CN104345963A - Touch screen electrode circuit preparation method - Google Patents
Touch screen electrode circuit preparation method Download PDFInfo
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- CN104345963A CN104345963A CN201410071560.6A CN201410071560A CN104345963A CN 104345963 A CN104345963 A CN 104345963A CN 201410071560 A CN201410071560 A CN 201410071560A CN 104345963 A CN104345963 A CN 104345963A
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/0412—Digitisers structurally integrated in a display
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- Manufacturing Of Electric Cables (AREA)
- Position Input By Displaying (AREA)
Abstract
In order to overcome the problem that the widths of the electrode leads prepared in the prior art are oversize, the invention provides a touch screen electrode circuit preparation method which comprises the following steps: S1, providing a touch screen precursor, wherein the touch screen precursor comprises a base plate, the base plate comprises a central visible area and a border area which is located around the central visible area, and the central visible area is internally provided with an electrode layer; S2, coating photo-sensory silver paste in the frame area to form a photo-sensory silver paste layer; S3, putting a film on the photo-sensory silver paste layer and carrying out exposure on the photo-sensory silver paste layer, wherein the exposure conditions are that the light amount is 500-650 mj/m<2>, the exposure time is 25-27 s, the standard tolerance of the exposure shank bit is +/-0.2mm and the wavelength of the ultraviolet light in the exposure machine is 380-780nm; and S4, developing the photo-sensory silver paste layer to form an electrode lead which has a width of 30 micron and a space less than 30 micron, wherein the developing method includes the step of spray rinsing the photo-sensory silver paste layer by using a potassium hydroxide or sodium hydroxide solution with a concentration of 0.19-0.21mol/l, at the temperature of 29-31 DEG C and the spray rinsing pressure is 0.8-1.2kg/m<2>. The width of the electrode lead prepared by the method provided by the invention is narrow.
Description
Technical field
The invention belongs to touch-screen field, particularly relate to a kind of touch screen electrode circuit preparation method.
Background technology
Along with the cut-throat competition of contact panel (touch panel, TP) industry, touch screen technology is constantly updated and innovation, occurs a large amount of narrow border displays in the market, such as panel computer, televisor, mobile phone etc.The frame of display is mainly laid with contact conductor, and the live width line-spacing of contact conductor is less, and the overall width of display frame is less, and frame is narrower.
For the touch screen electrode of narrow frame, traditional method for making is: by tin-doped indium oxide (Indium Tin Oxide unnecessary on transparency conducting layer, ITO) logical overetched mode is removed, leave circuit pattern, and then printing silver slurry forms contact conductor, makes contact conductor and circuit pattern directly form loop.
The classical production process of the touch screen electrode of narrow frame is after the circuit pattern forming central visible area, by the mode of serigraphy, silver slurry circuit is directly printed on outside the circuit pattern edge of central visible area, and overlaps with the circuit pattern in visible area and form loop.Owing to being subject to the technical limitation of serigraphy, the live width line-spacing printing the contact conductor of silver slurry railway superstructures by this mode under normal circumstances, can only reach the order of magnitude of 100 microns, cannot meet the requirement of the overall narrow frame of touch screen electrode of narrow frame.
Summary of the invention
Technical matters to be solved by this invention is the excessive problem of the contact conductor live width for preparing for electrode circuit preparation method of the prior art, provides a kind of touch screen electrode circuit preparation method.
It is as follows that the present invention solves the problems of the technologies described above adopted technical scheme:
A kind of touch screen electrode circuit preparation method is provided, it is characterized in that, comprising:
S1, provide touch-screen precursor; Described touch-screen precursor comprises substrate, and described substrate comprises central visible area and is positioned at the rim area of central visible area surrounding, is provided with electrode layer in described central visible area;
S2, in the rim area of described substrate surface, apply photosensitive silver slurry, form photosensitive silver pulp layer;
S3, the film is placed in photosensitive silver pulp layer, then above photosensitive silver pulp layer, exposure-processed is carried out to photosensitive silver pulp layer; Described exposure-processed condition is: light quantity is 500-650mj/m
2, the time shutter is 25-27s, and the standard of tolerance of exposure handle position is ± 0.2mm, and in exposure machine, ultraviolet wavelength is 380-780nm;
S4, carry out development treatment to the photosensitive silver pulp layer after exposure-processed, form live width and be less than 30 μm, the spacing contact conductor that is less than 30 μm, described contact conductor is electrically connected with electrode layer; Described developing method is: at 29-31 DEG C, and adopt concentration to be that the potassium hydroxide of 0.19-0.21mol/l or sodium hydroxide solution carry out hydro-peening to the photosensitive silver pulp layer after exposure-processed, hydro-peening pressure is 0.8-1.2kg/m
2.
