CN103345326A - Optical filter box and touch display screen - Google Patents
Optical filter box and touch display screen Download PDFInfo
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- CN103345326A CN103345326A CN2013102825362A CN201310282536A CN103345326A CN 103345326 A CN103345326 A CN 103345326A CN 2013102825362 A CN2013102825362 A CN 2013102825362A CN 201310282536 A CN201310282536 A CN 201310282536A CN 103345326 A CN103345326 A CN 103345326A
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Abstract
The invention relates to an optical filter box which comprises a glass substrate, a first conducting layer, an imprinting glue layer, a second conducting layer, a shading matrix layer and a color photoresist layer. The first conducting layer comprises first conducting patterns. The imprinting glue layer is arranged on the glass substrate. The second conducting layer comprises second conducting patterns, the second conducting patterns comprise continuous conducting grids, and the first conducting layer and the second conducting layer are arranged at intervals in the thickness direction of the imprinting glue layer to form a sensing structure. The wire width of one of a first conducting wire of the first conducting layer and a second conducting wire of the second conducting layer is 0.2-5micrometers, and projection of the other one on the shading matrix layer falls into the grids. The optical filter box can achieve touch operation and filtering, is beneficial to reducing the thickness of electronic equipment, and saves materials and assembly cost. The invention further provides a touch display screen.
Description
Technical field
The present invention relates to the plane and show the field, particularly relate to the touch display screen of a kind of optical filter box and this optical filter box of use.
Background technology
Touch-screen is a kind of inductive arrangement that receives the Touching controlling lamp input signal.Touch-screen has given information interaction brand-new looks, is extremely attractive brand-new information interaction equipment.The development of touch screen technology has caused the common concern of domestic and international information medium circle, has become the Chaoyang new high-tech industry that the photoelectricity industry is a dark horse.
At present, having the electronic product that touches Presentation Function includes display screen and is positioned at touch-screen on the display screen.Yet, touch-screen as with display screen assembly independently, when being used for the electronic product that some realize man-machine interactions, all need to order according to the size of display screen, assemble afterwards, with the formation touch display screen, but touch display screen can have touch control operation and Presentation Function simultaneously again.The assembling of existing touch-screen and display screen mainly contains dual mode, and namely frame pastes and full the applying.The frame subsides are to be fitted in the edge of touch-screen and display screen, and full applying is whole the applying of upper surface with lower surface and the display screen of touch-screen.
Display screen mainly comprises polaroid, optical filter box, Liquid Crystal Module and thin film transistor (TFT) (the Thin Film Transistor of stack successively, TFT), therefore display screen itself has had bigger thickness, and when continuing on the display screen applying touch-screen, to further increase its thickness, moreover, many one attaching process, just meaning has increased the bad probability of product, increases production cost of products greatly.
Summary of the invention
Based on this, the touch display screen that is necessary to provide the effective optical filter box of a kind of visually-clear and uses this optical filter box.
A kind of optical filter box comprises:
Glass baseplate;
First conductive layer comprises first conductive pattern of being located on the described glass baseplate, and described first conductive pattern comprises continuous conductive grid, and described conductive grid is intersected to form by conductive thread;
The impression glue-line is arranged on described glass baseplate and described first conductive pattern, and described first conductive pattern is embedded in the side of described impression glue-line near described first surface;
Second conductive layer, comprise and being embedded at second conductive pattern of described impression glue-line away from a side of described glass baseplate, described second conductive pattern comprises the second continuous conductive grid, described second conductive grid is intersected to form by second conductive thread, and described first conductive pattern and described second conductive pattern space on the thickness direction of described impression glue-line forms induction structure;
The shading matrix layer is arranged on described impression glue-line away from a side of described glass baseplate, and described shading matrix layer comprises cross one another ruling, and described ruling intersects to form a plurality of grid cells; And
The colorama resistance layer is arranged on described impression glue-line away from a side of described glass baseplate, comprises a plurality of chromatic photoresists unit, and each described chromatic photoresist unit is arranged in a described grid cell;
Wherein, in described first conductive thread and second conductive thread wherein one live width be 0.2 micron～5 microns, another person falls in the described ruling in the projection of described shading matrix layer in described first conductive thread and second conductive thread.
