CN103420333A - Method and apparatus for drying nanometer pattern by using microwave - Google Patents
Method and apparatus for drying nanometer pattern by using microwave Download PDFInfo
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- CN103420333A CN103420333A CN2012101501624A CN201210150162A CN103420333A CN 103420333 A CN103420333 A CN 103420333A CN 2012101501624 A CN2012101501624 A CN 2012101501624A CN 201210150162 A CN201210150162 A CN 201210150162A CN 103420333 A CN103420333 A CN 103420333A
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Abstract
The present invention relates to the technical field of semiconductor drying processes, and discloses a method and an apparatus for drying a nanometer pattern by using microwave. The method comprises: cleaning a nanometer sample sheet requiring a treatment; and carrying out a drying treatment on the cleaned nanometer sample sheet by using microwave. The apparatus comprises a fluorescent lamp, a microwave generator, a microwave resonance cavity, a magnetron, a quartz cleaning box, a rotation table, a frequency converter, a rotation rod, a motor and a power supply. According to the present invention, the problem of structure collapsing during a drying process can be effectively solved.
Description
Technical field
The present invention relates to semiconductor drying technique field, particularly a kind of method and device thereof that utilizes the microwave drying nano graph.
Background technology
In the manufacture process of microelectronic component, along with characteristic size further reduce the further raising with the complex structure degree, subsiding of nano-device structure becomes day by day serious problem.Subsiding is exactly in dry run, and the surface tension of solution can pull to substrate to submissive structure, and after dry run completes, this structure and substrate be coherent phenomenon securely.Structural collapse is the one of the main reasons that causes component failure.Discharge other factors, dry run has just become very crucial step.Take the device of water after primary solvent cleans in traditional drying means, and the part that its mechanicalness structure is weak and the photoetching offset plate figure of high-aspect-ratio can be destroyed.
The dry difficult problem run in order to solve high density integrated circuit, a lot of experts and scholars have proposed different solutions, such as 1. critical-point drying method, utilize supercritical carbon dioxide to be cleaned device and dry; 2. freezing-sublimed method; 3. to the method for adding surfactant in water-based solvent etc.But, when dimension of picture reaches 32nm and following technology node, above method still inevitably can cause subsiding, lodge or destroying of nano graph.
Summary of the invention
Technical problem to be solved by this invention is to provide a kind of method of utilizing the microwave drying nano graph and device thereof made after the print drying without adhesion or lodging phenomenon.
For solving the problems of the technologies described above, the invention provides a kind of nano graph drying means, comprising: clean pending nanometer print;
By microwave, the nanometer print after cleaning being carried out to drying processes.
In order to realize utilizing the method for microwave drying nano graph, the present invention also provides a kind of microwave drier, comprising: fluorescent lamp, microwave generator, microwave resonance cavity, magnetron, quartzy cleaning box, turntable, frequency converter, bull stick, motor and power supply;
The part of described fluorescent lamp, magnetron, quartzy cleaning box, turntable and bull stick is encapsulated in microwave resonance cavity; It is external that another part of described bull stick and the motor be connected with this part are placed in microwave cavity;
Described fluorescent lamp is connected with power supply, and described microwave generator input is connected with power supply, and described microwave generator output is connected with magnetron, and the magnetron other end is connected with power supply;
Described quartzy cleaning box is fixed on turntable, and wherein motor is connected with turntable by bull stick;
Described frequency converter output is connected with described motor.
In such scheme, the preferred yellow fluorescence lamp of described fluorescent lamp.
In such scheme, described quartzy cleaning box is quartzy cleaning box with cover preferably; The part of described fluorescent lamp, magnetron, quartzy cleaning box, turntable, bull stick is encapsulated in microwave resonance cavity, and it is external that another part of bull stick and the motor be connected with this part are placed in microwave cavity; Described microwave generator is encapsulated in the control panel case.
For further prioritization scheme, also comprise the mica sheet baffle plate, wherein the mica sheet baffle plate is encapsulated in described microwave resonance cavity and is contained in described magnetron exit.
For further prioritization scheme, also comprise temperature control display, wherein temperature is controlled the outside that display is arranged on microwave resonance cavity.
For further prioritization scheme, also comprise timer, wherein timer one end is connected with described power supply, and described timer is encapsulated in the control panel case, and the Timer Controlling button is arranged on its panel.
