CN103205695B - A kind of evaporation mask plate and manufacture craft thereof - Google Patents
A kind of evaporation mask plate and manufacture craft thereof Download PDFInfo
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- CN103205695B CN103205695B CN201210010754.6A CN201210010754A CN103205695B CN 103205695 B CN103205695 B CN 103205695B CN 201210010754 A CN201210010754 A CN 201210010754A CN 103205695 B CN103205695 B CN 103205695B
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Abstract
The present invention proposes a kind of evaporation mask plate and manufacture craft thereof, and described manufacture craft comprises the steps: to arrange substrate; At the one side at least two-layer mask flaggy of electroforming successively of substrate, each mask flaggy is provided with opening, and the size of mask flaggy opening expands and becomes large along with the distance of mask flaggy and substrate.Multilayer opening arrays is together, roughly tapered.The evaporation mask plate proposed by the present invention and manufacture craft thereof, by electroformed multilayer mask flaggy, improve the positional precision of OLED evaporation mask plate; Improve the precision of OLED evaporation mask plate opening size; The angle of upper and lower opening can be controlled arbitrarily, to meet evaporation requirement.
Description
Technical field
The invention belongs to mask plate manufacture technology field, relate to a kind of mask plate structure, particularly a kind of evaporation mask plate; Meanwhile, the invention still further relates to a kind of manufacture craft of evaporation mask plate.
Background technology
Organic light emitting display, owing to having the advantage of wide viewing angle, high-contrast and high corresponding speed, has been given and has shown great attention to.Meanwhile, el light emitting device is divided into inorganic electroluminescent device and Organnic electroluminescent device; Brightness and the response speed of organic light-emitting device are higher than inorganic electroluminescent device, and can color display.
Display of organic electroluminescence comprises Organnic electroluminescent device, and Organnic electroluminescent device has and is stacked on suprabasil anode, organic material layer and negative electrode respectively.Organic material layer comprises organic emission layer, the exciton that organic emission layer obtains due to compound hole and electronics and luminous.In addition, in order to hole and electronics are transferred to emission layer reposefully and improve emission efficiency, electron injecting layer and electron transfer layer can be arranged between negative electrode and organic emission layer, and hole injection layer and hole transmission layer can be arranged between anode and organic emission layer.
Above-mentioned Organnic electroluminescent device comprises the first electrode, organic luminous layer and the second electrode.When manufacturing organic light-emitting device, lithographically, by etching reagent composition on ITO.Photolithography be used for again preparation the second electrode time, moisture infiltrates between organic luminous layer and the second electrode, can shorten the life-span of organic light-emitting device significantly, reduce its performance.In order to overcome above problem, adopt evaporation process to be deposited on substrate by luminous organic material, form organic luminous layer, the method needs supporting high precision evaporation mask plate.The making of the second electrode is with the making method of luminescent layer.
In evaporate process, along with the prolongation of time, temperature is also in continuous rising, high temperature can reach 60 DEG C, if due to during the very thin so application of mask plate without process, mask plate relatively can produce position deviation by its mask frame, and sagging, affect organic materials evaporating quality.
Current OLED makes field and generally adopts individual layer evaporation mask plate; as shown in Figure 1; organic material particles passes mask plate from all angles and is attached at substrate; opening 11 zero draft; when particle tilt inject angle be less than or equal to θ time; this part particle can encounter perforated wall and crested, cannot arrive substrate.This phenomenon can produce following problem: excalation appears in the particle that inclination is injected, and causes briliancy to decline, and can not form thickness and the shape of hope on substrate.
In sum, in traditional technology, the mask plate with steep-taper opening cannot be made by the technique of electroforming one deck.
Summary of the invention
Object of the present invention is intended at least solve one of above-mentioned technological deficiency, particularly solves and cannot make the mask plate problem with steep-taper opening.
For achieving the above object, the present invention proposes a kind of manufacture craft of evaporation mask plate, comprising the steps: to arrange substrate; At the one side at least two-layer mask flaggy of electroforming successively of substrate, each mask flaggy is provided with opening, and the size of mask flaggy opening expands and becomes large along with the distance of mask flaggy and substrate.
In one embodiment of the invention, multilayer opening arrays is together, roughly tapered, and opening tapering is formed by the apertures overlie of multilayer size increments.
