CN103336382B - Polarisation-filtration module and use the touch display screen of this polarisation-filtration module - Google Patents

Polarisation-filtration module and use the touch display screen of this polarisation-filtration module Download PDF

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Publication number
CN103336382B
CN103336382B CN201310282456.7A CN201310282456A CN103336382B CN 103336382 B CN103336382 B CN 103336382B CN 201310282456 A CN201310282456 A CN 201310282456A CN 103336382 B CN103336382 B CN 103336382B
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conductive
polarisation
conductive layer
filtration module
grid
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CN103336382A (en
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唐根初
刘伟
董绳财
唐彬
何世磊
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Anhui Jingzhuo Optical Display Technology Co Ltd
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Nanchang Ofilm Display Tech Co ltd
Suzhou OFilm Tech Co Ltd
Shenzhen OFilm Tech Co Ltd
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Abstract

A kind of polarisation filtration module, including filtering assembly and polarization elements;Filtering assembly includes transparent substrates, the first conductive layer and light filter substrate, light filter substrate includes shading matrix and chromatic photoresist, first conductive layer includes the first conductive unit of multiple mutually insulated extended in a first direction, and the first conductive unit includes the first conductive thread that live width is 0.2 μm~5 μm;Polarization elements includes polaroid and the second conductive layer, and the second conductive layer includes the second conductive unit of multiple mutually insulated extended in a second direction, and the second conductive unit includes the second conductive thread that live width is 0.2 μm~5 μm;First direction is not parallel with second direction.Above-mentioned polarisation filtration module can realize touch operation, polarized light function and filtering functions simultaneously, time in display screen, display screen can be directly made to have touch controllable function, without assembling touch screen the most on a display screen, not only contribute to reduce the thickness of electronic product, be the most also greatly saved material and assembly cost.

Description

Polarisation-filtration module and use the touch display screen of this polarisation-filtration module
Technical field
The present invention relates to touch screen, particularly relate to a kind of polarisation-filtration module and use this polarisation-filtration module Touch display screen.
Background technology
Touching display device and impart the looks that information is brand-new, the brand-new information being extremely attractive is mutual Equipment.The development touching display device technology causes the common concern of domestic and international information medium circle, it has also become The Chaoyang new high-tech industry that photovoltaic industry is a dark horse.
Traditional touch display device is mainly fitted or frame patch group by complete by touch induction device and display device Conjunction obtains, and therefore, needs technique that touch induction device and display device fitted by a step and obtain during production Touch display unit thickness thicker.
Summary of the invention
Based on this, it is necessary to provide a kind of polarisation-filtration module advantageously reducing touch display unit thickness and Use the touch display screen of this polarisation-filtration module.
A kind of polarisation-filtration module, including
Filtering assembly, described filtering assembly includes transparent substrates, is arranged on the first of described transparent substrates side Conductive layer and be arranged on the light filter substrate of described transparent substrates opposite side, described light filter substrate includes shading square Battle array and chromatic photoresist, described first conductive layer includes the of multiple spaced insulation extended in a first direction One conductive unit, described first conductive unit includes that multiple continuous print is intersected by the first conductive thread and is formed The first conductive grid, the live width of described first conductive thread is 0.2 μm~5 μm, and described shading matrix includes Cross one another ruling, described cross one another ruling forms grid, and described chromatic photoresist is formed at described grid In lattice;
It is arranged on described first conductive layer polarization elements away from the side of described transparent substrates, described polarisation group Part includes polaroid and is arranged on the second conductive layer of described polaroid side, and described second conductive layer includes Second conductive unit of multiple spaced insulation extended in a second direction, described second conductive unit includes Multiple continuous print are intersected by the second conductive thread the second conductive grid formed, described second conductive thread Live width be 0.2 μm~5 μm;
Described first direction is not parallel with described second direction, described first conductive unit and described second conduction Unit is the most spaced and insulate.
Wherein in an embodiment, between two adjoining nodes of cross one another described first conductive thread Distance be 50 μm~500 μm;Between two adjoining nodes of cross one another described second conductive thread Distance is 50 μm~500 μm.
