CN103336618A - Light polarizing-filtering module, manufacturing method thereof and touch display screen - Google Patents
Light polarizing-filtering module, manufacturing method thereof and touch display screen Download PDFInfo
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- CN103336618A CN103336618A CN2013102824209A CN201310282420A CN103336618A CN 103336618 A CN103336618 A CN 103336618A CN 2013102824209 A CN2013102824209 A CN 2013102824209A CN 201310282420 A CN201310282420 A CN 201310282420A CN 103336618 A CN103336618 A CN 103336618A
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Abstract
A light polarizing-filtering module comprises a light polarizing assembly and a light filtering assembly. The light polarizing assembly comprises a light polarizing plate and a first conducting layer arranged on one side of the light polarizing plate. The light filtering assembly comprises a transparent substrate, a light filtering layer and a second conducting layer which are arranged on the same side of the transparent substrate. According to the light polarizing-filtering module, touch operation, a light polarizing function and a light filtering function can be achieved at the same time. Serving as a necessary part of a display screen, the light polarizing-filtering module can directly enable the display screen to have the touch control function when used in the display screen. A touch screen is not needed to be assembled on the display screen. Therefore, reduction of the thickness of an electronic product is facilitated, and meanwhile material and assembly cost are greatly saved. The invention further provides a touch display screen and a manufacturing method for the light polarizing-filtering module.
Description
Technical field
The present invention relates to display technique field, plane, particularly relate to a kind of polarisation optical filtering module and its method for making and touch display screen.
Background technology
Touch-screen is the inductive arrangement that can receive input signals such as touch.Touch-screen has given information interaction brand-new looks, is extremely attractive brand-new information interaction equipment.The development of touch screen technology has caused the common concern of domestic and international information medium circle, has become the Chaoyang new high-tech industry that the photoelectricity industry is a dark horse.
At present, having the electronic product that touches Presentation Function includes display screen and is positioned at touch-screen on the display screen.Touch-screen as with display screen assembly independently, when being used for the electronic product of some realization man-machine interactions, all need to order according to the size of display screen, assemble again afterwards, with the formation touch display screen, but touch display screen can have touch control operation and Presentation Function simultaneously.The assembling of existing touch-screen and display screen mainly contains dual mode, and namely frame pastes and full the applying.The frame subsides are to be fitted in the edge of touch-screen and display screen, and full applying is whole the applying of upper surface with lower surface and the display screen of touch-screen.
Traditional display screen mainly comprises polaroid, optical filter box, Liquid Crystal Module and TFT(Thin Film Transistor, thin film transistor (TFT)), had bigger thickness, and when continuing on the display screen applying touch-screen, will further increase the thickness of touch display screen.
Summary of the invention
Based on this, be necessary to provide a kind of polarisation optical filtering module and its method for making and touch display screen that reduces to reduce electronic product thickness.
A kind of polarisation optical filtering module comprises: the polaroid assembly comprises polaroid, and is arranged at first conductive layer of described polaroid one side that described first conductive layer comprises a plurality of first conductive units that arrange at interval along first direction; Optical filter box, comprise transparent substrates, and be positioned at filter layer and second conductive layer of described transparent substrates the same side, described filter layer comprises light shielding part and optical filtering portion, described light shielding part is intersected to form mutually by gridline, and described gridline intersects to form a plurality of grid cells mutually; Described optical filtering portion comprises a plurality of filter units, and each described filter unit is contained in the corresponding described grid cell; Described second conductive layer comprises a plurality of second conductive units that arrange along the second direction parallel interval, and each described second conductive unit is intersected to form mutually by conductive thread, and described second conductive unit comprises some grid cells; Described first direction and second direction are not parallel to each other, and described first conductive unit and second conductive unit insulate at thickness direction; The conductive thread of each grid cell of described second conductive layer falls within on the gridline of a described grid cell in the projection correspondence of described filter layer.
Among embodiment, the conductive thread of described second conductive layer and described gridline are wide therein.
Among embodiment, described first conductive unit is intersected to form mutually by conductive thread therein, and the conductive thread of described first conductive layer all falls within on the described gridline in the projection of described filter layer.
Therein among embodiment, described polaroid comprises the polaroid body and is arranged at the impression glue-line of described polaroid body one side, and described impression glue-line offers groove away from a side of described polaroid body, and described first conductive layer is contained in described groove.
Among embodiment, the degree of depth of described groove is less than the thickness of described impression glue-line therein, and the conductive thread thickness of described first conductive layer is not more than the degree of depth of described groove.
Among embodiment, the interval width of two adjacent described first conductive units is 0.5 micron～50 microns therein, and the interval width of two adjacent described second conductive units is 0.5 micron～50 microns.
Among embodiment, described second conductive layer is arranged at described light shielding part away from a side of described transparent substrates, or is arranged between described light shielding part and the described transparent substrates therein.
Among embodiment, described polarisation optical filtering module also comprises substratum transparent therein, and described transparent substrates is bonding by described substratum transparent and described polaroid assembly away from a side of described filter layer and second conductive layer.
A kind of polarisation optical filtering module comprises:
The polaroid assembly, comprise polaroid, and be arranged at first conductive layer of described polaroid one side, described first conductive layer comprises a plurality of first conductive units that arrange along the first direction parallel interval, each described first conductive unit is intersected to form mutually by conductive thread, and described conductive thread intersects to form grid node mutually;
Optical filter box, comprise transparent substrates, and be positioned at filter layer and second conductive layer of described transparent substrates the same side, described filter layer comprises light shielding part and optical filtering portion, described light shielding part is intersected to form mutually by gridline, and described gridline intersects to form a plurality of grid cells mutually; Described optical filtering portion comprises a plurality of filter units, and each described filter unit is contained in the corresponding described grid cell; Described second conductive layer comprises a plurality of second conductive units that arrange along the second direction parallel interval, and each described second conductive unit is intersected to form mutually by conductive thread;
Described first direction and second direction are not parallel to each other, and described first conductive unit and second conductive unit insulate at thickness direction; The conductive thread live width of described first conductive layer is 0.2 micron～5 microns, and the distance of adjacent two grid nodes is 50 microns～800 microns; The conductive thread of described second conductive layer falls within on the described gridline in the projection of described filter layer.
Among embodiment, the conductive thread of described second conductive layer and described gridline are wide therein.
Therein among embodiment, described polaroid comprises the polaroid body and is arranged at the impression glue-line of described polaroid body one side, and described impression glue-line offers groove away from a side of described polaroid body, and described first conductive layer is contained in described groove.
