CN203324946U - Touch screen electrode - Google Patents
Touch screen electrode Download PDFInfo
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- CN203324946U CN203324946U CN2013203309319U CN201320330931U CN203324946U CN 203324946 U CN203324946 U CN 203324946U CN 2013203309319 U CN2013203309319 U CN 2013203309319U CN 201320330931 U CN201320330931 U CN 201320330931U CN 203324946 U CN203324946 U CN 203324946U
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- photosensitive silver
- silver slurry
- contact conductor
- touch screen
- screen electrode
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Abstract
A touch screen electrode comprises a substrate, a conducting layer and photosensitive silver paste electrode leads, and the substrate comprises a display area and a frame area; under the condition of yellow light, the conducting layer with a plurality of conducting pattern areas is formed on the display area of the substrate by the processes of coating, exposure, development, etching and stripping, photosensitive silver paste is screen-printed on the frame area, exposure and development are then directly performed, consequently, the display area is provided with the conducting pattern areas which compose the conducting layer, the frame area is provided with the photosensitive silver paste electrode leads with smaller line width and line spacing, and the photosensitive silver paste electrode leads are electrically connected with the conducting pattern areas to form a circuit. Since the photosensitive silver paste electrode leads are obtained by the mode of exposure and development, the line width and the line spacing can be reduced, moreover, the flow of the production method of the touch screen electrode is simple, the cost is reduced, and meanwhile, undesirable phenomena, such as ink permeation, sticking and sawtoothed edges, are prevented.
Description
Technical field
The utility model relates to the touch screen technology field, particularly relates to a kind of touch screen electrode.
Background technology
Along with the cut-throat competition of contact panel (touch panel, TP) industry, touch screen technology is constantly updated and innovation, a large amount of narrow border displays occurs in the market, for example panel computer, televisor, mobile phone etc.The frame of display mainly is laid with contact conductor, and the live width line-spacing of contact conductor is less, and the overall width of display frame is less, and frame is narrower.
The traditional manufacture method of the touch screen electrode of narrow frame is by tin-doped indium oxide unnecessary on transparency conducting layer (Indium Tin Oxide, ITO) by etched mode, remove, stay circuit pattern, and then printed silver slurry formation contact conductor, make contact conductor and circuit pattern directly form loop.
The traditional manufacture method of the touch screen electrode of narrow frame is after the circuit pattern that forms central visible area, mode by serigraphy starches by silver the outside, circuit pattern edge that circuit directly is printed on central visible area, and overlaps and the formation loop with the circuit pattern in visible area.Due to the technical limitation that is subject to serigraphy, the live width line-spacing normal condition of the contact conductor formed with this mode printed silver slurry circuit can only reach the 100/100um rank, can't meet the requirement of the whole narrow frame of touch screen electrode of narrow frame, and in the process of serigraphy silver slurry circuit, the bad phenomenon such as printing ink transmission, adhesion and edge sawtooth easily appear, thereby affect the function yield of touch screen electrode, thereby production cost is higher.
Summary of the invention
Based on this, be necessary can't meet too greatly narrow frame requirement and the higher problem of cost for the live width line-spacing, provide a kind of live width line-spacing less and lower-cost touch screen electrode.
A kind of touch screen electrode comprises:
Substrate, comprise viewing area and frame region, and described viewing area and described frame region are complementary;
Conductive layer, be attached at described viewing area, comprises a plurality of conductive patterns district, a plurality of conductive patterns district mutually insulated;
Photosensitive silver slurry contact conductor, be attached at described frame region, described photosensitive silver slurry contact conductor one end is electrically connected to described conductive pattern district, and each described conductive pattern district all is electrically connected with a described photosensitive silver slurry contact conductor, and described photosensitive silver slurry contact conductor space is with insulation.
Therein in embodiment, described conductive pattern district comprises by some metal wires and intersects the metal grill formed, and metal grill is irregular random grid.
