CN103345330B - Optical filter box and touch display screen using optical filter box - Google Patents
Optical filter box and touch display screen using optical filter box Download PDFInfo
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- CN103345330B CN103345330B CN201310282612.XA CN201310282612A CN103345330B CN 103345330 B CN103345330 B CN 103345330B CN 201310282612 A CN201310282612 A CN 201310282612A CN 103345330 B CN103345330 B CN 103345330B
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Abstract
An optical filter box comprises a substrate, a filtering layer, a first imprinting glue layer, a first conducting layer and a second conducting layer. The filtering layer is directly formed on a first surface of the substrate, the second conducting layer is directly formed on a second surface, and the wire width of conducting wires of the first conducting layer and conducting wires of the second conducting layer is 0.2-5micrometers. According to the optical filter box, the first conducting layer and the second conducting layer form a sensing structure, and therefore the optical filter box can achieve touch operation and filtering, is beneficial to reducing the thickness of electronic equipment, and saves materials and assembly cost. The first conducting layer is formed in a imprinting mode, and the second conducting layer is directly formed on the second surface by utilizing good bonding performance of the substrate. Meanwhile, the first conducting layer and the second conducting layer are visually transparent, and the conducting wires can be aligned to or not aligned to a shading portion. The invention further provides a touch display screen using the optical filter box.
Description
Technical field
The present invention relates to flat panel display technology field, more particularly to a kind of optical filter box and use this optical filter box
Touch display screen.
Background technology
Touch-screen is the inductive arrangement that can receive the input signals such as touch.Touch-screen imparts the brand-new face of information exchange
Looks, are extremely attractive brand-new information exchange equipment.The development of touch screen technology causes the general of domestic external information medium circle
All over concern, it has also become the Chaoyang new high-tech industry that photovoltaic industry is a dark horse.
At present, the electronic product with touch display function all includes display screen and the touch-screen being located on display screen.So
And, touch-screen, as the assembly with display screen independence, when realizing the electronic product of man-machine interaction for some, is required to basis
The size of display screen is ordered, and is assembled afterwards again, and to form touch display screen, touch display screen can have simultaneously can be touched
Control operation and display function.Existing touch-screen mainly has two ways with the assembling of display screen, i.e. frame patch and full laminating.Frame pastes
It is that touch-screen is fitted with the edge of display screen, full laminating is to paste whole for the upper surface of the lower surface of touch-screen and display screen face
Close.
Display screen mainly includes polaroid, optical filter box, Liquid Crystal Module and thin film transistor (TFT) (TFT, Thin Film
Transistor), therefore, display screen itself has had larger thickness, and when continuing the laminating touch-screen toward on display screen, will
Increase its thickness further, furthermore, how one attaching process, it is meant that increased the bad probability of product, greatly increases product
The production cost of product.
Content of the invention
Based on this it is necessary to for the larger and relatively costly problem of thickness, provide one kind to advantageously reduce electronic product
The optical filter box of thickness and production cost and the touch display screen using this optical filter box.
A kind of optical filter box, including：
Substrate, including first surface and second surface, described first surface and second surface are oppositely arranged；
Filter layer, is arranged at described first surface, and including light shielding part and multiple filter unit, described light shielding part is in grid
Shape, including cross one another gridline, forms some grid cells by the space that described gridline is split, filter unit houses
In grid cell, the plurality of filter unit forms optical filtering portion；
First impressing glue-line, is arranged at the side away from described first surface for the described filter layer, described first impressing glue-line
Offer the first groove；
First conductive layer, is embedded at described first impressing glue-line, including multiple spaced first conductive patterns, described
First conductive pattern includes the first conductive grid, and described first conductive grid is intersected to form by the first conductive thread, and first is conductive
Silk thread intersects to form grid node, and described first conductive thread is solidify to form by the conductive material being filled in described first groove；
Second conductive layer, is arranged at described second surface, including multiple spaced second conductive patterns, described second
Conductive pattern includes the second conductive grid, and described second conductive grid is intersected to form by the second conductive thread, the second conductive thread
Intersect to form grid node；
Wherein, the live width of described first conductive thread and the second conductive thread is 0.2 μm～5 μm.
