CN103436845A - Method for coating TiC layer on surface of diamond particles - Google Patents
Method for coating TiC layer on surface of diamond particles Download PDFInfo
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- CN103436845A CN103436845A CN2013102410824A CN201310241082A CN103436845A CN 103436845 A CN103436845 A CN 103436845A CN 2013102410824 A CN2013102410824 A CN 2013102410824A CN 201310241082 A CN201310241082 A CN 201310241082A CN 103436845 A CN103436845 A CN 103436845A
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Abstract
The present invention discloses a method for coating a TiC layer on the surface of diamond particles. According to the method, after the ordinary vacuum evaporation film plating is performed, a vacuum heat treatment is performed so as to obtain a TiC coating layer on the surface of diamond particles; the TiC layer coating method is different from the ordinary vacuum evaporation Ti film plating method, and is further different from other chemical plating or electroplating methods, wherein the single Ti metal layer can be plated and the metal Ti and C compound layer can not be plated with the ordinary evaporation Ti film plating method, and the alloy of Ti and other metals can be plated and the TiC alloy layer can not be plated with the electroplating method; vacuum evaporation Ti film plating and a heat treatment are performed to prepare the diamond with a TiC coating layer, wherein the diamond presents good wettability with various metal or non-metal powders, and static pressure strength and thermal stability of the single particle of the diamond are substantially increased so as to increase a service life and use performances of the diamond tool.
Description
Technical field
The present invention is specifically related to a kind of method that coats the TiC layer on the diamond particles surface.
Background technology
In various grinding tool friction materialss, diamond tool is widely used, the quality of diamond particles quality directly has influence on work-ing life and the use properties of diamond tool product, therefore, require diamond particles energy and tire material to form good combination and there is certain high thermal resistance.As everyone knows, diamond is a kind of typical covalent linkage crystal, has very high unreactiveness, during with metal, resin and Ceramic bond, has very high interfacial energy, causes diamond particles to be difficult for being infiltrated by various wedding agents, and cohesiveness is poor.The diamond of bad adhesion is as easy as rolling off a log coming off in the course of the work, and the diamond come off can not be recycled utilization, caused the significant wastage of diamond particles, in addition, due to diamond, in the easy carbonization of being heated of when work, this will directly affect the use properties of diamond work.
At present, the general diamond surface metallization that adopts improves cohesiveness and the adamantine thermotolerance between diamond and tire material both at home and abroad, method commonly used has: electroless plating re-plating, salt bath plating, the micro-evaporation plating of vacuum, physics and chemistry vapour deposition etc., although these methods have obtained certain effect, but also exist some shortcomings, for example, production efficiency low, can not solve cohesiveness and stable on heating problem simultaneously.
Therefore, research and development energy and tire material have good wettability and can heat-resisting cladded type diamond particles be a job that has construction value.
Summary of the invention
The purpose of this invention is to provide a kind of method that coats the TiC layer on the diamond particles surface.A kind of method that improves diamond abrasive tool work-ing life and use properties,
The present invention has increased rotating objective table device on common vacuum evaporating coating machine, thereby has guaranteed the homogeneity of diamond surface plating, and rotating Stage microscope per minute is walked around moving with 250~300.Increase vacuum heat treatment after common vacuum vapor plating, thermal treatment temp is 880 ℃, and the time is 1h.
A kind of method that coats the TiC layer on the diamond particles surface provided by the invention, be after common vacuum vapor plating, then carry out vacuum heat treatment, thereby obtain one deck TiC coating layer on the diamond particles surface.
The method has following concrete steps:
1) adopt and be of a size of 40 ~ 50 purpose diamond particles, diameter is the pure titanium silk that 0.3mm, purity are 99.99%, and evaporation source is the tungsten filament of diameter 1mm, purity 99.95%;
2) to diamond particles cleaned, the alligatoring pre-treatment, pure titanium silk adopts ultrasonic wave to carry out clean, with sand papering pure tungsten silk, removes surface film oxide, wrapping wire, by the titanium filament winding on tungsten filament;
3) pretreated diamond particles is packed in 100 eye mesh screen vessel, vessel are fixed under rotating Stage microscope, tungsten filament is sandwiched on the fixture of heating source;
4) setting the processing parameter that evaporates plating is: electric current 40A, vacuum tightness is 7.0 * 10
-4pa, the Stage microscope rotating speed is 250~300 rev/mins, plated film time 25min;
5) diamond after plated film is put into to crucible, crucible is put into to vacuum heat treatment furnace and carry out vacuum heat treatment, processing parameter is: vacuum tightness is 1.6 * 10
-1pa, Heating temperature is 880 ℃, heat treatment time 1h.
In described step 4), the Stage microscope rotating speed is 300 rev/mins.
