CN102004358A - Manufacturing method and device of a liquid crystal panel - Google Patents
Manufacturing method and device of a liquid crystal panel Download PDFInfo
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- CN102004358A CN102004358A CN2010102717044A CN201010271704A CN102004358A CN 102004358 A CN102004358 A CN 102004358A CN 2010102717044 A CN2010102717044 A CN 2010102717044A CN 201010271704 A CN201010271704 A CN 201010271704A CN 102004358 A CN102004358 A CN 102004358A
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
- G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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Abstract
The invention provides a manufacturing method and device of a liquid crystal panel capable of performing the orientation of the liquid crystal panel in the short time, not resulting into reduced reliability. The liquid crystal including a UV reaction material is encapsulated on the liquid crystal panel (8) between two light-transparent substrates (glass substrates) on a first workpiece platform (3a). In the first step, while applying the voltage from a probe (4), the light with wavelength larger than that of the absorbing end of the liquid crystal (wavelength range of 320nm-360nm) irradiates a first light irradiating part (1). Then, the liquid crystal panel (8) is transported on a second workpiece platform (3b) using a workpiece transportation mechanism (5) and the light with wavelength shorter than that of the absorbing end of the liquid crystal (wavelength range of 300nm-320nm) irradiates a second light irradiating part (2), so as to perform the orientation of the liquid crystal. The lamp of the first step can use such as an iodine quasi molecule lamp and the lamp of the second step can use such as an XeCl quasi molecule lamp.
Description
Technical field
The present invention relates to the manufacture method of the liquid crystal panel of a kind of MVA (Multi-domain Vertical Alignment) mode, relate in particular to and a kind ofly will mix the liquid crystal that has by applying the orientation that voltage is orientated and the material that the ultraviolet ray reaction produces the photoreactivity material of polymerization is enclosed in advance between two pieces of glass substrates, to this liquid crystal panel irradiation ultraviolet radiation and polymerization ultraviolet ray reaction material, thereby alignment films is formed at the manufacture method and the manufacturing installation of the liquid crystal panel on the glass plate.
Background technology
Liquid crystal panel is that liquid crystal is enclosed in structure between two pieces of transmitance substrates (glass substrate), forms a plurality of active components (TFT) and liquid crystal drive electrode on a side glass substrate, and forms alignment films in the above.Glass substrate the opposing party forms color filter, alignment films and transparency electrode (ITO).Then, between the alignment films of two glass substrates, enclose liquid crystal, around sealing with sealant.
In the liquid crystal panel of this structure, alignment films is the alignment films that is used to control the liquid crystal aligning that liquid crystal is orientated to applying voltage between electrode.In the past, the control of alignment films was undertaken by friction, but was attempting new orientation control technology in recent years.
This technology is, liquid crystal with the orientation that utilizes voltage to apply and be orientated and the material that the ultraviolet ray reaction is produced the photoreactivity material (ultraviolet reaction material) of polymerization will have been mixed, enclose in advance and be provided with between the 1st glass substrate and the 2nd glass substrate of TFT element with respect to the 1st glass substrate, to this liquid crystal panel irradiation ultraviolet radiation and polymerization ultraviolet ray reaction material, the direction of the liquid crystal (being about 1 molecular layer on top layer) by fixedly being contacted with glass substrate, thus tilt angle (for example with reference to patent documentation 1) given to liquid crystal.
According to the method, owing to do not need having in order to give the thrust on the needed inclined-plane of tilt angle in the past, thereby the manufacturing process of liquid crystal panel can be simplified.Therefore, can delete the manufacturing cost or the manufacturing time of liquid crystal panel, and because the shadow of above-mentioned thrust eliminates, thereby aperture opening ratio is enhanced, and has the advantage of the province's electrification that concerns back side light.
In the manufacturing technology of the liquid crystal panel that carries out this new orientation control, about with respect to the material that has mixed liquid crystal and ultraviolet reaction material (below, the situation that is called the liquid crystal that contains ultraviolet reaction material is also arranged) disposal route of irradiation ultraviolet radiation, be suggested several motions.
In patent documentation 2 described " liquid crystal display cells device and manufacture method thereof ", ultraviolet ray irradiation, and the manufacture method of the liquid crystal indicator of the ultraviolet ray irradiation of the polymerization speed second condition bigger than the ultraviolet ray irradiation of first condition (with reference to paragraph [0012] etc.) of first condition carried out in a kind of combination successively of motion.
Specifically, radiation illumination is carried out the ultraviolet ray irradiation with integrated intensity under the second condition condition bigger than first condition.Like this, in the ultraviolet ray of first condition irradiation, because the polymerization that relaxes, thereby can suppress to be orientated unusual generation,, be orientated unusual liquid crystal layer and can obtain not or be suppressed even it is also no problem to promote polymerization speed afterwards.In addition, record in the ultraviolet ray of second condition irradiation, preferably increase near the ratio (with reference to paragraph [0037] etc.) of the short wavelength's composition the 310nm.
In patent documentation 3 described " liquid crystal display cells device and manufacture method thereof ", show such opinion: " in order not make the liquid crystal deterioration; irradiation uses wave filter to remove the ultraviolet ray in short wavelength zone of not enough 310nm for well as can be known ", " still;, then be difficult to obtain desired liquid crystal aligning if it is zero that intensity at wavelength 310nm is entirely.Therefore, wish that it is 0.02～0.05mW/cm in the intensity of 310nm that utilization contains wavelength
2About light source " (with reference to paragraph [0019] etc.).
In patent documentation 4 described " liquid crystal display cells device and manufacture method thereof ", short wavelength's ultraviolet ray obtains on the vertical orientated property of liquid crystal more favourable in the short time, but promote the rotten of liquid crystal molecule etc. easily, on the other hand, going bad of the very difficult promotion of long wavelength's ultraviolet ray liquid crystal molecule etc., but need the long period for the vertical orientated property that obtains liquid crystal in (with reference to paragraph [0031] etc.), proposed the scope of integrating intensity of the wavelength components (short wavelength's ultraviolet ray) of 300nm～350nm, and the scope of the integrating intensity of the wavelength components (long wavelength's ultraviolet ray) of 350nm～400nm.
Patent documentation 1: TOHKEMY 2003-177408 communique
Patent documentation 2: TOHKEMY 2005-181582 communique
Patent documentation 3: TOHKEMY 2005-338613 communique
Patent documentation 4: TOHKEMY 2006-58755 communique
Summary of the invention
As mentioned above, though finished several motions about relative disposal route of having mixed the material irradiation ultraviolet radiation of liquid crystal and ultraviolet reaction material, we carry out the result that various experiments are discussed, and also obtain following opinion.