In one embodiment of the invention, described manufacture craft comprises the making step of the first layer mask flaggy, comprises successively: core pre-treatment step, step of membrane sticking, step of exposure, development step, electroforming step, subsequent processing steps; Subsequent disposal comprises sandblasting operation, thus increases surfaceness, improves the bonding force between the first layer and the second layer; The sand sprayed is silicon carbide, and Grains number is 200-500 order.
Wherein, the processing parameter of described electroforming step is as follows: soak time is 3-5min, and the electroforming time is 60min.In described electroforming step, the additive in electroforming solution comprises: pneumatic blending uses and the agent 65ml that walks, the stablizer 25ml of mechanical stirring wetting agent 25ml, raising ion dispersive ability and depth capability.
In one embodiment of the invention, at the one side electroforming N layer mask flaggy successively of substrate, wherein, N >=2; Described manufacture craft comprises the making step of the second layer to n-th layer mask flaggy, comprises successively respectively: step of membrane sticking, step of exposure, electroforming step, subsequent processing steps.
Wherein, the processing parameter of described electroforming step is as follows: soak time is 6-8min, and the electroforming time is 80min.
In one embodiment of the invention, at the one side electroforming N layer mask flaggy successively of substrate, wherein, N >=2; Described manufacture craft comprises the making step of n-th layer mask flaggy, comprises successively respectively: step of membrane sticking, step of exposure, electroforming step, ultrasonic demoulding step.
In one embodiment of the invention, the processing parameter of described electroforming step is as follows: soak time is 6-8min, and the electroforming time is 80min.
Wherein, in described ultrasonic demoulding step, ultrasonic demoulding 3 times, each 5min.
The present invention proposes a kind of evaporation mask plate simultaneously, comprising: substrate, at least two-layer mask flaggy in the one side electroforming successively of substrate; Each mask flaggy is provided with opening, and the size of mask flaggy opening expands and becomes large along with the distance of mask flaggy and substrate.
The evaporation mask plate proposed by the present invention and manufacture craft thereof, by electroformed multilayer mask flaggy, improve the positional precision of OLED evaporation mask plate; Improve the precision of OLED evaporation mask plate opening size; The angle of upper and lower opening can be controlled arbitrarily, to meet evaporation requirement.
Because mask plate of the present invention divides the evaporation mask plate of multilayer electroforming different thickness, by the design of opening size and the control of electroforming process parameter, realize along with the number of plies increases progressively, opening size increases progressively, the opening tapering formed is σ, to meet evaporation requirement, improves the quality of precision and OLED.
The aspect that the present invention adds and advantage will part provide in the following description, and part will become obvious from the following description, or be recognized by practice of the present invention.
Accompanying drawing explanation
The present invention above-mentioned and/or additional aspect and advantage will become obvious and easy understand from the following description of the accompanying drawings of embodiments, wherein:
Fig. 1 is the structural representation of existing individual layer evaporation mask plate;
Fig. 2 is the schematic cross-section of evaporation mask plate in one embodiment of the invention;
Fig. 3 is the structural representation () of evaporation mask plate in one embodiment of the invention;
Fig. 4 is the structural representation (two) of evaporation mask plate in one embodiment of the invention;
Fig. 5 is the partial schematic diagram of Fig. 4.
Embodiment
Be described below in detail embodiments of the invention, the example of described embodiment is shown in the drawings, and wherein same or similar label represents same or similar element or has element that is identical or similar functions from start to finish.Being exemplary below by the embodiment be described with reference to the drawings, only for explaining the present invention, and can not limitation of the present invention being interpreted as.
In describing the invention, it will be appreciated that, term " on ", D score, "front", "rear", " interior ", the orientation of the instruction such as " outward " or position relationship be based on orientation shown in the drawings or position relationship, only the present invention for convenience of description and simplified characterization, instead of indicate or imply that the device of indication or element must have specific orientation, with specific azimuth configuration and operation, therefore can not be interpreted as limitation of the present invention.In addition, term " first ", " second " only for describing object, and can not be interpreted as instruction or hint relative importance.
Main innovation part of the present invention is, the present invention innovatively proposes a kind of evaporation mask plate, refer to Fig. 2-Fig. 5, evaporation mask plate comprise substrate 10, substrate 10 one side successively electroforming at least two-layer mask flaggy 21,22, in 23(the present embodiment the side of substrate 10 be provided with tri-layer mask flaggy).Each mask flaggy 21,22,23 is provided with opening, and the size of mask flaggy opening expands and becomes large along with the distance of mask flaggy 21,22,23 and substrate 10.Multilayer opening arrays is together, roughly tapered, and opening tapering is formed by the apertures overlie of multilayer size increments.Preferably, as shown in Figure 2, the tapering of each opening is σ, thus meets evaporation requirement, improves the quality of precision and OLED.
