CN103294276A - Touch screen electrode and manufacturing method thereof - Google Patents
Touch screen electrode and manufacturing method thereof Download PDFInfo
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- CN103294276A CN103294276A CN2013102281310A CN201310228131A CN103294276A CN 103294276 A CN103294276 A CN 103294276A CN 2013102281310 A CN2013102281310 A CN 2013102281310A CN 201310228131 A CN201310228131 A CN 201310228131A CN 103294276 A CN103294276 A CN 103294276A
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Abstract
A touch screen electrode comprises a substrate, a conducting layer and light-sensitive silver paste electrode leads. The substrate comprises a display area and a frame area. Under a yellow light condition, through coating, exposure, development treatment, etching and peeling procedures, the conducting layer with a plurality of conducting pattern regions is formed in the display area of the substrate, an exposure developing mode is directly carried out on the frame area through silk-screen light-sensitive silver paste, the conducting pattern regions in the display area are obtained to form the conducting layer, the frame area is provided with the light-sensitive silver paste electrode leads with small wire widths and spacing, and the light-sensitive silver paste electrode leads are electrically connected with the conducting pattern regions to form a loop. Due to the fact that the light-sensitive silver paste electrode leads are obtained through the exposure developing mode, and therefore the wire widths and spacing can be reduced; the manufacturing method has simple procedures, reduces cost, and meanwhile avoids the bad phenomena of ink penetration-out, adhesion, jaggy edges and the like.
Description
Technical field
The present invention relates to the touch screen technology field, particularly relate to a kind of touch screen electrode and manufacture method thereof.
Background technology
(touch screen technology is brought in constant renewal in and innovation, occurs a large amount of narrow frame displays in the market, for example panel computer, televisor, mobile phone etc. for touch panel, the TP) cut-throat competition of industry along with contact panel.The frame of display mainly is laid with contact conductor, and the live width line-spacing of contact conductor is more little, and the overall width of display frame is more little, and frame is more narrow.
The traditional manufacture method of the touch screen electrode of narrow frame is with tin-doped indium oxide unnecessary on the transparency conducting layer (Indium Tin Oxide, ITO) remove by etched mode, stay circuit pattern, and then printed silver slurry formation contact conductor, make contact conductor and circuit pattern directly form the loop.
The traditional manufacture method of the touch screen electrode of narrow frame is behind the circuit pattern that forms central visible area, mode by serigraphy is starched the outside, circuit pattern edge that circuit directly is printed on central visible area with silver, and with visible area in the circuit pattern overlap joint and form the loop.Owing to be subjected to the technical limitation of serigraphy, the live width line-spacing normal condition of starching the contact conductor of circuit formation with this mode printed silver can only reach the 100/100um rank, can't satisfy the requirement of the whole narrow frame of touch screen electrode of narrow frame, and in the process of serigraphy silver slurry circuit bad phenomenon such as the saturating sky of printing ink, adhesion and edge sawtooth appear easily, thereby influence the function yield of touch screen electrode, thereby production cost is higher.
Summary of the invention
Based on this, be necessary can't satisfy narrow frame requirement and cost problem of higher too greatly at the live width line-spacing, the less and lower-cost touch screen electrode of a kind of live width line-spacing and manufacture method are provided.
A kind of touch screen electrode comprises:
Substrate comprises viewing area and frame region, and described viewing area and described frame region are complementary;
Conductive layer is attached at described viewing area, comprises a plurality of conductive patterns district, a plurality of conductive patterns district mutually insulated;
Photosensitive silver slurry contact conductor, be attached at described frame region, described photosensitive silver slurry contact conductor one end is electrically connected with described conductive pattern district, and each described conductive pattern district all is electrically connected with a described photosensitive silver slurry contact conductor, described photosensitive silver slurry contact conductor mutually insulated.
Therein among embodiment, described conductive pattern district comprises by some metal wires and intersects the metal grill that constitutes that metal grill is irregular random grid.
Among embodiment, described photosensitive silver slurry contact conductor comprises connecting portion and leading part therein, and described leading part is electrically connected with described conductive pattern district by described connecting portion.
Among embodiment, described leading part is parallel to each other and arranges at interval therein.