Live width and the narrower contact conductor of line-spacing can be prepared by said method, be beneficial to and prepare the narrower touch display device of frame.And the contact conductor yield that said method prepares is high.
Embodiment
In order to make technical matters solved by the invention, technical scheme and beneficial effect clearly understand, below in conjunction with embodiment, the present invention is further elaborated.Should be appreciated that specific embodiment described herein only in order to explain the present invention, be not intended to limit the present invention.
Touch screen electrode circuit preparation method provided by the invention comprises:
S1, provide touch-screen precursor; Described touch-screen precursor comprises substrate, and described substrate comprises central visible area and is positioned at the rim area of central visible area surrounding, is provided with electrode layer in described central visible area;
S2, in the rim area of described substrate surface, apply photosensitive silver slurry, form photosensitive silver pulp layer;
S3, the film is placed in photosensitive silver pulp layer, then above photosensitive silver pulp layer, exposure-processed is carried out to photosensitive silver pulp layer; Described exposure-processed condition is: light quantity is 500-650mj/m
2, the time shutter is 25-27s, and the standard of tolerance of exposure handle position is ± 0.2mm, and in exposure machine, ultraviolet wavelength is 380-780nm;
S4, carry out development treatment to the photosensitive silver pulp layer after exposure-processed, form live width and be less than 30 μm, the spacing contact conductor that is less than 30 μm, described contact conductor is electrically connected with electrode layer; Described developing method is: at 29-31 DEG C, and adopt concentration to be that the potassium hydroxide of 0.19-0.21mol/l or sodium hydroxide solution carry out hydro-peening to the photosensitive silver pulp layer after exposure-processed, hydro-peening pressure is 0.8-1.2kg/m
2.
According to the present invention, above-mentioned touch-screen precursor is by being commercially available.In commercial production, usually prepare voluntarily according to actual design.The preparation method of touch-screen precursor is known in the field, such as, is specifically as follows: form ITO conductive layer at substrate surface; Then form acid resisting material at ITO conductive layer surface, and solidify acid resisting material according to the electrode layer pattern of required formation; Recycling etching solution etches described ITO conductive layer and acid resisting material, forms the electrode pattern that surface coverage has acid resisting material; Finally peel off acid resisting material, obtain electrode layer.
The material that aforesaid substrate can adopt this area conventional, such as, can adopt stripping or water white plastic sheeting (as PET film).Its thickness can change in a big way, and such as, when adopting plastic sheeting as substrate, the thickness of described substrate is 100-200 μm.
For reducing substrate surface dirt to the impact of preparation process, reduce yield, under preferable case, first cleaning treatment is carried out to substrate, described cleaning method is: at 55-65 DEG C, is in the potassium hydroxide solution of 0.4-0.7mol/l by substrate in concentration, soaks 2-33min.
After base-plate cleaning completes, ITO conductive layer need be formed on substrate.The method of concrete formation ITO conductive layer is: magnetron sputtering, forms at substrate surface the ITO conductive layer that thickness is 200-300nm.
After forming ITO conductive layer, form acid resisting material at ITO conductive layer surface.The method of concrete formation acid resisting material can be serigraphy.Such as, polyester net can be adopted at full wafer ITO conductive layer surface printing acid resisting material.Above-mentioned acid resisting material can adopt photo-cured coating etc.
Then, according to the electrode layer pattern solidification acid resisting material of required formation.Concrete grammar can be: the electrode layer pattern according to required formation prepares mask, in mask, needs the region of corresponding formation electrode layer pattern by hollow out.Mask is covered on acid resisting material, by UV-irradiation acid resisting material above mask.By the region printing opacity of hollow out on mask, other regions are light tight, thus the acid resisting material that need be formed in the region of electrode layer pattern is solidified.
Recycling etching solution etches described ITO conductive layer and acid resisting material, forms the electrode pattern that surface coverage has acid resisting material.