That is, use as the liquid crystal panel of above-mentioned new orientation control in, the ultraviolet reaction material that produces polymerization with the ultraviolet ray reaction is mixed in liquid crystal, utilizes the ultraviolet ray irradiation to make this ultraviolet reaction material polymerization.But,, then produce the calcination of picture or the reduction of VHR (Voltage Holding Ratio), the reduction of contrast etc. and reduce reliability at liquid crystal panel if in liquid crystal, stay unpolymerized ultraviolet reaction material.Below, this situation is called the reduction of the reliability that the residue of ultraviolet reaction material causes.Therefore, the ultraviolet reaction material that is mixed in liquid crystal must have no all to be aggregated with remaining.
In order to promote the polymerization of ultraviolet reaction material, as long as the light of the irradiation wavelength that how ultraviolet reaction material reacted is just passable.Usually, the zone of reaction material below wavelength 360nm by the polymerization of ultraviolet institute has higher reaction sensitivity.On the other hand, as described in patent documentation 2,3,, then be also referred to as the rotten deterioration of liquid crystal damaged if the light that short wavelength's ultraviolet ray, especially wavelength 310nm is following effectively contacts.
Yet, say what kind of thing on the damage of this liquid crystal, rotten, deterioration are concrete, what kind of relevance itself and irradiated wavelength have in addition, and it is unclear, for in order to make the ultraviolet reaction material required light wavelength scope of polymerization without reservation, or short wavelength's light gives the specifics influence of liquid crystal, also do not do fully getting across.
Promptly, up to now, on liquid crystal, mix ultraviolet reaction material and be orientated with respect to its irradiation ultraviolet radiation in the manufacturing of liquid crystal panel of MVA mode of control, be directed to the light of which kind of wavelength coverage, shine and can not reduce the reliability of liquid crystal panel and just can carry out not clearly explanation of orientation process in the short time with which kind of ratio.
The present invention is according to being directed in order to make above-mentioned ultraviolet reaction material not remain the ground polymerization and needed light wavelength scope, or the concrete sex opinion that short wavelength's light gives liquid crystal is finished, the object of the present invention is to provide and a kind ofly mixed ultraviolet reaction material at liquid crystal and be orientated for this irradiation ultraviolet radiation in the manufacture method of liquid crystal panel of MVA mode of control, the reliability that the reliability that can not cause liquid crystal to decompose causing reduces or the residue of ultraviolet reaction material causes reduces, and can carry out the manufacture method and the manufacturing installation of liquid crystal panel of the orientation process of liquid crystal panel at short notice.
The result of the wholwe-hearted research of invention people finds following item.
At first, be directed to the negative anisotropic liquid crystal of dielectric coefficient (Merck ﹠ Co., Inc.'s system), measure transmissivity for light wavelength with present general employed VA (Vertical Alignment) usefulness.Represent as its result's liquid crystal chart at Fig. 1 for the transmissivity of wavelength.In the figure, transverse axis is wavelength (nm), and the longitudinal axis is transmissivity (%).
As can be known as shown in the drawing, the zone of liquid crystal more than wavelength 330nm, transmissivity is 100%, for transparent, but the following light of wavelength 320nm is absorbed.The photolysis liquid crystal molecule that is absorbed.That is, when the rayed of the wavelength below the wavelength that will be absorbed (shorter than 320nm wavelength) was on liquid crystal, then liquid crystal decomposed, the reduction that produces the reliability of liquid crystal panel thus.Below, the reduction of the reliability that this decomposition that is called liquid crystal is caused.
In addition, will absorb here in the above-mentioned light wavelength long wavelength wavelength (wavelength that begins the absorption of light when shortening light wavelength) be called the absorption edge wavelength, liquid crystal absorption edge wavelength shown in Figure 1 is 320nm.
As described above, have the promptly negative anisotropic liquid crystal of dielectric constant of liquid crystal that VA uses, its absorption edge wavelength is 320nm, and reduces in the 320nm transmissivity.
That is, the reduction of such reliability of the reduction of the calcination of the picture of liquid crystal panel or the reduction of VHR, contrast, think result from decompose by shining the liquid crystal that light produced below the above-mentioned absorption short wavelength, and the residue of above-mentioned ultraviolet reaction material.
Below, in the manufacturing of the liquid crystal panel of MVA mode, be directed to and be included in the ultraviolet reaction material of general employed liquid crystal now, measure absorbance for optical wavelength.Absorbed at light is the zone of the bigger wavelength of absorbance, and ultraviolet reaction material produces polyreaction.
Fig. 2 represents as its result's the ultraviolet reaction material absorbance for wavelength.In the figure, transverse axis is that wavelength (nm), the longitudinal axis are the absorbance (arbitrary unit) of ultraviolet reaction material.In addition, for measure using the material that has mixed liquid crystal and ultraviolet reaction material, when being directed to concentration with ultraviolet reaction material and being for example 0.1w% (w% is meant percentage by weight) below 1%, and two kinds during 0.01w% measure.The thickness of material is below the 15 μ m.
As shown in the drawing, ultraviolet reaction material under concentration height (for example 0.1w%) state, absorbing light in the zone below wavelength 370nm.That is, the absorption edge wavelength of ultraviolet reaction material is 370nm, the light time below illumination wavelength 370nm, can produce polyreaction.
But, carry out and the surplus of reaction material when reducing when polyreaction as can be known, then the light more than wavelength 330nm can not carry out polyreaction.This consideration is because when the concentration step-down (polyreaction proceeds to 90%, and the concentration of reaction material is 0.01w%) of reaction material, long wavelength's light almost is not absorbed in appearance.As above ground, even the light below wavelength 370nm produces the ultraviolet reaction material of polyreaction as can be known, if the following light of illumination wavelength 330nm not, (concentration 0.01w%'s) reaction material that then can not polymerization residue 10%.
That is,, also need to shine the following light of absorption edge wavelength (wavelength 320nm) of above-mentioned liquid crystal in order to have no residue ground polymerization ultraviolet ray reaction material.
In addition, also can consider to use the wavelength longer to produce the ultraviolet reaction material of polyreaction than wavelength 370nm, but if use the wavelength longer to produce the ultraviolet reaction material of polyreaction than wavelength 370nm, even then natural light also might produce polyreaction, owing to handle the reason of difficulty etc., in the manufacturing of the liquid crystal panel of MVA mode, as the ultraviolet reaction material that is contained in liquid crystal, as shown in Figure 2, use the ultraviolet reaction material that produces polyreaction with the light below the wavelength 370nm.