A kind of touch screen electrode preparation method may further comprise the steps:
Substrate is provided;
Arrange conductive material in described substrate surface to form conductive layer;
Apply resistant layer in the surface of described conductive layer, to protect described conductive layer;
The described resistant layer of exposing, obtaining frame region and to have the viewing area in a plurality of conductive patterns district, described viewing area and described frame region are complementary;
Video picture is handled, so that the resistant layer except described a plurality of conductive patterns district is removed;
Etching is to remove the conductive material of the conductive layer except described a plurality of conductive patterns district;
Peel off described resistant layer, have the conductive layer in a plurality of conductive patterns district and the frame region that is complementary with described viewing area, described a plurality of conductive patterns district mutually insulated to form in described viewing area;
The printing photosensitive silver is starched in described frame region;
The described photosensitive silver that exposes is starched, to form patterned photosensitive silver slurry;
Develop, to obtain photosensitive silver slurry contact conductor, described photosensitive silver slurry contact conductor is attached at described frame region, described photosensitive silver slurry contact conductor one end is electrically connected with described conductive pattern district, each described conductive pattern district all is electrically connected with a described photosensitive silver slurry contact conductor, described photosensitive silver slurry contact conductor mutually insulated;
Wherein, above-mentioned steps is all carried out under the gold-tinted condition.
Among embodiment, the described conductive material that arranges specifically comprises to form conductive layer in described substrate surface therein:
The coating metal ink is in described substrate surface;
Baking obtains the irregular metal grill at random that intersected to form by some metal wires, and metal grill constitutes conductive layer.
Among embodiment, the described conductive material that arranges specifically comprises to form conductive layer in described substrate surface therein:
By the sputter mode, the ITO material is formed at described substrate surface.
Among embodiment, before the described coating resistant layer step, also be included in burin-in process conductive layer and substrate under the gold-tinted condition therein.
Among embodiment, before the described exposure photosensitive silver slurry step, also be included in pre-bake step under the gold-tinted condition therein, the photosensitive silver slurry is carried out prebake conditions, to solidify described photosensitive silver slurry.
Among embodiment, also be included under the gold-tinted condition after the described development step and toast therein, to solidify photosensitive silver slurry contact conductor.
Above-mentioned touch screen electrode and manufacture method thereof, institute all carries out under the gold-tinted condition in steps, at first form conductive layer at substrate surface, apply resistant layer at conductive layer surface then, the resistant layer of exposing again, carrying out video picture again handles, etching, peel off the resistant layer of conductive layer surface, obtain viewing area and frame region, the viewing area comprises a plurality of conductive patterns district, a plurality of conductive patterns district mutually insulated, viewing area and frame region are complementary, starch at frame region silk-screen photosensitive silver again, mode by exposure imaging again, can obtain having the photosensitive silver slurry contact conductor of less live width line-spacing, because above-mentioned steps is all carried out under the gold-tinted condition, so do not need the conversion process condition, easy to operate, and photosensitive silver slurry has photosensitive resin, can directly form the photosensitive silver with less live width line-spacing by exposure imaging and starch contact conductor, so operating process is simple, reduce cost, and when obtaining touch screen electrode by the way, avoided printing ink empty thoroughly, adhesion, and bad phenomenon such as edge sawtooth.
Description of drawings
Fig. 1 is the structural representation of touch screen electrode;
Fig. 2 is the structural representation at another visual angle of touch screen electrode;
Fig. 2 A is the partial schematic diagram of A among Fig. 2;
Fig. 3 is the process flow diagram of touch screen electrode preparation method among the embodiment;
Fig. 4 is the process flow diagram of touch screen electrode preparation method among another embodiment.
Embodiment
The invention will be further described below in conjunction with the drawings and specific embodiments.
See also Fig. 1, Fig. 2 and Fig. 2 A, a kind of touch screen electrode 100 comprises substrate 110, conductive layer 120 and photosensitive silver slurry contact conductor 130.Substrate 110 comprises viewing area 112 and frame region 114, and described viewing area 112 is complementary with described frame region 114, and viewing area 112 is positioned at middle position, generally be rectangle or square, and viewing area 112 and frame region 114 shape complementarities.Frame region 114 generally is positioned at the touch-screen edge.Described viewing area 112 explicit user operation interfaces, frame region 114 is used for laying contact conductor.Conductive layer 120 is attached at described viewing area 112, comprises a plurality of conductive patterns district 122, a plurality of conductive patterns district 122 mutually insulateds.Photosensitive silver slurry contact conductor 130 is attached at described frame region 114, photosensitive silver slurry contact conductor 130 1 ends are electrically connected with conductive pattern district 122, each conductive pattern district 122 all is electrically connected with a described photosensitive silver slurry contact conductor 130, described photosensitive silver slurry contact conductor 130 mutually insulateds.