Wherein in an embodiment, in the first conductive layer, the distance of two neighboring described grid node is 50 μm～800 μ
M, in the second conductive layer, the distance of two neighboring described grid node is 50～800 μm.
Wherein in an embodiment, in described first conductive grid and the second conductive grid, at least one is Stochastic Networks
Lattice.
Wherein in an embodiment, in described first conductive layer, the interval width of two neighboring first conductive pattern is
0.5 μm～50 μm, in described second conductive layer, the interval width of two neighboring second conductive pattern is 0.5 μm～50 μm.
Wherein in an embodiment, in described first conductive thread and the second conductive thread, at least one is in described optical filtering
The projection of layer all falls within described gridline.
Wherein in an embodiment, the thickness in described optical filtering portion is not less than the thickness of described light shielding part.
Wherein in an embodiment, described light shielding part is that the photoresist with black dyes imprints glue-line described first
The lattice-shaped structure being formed.
Wherein in an embodiment, each described first conductive grid and described second conductive grid are in described filter layer
On projection accommodate at least one filter unit.
Wherein in an embodiment, each described first conductive grid of described first conductive layer is on described filter layer
Each described second conductive grid of filter unit number and described second conductive layer that accommodates of projection on described filter layer
The filter unit number that projection accommodates differs.
A kind of touch display screen, including the TFT electrode, Liquid Crystal Module, optical filter box and the polaroid that stack gradually, described
Optical filter box is above-described optical filter box.
Above-mentioned optical filter box and the touch display screen using this optical filter box, optical filter box can realize touch-control simultaneously
Operation and filtering functions, as the combination of two assemblies indispensable in display screen, for, when in display screen, can directly make to show
Display screen has touch controllable function, need not assemble a touch-screen more on a display screen, not only contributes to reduce the thickness of electronic product, with
When also greatly save material and assembly cost.
Brief description
Fig. 1 is the structural representation of the touch display screen of an embodiment；
Fig. 2 is the structural representation of the optical filter box of an embodiment；
Fig. 3 is the structural representation of the optical filter box of another embodiment；
Fig. 4 is the structural representation of the optical filter box of another embodiment；
Fig. 5 is the structural representation of the optical filter box of a further embodiment；
Fig. 6 is the structural representation at another visual angle of optical filter box shown in Fig. 5；
Fig. 7 is that in optical filter box, conductive thread all falls within the multiple of conductive layer of gridline and leads in the projection of filter layer
The interval schematic diagram of electrical pattern；
Fig. 8 be optical filter box in conductive thread filter layer projection do not fall within gridline conductive layer multiple conductions
The interval schematic diagram of pattern；
Fig. 9 projects to the structural representation of an embodiment of filter layer for the conductive thread of conductive layer shown in Fig. 7；
Figure 10 projects to the structural representation of an embodiment of filter layer for the conductive thread of conductive layer shown in Fig. 8；
Figure 11 projects to the structural representation of another embodiment of filter layer for the conductive thread of conductive layer shown in Fig. 7；
Figure 12 projects to the structural representation of the another embodiment of filter layer for the conductive thread of conductive layer shown in Fig. 7；
Figure 13 projects to the structural representation of a further embodiment of filter layer for the conductive thread of conductive layer shown in Fig. 7；
Figure 14 projects to the structural representation of the another embodiment of filter layer for the conductive thread of conductive layer shown in Fig. 8；
Figure 15 projects to the structural representation of the another embodiment of filter layer for the conductive thread of conductive layer shown in Fig. 8；
Figure 16 projects to the structural representation of a further embodiment of filter layer for the conductive thread of conductive layer shown in Fig. 8.
