooctonoate)和158.5g(1.39摩尔)HFO-1234yf。反应器的温度升高到80℃，之后在3小时时间内恒定添加40mL的0.091M过硫酸钾溶液。在添加过硫酸盐完成之后，使反应在80℃进行另外的16小时。然后将高压釜内容物冷却到室温，转移到烧杯，并且用12M的HC1酸化以诱导聚合物沉淀。将聚合物过滤然后用H2O洗涤直到滤液具有中性pH值。在干燥之后，分离到总共44.48g的白色聚合物。(收率28.1％)。
实施例2类似于实施例1，只是引发剂一次性添加，并且向反应器装载的单体量是148.6g(1.3mo1)。由该反应获得的聚合物产量是90.2g(60.7％收率)。
实施例3类似于实验1，只是表面活性剂的量减少33％到2.98g(6.91×10-3摩尔)并且反应器中装载的单体量增大到161g(1.41摩尔)。聚合物的产量是55.73g(34.6％收率)。
实施例4类似于实验1，只是反应温度降低到55℃并且装载的单体量减少到151.7g(1.33摩尔)。聚合物的产量是122.38g(80.7％收率)。由该实验显示低反应温度更有利聚合作用。
实施例5类似于实施例4只是表面活性剂减少33％并且装载的单体量增大到178.9g(1.57摩尔)。由该实验获得的聚合物的产量是166.71g(93.2％收率)。该实验表明低反应温度(如上)和低表面活性剂浓度有利于聚合物形成。
实施例6：制备抗反射涂层
将根据实施例5产生的含氟聚合物溶解在乙酸乙酯中以形成各种抗反射涂渍溶液样品，各自具有大约3.5wt％的聚合物浓度。对于以下表格1列出的各样品，将所得涂渍溶液通过1500rpm下35秒的旋涂涂敷到玻璃和硅片，然后涂布的晶片(wafer)在以下说明的各种温度下固化。样品9是样品1-8的变体，其中晶片首先涂有137nm厚的溶胶凝胶涂层，然后涂敷20nm厚的本文描述的含氟聚合物涂层。该溶胶凝胶涂层是通过四乙氧基硅烷和甲基三乙氧基硅烷以2∶1的摩尔比，在IPA中在四丁基氢氧化铵(40％水溶液)碱性(base)催化剂存在下反应形成的。反应混合物被加热到35-70℃持续1-3.5小时，冷却，然后以半间歇方式向反应混合物添加硝酸以调节反应混合物的pH到0.5-1.7。然后将反应混合物进一步冷却并用有机溶剂稀释。然后基材被涂敷并在600-750℃固化。在固化之后，涂敷含氟聚合物层。
表格1：
使用可从n&k Technology,Inc获得的宽带光谱仪工具测量硅片上的涂层厚度。使用相同的工具测量折射率。通过紫外-可见光光谱分析测量300-2500nm波长的透射率。将粘合带测试用作涂层粘附性的指示器，并通过如下方式进行：在该涂层中形成交叉窗口(cross-hatches)(在室温下和在沸水中加热二者)、将背粘性带材按压到经涂布的基材上、将带材从涂层上拉开、然后研究带材对涂层的交叉窗口部分的影响。使用接触角测试采用可从AST Products，Inc获得的VCA2500仪器来测定AR涂布基材的接触角。使用光学显微镜方法可视地分析膜均匀性。
结果表明本发明实施方式的AR涂层提高了光透射(T增益)，同时保持了涂层的均匀性和粘附性。实施方式还证明了与常规溶胶凝胶涂层相比，AR涂层可以在低温固化。
实施例7-性能测试
除表格1中展示的测试数据之外，用涂渍溶液涂布几个晶片，该涂渍溶液包括乙酸乙酯溶剂和3.5wt％的如实施例5中所述形式的含氟聚合物并且具有17,000道尔顿的摩尔重量。涂层在300℃固化并且所得涂层具有140nm的厚度。使所得样品经受各种性能和耐久性测试。在单侧涂布的样品上通过使用差分扫描量热法来测量样品在300℃经过170分钟的重量改变来实施热稳定性测试。在此时段的末期，平均样品损失仅为0.81wt％。通过热解吸质谱分析法测量膜的排气(out-gassing)，如图3所示，结果显示出有利的排气性能。
通过130℃和85％相对湿度下96小时的加速湿热测试来测量透射率性能。未涂布的、单侧涂布的、以及双侧涂布的样品全部测试。双侧涂布样品显示出透射率几乎没有损失，而单侧涂布样品显示出仅有轻微的透射率损失(约0.3％)。比较起来，未涂布样品显示出显著的透射率损失(约1.4％)。
通过将单侧涂布样品(样品10)留在户外环境42天，并与未涂布的玻璃基材样品(比较样品A)和涂有137nm厚的溶胶凝胶涂层的玻璃基材样品(比较样品B)比较透射率损失和视觉清洁度来测量涂层的抗污特性。溶胶凝胶涂层参考样品9如上述形成。表格2中显示的结果表明，和比较样品A和B相比，在视觉外观和透光率损失两方面，根据本发明实施方式制备的样品具有更好的抗污特性。
表格2
如以下表格3显示的，在样品10上也实施了各种耐久性测试。全部测试都通过。
表格3：
实施例8-10：另外的HFO化合物
实施例8是按类似实施例1-5的方式形成，只是使用HFO-1234zf替换HFO-1234yf以形成聚合物。实施例9按类似实施例1-5的方式形成，只是使用HFO-1234ze替换HFO-1234yf以形成聚合物。实施例10按类似实施例1-5的方式形成，只是使用HFO-1225替换HFO-1234yf以形成聚合物。对于各含氟聚合物，以和实施例6所述同样的方式来形成抗反射涂层。
在不背离本发明范围的前提下，可以对论述的示例性实施方式进行各种各样的变更和增加。例如，虽然如上所述的实施方式提到了特定的特征，本发明的范围还包括具有不同特征组合的实施方式和不包括所有所述特征的实施方式。因此，本发明的范围旨在涵盖落入权利要求范围的所有这类的替代物、变型和变体，连同它们的所有等同物。
Claims (10)
1.一种光学透明元件，包括：
光学透明基材；和
抗反射涂层，其布置在所述光学透明基材的至少一个表面的一部分上，所述抗反射涂层包含至少一种下式所示的聚合物：
其中n=10到2500，R1、R2和R3各自选自H和F，并且所述聚合物具有2000到200,000道尔顿的分子量。
2.权利要求1的光学透明元件，其中所述至少一种聚合物如下式所示：
其中n=15到2000。
3.权利要求1-2中任一项的光学透明元件，其中所述至少一种聚合物具有10,000到100,000道尔顿的分子量。
4.权利要求1-3中任一项的光学透明元件，其中所述至少一种聚合物衍生自四氟丙烯或五氟丙烯化合物。
5.权利要求4的光学透明元件，其中所述化合物选自HFO-1234yf、HFO-1234zf、HFO-1234ze、HFO-1225及它们的立体异构体和组合。