Therein among embodiment, the live width of described first conductive thread is 0.2 micron～5 microns, the distance of adjacent two grid nodes is 50 microns～500 microns, and the projection of described second conductive thread on described shading matrix layer falls on the ruling of described shading matrix layer.
Among embodiment, the width of described second conductive thread is less than the width of described ruling therein.
Therein among embodiment, described first conductive grid comprises a plurality of first grid cells, each first grid cell accommodates at least one chromatic photoresist unit in the projection of described colorama resistance layer, described second conductive grid comprises a plurality of second grid cells, and each second grid cell accommodates at least one chromatic photoresist unit in the projection of described colorama resistance layer.
Therein among embodiment, described first conductive grid comprises a plurality of first grid cells, described second conductive grid comprises a plurality of second grid cells, and the quantity of each first grid cell in the chromatic photoresist unit that the projection of described colorama resistance layer is held is not less than each second grid cell in the quantity of the chromatic photoresist unit that the projection of described colorama resistance layer is held.
Therein among embodiment, described first conductive layer is handled first conductive pattern that obtains a plurality of spaces by whole complete conductive grid broken, described second conductive layer is handled second conductive pattern that obtains a plurality of spaces by whole complete conductive grid broken.
Therein among embodiment, the interval width of two adjacent described first conductive patterns in described first conductive layer is 0.5 micron～50 microns, and the interval width of two adjacent described second conductive patterns in described second conductive layer is 0.5 micron～50 microns.
Among embodiment, the thickness of described colorama resistance layer is more than or equal to the thickness of described shading matrix layer therein.
Therein among embodiment, described impression glue-line offers the groove of shape and described second conductive pattern coupling, described second conductive pattern is contained in the described groove, the degree of depth of described groove is less than the thickness of described impression glue-line, and the thickness of described second conductive pattern is smaller or equal to the degree of depth of described groove.
A kind of touch display screen comprises the film crystal pipe electrode, Liquid Crystal Module, optical filter box and the polaroid that stack gradually, and described optical filter box is as above any described optical filter box.
Above-mentioned optical filter box and use the touch display screen of this optical filter box, optical filter box can be realized touch control operation and filtering functions simultaneously, combination as indispensable two assemblies in the display screen, when being used for display screen, can directly make display screen have touch controllable function, need not to assemble a touch-screen at display screen again, not only be conducive to reduce the thickness of electronic product, also saved material and assembly cost simultaneously greatly.
Description of drawings
Fig. 1 is the structural representation of the touch display screen of an embodiment;
Fig. 2 is the diagrammatic cross-section of optical filter box shown in Figure 1;
Fig. 3 is the schematic perspective view of the optical filter box of an embodiment;
Fig. 4 is the vertical view of a conductive layer shown in Figure 3;
Fig. 5 is the diagrammatic cross-section of the optical filter box of another embodiment;
Fig. 6 is the diagrammatic cross-section of the optical filter box of another embodiment;
Fig. 7 is the structural representation of the conductive thread of an embodiment;
Fig. 8 is the structural representation of the conductive thread of another embodiment;
Fig. 9 is the structural representation of the conductive thread of another embodiment;
Figure 10 is the structural representation of the conductive thread of another embodiment.
Embodiment
For above-mentioned purpose of the present invention, feature and advantage can be become apparent more, below in conjunction with accompanying drawing the specific embodiment of the present invention is described in detail.A lot of details have been set forth in the following description so that fully understand the present invention.But the present invention can implement much to be different from alternate manner described here, and those skilled in the art can do similar improvement under the situation of intension of the present invention, so the present invention is not subjected to the restriction of following public concrete enforcement.
Need to prove that when element is called as " being fixed in " another element, can directly can there be element placed in the middle in it on another element or also.When an element is considered to " connection " another element, it can be to be directly connected to another element or may to have element placed in the middle simultaneously.