Among embodiment, the degree of depth of described groove is less than the thickness of described impression glue-line therein, and the conductive thread thickness of described first conductive layer is not more than the degree of depth of described groove.
Among embodiment, the interval width of two adjacent described first conductive units is 0.5 micron～50 microns therein, and the interval width of two adjacent described second conductive units is 0.5 micron～50 microns.
Among embodiment, described second conductive layer is arranged at described light shielding part away from a side of described transparent substrates, or is arranged between described light shielding part and the described transparent substrates therein.
Among embodiment, described polarisation optical filtering module also comprises substratum transparent therein, and described transparent substrates is bonding by described substratum transparent and described polaroid assembly away from a side of described filter layer and second conductive layer.
A kind of touch display screen comprises TFT electrode, Liquid Crystal Module and above-mentioned any one polarisation optical filtering module of stacking gradually.
A kind of polarisation optical filtering module making method may further comprise the steps:
Form first conductive layer in polaroid one side, obtain the polaroid assembly; Described first conductive layer comprises a plurality of first conductive units that arrange along the first direction parallel interval, and each described first conductive unit is intersected to form mutually by conductive thread;
Utilize mask plate to adopt the exposure etching technique, form filter layer and second conductive layer in transparent substrates the same side, obtain optical filter box; Described filter layer comprises light shielding part and optical filtering portion, and described light shielding part is intersected to form mutually by gridline, and described gridline intersects to form a plurality of grid cells mutually; Described optical filtering portion comprises a plurality of filter units, and each described filter unit is contained in the corresponding described grid cell; Described second conductive layer comprises a plurality of second conductive units that arrange along the second direction parallel interval, and each described second conductive unit is intersected to form mutually by conductive thread; Described first direction and second direction are not parallel to each other, and described first conductive unit and second conductive unit insulate at thickness direction; The conductive thread of described second conductive layer falls within on the described gridline in the projection of described filter layer;
The side of described transparent substrates away from described filter layer and second conductive layer is connected with described polaroid assembly, obtains polarisation optical filtering module.
Therein among embodiment, describedly form first conductive layer in polaroid one side, the step that obtains the polaroid assembly may further comprise the steps:
At polaroid body one side coating impression glue, obtain impressing glue-line; Described polaroid body and impression glue-line constitute described polaroid;
Described impression glue-line is impressed away from a side of described polaroid body and solidifies, obtain groove;
Filled conductive material and solidifying in the described groove forms described first conductive layer, obtains described polaroid assembly.
Among embodiment, the described mask plate that utilizes adopts the exposure etching technique, forms filter layer and second conductive layer in transparent substrates the same side therein, and the step that obtains optical filter box may further comprise the steps:
Be coated with or plate the photoresist that has black dyes at the whole face of described transparent substrates one side surface, obtain initial light shield layer;
Plate or be coated with conductive material on whole of described initial light shield layer surface, obtain initial conductive layer;
Be coated with first photoresist layer at described initial conduction laminar surface, utilize first mask plate corresponding with the gridline pattern of described light shielding part that described first photoresist layer is carried out exposure imaging;
Described initial conductive layer is carried out etching, obtain initial second conductive layer; The conductive pattern of described initial second conductive layer is consistent with the pattern of described first mask plate;
Described initial light shield layer is carried out etching, obtain light shielding part; The gridline pattern of described light shielding part is consistent with the pattern of described first mask plate;
Be coated with second photoresist layer at described initial second conductive layer surface, utilize second mask plate corresponding with the broken string position of described second conductive layer that described second photoresist layer is carried out exposure imaging;
Described initial second conductive layer is carried out etching, described initial second conductive layer is divided into second conductive unit that a plurality of parallel interval arrange, obtain described second conductive layer;
In the grid cell that the gridline of described light shielding part constitutes, plate or be coated with filter unit successively, form optical filtering portion, obtain described filter layer; Described transparent substrates, second conductive layer and filter layer namely constitute described optical filter box.
Therein among embodiment, describedly be coated with or plate the photoresist that has black dyes at the whole face of described transparent substrates one side surface, obtain may further comprise the steps before the step of initial light shield layer:
Described transparent substrates one side surface is carried out plasma treatment; Described initial light shield layer is formed at described transparent substrates through the surface after the described plasma treatment.
Among embodiment, the described mask plate that utilizes adopts the exposure etching technique, forms filter layer and second conductive layer in transparent substrates the same side therein, and the step that obtains optical filter box may further comprise the steps:
Plate or be coated with conductive material whole of described transparent substrates one side surface, obtain initial conductive layer;
Be coated with or plate the photoresist that has black dyes at the whole face of described initial conduction laminar surface, obtain initial light shield layer;
Utilize the mask plate corresponding with the conductive pattern of described second conductive layer that described initial light shield layer is carried out exposure imaging;
Described initial light shield layer is carried out etching, obtain described light shielding part;
Described initial conductive layer is carried out etching, described conductive layer is divided into second conductive unit that a plurality of parallel interval arrange, obtain described second conductive layer; The gridline pattern of described light shielding part is consistent with the conductive pattern of described second conductive layer;
In the grid cell that the gridline of described light shielding part constitutes, plate or be coated with filter unit successively, form optical filtering portion, obtain described filter layer; Described transparent substrates, second conductive layer and filter layer namely constitute described optical filter box.
Among embodiment, plate or be coated with conductive material whole of described transparent substrates one side surface therein, obtain may further comprise the steps before the step of conductive layer:
Described transparent substrates one side surface is carried out plasma treatment; Described conductive layer is formed at described transparent substrates through the surface after the described plasma treatment.
Above-mentioned polarisation optical filtering module and touch display screen, and the polarisation optical filtering module that is made by above-mentioned polarisation optical filtering module making method, can realize touch operation, polarized light function and filtering functions simultaneously, as an indispensable assembly in the display screen, when being used for display screen, can directly make display screen have touch controllable function, need not to assemble touch-screen at display screen again, not only be conducive to reduce the thickness of electronic product, also saved material and assembly cost simultaneously greatly.