Above-mentioned " when will shine in the light wavelength of liquid crystal make its absorption edge wavelength (320nm) when following then liquid crystal decompose " situation, and the situation of " if the light illumination wavelength 320nm below not, then can't polymerization remaining 10% ultraviolet reaction material " be opposite situation.That is, utilize above-mentioned experiment, the reduction of the reliability that causes for the residue that prevents ultraviolet reaction material for the ultraviolet reaction material that makes all be contained in liquid crystal carries out polyreaction, needs the following light of irradiation absorption end wavelength (320nm).But, as can be known when the following light time of irradiation absorption end wavelength (320nm), then produce the reliability that the decomposition of liquid crystal causes and reduce, need be to satisfy the mode irradiates light of this opposite requirement.
Therefore, for its two side is set up, be about to the light of the wavelength shorter than the absorption edge wavelength (wavelength 320nm) of above-mentioned liquid crystal, the reduction of the reliability that causes for the residue that does not produce ultraviolet reaction material, though surpass the exposure that all ultraviolet reaction materials produce polyreaction, but need shine with controlling, make the scope of the critical value become the exposure of the reduction that is no more than the reliability that the decomposition that produces liquid crystal causes.However, if the following light of the absorption edge wavelength of liquid crystal (wavelength 320nm) only, then can not surpass produce the critical value of exposure of the reduction of the reliability that the decomposition of liquid crystal cause, thereby, as being used to make all ultraviolet reaction materials not remain the exposure of ground polymerization and deficiency, and produce the reliability reduction that the residue of ultraviolet reaction material causes.
Therefore, the major part of ultraviolet ray reaction material is used and is not absorbed in liquid crystal (promptly, the above light of the absorption edge wavelength of liquid crystal undecomposed liquid crystal) (wavelength 320nm) produces polyreaction, and will be with the unreacted in fact reflecting material of the light more than the remaining a little absorption edge wavelength, the light following with the absorption edge wavelength (wavelength 320nm) of liquid crystal carries out polyreaction.
Therefore, with rayed when liquid crystal panel, compare with the exposure of the light (for example light of wavelength coverage 300nm～320nm) of the wavelength shorter, the exposure than the light (for example light of wavelength coverage wavelength 320nm～360nm) of the long wavelength of absorption edge ripple of liquid crystal is increased than the absorption edge wavelength of liquid crystal.Thus, the major part of polyreaction ultraviolet ray reaction material at high speed, and can be at the short processing time unreacted in fact reaction material of the light of polyreaction more than the absorption edge wavelength without reservation.In addition, as above-mentioned ground, the exposure of the light of the wavelength shorter than the absorption edge wavelength of liquid crystal, though surpass the exposure that all ultraviolet reaction materials produce polyreaction, but wish irradiation, making becomes the scope of the critical value that is no more than the exposure that produces the reliable reduction that the liquid crystal decomposition causes with controlling.
Above-mentioned exposure with light (for example light of the wavelength coverage 300nm～320nm) wavelength of lacking than the absorption edge wavelength of liquid crystal is compared, for the exposure than the light (for example light of wavelength coverage 320nm～360nm) of the long wavelength of absorption edge ripple of liquid crystal is increased, light-struck operation is divided into 1st operation of irradiation than the light (light of wavelength coverage 320nm～360nm) of the long wavelength of absorption edge ripple of liquid crystal, with 2nd operation of irradiation, and after beginning the 1st operation, implement the 2nd operation than the light (light of wavelength coverage 300nm～320nm) of the wavelength of the absorption edge wavelength weak point of liquid crystal.
In the 1st operation, light by wavelength coverage 320nm～360nm, the major part of polyreaction ultraviolet ray reaction material, in the 2nd operation, cooperate the concentration of ultraviolet reaction material to reduce the variation of the absorbance cause, the light of the scope by illumination wavelength 300nm～320nm, thereby remaining a little the ultraviolet reaction material of polyreaction.
As the light source of radiation, can use phosphor body lamp or the iodine Excimer lamp of having removed the short wavelength at the light of the scope of the employed wavelength 320nm～360nm of the 1st operation.In addition, as the light source of radiation, can use the iodine Excimer lamp of 308XeCl Excimer lamp, phosphor body lamp, inclosure xenon at the light of the employed wavelength 300nm of the 2nd operation～320nm scope.
Be used to implement the manufacturing installation of the liquid crystal panel of above-mentioned the 1st operation and the 2nd operation, for example can constitute as described below.
Constitute illumination part by the 1st illumination part and the 2nd illumination part, for liquid crystal panel, in the 1st operation, from above-mentioned the 1st illumination part with respect to liquid crystal panel irradiation light than the long wavelength of absorption edge ripple of liquid crystal, and after beginning the 1st operation, from the light of above-mentioned the 2nd illumination part irradiation wavelength shorter, carry out the orientation process of liquid crystal panel than the absorption edge wavelength of liquid crystal.
In addition, the unit that voltage is put on liquid crystal panel is set, when penetrating device and carry out rayed by the 1st light at least, voltage is put on liquid crystal panel in the support sector that supports liquid crystal panel, and aligned liquid-crystal.
According in the present invention above, solve above-mentioned problem as described below.
(1) a kind of manufacture method of liquid crystal panel, relative liquid crystal panel irradiates light, this liquid crystal panel is enclosed the liquid crystal panel of inner MVA mode for the liquid crystal that will contain the photoreactivity material, make above-mentioned photoreactivity substance reaction, inside at above-mentioned liquid crystal panel forms orientation section, implement irradiation than the 1st operation of the light of the long wavelength of absorption edge ripple of liquid crystal, and after above-mentioned the 1st operation begins, begin to shine the wavelength shorter than the absorption edge wavelength of liquid crystal light the 2nd operation and carry out the orientation process of liquid crystal panel.
(2) in above-mentioned (1), the light wavelength scope of the long wavelength of absorption edge ripple of the above-mentioned liquid crystal of ratio that is shone in above-mentioned the 1st operation is 320nm～360nm, and the short wavelength of being shone in the 2nd operation light wavelength scope is 300nm～320nm.