In embodiment, wherein a kind of metal material that described metal wire is copper, silver, zinc, gold or nickel forms therein.
In embodiment, described photosensitive silver slurry contact conductor comprises connecting portion and leading part therein, and described leading part is electrically connected to described conductive pattern district by described connecting portion.
In embodiment, described leading part is parallel to each other spaced therein.
In embodiment, the live width scope of described photosensitive silver slurry contact conductor is 20 μ m-50 μ m therein.
In embodiment, the line-spacing scope between described photosensitive silver slurry contact conductor is 20 μ m-50 μ m therein.
Above-mentioned touch screen electrode, at first form conductive layer at substrate surface, then apply resistant layer at conductive layer surface, the resistant layer of exposing again, carry out again the video picture processing, etching, peel off the resistant layer of conductive layer surface, obtain viewing area and frame region, viewing area comprises a plurality of conductive patterns district, a plurality of conductive patterns district mutually insulated, viewing area and frame region are complementary, at frame region silk-screen photosensitive silver, starch again, again by the mode of exposure imaging, can obtain having the photosensitive silver slurry contact conductor of less live width line-spacing, the photosensitive silver slurry has photosensitive resin, can directly by exposure imaging, form the photosensitive silver slurry contact conductor with less live width line-spacing, so operating process is simple, reduced cost, and while obtaining touch screen electrode by the way, avoided the printing ink transmission, adhesion, and the bad phenomenon such as edge sawtooth.
The accompanying drawing explanation
The structural representation that Fig. 1 is touch screen electrode;
The structural representation at another visual angle that Fig. 2 is touch screen electrode;
The partial schematic diagram that Fig. 2 A is A in Fig. 2;
The process flow diagram that Fig. 3 is touch screen electrode preparation method in an embodiment;
The process flow diagram that Fig. 4 is touch screen electrode preparation method in another embodiment.
Embodiment
Below in conjunction with the drawings and specific embodiments, the utility model is described in further detail.
Refer to Fig. 1, Fig. 2 and Fig. 2 A, a kind of touch screen electrode 100, comprise substrate 110, conductive layer 120 and photosensitive silver slurry contact conductor 130.Substrate 110 comprises viewing area 112 and frame region 114, and described viewing area 112 is complementary with described frame region 114, and viewing area 112 is positioned at middle position, generally be rectangle or square, and viewing area 112 and frame region 114 shape complementarities.Frame region 114 generally is positioned at the touch-screen edge.Described viewing area 112 shows user interface, and frame region 114 is for laying contact conductor.Conductive layer 120 is attached at described viewing area 112, comprises a plurality of conductive patterns district 122, a plurality of conductive patterns district 122 mutually insulateds.Photosensitive silver slurry contact conductor 130 is attached at described frame region 114, photosensitive silver slurry contact conductor 130 1 ends are electrically connected to conductive pattern district 122, each conductive pattern district 122 all is electrically connected with a described photosensitive silver slurry contact conductor 130, and described photosensitive silver slurry contact conductor 130 spaces are with insulation.
Above-mentioned touch screen electrode 100, photosensitive silver slurry contact conductor 130 is by after frame region 114 printing photosensitive silver slurries, directly by the exposure imaging mode, form, one end of photosensitive silver slurry contact conductor 130 is electrically connected to conductive pattern district 122, and each conductive pattern district 122 all is electrically connected with a photosensitive silver slurry contact conductor 130.Because the photosensitive silver slurry comprises photosensitive resin and silver powder particles, the part of photosensitive silver slurry exposure can be solidified, therefore can be by thering is the exposure masterplate exposure of less live width line-spacing contact conductor figure, the photosensitive silver slurry developed again except removing photosensitive silver slurry contact conductor 130, formation has the photosensitive silver slurry contact conductor 130 of less live width line-spacing, meets the narrow-frame touch panel requirement.