After above-mentioned solidification process, the acid resisting material in masked region of blocking is uncured.Be removed by etching method, form the electrode pattern that surface coverage has acid resisting material.Concrete etching method is: at 43-47 DEG C, adopts pH to be that the mix acid liquor of 6.5-7.5mol/l is with 1.2-1.6kg/cm
2hydro-peening pressure hydro-peening 1-2min; Described mix acid liquor is the mix acid liquor of hydrochloric acid and nitric acid.
After above-mentioned etch processes, final required electrode layer surface is still coated with the acid resisting material after solidification.This acid resisting material need be peeled off, expose electrode layer.The method of concrete stripping acid resisting material is: employing concentration is that the potassium hydroxide solution cleaning acid resisting material of 0.6-0.8mol/l is all eliminated to acid resisting material.
Described touch-screen precursor can be prepared by said method.This touch-screen precursor comprises substrate, and described substrate comprises central visible area and is positioned at the rim area of central visible area surrounding, is provided with electrode layer in described central visible area.Electrode layer pattern in the position distribution of concrete central visible area and rim area and central visible area all can first design according to performance requirement, is then prepared in preceding method.
According to the present invention, photosensitive silver slurry need be applied in the rim area of substrate surface, form photosensitive silver pulp layer.The photosensitive silver slurry adopted in the present invention is photosensitive silver slurry commonly known in the art, generally includes photosensitive resin and is distributed in the silver powder in photosensitive resin.Above-mentioned photosensitive silver slurry is by being commercially available.
The method applying photosensitive silver slurry in the rim area of substrate surface can be coated with for conventional serigraphy, rotation and car are mixed.For ensureing coating effect, under preferable case, temperature be 18-21 DEG C, relative humidity lower than 65-75%, irradiate in environment in amber light and apply photosensitive silver slurry.
The mode of mixing painting according to rotation and car applies photosensitive silver slurry, and it is 213-223rad/min that roller biography speed passes speed with coating wheel, and dryer rotating speed is 3-5m/min, and photosensitive silver slurry viscosity is 130-230cpa.s.Applying by said method the photosensitive silver pulp layer obtained adheres to good, and pin hole is few, and corrosion resistivity is strong.
After forming above-mentioned photosensitive silver pulp layer, under preferable case, prebake conditions process is carried out to photosensitive silver pulp layer, avoid the film in post-exposure processing procedure to have an impact to photosensitive silver pulp layer, reduce preparation precision.Concrete, described prebake conditions method is: heat-treat photosensitive silver pulp layer at 90-100 DEG C.
According to preparation method provided by the invention, also comprise and the film is placed in photosensitive silver pulp layer, then above photosensitive silver pulp layer, exposure-processed is carried out to photosensitive silver pulp layer; Described exposure-processed condition is: light quantity is 500-650mj/m
2, the time shutter is 25-27s, and the standard of tolerance of exposure handle position is ± 0.2mm, and in exposure machine, ultraviolet wavelength is 380-780nm.
In above-mentioned steps, the film of employing can design in advance according to the pattern of the contact conductor of required formation and prepare.Concrete, the described film has light tank, and described light tank is corresponding with the contact conductor pattern of required formation; Described light tank width is less than 30 μm, and the spacing between light tank is less than 30 μm.
Exposure-processed is the committed step of preparation method provided by the invention, larger to the Accuracy of the contact conductor prepared.When adopting above-mentioned exposure technology to process, the photosensitive resin during photosensitive silver can be made to starch fully reacts, and ensures its etch resistant properties, avoids being corroded when developing; Further, above-mentioned exposing operation can not make without the need to photosensitive part by faint photosensitive, namely produces " halation " phenomenon, ensures the precision preparing contact conductor.
Conductive silver slurry layer after exposure-processed need carry out development can show contact conductor.In the present invention, concrete developing method is: at 29-31 DEG C, and adopt concentration to be that the potassium hydroxide of 0.19-0.21mol/l or sodium hydroxide solution carry out hydro-peening to the photosensitive silver pulp layer after exposure-processed, hydro-peening pressure is 0.8-1.2kg/m
2.
Can form live width by said method and be less than 30 μm, the spacing contact conductor that is less than 30 μm, described contact conductor is electrically connected with electrode layer.When adopting above-mentioned technique to carry out development operation, photosensitive silver slurry there will not be softening, expansion, avoids the potassium hydroxide solution as developer solution infiltrate photosensitive silver pulp layer and occur sticky molten, pattern edge is out of shape, effectively ensure that the precision of contact conductor.