(3) a kind of manufacturing installation of liquid crystal panel possesses: support sector, support liquid crystal panel, and this liquid crystal panel is enclosed the liquid crystal panel of inner MVA mode for the liquid crystal that will contain the photoreactivity material; And illumination part, to being supported at the above-mentioned liquid crystal panel irradiates light of above-mentioned support sector, by the liquid crystal panel that is supported at above-mentioned support sector being shone light from above-mentioned illumination part, thereby make the photoreactivity substance reaction in the above-mentioned liquid crystal panel and form orientation section, above-mentioned illumination part is comprised: have 1st illumination part of irradiation than the light source of the light of the long wavelength of absorption edge ripple of liquid crystal in the inside of liquid crystal panel; And, 2nd illumination part of irradiation than the light source of the light of the wavelength of the absorption edge wavelength weak point of liquid crystal arranged.
(4) in above-mentioned (3), be arranged on the light time of irradiation in the support sector that supports liquid crystal panel from the 1st illumination part, liquid crystal panel is applied the unit of voltage.
In the present invention, can obtain following effect.
By with the operation of rayed in liquid crystal panel, be divided into light the 1st operation, and the 2nd operation of the light of the irradiation wavelength shorter of the irradiation wavelength longer, thereby can set exposure, and the exposure of the light of the wavelength shorter of light of the long wavelength of absorption edge ripple of control ratio liquid crystal independently than the absorption edge wavelength of liquid crystal than the absorption edge wavelength (for example wavelength 320nm) of liquid crystal than the absorption edge wavelength of liquid crystal.
Therefore, in the 1st operation, major part for the ultraviolet ray of polymerization apace reaction material, set for and will give more exposure with height radiation illumination in the short time than the light of the long wavelength of absorption edge ripple of liquid crystal, on the other hand, in the 2nd operation, can set rayed amount for the wavelength shorter than the absorption edge wavelength of liquid crystal, surpass the exposure that all ultraviolet reaction materials produce polyreaction, but the critical value of the exposure that the reliability that causes above the decomposition that produces liquid crystal reduces.
Therefore, the reduction of the reliability that the reduction of the reliability that the residue of ultraviolet reaction material causes, the decomposition of liquid crystal cause can not produce, and can implement the orientation process of liquid crystal panel with the short time expeditiously.
Description of drawings
Fig. 1 is the figure of expression liquid crystal for the transmissivity of light wavelength.
Fig. 2 is the figure of the ultraviolet reaction material of expression for the absorbance of light wavelength.
Fig. 3 is the figure of the 1st configuration example of manufacturing installation of the liquid crystal panel of expression embodiments of the invention.
Fig. 4 is the figure of the configuration example of expression phosphor body lamp.
Fig. 5 (a) and Fig. 5 (b) are the figure of other configuration example of expression phosphor body lamp.
Fig. 6 is the figure of the beam split emission spectrum of expression phosphor body lamp.
Fig. 7 (a) and Fig. 7 (b) are the figure of the configuration example of expression iodine Excimer lamp.
Fig. 8 is the figure of the beam split emission spectrum of expression iodine Excimer lamp.
Fig. 9 is the figure of the beam split emission spectrum of the expression iodine Excimer lamp of enclosing xenon.
Figure 10 is the figure of the beam split emission spectrum of expression XeCl iodine Excimer lamp.
Figure 11 is the figure of the 2nd configuration example of manufacturing installation of the liquid crystal panel of expression embodiments of the invention.
Figure 12 is the figure of the 3rd configuration example of manufacturing installation of the liquid crystal panel of expression embodiments of the invention.
Figure 13 is the figure of the 4th configuration example of manufacturing installation of the liquid crystal panel of expression embodiments of the invention.
Figure 14 (a) is that expression is from the figure of the 1st operation to the variation of the pattern of the 2nd operation switching irradiation to Figure 14 (d).
Among the figure, 1: the 1 illumination part; 1a: the 1st light illuminator; 1b: lamp; 1c: the power supply of lamp; 1d: catoptron; 1e: lamp group; 2: the 2 illumination parts; 2a: the 2nd light illuminator; 2b: lamp; 2c: the power supply of lamp; 2d: catoptron; 2e: lamp group; 3a: the 1st work piece platform; 3b: the 2nd work piece platform; 4: probe; 5: workpiece handling mechanism; 6: transveyer; 7: control part; 8: liquid crystal panel; 9: framework; 10,20,30: lamp; 11: container (luminotron); 12,13: electrode; 15,27: phosphor layers; 21: container (luminotron); 22,23: electrode; 31: discharge vessel; 32,33: electrode; 24,37: ultraviolet reflecting film.
Embodiment
Fig. 3 represents to be used in the 1st configuration example of manufacturing installation (ultraviolet lamp) of liquid crystal panel of manufacture method of the liquid crystal panel of embodiments of the invention.
In the present invention, be divided into by than the long wavelength of absorption edge ripple of liquid crystal (light of wavelength coverage 320nm～360nm) come polyreaction be contained in the ultraviolet reaction material of liquid crystal most the 1st operation, and wavelength by lacking than the absorption edge wavelength of liquid crystal (light of wavelength coverage 300nm～320nm) carries out polyreaction is implemented to carry out liquid crystal panel in the 2nd operation of the unpolymerized remaining ultraviolet reaction material of the 1st operation orientation process.
Therefore, as shown in the drawing, the manufacturing installation of the liquid crystal panel of present embodiment (ultraviolet lamp) possesses: the 1st illumination part 1 of implementing the 1st operation; And the 2nd illumination part 2 of enforcement the 2nd operation.The 1st illumination part 1 possesses: the 1st light illuminator 1a; And the 1st work piece platform 3a of mounting liquid crystal panel.In addition, the 2nd illumination part 2 possesses: the 2nd light illuminator 2a; And the 2nd work piece platform 3b.
In the figure, on the 1st light illuminator 1 and the 2nd light illuminator 2, show each 6 lamp 1b, 2b respectively, but in fact, dispose 10 to the lamp more than 50.In addition, be directed to the number of lamp, suitably select according to the size of the liquid crystal panel of handling.
1st, the 2nd work piece platform 3a, 3b are the support sectors that supports liquid crystal panel 8, possess the vacuum suction mechanism (not shown) that keeps liquid crystal panel 8.In addition, in rayed, when the misgivings that the temperature of liquid crystal panel 8 rises are arranged, the cooling body of water-cooled pipe arrangement etc. can be set also at work piece platform 3a, 3b then.