Description of drawings
Fig. 1 is the structural drawing of polarisation optical filtering module among the embodiment;
Fig. 2 is the structural drawing of first conductive layer and second conductive layer among the embodiment;
Fig. 3 is the structural drawing of optical filter box and the second conductive layer conductive thread among the embodiment;
Fig. 4 is the structural drawing of optical filter box and the second conductive layer conductive thread among another embodiment;
Fig. 5 is the structural drawing of polaroid assembly and the first conductive layer conductive thread among the embodiment;
Fig. 6 is the structural drawing of polaroid assembly and the first conductive layer conductive thread among another embodiment;
Fig. 7 is the structural drawing of polarisation optical filtering module among another embodiment;
Fig. 8 is the structural drawing of polarisation optical filtering module among the another embodiment;
Fig. 9 is the structural drawing of polarisation optical filtering module among the another embodiment;
Figure 10 is the process flow diagram of polarisation optical filtering module making method among the embodiment.
Embodiment
For above-mentioned purpose of the present invention, feature and advantage can be become apparent more, below in conjunction with accompanying drawing the specific embodiment of the present invention is described in detail.A lot of details have been set forth in the following description so that fully understand the present invention.But the present invention can implement much to be different from alternate manner described here, and those skilled in the art can do similar improvement under the situation of intension of the present invention, so the present invention is not subjected to the restriction of following public concrete enforcement.
Need to prove that when element is called as " being fixed in " another element, can directly can there be element placed in the middle in it on another element or also.When an element is considered to " connection " another element, it can be to be directly connected to another element or may to have element placed in the middle simultaneously.
Unless otherwise defined, the employed all technology of this paper are identical with the implication that belongs to those skilled in the art's common sense of the present invention with scientific terminology.Employed term is not intended to be restriction the present invention just in order to describe the purpose of specific embodiment in instructions of the present invention herein.Term as used herein " and/or " comprise one or more relevant Listed Items arbitrarily with all combinations.
A kind of polarisation optical filtering module as depicted in figs. 1 and 2, comprises polaroid assembly 100 and optical filter box 200.
First conductive layer 120 and second conductive layer 230 can be nesa coating, as tin indium oxide (ITO) film, perhaps be the staggered netted conductive layer that forms of conductive thread, what conductive thread can be in metal simple-substance line, metal alloy wire, carbon nano tube line, Graphene line, organic conductive macromolecule line or tin indium oxide (ITO) line is at least a.In the present embodiment, first conductive layer 120 and second conductive layer 230 are the staggered netted conductive layer that forms of conductive thread, and the conductive thread of first conductive layer 120 and second conductive layer 230 is the metal simple-substance line, and for example silver-colored line can improve electric conductivity.
First direction and second direction are not parallel to each other, and first conductive unit 122 and second conductive unit 232 form Inductance and Capacitance in the thickness direction insulation.The interval width of two adjacent first conductive units 122 can be 0.5 micron to 50 microns, and the interval width of two adjacent second conductive units 232 also can be 0.5 micron to 50 microns.
Therein among embodiment, the conductive thread of first conductive layer 120 and second conductive layer 230 intersects to form grid node mutually, the conductive thread live width of first conductive layer 120 is 0.2 micron～5 microns, and the distance of adjacent two grid nodes is 50 microns～800 microns, to guarantee first conductive layer, 120 visually-clear, namely guarantee visible light transmittance rate greater than 80%, this moment, first conductive layer, 120 conductive threads can fall within on the gridline in the projection of filter layer 220, also can not fall within on the gridline.The conductive thread of second conductive layer 230 falls within on the gridline in the projection of filter layer 220, avoids conductive thread to be exposed to optical filtering portion 224 and influences bright dipping and the appearance effect of optical filtering portion 224.Second conductive unit 232 comprises some grid cells, and the conductive thread of each grid cell of second conductive layer 230 can corresponding fall within on the gridline of a grid cell 223 in the projection of filter layer 220 in the present embodiment.In like manner, the conductive thread of second conductive layer 230 also can not fall within on the gridline in the projection of filter layer 220, the conductive thread of second conductive layer 230 adopts transparent material, or its live width and grid node distance are limited to guarantee second conductive layer, 230 visually-clear.
In another embodiment, the conductive thread of first conductive layer 120 and second conductive layer 230 all falls within on the gridline in the projection of filter layer 220, avoids conductive thread to be exposed to optical filtering portion 224 and influences bright dipping and the appearance effect of optical filtering portion 224.Be appreciated that this moment for the conductive thread live width of first conductive layer 120, the distance that reaches adjacent two grid nodes can limit, and also can not limit.Operation can limit the conductive thread live width of first conductive layer 120 less than the gridline live width of light shielding part 222 for convenience, can further hang down the risk that conductive thread is exposed to the gridline side direction.
Therein among embodiment, as shown in Figure 3 and Figure 4, the gridline of the conductive thread of second conductive layer 230 and light shielding part 222 is wide, second conductive layer 230 can adopt the exposure etching to make, when the gridline of the conductive thread of making second conductive layer 230 and light shielding part 222, can adopt same mask plate exposure, etching to make, need not to aim at, reduce task difficulty.The conductive thread width that is appreciated that second conductive layer 230 also can be less than the gridline width of light shielding part 222.
Comprise a plurality of grid cells referring to Fig. 5 and 6, the first conductive layers 120, grid cell can be the regular polygon grid, as square, rhombus, regular hexagon etc., also can be random grid, can select according to the actual conditions working condition, has reduced production requirement.The conductive thread of first conductive layer 120 can be straight line, curve, also can be broken line, can select according to the actual conditions working condition, has reduced production requirement.The linear of lead silk thread that is appreciated that second conductive layer 230 can be straight line, curve or broken line also, and the shape of the grid cell that constitutes can be square, rhombus, regular hexagon etc., also can be random grid.
Therein among embodiment, as Fig. 1, Fig. 5 and shown in Figure 7, polaroid 110 comprises polaroid body 112, also can comprise impression glue-line 114, impression glue-line 114 is arranged at polaroid body 112 1 sides, first conductive layer 120 can adopt the impression mode to be formed at polaroid 110, specifically can print off conductive pattern structure corresponding groove with first conductive layer 120 away from a side pressure of polaroid body 112 at impression glue-line 114, filled conductive material and solidify and make first conductive layer 120 in the groove again, namely first conductive layer 120 is contained in groove.
Impression glue-line 114 is transparence, does not influence whole transmitance.The material of impression glue-line 114 specifically can be solvent-free ultra-violet curing acrylic resin, can also be visible-light curing resin or heat reactive resin.The thickness of impression glue-line 114 can be 2 μ m～10 μ m, both can avoid shallow excessively because impressing the thin excessively groove that makes of glue-line 114, cross the thin electric conductivity that influences and cause impressing first conductive layer 120 that obtains, it is blocked up and cause polaroid assembly 100 blocked up also can to avoid impressing glue-line 114.The present embodiment further groove degree of depth is less than the thickness of impression glue-line 114, and the conductive thread thickness of first conductive layer 120 is not more than the degree of depth of groove, can avoid first conductive layer 120 exposed and in subsequent technique by scratch.