For ensureing the adhesion of the contact conductor prepared further, make contact conductor more stable, under preferable case, after described step S4, also comprise baking procedure, described baking method is: heat-treat contact conductor at 140-150 DEG C.
By the following examples the present invention is further detailed.
Embodiment 1
The present embodiment is for illustration of touch screen electrode circuit preparation method disclosed by the invention.
Thickness is adopted to be the PET(polyethylene terephthalate of 100 μm) plastic sheeting is as substrate.
At 55 DEG C, be in the potassium hydroxide solution of 0.4mol/l in concentration by substrate, soak 30min.
Form by magnetron sputtering the ITO conductive layer that thickness is 200nm on aforesaid substrate surface.
The ITO conductive layer of substrate surface forms acid resisting material layer by serigraphy.
Then, acid resisting material layer is placed the mask with the required electrode layer pattern formed and blocks, adopt UV-irradiation acid resisting material, acid resisting material layer is cured.
At 43 DEG C, pH is adopted to be that the mix acid liquor of the hydrochloric acid of 6.5mol/l and nitric acid is with 1.2kg/cm
2hydro-peening pressure hydro-peening acid resisting material layer 2min.
Then adopt concentration be 0.8mol/l potassium hydroxide solution cleaning acid resisting material be all eliminated to acid resisting material.Obtain touch-screen precursor.
Temperature be 21 DEG C, relative temperature is 65% time, irradiates in environment in amber light, the rim area of body adopts and to rotate and mode that car mixes painting applies photosensitive silver slurry in front of the touch screen.
It is 218rad/min that roller biography speed passes speed with coating wheel, and dryer rotating speed is 4m/min, and photosensitive silver slurry viscosity is 180cpa.s.
Then at 90 DEG C, photosensitive silver pulp layer is heat-treated.
Again the film (light tank width is 20 μm, and the spacing between light tank is 25 μm) is placed in photosensitive silver pulp layer, then above photosensitive silver pulp layer, exposure-processed is carried out to photosensitive silver pulp layer; Described exposure-processed condition is: light quantity is 500mj/m
2, the time shutter is 25s, and the standard of tolerance of exposure handle position is 0mm, and in exposure machine, ultraviolet wavelength is 380nm.
Then, at 30 DEG C, employing concentration is that the potassium hydroxide solution of 0.2mol/l carries out hydro-peening to the photosensitive silver pulp layer after exposure-processed, and hydro-peening pressure is 1.0kg/m
2.
At 140 DEG C, contact conductor is heat-treated again.
The contact conductor width formed in rim area is 20 μm, and the spacing between contact conductor is 25 μm.Electrode lead pattern is regular, without distortion.
Embodiment 2
The present embodiment is for illustration of touch screen electrode circuit preparation method disclosed by the invention.
Thickness is adopted to be the PET(polyethylene terephthalate of 200 μm) plastic sheeting is as substrate.
At 65 DEG C, be in the potassium hydroxide solution of 0.7mol/l in concentration by substrate, soak 6min.
Form by magnetron sputtering the ITO conductive layer that thickness is 200nm on aforesaid substrate surface.
The ITO conductive layer of substrate surface forms acid resisting material layer by serigraphy.
Then, acid resisting material layer is placed the mask with the required electrode layer pattern formed and blocks, adopt UV-irradiation acid resisting material, acid resisting material layer is cured.
At 47 DEG C, pH is adopted to be that the mix acid liquor of the hydrochloric acid of 6.5mol/l and nitric acid is with 1.3kg/cm
2hydro-peening pressure hydro-peening acid resisting material layer 2min.
Then adopt concentration be 0.6mol/l potassium hydroxide solution cleaning acid resisting material be all eliminated to acid resisting material.Obtain touch-screen precursor.
Temperature be 20 DEG C, relative temperature is 75% time, irradiates in environment in amber light, the rim area of body adopts and to rotate and mode that car mixes painting applies photosensitive silver slurry in front of the touch screen.
It is 218rad/min that roller biography speed passes speed with coating wheel, and dryer rotating speed is 4m/min, and photosensitive silver slurry viscosity is 180cpa.s.
Then at 100 DEG C, photosensitive silver pulp layer is heat-treated.