Unless otherwise defined, the employed all technology of this paper are identical with the implication that belongs to those skilled in the art's common sense of the present invention with scientific terminology.Employed term is not intended to be restriction the present invention just in order to describe the purpose of specific embodiment in instructions of the present invention herein.Term as used herein " and/or " comprise one or more relevant Listed Items arbitrarily with all combinations.
The present invention proposes a kind of optical filter box and uses the touch display screen of this optical filter box.This optical filter box can be realized touch operation and optical filter function, thereby makes touch display screen have the touch Presentation Function.
See also Fig. 1, the touch display screen 100 of an embodiment comprises following polaroid 10, TFT electrode 20, Liquid Crystal Module 30, public electrode 40, diaphragm 50, the optical filter box 200 that stacks gradually and goes up polaroid 60.
(Thin Film Transistor, TFT) structure and the function of electrode 20, Liquid Crystal Module 30, public electrode 40, diaphragm 50 and last polaroid 60 can be identical with existing product, do not repeat them here for the following polaroid 10 of present embodiment, thin film transistor (TFT).
Be appreciated that for using backlight as polarized light source, as the OLED polarized light source, then need not down polaroid 10, only need to go up polaroid 60 and get final product.Diaphragm 50 also can omit.
Following emphasis is described optical filter box 200.
See also Fig. 2, optical filter box 200 comprise glass baseplate 22, impression glue-line 24, first conductive layer 25, second conductive layer 26, shading matrix layer (Black Matrix, BM) 27, colorama resistance layer 28.First conductive layer 25 and second conductive layer, 26 spaces form induction structure.
First conductive layer 25 is arranged on impression glue-line 24 near a side of glass baseplate 22.First conductive layer 25 comprises first conductive pattern 252.First conductive pattern 252 can obtain through etching by at glass baseplate 22 plating/matel coated layers again.The material of metal level can be at least a in the metals such as gold, silver, copper, aluminium, zinc, tin and molybdenum.
See also Fig. 3, first conductive pattern 252 comprises some first conductive grids, and first conductive grid is intersected to form by the first conductive thread a, and the first adjacent conductive thread a intersects to form grid node.The basic grid that the first conductive thread a forms can be regular polygon, as square, rhombus, regular hexagon etc.The basic grid that conductive thread a forms can also be random grid.The first conductive thread a can straight line, curve or broken line.See also Fig. 2, in the present embodiment, first projection of conductive thread a on shading matrix layer 26 falls in the ruling of shading matrix layer 26.When optical filter box 200 was applied to product, generalized case was embedded at first conductive layer, 25 easier being seen by user's naked eyes of impression glue-line 24 and influences user's experience sense.So the first conductive thread a is fallen within gridline and is not exceeded gridline in the projection of shading matrix layer 26, do not influence light transmission, be conducive to improve user's experience sense.
In one embodiment, the live width of the first conductive thread a is 0.2 micron～5 microns, conductive thread a intersects to form grid node mutually, distance between adjacent two grid nodes is 50 microns～500 microns, under the condition that satisfies above-mentioned live width and spacing, can realize the transparent effect of the first conductive thread a, namely naked eyes are invisible.
Impression glue-line 24 arranges on the first surface 222 of glass baseplate 22, and covers first conductive pattern 252.First conductive layer 25 is arranged on impression glue-line 24 near a side of glass baseplate 22.Impression glue-line 24 is transparence, and thickness is 2 microns～10 microns, does not influence whole transmitance.The material of impression glue-line 24 can be solvent-free ultra-violet curing acrylic resin, visible-light curing resin or heat reactive resin.
See also Fig. 2, second conductive layer 26 is arranged on impression glue-line 24 away from a side of glass baseplate 22.Second conductive layer 26 comprises second conductive pattern 262.Second conductive pattern 262 can be by the groove 242 that has shape and described second conductive pattern 262 to mate away from a side of glass baseplate 22 at impression glue-line 24, makes after the filled conductive material cured in groove 242 structures again.The degree of depth of groove 242 is less than the thickness of impression glue-line 24, and the thickness of second conductive pattern 262 is smaller or equal to the degree of depth of groove 242.The conductive material of filling can be metal, carbon nano-tube, and Graphene, organic conductive macromolecule and ITO are preferably metal, as nanometer silver paste.In present embodiment, the second conductive thread b is identical with the material of the first conductive thread a.In other embodiment, the material of the second conductive thread b also can be different with the material of the first conductive thread a.When adopting the impression mode, the degree of depth of groove 242 is less than the thickness of impression glue-line 24, and the thickness of the conductive material of accommodating in the groove 242 is smaller or equal to the degree of depth of groove 242.Can avoid conductive layer in successive process by scratch.