Above-mentioned touch screen electrode 100, photosensitive silver slurry contact conductor 130 is by behind frame region 114 printing photosensitive silver slurries, directly form by the exposure imaging mode, one end of photosensitive silver slurry contact conductor 130 is electrically connected with conductive pattern district 122, and each conductive pattern district 122 all is electrically connected with a photosensitive silver slurry contact conductor 130.Because the photosensitive silver slurry comprises photosensitive resin and silver powder particles, the part of photosensitive silver slurry exposure can be solidified, so can be by having the exposure masterplate exposure of less live width line-spacing contact conductor figure, the photosensitive silver that develops again except removing photosensitive silver slurry contact conductor 130 is starched, the photosensitive silver slurry contact conductor 130 that formation has less live width line-spacing satisfies the narrow-frame touch panel requirement.
In present embodiment, the live width scope of photosensitive silver slurry contact conductor 130 is 20 μ m-50 μ m.Preferably can be the arbitrary live width among 20 μ m, 30 μ m, 40 μ m or the 50 μ m.The line-spacing scope of photosensitive silver slurry contact conductor 130 is 20 μ m-50 μ m.Preferably can be the arbitrary line-spacing among 20 μ m, 30 μ m, 40 μ m or the 50 μ m.Be that the contact conductor of 100/100 μ m is compared with live width line-spacing in the prior art, the live width line-spacing of contact conductor has reduced greatly among the present invention, and the narrow frame that obtains is narrower.
See also Fig. 2 and Fig. 2 A, in present embodiment, described conductive pattern district 122 comprises the metal grill that is made of some metal wires intersections, and metal grill is irregular random grid.Metal wire can for copper, silver, zinc, gold, nickel or other common better conductivity wherein a kind of metal material constitute, can further reduce the cost of touch screen electrode.Simultaneously because conductive pattern district 122 is made of metal grill, guaranteeing under the transparent prerequisite that the metal material that expends is still less saved cost.When metal grill is irregular grid immediately, can also eliminate Moire fringe, improve the customer experience sense.It is to be noted, when conductive pattern district 122 comprises the metal grill of some metal wires formations, just further reduced cost, when the material in conductive pattern district 122 is ITO, do not influence by at frame region silk-screen photosensitive silver slurry contact conductor 130, reduce live width line-spacing this purpose of photosensitive silver slurry contact conductor 130 by the exposure imaging mode.
See also Fig. 2 and Fig. 2 A, in present embodiment, described photosensitive silver slurry contact conductor 130 can comprise connecting portion 132 and leading part 134, and described leading part 134 is electrically connected with described conductive pattern district 122 by described connecting portion 132.When exposure photosensitive silver slurry, the exposure masterplate that can select to have connecting portion 132 and leading part 134 exposes, the photosensitive silver slurry contact conductor 130 that has connecting portion 132 and leading part 134 with formation, connecting portion 132 is electrically connected with conductive pattern district 122, and leading part 134 1 ends are electrically connected with connecting portion 132.Connecting portion 132 and conductive pattern district 122 to be connected area big, so behind the electric connection, electric conductivity is better.The live width of connecting portion 132 also can reduce by the mode of exposure imaging, so can further reduce the overall width of frame region 114.
Please consult Fig. 2 and Fig. 2 A again, in present embodiment, described leading part 134 is parallel to each other and arranges at interval.Leading part 134 makes many photosensitive silver slurry contact conductors 130 non-intersect by certain spacing is set, thereby makes photosensitive silver slurry contact conductor 130 mutually insulateds.General, article two, when line segment is non-intersect, when two line segments are parallel apart from minimum, so the leading part 134 that photosensitive silver is starched contact conductor is made as when parallel, line-spacing minimum between the photosensitive silver slurry contact conductor 130, can further reduce the overall width of frame region 114, obtain narrower frame region 114.In present embodiment, the scope of the distance s of described leading part 132 is 20 μ m-50 μ m.Preferably can be 20 μ m, 30 μ m, 40 μ m or 50 μ m.The scope of the live width d of described leading part is 20 μ m-50 μ m.Preferably can be 20 μ m, 30 μ m, 40 μ m or 50 μ m.