Wherein in an embodiment, the adjacent distance between described first conductive unit is 0.5 μm~50 μm;The adjacent distance between described second conductive unit is 0.5 μm~50 μm.
Wherein in an embodiment, described first conductive grid and the second conductive grid at least one be Random grid.
Wherein in an embodiment, described filtering assembly also includes the first impressing glue-line, described first impressing Glue-line coats the side of described transparent substrates, and described first conductive layer is embedded at described first impressing glue-line remote Side from described transparent substrates.
Wherein in an embodiment, described polarization elements also includes the second impressing glue-line, described second impressing Glue-line coats the side of described polaroid, described second conductive layer be embedded described second imprint glue-line away from The side of described polaroid.
Wherein in an embodiment, the material of described first impressing glue-line is solvent-free ultra-violet curing acrylic Resin, On Visible Light Cured Resin or heat reactive resin;The material of described second impressing glue-line is solvent-free ultraviolet Solidification acryl resin, On Visible Light Cured Resin or heat reactive resin.
Wherein in an embodiment, the projection on described light filter substrate of each described first conductive grid is held Receive at least one chromatic photoresist.
Wherein in an embodiment, the projection on described light filter substrate of each described second conductive grid is held Receive at least one chromatic photoresist.
A kind of touch display screen, including the lower polaroid stacked gradually, TFT electrode, Liquid Crystal Module, public Electrode and described polarisation-filtration module.
Above-mentioned polarisation-filtration module can realize touch operation, polarized light function and filtering functions simultaneously, as aobvious An indispensable assembly in display screen, when above-mentioned polarisation-filtration module is in display screen, can directly make to show Display screen has touch controllable function, it is not necessary to assemble touch screen the most on a display screen, not only contributes to reduce electronic product Thickness, be the most also greatly saved material and assembly cost.
Accompanying drawing explanation
Fig. 1 is the structural representation touching display screen of an embodiment;
Fig. 2 is the structural representation of the polarisation-filtration module of an embodiment;
Fig. 3 is the first conductive layer and the structural representation of the second conductive layer of an embodiment;
Fig. 4 is the structural representation of the polarisation-filtration module of another embodiment;
Fig. 5 is the structural representation of the polarisation-filtration module of another embodiment;
Fig. 6 is the structural representation of the polarisation-filtration module of another embodiment;
Fig. 7 is the structural representation of the polarisation-filtration module of another embodiment;
Fig. 8 is the structural representation of the polarisation-filtration module of another embodiment;
Fig. 9 is polarisation-filtration module and the structural representation of conductive thread of an embodiment;
Figure 10 is polarisation-filtration module and the structural representation of conductive thread of another embodiment;
Figure 11 is polarisation-filtration module and the structural representation of conductive thread of another embodiment;
Figure 12 is the partial structurtes schematic diagram of the conductive thread of an embodiment;
Figure 13 is the partial structurtes schematic diagram of the conductive thread of another embodiment;
Figure 14 is the partial structurtes schematic diagram of the conductive thread of another embodiment;
Figure 15 is the partial structurtes schematic diagram of the conductive thread of another embodiment.
Detailed description of the invention
Understandable for enabling the above-mentioned purpose of the present invention, feature and advantage to become apparent from, the most right The detailed description of the invention of the present invention is described in detail.Elaborate in the following description a lot of detail with It is easy to fully understand the present invention.But the present invention can come real to be a lot different from alternate manner described here Executing, those skilled in the art can do similar improvement in the case of intension of the present invention, therefore this Bright do not limited by following public being embodied as.
Refer to Fig. 1, the touch display screen 100 of an embodiment, including the lower polaroid 10 stacked gradually, TFT electrode 20, Liquid Crystal Module 30, public electrode 40, protecting film 50 and polarisation-filtration module 60.
TFT electrode 20 includes glass-base 24 and the show electrode 22 being arranged on glass-base 24.Liquid crystal Module 30 includes liquid crystal 32 and is held on the alignment film 34 of liquid crystal 32 both sides.
It is appreciated that when use backlight is as polarized light source, such as OLED polarized light source, it is not necessary to use Lower polaroid 10.The lower polaroid 10 of present embodiment, TFT electrode 20, Liquid Crystal Module 30 and common electrical The structure of pole 40 and function can be identical with existing product, do not repeat them here.