See also Fig. 3, second conductive pattern 262 comprises the second continuous conductive grid, and second conductive grid is intersected to form by the second conductive thread b.The basic grid that the second conductive thread b forms can be regular polygon, as square, rhombus or regular hexagon etc.In other embodiments, the basic grid of second conductive thread b formation can also be random grid.The second conductive thread b can straight line, curve or broken line.The live width of the second conductive thread b is 0.2 micron～5 microns, the second conductive thread b intersects to form grid node mutually, distance between adjacent two grid nodes is 50 microns～500 microns, under the condition that satisfies above-mentioned live width and spacing, can realize the transparent effect of the second conductive thread b, namely naked eyes are invisible.
See also Fig. 4, first conductive pattern 252 and second conductive pattern 262 can be separated to form whole complete conductive grid for handling by broken string.Wherein, a plurality of first conductive patterns 252 and the 262 difference space insulation of a plurality of second conductive pattern form induction structure.It is 0.5 micron～50 microns to the first conductive thread a of whole the first conductive layer 25 internodal distance of first conductive pattern 252, the first conductive thread a, two broken strings that processing (seeing square frame c place on the figure) obtains the space insulation that breaks.252 separate, insulation that a plurality of first conductive patterns conduct electricity.Equally, the second conductive thread b of whole second conductive layer 26 break that handling breaks being handled the internodal distance of second conductive pattern 262, the second conductive thread b, two broken strings that obtains the space insulation is 0.5 micron～50 microns.262 separate, insulation that a plurality of second conductive patterns conduct electricity.
In one embodiment, see also Fig. 5, the second conductive thread b all falls on the ruling of shading matrix layer 27 in the projection of shading matrix layer 27 in the first conductive thread a of first conductive layer 25 and second conductive layer 26.And the width of the first conductive thread a and the second conductive thread b is exposed to the outer risk of ruling less than the width of ruling to reduce by the first conductive thread a and the second conductive thread b.
In another embodiment, see also Fig. 6, the second conductive thread b all falls on the ruling of shading matrix layer 27 in the projection of shading matrix layer 27 in the first conductive thread a of first conductive layer 25 and second conductive layer 26.The width of the first conductive thread a and the second conductive thread b can equate with the width of ruling.Like this silk thread live width can do wide, to reduce the manufacture difficulty of conductive thread.And that can not expose that shading matrix layer 27 influences chromatic photoresist to chromatic photoresist zone goes out light effect and product appearance effect.
The basic grid of the second conductive thread b in the first conductive thread a of first conductive layer 25 and second conductive layer 26 (first grid cell, 212, the second grid cells 232) shape can with the similar fitgures that are shaped as of shading matrix layer 27 grid.Namely similar to the shape of the chromatic photoresist unit 282 of colorama resistance layer 28, the projection of intersection point on shading matrix layer 27 of the grid of the first conductive thread a and the second conductive thread b overlaps with the ruling intersection point of shading matrix layer 27 respectively.
See also Fig. 7, in one embodiment, first conductive grid 21 comprises a plurality of first grid cells 212, each first grid cell 212 accommodates at least one chromatic photoresist unit 282 in the projection of described colorama resistance layer 28, second conductive grid 23 comprises a plurality of second grid cells 232, and each second grid cell 232 accommodates at least one chromatic photoresist unit 282 in the projection of colorama resistance layer 28.
In another embodiment, first conductive grid 21 comprises a plurality of first grid cells 212, second conductive grid 23 comprises a plurality of second grid cells 232, and the quantity of each first grid cell 212 in the chromatic photoresist unit 282 that the projection of colorama resistance layer 28 is held is not less than each second grid cell 232 in the quantity of the chromatic photoresist unit 282 that the projection of colorama resistance layer 28 is held.