On the 1st work piece platform 3a, be provided with the probe 4 of mechanism that voltage is put on the liquid crystal panel 8 of institute's mounting.Probe 4 is connected to probe power supply 4a.When carrying out rayed by the 1st light illuminator 1a, make the front end of probe 4 be contacted with the electrode of the liquid crystal panel on the 1st work piece platform 3a, 4a applies voltage from the probe power supply.In addition, in the 2nd operation, also can be and irradiates light not in liquid crystal applied voltages.Therefore, on the 2nd work piece platform 3b, also the mechanism that voltage is put on liquid crystal panel 8 can be set.
The 1st light illuminator 1a possesses the 1st lamp 1b, and the 2nd light illuminator 2a possesses the 2nd lamp 2b.In order to shine all of large-scale liquid crystal panel 8 with uniform illumination, on each light illuminator 1a, 2a, be arranged with many lamp 1b, 2b.In addition, the 1st lamp group of the 1st light illuminator 1a is connected to the power supply 1c of the 1st lamp, and the 2nd lamp group of the 2nd light illuminator 2a is connected to the power supply 2c of the 2nd lamp.
In the 1st operation, can not damage liquid crystal, carry out the major part of polyreaction ultraviolet ray reaction material at short notice.Therefore, it is the following light of 320nm (light of the wavelength shorter than wavelength 320nm) that the 1st lamp 1b that is installed on the 1st light illuminator 1a uses the absorption edge wavelength that radiation does not contain liquid crystal, even or contain also seldom, and be the lamp that the scope of (light of the wavelength longer than wavelength 320nm) more than the 320nm has the light of luminescence peak at the absorption edge wavelength of liquid crystal.
As this lamp, as above-mentioned ground, can enumerate the iodine Excimer lamp, or remove the following phosphor body lamp of wavelength 320nm.
In the 2nd operation, fully be aggregated in the ultraviolet reaction material of the left slight amount of the 1st operation unreacted.Therefore, be installed on the 2nd lamp 2b of the 2nd light illuminator 2a, using absorption edge wavelength at liquid crystal is the lamp that the scope of (light of the wavelength shorter than wavelength 320nm) below the 320nm has luminous peak value.
As this lamp, can exemplify the iodine Excimer lamp of phosphor body lamp, XeCl Excimer lamp, inclosure xenon.
More than, these lamps are not radiate unwanted light in the orientation process of infrared light etc., can prevent the temperature rising of substrate etc.The detailed construction that is directed to lamp is in following explanation.
As shown in Figure 3, above-mentioned Excimer lamp is owing to be formed with reflectance coating at the lamp body, thereby also catoptron 1d, 2d can be set at illumination part.On lamp, can not form the situation of for example phosphor body lamp of reflectance coating, on illumination part 1,2, catoptron 1d, 2d are set.
Between the 1st illumination part 1 and the 2nd illumination part 2, the workpiece handling mechanism 5 of carrying liquid crystal panel is set.Workpiece handling mechanism 5 is at the 1st illumination part 1, and the liquid crystal panel 8 that the 1st operation is through with is carried to the 2T spare platform 3b of the 2nd illumination part 2 from the 1st work piece platform 3a.
In addition, the power supply 2c of the power supply 1c of the 1st lamp, the 2nd lamp, probe power supply 4a, workpiece handling mechanism 5 etc. are connected to control part 7.Light a lamp light-off and the irradiation time of control part 7 control the 1st lamp 1b and the 2nd lamp 2b, in the 1st operation, put on magnitude of voltage or the time or the workpiece handling etc. of liquid crystal panel 8.
In addition, the rayed of the 2nd operation, though the exposure of wavelength 300nm～320nm scope surpasses the exposure that all ultraviolet reaction materials produce polyreaction, but produce the critical value that liquid crystal decomposes the exposure of the reliability reduction that causes in order to be no more than, its scope waits by experiment in advance and obtains, and is set at control part 7.
Fig. 4 is the figure of the configuration example of the above-mentioned phosphor body lamp of expression, the figure shows the sectional view that dissects with the plane that comprises tubular axis.
Inner peripheral surface in inside tube 111 is provided with electrode 12, and is provided with mesh electrode 13 at the outer peripheral face of outboard tube 112.These electrodes 12,13 dispose with discharge space S between container 11.
Fig. 5 represents other configuration example of phosphor body lamp.Fig. 5 (a) is the sectional view that expression is dissectd with the plane that comprises tubular axis, and Fig. 5 (b) is the A-A line sectional view of presentation graphs 5 (a).
In Fig. 5, lamp 20 has pair of electrodes 22,23, and electrode 22,23 is equipped on the outer peripheral face of container (luminotron) 21, is provided with diaphragm 24 in the outside of electrode 22,23.
At the inside surface that penetrates the opposite side of direction one side for the light of container 21 inner peripheral surfaces ultraviolet reflecting film 25 (with reference to Fig. 5 (b)) is set, is provided with low softening point glassy layer 26 within it week, be provided with phosphor layers 27 at the inner peripheral surface of this low softening point glassy layer 26.
Other formation and shown in Figure 4 same, be enclosed in the discharge space S in the container 21 gas, be used in phosphor layers 25 phosphor body too.
When HF voltage puts on electrode 22,23, then form the discharge of medium barrier, as ultraviolet light takes place above-mentionedly at 22,23 at electrode.Thus, phosphor body is energized, and is ultraviolet light about 340nm by phosphor layers generative center wavelength, and this light is reflected by ultraviolet reflecting film 25, is radiated to the outside by the opening portion that is not provided with ultraviolet reflecting film 25.
Fig. 6 represents the beam split emission spectrum of phosphor body lamp.As shown in the drawing, the above light of phosphor body lamp radiation wavelength 300nm～360nm.
Fig. 7 is the figure of the configuration example of expression iodine Excimer lamp.The outside drawing that this Fig. 7 (a) expression is all, Fig. 7 (b) is the A-A line sectional view of presentation graphs 7 (a).
In addition, in the inside of container 31, for example contain with SiO
2Be formed at the wall 36 of opposition side for the wall 35 of light ejaculation direction one side as the ultraviolet reflecting film 37 of principal ingredient, and the ultraviolet ray that is taken place in discharge space S is reflected towards light ejaculation direction by ultraviolet reflecting film 37, and becomes from being positioned at wall 35 ejaculations that light penetrates direction one side.
There is iodine gas the inside of container 31 except inclosure, argon gas body, ammonia gas have also been enclosed as buffer gas.Total head is 40～130kPa.Wherein, the concentration of iodine gas is 0.05～1.0%, and the radiation wavelength is 342nm.
In addition, Fig. 4, lamp shown in Figure 5 have phosphor body at the inner face of container, and be relative therewith, and lamp shown in Figure 7 is in that not have the phosphor body part inequality.But in discharge (discharge of the medium barrier) part of utilizing the dress medium that is situated between is common.