Meanwhile, the invention allows for a kind of manufacture craft of evaporation mask plate, comprise the steps:
Step S1: substrate is set;
Step S2: at the one side at least two-layer mask flaggy of electroforming successively of substrate, each mask flaggy is provided with opening, the size of mask flaggy opening expands and becomes large along with the distance of mask flaggy and substrate.Multilayer opening arrays is together, roughly tapered.
In one embodiment of the invention, the side of substrate 10 is provided with N layer mask flaggy, N >=2.Step S2 specifically comprises:
Step S21: the making step of the first layer mask flaggy, comprises successively: core pre-treatment step, step of membrane sticking, step of exposure, development step, electroforming step, subsequent processing steps.Wherein, the processing parameter of described electroforming step is as follows: soak time is 3-5min, and the electroforming time is that 60min(is certain, can be also other times, as 50min-100min).Additive in electroforming solution comprises: pneumatic blending with and mechanical stirring wetting agent 25ml(certain, the consumption of wetting agent also can be other values, as 15ml-40ml), the agent 65ml(that walks that improves ion dispersive ability and depth capability is certain, walking the consumption of agent also can for other value, as 30ml-100ml), stablizer 25ml(is certain, the consumption of stablizer can be also other values, as 10ml-50ml).The amount ratio of wetting agent, the agent that walks, stablizer is preferably 25:65:25.In this step, subsequent disposal comprises sandblasting operation, thus increases surfaceness, improves the bonding force between the first layer and the second layer; The sand sprayed is silicon carbide, and Grains number is 200-500 order.
Step S22: the second layer, to the making step of n-th layer mask flaggy, comprises respectively successively: step of membrane sticking, step of exposure, electroforming step, subsequent processing steps.Wherein, the processing parameter of described electroforming step is as follows: soak time is 6-8min, and the electroforming time is 80min.The bonding force between first and second layer is improved by the control of subsequent processing steps and soak time.
Step S23: the making step of n-th layer mask flaggy, comprises: step of membrane sticking, step of exposure, electroforming step respectively successively, ultrasonic demoulding step.Wherein, the processing parameter of described electroforming step is as follows: soak time is 6-8min, and the electroforming time is 80min.In addition, in described ultrasonic demoulding step, ultrasonic demoulding 3 times, each 5min.
Although illustrate and describe embodiments of the invention, for the ordinary skill in the art, be appreciated that and can carry out multiple change, amendment, replacement and modification to these embodiments without departing from the principles and spirit of the present invention, scope of the present invention is by claims and equivalency thereof.
Claims (6)
1. a manufacture craft for evaporation mask plate, is characterized in that, comprises the steps:
Substrate is set;
At the one side electroforming N layer mask flaggy successively of substrate, wherein N >=2, each mask flaggy is provided with opening, and the size of mask flaggy opening expands and becomes large along with the distance of mask flaggy and substrate;
Described manufacture craft comprises the making step of the first layer mask flaggy, comprises successively: core pre-treatment step, step of membrane sticking, step of exposure, development step, electroforming step, subsequent processing steps; Subsequent disposal comprises sandblasting operation, thus increases surfaceness, improves the bonding force between the first layer and the second layer; The sand sprayed is silicon carbide, and Grains number is 200-500 order;
The processing parameter of described the first layer mask flaggy electroforming step is as follows: soak time is 3-5min, and the electroforming time is 60min;
Described manufacture craft comprises the making step of the second layer to n-th layer mask flaggy, comprises successively respectively: step of membrane sticking, step of exposure, electroforming step, subsequent processing steps;
The described second layer is as follows to the processing parameter of n-th layer mask flaggy electroforming step: soak time is 6-8min, and the electroforming time is 80min.
2. the manufacture craft of evaporation mask plate as claimed in claim 1, it is characterized in that, multilayer opening arrays is together tapered, and opening tapering is formed by the apertures overlie of multilayer size increments.
3. the manufacture craft of evaporation mask plate as claimed in claim 1, it is characterized in that, in the electroforming step of described making the first layer mask plate, the additive in electroforming solution comprises: pneumatic blending uses and the agent 65ml that walks, the stablizer 25ml of mechanical stirring wetting agent 25ml, raising ion dispersive ability and depth capability.
