CN103529599B - The orientation equipment of a kind of air-flotation type crystal liquid substrate and method - Google Patents
The orientation equipment of a kind of air-flotation type crystal liquid substrate and method Download PDFInfo
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- CN103529599B CN103529599B CN201310429812.3A CN201310429812A CN103529599B CN 103529599 B CN103529599 B CN 103529599B CN 201310429812 A CN201310429812 A CN 201310429812A CN 103529599 B CN103529599 B CN 103529599B
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
- G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Liquid Crystal (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
Abstract
The embodiment of the invention discloses the orientation equipment of a kind of air-flotation type crystal liquid substrate, including: heating platform, it is provided with multiple pore, described pore is used for delivery temperature hot blast uniformly and vertically upward；Bracing frame, is arranged at the surrounding of described heating platform, treats the crystal liquid substrate of orientation for support clamping；Support pin, is uniformly arranged in described heating platform, and it can move the most in the same direction with support frame as described above, supports the bottom of described crystal liquid substrate at least part time；Wherein, the jet amount of described pore gradually decreases to described heating platform edge from described heating platform center.The embodiment of the invention also discloses corresponding alignment method.According to embodiments of the invention, can make crystal liquid substrate process of alignment is heated and ultraviolet light irradiates uniformly, and quality and the product yield of crystal liquid substrate can be promoted.
Description
Technical field
The present invention relates to the manufacturing technology of Thin Film Transistor-LCD (Thin Film Transistor liquid crystal display, TFT-LCD), particularly to orientation equipment and the method for a kind of air-flotation type crystal liquid substrate.
Background technology
In the manufacturing technology of existing liquid crystal display, wherein, ultraviolet curing (UV Curing) is an important processing procedure, and crystal liquid substrate, after filling liquid crystal mixture, needs to make liquid crystal complete process of alignment under the common effect of ultraviolet and electric field.
The principle being carried out orientation by ultraviolet curing is to apply electric field in the upper and lower both sides of crystal liquid substrate, and use ultraviolet to irradiate in liquid crystal, so that the reaction monomers in liquid crystal moves up and down under the effect of electric field, and under the effect of ultraviolet, there is polyreaction, thus on liquid crystal upper and lower base plate, form both alignment layers, to realize liquid crystal is carried out the effect of orientation.During LCD alignment, ultraviolet, electric field and reaction temperature are three very important factors.
In order to realize the uniformity that crystal liquid substrate is irradiated by ultraviolet, the modes using thimble to support substrate more, as shown in Figures 1 and 2, it is shown that a kind of crystal liquid substrate orientation equipment schematic diagram of the prior art.Wherein, this crystal liquid substrate orientation equipment supports crystal liquid substrate 1 by multiple rows of thimble 90, and wherein, this multiple rows of top assorted 90 contacts with the viewing area 10 of crystal liquid substrate 1；Additionally by the conducting probe 91 being positioned at crystal liquid substrate 1 two ends, this crystal liquid substrate 1 is applied electric field.But, in this prior art, owing to thimble can not reach insulation effect completely, therefore easily produce the uneven (Pin of orientation produced due to the contact of thimble
Mura) situation.
In order to reduce this uneven situation, in some versions, by reducing the quantity of thimble 90, or viewing area 10 is avoided in the position making thimble 90 contact with crystal liquid substrate 1.
As shown in Figure 3, it is shown that another kind of crystal liquid substrate orientation equipment schematic diagram of the prior art.In this prior art, substantially reduce the number the quantity of thimble 90.But, in this prior art, minimizing due to thimble quantity, there will be again crystal liquid substrate and produce the situation of bending (bending), owing to creating bending, may result in conducting probe and crystal liquid substrate loose contact (as shown in the B in figure), so that the voltage outside applying crystal liquid substrate is loose contact occur, thus it is abnormal to cause orientation to occur.Additionally, the place of deformation occurs at crystal liquid substrate, also the quantity that can produce its ultraviolet received is different from the quantity of the ultraviolet received by other normal region, generally in the place that deformation occurs, the quantity of its ultraviolet received can more lower (shown in the A in figure), so can cause each region orientation speed difference, thus it is uneven to produce orientation.
As shown in Figure 4, it is shown that another kind of crystal liquid substrate orientation equipment schematic diagram of the prior art.In this orientation equipment, its thimble 90 can be with alternating movement, to support crystal liquid substrate 1.So can reduce thimble 91 and crystal liquid substrate 1 time of contact at same position, owing to thimble 91 inevitably needs to contact with crystal liquid substrate 1, therefore existing this technology can only reduce the appearance of the uneven situation of orientation, but the appearance of the uneven situation of orientation can not be avoided completely.