Specific embodiment
Understandable for enabling the above objects, features and advantages of the present invention to become apparent from, below in conjunction with the accompanying drawings to the present invention
Specific embodiment be described in detail.Elaborate a lot of details in order to fully understand this in the following description
Bright.But the present invention can be much to implement different from alternate manner described here, and those skilled in the art can be not
Similar improvement is done, therefore the present invention is not embodied as being limited by following public in the case of running counter to intension of the present invention.
It should be noted that when element is referred to as " being fixed on " another element, it can be directly on another element
Or can also there is element placed in the middle.When an element is considered as " connection " another element, it can be directly connected to
To another element or may be simultaneously present centering elements.
Unless otherwise defined, all of technology used herein and scientific terminology and the technical field belonging to the present invention
The implication that technical staff is generally understood that is identical.The term being used in the description of the invention herein is intended merely to description tool
The purpose of the embodiment of body is it is not intended that in limiting the present invention.Term as used herein " and/or " include one or more phases
The arbitrary and all of combination of the Listed Items closing.
Refer to Fig. 1, be the touch display screen 100 of an embodiment, including the down polaroid 10 stacking gradually, TFT electricity
Pole 20, Liquid Crystal Module 30, public electrode 40, diaphragm 50, optical filter box 200 and upper polaroid 60.In other embodiments
In, diaphragm 50 need not be set and also may be used.
TFT electrode 20 includes glass-base 24 and the show electrode 22 being arranged on glass-base 24.Liquid Crystal Module includes
Liquid crystal 32 and the alignment film 34 being held on liquid crystal 32 both sides.
It is appreciated that when backlight being used as polarized light source, such as OLED polarized light source, without down polaroid 10, only
Need upper polaroid 60.The down polaroid 10 of the present embodiment, TFT electrode 20, Liquid Crystal Module 30, public electrode 40, protection
Film 50, the structure of upper polaroid 60 and function can be identical with existing product, will not be described here.
Optical filter box 200 have simultaneously can touch control operation and can filtering functions, make touch display screen 100 have touch-control show
Show function.Touch display screen can be the LCDs of straight-down negative or side entering type light source.
Refer to Fig. 2 to Fig. 5, expression is 200 4 different embodiments of optical filter box.In aforementioned four embodiment
Optical filter box 200 all include substrate 210, filter layer 220, first impressing glue-line 230, the first conductive layer 240 and second are led
Electric layer 260.Wherein substrate 210 includes first surface 212 and second surface 214, and first surface 212 is relative with second surface 214
Setting.Substrate 210 is the material of transparent insulation, and such as glass, can be specifically sillico aluminate glass and calcium soda-lime glass, through etc.
After ion processing, surface has good cohesive force.General, the thickness range of substrate 210 can be 0.1mm～0.5mm.
Filter layer 220 is arranged at first surface 212, including light shielding part 222 and multiple filter unit.Light shielding part 222 is in grid
Trellis, including some cross one another gridlines.Some grid cells are formed by the space that gridline is split, filter unit is received
It is dissolved in grid cell.Can a filter unit be contained in a grid cell it is also possible to a filter unit is contained in multiple grid
In lattice unit, multiple filter units form optical filtering portion 224.General, the thickness range in light shielding part 222 and optical filtering portion 224 is 0.5
μm～2 μm.
First impressing glue-line 230 is arranged at the side away from first surface 212 for the filter layer 220, and the first impressing glue-line 230
Side away from first surface 212 offers the first groove 232.First groove 232 is the groove of mesh shape, and mesh shape can
To be preset to required figure as needed.First conductive layer 240 is embedded at the first impressing glue-line 230, conductive including multiple first
Pattern 242, is provided with interval between multiple first conductive patterns 242, so that multiple first conductive pattern 242 mutually insulated.First leads
Electrical pattern 242 includes the first conductive grid, and the first conductive grid is intersected to form by the first conductive thread 2422, the first conductive thread
2422 intersect to form grid node, and described first conductive thread 2422 is contained in described first groove 232.First conductive thread
2422 are solidify to form by the conductive material being filled in the first groove 232.Conductive material include metal, CNT, Graphene,
At least one in organic conductive macromolecule and ITO.In other examples, the first impressing glue-line 230 can also lean on
The side of nearly first surface 212 opens up the first groove 232.