Touch display screen 100 and there is touch operation, polarized light function and filtering functions simultaneously, make display screen have There is touch display function.Display screen can be straight-down negative or the LCDs of side entering type light source.
Following emphasis describes polarisation-filtration module 60.
Touching display device also to include controlling driving chip and flexible circuit board, for the purpose of simplifying the description, these are two years old Part is shown without the most in this application.
Referring to Fig. 2 and Fig. 3, the polarisation-filtration module 60 of an embodiment, including filtering assembly 62 and polarisation Assembly 64.
Filtering assembly 62 include transparent substrates 622, first imprint glue-line the 623, first conductive layer 624 and Light filter substrate.Light filter substrate includes shading matrix 626 and chromatic photoresist 628.First impressing glue-line 623 is coated with In a surface of transparent substrates 622, the first conductive layer 624 is embedded at the first impressing glue-line 623 away from thoroughly The side of bright substrate 622.Light filter substrate is arranged on another surface of transparent substrates 622.Transparent substrates 622 Can be glass or thermostable transparent resin.
Polarization elements 64 is arranged on first conductive layer 624 side away from transparent substrates 622.Polarization elements 64 Glue-line 646 and the second conductive layer 644 is imprinted including polaroid 642, second.Second impressing glue-line 646 is coated with In a surface of polaroid 642, the second conductive layer 644 is embedded at the second impressing glue-line 646 away from polarisation The side of sheet 642.First conductive layer 624 of polarization elements 64 and filtering assembly 62 is by a substratum transparent Laminating.
First conductive layer 624 includes the first conductive unit of multiple spaced insulation extended in a first direction 6242.The adjacent distance between the first conductive unit 6242 can be 0.5 μm~50 μm.Isolation each other First conductive unit 6242 of edge is by obtaining the first conductive layer 624 by break line treatment.
First conductive unit 6242 includes that multiple continuous print first formed that intersected by the first conductive thread is led Power grid.The live width of the first conductive thread is 0.2 μm~5 μm.Two of cross one another first conductive thread Distance between adjoining nodes can be 50 μm~500 μm.
Shading matrix 626 includes cross one another ruling, and cross one another ruling forms grid, chromatic photoresist 628 are formed in grid.
Shading matrix 626 is the photoresist with black dyes, and it can use exposure, development to make.Color Coloured light resistance 628 is the photoresist with coloured dye, and it can use exposure, development to make.Chromatic photoresist 28 generally comprise red (red, R) photoresistance, green (green, G) photoresistance or indigo plant (blue, B) photoresistance, use It is transformed into monochromatic light, it is achieved filtering functions in making incident illumination.
Second conductive layer 644 includes the second conductive unit of multiple spaced insulation extended in a second direction 6442.The adjacent distance between the second conductive unit 6242 can be 0.5 μm~50 μm.Isolation each other Second conductive unit 6442 of edge is by obtaining the second conductive layer 644 by break line treatment.
Second conductive unit 6442 includes that multiple continuous print second formed that intersected by the second conductive thread is led Power grid.The live width of the second conductive thread is 0.2 μm~5 μm.Two of cross one another second conductive thread Distance between adjoining nodes can be 50 μm~500 μm.
First direction is not parallel with second direction.First conductive unit 6242 and the second conductive unit 6442 exist Spaced and insulation formation induction structure on thickness direction.
First conductive layer 624 and the second conductive layer 644 are by respectively in the first impressing glue-line 623 and the second pressure Imprint out conductive pattern groove on print glue-line 646, then in conductive pattern groove, fill conductive material and solidify Prepare.
The degree of depth of conductive pattern groove is less than the thickness of the first impressing glue-line 623, meanwhile, conductive pattern groove The degree of depth less than second impressing glue-line 642 thickness.
For convenience of explanation, being not particularly illustrated below is the first conductive thread or the situation of the second conductive thread Under, the first conductive thread and the second conductive thread are referred to as conductive thread.
Conductive thread thickness is not more than the degree of depth of conductive pattern groove.
Conductive material can be metal simple-substance, alloy, CNT, Graphene, organic conductive macromolecule or Tin indium oxide (ITO).In one preferably embodiment, conductive material is metal, such as nanometer silver paste.