See also Fig. 3, a kind of manufacture method of touch screen electrode also is provided, mainly may further comprise the steps, wherein, institute all carries out under the gold-tinted condition in steps.
Step S100 provides substrate.Substrate can be water white plastic sheeting, and thickness is 100 μ m.
Step S110, arrange conductive material in described substrate surface to form conductive layer.In present embodiment, can the ITO material be formed at substrate surface by sputter, to form conductive layer.The thickness of conductive layer is 200nm, to form visually transparent transparency conducting layer.
Step S111, burin-in process conductive layer and substrate.With conductive layer and substrate put into together infrared ray (Infra-red IR) shrinks in the oven, with the expansion and contraction that guarantees substrate in preset range.By 140 ℃ of high temperature, whole substrate and conductive layer are carried out burin-in process, with the expansion and contraction that guarantees substrate in normal scope.Even it is pointed out that this step is not set, do not influence photosensitive silver slurry contact conductor this purpose of starching to obtain less live width line-spacing by the silk-screen photosensitive silver yet.
Step S120 applies resistant layer in the surface of conductive layer, with the protection conductive layer.In the surface-coated resistant layer of conductive layer, make conductive layer surface all cover one deck resistant layer.The material of resistant layer is the minus photoresist, and the minus photoresist is a kind of of photoresist, and it shines the partly solidified of light, can not be dissolved in the photoresistance developer solution, and the part that does not shine light can be dissolved in the photoresistance developer solution.Certainly, in other embodiment, can also apply the eurymeric photoresist, its part that shines light can be dissolved in the photoresistance developer solution, and the part that does not shine light can not be dissolved in the photoresistance developer solution.
Step S130, the described resistant layer of exposing, to obtain frame region and the viewing area with a plurality of conductive patterns district, described viewing area and frame region are complementary.The masterplate that will expose is covered in resistant layer top, and exposure light is by exposure masterplate irradiation resistant layer, and exposure partly solidified forms patterned resistant layer.The exposure masterplate is printed on reservation shape, comprises frame region and is positioned at central viewing area, and viewing area and frame region shape are complementary.There is a plurality of conductive patterns district the viewing area, and the pattern in conductive pattern district can be strip, also can be shapes such as rhombus.There is certain intervals in a plurality of conductive patterns district, so mutually insulated.In other embodiment, when applying the eurymeric photoresist, can expose by the exposure masterplate that is printed on the figure of the required pattern complementation of conductive layer.
Step S140, video picture is handled, so that the resistant layer except a plurality of conductive patterns district is removed.Utilize as K
2CO
3Organic solution resistant layer carried out video picture handle, exposure will not have the minus photoresist of curing rinse well.The minus photoresist that has solidified after the exposure then remains, to the conductive pattern district of the viewing area that is positioned at middle position protecting.
Step S150, etching is to remove the conductive material of the conductive layer except a plurality of conductive patterns district.Utilize acid solution, for example HCl, HNO
3Perhaps both mixed solutions carry out etching to conductive layer except the conductive material in a plurality of conductive patterns district, and the conductive material except the conductive pattern district is etched away.And the conductive pattern district is because be coated with the minus photoresist, so be retained.
Step S160 peels off described resistant layer, forming the conductive layer with a plurality of conductive patterns district in described viewing area, and a plurality of conductive patterns district mutually insulated, the frame region that is complementary with described viewing area.Utilize alkaline solution, as N а OH solution remaining minus photoresist is carried out lift-off processing, thereby formed frame region and be positioned at central viewing area.At this moment, frame region is white space, is positioned at the marginal portion of substrate.The viewing area has a plurality of conductive patterns district.The pattern in conductive pattern district can be strip, also can be rhombus etc.
Step S170, the printing photosensitive silver is starched in described frame region.Namely utilizing 400 orders or 500 purpose steel wire half tone print thickness scopes in the marginal portion of substrate in frame region is photosensitive silver slurry below the 8 μ m.The photosensitive silver slurry is a kind of of sensitization photoresistance, and principal ingredient is divided into two parts, and a part is photosensitive resin, and another part is silver powder particles.Whole frame region all is printed with the photosensitive silver slurry.