Again the film (light tank width is 20 μm, and the spacing between light tank is 28 μm) is placed in photosensitive silver pulp layer, then above photosensitive silver pulp layer, exposure-processed is carried out to photosensitive silver pulp layer; Described exposure-processed condition is: light quantity is 500mj/m
2, the time shutter is 25s, and the standard of tolerance of exposure handle position is 0.01mm, and in exposure machine, ultraviolet wavelength is 380nm.
Then, at 30 DEG C, employing concentration is that the sodium hydroxide solution of 0.2mol/l carries out hydro-peening to the photosensitive silver pulp layer after exposure-processed, and hydro-peening pressure is 0.5kg/m
2.
At 140 DEG C, contact conductor is heat-treated again.
The contact conductor width formed in rim area is 20 μm, and the spacing between contact conductor is 28 μm.There is slight deformation in electrode lead pattern.
Embodiment 3
The present embodiment is for illustration of touch screen electrode circuit preparation method disclosed by the invention.
Thickness is adopted to be the PET(polyethylene terephthalate of 150 μm) plastic sheeting is as substrate.
At 50 DEG C, be in the potassium hydroxide solution of 0.5mol/l in concentration by substrate, soak 20min.
Form by magnetron sputtering the ITO conductive layer that thickness is 200nm on aforesaid substrate surface.
The ITO conductive layer of substrate surface forms acid resisting material layer by serigraphy.
Then, acid resisting material layer is placed the mask with the required electrode layer pattern formed and blocks, adopt UV-irradiation acid resisting material, acid resisting material layer is cured.
At 45 DEG C, pH is adopted to be that the mix acid liquor of the hydrochloric acid of 6.5mol/l and nitric acid is with 1.2kg/cm
2hydro-peening pressure hydro-peening acid resisting material layer 2min.
Then adopt concentration be 0.7mol/l potassium hydroxide solution cleaning acid resisting material be all eliminated to acid resisting material.Obtain touch-screen precursor.
Temperature be 20 DEG C, relative temperature is 75% time, irradiates in environment in amber light, the rim area of body adopts and to rotate and mode that car mixes painting applies photosensitive silver slurry in front of the touch screen.
It is 218rad/min that roller biography speed passes speed with coating wheel, and dryer rotating speed is 4m/min, and photosensitive silver slurry viscosity is 180cpa.s.
Then at 90 DEG C, photosensitive silver pulp layer is heat-treated.
Again the film (light tank width is 28 μm, and the spacing between light tank is 28 μm) is placed in photosensitive silver pulp layer, then above photosensitive silver pulp layer, exposure-processed is carried out to photosensitive silver pulp layer; Described exposure-processed condition is: light quantity is 600mj/m
2, the time shutter is 27s, and the standard of tolerance of exposure handle position is 0.01mm, and in exposure machine, ultraviolet wavelength is 380nm.
Then, at 30 DEG C, employing concentration is that the sodium hydroxide solution of 0.2mol/l carries out hydro-peening to the photosensitive silver pulp layer after exposure-processed, and hydro-peening pressure is 1.0kg/m
2.
At 140 DEG C, contact conductor is heat-treated again.
The contact conductor width formed in rim area is 28 μm, and the spacing between contact conductor is 28 μm.Electrode lead pattern is regular, without distortion.
Embodiment 4
The present embodiment is for illustration of touch screen electrode circuit preparation method disclosed by the invention.
Thickness is adopted to be the PET(polyethylene terephthalate of 100 μm) plastic sheeting is as substrate.
At 50 DEG C, be in the potassium hydroxide solution of 0.6mol/l in concentration by substrate, soak 15min.
Form by magnetron sputtering the ITO conductive layer that thickness is 200nm on aforesaid substrate surface.
The ITO conductive layer of substrate surface forms acid resisting material layer by serigraphy.
Then, acid resisting material layer is placed the mask with the required electrode layer pattern formed and blocks, adopt UV-irradiation acid resisting material, acid resisting material layer is cured.
At 45 DEG C, pH is adopted to be that the mix acid liquor of the hydrochloric acid of 6.5mol/l and nitric acid is with 1.2kg/cm
2hydro-peening pressure hydro-peening acid resisting material layer 2min.
Then adopt concentration be 0.7mol/l potassium hydroxide solution cleaning acid resisting material be all eliminated to acid resisting material.Obtain touch-screen precursor.
Temperature be 20 DEG C, relative temperature is 75% time, irradiates in environment in amber light, the rim area of body adopts and to rotate and mode that car mixes painting applies photosensitive silver slurry in front of the touch screen.