Second conductive layer 260 is arranged at second surface 214, including multiple second conductive patterns 262.Multiple second conductive patterns
It is provided with interval between case 262, so that multiple second conductive pattern 262 mutually insulated.Second conductive pattern 262 includes the second conductive mesh
Lattice, the second conductive grid is intersected to form by the second conductive thread 2622, the second conductive thread 2622 of the second conductive pattern 262 with
The material of the first conductive thread 2422 of the first conductive pattern 242 is identical.Second conductive thread 2622 intersects to form grid node.
Second conductive thread 2622 is formed directly into substrate second surface 214 by way of metal coating or electrocondution slurry coating.?
In other embodiments, the material of the first conductive thread 2422 of the first conductive layer 240 can also be with the of the second conductive layer 260
The material of two conductive threads 2622 is different.
Wherein, the live width of the first conductive thread 2422 and the second conductive thread 2622 is 0.2 μm～5 μm, so that first leads
Electric layer 240 and the second conductive layer 260 reach visually-clear, and that is, naked eyes are invisible.As shown in Fig. 2 represent is the first conductive mesh
Lattice and the second conductive grid are random grid, to reduce the manufacture difficulty of conductive thread and to avoid producing Moire fringe.As
Shown in Fig. 3, expression is that the first conductive thread 2422 of the first conductive layer 240 all falls within grid in the projection of filter layer 220
On line, the second conductive grid of the second conductive layer 260 is random grid.In other examples, can also the first conductive layer
240 the first conductive grid is random grid, and the second conductive thread 2622 of the second conductive layer 260 is in the projection of filter layer 220
All fall within gridline, be conducive to the optimization of cost of manufacture.As shown in Figure 4 and Figure 5, expression is the first conductive thread 2422
All all fall within gridline in the projection of filter layer 220 with the second conductive thread 2622, to reduce the first conductive thread 2422
It is exposed to the lateral risk of gridline with the second conductive thread 2622.
Above-mentioned optical filter box 200, the first conductive layer 240 and the second conductive layer 260 interval setting constitute capacitive sensing knot
Structure, makes optical filter box 200 can realize touch control operation and filtering functions simultaneously, and need not carry out design of putting up a bridge, and reduces operation
Difficulty.When above-mentioned optical filter box 200 is applied to display screen, display screen can be directly made to have touch controllable function, need not be again aobvious
Display screen over-assemble one touch-screen, not only contributes to reduce the thickness of electronic product, also greatlys save material and assembly cost.The
One conductive thread 2322 is imprinted with-filling mode acquisition, the selectable expanded range of conductive material, the second conductive thread 2622
It is formed directly into substrate second surface 214 by way of metal coating or electrocondution slurry coating, make use of substrate 210 to have relatively
Good adhesive property, thus eliminating coating one lamination print glue-line, further reduces the thickness of optical filter box.When first leads
The live width of electrical filament line 2422 and the second conductive thread 2622 is 0.2 μm～5 μm, can reach the effect of visually-clear.Thus not
Pipe the first conductive thread 2422 and the second conductive thread 2622 fall within or do not fall within gridline in the projection of filter layer 220,
It is attained by visually-clear.
In one embodiment, the distance range of the two neighboring grid node of the first conductive layer 240 can for 50 μm～
800μm.The distance range of the two neighboring grid node of the second conductive layer 260 can be 50 μm～800 μm.When grid node
When distance is bigger, the density of conductive grid is less, and now light permeable rate is big, and cost also can be low, but resistance can be larger.Work as grid
The distance of node gets over hour, and the density of conductive grid is bigger, and resistance is less, but transmitance reduces, the consumption of conductive material simultaneously
Amount is also bigger, so that cost is higher.Therefore considering cost, light transmittance and resistance factors, grid node spacing is typically arranged
For 50 μm～800 μm.