Fig. 8 represents the beam split emission spectrum of iodine Excimer lamp.As shown in the drawing, the light of iodine Excimer lamp radiation wavelength 310nm～350nm.
Enclose the iodine Excimer lamp of xenon, by enclosing the ormal weight xenon-133 gas again at iodine lamp shown in Figure 7, thus the light of radiation and above-mentioned wavelength inequality.
Enclose gas except iodine gas, xenon-133 gas, enclosing as buffer gas has krypton-85 gas.Total pressure is 40～130kPa.Wherein, the concentration of iodine gas is enclosed 0.05～1.0%, and the concentration of xenon-133 gas is enclosed about 0.05～2%.
The radiation wavelength has peak value at 342nm and 320nm, but passes through the relativity balance of the enclosed volume of iodine gas and xenon-133 gas, makes both exit doses change.
Fig. 9 represents to enclose the beam split emission spectrum of the iodine Excimer lamp of xenon.As shown in the drawing, the iodine Excimer lamp of enclosing xenon radiates the light of wavelength 310nm～350nm.In addition, enclose the iodine Excimer lamp of xenon,, can freely change near the light quantity (size of peak value) of wavelength 320nm by changing the xenon amount of being enclosed.
Therefore, increase the composition of the following light of wavelength 320nm, thereby the remaining ultraviolet reaction material of polymerization more quickly can shorten the processing time.
In addition, when using this lamp,, can freely change near the light quantity (size of peak value) of wavelength 320nm then by changing the enclosed volume of xenon.Therefore, can freely set light, and the ratio of the light of wavelength coverage 320nm～360nm of wavelength coverage 300nm～320nm, in addition, the exposure of the light below the wavelength 320nm is surpassed all ultraviolet reaction materials produce the exposure of polyreactions, can decompose the scope that the reliability that causes reduces the critical value of the exposure that is produced and set being no more than liquid crystal but become easily.
Enclose the chlorine Excimer lamp (XeCl Excimer lamp) of xenon, in lamp shown in Figure 7, enclose chlorine, xenon-133 gas, thus, can radiate the light of wavelength inequality to substitute iodine.
Particularly, enclose and chlorine body to be arranged, xenon-133 gas, and enclose as buffer gas the argon gas body is arranged.Total pressure is about 30kPa.Wherein, the concentration of chlorine body be enclose about 0.5～1.0%, xenon-133 gas concentration be enclose about 90～95%, the concentration of argon gas body is to enclose about 1.0～3.0%.Radiation wavelength 308nm.
Figure 10 represents the beam split emission spectrum of XeCl Excimer lamp.Light as shown in the drawing, that the radiation of XeCl Excimer lamp has the wavelength 290nm～320nm scope of luminescence peak at wavelength 308nm.
In addition, Fig. 4, Fig. 5, lamp shown in Figure 7 all are by make the discharge (so-called medium barrier discharge) establish medium and common of being situated between between pair of electrodes.Fig. 4, lamp shown in Figure 5 are at container inner face coating phosphor body, and obtain desired light by phosphor body, relative therewith, iodine Excimer lamp shown in Figure 7, the iodine Excimer lamp of enclosing xenon, the chlorine Excimer lamp of enclosing xenon do not use phosphor body, enclose things by these luminous to obtain desired light part inequality.
In addition, in the lamp of the structure of Fig. 4, Fig. 5, if remove phosphor body, also can use certainly as the iodine Excimer lamp, enclose xenon the iodine Excimer lamp, enclose the chlorine Excimer lamp of xenon.In addition, in the lamp of structure shown in Figure 7, if the coating phosphor body then only also can constitute lamp with the rare gas of xenon, argon, krypton etc.
In order to confirm effect of the present invention, carry out following experiment, at being verified with respect to the exposure of the liquid crystal that contains ultraviolet reaction material.At first, for the liquid crystal that contains ultraviolet reaction material, confirm that the following light of wavelength 320nm must decompose the experiment of scope irradiation that the quality that causes reduces the critical value of the exposure that is produced being no more than liquid crystal.Its result is shown in table 1.
(table 1)
| ?6 | The |
1 | Do not have | △ |
| ?7 | There is not |
0 | Do not have | × |
Table 1 is that expression contains the liquid crystal (the system MJ961213 of Merck ﹠ Co., Inc.) that the present generally light below the employed above-mentioned wavelength 370nm of irradiation then produces the acrylic ester ultraviolet ray reaction material (DIC corporate system) of polyreaction to the concentration with 0.1w%, shines about 10J/cm
2Light (having removed the main light below the wavelength 320nm) from extra-high-pressure mercury vapour lamp with wavelength 350nm～370nm scope by wave filter, the surplus ratio of ultraviolet ray reaction material was 10% (being equivalent to concentration 0.01w%), relative therewith, the variation exposure is shone the light from the XeCl Excimer lamp, at the result with reliability (calcination of picture or the reduction of VHR, the reduction of the contrast) investigation of panel of having or not with respect to the decomposition of the liquid crystal of exposure.
The XeCl Excimer lamp is as enclose the Excimer lamp of xenon-133 gas and chlorine body, as shown in figure 10, have luminous peak value at wavelength 308nm, the light of radiation wavelength 290nm～320nm scope above-mentionedly.
Shown in above-mentioned table 1, when with 10J/cm
2Above exposure irradiation then can be seen the decomposition that produces liquid crystal from the light time below the wavelength 320nm of XeCl Excimer lamp, causes that thus the reliability of panel reduces.
On the one hand, be 0 (not having irradiation)～1J/cm in exposure
2The time, the decomposition that also can not produce liquid crystal, but the reliability of panel reduces.This considers the reduction of the reliability that the residue of the ultraviolet reaction material of generation causes.In addition, when with 2J/cm
2～5J/cm
2The irradiation of exposure the time, the decomposition that then can not produce liquid crystal, and the reliability of panel is also good.This situation represents can not produce the decomposition of liquid crystal, and all in addition ultraviolet reaction materials produce polyreaction, and do not remain ultraviolet reaction material.
As known from the above, in order not produce light below the wavelength 320nm because the reduction of the reliability that the residue of ultraviolet reaction material causes, and surpass the exposure that all ultraviolet reaction materials produce polyreaction, do not produce because the scope of the critical value of the exposure that the reliability that the decomposition of liquid crystal causes reduces is at 2J/cm but surpass
2～10J/cm
2Exposure.