It is 213rad/min that roller biography speed passes speed with coating wheel, and dryer rotating speed is 2m/min, and photosensitive silver slurry viscosity is 180cpa.s.
Then at 100 DEG C, photosensitive silver pulp layer is heat-treated.
Again the film (light tank width is 20 μm, and the spacing between light tank is 20 μm) is placed in photosensitive silver pulp layer, then above photosensitive silver pulp layer, exposure-processed is carried out to photosensitive silver pulp layer; Described exposure-processed condition is: light quantity is 550mj/m
2, the time shutter is 26s, and the standard of tolerance of exposure handle position is 0.01mm, and in exposure machine, ultraviolet wavelength is 380nm.
Then, at 29 DEG C, employing concentration is that the potassium hydroxide solution of 0.19mol/l carries out hydro-peening to the photosensitive silver pulp layer after exposure-processed, and hydro-peening pressure is 1.1kg/m
2.
At 150 DEG C, contact conductor is heat-treated again.
The contact conductor width formed in rim area is 20 μm, and the spacing between contact conductor is 20 μm.Electrode lead pattern is regular, without distortion.
Embodiment 5
The present embodiment is for illustration of touch screen electrode circuit preparation method disclosed by the invention.
Thickness is adopted to be the PET(polyethylene terephthalate of 100 μm) plastic sheeting is as substrate.
At 50 DEG C, be in the potassium hydroxide solution of 0.5mol/l in concentration by substrate, soak 10min.
Form by magnetron sputtering the ITO conductive layer that thickness is 200nm on aforesaid substrate surface.
The ITO conductive layer of substrate surface forms acid resisting material layer by serigraphy.
Then, acid resisting material layer is placed the mask with the required electrode layer pattern formed and blocks, adopt UV-irradiation acid resisting material, acid resisting material layer is cured.
At 45 DEG C, pH is adopted to be that the mix acid liquor of the hydrochloric acid of 6.5mol/l and nitric acid is with 1.2kg/cm
2hydro-peening pressure hydro-peening acid resisting material layer 2min.
Then adopt concentration be 0.7mol/l potassium hydroxide solution cleaning acid resisting material be all eliminated to acid resisting material.Obtain touch-screen precursor.
Temperature be 20 DEG C, relative temperature is 75% time, irradiates in environment in amber light, the rim area of body adopts and to rotate and mode that car mixes painting applies photosensitive silver slurry in front of the touch screen.
It is 223rad/min that roller biography speed passes speed with coating wheel, and dryer rotating speed is 6m/min, and photosensitive silver slurry viscosity is 200cpa.s.
Then at 100 DEG C, photosensitive silver pulp layer is heat-treated.
Again the film (light tank width is 25 μm, and the spacing between light tank is 20 μm) is placed in photosensitive silver pulp layer, then above photosensitive silver pulp layer, exposure-processed is carried out to photosensitive silver pulp layer; Described exposure-processed condition is: light quantity is 600mj/m
2, the time shutter is 27s, and the standard of tolerance of exposure handle position is 0.01mm, and in exposure machine, ultraviolet wavelength is 380nm.
Then, at 30 DEG C, employing concentration is that the sodium hydroxide solution of 0.1mol/l carries out hydro-peening to the photosensitive silver pulp layer after exposure-processed, and hydro-peening pressure is 1.0kg/m
2.
At 140 DEG C, contact conductor is heat-treated again.
The contact conductor width formed in rim area is 25 μm, and the spacing between contact conductor is 20 μm.There is slight deformation in electrode lead pattern.
The foregoing is only preferred embodiment of the present invention, not in order to limit the present invention, all any amendments done within the spirit and principles in the present invention, equivalent replacement and improvement etc., all should be included within protection scope of the present invention.
Claims (10)
1. a touch screen electrode circuit preparation method, is characterized in that, comprising:
S1, provide touch-screen precursor; Described touch-screen precursor comprises substrate, and described substrate comprises central visible area and is positioned at the rim area of central visible area surrounding, is provided with electrode layer in described central visible area;
S2, in the rim area of described substrate surface, apply photosensitive silver slurry, form photosensitive silver pulp layer;
S3, the film is placed in photosensitive silver pulp layer, then above photosensitive silver pulp layer, exposure-processed is carried out to photosensitive silver pulp layer; Described exposure-processed condition is: light quantity is 500-650mj/m
2, the time shutter is 25-27s, and the standard of tolerance of exposure handle position is ± 0.2mm, and in exposure machine, ultraviolet wavelength is 380-780nm;
S4, carry out development treatment to the photosensitive silver pulp layer after exposure-processed, form live width and be less than 30 μm, the spacing contact conductor that is less than 30 μm, described contact conductor is electrically connected with electrode layer; Described developing method is: at 29-31 DEG C, and adopt concentration to be that the potassium hydroxide of 0.19-0.21mol/l or sodium hydroxide solution carry out hydro-peening to the photosensitive silver pulp layer after exposure-processed, hydro-peening pressure is 0.8-1.2kg/m
2.