In the present embodiment, the live width scope of photosensitive silver slurry contact conductor 130 is 20 μ m-50 μ m.It can be preferably the arbitrary live width in 20 μ m, 30 μ m, 40 μ m or 50 μ m.The line-spacing scope of photosensitive silver slurry contact conductor 130 is 20 μ m-50 μ m.It can be preferably the arbitrary line-spacing in 20 μ m, 30 μ m, 40 μ m or 50 μ m.With the contact conductor that in prior art, the live width line-spacing is 100/100 μ m, compare, in the utility model, the live width line-spacing of contact conductor has reduced greatly, and the narrow frame obtained is narrower.
Refer to Fig. 2 and Fig. 2 A, in the present embodiment, described conductive pattern district 122 comprises the metal grill consisted of some metal wires intersections, and metal grill is irregular random grid.Metal wire can for copper, silver, zinc, gold, nickel or other common electric conductivity preferably wherein a kind of metal material form, can further reduce the cost of touch screen electrode.Because conductive pattern district 122 consists of metal grill, guaranteeing that under transparent prerequisite, the metal material expended still less, cost-saving simultaneously.When metal grill is irregular grid immediately, can also eliminate Moire fringe, improve the customer experience sense.It is to be noted, when conductive pattern district 122 comprises the metal grill of some metal wires formations, just further reduced cost, when the material in conductive pattern district 122 is ITO, do not affect by frame region silk-screen photosensitive silver slurry contact conductor 130, reduce live width line-spacing this purpose of photosensitive silver slurry contact conductor 130 by the exposure imaging mode.
Refer to Fig. 2 and Fig. 2 A, in the present embodiment, described photosensitive silver slurry contact conductor 130 can comprise connecting portion 132 and leading part 134, and described leading part 134 is electrically connected to described conductive pattern district 122 by described connecting portion 132.When exposure photosensitive silver slurry, can select the exposure masterplate with connecting portion 132 and leading part 134 to be exposed, the photosensitive silver slurry contact conductor 130 that there is connecting portion 132 and leading part 134 with formation, connecting portion 132 is electrically connected to conductive pattern district 122, and leading part 134 1 ends are electrically connected to connecting portion 132.Connecting portion 132 is large with the connection area in conductive pattern district 122, so, after electric connection, electric conductivity is better.The live width of connecting portion 132 also can reduce by the mode of exposure imaging, so can further reduce the overall width of frame region 114.
Please consult Fig. 2 and Fig. 2 A, in the present embodiment, described leading part 134 is parallel to each other spaced again.Leading part 134, by certain spacing is set, makes many photosensitive silver slurry contact conductors 130 non-intersect, thereby makes photosensitive silver slurry contact conductor 130 mutually insulateds.General, article two, when line segment is non-intersect, when two line segments are parallel apart from minimum, so the leading part 134 that photosensitive silver is starched to contact conductor is made as when parallel, line-spacing minimum between photosensitive silver slurry contact conductor 130, can further reduce the overall width of frame region 114, obtain narrower frame region 114.In the present embodiment, the scope of the distance s of described leading part 132 is 20 μ m-50 μ m.Can be preferably 20 μ m, 30 μ m, 40 μ m or 50 μ m.The scope of the live width d of described leading part is 20 μ m-50 μ m.Can be preferably 20 μ m, 30 μ m, 40 μ m or 50 μ m.
Refer to Fig. 3, a kind of manufacture method of touch screen electrode also is provided, mainly comprise the following steps, wherein, institute all carries out in steps under the gold-tinted condition.
Step S100, provide substrate.Substrate can be water white plastic sheeting, and thickness is 100 μ m.
Step S110, arrange conductive material in described substrate surface to form conductive layer.In the present embodiment, can the ITO material be formed to substrate surface by sputter, to form conductive layer.The thickness of conductive layer is 200nm, to form visually transparent transparency conducting layer.