6.权利要求1-5中任一项的光学透明元件，其中所述涂层包括包含溶胶凝胶的下层和包含至少一种聚合物的上层。
7.权利要求1-6中任一项的光学透明元件，其中所述涂层布置在所述基材的第一表面的至少一部分上和第二表面的至少一部分上。
8.形成光学透明元件的方法，包括：
在光学透明基材的表面的至少一部分上涂敷涂渍溶液，所述涂渍溶液包含至少一种下式所示的聚合物：
其中n=10到2500，R1、R2和R3各自选自H和F，并且所述聚合物具有2000到200,000道尔顿的分子量；并且
固化所述涂渍溶液以在所述光学透明基材上形成抗反射涂层。
9.权利要求8的方法，其中通过辊涂来涂敷所述涂渍溶液。
10.权利要求8-9中任一项的方法，其中在小于350℃的温度下固化所述涂渍溶液。
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/073,615 | 2011-03-28 | ||
| US13/073,615 US20120247531A1 (en) | 2011-03-28 | 2011-03-28 | Fluorinated antireflective coating |
| PCT/US2012/030255 WO2012134984A1 (en) | 2011-03-28 | 2012-03-23 | Fluorinated anti-reflective coating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103547946A true CN103547946A (zh) | 2014-01-29 |
Family
ID=46925631
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201280016154.9A Pending CN103547946A (zh) | 2011-03-28 | 2012-03-23 | 氟化抗反射涂层 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20120247531A1 (zh) |
| KR (1) | KR20140020303A (zh) |
| CN (1) | CN103547946A (zh) |
| TW (1) | TW201247799A (zh) |
| WO (1) | WO2012134984A1 (zh) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110320585A (zh) * | 2019-07-05 | 2019-10-11 | 佛山纬达光电材料股份有限公司 | 一种抗反射及增透型3d偏光片 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6293138B2 (ja) * | 2013-06-17 | 2018-03-14 | 株式会社カネカ | 太陽電池モジュール及び太陽電池モジュールの製造方法 |
| JP6702864B2 (ja) * | 2013-10-22 | 2020-06-03 | ハネウェル・インターナショナル・インコーポレーテッドＨｏｎｅｙｗｅｌｌ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｉｎｃ． | テトラフルオロプロペンから形成される硬化性フッ素ポリマー |
| TW201636455A (zh) * | 2014-10-21 | 2016-10-16 | 帝斯曼知識產權資產管理有限公司 | 塗覆基材之方法 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2970988A (en) * | 1955-10-14 | 1961-02-07 | Minnesota Mining & Mfg | New fluorine-containing polymers and preparation thereof |
| US4830038A (en) * | 1988-01-20 | 1989-05-16 | Atlantic Richfield Company | Photovoltaic module |
| US5339197A (en) * | 1989-03-31 | 1994-08-16 | Yen Yung Tsai | Optical pellicle with controlled transmission peaking |
| FR2680583B1 (fr) * | 1991-08-22 | 1993-10-08 | Commissariat A Energie Atomique | Materiau presentant des proprietes antireflet, hydrophobes et de resistance a l'abrasion et procede de depot d'une couche antireflet, hydrophobe et resistante a l'abrasion sur un substrat. |
| US5846650A (en) * | 1996-05-10 | 1998-12-08 | Minnesota Mining And Manufacturing Company | Anti-reflective, abrasion resistant, anti-fogging coated articles and methods |
| KR20060129509A (ko) * | 2004-03-26 | 2006-12-15 | 후지 샤신 필름 가부시기가이샤 | 반사 방지 필름의 제조방법, 반사 방지 필름, 편광판 및화상 표시 장치 |
| US20080135091A1 (en) * | 2006-12-08 | 2008-06-12 | Lap Kin Cheng | Process and device to produce a solar panel with enhanced light capture |