In the present embodiment, the material of the first impressing glue-line is solvent-free ultra-violet curing acryl resin.The One impressing glue-line is transparence, does not affect the transmitance of entirety.In other embodiments, the first impressing glue The material of layer can also be On Visible Light Cured Resin or heat reactive resin.The thickness of the first impressing glue-line can be 2 μm~10 μm.
In the present embodiment, the material of the second impressing glue-line is solvent-free ultra-violet curing acryl resin.The Two impressing glue-lines are transparence, do not affect the transmitance of entirety.In other embodiments, the second impressing glue The material of layer can also be On Visible Light Cured Resin or heat reactive resin.The thickness of the second impressing glue-line can be 2 μm~10 μm.
In an embodiment as illustrated in figure 2, polaroid 642 is arranged on the surface of substratum transparent, the first conduction Separated by polaroid 642 and substratum transparent between layer 624 and the second conductive layer 644.Certainly, at other In embodiment, as shown in Figure 4, the second conductive layer 644 is set directly at the surface of substratum transparent, and first leads Separated by substratum transparent between electric layer 624 and the second conductive layer 644.
It is appreciated that polarisation-filtration module 60 can also be not provided with the first impressing glue-line 623 and the second impressing glue Layer 646, refer to Fig. 5 to Fig. 6.Certainly, polarisation-filtration module 60 can also be not provided with the first impressing glue Layer 623 or the second impressing glue-line 646, refer to Fig. 7 to Fig. 8.
As it is shown in figure 5, polarisation-filtration module 60 is not provided with the first impressing glue-line and the second impressing glue-line.This Time, the first conductive layer 624 and the second conductive layer 644 are prepared by the way of being coated with or plate conductive layer and etching.
In the embodiment as shown in fig .5, polaroid 642 is arranged on the surface of substratum transparent, the first conduction Separated by polaroid 642 and substratum transparent between layer 624 and the second conductive layer 644.Certainly, at other In embodiment, as shown in Figure 6, the second conductive layer 644 is set directly at the surface of substratum transparent, and first leads Separated by substratum transparent between electric layer 624 and the second conductive layer 644.
As it is shown in fig. 7, polarisation-filtration module 60 is provided with the second impressing glue-line 646, but it is not provided with the first pressure Print glue-line.Now, the first conductive layer 624 is prepared by the way of being coated with or plate conductive layer and etching.Second leads Electric layer 644 is imprinted with mode and prepares.
Certainly, in other embodiments, polarisation-filtration module 60 can be provided with the first impressing glue-line, but does not sets Put the second impressing glue-line.Now, the second conductive layer 644 is prepared by the way of being coated with or plate conductive layer and etching. First conductive layer 624 is imprinted with mode to be prepared.
In one preferably embodiment, the first conductive layer 624 is by the way of being coated with or plate conductive layer and etching Preparation.Second conductive layer 644 is imprinted with mode to be prepared.This mainly due to transparent substrates 622 relative to The resin film of polaroid 642, more resistant to high temperature, is more suitable for carrying out plated film.
In the embodiment as shown in figure 7, polaroid 642 is arranged on the surface of substratum transparent, the first conduction Separated by polaroid 642 and substratum transparent between layer 624 and the second conductive layer 644.Certainly, at other In embodiment, as shown in Figure 8, the second conductive layer 644 is set directly at the surface of substratum transparent, and first leads Separated by substratum transparent between electric layer 624 and the second conductive layer 644.
Refer to Fig. 9 to Figure 11, the above-mentioned polarisation-filtration module 60 with touch control operation function, the first conduction Layer 624 and the second conductive layer 644 are made up of conductive thread, owing to the live width of the first conductive thread is 0.2 μm~5 μm, the live width of the second conductive thread is 0.2 μm~5 μm, therefore, the first conductive thread and second Conductive thread visually-clear (i.e. naked eyes are invisible), the first conductive thread and the second conductive thread can and shading The ruling spatial alignment of matrix 626, it is also possible to do not line up.