2. preparation method according to claim 1, is characterized in that, in described step S2, is 18-21 DEG C in temperature, under relative humidity is 65-75%, irradiates in environment apply photosensitive silver slurry in amber light.
3. preparation method according to claim 1 and 2, is characterized in that, in described step S2, during coating photosensitive silver slurry, it is 213-223rad/min that roller biography speed passes speed with coating wheel, and dryer rotating speed is 3-5m/min, and photosensitive silver slurry viscosity is 130-230cpa.s.
4. preparation method according to claim 1, is characterized in that, after described step S2, also comprises pre-bake step before step S3, and described prebake conditions method is: heat-treat photosensitive silver pulp layer at 90-100 DEG C.
5. the preparation method according to claim 1 or 4, is characterized in that, after described step S4, also comprise baking procedure, and described baking method is: heat-treat contact conductor at 140-150 DEG C.
6. preparation method according to claim 1, is characterized in that, the described film has light tank, and described light tank is corresponding with the contact conductor pattern of required formation; Described light tank width is less than 30 μm, and the spacing between light tank is less than 30 μm.
7. according to the preparation method in claim 1,2,4,6 described in any one, it is characterized in that, described touch-screen precursor prepares by the following method: form ITO conductive layer at substrate surface; Then form acid resisting material at ITO conductive layer surface, and solidify acid resisting material according to the electrode layer pattern of required formation; Recycling etching solution etches described ITO conductive layer and acid resisting material, forms the electrode pattern that surface coverage has acid resisting material; Finally peel off acid resisting material, obtain electrode layer.
8. preparation method according to claim 7, is characterized in that, between formation ITO conductive layer, first substrate is cleaned, described cleaning method is: at 55-65 DEG C, is in the potassium hydroxide solution of 0.4-0.7mol/l by substrate in concentration, soaks 2-33min.
9. preparation method according to claim 7, is characterized in that, described engraving method is: at 43-47 DEG C, adopts pH to be that the mix acid liquor of 6.5-7.5mol/l is with 1.2-1.6kg/cm
2hydro-peening pressure hydro-peening 1-2min; Described mix acid liquor is the mix acid liquor of hydrochloric acid and nitric acid.
10. preparation method according to claim 7, is characterized in that, the method for described stripping acid resisting material is: employing concentration is that the potassium hydroxide solution cleaning acid resisting material of 0.6-0.8mol/l is all eliminated to acid resisting material.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106445225A (en) * | 2016-08-03 | 2017-02-22 | 深圳市骏达光电股份有限公司 | Touch screen and processing method thereof |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20130000954A1 (en) * | 2010-06-22 | 2013-01-03 | Nissha Printing Co., Ltd. | Narrow frame touch input sheet with good anticorrosion property and manufacturing method thereof |
| CN103294276A (en) * | 2013-06-08 | 2013-09-11 | 南昌欧菲光科技有限公司 | Touch screen electrode and manufacturing method thereof |
| CN103309510A (en) * | 2013-06-08 | 2013-09-18 | 南昌欧菲光科技有限公司 | Touch screen electrode manufacturing method |
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| US20130000954A1 (en) * | 2010-06-22 | 2013-01-03 | Nissha Printing Co., Ltd. | Narrow frame touch input sheet with good anticorrosion property and manufacturing method thereof |
| CN103294276A (en) * | 2013-06-08 | 2013-09-11 | 南昌欧菲光科技有限公司 | Touch screen electrode and manufacturing method thereof |
| CN103309510A (en) * | 2013-06-08 | 2013-09-18 | 南昌欧菲光科技有限公司 | Touch screen electrode manufacturing method |
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| CN106445225A (en) * | 2016-08-03 | 2017-02-22 | 深圳市骏达光电股份有限公司 | Touch screen and processing method thereof |
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