Refer to Fig. 5 and Fig. 6, specific in the present embodiment, optical filtering portion 224 includes chromatic photoresist, formed in grid cell
Chromatic colour photoresistance, chromatic photoresist forms filter unit.Can the corresponding grid cell of a chromatic photoresist it is also possible to a chromatic photoresist
Corresponding multiple grid cells.Chromatic photoresist is that the photoresist with coloured dye is formed, and can adopt exposure-development processing procedure.Color
Coloured light resistance is generally red（Red, R）Photoresistance, green（Green, G）Photoresistance or indigo plant（Blue, B）Photoresistance, is used for making incident light be transformed into
Monochromatic light, realizes filtering functions.Light shielding part 222 is that the photoresist with black dyes is formed at the first impressing glue-line 230, and hides
Light portion 222 is in lattice-shaped, has opaqueness, can adopt exposure-development processing procedure.In lattice-shaped, grid cell is square, makes
Must filter portion 224 photoresistance arrangement more compact and uniform.Light shielding part 222 can be prevented effectively from chromatic photoresist colour contamination each other, and
The contrast of R, G, B light can be increased.
Specific in the present embodiment, the material of the first impressing glue-line 230 is solvent-free ultra-violet curing acryl resin, thickness
For 2～10 μm.First impressing glue-line 230 is transparence, does not affect overall transmitance.In other embodiments, the first pressure
The material of print glue-line 230 can also be On Visible Light Cured Resin or heat reactive resin.
The above-mentioned optical filter box with touch controllable function, specifically manufacturing process is as follows：
（1）Carry out plasma in the first surface 212 of substrate 210 and second surface 214 first（Plasma）Process.To remove
Go the first surface 212 of substrate 210 and the dirty of second surface 214, and so that first surface 212 and second surface 214 is ionized,
Increase follow-up and other materials cohesive forces.
（2）In the second surface 214 whole face metal cladding of substrate 210 or apply layer of metal conductive ink, to form the
Two conductive layers 260.In the present embodiment, the metal adopting in metallic conduction ink is argent.In other examples, also may be used
With using as at least one in the metal such as gold, copper, aluminium, zinc, tin, molybdenum.
（3）It is coated with one layer of photoresist on the surface of the second conductive layer 260, through exposure-development technology, only retain and be covered in
The photoresist of the second conductive pattern 262 part, the photoresist of other parts is removed.
（4）Using metal etch liquid, the second conductive layer 260 is etched, obtains the second conductive pattern portion of desirable pattern
The second conductive thread dividing, intersects to form the second conductive grid by the second conductive thread.
（5）In the whole face of first surface 212 of substrate 210, one layer of photoresist carrying black dyes is set.
（6）Using exposure-development technology, the photoresist in filter unit region is removed, form the light shielding part of lattice-shaped
222.Light shielding part 222 includes cross one another gridline, forms some grid cells by the space that gridline is split.
（7）In grid cell, R/G/B chromatic photoresist is set by several times, forms optical filtering portion 224.
（8）In filter layer 220 away from the side coating impressing glue of first surface 212, form the first impressing glue-line 230.This
Embodiment adopts solvent-free ultra-violet curing acryl resin.And with the impression block nested with the first conductive pattern 242 first
Impressing glue-line 230 surface is imprinted and is solidified, and obtains required the first groove 232 mating with the first conductive pattern 242.
（9）Fill conductive material into the first groove 232 mating with the first conductive pattern 242 simultaneously and solidify, obtain
First conductive layer 240.Conductive material is included in metal, CNT, Graphene, organic conductive macromolecule and ITO at least
One kind, forms and intersects, by conductive thread, the conductive grid constituting.It is preferably metal, such as nanometer silver paste.When from metal, can drop
Low resistance and the energy consumption reducing touch display screen.The live width scope of the first conductive thread 2422 and the second conductive thread 2622 is
0.2 μm～5 μm.