In embodiment as shown in Figure 9, the conductive thread of the first conductive layer 624 and the second conductive layer 644 The ruling of conductive thread and shading matrix 626 the most all do not line up, now, two of conductive thread Distance between adjoining nodes is 50 μm~500 μm.First conductive grid can be regular polygon, such as pros Shape, rhombus, regular hexagon or random grid.Second conductive grid can be regular polygon, as square, Rhombus, regular hexagon or random grid.
In embodiment as shown in Figure 10, the conductive thread of the first conductive layer 624 and the second conductive layer 644 Conductive thread the most all align with the ruling of shading matrix 626, such conductive thread will not expose screening The region of light matrix 626 affects light-out effect and the product appearance effect of chromatic photoresist to chromatic photoresist region. Conductive thread can be straight line, it is also possible to for curve, in other examples, conductive thread can also be Broken line.
In embodiment as shown in figure 11, the conductive thread of the first conductive layer 624 or the second conductive layer 644 Conductive thread spatially align with the ruling of shading matrix 626.
Preferably, the first conductive thread spatially aligns with the ruling of shading matrix 626, the second conductive filament Line does not lines up with the ruling of shading matrix 626, because the first conductive layer 624 and shading matrix 626 are same In transparent substrates, so easily realizing alignment request in manufacturing process.Now, the first conductive thread is permissible For straight line, curve or broken line, first conductive thread projection on light filter substrate shading to be fully fallen in The coverage of the ruling of matrix 626.Distance between two adjoining nodes of the second conductive thread is 50 μm~500 μm.Second conductive thread intersect formed conductive grid can be regular polygon, such as pros Shape, rhombus, regular hexagon or random grid.
Above-mentioned Fig. 9 to Figure 11 illustrate only the first conductive layer 624 and the second conductive layer 644 is impressing system The schematic diagram become, in actual applications, is not intended to the first conductive layer 624 and preparation of the second conductive layer 644 Mode.
Refer to Figure 12 to Figure 15, when the lattice of the first conductive thread or the second conductive thread with shading matrix 626 When line aligns, the first conductive grid and the projection on light filter substrate of second conductive grid can comprise whole Several complete R photoresistances, G photoresistance or B photoresistance.
In embodiment as shown in figure 12, the conductive grid that conductive thread a is formed and R photoresistance, G photoresistance Or B photoresistance one_to_one corresponding.
In as shown for example in fig.13, only on first axial (such as transverse axis), conductive thread a shape The conductive grid become projection on light filter substrate comprises multiple complete R photoresistance, G photoresistance or B photoresistance.
In embodiment as shown in figure 14, only on second axial (the such as longitudinal axis), conductive thread a shape The conductive grid become projection on light filter substrate comprises multiple complete R photoresistance, G photoresistance or B photoresistance.
In embodiment as shown in figure 15, on first axial (transverse axis) and second axial (longitudinal axis), The conductive grid that conductive thread a is formed projection on light filter substrate all comprises multiple complete R photoresistance, G Photoresistance or B photoresistance.
Polarisation-the filtration module 60 with touch control operation function as shown in Figure 2 and Figure 4, when the first conductive layer 624 and second conductive layer 644 when all using impressing mode to prepare, its manufacturing process is as follows:
(1) first the surface of glass baseplate 622 is carried out Plasma process, remove the dirty of surface, and make Surface ionizing, increase follow-up and other material cohesive force.
(2) in the whole topcoating/plating in a surface of glass baseplate 622 with the photoresist layer of black dyes.
(3) use exposure-development technology, the photoresist with black dyes in chromatic photoresist region removed, Form shading matrix.
(4) plate in the region eliminating the photoresist with black dyes or coat R/G/B chromatic photoresist by several times.
(5) at another surface of glass baseplate 622 coating impressing glue, (the present embodiment uses PMMA UV Solidification resin), and the impression block being nested with the conductive pattern with the first conductive layer imprints glue surface first Imprint and solidify, obtaining the conductive pattern groove of required first conductive layer.
(6) in the conductive pattern groove of the first conductive layer, fill conductive material and solidify.Conductive material is permissible For metal simple-substance or alloy, CNT, Graphene, organic conductive macromolecule or ITO, form the first conduction The conductive grid that silk thread is constituted.Preferably, conductive material is metal (such as nanometer silver paste), obtains with first The filtering assembly 62 of conductive layer 624.