At least one chromatic photoresist unit 282 is held in the projection of basic grid unit on colorama resistance layer 28 of the first conductive thread a and the second conductive thread b respectively, wherein is divided into four kinds of situations:
1, the first conductive grid unit 212(, the second conductive grid unit 232 first conductive grid 21(, second conductive grid 23 of the Xing Chenging first conductive thread a(, the second conductive thread b))) corresponding one by one with chromatic photoresist unit 282, the i.e. first conductive thread a(, the second conductive thread b) mesh lines is apart from being shading matrix layer 27 and adjacent two distance between center lines, as shown in Figure 7.2, only on first axial (for example transverse axis), the first conductive thread a(, the second conductive thread b) mesh lines is apart from being the shading matrix layer 27 same axially integral multiple of adjacent two distance between center lines, namely at the first conductive thread a(of X direction, the second conductive thread b) the projection of basic grid unit on shading matrix layer 27 comprise a plurality of complete chromatic photoresist unit 282, as shown in Figure 8.3, only on second axial (for example longitudinal axis), the first conductive thread a(, the second conductive thread b) mesh lines is apart from being the shading matrix layer 27 same axially integral multiple of adjacent two distance between center lines, namely at the first conductive thread a(of y direction, the second conductive thread b) the projection of basic grid unit on shading matrix layer 27 comprise a plurality of complete chromatic photoresist unit 282, as shown in Figure 9.4, first axially and second axially on, the first conductive thread a(, the second conductive thread b) mesh lines is apart from all being the shading matrix layer 27 same axially integral multiple of adjacent two distance between center lines, namely at the first conductive thread a(of transverse axis and y direction, the second conductive thread b) the projection of basic grid unit on shading matrix layer 27 all comprise a plurality of complete chromatic photoresist unit 282, as shown in figure 10.
Please consult Fig. 2 again, shading matrix layer 27 is arranged on impression glue-line 24 and second surface of conductive layer 26 away from glass baseplate 22.Shading matrix layer 27 comprises cross one another ruling, and these rulings intersect to form a plurality of grid cells.Grid cell is used for accommodating the chromatic photoresist material.The material of shading matrix layer 27 is photoresist or the crome metal that has black dyes, and it can adopt exposure, develop and make.
Please consult Fig. 5 again, in one embodiment, the thickness of colorama resistance layer 28 equals the thickness of shading matrix layer 27.In another embodiment, as shown in Figure 6, the thickness of colorama resistance layer 28 can increase the light emission rate of light like this greater than the thickness of shading matrix layer 27.If the thickness of colorama resistance layer 28 is less than the thickness of shading matrix layer 27, looking then that colorama resistance layer 28 is similar to is embedded in shading matrix layer 27, shading matrix layer 27 covers light, therefore 26 light that come out can only be seen from the front from the colorama resistance layer, the side is then blocked by shading matrix layer 27 easily, is unfavorable for bright dipping.And work as the thickness of colorama resistance layer 28 greater than the thickness of shading matrix layer 27; the top of colorama resistance layer 28 is similar to and embeds in the impression glue-line 24; impression glue-line 24 is filled and led up the gap between the chromatic photoresist, and impression glue-line 24 plays the effect of protection chromatic photoresist and grid moulding simultaneously.
The above-mentioned optical filter box 200 that has the touch-control effect, its manufacturing process is as follows:
(1) carries out plasma (Plasma) on a surface of glass baseplate and handle, remove the dirty of glass surface, and make surface ionization, increase follow-up and cohesive force other material.
(2) whole metal cladding or be coated with the layer of metal conductive ink on the surface of the glass baseplate of handling through Plasma.Present embodiment is adopted as argent.
(3) coating one deck photoresist through overexposure-developing technique, only keeps the photoresist that covers first conductive layer part, and the photoresist that all the other are local is removed.
(4) utilize metal etch liquid that above-mentioned metal level is carried out etching, obtain the grid silk thread of first conductive layer of required pattern.