For further prioritization scheme, also comprise frequency converter; Wherein frequency converter output is connected with described motor, and frequency converter is inputted except being connected with described power supply; Described frequency converter is encapsulated in the control panel case, and the control button of frequency converter is arranged on its panel.
Beneficial effect of the present invention is:
1. print to be dried is put into to quartzy cleaning box, utilize microelectronic processing technology to complete the cleaning in early stage in quartzy cleaning box, the solution that then utilizes the deionized water displacement to use in quartzy cleaning box.Can provide clean and dry device like this, reduced organic solvent a large amount of uses, protected environment, reduced the consumption to the energy.
2. cleaning box is fixed on turntable, operated motor, by frequency converter, regulate motor speed (can not allow liquid throw away), sets drying time, opens microwave generator, the problem of structural collapse in so effective solution dry run.
The accompanying drawing explanation
The nano graph drying device schematic diagram that Fig. 1 provides for the embodiment of the present invention.
Wherein, 1-temperature is controlled display, 2-light source, 3-microwave generator, 4-timer, 5-frequency converter, 6-magnetron, 7-mica sheet baffle plate, 8-turntable, 9-microwave resonance cavity, 10-quartzy cleaning box, 11-dry print, 12-control panel case, 13-bull stick, 14-motor.
The specific embodiment
As shown in Figure 1, the present invention is used for realizing that the device of drying technology process comprises: fluorescent lamp 2, microwave generator 3, magnetron 6, quartzy cleaning box 10, turntable 8, bull stick 13, motor 14 and power supply.Wherein, fluorescent lamp 2 is connected with power supply and is fixed on microwave resonance cavity 9 inside.Microwave generator 3 is connected with power supply and is fixed in control panel case 12.Microwave generator 3 outputs are connected with magnetron 6, and magnetron 6 other ends are connected with power supply.Quartzy cleaning box 10 can be fixed on turntable 8.Motor 14 is connected with turntable 8 by bull stick 13.Wherein, fluorescent lamp 2, preferably yellow fluorescence lamp.In the present embodiment, microwave generator 3 is used for producing high-frequency microwave.In the present embodiment, the introducing of motor, bull stick, turntable, be more evenly distributed electromagnetic field, also can better solve the problem of structural collapse in dry run, makes nanometer print to be dried evenly dry, improves drying efficiency, reduces energy resource consumption.
In the present embodiment, quartzy cleaning box 10, preferred quartzy cleaning box with cover, its effect is: 1, prevent dust and the pollutions such as particle that likely occur in follow-up dry run are dropped on print; 2, quartzy heatproof is high, there is no the alkali metal ion discharge; 3, can increase vapour pressure.The part of fluorescent lamp 2, magnetron 6, quartzy cleaning box 10, turntable 8 and bull stick 13 is encapsulated in microwave resonance cavity 9.Another part of bull stick 13 and the motor 14 be connected with this part are placed in outside microwave resonance cavity 9.Microwave generator 3 is encapsulated in control panel case 12.In the present embodiment, quartzy cleaning box 10 with cover is for filling print 11 to be dried, can avoid dust to fall in print surface or solution simultaneously.
The present embodiment also comprises mica sheet baffle plate 7, and wherein mica sheet baffle plate 7 is encapsulated in microwave resonance cavity 9 and is contained in magnetron 6 exits.Mica sheet baffle plate 7 can avoid liquid to be splashed on magnetron 6, prevents the magnetron shortening in 6 service lifes.
In order to control cavity temperature and to show, reach better drying effect, the present embodiment also comprises temperature control display 1, wherein temperature is controlled the outside that display 1 is arranged on microwave resonance cavity 9.
The present invention simultaneously, in order to control the heat drying time, reduces energy resource consumption, also comprises timer 4, and wherein timer 4 one ends are connected with power supply.Timer 4 is encapsulated in control panel case 12, and timer 4 control buttons are arranged on its panel.
In order not allow the interior liquid of quartzy cleaning box 11 throw away and to regulate motor 14 speed governing, also comprise frequency converter 5; Wherein frequency converter 5 outputs are connected with described motor 14, and frequency converter 5 inputs are except being connected with described power supply; Described frequency converter 5 is encapsulated in control panel case 12, and the control button of frequency converter 5 is arranged on its panel.