4. the manufacture craft of evaporation mask plate as claimed in claim 1, is characterized in that, at the one side electroforming N layer mask flaggy successively of substrate, wherein, and N >=2; Described manufacture craft comprises the making step of n-th layer mask flaggy, comprises successively respectively: step of membrane sticking, step of exposure, electroforming step, ultrasonic demoulding step.
5. the manufacture craft of evaporation mask plate as claimed in claim 4, it is characterized in that, the processing parameter of described electroforming step is as follows: soak time is 6-8min, and the electroforming time is 80min.
6. the manufacture craft of evaporation mask plate as claimed in claim 4, is characterized in that, in described ultrasonic demoulding step, and ultrasonic demoulding 3 times, each 5min.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210010754.6A CN103205695B (en) | 2012-01-16 | 2012-01-16 | A kind of evaporation mask plate and manufacture craft thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210010754.6A CN103205695B (en) | 2012-01-16 | 2012-01-16 | A kind of evaporation mask plate and manufacture craft thereof |
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| Publication Number | Publication Date |
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| CN103205695A CN103205695A (en) | 2013-07-17 |
| CN103205695B true CN103205695B (en) | 2015-11-25 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201210010754.6A Expired - Fee Related CN103205695B (en) | 2012-01-16 | 2012-01-16 | A kind of evaporation mask plate and manufacture craft thereof |
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Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103374734A (en) * | 2012-04-17 | 2013-10-30 | 昆山允升吉光电科技有限公司 | Method for raising coating binding force |
| JP5780350B2 (en) * | 2013-11-14 | 2015-09-16 | 大日本印刷株式会社 | Vapor deposition mask, vapor deposition mask with frame, and method of manufacturing organic semiconductor element |
| TWI682237B (en) * | 2015-02-10 | 2020-01-11 | 日商大日本印刷股份有限公司 | Evaporation mask |
| CN105063551A (en) * | 2015-07-15 | 2015-11-18 | 中国工程物理研究院激光聚变研究中心 | Mask method for preparing thin mask layer composed of multiple materials in zoning mode |
| CN106086781B (en) * | 2016-06-15 | 2018-09-11 | 京东方科技集团股份有限公司 | Mask assembly and its manufacturing method, display device |
| CN108628091B (en) * | 2017-03-20 | 2022-08-16 | 昆山国显光电有限公司 | Mask plate and manufacturing method thereof |
| CN107059071B (en) * | 2017-04-20 | 2019-05-24 | 上海天马有机发光显示技术有限公司 | A kind of release method of electroforming mask plate |
| CN108630832A (en) * | 2018-03-13 | 2018-10-09 | 阿德文泰克全球有限公司 | Metal shadow mask and preparation method thereof |
| CN108486616B (en) * | 2018-03-13 | 2020-05-05 | 阿德文泰克全球有限公司 | Metal shadow mask and method for manufacturing the same |
| CN108468072B (en) * | 2018-03-13 | 2020-05-05 | 阿德文泰克全球有限公司 | Iron-nickel alloy shadow mask and preparation method thereof |
Citations (3)
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| JP2005154879A (en) * | 2003-11-28 | 2005-06-16 | Canon Components Inc | Metal mask for vapor deposition, and method of producing vapor deposition pattern using the same |
| CN1804138A (en) * | 2005-11-14 | 2006-07-19 | 深圳市允升吉电子有限公司 | Mask electro-forming method for vaporization coating of organic light-emitting display |
| JP2011074404A (en) * | 2009-09-29 | 2011-04-14 | Nippon Seiki Co Ltd | Mask for vapor deposition |
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2012
- 2012-01-16 CN CN201210010754.6A patent/CN103205695B/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005154879A (en) * | 2003-11-28 | 2005-06-16 | Canon Components Inc | Metal mask for vapor deposition, and method of producing vapor deposition pattern using the same |
| CN1804138A (en) * | 2005-11-14 | 2006-07-19 | 深圳市允升吉电子有限公司 | Mask electro-forming method for vaporization coating of organic light-emitting display |
| JP2011074404A (en) * | 2009-09-29 | 2011-04-14 | Nippon Seiki Co Ltd | Mask for vapor deposition |
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| CN103205695A (en) | 2013-07-17 |
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