Below, investigation is by the above light of wavelength 320nm, make the major part reaction (polymerization) of ultraviolet reaction material, and, in order not produce because the reduction of the reliability that the residue of ultraviolet reaction material causes, and surpass the exposure that all ultraviolet reaction materials produce polyreaction, but but do not surpassing generation because the illuminator of the light below the scope illumination wavelength 320nm of the critical value of the exposure of the reduction of the reliability that the decomposition of liquid crystal causes or the purpose of rayed flow process are carried out following experiment.Its result is shown in table 2.
(table 2)
Table 2 is to contain the liquid crystal (the system MJ961213 of Merck ﹠ Co., Inc.) that the present generally light below the employed above-mentioned wavelength 370nm of irradiation then produces the acrylic ester ultraviolet ray reaction material (DIC corporate system) of polyreaction for the concentration with 0.1w%, with following condition irradiates light, be directed to and have or not liquid crystal to decompose to investigate with the reliability (reduction of the calcination of picture or the reduction of VHR, contrast) of panel.
＜condition 1 〉: with 20J/cm
2Exposure irradiation from the light of the wavelength 290nm～320nm of XeCl Excimer lamp.
＜condition 2 〉: with 15J/cm
2Exposure irradiation light from the iodine Excimer lamp after, with 5J/cm
2Exposure irradiation from the light of XeCl Excimer lamp.Iodine Excimer lamp such as above-mentioned shown in Figure 8, the light of radiation wavelength 310nm～360nm, but the following light quantity of wavelength 320nm is about 6% and seldom for all light quantities.
As noted above, condition 1 time, do not have the residue of ultraviolet reaction material, but produce the decomposition of liquid crystal and the reliability of panel reduces.But condition 2 times, the decomposition of liquid crystal or the residue of ultraviolet reaction material all do not have, and the reliability of panel is good.
So, at first, carry out after the irradiation of iodine Excimer lamp, if carry out the irradiation of XeCl Excimer lamp, then the reduction of the reliability that causes of the residue of the reduction of the reliability that causes of the decomposition of liquid crystal or ultraviolet reaction material does not all have, and can make liquid crystal panel.
As noted above, as condition 2, rayed is divided into twice, the 1 time uses the light that does not contain or almost do not contain below the wavelength 320nm, but the big light source of radiation illumination of wavelength coverage 320nm～360nm carries out polymerization in the major part of the reaction material of chien shih ultraviolet ray in short-term.
Then, the light by wavelength coverage 300nm～320nm makes that remaining a little ultraviolet reaction material carries out polyreaction in the liquid crystal.
The 2nd time irradiation, the reduction of the reliability that causes for the residue that does not produce ultraviolet reaction material, surpass the exposure that all ultraviolet reaction materials produce polyreaction, but use the light source that can shine in the scope of the critical value of the exposure of the reduction that does not surpass the reliability that the decomposition that produces liquid crystal causes.
The situation of this condition, carry out the major part of polyreaction ultraviolet ray reaction material by light, carry out the remaining ultraviolet reaction material of polyreaction by light from the wavelength 290nm～320nm of XeCl Excimer lamp from the wavelength 320nm～360nm of iodine Excimer lamp.
Though consider various be used in the 1st time irradiation illuminator and be used in the combination of illuminator of the 2nd time irradiation, but for example as the lamp that is used in the 1st time irradiation, except the iodine Excimer lamp that is used in above-mentioned experiment, consider to have removed the phosphor body lamp below the wavelength 320nm etc. with color filter etc.In addition, as the lamp that is used in the 2nd irradiation, consider the XeCl Excimer lamp, do not remove the following phosphor body lamp of wavelength 320nm, enclose the iodine Excimer lamp of xenon etc.
So, as the 1st operation and the 2nd operation, by irradiation is divided into twice, but the kind of variable light source can be set exposure, and the exposure of the scope of wavelength 300nm～320nm of control wavelength 320nm～360nm scope independently.Therefore, in the 1st operation, major part for the ultraviolet ray of polymerization apace reaction material, set for height radiation illumination and give more exposure at short notice, on the other hand, in the 2nd operation, become the exposure of wavelength 300nm～320nm scope easily set for above all ultraviolet reaction materials and produce the exposure of polyreaction, but be no more than the critical value of the exposure that reliability that the decomposition that produces liquid crystal causes reduces.
Below, other configuration example that is directed to the manufacturing installation (ultraviolet lamp) of liquid crystal panel is illustrated.
Represent the configuration example of the manufacturing installation (ultraviolet lamp) of the liquid crystal panel of embodiments of the invention at Fig. 3, but represent other configuration example at Figure 11, Figure 12, Figure 13.In addition, in Figure 11, Figure 12, Figure 13, omit expression control part and lamp power supply, probe power supply.
The ultraviolet lamp of Figure 11 is via framework 9 above-below direction ground configuration the 1st illumination part 1 and the 2nd illumination part 2.
On the 1st illumination part 1, have the 2nd illumination part 2, finished light-struck liquid crystal panel (workpiece) 8,, be carried to the 2nd top illumination part 2 and carry out rayed by workpiece handling mechanism 5 at the 1st illumination part 1.
So, dispose two illumination parts up and down, thereby can reduce the floor area (track) of ultraviolet lamp.
The ultraviolet lamp of Figure 12 is accommodated in the 1st lamp group 1e and the 2nd lamp group 2e in the light illuminator (among this figure, belong to the lamp of the 1st lamp group 1e with the represented lamp of 1b, belong to the lamp of the 2nd lamp group 2e with the represented lamp of 2b).In addition, work piece platform 3 be placed on transveyer 6 above, and transveyer 6 drives, thus work piece platform 3 moves to the right by the left side among the figure under the state of mounting liquid crystal panel 8.
Have under the state of liquid crystal panel 8 in work piece platform 3 mountings, transveyer 6 is driven, and the moment below work piece platform 3 moves to the 1st lamp group 1e of the 1st illumination part 1 stops transveyer 6.
Light the lamp 1b of the 1st lamp group 1e, the light of wavelength coverage 320nm～360nm is irradiated onto liquid crystal panel 8.In addition, when this rayed, apply voltage by 4 pairs of liquid crystal panels 8 of probe.
When the rayed of the lamp 1b that finishes the 1st lamp group 1e, then transveyer 6 is driven, and under the state of mounting liquid crystal panel 8 still, make work piece platform 3 be transported to the 2nd lamp group 2e below.