Using tungsten filament as evaporation source, more than the Ti silk being evaporated to the vaporization temperature of Ti, under the vaporization heat effect, the molecule of material or atom have enough thermal vibration energy and go to overcome the interatomic magnetism of solid surface, and overflow and to become gaseous molecular or atom evaporates rapidly scattering to surrounding with certain speed, in scattering way, unobstructed ground straight line reaches and is set in diamond surface, in this process, the temperature on diamond particles surface is always lower, Ti is with on physical form deposition and diamond surface, the diamond that then will deposit Ti carries out the vacuum heat treatment of 880 ℃ and 1h, slight carbonization occurs in diamond surface, and chemical reaction generation TiC occurs in the diamond of this carbonization and Ti, thereby make coating and the combination of diamond generation chemical metallurgy.
The invention has the beneficial effects as follows:
1) method of coating TiC layer used in the present invention both had been different from common vacuum evaporation coating Ti embrane method, also be different from other electroless platings or electrochemical plating, common evaporation plating Ti can only plate single Ti metal level, can not metallizing Ti and the compound layer of C, electrochemical plating also can only be plated the alloy of Ti and other metal, can not plate the TiC alloy layer, the present invention has that efficiency is high, the uniform characteristics of plated film.
2) the prepared diamond that the TiC coating layer is arranged formed after vacuum evaporation coating Ti film thermal treatment shows the characteristics that have good wettability with various metals or non-metal powder, adamantine single particle isostatic pressing strength and thermostability also are improved to a great extent simultaneously, thereby improve work-ing life and the use properties of diamond tool.
The accompanying drawing explanation
The vacuum-evaporation plating appts schematic diagram that Fig. 1 the present invention uses.
Wherein:
1. Stage microscope 2. screen cloth vessel 3. titanium molecule 4. evaporation source 5. heating sources.
Fig. 2 the present invention coats the front diamond surface shape appearance figure of TiC layer.
Fig. 3 the present invention coats diamond surface shape appearance figure after the TiC layer.
Embodiment
1. preferred dimension is 40 ~ 50 purpose diamond particles, and the employing diameter is the titanium silk that 0.3mm, purity are 99.99%, and evaporation source is selected the tungsten filament of diameter 1mm, purity 99.95%.
To diamond cleaned, the pre-treatment such as alligatoring.Pure titanium silk adopts ultrasonic wave to carry out clean.With sand papering pure tungsten silk, remove surface film oxide, wrapping wire.By the titanium filament winding on tungsten filament.
3. pretreated diamond is packed in 100 eye mesh screen vessel, vessel are fixed under rotating Stage microscope.Tungsten filament is sandwiched on the heating source fixture.
4. the processing parameter of setting the evaporation plating is: electric current 40A, vacuum tightness is 7.0 * 10
-4pa, the Stage microscope rotating speed is 300 rev/mins, plated film time 25min.
5. the diamond after plated film is put into to crucible, crucible is put into to vacuum heat treatment furnace and heat-treat, processing parameter is: vacuum tightness is 1.6 * 10
-1pa, Heating temperature is 880 ℃, heat treatment time 1h.
Claims (3)
1. a method that coats the TiC layer on the diamond particles surface, is characterized in that: after common vacuum vapor plating, then carry out vacuum heat treatment, thereby obtain one deck TiC coating layer on the diamond particles surface.
2. method according to claim 1 is characterized in that the method has following concrete steps:
Employing is of a size of 40 ~ 50 purpose diamond particles, and diameter is the pure titanium silk that 0.3mm, purity are 99.99%, and evaporation source is the tungsten filament of diameter 1mm, purity 99.95%;
To diamond particles cleaned, the alligatoring pre-treatment, pure titanium silk adopts ultrasonic wave to carry out clean, with sand papering pure tungsten silk, removes surface film oxide, wrapping wire, by the titanium filament winding on tungsten filament;
Pretreated diamond particles is packed in 100 eye mesh screen vessel, vessel are fixed under rotating Stage microscope, tungsten filament is sandwiched on the fixture of heating source;
The processing parameter of setting the evaporation plating is: electric current 40A, vacuum tightness is 7.0 * 10
-4pa, the Stage microscope rotating speed is 250~300 rev/mins, plated film time 25min;
Diamond after plated film is put into to crucible, crucible is put into to vacuum heat treatment furnace and carry out vacuum heat treatment, processing parameter is: vacuum tightness is 1.6 * 10
-1pa, Heating temperature is 880 ℃, heat treatment time 1h.
3. method according to claim 1, it is characterized in that: in described step 4), the Stage microscope rotating speed is 300 rev/mins.