Step S111, burin-in process conductive layer and substrate.Conductive layer is put into together with substrate to infrared ray (Infra-red, IR) oven and is shunk, with the expansion and contraction that guarantees substrate in preset range.By 140 ℃ of high temperature, whole substrate and conductive layer are carried out to burin-in process, with the expansion and contraction that guarantees substrate in normal scope.Even it is pointed out that this step is not set, do not affect photosensitive silver slurry contact conductor this purpose of starching to obtain less live width line-spacing by the silk-screen photosensitive silver yet.
Step S120, apply resistant layer in the surface of conductive layer, with the protection conductive layer.Surface at conductive layer applies resistant layer, makes conductive layer surface all cover one deck resistant layer.The material of resistant layer is negative light resistance agent, and negative light resistance agent is a kind of of photoresist, and it shines the partly solidified of light, can not be dissolved in the photoresistance developer solution, and the part that does not shine light can be dissolved in the photoresistance developer solution.Certainly, in other embodiment, can also apply the eurymeric photoresist, its part that shines light can be dissolved in the photoresistance developer solution, and the part that does not shine light can not be dissolved in the photoresistance developer solution.
Step S130, the described resistant layer of exposing, to obtain frame region and the viewing area with a plurality of conductive patterns district, described viewing area and frame region are complementary.The masterplate that will expose is covered in resistant layer top, and exposure light irradiates resistant layer by the exposure masterplate, and exposure partly solidified forms patterned resistant layer.The exposure masterplate is printed on reservation shape, comprises frame region and is positioned at central viewing area, and viewing area and frame region shape are complementary.There is a plurality of conductive patterns district viewing area, and the pattern in conductive pattern district can be strip, can be also the shapes such as rhombus.There is certain intervals in a plurality of conductive patterns district, so mutually insulated.In other embodiment, when applying the eurymeric photoresist, can be exposed by being printed on the exposure masterplate of the figure of the required pattern complementation of conductive layer.
Step S140, video picture is processed, so that the resistant layer except a plurality of conductive patterns district is removed.Utilize as K
2CO
3Organic solution resistant layer is carried out to the video picture processing, will less than the exposure do not have curing negative light resistance agent to rinse well.The negative light resistance agent solidified after exposure remains, to the conductive pattern district of the viewing area that is positioned at middle position being protected.
Step S150, etching, remove with the conductive material by the conductive layer except a plurality of conductive patterns district.Utilize acid solution, for example HCl, HNO
3Perhaps both mixed solutions, carry out etching to conductive layer except the conductive material in a plurality of conductive patterns district, and the conductive material except the conductive pattern district is etched away.And the conductive pattern district is because be coated with negative light resistance agent, so be retained.
Step S160, peel off described resistant layer, to form the conductive layer with a plurality of conductive patterns district in described viewing area, and a plurality of conductive patterns district mutually insulated, the frame region be complementary with described viewing area.Utilize alkaline solution, as N а OH solution carries out lift-off processing to remaining negative light resistance agent, thereby formed frame region and be positioned at central viewing area.Now, frame region is white space, is positioned at the marginal portion of substrate.Viewing area has a plurality of conductive patterns district.The pattern in conductive pattern district can be strip, can be also rhombus etc.
Step S170, the printing photosensitive silver is starched in described frame region.Utilizing 400 orders or 500 purpose steel wire half tone print thickness scopes in the marginal portion of substrate in frame region is the photosensitive silver slurry below 8 μ m.The photosensitive silver slurry is a kind of of sensitization photoresistance, and principal ingredient is divided into two parts, and a part is photosensitive resin, and another part is silver powder particles.Whole frame region all is printed with the photosensitive silver slurry.
Step S180, the described photosensitive silver slurry that exposes, form patterned photosensitive silver slurry.Photosensitive silver slurry under the effect of light, exposure partly solidified, no the place of exposure can not solidified.Curing pattern part is photosensitive silver slurry contact conductor part.According to demand, the live width scope of the contact conductor pattern in the exposure masterplate can be made as to 20 μ m-50 μ m, the scope of live width is 20 μ m-50 μ m.Preferably, the live width line-spacing is designed to the different sizes such as 20/20 μ m, 30/30 μ m, 40/40 μ m, 50/50 μ m or 30/40 μ m.