| US20100027144A1 (en) * | 2008-07-31 | 2010-02-04 | Guardian Industries Corp. | Articles with protective coating |
-
2011
- 2011-03-28 US US13/073,615 patent/US20120247531A1/en not_active Abandoned
-
2012
- 2012-03-23 CN CN201280016154.9A patent/CN103547946A/zh active Pending
- 2012-03-23 KR KR1020137028322A patent/KR20140020303A/ko not_active Application Discontinuation
- 2012-03-23 WO PCT/US2012/030255 patent/WO2012134984A1/en active Application Filing
- 2012-03-27 TW TW101110633A patent/TW201247799A/zh unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110320585A (zh) * | 2019-07-05 | 2019-10-11 | 佛山纬达光电材料股份有限公司 | 一种抗反射及增透型3d偏光片 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2012134984A1 (en) | 2012-10-04 |
| KR20140020303A (ko) | 2014-02-18 |
| US20120247531A1 (en) | 2012-10-04 |
| TW201247799A (en) | 2012-12-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101769093B1 (ko) | 색변환 광결정 구조체 및 이를 이용한 색변환 광결정 센서 | |
| US10338278B2 (en) | Anti-fog coating | |
| CN103547946A (zh) | 氟化抗反射涂层 | |
| US20110177241A1 (en) | Coating formulation affording antireflection effects on transparent substrate and method for manufacturing transparent substrate with antireflection function using said coating formulation | |
| CN102190956B (zh) | 抗反射涂布材料及包含其的抗反射涂膜 | |
| CN112415639A (zh) | 一种低反射防红外耐高温树脂镜片及其制备方法 | |
| CN107082868B (zh) | 一种核壳结构纳米杂化粒子，其制备方法和其减反射涂料组合物 | |
| CN110272645B (zh) | 一种可重涂增透的超疏水涂料及其制备方法和应用 | |
| Chi et al. | Novel pathways for the preparation of silica antireflective films: Improvement in mechanical property | |
| JPH01139255A (ja) | 分子配向性薄膜 | |
| US20120167800A1 (en) | Coating Composition for Low-Refractive Index Anti-Reflection Film | |
| KR20170068274A (ko) | 색변환 광결정 구조체 및 이를 이용한 색변환 광결정 센서 | |
| KR20190078484A (ko) | 불소계 고분자, 이를 포함하는 불소계 고분자 조성물 및 이를 이용한 불소계 고분자막 | |
| KR101803549B1 (ko) | 색변환 광결정 구조체 및 이를 이용한 색변환 광결정 센서 | |
| KR101803550B1 (ko) | 색변환 광결정 구조체의 제조 방법 | |
| KR101028017B1 (ko) | 폴리머 후처리 공정을 이용한 무색 투명 ｆｔｏ 전도막제조 방법 | |
| CN105753337A (zh) | 一种绿色环保低成本增透膜的制备方法 | |
| KR101564658B1 (ko) | 광학필름 | |
| KR101445437B1 (ko) | 반사방지필름 및 그의 제조방법 | |
| US10059622B2 (en) | Anti-reflection glass with tin oxide nanoparticles | |
| CN110041543B (zh) | 一种耐腐蚀的结构色水凝胶薄膜及其制备方法 | |
| Vahanian et al. | Enhancement of the electrical response in high concentrating photovoltaic systems by antireflective coatings based on silica nanoparticles | |
| JP2022143648A (ja) | 波長変換膜形成用組成物及び波長変換膜 | |
| CN107141843B (zh) | 一种高强度耐湿热减反增透碳硅氧磷复合涂层的制备方法 | |
| US20120148814A1 (en) | Transparent glass body, method for the production thereof, and use thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20140129 |