In another embodiment, as Fig. 6, Fig. 8 and shown in Figure 9, polaroid 110 also can include only polaroid body 112, do not comprise impression glue-line 114, first conductive layer 120 directly is arranged at polaroid body 112 1 sides, first conductive layer 120 specifically can be by being coated with or plating conductive layer at polaroid body 112, and the etched mode of exposing again prepares.
Second conductive layer 230 also can be by being coated with or plating conductive layer, and the etched mode of exposing again prepares.Second conductive layer 230 can be arranged at light shielding part 222 away from a side of transparent substrates 210, as Fig. 1, Fig. 3, Fig. 7, Fig. 8 and shown in Figure 9.Second conductive layer 230 also can be arranged between light shielding part 222 and the transparent substrates 210, as shown in Figure 4.
Among embodiment, polarisation optical filtering module also can comprise substratum transparent (not shown in the accompanying drawing) therein, and transparent substrates 210 is bonding by substratum transparent and polaroid assembly 100 away from a side of filter layer 220 and second conductive layer 230.Particularly, transparent substrates 210 can be by substratum transparent and polaroid 110 side bonds away from first conductive layer 120, as Fig. 1 and shown in Figure 8, also can be the side bonds that first conductive layer 120 is set by substratum transparent and polaroid 110, as Fig. 7 and shown in Figure 9.Be appreciated that in other embodiments polarisation optical filtering module also can not comprise substratum transparent, transparent substrates 210 is connected with polaroid assembly 100 by other means.
Above-mentioned polarisation optical filtering module, can realize touch operation, polarized light function and filtering functions simultaneously, as an indispensable assembly in the display screen, when being used for display screen, can directly make display screen have touch controllable function, need not to assemble touch-screen at display screen again, not only be conducive to reduce the thickness of electronic product, also saved material and assembly cost simultaneously greatly.
The material that first conductive layer 120 and second conductive layer 230 are selected for use only expands all suitable conductive materials to transparent material by tradition; When conductive material is selected metal material for use, the energy consumption that can reduce resistance greatly and reduce touch-screen.
Above-mentioned polarisation optical filtering module with touch controllable function is double-deck conductive structure, and the design that need not to put up a bridge reduces task difficulty greatly.Adopt above-mentioned polarisation optical filtering module, (Liquid Crystal Display, LCD) signal to the touch-control effect disturbs can to reduce LCD.
The present invention also provides a kind of touch display screen, can be the LCDs of straight-down negative or side entering type light source.Touch display screen comprises TFT electrode, Liquid Crystal Module and the above-mentioned polarisation optical filtering module that stacks gradually.Because polarisation optical filtering module has touch operation, polarized light function and filtering functions simultaneously, makes touch display screen have the touch Presentation Function.Not only be conducive to reduce the thickness of electronic product, also saved material and assembly cost simultaneously greatly.
In addition, the present invention also provides a kind of polarisation optical filtering module making method, as shown in figure 10, may further comprise the steps:
Step S110: form first conductive layer in polaroid one side, obtain the polaroid assembly.
First conductive layer comprises a plurality of first conductive units that arrange along the first direction parallel interval, and each first conductive unit is intersected to form mutually by conductive thread.First conductive unit can be handled by broken string and obtain, and perhaps directly recharges conductive material by the groove that impresses predetermined pattern and obtains.
Among embodiment, step S110 can may further comprise the steps therein:
At polaroid body one side coating impression glue, obtain impressing glue-line.Polaroid body and impression glue-line constitute polaroid.
The impression glue-line is impressed away from a side of polaroid body and solidifies, obtain groove.
Filled conductive material and solidifying in the groove forms first conductive layer, obtains the polaroid assembly.
Be that polaroid comprises polaroid body and the impression glue-line that is arranged at polaroid body one side in the present embodiment, first conductive layer is contained in the impression glue-line away from a side of polaroid body.
The impression glue-line is transparence, does not influence whole transmitance.The material of impression glue-line specifically can be solvent-free ultra-violet curing acrylic resin, can also be visible-light curing resin or heat reactive resin.The thickness of impression glue-line can be 2 μ m～10 μ m, both can avoid crossing the thin electric conductivity that influences because the impression glue-line thin excessively groove that makes is shallow excessively and cause impressing first conductive layer that obtains, and it is blocked up and cause the polaroid assembly blocked up also can to avoid impressing glue-line.The present embodiment further groove degree of depth is less than the thickness of impression glue-line, and the conductive thread thickness of first conductive layer is not more than the degree of depth of groove, can avoid first conductive layer exposed and in subsequent technique by scratch.
In another embodiment, step S110 directly is coated with or plates conductive layer at the polaroid body, and the etched mode of exposing again forms first conductive layer, and namely polaroid does not comprise the impression glue-line.
Step S120: utilize mask plate to adopt the exposure etching technique, form filter layer and second conductive layer in transparent substrates the same side, obtain optical filter box.
Filter layer comprises light shielding part and optical filtering portion, and light shielding part is intersected to form mutually by gridline, and gridline intersects to form a plurality of grid cells mutually; Optical filtering portion comprises a plurality of filter units, and each filter unit is contained in the corresponding grid cell; Second conductive layer comprises a plurality of second conductive units that arrange along the second direction parallel interval, and each second conductive unit is intersected to form mutually by conductive thread, and second conductive unit can be handled by broken string equally and obtain.
Transparent substrates can be glass, polymethylmethacrylate (PMMA) or polyethylene terephthalate optically transparent materials such as (PET) and makes.Transparent substrates is substrate of glass in the present embodiment, can reduce production costs.Light shielding part is the photoresist that has black dyes, and it can adopt exposure, developing forms specific pattern.Optical filtering portion is the photoresist that has coloured dye, can adopt exposure, development to form specific pattern equally.Optical filtering portion comprise do periodic arrangement red (red, R) filter unit, it is green that (green, G) (blue, B) filter unit are used for making incident light be transformed into monochromatic light, realize filtering functions for filter unit and indigo plant.
First conductive layer and second conductive layer can be nesa coating, as tin indium oxide (ITO) film, perhaps be the staggered netted conductive layer that forms of conductive thread, what conductive thread can be in metal simple-substance line, metal alloy wire, carbon nano tube line, Graphene line, organic conductive macromolecule line or tin indium oxide (ITO) line is at least a.In the present embodiment, the conductive thread of first conductive layer and second conductive layer is the metal simple-substance line, and for example silver-colored line can improve electric conductivity.