(7) at surface coating impressing glue (the present embodiment employing poly-methyl methacrylate of polaroid 642 Ester (polymethylmethacrylate, PMMA) UV solidifies resin), and with the leading of the second conductive layer The impression block that electrical pattern is nested imprints on the second impressing glue surface and solidifies, and obtains required second and leads The conductive pattern groove of electric layer.
(8) filling conductive material in the conductive pattern groove of the second conductive layer and solidify, conductive material is permissible For metal simple-substance or alloy, CNT, Graphene, organic conductive macromolecule or ITO, form the first conduction The conductive grid that silk thread is constituted.Preferably, conductive material is metal (such as nanometer silver paste), obtains with second The polarization elements 64 of conductive layer 644.
(9) by the filtering assembly 62 with the first conductive layer 624 and the polarisation with the second conductive layer 644 Assembly 64 is bondd by transparent adhesive and solidifies, and obtains the polarisation-optical filtering mould with touch control operation function Block 60.
Polarisation-the filtration module 60 with touch control operation function as shown in Figure 5 and Figure 6, when the first conductive layer 624 and second conductive layer 644 all by be coated with or plating conductive layer etch again by the way of realize time, its manufacturing process is such as Under:
(1) first the surface of glass baseplate 622 is carried out Plasma process, remove the dirty of surface, and make Surface ionizing, increase follow-up and other material cohesive force.
(2) in a whole topcoating in surface of glass baseplate 622 or plating with the photoresist layer of black dyes.
(3) use exposure-development technology, the photoresist with black dyes in chromatic photoresist region removed, Form shading matrix.
(4) plate in the region eliminating the photoresist with black dyes or coat R/G/B chromatic photoresist by several times.
(5) in whole of another surface of glass baseplate 622 plating conductive layer or painting one layer of conductive ink (conduction Material can be metal simple-substance, metal alloy, CNT, Graphene, organic conductive macromolecule or ITO; In the present embodiment, conductive material is silver ink), form conductive layer.
(6) it is coated with a layer photoetching glue on the electrically conductive, through exposure-development technology, only retains covering first and lead The photoresist of the conductive pattern portions of electric layer 624, removes the photoresist in remaining place.
(7) utilize lithographic technique that above-mentioned conductive layer is etched, obtain first leading of separate, insulation Electric unit, thus obtain the filtering assembly 62 with the first conductive layer 624.
(8) at whole an of surface of polaroid 642 plating conductive layer or one layer of conductive ink (conductive material of painting Can be metal simple-substance, metal alloy, CNT, Graphene, organic conductive macromolecule or ITO.This reality Executing in example, conductive material is silver ink), form conductive layer.
(9) it is coated with a layer photoetching glue, through exposure-development technology, only retains and cover the second conductive layer 644 The photoresist of conductive pattern portions, the photoresist in remaining place is removed.
(10) utilize lithographic technique that above-mentioned conductive layer is etched, obtain separate, insulation second Conductive unit, thus obtain the polarization elements 64 with the second conductive layer 644.
(11) by the filtering assembly 62 with the first conductive layer 624 and the polarisation with the second conductive layer 644 Assembly 64 is bondd by transparent adhesive and solidifies, and obtains the polarisation-optical filtering mould with touch control operation function Block 60.
Polarisation-the filtration module 60 with touch control operation function as shown in Figure 7, when the first conductive layer 624 leads to Cross and be coated with or prepared by the plating mode that etches again of conductive layer, when the second conductive layer 644 uses impressing mode to prepare, its Manufacturing process is as follows:
(1) first the surface of glass baseplate 622 is carried out Plasma process, remove the dirty of surface, and make Surface ionizing, increase follow-up and other material cohesive force.
(2) in a whole topcoating in surface of glass baseplate 622 or plating with the photoresist layer of black dyes.
(3) use exposure-development technology, the photoresist with black dyes in chromatic photoresist region removed, Form shading matrix.
(4) plate in the region eliminating the photoresist with black dyes or coat R/G/B chromatic photoresist by several times.