To sum up, in existing technology, when crystal liquid substrate is carried out orientation, owing to the appearance of the uneven situation of orientation cannot be avoided, therefore how to promote the quality of crystal liquid substrate and product yield is a problem needing to solve.
Summary of the invention
The technical problem to be solved is, it is provided that the orientation equipment of a kind of air-flotation type crystal liquid substrate and method, can make to be heated in crystal liquid substrate process of alignment and ultraviolet light irradiates uniformly, and can promote quality and the product yield of crystal liquid substrate.
In order to solve above-mentioned technical problem, the one side of embodiments of the invention provides the orientation equipment of a kind of air-flotation type crystal liquid substrate, including:
Heating platform, is provided with multiple pore, and described pore is used for delivery temperature hot blast uniformly and vertically upward；
Bracing frame, is arranged at the surrounding of described heating platform, treats the crystal liquid substrate of orientation for support clamping；
Support pin, is uniformly arranged in described heating platform, and it can move the most in the same direction with support frame as described above, supports the bottom of described crystal liquid substrate at least part time；
Wherein, the jet amount of described pore gradually decreases to described heating platform edge from described heating platform center；
There is on described heating platform the first heat transfer layer, described first heat transfer layer is provided with probe, for described crystal liquid substrate (1) is positioned.
Wherein, described heating platform includes:
Zone of heating, is used for heating；
First heat transfer layer, is positioned on described zone of heating；
Second heat transfer layer, is positioned under described zone of heating；
Wherein, being further provided with gas passage in described first heat transfer layer, described gas passage is formed with the plurality of pore on described first heat transfer layer surface.
Wherein, described first heat transfer layer upper surface, through anodising, forms black or relatively dark colour, so that the heat energy of described zone of heating is converted into infrared ray.
Wherein, described zone of heating is to use Muscovitum as the electric heating layer of dielectric.
Wherein, support frame as described above is further provided with the mechanism for described crystal liquid substrate carries out permutation location, and the clamping device gripping crystal liquid substrate.
Wherein, farther include for driving support frame as described above and the drive mechanism of support pin motion respectively.
Correspondingly, the embodiment of the present invention additionally provides the alignment method of a kind of air-flotation type crystal liquid substrate, comprises the steps:
Being positioned over by crystal liquid substrate on bracing frame and support pin, described crystal liquid substrate is positioned and grips by support frame as described above；
Support frame as described above and described support pin move down the first distance；
Multiple pores by heating platform surface the most vertically spray the hot blast of homogeneous temperature, described crystal liquid substrate is made to suspend and apart from described support pin one predetermined altitude, drive described support pin to move down second distance, and make probe rise the bottom supporting described crystal liquid substrate；
Apply voltage to described crystal liquid substrate, and apply ultraviolet light, carry out process of alignment；
After orientation completes, making described probe unclamp, and make support pin move up second distance, the plurality of pore stops ejection hot blast；
Drive support frame as described above and described support pin to move up the first distance, and remove described crystal liquid substrate；
Wherein, farther include:
The jet amount controlling described pore gradually decreases to described heating platform edge from described heating platform center, and makes described crystal liquid substrate suspend and be 0.1 ~ 1mm apart from the predetermined altitude of described support pin.
Wherein, the temperature of the hot blast that the plurality of pore the most vertically sprays is between 50 ± 5 DEG C.
Implement embodiments of the invention, there is following beneficial effect:
First, the orientation equipment of the crystal liquid substrate that the embodiment of the present invention provides and method, by the pore of heating platform to base plate bottom blowing hot-air, the viewing area making crystal liquid substrate is suspended in the air, do not contact with any material, thus avoid substrate because of the phenomenon uneven with the orientation that support pin contacts results in.
It addition, the embodiment of the present invention can make crystal liquid substrate each several part in process of alignment be heated evenly；And the bending of crystal liquid substrate can be reduced so that ultraviolet can uniform irradiation on crystal liquid substrate, thus improve quality and the product yield of crystal liquid substrate；
And, in the embodiment of the present invention, the jet amount of pore gradually decreases to described heating platform edge from described heating platform center, it is ensured that crystal liquid substrate can stably be suspended in above heating platform in whole process of alignment.
Accompanying drawing explanation
In order to be illustrated more clearly that the embodiment of the present invention or technical scheme of the prior art, the accompanying drawing used required in embodiment or description of the prior art will be briefly described below, apparently, accompanying drawing in describing below is only some embodiments of the present invention, for those of ordinary skill in the art, on the premise of not paying creative work, it is also possible to obtain other accompanying drawing according to these accompanying drawings.