First direction and second direction are not parallel to each other, and first conductive unit and second conductive unit form Inductance and Capacitance in the thickness direction insulation.The interval width of two adjacent first conductive units can be 0.5 micron to 50 microns, and the interval width of two adjacent second conductive units also can be 0.5 micron to 50 microns.
Therein among embodiment, the conductive thread of first conductive layer and second conductive layer intersects to form grid node mutually, the conductive thread live width of first conductive layer is 0.2 micron～5 microns, and the distance of adjacent two grid nodes is 50 microns～800 microns, to guarantee the first conductive layer visually-clear, namely guarantee visible light transmittance rate greater than 80%, this moment, the first conductive layer conductive thread can fall within on the gridline in the projection of filter layer, also can not fall within on the gridline.The conductive thread of second conductive layer falls within on the gridline in the projection of filter layer in the present embodiment, avoids conductive thread to be exposed to optical filtering portion and influences bright dipping and the appearance effect of optical filtering portion.In like manner, the conductive thread of second conductive layer also can not fall within on the gridline in the projection of filter layer, and the conductive thread of second conductive layer adopts transparent material, or its live width and grid node distance are limited to guarantee the second conductive layer visually-clear.
In another embodiment, the conductive thread of first conductive layer and second conductive layer all falls within on the gridline in the projection of filter layer, avoids conductive thread to be exposed to optical filtering portion and influences bright dipping and the appearance effect of optical filtering portion.Be appreciated that this moment for the conductive thread live width of first conductive layer, the distance that reaches adjacent two grid nodes can limit, and also can not limit.Operation can limit the conductive thread live width of first conductive layer less than the gridline live width of light shielding part for convenience, can further hang down the risk that conductive thread is exposed to the gridline side direction.
Therein among embodiment, the conductive thread of second conductive layer and the gridline of light shielding part are wide, second conductive layer can adopt the exposure etching to make, when the gridline of the conductive thread of making second conductive layer and light shielding part, can adopt same mask plate exposure, etching to make, need not to aim at, reduced task difficulty.The conductive thread width that is appreciated that second conductive layer also can be less than the gridline width of light shielding part.
First conductive layer comprises a plurality of grid cells, and grid cell can be the regular polygon grid, as square, rhombus, regular hexagon etc., also can be random grid, can select according to the actual conditions working condition, has reduced production requirement.The conductive thread of first conductive layer can be straight line, curve, also can be broken line, can select according to the actual conditions working condition, has reduced production requirement.The linear of lead silk thread that is appreciated that second conductive layer can be straight line, curve or broken line also, and the shape of the grid cell that constitutes can be square, rhombus, regular hexagon etc., also can be random grid.
Second conductive layer also can be by being coated with or plating conductive layer, and the etched mode of exposing again prepares.Second conductive layer can be formed at light shielding part away from a side of transparent substrates, also can be formed between light shielding part and the transparent substrates.
Among embodiment, second conductive layer is formed at light shielding part away from a side of transparent substrates therein, and step S120 can may further comprise the steps:
Step 1: be coated with or plate the photoresist that has black dyes at the whole face of transparent substrates one side surface, obtain initial light shield layer.
Step 2: plate or be coated with conductive material on whole of initial light shield layer surface, obtain initial conductive layer.
Step 3: be coated with first photoresist layer at the initial conduction laminar surface, utilize first mask plate corresponding with the gridline pattern of light shielding part that first photoresist layer is carried out exposure imaging.
Step 4: initial conductive layer is carried out etching, obtain initial second conductive layer.The conductive pattern of initial second conductive layer is consistent with the pattern of first mask plate, and initial second conductive layer comprises some grid cells.
Step 5: initial light shield layer is carried out etching, obtain light shielding part.The gridline pattern of light shielding part is consistent with the pattern of first mask plate.
Because the conductive pattern of initial second conductive layer and the gridline pattern of light shielding part are all consistent with the pattern of first mask plate, therefore the conductive thread of each grid cell of initial second conductive layer falls within on the gridline of a described grid cell in the projection correspondence of described filter layer
Step 6: be coated with second photoresist layer at initial second conductive layer surface, utilize second mask plate corresponding with the broken string position of second conductive layer that second photoresist layer is carried out exposure imaging.
Step 7: initial second conductive layer is carried out etching, initial second conductive layer is divided into second conductive unit that a plurality of parallel interval arrange, obtain second conductive layer.
Step 8: in the grid cell that the gridline of light shielding part constitutes, plate or be coated with filter unit successively, form optical filtering portion, obtain filter layer.Transparent substrates, second conductive layer and filter layer namely constitute optical filter box.
Before step 1, also can carry out plasma treatment to transparent substrates one side surface, remove the dirty of its surface, and make surface ionization, increase follow-up and cohesive force other material.Initial light shield layer is formed at transparent substrates through the surface after the plasma treatment.
Among another embodiment, second conductive layer is formed between light shielding part and the transparent substrates, and step S120 can may further comprise the steps:
Step 1: plate or be coated with conductive material whole of transparent substrates one side surface, obtain initial conductive layer.
Step 2: be coated with or plate the photoresist that has black dyes at the whole face of initial conduction laminar surface, obtain initial light shield layer.
Step 3: utilize the mask plate corresponding with the conductive pattern of second conductive layer that initial light shield layer is carried out exposure imaging.
Step 4: initial light shield layer is carried out etching, obtain light shielding part.
Step 5: initial conductive layer is carried out etching, conductive layer is divided into second conductive unit that a plurality of parallel interval arrange, obtain second conductive layer.The gridline pattern of light shielding part is consistent with the conductive pattern of second conductive layer, namely light shielding part has also been carried out broken string and has handled.
Step 6: in the grid cell that the gridline of light shielding part constitutes, plate or be coated with filter unit successively, form optical filtering portion, obtain filter layer.Transparent substrates, second conductive layer and filter layer namely constitute optical filter box.
In like manner, before step 1, also can carry out plasma treatment to transparent substrates one side surface, remove the dirty of its surface, and make surface ionization, increase follow-up and cohesive force other material.Conductive layer is formed at transparent substrates through the surface after the plasma treatment.
Step S130: the side of transparent substrates away from filter layer and second conductive layer is connected with the polaroid assembly, obtains polarisation optical filtering module.