(5) at whole coating impression of the above-mentioned glass basic surface that covers first conductive layer glue, and use the impression block that is nested with second conductive pattern to impress on impression glue surface and solidify, obtain the grid groove of the required second conductive layer correspondence.Present embodiment adopts polymethylmethacrylate, and (polymethyl methacrylate, PMMA) the UV cured resin is as impression glue.
(6) filled conductive material and solidifying in the grid groove obtains second conductive layer.Conductive material can be metal, carbon nano-tube, and Graphene, organic conductive macromolecule and ITO form the conductive grid that conductive thread constitutes; Be preferably metal, as nanometer silver paste.
(7) be coated with/plate the shading matrix material at above-mentioned impression glue and the whole face of second conductive layer surface, adopt exposure-developing technique, the shading matrix material of chromatic photoresist corresponding region is removed, obtain the shading matrix layer.
(8) plate/coat the R/G/B chromatic photoresist in the corresponding region gradation, obtain the colorama resistance layer.
In the touch display screen of above-mentioned optical filter box and this optical filter box of use, comprise glass substrate, be arranged on impression glue-line on the glass substrate, be distributed in first conductive layer and second conductive layer of the both sides of impression glue-line, and being arranged on shading matrix layer and the colorama resistance layer that impresses on the glue-line, first conductive layer and second conductive layer form induction structure in the space insulation of impression bondline thickness direction.As an indispensable assembly in the display screen, when being used for display screen, can directly make display screen have touch controllable function, need not again at display screen assembling one touch-screen, not only be conducive to reduce the thickness of electronic product, also saved material and assembly cost simultaneously greatly.The preparation technology of this optical filter box is simple, operates controlledly, and cost is lower, applicable to suitability for industrialized production.
Further, in first conductive thread and second conductive thread wherein one live width be 0.2 micron～5 microns, and the distance of adjacent two grid nodes is 50 microns～500 microns, and another person falls on the described ruling in the projection of described shading matrix layer in described first conductive thread and second conductive thread.Guarantee that thus the visually-clear effect is better.And conductive layer is arranged on the both sides of impression glue-line, has avoided the scratch of conductive layer.In addition, above-mentioned optical filter box and touch display screen also have following advantage:
(1) first conductive thread obtains by metal etch; Second conductive thread adopts the impression mode to make, by this dual mode, conductive thread in first conductive layer and second conductive layer all can be visually-clear, and therefore, the material that conductive pattern is selected for use can only expand all suitable conductive materials to transparent material by tradition.When the conductive material of conductive thread is selected metal material for use, the energy consumption that can reduce resistance greatly and reduce touch-screen.
(2) above-mentioned optical filter box with touch controllable function is double-deck conductive structure, and the design that need not to put up a bridge reduces task difficulty greatly.
(3) above-mentioned conductive pattern adopts the metal grill structure, adopts imprint process to make, compared to the technology of traditional ITO film as conductive layer, mesh shape can form in a step, and technology is simple, does not need expensive device such as sputter, evaporation, the yield height is fit to large tracts of land, production in enormous quantities.And if with metal replacement ITO, material cost reduces greatly, owing to do not need to use etching technics, can not cause the waste of conductive, and environmentally friendly.
The above embodiment has only expressed several embodiment of the present invention, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to claim of the present invention.Should be pointed out that for the person of ordinary skill of the art without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.
Claims (10)
1. an optical filter box is characterized in that, comprising:
Glass baseplate;
First conductive layer comprises first conductive pattern of being located on the described glass baseplate, and described first conductive pattern comprises continuous conductive grid, and described conductive grid is intersected to form by conductive thread;
The impression glue-line is arranged on described glass baseplate and described first conductive pattern, and described first conductive pattern is embedded in the side of described impression glue-line near described first surface;
Second conductive layer, comprise and being embedded at second conductive pattern of described impression glue-line away from a side of described glass baseplate, described second conductive pattern comprises the second continuous conductive grid, described second conductive grid is intersected to form by second conductive thread, and described first conductive pattern and described second conductive pattern space on the thickness direction of described impression glue-line forms induction structure;
The shading matrix layer is arranged on described impression glue-line away from a side of described glass baseplate, and described shading matrix layer comprises cross one another ruling, and described ruling intersects to form a plurality of grid cells; And
The colorama resistance layer is arranged on described impression glue-line away from a side of described glass baseplate, comprises a plurality of chromatic photoresists unit, and each described chromatic photoresist unit is arranged in a described grid cell;
Wherein, in described first conductive thread and second conductive thread wherein one live width be 0.2 micron～5 microns, another person falls in the described ruling in the projection of described shading matrix layer in described first conductive thread and second conductive thread.