If being not particularly illustrated is the first conductive thread or the second conductive thread, conductive thread herein may refer to first
Conductive thread and/or the second conductive thread.Conductive grid may refer to the first conductive grid and/or the second conductive grid.Conductive
Pattern may refer to the first conductive pattern and/or the second conductive pattern.
As shown in Figure 2 and Figure 8, when conductive thread does not fall within gridline in the projection of filter layer 220, described first leads
In electric layer 240, the interval width of two neighboring first conductive pattern 242 is 0.5 μm～50 μm, phase in described second conductive layer 260
The interval width of adjacent two the second conductive patterns 262 is 0.5 μm～50 μm.Now can be by conductive thread marginal portion be lacked
Separated.
As shown in figure 5 and figure 7, when the first conductive thread 2422 and the second conductive thread 2622 are in the projection of filter layer 220
When all falling within gridline, in the first conductive layer 240, the interval width of two neighboring first conductive pattern 242 can be one
The width of filter unit, in the second conductive layer 260, the interval width of two neighboring second conductive pattern 262 can be single for an optical filtering
The width of unit.Now can be separated by full line or permutation conductive thread disappearance.Certainly, when conductive thread is in filter layer
Projection when all falling within gridline, the interval width of two neighboring conductive pattern can also be 0.5 μm～50 μm, can pass through
Conductive thread marginal portion disappearance is separated.
As shown in Fig. 3, Fig. 7 and Fig. 8, when the first conductive thread of the first conductive layer 240 does not fall in the projection of filter layer 220
On gridline, the second conductive thread 2622 of the second conductive layer 260 all falls within gridline in the projection of filter layer 220
When, in the first conductive layer 240, the interval width of two neighboring first conductive pattern 242 may range from 0.5 μm～50 μm, and second
The interval width of two neighboring second conductive pattern 262 of conductive layer 260 may range from the width of a filter unit.Certainly,
In other examples, can also the first conductive thread 2422 of the first conductive layer 240 all fall in the projection of filter layer 220
On gridline, the second conductive thread of the second conductive layer 260 does not fall within gridline in the projection of filter layer 220, and now
The interval width of two neighboring first conductive pattern 242 of one conductive layer 240 is the width of a filter unit, the second conductive layer
In 260, the interval width of two neighboring second conductive pattern 262 is 0.5 μm～50 μm.
Specific in the present embodiment, the thickness in optical filtering portion 224 is not less than the thickness of light shielding part 222.Refer to Fig. 5 and Fig. 6,
Represent is the thickness more than gridline for the thickness of filter unit.When the thickness in optical filtering portion 224 is more than the thickness of light shielding part 222
When, the light appearing from optical filtering portion 224, not only can see from front, from side it can be seen that, such that it is able to increase optical filtering portion
224 light emission rate.Certainly, as shown in figure 4, the thickness in optical filtering portion 224 can also be equal to the thickness of gridline.
Refer to Fig. 6, specific in the present embodiment, the first conductive thread 2422 and the second conductive thread 2622 be straight line,
Curve or broken line.When first conductive thread 2422 and the second conductive thread 2622 can be different shape, reduce production requirement.
As shown in Figure 9 and Figure 10, what Figure 10 represented is when conductive thread does not fall within gridline in the projection of filter layer 220
When, the projection on described filter layer 220 of each described conductive grid of the first conductive layer 240 and/or the second conductive layer 260 is held
Receive the filter unit having.What Fig. 9 represented is when conductive thread all falls within gridline in the projection of filter layer 220,
Projection on described filter layer 220 for each described conductive grid of the first conductive layer 240 and/or described second conductive layer 260
Accommodate the filter unit of.Because each grid cell is to should have a conductive grid, so the density of conductive grid
Larger, electric conductivity is preferable.