Particularly, can be coated with away from a side of filter layer and second conductive layer in transparent substrates and add binder, bonding by binder and polaroid assembly, transparent substrates can be and the side bonds of polaroid away from first conductive layer, also can be the side bonds that first conductive layer is set with polaroid.Be appreciated that in other embodiments transparent substrates also can be connected with the polaroid assembly by other means.
The polarisation optical filtering module that is made by above-mentioned polarisation optical filtering module making method, can realize touch operation, polarized light function and filtering functions simultaneously, as an indispensable assembly in the display screen, when being used for display screen, can directly make display screen have touch controllable function, need not to assemble touch-screen at display screen again, not only be conducive to reduce the thickness of electronic product, also saved material and assembly cost simultaneously greatly.
Several embodiment to polarisation optical filtering module making method are elaborated below.
As Fig. 1 and the polarisation optical filtering module with touch control operation function shown in Figure 7, when first conductive layer 120 adopts the impression mode to prepare, second conductive layer 230 is covered in light shielding part 222 away from a side of transparent substrates 210, and light shielding part 222 is when being complete grid, and its manufacturing process is as follows:
(1) a surface coating at polaroid body 112 impresses glue-line 114, can adopt PMMA(polymethylmethacrylate in the present embodiment, polymethylmethacrylate) UV cured resin, and the impression block of using the conductive pattern with first conductive layer 120 to be nested impresses on impression glue-line 114 surfaces and solidifies, and obtains be used to the groove of accommodating first conductive layer 120.
(2) filled conductive material and solidifying in the groove, (conductive material can be metal simple-substance or alloy, carbon nano-tube, Graphene, organic conductive macromolecule or ITO to obtain first conductive unit of separate, insulation.Be preferably metal, as nanometer silver paste), obtain having the polaroid assembly 100 of first conductive layer 120.
(3) at first carry out the Plasma(plasma process on a surface of transparent substrates 210) handle, remove the dirty of transparent substrates 210 surfaces, and make surface ionization, increase follow-up and cohesive force other material.
(4) be coated with/plate the photoresist that has black dyes at the whole face in transparent substrates 210 above-mentioned treated surfaces, obtain initial light shield layer.
(5) at initial light shield layer surface whole plating conductive material or be coated with one deck conductive ink (conductive material or conductive ink can be metal simple-substance, metal alloy, carbon nano-tube, Graphene, organic conductive macromolecule or ITO.Present embodiment is argent), obtain conductive layer.
(6) be coated with first photoresist layer at conductive layer surface, utilize first mask plate corresponding with the gridline pattern of light shielding part 222 that first photoresist layer is exposed, develops.Only cover the photoresist consistent with the gridline pattern of light shielding part 222 on conductive layer, other local photoresist is removed.
(7) utilize lithographic technique that conductive layer is carried out etching, obtain initial second conductive layer consistent with the gridline pattern of light shielding part 222 (this moment conductive pattern of initial second conductive layer and the pattern unanimity of first mask plate, the conductive thread of initial second conductive layer is complete, the processing of breaking).
(8) utilize lithographic technique that initial light shield layer is carried out etching, obtain light shielding part 222.Because all be to utilize first photoresist layer to do to cover layer during to conductive layer and initial light shield layer etching, so the gridline pattern of the conductive pattern of initial second conductive layer and light shielding part 222 is consistent.
(9) be coated with second photoresist layer at initial second conductive layer surface consistent with the gridline pattern of light shielding part 222 again, with second mask plate corresponding with the broken string position of second conductive layer 230 second photoresist layer is exposed, develops, with initial second conductive layer need break the zone photoresist remove.
(10) utilize lithographic technique that second conductive layer is carried out etching again, the break conductive material of location of needs is etched away, form second conductive unit separate, insulation, obtain second conductive layer 230.
(11) plate/coat the R/G/B filter unit in the corresponding region gradation again, thereby obtain having the optical filter box 200 of second conductive layer 230.
(12) optical filter box 200 that will have the polaroid assembly 100 of first conductive layer 120 and have second conductive layer 230 bonds by transparent adhesive and solidifies, and obtains having the polarisation optical filtering module of touch control operation function.
Continuation is with reference to Fig. 1 and Fig. 7, polarisation optical filtering module with touch control operation function, first conductive layer 120 adopts the impression mode to prepare, second conductive layer 230 is covered in light shielding part 222 away from a side of transparent substrates 210, and the gridline pattern of light shielding part 222 is consistent with the conductive pattern of second conductive layer 230, also break when handling, its manufacturing process is as follows:
(1) a surface coating impression glue-line 114(present embodiment at polaroid body 112 adopts the PMMAUV cured resin), and the impression block of using the conductive pattern with first conductive layer 120 to be nested impresses on impression glue-line 114 surfaces and solidifies, and obtains be used to the groove of accommodating first conductive layer 120.
(2) filled conductive material and solidifying in the groove, (conductive material can be metal simple-substance, metal alloy, carbon nano-tube, Graphene, organic conductive macromolecule or ITO to obtain first conductive unit of separate, insulation.Be preferably metal, as nanometer silver paste), obtain having the polaroid assembly 100 of first conductive layer 120.
(3) at first carry out Plasma on a surface of transparent substrates 210 and handle, remove the dirty of transparent substrates 210 surfaces, and make surface ionization, increase follow-up and cohesive force other material.
(4) be coated with/plate the photoresist that has black dyes at the whole face in transparent substrates 210 above-mentioned treated surfaces, obtain initial light shield layer.
(5) in whole the plating in initial light shield layer surface conductive material plating or be coated with one deck conductive ink (conductive material or conductive ink can be metal simple-substance, metal alloy, carbon nano-tube, Graphene, organic conductive macromolecule or ITO.Present embodiment is argent), obtain conductive layer.
(6) at conductive layer surface coating photoresist layer, utilize the mask plate corresponding with the conductive pattern of second conductive layer 230 that photoresist layer is exposed, develops, only cover the photoresist consistent with the conductive pattern shape of second conductive layer 230 on conductive layer, other local photoresist is removed (comprising the broken string zone).
(7) utilize lithographic technique that conductive layer is carried out etching, form second conductive unit separate, insulation, obtain second conductive layer 230.
(8) utilize lithographic technique that initial light shield layer is carried out etching, obtain the light shielding part consistent with the conductive pattern of second conductive layer 230 222.Because utilizing same photoresist layer to do when conductive layer is carried out etching with initial light shield layer covers layer, light shielding part 222 has also been carried out broken string handled.