2. optical filter box according to claim 1, it is characterized in that, the live width of described first conductive thread is 0.2 micron～5 microns, the distance of adjacent two grid nodes is 50 microns～500 microns, and the projection of described second conductive thread on described shading matrix layer falls on the ruling of described shading matrix layer.
3. optical filter box according to claim 2 is characterized in that, the width of described second conductive thread is less than the width of described ruling.
4. optical filter box according to claim 1, it is characterized in that, described first conductive grid comprises a plurality of first grid cells, each first grid cell accommodates at least one chromatic photoresist unit in the projection of described colorama resistance layer, described second conductive grid comprises a plurality of second grid cells, and each second grid cell accommodates at least one chromatic photoresist unit in the projection of described colorama resistance layer.
5. optical filter box according to claim 2, it is characterized in that, described first conductive grid comprises a plurality of first grid cells, described second conductive grid comprises a plurality of second grid cells, and the quantity of each first grid cell in the chromatic photoresist unit that the projection of described colorama resistance layer is held is not less than each second grid cell in the quantity of the chromatic photoresist unit that the projection of described colorama resistance layer is held.
6. optical filter box according to claim 1, it is characterized in that, described first conductive layer is handled first conductive pattern that obtains a plurality of spaces by whole complete conductive grid broken, described second conductive layer is handled second conductive pattern that obtains a plurality of spaces by whole complete conductive grid broken.
7. optical filter box according to claim 6, it is characterized in that, the interval width of two adjacent described first conductive patterns in described first conductive layer is 0.5 micron～50 microns, and the interval width of two adjacent described second conductive patterns in described second conductive layer is 0.5 micron～50 microns.
8. optical filter box according to claim 1 is characterized in that, the thickness of described colorama resistance layer is more than or equal to the thickness of described shading matrix layer.
9. optical filter box according to claim 1, it is characterized in that, described impression glue-line offers the groove of shape and described second conductive pattern coupling, described second conductive pattern is contained in the described groove, the degree of depth of described groove is less than the thickness of described impression glue-line, and the thickness of described second conductive pattern is smaller or equal to the degree of depth of described groove.
10. a touch display screen comprises the film crystal pipe electrode, Liquid Crystal Module, optical filter box and the polaroid that stack gradually, it is characterized in that, described optical filter box is as any described optical filter box of claim 1～9.
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| CN104850295A (en) * | 2015-05-08 | 2015-08-19 | 业成光电（深圳）有限公司 | Touch control display device and color filter substrate |
| CN109032405A (en) * | 2018-07-06 | 2018-12-18 | 京东方科技集团股份有限公司 | A kind of production method of display panel, display device and display panel |
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| CN203038679U (en) * | 2012-10-25 | 2013-07-03 | 南昌欧菲光科技有限公司 | Conductive structure in transparent conductive film and transparent conductive film |
| CN103106953A (en) * | 2013-02-06 | 2013-05-15 | 南昌欧菲光科技有限公司 | Conducting film and preparation method thereof and touch screen comprising the same |
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| CN103164100A (en) * | 2013-03-28 | 2013-06-19 | 南昌欧菲光科技有限公司 | Capacitive touch screen |
| CN203338305U (en) * | 2013-07-05 | 2013-12-11 | 南昌欧菲光显示技术有限公司 | Optical filter assembly and touch displaying screen |
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| CN109032405A (en) * | 2018-07-06 | 2018-12-18 | 京东方科技集团股份有限公司 | A kind of production method of display panel, display device and display panel |
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