As shown in Figure 11 to Figure 13, expression is when the first conductive thread 2422 and the second conductive thread 2622 are in filter layer
When 220 projection all falls within gridline, each described conduction of the first conductive layer 240 and/or described second conductive layer 260
Projection on described filter layer 220 for the grid accommodates at least two filter unit, can be according to will to the resistance of conductive layer
Ask and conductive material coating weight requirement come to determine accommodate filter unit quantity.Three kinds of situations now can be divided into, with horizontal
For X-axis, the direction of vertical transverse is Y-axis.As shown in figure 11, only in the X-axis direction, the first conductive grid and the second conductive grid
Projection on filter layer 220 accommodates at least two filter units.As shown in figure 12, only in the Y-axis direction, the first conductive grid
Accommodate at least two filter units with projection on filter layer 220 for second conductive grid.As shown in figure 13, simultaneously in X-axis and Y
On direction of principal axis, the projection on filter layer 220 of the first conductive grid and the second conductive grid accommodates at least two filter units.
As shown in Figure 14 to Figure 16, expression is when conductive thread does not fall within gridline in the projection of filter layer 220,
Projection on described filter layer 220 for each described conductive grid of the first conductive layer 240 and/or described second conductive layer 260
Accommodate at least two filter unit.Now also can be divided into three kinds of situations, with laterally as X-axis, the direction of vertical transverse is Y
Axle.As shown in figure 14, only in the X-axis direction, the first conductive grid and the second conductive grid projection on filter layer 220 accommodates
At least two integer filter units.As shown in figure 15, only in the Y-axis direction, the first conductive grid and the second conductive grid exist
Projection on filter layer 220 accommodates at least two integer filter units.As shown in figure 16, simultaneously in X-axis and Y direction,
The projection on filter layer 220 of first conductive grid and the second conductive grid accommodates at least two integer filter units.
Specific in the present embodiment, the projection on filter layer 220 of every one first conductive grid of the first conductive layer 240 is held
The filter unit that the projection on filter layer of the filter unit number received and every one second conductive grid of the second conductive layer 260 accommodates
Number can differ.Manufacture difficulty can effectively be reduced.Certainly, in other examples, every the 1 of the first conductive layer 240
Filter unit number and every one second conductive mesh of the second conductive layer 260 that projection on filter layer 220 for one conductive grid accommodates
The filter unit number that projection on filter layer for the lattice accommodates can also be identical.
Embodiment described above only have expressed the several embodiments of the present invention, and its description is more concrete and detailed, but simultaneously
Therefore the restriction to the scope of the claims of the present invention can not be interpreted as.It should be pointed out that for those of ordinary skill in the art
For, without departing from the inventive concept of the premise, some deformation can also be made and improve, these broadly fall into the guarantor of the present invention
Shield scope.Therefore, the protection domain of patent of the present invention should be defined by claims.
Claims (9)
1. a kind of optical filter box is it is characterised in that include：
Substrate, including first surface and second surface, described first surface and second surface are oppositely arranged；
Filter layer, is arranged at described first surface, and including light shielding part and multiple filter unit, described light shielding part is in lattice-shaped, bag
Include cross one another gridline, some grid cells are formed by the space that described gridline is split, filter unit is contained in grid
In lattice unit, the plurality of filter unit forms optical filtering portion；
First impressing glue-line, is arranged at the side away from described first surface for the described filter layer, and described first impressing glue-line opens up
There is the first groove；
First conductive layer, is embedded at described first impressing glue-line, including multiple spaced first conductive patterns, described first
Conductive pattern includes the first conductive grid, and described first conductive grid is intersected to form by the first conductive thread, the first conductive thread
Intersect to form grid node, described first conductive thread is formed by the conductive material being filled in described first groove；
Second conductive layer, is attached directly to described second surface, including multiple spaced second conductive patterns, described second
Conductive pattern includes the second conductive grid, and described second conductive grid is intersected to form by the second conductive thread, the second conductive thread
Intersect to form grid node；
Wherein, the live width of described first conductive thread and the second conductive thread is 0.2 μm～5 μm；
The filter unit number that projection on described filter layer for each described first conductive grid of described first conductive layer accommodates
The filter unit number accommodating with the projection on described filter layer of each described second conductive grid of described second conductive layer is not
Identical.