Drying technology process of the present invention comprises: pending nanometer print 11 is put into to quartz with cover and clean box 10, utilize microelectronic processing technology in quartzy cleaning box 10, complete the early stage cleaning (for example, can adopt RCA standard cleaning method), the solution that then utilizes the deionized water displacement to use in quartzy cleaning box.Then quartzy cleaning box 10 is fixed on mounting table 8, operated motor 14, regulate motor 14 rotating speeds and can not make deionized water in quartzy cleaning box 10 throw away by frequency converter 5, regulates timer 4, sets drying time, opens microwave generator 3.After to be dried completing, print is taken out.
Operation principle of the present invention is: heated medium generally can be divided into nonpolarity molecule dielectric and the polar molecule dielectric is arranged.Water belongs to polar molecule, and polar molecule does not show polarity when there is no extra electric field.If this medium is placed in extra electric field, each polar molecule can form ordered arrangement along the direction of electric field force, and can induce contrary electric charge at dielectric surface, and this process is called polarization.Extra electric field is stronger, and polarization is also stronger.When extra electric field changes direction, polar molecule also forms ordered arrangement with contrary direction thereupon.If additional is alternating electric field and magnetic field, polar molecule will be by remagnetization repeatedly, and the frequency of alternating electric field is higher, and the polarization that polar molecule turns to repeatedly is also just faster.Now, the kinetic energy of molecular thermalmotion increases, and namely heat increases, and the temperature of water also increases, and has just completed the conversion of electromagnetic energy to heat energy.Hydrone can well absorb the 2.45GHz electromagnetic wave, electromagnetic wave energy is converted into to the heat of self.Water absorbs heat, makes it from the liquid state vaporization that is rapidly heated, and avoids occurring gas-liquid interface, thereby completes the not damaged drying process.
Drying efficiency of the present invention is higher, and drying time is very short, less energy intensive.If clean and drying process method for microwave drying as semiconductor novel green of future generation, not only reduced organic solvent a large amount of uses, protected environment, reduced the consumption to the energy, and meet the development trend of ITRS.Therefore no matter from environmental issue or economic benefit, microwave drying has good development and application prospect, is expected to be used on the microelectronics machining production line.The dry run that the present invention simultaneously also can be in semiconductor 22 nanometer technologies and even 16 nanometer technologies provides a kind of prospective method.
It should be noted last that, the above specific embodiment is only unrestricted in order to technical scheme of the present invention to be described, although with reference to example, the present invention is had been described in detail, those of ordinary skill in the art is to be understood that, can modify or be equal to replacement technical scheme of the present invention, and not breaking away from the spirit and scope of technical solution of the present invention, it all should be encompassed in the middle of claim scope of the present invention.
Claims (8)
1. a method of utilizing the microwave drying nano graph, is characterized in that, comprising:
Clean pending nanometer print;
By microwave, the nanometer print after cleaning being carried out to drying processes.
2. realize that claim 1 utilizes the microwave drier of the method for microwave drying nano graph for one kind, it is characterized in that, comprising:
Fluorescent lamp, microwave generator, microwave resonance cavity, magnetron, quartzy cleaning box, turntable, frequency converter, bull stick, motor and power supply;
The part of described fluorescent lamp, magnetron, quartzy cleaning box, turntable and bull stick is encapsulated in microwave resonance cavity; It is external that another part of described bull stick and the motor be connected with this part are placed in microwave cavity;
Described fluorescent lamp is connected with power supply, and described microwave generator input is connected with power supply, and described microwave generator output is connected with magnetron, and the magnetron other end is connected with power supply;
Described quartzy cleaning box is fixed on turntable, and wherein motor is connected with turntable by bull stick;
Described frequency converter output is connected with described motor.
3. microwave drier as claimed in claim 2, is characterized in that, described fluorescent lamp is the yellow fluorescence lamp.
4. microwave drier as claimed in claim 2, is characterized in that, described quartzy cleaning box is quartzy cleaning box with cover; Described microwave generator is encapsulated in the control panel case.
5. microwave drier as claimed in claim 4, is characterized in that, also comprises timer, and wherein timer one end is connected with described power supply, and described timer is encapsulated in the control panel case.
6. as the described microwave drier of claim 2-5 any one, it is characterized in that, also comprise the mica sheet baffle plate, wherein the mica sheet baffle plate is encapsulated in described microwave resonance cavity and is contained in described magnetron exit.