The lamp 2b that stops transveyer 6, the 2 lamp group 2e lights.The light that contains the following light of wavelength 320nm is irradiated onto liquid crystal panel 8.
After the rayed of finishing the 2nd lamp 2b, then transveyer 6 is driven, and makes liquid crystal panel 8 be transported the outside to ultraviolet lamp.
The ultraviolet lamp of Figure 13 is the 1st lamp 1b and the 2nd lamp 2b alternatively to be arranged be accommodated in a device in the light illuminator 1a.
During in work piece platform 3, then the 1st lamp 1b lights, and makes the light of wavelength coverage 320nm～360nm be irradiated onto liquid crystal panel 8 as the crystal panel mounting.When this rayed,, apply voltage at liquid crystal panel 8 by probe 4.
After the rayed of finishing the 1st lamp 1b, then the 2nd lamp 2b lights.The light that contains the following light of wavelength 320nm is illuminated in liquid crystal panel 8.At this moment, the 1st lamp 1b both can light, and also can extinguish.
Figure 14 represents the variation of switching the pattern of irradiation than the 1st operation of the light of the long wavelength of absorption edge ripple of liquid crystal to the 2nd operation of the light of the irradiation wavelength shorter than the absorption edge wavelength of liquid crystal from irradiation.
Figure 14 (a) be the irradiation of finishing the 1st operation (the 1st irradiation) afterwards, across temporal interval, carry out the pattern of the irradiation (the 2nd irradiation) of the 2nd operation.For example, when use is shown in the device of Fig. 3 or Figure 11, then become this pattern.Time between the 1st irradiation and the 2nd irradiation is the time that workpiece handling mechanism 5 is carried to workpiece (liquid crystal panel 8) from the 1st illumination part 1 the 2nd illumination part 2.
Figure 14 (b) finishes after the 1st irradiation, and (not across temporal compartment of terrain) carries out the pattern of the 2nd irradiation immediately.For example, when use is shown in the device of Figure 12, then become after the 1st irradiation, to begin the 2nd irradiation, thereby become this pattern.
Figure 14 (c) is the 1st irradiation and a part of pattern that repeats of the 2nd irradiation.Because the 1st irradiation can not decomposed liquid crystal, even thereby no problem with the 2nd irradiation repetition (even long-time irradiation) yet.For example, if use the device that is shown in Figure 13, then can carry out this pattern of irradiation.
Figure 14 (d) is the pattern that also continues the 1st irradiation (not stopping the 1st irradiation) in the 2nd irradiation.If use the device that is shown in Figure 13, then can carry out this pattern of irradiation.In addition, if be shown in the device of Figure 13, also can implement the irradiation mode of Figure 14 (a) or Figure 14 (b).
So, switched to for the 2nd time of shining, have various patterns according to the formation of installing from the 1st irradiation.But, at first, carry out the 1st irradiation, after the most photoreactive material of reaction, the photoreactive material that residue is tailed off is carried out the 2nd and is shone into the order of the Undec degree of liquid crystal for very important.If can implement this situation, then switch to the time of the 2nd irradiation from the 1st irradiation, also can be arbitrary pattern of Figure 14.
Claims (4)
1. the manufacture method of a liquid crystal panel, liquid crystal panel irradiates light relatively, this liquid crystal panel is enclosed the liquid crystal panel of inner MVA mode for the liquid crystal that will contain the photoreactivity material, make above-mentioned photoreactivity substance reaction, inside at above-mentioned liquid crystal panel forms orientation section, it is characterized in that, comprising:
Irradiation is than the 1st operation of the light of the long wavelength of absorption edge ripple of liquid crystal; And
After above-mentioned the 1st operation begins, begin to shine the 2nd operation of the light of the wavelength shorter than the absorption edge wavelength of liquid crystal.
2. the manufacture method of liquid crystal panel as claimed in claim 1 is characterized in that,
The light wavelength scope of the long wavelength of absorption edge ripple of the above-mentioned liquid crystal of ratio that is shone in above-mentioned the 1st operation is 320nm～360nm, and the short wavelength of being shone in the 2nd operation light wavelength scope is 300nm～320nm.
3. the manufacturing installation of a liquid crystal panel possesses: support sector, support liquid crystal panel, and this liquid crystal panel is enclosed the liquid crystal panel of inner MVA mode for the liquid crystal that will contain the photoreactivity material; And illumination part, to being supported at the above-mentioned liquid crystal panel irradiates light of above-mentioned support sector, by the liquid crystal panel that is supported at above-mentioned support sector being shone light from above-mentioned illumination part, thereby make the photoreactivity substance reaction in the above-mentioned liquid crystal panel and form orientation section in the inside of liquid crystal panel, it is characterized in that
Above-mentioned illumination part possesses:
Have 1st illumination part of irradiation than the light source of the light of the long wavelength of absorption edge ripple of liquid crystal; And, have 2nd illumination part of irradiation than the light source of the light of the wavelength of the absorption edge wavelength weak point of liquid crystal.
4. the manufacturing installation of liquid crystal panel as claimed in claim 3 is characterized in that,
Support the support sector of above-mentioned liquid crystal panel to possess, liquid crystal panel is applied the unit of voltage in the light time of irradiation from the 1st illumination part.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP201411/2009 | 2009-09-01 | ||
| JP2009201411A JP5316317B2 (en) | 2009-09-01 | 2009-09-01 | Manufacturing method of liquid crystal panel |
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| Publication Number | Publication Date |
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| CN102004358A true CN102004358A (en) | 2011-04-06 |
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| CN2010102717044A Pending CN102004358A (en) | 2009-09-01 | 2010-08-31 | Manufacturing method and device of a liquid crystal panel |
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| JP (1) | JP5316317B2 (en) |
| KR (1) | KR20110025069A (en) |
| CN (1) | CN102004358A (en) |
| TW (1) | TW201109802A (en) |
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2009
- 2009-09-01 JP JP2009201411A patent/JP5316317B2/en not_active Expired - Fee Related
-
2010
- 2010-06-28 TW TW099121063A patent/TW201109802A/en unknown
- 2010-07-21 KR KR1020100070326A patent/KR20110025069A/en not_active Application Discontinuation
- 2010-08-31 CN CN2010102717044A patent/CN102004358A/en active Pending
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Also Published As
| Publication number | Publication date |
|---|---|
| KR20110025069A (en) | 2011-03-09 |
| JP5316317B2 (en) | 2013-10-16 |
| TW201109802A (en) | 2011-03-16 |
| JP2011053399A (en) | 2011-03-17 |
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Application publication date: 20110406 |