Fig. 1 is the structure longitudinal section of the orientation equipment of existing a kind of crystal liquid substrate；
Fig. 2 is the elevational schematic view in Fig. 1；
Fig. 3 is the arrangement works schematic diagram of the orientation equipment of existing another kind of crystal liquid substrate；
Fig. 4 is the arrangement works schematic diagram of the orientation equipment of another crystal liquid substrate existing；
Fig. 5 is orientation equipment the first status architecture schematic diagram of a kind of air-flotation type crystal liquid substrate that the present invention provides；
Fig. 6 is orientation equipment the second status architecture schematic diagram of a kind of air-flotation type crystal liquid substrate that the present invention provides；
Fig. 7 is the orientation equipment third state structural representation of a kind of air-flotation type crystal liquid substrate that the present invention provides；
Fig. 8 be a kind of air-flotation type crystal liquid substrate that the present invention provides orientation equipment in the structural representation of heating platform.
Detailed description of the invention
Below with reference to the accompanying drawings the preferred embodiments of the present invention are described.
Incorporated by reference to shown in Fig. 5 to Fig. 8, it is shown that the structural representation of the present invention a kind of air-flotation type crystal liquid substrate orientation equipment.In this embodiment, the orientation equipment of this air-flotation type crystal liquid substrate at least includes:
Heating platform 2, is provided with multiple pore 230, and pore 230 is for delivery temperature hot blast uniformly and vertically upward；
Bracing frame 3, is arranged at the surrounding of heating platform 2, treats the crystal liquid substrate 1 of orientation for support clamping, is further provided with the mechanism for crystal liquid substrate 1 carries out permutation location, and the clamping device 6 gripping crystal liquid substrate 1 on bracing frame 3；
Multiple support pins 4, are uniformly arranged in heating platform 2, and it can move in the same direction with bracing frame about 3, support the bottom of crystal liquid substrate 1 at least part time；
Wherein, the jet amount of pore 230 gradually decreases to heating platform 2 edge from heating platform 2 center；
Further, also include for driving bracing frame and the drive mechanism of support pin motion respectively.
Wherein, heating platform 2 includes:
Zone of heating 20, heats heating platform for realization, and in one embodiment, zone of heating is to use Muscovitum as the electric heating layer of dielectric；
First heat transfer layer 21, is positioned on zone of heating 20；
Second heat transfer layer 22, is positioned under zone of heating 20；
Wherein, it is further provided with gas passage 23 in the first heat transfer layer 21, gas passage 23 is formed with multiple pore 230 on the first heat transfer layer 21 surface, wherein, this gas passage 23 and outside air pump (not shown), can such as filter and preheat before the gas of outside air pump carries out gas passage 23, wherein, quantity and/or size at the pore 23 set by the first heat transfer layer 21 centre position are bigger than quantity and/or the size at the pore 23 set by the first heat transfer layer 21 marginal position.
First heat transfer layer 21 and the second heat transfer layer 22 can use the material (such as aluminum or aluminum alloy) that heat conductivility is excellent, it is possible to uniform conductive heat energy；Can also be through anodising at the first heat transfer layer 21 upper surface; form black or relatively dark colour; the heat energy that can make zone of heating 20 is converted into infrared ray; this infrared ray can be that heat energy is to heat crystal liquid substrate 1 by crystal liquid substrate 1 sorption enhanced; above-mentioned anodising; may also operate as protecting the surface of the first heat transfer layer 21, in case crack arrestization produces gap simultaneously；
Zone of heating 20 controls with the temperature of outside air pump, makes the temperature from the pore 230 upwards hot blast of vertical ejection be in all the time between 50 ± 5 DEG C.
It addition, be provided with spy 5 pins on the first heat transfer layer 21, for crystal liquid substrate 1 is positioned.
Below, further in conjunction with Fig. 5 to Fig. 8, further illustrating the idiographic flow of the alignment method of the air-flotation type crystal liquid substrate that the present invention provides, the alignment method of this air-flotation type crystal liquid substrate comprises the steps:
First, being positioned over by crystal liquid substrate on bracing frame and support pin, crystal liquid substrate is positioned and grips by bracing frame；Typically requiring and crystal liquid substrate carrying carried out in an orientation room orientation process, and this orientation room needs the temperature (such as about 50 DEG C) that keeps a comparison fixing, carrying crystal liquid substrate can be completed by the equipment of such as mechanical hand.