Step S190, develop, to obtain photosensitive silver slurry contact conductor, described photosensitive silver slurry contact conductor is attached at described frame region, described photosensitive silver slurry contact conductor one end is electrically connected to described conductive pattern district, each described conductive pattern district all is electrically connected with a described photosensitive silver slurry contact conductor, described photosensitive silver slurry contact conductor mutually insulated.Utilize the weak base salt solution of low concentration, as N а
2CO
3Or K
2CO
3Solution is developed to the photosensitive silver slurry, and curing pattern part can not be developed, and does not have curing part development post-flush clean, obtains the photosensitive silver slurry contact conductor that the live width line-spacing is less.The live width scope of photosensitive silver slurry contact conductor is 20 μ m-50 μ m, and the scope of line-spacing is 20 μ m-50 μ m.Photosensitive silver slurry contact conductor is electrically connected to the conductive pattern district, and form loop, thereby form touch screen electrode, can be drive electrode or induction electrode.Can make again touch screen electrode with same method, two-layer touch screen electrode is fitted, get final product the narrow-frame touch panel input thin slice of complete.Wherein the gold-tinted condition is at the gold-tinted dust-free workshop and carries out.
In above-mentioned touch screen electrode preparation method, at first form conductive layer at substrate surface, then apply resistant layer at conductive layer surface, the resistant layer of exposing again, carry out again the video picture processing, etching, peel off the resistant layer of conductive layer surface, obtain viewing area and frame region, viewing area comprises a plurality of conductive patterns district, a plurality of conductive patterns district mutually insulated, viewing area and frame region are complementary, at frame region silk-screen photosensitive silver, starch again, again by the mode of exposure imaging, can obtain having the photosensitive silver slurry contact conductor of less live width line-spacing, aforesaid way all carries out under the gold-tinted condition, so do not need the conversion process condition, easy to operate, and can not cause actual bodily harm to the operator.The photosensitive silver slurry has photosensitive resin, can directly by exposure imaging, form photosensitive silver slurry contact conductor, the sensitization obtained and contact conductor live width line-spacing are less, operating process is simple, reduced cost, and, while obtaining touch screen electrode by the way, the bad phenomenon such as printing ink transmission, adhesion and edge sawtooth have been avoided.
In the present embodiment, before described step S180 exposure photosensitive silver slurry, also comprise step S171 prebake conditions under the gold-tinted condition, the photosensitive silver slurry is carried out to prebake conditions, to solidify described photosensitive silver slurry.Carry out prebake conditions by 60 ℃ of-100 ℃ of temperature, the photosensitive silver slurry is baked to a certain degree, make it when exposure, can instead not be stained with the film or masterplate.Even it is pointed out that this step is not set, do not affect photosensitive silver slurry contact conductor this purpose of starching to obtain less live width line-spacing by the silk-screen photosensitive silver yet.
In the present embodiment, can also comprise step S191 after described development step, under the gold-tinted condition, toasted, to solidify photosensitive silver slurry contact conductor.By 110 ℃ of-140 ℃ of high temperature, photosensitive silver slurry contact conductor is cured, improves adhesion and the resistivity of photosensitive silver slurry contact conductor.This step also completes in the gold-tinted workshop.It is pointed out that this step is in order to improve adhesion and the resistivity of photosensitive silver slurry contact conductor, even do not arrange, also do not affect the purpose of the photosensitive silver slurry contact conductor that obtains having less live width line-spacing.
Refer to Fig. 4, in other embodiment, described step S120 arranges conductive material and specifically can comprise to form conductive layer in described substrate surface:
Step S122, the coating metal ink is in described substrate surface.Metallic ink can form for the nano silver material hydrophilic solvent, and wherein solute is to be directly 20nm-40nm, the long silver of the simple substance for 10nm-20nm line.