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Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
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CN104805401A (en) * | 2015-03-26 | 2015-07-29 | 河南黄河旋风股份有限公司 | Production method for plating titanium carbide on diamond surface |
CN105970156A (en) * | 2016-04-18 | 2016-09-28 | 杭州诺麦科科技有限公司 | Selenium plating process and equipment based on vacuum evaporation method and container obtained through selenium plating process |
CN107462019A (en) * | 2017-09-25 | 2017-12-12 | 南京天煌机械有限公司 | One Room dual temperature vacuum drying chamber and furnace drying method |
CN109321917A (en) * | 2018-09-20 | 2019-02-12 | 泉州华大超硬工具科技有限公司 | A kind of pre-brazed Ways of Metallizing Cladding onto Diamond Surface |
CN109519489A (en) * | 2018-12-23 | 2019-03-26 | 王泰峰 | A kind of wear-resisting brake disc and its manufacturing method |
CN109750192A (en) * | 2019-03-08 | 2019-05-14 | 王泰峰 | A kind of no-spark super abrasive braking brake disk and preparation method thereof |
CN111254394A (en) * | 2018-12-03 | 2020-06-09 | 江苏锋泰工具有限公司 | Surface metallization diamond composite particle |
CN111364007A (en) * | 2020-04-26 | 2020-07-03 | 昆明理工大学 | Method and device for vacuum evaporation of magnesium on surface of high-temperature-resistant particle |
CN111519143A (en) * | 2020-04-26 | 2020-08-11 | 昆明理工大学 | Method and device for vacuum evaporation galvanizing on surface of high-temperature-resistant particles |
CN111575654A (en) * | 2020-05-21 | 2020-08-25 | 南京航空航天大学 | Ultrasonic vibration assisted vacuum micro-evaporation plating equipment |
Citations (1)
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JP2005068499A (en) * | 2003-08-26 | 2005-03-17 | Tohoku Tokushuko Kk | Metallic product provided with hard film having excellent adhesion, method of producing the metallic product, and cutting tool and die coated with the hard film |
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JP2005068499A (en) * | 2003-08-26 | 2005-03-17 | Tohoku Tokushuko Kk | Metallic product provided with hard film having excellent adhesion, method of producing the metallic product, and cutting tool and die coated with the hard film |
Non-Patent Citations (1)
Title |
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罗雯: "热处理对金刚石颗粒表面钛包覆层组织与性能的影响", 《金刚石与磨料磨具工程》, vol. 32, no. 4, 20 August 2012 (2012-08-20) * |
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
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CN104805401A (en) * | 2015-03-26 | 2015-07-29 | 河南黄河旋风股份有限公司 | Production method for plating titanium carbide on diamond surface |
CN105970156A (en) * | 2016-04-18 | 2016-09-28 | 杭州诺麦科科技有限公司 | Selenium plating process and equipment based on vacuum evaporation method and container obtained through selenium plating process |
CN105970156B (en) * | 2016-04-18 | 2018-12-18 | 杭州诺麦科科技有限公司 | A kind of plating selenium technique, equipment and its gained container based on vacuum vapour deposition |
CN107462019A (en) * | 2017-09-25 | 2017-12-12 | 南京天煌机械有限公司 | One Room dual temperature vacuum drying chamber and furnace drying method |
CN109321917B (en) * | 2018-09-20 | 2021-03-23 | 泉州华大超硬工具科技有限公司 | Pre-brazing diamond surface metallization method |
CN109321917A (en) * | 2018-09-20 | 2019-02-12 | 泉州华大超硬工具科技有限公司 | A kind of pre-brazed Ways of Metallizing Cladding onto Diamond Surface |
CN111254394A (en) * | 2018-12-03 | 2020-06-09 | 江苏锋泰工具有限公司 | Surface metallization diamond composite particle |
CN109519489A (en) * | 2018-12-23 | 2019-03-26 | 王泰峰 | A kind of wear-resisting brake disc and its manufacturing method |
CN109750192A (en) * | 2019-03-08 | 2019-05-14 | 王泰峰 | A kind of no-spark super abrasive braking brake disk and preparation method thereof |
CN109750192B (en) * | 2019-03-08 | 2024-05-07 | 王泰峰 | Sparkless super wear-resistant brake disc and preparation method thereof |
CN111519143A (en) * | 2020-04-26 | 2020-08-11 | 昆明理工大学 | Method and device for vacuum evaporation galvanizing on surface of high-temperature-resistant particles |
CN111364007A (en) * | 2020-04-26 | 2020-07-03 | 昆明理工大学 | Method and device for vacuum evaporation of magnesium on surface of high-temperature-resistant particle |
CN111519143B (en) * | 2020-04-26 | 2021-09-28 | 昆明理工大学 | Method and device for vacuum evaporation galvanizing on surface of high-temperature-resistant particles |
CN111364007B (en) * | 2020-04-26 | 2021-09-28 | 昆明理工大学 | Method and device for vacuum evaporation of magnesium on surface of high-temperature-resistant particle |
CN111575654A (en) * | 2020-05-21 | 2020-08-25 | 南京航空航天大学 | Ultrasonic vibration assisted vacuum micro-evaporation plating equipment |
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