(9) plate/coat the R/G/B filter unit in the corresponding region gradation again, thereby obtain having the optical filter box 200 of second conductive layer 230.
(10) optical filter box 200 that will have the polaroid assembly 100 of first conductive layer 120 and have second conductive layer 230 bonds by transparent adhesive and solidifies, and obtains having the polarisation optical filtering module of touch control operation function.
Above-mentioned polarisation optical filtering module with touch control operation function, first conductive layer adopts the impression mode to prepare, and second conductive layer is covered between light shielding part and the transparent substrates, and the gridline pattern of light shielding part is consistent with the conductive pattern of second conductive layer, also break when handling, its manufacturing process is as follows:
(1) a surface coating at the polaroid body impresses glue-line (present embodiment adopts PMMA UV cured resin), and the impression block of using the conductive pattern with first conductive layer to be nested impresses on impression glue-line surface and solidifies, and obtains be used to the groove of accommodating first conductive layer.
(2) filled conductive material and solidifying in the groove, (conductive material can be metal simple-substance, metal alloy, carbon nano-tube, Graphene, organic conductive macromolecule or ITO to obtain first conductive unit of separate, insulation.Be preferably metal, as nanometer silver paste), just obtain having the polaroid assembly of first conductive layer.
(3) at first carry out Plasma on a surface of transparent substrates and handle, remove the dirty of transparent substrates surface, and make surface ionization, increase follow-up and cohesive force other material.
(4) whole the plating conductive material or be coated with one deck conductive ink (conductive material or conductive ink can be metal simple-substance, metal alloy, carbon nano-tube, Graphene, organic conductive macromolecule or ITO on the above-mentioned treated surface of transparent substrates.Present embodiment is argent), obtain conductive layer.
(5) be coated with/plate the photoresist that has black dyes at the whole face of conductive layer surface, obtain initial light shield layer.
(6) utilize the mask plate corresponding with the conductive pattern of second conductive layer that initial light shield layer is exposed, develop again, (this moment, light shielding part carried out the broken string processing to obtain the light shielding part consistent with the conductive pattern shape of second conductive layer, carry out etching with light shielding part as covering layer because when forming second conductive layer be, if the light shielding part processing of not breaking can not blocked conductive layer, can make the conductive layer processing of can't breaking).
(7) utilize lithographic technique that conductive layer is carried out etching, form second conductive unit separate, insulation, obtain second conductive layer.
(8) plate/coat the R/G/B filter unit in the corresponding region gradation again, thereby obtain having the optical filter box of second conductive layer.
(9) optical filter box that will have the polaroid assembly of first conductive layer and have second conductive layer bonds by transparent adhesive and solidifies, and obtains having the polarisation optical filtering module of touch control operation function.
The above embodiment has only expressed several embodiment of the present invention, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to claim of the present invention.Should be pointed out that for the person of ordinary skill of the art without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.
Claims (22)
1. a polarisation optical filtering module is characterized in that, comprising:
The polaroid assembly comprises polaroid, and is arranged at first conductive layer of described polaroid one side, and described first conductive layer comprises a plurality of first conductive units that arrange at interval along first direction;
Optical filter box, comprise transparent substrates, and be positioned at filter layer and second conductive layer of described transparent substrates the same side, described filter layer comprises light shielding part and optical filtering portion, described light shielding part is intersected to form mutually by gridline, and described gridline intersects to form a plurality of grid cells mutually; Described optical filtering portion comprises a plurality of filter units, and each described filter unit is contained in the corresponding described grid cell; Described second conductive layer comprises a plurality of second conductive units that arrange along the second direction parallel interval, and each described second conductive unit is intersected to form mutually by conductive thread, and described second conductive unit comprises some grid cells;
Described first direction and second direction are not parallel to each other, and described first conductive unit and second conductive unit insulate at thickness direction; The conductive thread of each grid cell of described second conductive layer falls within on the gridline of a described grid cell in the projection correspondence of described filter layer.
2. polarisation optical filtering module according to claim 1 is characterized in that, the conductive thread of described second conductive layer and described gridline are wide.
3. polarisation optical filtering module according to claim 1 is characterized in that, described first conductive unit is intersected to form mutually by conductive thread, and the conductive thread of described first conductive layer all falls within on the described gridline in the projection of described filter layer.
4. polarisation optical filtering module according to claim 1, it is characterized in that, described polaroid comprises the polaroid body and is arranged at the impression glue-line of described polaroid body one side, described impression glue-line offers groove away from a side of described polaroid body, and described first conductive layer is contained in described groove.
5. polarisation optical filtering module according to claim 4 is characterized in that, the degree of depth of described groove is less than the thickness of described impression glue-line, and the conductive thread thickness of described first conductive layer is not more than the degree of depth of described groove.
6. polarisation optical filtering module according to claim 1 is characterized in that, the interval width of two adjacent described first conductive units is 0.5 micron～50 microns, and the interval width of two adjacent described second conductive units is 0.5 micron～50 microns.
7. polarisation optical filtering module according to claim 1 is characterized in that, described second conductive layer is arranged at described light shielding part away from a side of described transparent substrates, or is arranged between described light shielding part and the described transparent substrates.
8. polarisation optical filtering module according to claim 1 is characterized in that, also comprises substratum transparent, and described transparent substrates is bonding by described substratum transparent and described polaroid assembly away from a side of described filter layer and second conductive layer.
9. a polarisation optical filtering module is characterized in that, comprising:
The polaroid assembly, comprise polaroid, and be arranged at first conductive layer of described polaroid one side, described first conductive layer comprises a plurality of first conductive units that arrange along the first direction parallel interval, each described first conductive unit is intersected to form mutually by conductive thread, and described conductive thread intersects to form grid node mutually;
Optical filter box, comprise transparent substrates, and be positioned at filter layer and second conductive layer of described transparent substrates the same side, described filter layer comprises light shielding part and optical filtering portion, described light shielding part is intersected to form mutually by gridline, and described gridline intersects to form a plurality of grid cells mutually; Described optical filtering portion comprises a plurality of filter units, and each described filter unit is contained in the corresponding described grid cell; Described second conductive layer comprises a plurality of second conductive units that arrange along the second direction parallel interval, and each described second conductive unit is intersected to form mutually by conductive thread;
Described first direction and second direction are not parallel to each other, and described first conductive unit and second conductive unit insulate at thickness direction; The conductive thread live width of described first conductive layer is 0.2 micron～5 microns, and the distance of adjacent two grid nodes is 50 microns～800 microns; The conductive thread of described second conductive layer falls within on the described gridline in the projection of described filter layer.