Step S180, the described photosensitive silver slurry that exposes forms patterned photosensitive silver slurry.Photosensitive silver slurry is under the effect of light, and exposure partly solidified do not have the place of exposure can not solidify.The pattern part that solidifies is photosensitive silver slurry contact conductor part.According to demand, the live width scope of the contact conductor pattern in the exposure masterplate can be made as 20 μ m-50 μ m, the scope of live width is 20 μ m-50 μ m.Preferably, the live width line-spacing is designed to different sizes such as 20/20 μ m, 30/30 μ m, 40/40 μ m, 50/50 μ m or 30/40 μ m.
Step S190, develop, to obtain photosensitive silver slurry contact conductor, described photosensitive silver slurry contact conductor is attached at described frame region, described photosensitive silver slurry contact conductor one end is electrically connected with described conductive pattern district, each described conductive pattern district all is electrically connected with a described photosensitive silver slurry contact conductor, described photosensitive silver slurry contact conductor mutually insulated.Utilize the weak base salt solution of low concentration, as N а
2CO
3Or K
2CO
3Solution develops to the photosensitive silver slurry, and the pattern part of curing can not be developed, and does not have the part development post-flush of curing clean, obtains the less photosensitive silver slurry contact conductor of live width line-spacing.The live width scope of photosensitive silver slurry contact conductor is 20 μ m-50 μ m, and the scope of line-spacing is 20 μ m-50 μ m.Photosensitive silver slurry contact conductor is electrically connected with the conductive pattern district, forms the loop, thereby forms touch screen electrode, can be drive electrode or induction electrode.Can make touch screen electrode again with same method, two-layer touch screen electrode is fitted, can constitute complete narrow-frame touch panel input thin slice.Wherein the gold-tinted condition is at the gold-tinted dust-free workshop and carries out.
In the above-mentioned touch screen electrode preparation method, at first form conductive layer at substrate surface, apply resistant layer at conductive layer surface then, the resistant layer of exposing again, carrying out video picture again handles, etching, peel off the resistant layer of conductive layer surface, obtain viewing area and frame region, the viewing area comprises a plurality of conductive patterns district, a plurality of conductive patterns district mutually insulated, viewing area and frame region are complementary, at frame region silk-screen photosensitive silver slurry, again by the mode of exposure imaging, can obtain having the photosensitive silver slurry contact conductor of less live width line-spacing again, aforesaid way all carries out under the gold-tinted condition, so do not need the conversion process condition, easy to operate, and can not cause actual bodily harm to the operator.The photosensitive silver slurry has photosensitive resin, can directly form photosensitive silver slurry contact conductor by exposure imaging, the sensitization that obtains and contact conductor live width line-spacing are less, operating process is simple, reduced cost, and when obtaining touch screen electrode by the way, bad phenomenon such as the saturating sky of printing ink, adhesion and edge sawtooth have been avoided.
In present embodiment, before the described step S180 exposure photosensitive silver slurry, also comprise step S171 prebake conditions under the gold-tinted condition, the photosensitive silver slurry is carried out prebake conditions, to solidify described photosensitive silver slurry.Carry out prebake conditions by 60 ℃ of-100 ℃ of temperature, the photosensitive silver slurry is baked to a certain degree, make it when exposure, can instead not be stained with the film or masterplate.Even it is pointed out that this step is not set, do not influence photosensitive silver slurry contact conductor this purpose of starching to obtain less live width line-spacing by the silk-screen photosensitive silver yet.
In present embodiment, can also comprise step S191 after the described development step, under the gold-tinted condition, toast, to solidify photosensitive silver slurry contact conductor.By 110 ℃ of-140 ℃ of high temperature photosensitive silver slurry contact conductor is cured, improves adhesion and the resistivity of photosensitive silver slurry contact conductor.This step is also finished in the gold-tinted workshop.It is pointed out that this step is in order to improve adhesion and the resistivity of photosensitive silver slurry contact conductor, even do not arrange, also do not influence the purpose of the photosensitive silver slurry contact conductor that obtains having less live width line-spacing.
See also Fig. 4, in other embodiment, described step S120 arranges conductive material and specifically can comprise to form conductive layer in described substrate surface:
Step S122, the coating metal ink is in described substrate surface.Metallic ink can form for Nano Silver material hydrophilic solvent, and wherein solute is directly to be 20nm-40nm, long simple substance silver line for 10nm-20nm.