Step S124, baking, obtain the irregular random metal grill intersected to form by some metal wires, and metal grill forms conductive layer.The Nano Silver ink of substrate surface is dried, form the nano-silver thread of cross-distribution, form irregular random metal grill, metal grill forms conductive layer.
The conductive pattern district of the conductive layer that above-mentioned steps makes comprises by some metal wires and intersects the metal grill formed, and guaranteeing that conductive layer is visual when transparent, saved conductive, further reduced manufacturing cost.
The above embodiment has only expressed several embodiment of the present utility model, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to the utility model the scope of the claims.It should be pointed out that for the person of ordinary skill of the art, without departing from the concept of the premise utility, can also make some distortion and improvement, these all belong to protection domain of the present utility model.Therefore, the protection domain of the utility model patent should be as the criterion with claims.
Claims (7)
1. a touch screen electrode, is characterized in that, comprising:
Substrate, comprise viewing area and frame region, and described viewing area and described frame region are complementary;
Conductive layer, be attached at described viewing area, comprises a plurality of conductive patterns district, a plurality of conductive patterns district mutually insulated;
Photosensitive silver slurry contact conductor, be attached at described frame region, described photosensitive silver slurry contact conductor one end is electrically connected to described conductive pattern district, and each described conductive pattern district all is electrically connected with a described photosensitive silver slurry contact conductor, and described photosensitive silver slurry contact conductor space is with insulation.
2. touch screen electrode according to claim 1, is characterized in that, described conductive pattern district comprises the metal grill consisted of some metal wires intersections, and metal grill is irregular random grid.
3. touch screen electrode according to claim 2, is characterized in that, wherein a kind of metal material that described metal wire is copper, silver, zinc, gold or nickel forms.
4. touch screen electrode according to claim 1, is characterized in that, described photosensitive silver slurry contact conductor comprises connecting portion and leading part, and described leading part is electrically connected to described conductive pattern district by described connecting portion.
5. touch screen electrode according to claim 4, is characterized in that, described leading part is parallel to each other spaced.
6. touch screen electrode according to claim 1, is characterized in that, the live width scope of described photosensitive silver slurry contact conductor is 20 μ m-50 μ m.
7. touch screen electrode according to claim 1, is characterized in that, the line-spacing scope between described photosensitive silver slurry contact conductor is 20 μ m-50 μ m.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2013203309319U CN203324946U (en) | 2013-06-08 | 2013-06-08 | Touch screen electrode |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2013203309319U CN203324946U (en) | 2013-06-08 | 2013-06-08 | Touch screen electrode |
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| CN203324946U true CN203324946U (en) | 2013-12-04 |
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| CN2013203309319U Expired - Lifetime CN203324946U (en) | 2013-06-08 | 2013-06-08 | Touch screen electrode |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104850265A (en) * | 2015-06-03 | 2015-08-19 | 深圳市成鸿科技有限公司 | Method for manufacturing single-layer multi-point touch control structures |
-
2013
- 2013-06-08 CN CN2013203309319U patent/CN203324946U/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104850265A (en) * | 2015-06-03 | 2015-08-19 | 深圳市成鸿科技有限公司 | Method for manufacturing single-layer multi-point touch control structures |
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Legal Events
| Date | Code | Title | Description |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20210421 Address after: 231323 Building 1, precision electronics industrial park, Hangbu Town, Shucheng County, Lu'an City, Anhui Province Patentee after: Anhui jingzhuo optical display technology Co.,Ltd. Address before: 330000 Jiangxi city of Nanchang province Huangjiahu road Nanchang economic and Technological Development Zone Patentee before: Nanchang OFilm Tech. Co.,Ltd. |
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| TR01 | Transfer of patent right | ||
| CX01 | Expiry of patent term |
Granted publication date: 20131204 |
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| CX01 | Expiry of patent term |