(5) one layer of ito film is plated on whole of another surface of glass baseplate 622.
(6) it is coated with a layer photoetching glue on ito film surface, through exposure-development technology, only retains covering the The photoresist of the conductive pattern portions of one conductive layer 624, removes the photoresist in remaining place.
(7) utilize lithographic technique that above-mentioned ito film is etched, obtain first leading of separate, insulation Electric unit, thus obtain the filtering assembly 62 with the first conductive layer 624.
(8) in a surface coating impressing glue (the present embodiment employing PMMA UV solidification of polaroid 642 Resin), and the impression block being nested with the conductive pattern with the second conductive layer carries out on the second impressing glue surface Imprint and solidify, obtaining the conductive pattern groove of required second conductive layer.
(9) filling conductive material in the conductive pattern groove of the second conductive layer and solidify, conductive material is permissible For metal simple-substance or alloy, CNT, Graphene, organic conductive macromolecule or ITO, form the first conduction The conductive grid that silk thread is constituted;Preferably, conductive material is metal (such as nanometer silver paste), obtains with second The polarization elements 64 of conductive layer 644.
(10) by the filtering assembly 62 with the first conductive layer 624 and the polarisation with the second conductive layer 644 Assembly 64 is bondd by transparent adhesive and solidifies, and obtains the polarisation-optical filtering mould with touch control operation function Block 60.
Above-mentioned polarisation-the filtration module 60 with touch control operation function, when the first conductive layer 624 uses impressing side Prepared by formula, when the second conductive layer 644 is prepared by the way of being coated with or plate conductive layer and etching, and its manufacturing process As follows:
(1) first the surface of glass baseplate 622 is carried out Plasma process, remove the dirty of surface, and make Surface ionizing, increase follow-up and other material cohesive force.
(2) in the whole topcoating/plating in a surface of glass baseplate 622 with the photoresist layer of black dyes.
(3) use exposure-development technology, the photoresist with black dyes in chromatic photoresist region removed, Form shading matrix 626.
(4) plate in the region eliminating the photoresist with black dyes or coat R/G/B chromatic photoresist by several times 628。
(5) at another surface of glass baseplate 622 coating impressing glue, (the present embodiment uses PMMA UV Solidification resin), and the impression block being nested with the conductive pattern with the first conductive layer imprints glue surface first Imprint and solidify, obtaining the conductive pattern groove of required first conductive layer.
(6) in the conductive pattern groove of the first conductive layer, fill conductive material and solidify.Conductive material is permissible For metal simple-substance or alloy, CNT, Graphene, organic conductive macromolecule or ITO, form the first conduction The conductive grid that silk thread is constituted.Preferably, conductive material is metal (such as nanometer silver paste), obtains with first The filtering assembly 62 of conductive layer 624.
(7) at whole an of surface of polaroid 642 plating conductive layer or one layer of conductive ink (conductive material of painting Can be metal simple-substance, metal alloy, CNT, Graphene, organic conductive macromolecule or ITO.This reality Executing in example, conductive material is silver ink), form conductive layer.
(8) it is coated with a layer photoetching glue, through exposure-development technology, only retains and cover the second conductive layer 644 The photoresist of conductive pattern portions, the photoresist in remaining place is removed.
(9) utilize lithographic technique that above-mentioned conductive layer is etched, obtain second leading of separate, insulation Electric unit, thus obtain the polarization elements 64 with the second conductive layer 644.
(10) by the filtering assembly 62 with the first conductive layer 624 and the polarisation with the second conductive layer 644 Assembly 64 is bondd by transparent adhesive and solidifies, and obtains the polarisation-optical filtering mould with touch control operation function Block 60.
Above-mentioned polarisation-filtration module 60 can realize touch operation, polarized light function and filtering functions simultaneously, as An indispensable assembly in display screen, when above-mentioned polarisation-filtration module 60 is in display screen, can be direct Make display screen have touch controllable function, it is not necessary to assemble touch screen the most on a display screen, not only contribute to reduce electronics The thickness of product, is the most also greatly saved material and assembly cost.
The material that first conductive layer and the second conductive layer are selected by tradition only with transparent material expand to all properly Conductive material;When metal material selected by conductive material, resistance can be substantially reduced and reduce touch screen Energy consumption.