10. polarisation optical filtering module according to claim 9 is characterized in that, the conductive thread of described second conductive layer and described gridline are wide.
11. polarisation optical filtering module according to claim 9, it is characterized in that, described polaroid comprises the polaroid body and is arranged at the impression glue-line of described polaroid body one side, described impression glue-line offers groove away from a side of described polaroid body, and described first conductive layer is contained in described groove.
12. polarisation optical filtering module according to claim 11 is characterized in that the degree of depth of described groove is less than the thickness of described impression glue-line, the conductive thread thickness of described first conductive layer is not more than the degree of depth of described groove.
13. polarisation optical filtering module according to claim 9 is characterized in that, the interval width of two adjacent described first conductive units is 0.5 micron～50 microns, and the interval width of two adjacent described second conductive units is 0.5 micron～50 microns.
14. polarisation optical filtering module according to claim 9 is characterized in that, described second conductive layer is arranged at described light shielding part away from a side of described transparent substrates, or is arranged between described light shielding part and the described transparent substrates.
15. polarisation optical filtering module according to claim 9 is characterized in that, also comprises substratum transparent, described transparent substrates is bonding by described substratum transparent and described polaroid assembly away from a side of described filter layer and second conductive layer.
16. a touch display screen is characterized in that, comprises the TFT electrode that stacks gradually, Liquid Crystal Module and as any described polarisation optical filtering module in the claim 1 to 15.
17. a polarisation optical filtering module making method is characterized in that, may further comprise the steps:
Form first conductive layer in polaroid one side, obtain the polaroid assembly; Described first conductive layer comprises a plurality of first conductive units that arrange along the first direction parallel interval, and each described first conductive unit is intersected to form mutually by conductive thread;
Utilize mask plate to adopt the exposure etching technique, form filter layer and second conductive layer in transparent substrates the same side, obtain optical filter box; Described filter layer comprises light shielding part and optical filtering portion, and described light shielding part is intersected to form mutually by gridline, and described gridline intersects to form a plurality of grid cells mutually; Described optical filtering portion comprises a plurality of filter units, and each described filter unit is contained in the corresponding described grid cell; Described second conductive layer comprises a plurality of second conductive units that arrange along the second direction parallel interval, and each described second conductive unit is intersected to form mutually by conductive thread; Described first direction and second direction are not parallel to each other, and described first conductive unit and second conductive unit insulate at thickness direction; The conductive thread of described second conductive layer falls within on the described gridline in the projection of described filter layer;
The side of described transparent substrates away from described filter layer and second conductive layer is connected with described polaroid assembly, obtains polarisation optical filtering module.
18. polarisation optical filtering module making method according to claim 17 is characterized in that, describedly forms first conductive layer in polaroid one side, the step that obtains the polaroid assembly may further comprise the steps:
At polaroid body one side coating impression glue, obtain impressing glue-line; Described polaroid body and impression glue-line constitute described polaroid;
Described impression glue-line is impressed away from a side of described polaroid body and solidifies, obtain groove;
Filled conductive material and solidifying in the described groove forms described first conductive layer, obtains described polaroid assembly.
19. polarisation optical filtering module making method according to claim 17 is characterized in that, the described mask plate that utilizes adopts the exposure etching technique, forms filter layer and second conductive layer in transparent substrates the same side, and the step that obtains optical filter box may further comprise the steps:
Be coated with or plate the photoresist that has black dyes at the whole face of described transparent substrates one side surface, obtain initial light shield layer;
Plate or be coated with conductive material on whole of described initial light shield layer surface, obtain initial conductive layer;
Be coated with first photoresist layer at described initial conduction laminar surface, utilize first mask plate corresponding with the gridline pattern of described light shielding part that described first photoresist layer is carried out exposure imaging;
Described initial conductive layer is carried out etching, obtain initial second conductive layer; The conductive pattern of described initial second conductive layer is consistent with the pattern of described first mask plate;
Described initial light shield layer is carried out etching, obtain light shielding part; The gridline pattern of described light shielding part is consistent with the pattern of described first mask plate;
Be coated with second photoresist layer at described initial second conductive layer surface, utilize second mask plate corresponding with the broken string position of described second conductive layer that described second photoresist layer is carried out exposure imaging;
Described initial second conductive layer is carried out etching, described initial second conductive layer is divided into second conductive unit that a plurality of parallel interval arrange, obtain described second conductive layer;
In the grid cell that the gridline of described light shielding part constitutes, plate or be coated with filter unit successively, form optical filtering portion, obtain described filter layer; Described transparent substrates, second conductive layer and filter layer namely constitute described optical filter box.
20. polarisation optical filtering module making method according to claim 19 is characterized in that, describedly is coated with or plates the photoresist that has black dyes at the whole face of described transparent substrates one side surface, obtains may further comprise the steps before the step of initial light shield layer:
Described transparent substrates one side surface is carried out plasma treatment; Described initial light shield layer is formed at described transparent substrates through the surface after the described plasma treatment.
21. polarisation optical filtering module making method according to claim 17 is characterized in that, the described mask plate that utilizes adopts the exposure etching technique, forms filter layer and second conductive layer in transparent substrates the same side, and the step that obtains optical filter box may further comprise the steps:
Plate or be coated with conductive material whole of described transparent substrates one side surface, obtain initial conductive layer;
Be coated with or plate the photoresist that has black dyes at the whole face of described initial conduction laminar surface, obtain initial light shield layer;
Utilize the mask plate corresponding with the conductive pattern of described second conductive layer that described initial light shield layer is carried out exposure imaging;
Described initial light shield layer is carried out etching, obtain described light shielding part;
Described initial conductive layer is carried out etching, described conductive layer is divided into second conductive unit that a plurality of parallel interval arrange, obtain described second conductive layer; The gridline pattern of described light shielding part is consistent with the conductive pattern of described second conductive layer;
In the grid cell that the gridline of described light shielding part constitutes, plate or be coated with filter unit successively, form optical filtering portion, obtain described filter layer; Described transparent substrates, second conductive layer and filter layer namely constitute described optical filter box.
22. polarisation optical filtering module making method according to claim 21 is characterized in that, plates or be coated with conductive material whole of described transparent substrates one side surface, obtains may further comprise the steps before the step of conductive layer:
Described transparent substrates one side surface is carried out plasma treatment; Described conductive layer is formed at described transparent substrates through the surface after the described plasma treatment.
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