2. optical filter box according to claim 1 is it is characterised in that two neighboring described grid section in the first conductive layer
The distance of point is 50 μm～800 μm, and in the second conductive layer, the distance of two neighboring described grid node is 50 μm～800 μm.
3. optical filter box according to claim 1 is it is characterised in that described first conductive grid and the second conductive grid
In at least one be random grid.
4. optical filter box according to claim 1 is it is characterised in that two neighboring first lead in described first conductive layer
The interval width of electrical pattern is 0.5 μm～50 μm, the interval width of two neighboring second conductive pattern in described second conductive layer
For 0.5 μm～50 μm.
5. optical filter box according to claim 1 is it is characterised in that described first conductive thread and the second conductive thread
In at least one all falls within described gridline in the projection of described filter layer.
6. optical filter box according to claim 1 is it is characterised in that the thickness in described optical filtering portion is not less than described shading
The thickness in portion.
7. optical filter box according to claim 1 is it is characterised in that described light shielding part is the photoetching with black dyes
The lattice-shaped structure that glue is formed in the described first impressing glue-line.
8. optical filter box according to claim 1 is it is characterised in that each described first conductive grid and described second
Projection on described filter layer for the conductive grid accommodates at least one filter unit.
9. a kind of touch display screen it is characterised in that include stacks gradually TFT electrode, Liquid Crystal Module, optical filter box and partially
Mating plate, described optical filter box is optical filter box as claimed in any of claims 1 to 8 in one of claims.
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| CN201310282612.XA CN103345330B (en) | 2013-07-05 | 2013-07-05 | Optical filter box and touch display screen using optical filter box |
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| CN201310282612.XA CN103345330B (en) | 2013-07-05 | 2013-07-05 | Optical filter box and touch display screen using optical filter box |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| US20110285640A1 (en) * | 2010-05-21 | 2011-11-24 | Park Young-Bae | Electric field shielding for in-cell touch type thin-film-transistor liquid crystal displays |
| CN103135292A (en) * | 2011-11-30 | 2013-06-05 | 乐金显示有限公司 | Liquid crystal display device having touch screen |
| CN103164100A (en) * | 2013-03-28 | 2013-06-19 | 南昌欧菲光科技有限公司 | Capacitive touch screen |
| CN203338316U (en) * | 2013-07-05 | 2013-12-11 | 南昌欧菲光显示技术有限公司 | Optical filter assembly and touch displaying screen with optical filter assembly |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103106953B (en) * | 2013-02-06 | 2014-11-26 | 南昌欧菲光科技有限公司 | Conducting film and preparation method thereof and touch screen comprising the same |
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20110285640A1 (en) * | 2010-05-21 | 2011-11-24 | Park Young-Bae | Electric field shielding for in-cell touch type thin-film-transistor liquid crystal displays |
| CN103135292A (en) * | 2011-11-30 | 2013-06-05 | 乐金显示有限公司 | Liquid crystal display device having touch screen |
| CN103164100A (en) * | 2013-03-28 | 2013-06-19 | 南昌欧菲光科技有限公司 | Capacitive touch screen |
| CN203338316U (en) * | 2013-07-05 | 2013-12-11 | 南昌欧菲光显示技术有限公司 | Optical filter assembly and touch displaying screen with optical filter assembly |
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| CN103345330A (en) | 2013-10-09 |
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Effective date of registration: 20170630 Address after: 330000 Jiangxi city of Nanchang Province Economic and Technological Development Zone HUANGJIAHU Road Patentee after: Nanchang OFilm Tech. Co.,Ltd. Address before: North to the East, 330013 in Jiangxi province Nanchang city Nanchang economic and technological development zones clove road Longtan ditch Co-patentee before: Shenzhen OFilm Tech Co.,Ltd. Patentee before: Nanchang Ofilm Display Tech Co.,Ltd. Co-patentee before: Suzhou OFilm Tech. Co.,Ltd. |
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