Then, bracing frame and support pin move down the first distance, so that the heat of heating platform more effectively passes to crystal liquid substrate, in one embodiment, this first distance can be for 0.1-50
mm。
Then, multiple pores by heating platform surface the most vertically spray the hot blast of homogeneous temperature, crystal liquid substrate is made to suspend and distance support pin one predetermined altitude, support pin is driven to move down second distance, and make probe rise the bottom supporting crystal liquid substrate, wherein, by quantity and the setting of size of pore, the jet amount that can control pore gradually decreases to heating platform edge from heating platform center, in one embodiment, the temperature of the hot blast that multiple pores the most vertically spray is between 50 ± 5 DEG C, and second distance can be 0.1-5mm, predetermined altitude can be 0.1 ~ 1mm；
Apply voltage to crystal liquid substrate, and apply ultraviolet light, carry out process of alignment；
After orientation completes, making probe unclamp, and make support pin move up second distance, multiple pores stop ejection hot blast；
Drive bracing frame and support pin to move up the first distance, and remove crystal liquid substrate.
Implement embodiments of the invention, there is following beneficial effect:
First, the orientation equipment of the crystal liquid substrate that the embodiment of the present invention provides and method, by the pore of heating platform to base plate bottom blowing hot-air, the viewing area making crystal liquid substrate is suspended in the air, do not contact with any material, thus avoid substrate because of the phenomenon uneven with the orientation that support pin contacts results in.
It addition, the embodiment of the present invention can make crystal liquid substrate each several part in process of alignment be heated evenly；And the bending of crystal liquid substrate can be reduced so that ultraviolet can uniform irradiation on crystal liquid substrate, thus improve quality and the product yield of crystal liquid substrate；
And, in the embodiment of the present invention, the jet amount of pore gradually decreases to heating platform edge from heating platform center, it is ensured that crystal liquid substrate can stably be suspended in above heating platform in whole process of alignment.
The above disclosed present pre-ferred embodiments that is only, certainly can not limit the interest field of the present invention, therefore equivalent variations with this, still belong to the scope that the present invention is contained.
Claims (8)
1. the orientation equipment of an air-flotation type crystal liquid substrate, it is characterised in that including:
Heating platform (2), is provided with multiple pore (230), and described pore (230) is used for delivery temperature hot blast uniformly and vertically upward；
Bracing frame (3), is arranged at the surrounding of described heating platform (2), treats the crystal liquid substrate (1) of orientation for support clamping；
Support pin (4), is uniformly arranged in described heating platform (2), and it can move the most in the same direction with support frame as described above (3), supports the bottom of described crystal liquid substrate (1) at least part of time；
Wherein, the jet amount of described pore (230) gradually decreases to described heating platform (2) edge from described heating platform (2) center；
Described heating platform has the first heat transfer layer on (2), is provided with probe (5) on described first heat transfer layer (21), for positioning described crystal liquid substrate (1).
2. the orientation equipment of air-flotation type crystal liquid substrate as claimed in claim 1, it is characterised in that described heating platform (2) including:
Zone of heating (20), is used for heating；
First heat transfer layer (21), is positioned on described zone of heating (20)；
Second heat transfer layer (22), is positioned under described zone of heating (20)；
Wherein, being further provided with gas passage in described first heat transfer layer (21), described gas passage is formed with the plurality of pore (230) on described first heat transfer layer (21) surface.
3. the orientation equipment of air-flotation type crystal liquid substrate as claimed in claim 2, it is characterised in that described first heat transfer layer (21) upper surface, through anodising, forms black or relatively dark colour, so that the heat energy of described zone of heating (20) is converted into infrared ray.
4. the orientation equipment of air-flotation type crystal liquid substrate as claimed in claim 3, it is characterised in that described zone of heating (20) is to use Muscovitum as the electric heating layer (20) of dielectric.
5. the orientation equipment of the air-flotation type crystal liquid substrate as described in any one of claim 1-4, it is characterized in that, the mechanism for described crystal liquid substrate (1) being carried out permutation location, and the clamping device (6) that crystal liquid substrate (1) is gripped it is further provided with on support frame as described above (3).
6. the orientation equipment of air-flotation type crystal liquid substrate as claimed in claim 5, it is characterised in that farther include the drive mechanism for driving support frame as described above (3) and support pin (4) to move respectively.