Step S124, baking obtains the irregular metal grill at random that intersected to form by some metal wires, and metal grill constitutes conductive layer.With the Nano Silver ink oven dry of substrate surface, form the nano-silver thread of cross-distribution, constitute irregular metal grill at random, metal grill constitutes conductive layer.
The conductive pattern district of the conductive layer that above-mentioned steps makes comprises by some metal wires and intersects the metal grill that constitutes, and guaranteeing that conductive layer is visual when transparent, saved conductive, further reduced manufacturing cost.
The above embodiment has only expressed several embodiment of the present invention, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to claim of the present invention.Should be pointed out that for the person of ordinary skill of the art without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.
Claims (10)
1. a touch screen electrode is characterized in that, comprising:
Substrate comprises viewing area and frame region, and described viewing area and described frame region are complementary;
Conductive layer is attached at described viewing area, comprises a plurality of conductive patterns district, a plurality of conductive patterns district mutually insulated;
Photosensitive silver slurry contact conductor, be attached at described frame region, described photosensitive silver slurry contact conductor one end is electrically connected with described conductive pattern district, and each described conductive pattern district all is electrically connected with a described photosensitive silver slurry contact conductor, described photosensitive silver slurry contact conductor mutually insulated.
2. touch screen electrode according to claim 1 is characterized in that, described conductive pattern district comprises the metal grill that is made of some metal wires intersections, and metal grill is irregular random grid.
3. touch screen electrode according to claim 1 is characterized in that, described photosensitive silver slurry contact conductor comprises connecting portion and leading part, and described leading part is electrically connected with described conductive pattern district by described connecting portion.
4. touch screen electrode according to claim 3 is characterized in that, described leading part is parallel to each other and arranges at interval.
5. a touch screen electrode preparation method is characterized in that, may further comprise the steps:
Substrate is provided;
Arrange conductive material in described substrate surface to form conductive layer;
Apply resistant layer in the surface of described conductive layer, to protect described conductive layer;
The described resistant layer of exposing, obtaining frame region and to have the viewing area in a plurality of conductive patterns district, described viewing area and described frame region are complementary;
Video picture is handled, so that the resistant layer except described a plurality of conductive patterns district is removed;
Etching is to remove the conductive material of the conductive layer except described a plurality of conductive patterns district;
Peel off described resistant layer, have the conductive layer in a plurality of conductive patterns district and the frame region that is complementary with described viewing area, described a plurality of conductive patterns district mutually insulated to form in described viewing area;
The printing photosensitive silver is starched in described frame region;
The described photosensitive silver that exposes is starched, to form patterned photosensitive silver slurry;
Develop, to obtain photosensitive silver slurry contact conductor, described photosensitive silver slurry contact conductor is attached at described frame region, described photosensitive silver slurry contact conductor one end is electrically connected with described conductive pattern district, each described conductive pattern district all is electrically connected with a described photosensitive silver slurry contact conductor, described photosensitive silver slurry contact conductor mutually insulated;
Wherein, above-mentioned steps is all carried out under the gold-tinted condition.
6. touch screen electrode preparation method according to claim 5 is characterized in that, the described conductive material that arranges specifically comprises to form conductive layer in described substrate surface:
The coating metal ink is in described substrate surface;
Baking obtains the irregular metal grill at random that intersected to form by some metal wires, and metal grill constitutes conductive layer.
7. touch screen electrode preparation method according to claim 5 is characterized in that, the described conductive material that arranges specifically comprises to form conductive layer in described substrate surface:
The sputtering ITO material is in described substrate surface.
8. touch screen electrode preparation method according to claim 5 is characterized in that, before the described coating resistant layer step, also is included in burin-in process conductive layer and substrate under the gold-tinted condition.
9. touch screen electrode preparation method according to claim 5 is characterized in that, before the described exposure photosensitive silver slurry step, also is included in pre-bake step under the gold-tinted condition, and the photosensitive silver slurry is carried out prebake conditions, to solidify described photosensitive silver slurry.
10. touch screen electrode preparation method according to claim 5 is characterized in that, also is included under the gold-tinted condition after the described development step and toasts, to solidify photosensitive silver slurry contact conductor.
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