Above-mentioned polarisation-the filtration module 60 with touch controllable function is bilayer conductive structure, it is not necessary to carries out bridging and sets Meter, is substantially reduced task difficulty.
Use above-mentioned polarisation-filtration module 60, can reduce liquid crystal display (LiquidCrystalDisplay, LCD) signal disturbing to touch-control effect.
Embodiment described above only have expressed the several embodiments of the present invention, and it describes more concrete and detailed, But therefore can not be interpreted as the restriction to the scope of the claims of the present invention.It should be pointed out that, for this area Those of ordinary skill for, without departing from the inventive concept of the premise, it is also possible to make some deformation and Improving, these broadly fall into protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be with appended Claim is as the criterion.

Claims (8)

1. polarisation-filtration module, it is characterised in that include
Filtering assembly, described filtering assembly includes transparent substrates, is arranged on the first of described transparent substrates side Conductive layer and be arranged on the light filter substrate of described transparent substrates opposite side, described light filter substrate includes shading square Battle array and chromatic photoresist, described first conductive layer includes the of multiple spaced insulation extended in a first direction One conductive unit, described first conductive unit includes that multiple continuous print is intersected by the first conductive thread and is formed The first conductive grid, the live width of described first conductive thread is 0.2 μm~5 μm, and described shading matrix includes Cross one another ruling, described cross one another ruling forms grid, and described chromatic photoresist is formed at described grid In lattice;
It is arranged on described first conductive layer polarization elements away from the side of described transparent substrates, described polarisation group Part includes polaroid and is arranged on the second conductive layer of described polaroid side, and described second conductive layer includes Second conductive unit of multiple spaced insulation extended in a second direction, described second conductive unit includes Multiple continuous print are intersected by the second conductive thread the second conductive grid formed, described second conductive thread Live width be 0.2 μm~5 μm;
Described first direction is not parallel with described second direction, described first conductive unit and described second conduction Unit is the most spaced and insulate;
Distance between two adjoining nodes of cross one another described first conductive thread is 50 μm~500 μm; Distance between two adjoining nodes of cross one another described second conductive thread is 50 μm~500 μm;
The adjacent distance between described first conductive unit is 0.5 μm~50 μm;Adjacent described second conduction Distance between unit is 0.5 μm~50 μm.
Polarisation-filtration module the most according to claim 1, it is characterised in that described first conductive grid At least one is random grid with the second conductive grid.
Polarisation-filtration module the most according to claim 1, it is characterised in that described filtering assembly also wraps Including the first impressing glue-line, described first impressing glue-line coats the side of described transparent substrates, and described first leads Electric layer is embedded and imprints the glue-line side away from described transparent substrates described first.
Polarisation-filtration module the most according to claim 1, it is characterised in that described polarization elements also wraps Including the second impressing glue-line, described second impressing glue-line coats the side of described polaroid, described second conduction Layer is embedded and imprints the glue-line side away from described polaroid described second.
5. according to the polarisation-filtration module described in claim 3 or 4, it is characterised in that described first impressing The material of glue-line is solvent-free ultra-violet curing acryl resin, On Visible Light Cured Resin or heat reactive resin;Institute The material stating the second impressing glue-line is solvent-free ultra-violet curing acryl resin, On Visible Light Cured Resin or thermosetting Change resin.
Polarisation-filtration module the most according to claim 1, it is characterised in that each described first conduction Grid projection on described light filter substrate accommodates at least one chromatic photoresist.
7. according to the polarisation-filtration module described in claim 1 or 6, it is characterised in that each described second Conductive grid projection on described light filter substrate accommodates at least one chromatic photoresist.
8. one kind touches display screen, it is characterised in that the lower polaroid that includes stacking gradually, TFT electrode, Liquid Crystal Module, public electrode and the polarisation-filtration module as described in any one in claim 1~7.
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CN106597597B (en) * 2016-12-28 2023-09-12 京东方科技集团股份有限公司 Linear polaroid and display device
TWI615765B (en) 2017-06-12 2018-02-21 友達光電股份有限公司 Touch sensing substrate, and integrated structure having functions of polarization and touch-sensing
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