7. as the described microwave drier of claim 2-5 any one, it is characterized in that, also comprise temperature control display, wherein temperature is controlled the outside that display is arranged on microwave resonance cavity.
8. as the described microwave drier of claim 2-5 any one, it is characterized in that, also comprise frequency converter; Wherein frequency converter output is connected with described motor.
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| Application Number | Priority Date | Filing Date | Title |
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| CN2012101501624A CN103420333A (en) | 2012-05-15 | 2012-05-15 | Method and apparatus for drying nanometer pattern by using microwave |
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| CN2012101501624A CN103420333A (en) | 2012-05-15 | 2012-05-15 | Method and apparatus for drying nanometer pattern by using microwave |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106288681A (en) * | 2016-07-29 | 2017-01-04 | 无锡市三峰仪器设备有限公司 | A kind of air blast microwave drying oven |
| CN111276422A (en) * | 2018-12-04 | 2020-06-12 | 南亚科技股份有限公司 | Semiconductor wafer drying apparatus and method |
| CN111383946A (en) * | 2018-12-29 | 2020-07-07 | 中国科学院微电子研究所 | Nano-pattern rapid curing device |
| CN111578648A (en) * | 2019-02-19 | 2020-08-25 | 江苏食品药品职业技术学院 | Microwave heating type vacuum freeze dryer with multiple oscillation modes |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0831725A (en) * | 1994-07-15 | 1996-02-02 | Matsushita Electric Ind Co Ltd | Method of drying photoresist |
| JP2002327983A (en) * | 2001-05-01 | 2002-11-15 | Anzai Setsu | Microwave drying apparatus |
| KR20050110420A (en) * | 2004-05-19 | 2005-11-23 | 동부아남반도체 주식회사 | Dry device for semiconductor wafer and method thereof |
| CN101517708A (en) * | 2005-11-09 | 2009-08-26 | 东京毅力科创株式会社 | Multi-step system and method for curing a dielectric film |
| CN101837951A (en) * | 2010-05-24 | 2010-09-22 | 山东大学 | Apparatus and method for graphically producing nano structures by way of electrode induction and microwave curing |
| CN102384638A (en) * | 2011-11-14 | 2012-03-21 | 江苏环能通环保科技有限公司 | Drying box of lithium battery cathode material |
-
2012
- 2012-05-15 CN CN2012101501624A patent/CN103420333A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0831725A (en) * | 1994-07-15 | 1996-02-02 | Matsushita Electric Ind Co Ltd | Method of drying photoresist |
| JP2002327983A (en) * | 2001-05-01 | 2002-11-15 | Anzai Setsu | Microwave drying apparatus |
| KR20050110420A (en) * | 2004-05-19 | 2005-11-23 | 동부아남반도체 주식회사 | Dry device for semiconductor wafer and method thereof |
| CN101517708A (en) * | 2005-11-09 | 2009-08-26 | 东京毅力科创株式会社 | Multi-step system and method for curing a dielectric film |
| CN101837951A (en) * | 2010-05-24 | 2010-09-22 | 山东大学 | Apparatus and method for graphically producing nano structures by way of electrode induction and microwave curing |
| CN102384638A (en) * | 2011-11-14 | 2012-03-21 | 江苏环能通环保科技有限公司 | Drying box of lithium battery cathode material |
Non-Patent Citations (1)
| Title |
|---|
| 吴疆等: "《看图学修微波炉》", 31 August 2001, 人民邮电出版社出版发行 * |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106288681A (en) * | 2016-07-29 | 2017-01-04 | 无锡市三峰仪器设备有限公司 | A kind of air blast microwave drying oven |
| CN111276422A (en) * | 2018-12-04 | 2020-06-12 | 南亚科技股份有限公司 | Semiconductor wafer drying apparatus and method |
| CN111383946A (en) * | 2018-12-29 | 2020-07-07 | 中国科学院微电子研究所 | Nano-pattern rapid curing device |
| CN111578648A (en) * | 2019-02-19 | 2020-08-25 | 江苏食品药品职业技术学院 | Microwave heating type vacuum freeze dryer with multiple oscillation modes |
| CN111578648B (en) * | 2019-02-19 | 2022-12-23 | 江苏食品药品职业技术学院 | Microwave heating type vacuum freeze dryer with multiple oscillation modes |
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Application publication date: 20131204 |