7. an alignment method for air-flotation type crystal liquid substrate, it realizes in the orientation equipment of the air-flotation type crystal liquid substrate as described in any one of claim 1 to 6, it is characterised in that comprise the steps:
Being positioned over by crystal liquid substrate (1) on bracing frame (3) and support pin (4), described crystal liquid substrate (1) is positioned and grips by support frame as described above (3)；
Support frame as described above (3) and described support pin (4) move down the first distance；
Multiple pores (230) by heating platform (2) surface the most vertically spray the hot blast of homogeneous temperature, described crystal liquid substrate (1) is made to suspend and apart from described support pin (4) predetermined altitude, drive described support pin (4) to move down second distance, and make probe (5) rise the bottom supporting described crystal liquid substrate (1)；
Apply voltage to described crystal liquid substrate (1), and apply ultraviolet light, carry out process of alignment；
After orientation completes, making described probe (5) unclamp, and make support pin (4) move up second distance, the plurality of pore (230) stops ejection hot blast；
Drive support frame as described above (3) and described support pin (4) to move up the first distance, and remove described crystal liquid substrate (1)；
Wherein, farther include:
The jet amount controlling described pore (230) gradually decreases to described heating platform (2) edge from described heating platform (2) center, and makes described crystal liquid substrate (1) suspend and be 0.1 ~ 1mm apart from the predetermined altitude of described support pin (4).
The alignment method of a kind of air-flotation type crystal liquid substrate the most as claimed in claim 7, it is characterised in that the temperature of the plurality of pore (230) the upwards hot blast of vertical ejection is between 50 ± 5 DEG C.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310429812.3A CN103529599B (en) | 2013-09-22 | 2013-09-22 | The orientation equipment of a kind of air-flotation type crystal liquid substrate and method |
| PCT/CN2013/084174 WO2015039360A1 (en) | 2013-09-22 | 2013-09-25 | Alignment device and method for air-floating-type liquid crystal substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310429812.3A CN103529599B (en) | 2013-09-22 | 2013-09-22 | The orientation equipment of a kind of air-flotation type crystal liquid substrate and method |
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| Publication Number | Publication Date |
|---|---|
| CN103529599A CN103529599A (en) | 2014-01-22 |
| CN103529599B true CN103529599B (en) | 2016-08-10 |
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| CN201310429812.3A Active CN103529599B (en) | 2013-09-22 | 2013-09-22 | The orientation equipment of a kind of air-flotation type crystal liquid substrate and method |
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| CN (1) | CN103529599B (en) |
| WO (1) | WO2015039360A1 (en) |
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| CN104028438B (en) * | 2014-06-25 | 2015-08-19 | 南京中电熊猫液晶显示科技有限公司 | A kind of preliminary drying baking oven of removable feet position |
| CN107301962A (en) * | 2016-04-15 | 2017-10-27 | 上海新昇半导体科技有限公司 | Bernoulli Jacob's base unit and depositing device |
| US20190086697A1 (en) * | 2016-05-27 | 2019-03-21 | Sharp Kabushiki Kaisha | Method for manufacturing liquid crystal display device |
| CN106111492B (en) * | 2016-08-26 | 2022-09-27 | 合肥京东方光电科技有限公司 | Curing equipment and curing method |
| CN106526908A (en) * | 2016-08-30 | 2017-03-22 | 武汉华星光电技术有限公司 | Air floatation type support pin device and method |
| CN206573826U (en) | 2017-03-23 | 2017-10-20 | 惠科股份有限公司 | A kind of jacking apparatus and orientation ultraviolet irradiation machine |
| CN107193142A (en) * | 2017-07-19 | 2017-09-22 | 武汉华星光电技术有限公司 | Alignment film cure system |
| CN107505739B (en) * | 2017-09-04 | 2020-04-28 | 深圳市华星光电半导体显示技术有限公司 | Substrate support and alignment film pre-baking device |
| CN107340618A (en) * | 2017-09-14 | 2017-11-10 | 京东方科技集团股份有限公司 | Support meanss and support system |
| CN107601341B (en) * | 2017-09-25 | 2019-07-05 | 武汉华星光电技术有限公司 | Ejector pin component and hoistable platform |
| CN110172683A (en) * | 2019-06-27 | 2019-08-27 | 云谷（固安）科技有限公司 | Heating mechanism, plasma chamber and the method to form a film on substrate |
| CN110888266A (en) * | 2019-11-26 | 2020-03-17 | Tcl华星光电技术有限公司 | Method for manufacturing liquid crystal display panel |
| CN111025766A (en) | 2019-12-02 | 2020-04-17 | 深圳市华星光电半导体显示技术有限公司 | Liquid crystal alignment device |
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| CN103529599A (en) | 2014-01-22 |
| WO2015039360A1 (en) | 2015-03-26 |
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