CN103205695A - A mask plate for vapor plating and a production method thereof - Google Patents
A mask plate for vapor plating and a production method thereof Download PDFInfo
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- CN103205695A CN103205695A CN2012100107546A CN201210010754A CN103205695A CN 103205695 A CN103205695 A CN 103205695A CN 2012100107546 A CN2012100107546 A CN 2012100107546A CN 201210010754 A CN201210010754 A CN 201210010754A CN 103205695 A CN103205695 A CN 103205695A
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Abstract
The invention discloses a mask plate for vapor plating and a production method thereof, and the production method comprises the following steps of: arranging a substrate; electroforming at least two mask plate layers in order on one surface of the substrate, and each mask plate layer is arranged with openings, and the size of the openings of each mask plate layer is widened along with the distance from the mask plate layer to the substrate. A plurality layers of openings are arranged together to roughly be a cone shape. According to the mask plate for vapor plating and the production method thereof provided by the invention, through electroforming a plurality of mask plate layers, the position accuracy of the mask plate for OLED vapor plating is improved, the opening size accuracy of the mask plate for OLED vapor plating is improved, and the angles of upper and lower openings can be controlled at will to satisfy vapor plating requirements.
Description
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Technical field
The invention belongs to the mask plate manufacture technology field, relate to a kind of mask plate structure, particularly a kind of evaporation mask plate; Simultaneously, the invention still further relates to the manufacture craft that a kind of evaporation is used mask plate.
Background technology
Organic light emitting display has been given and has shown great attention to owing to have the advantage of wide visual angle, high-contrast and high corresponding speed.Simultaneously, el light emitting device is divided into inorganic EL device and Organnic electroluminescent device; The brightness of organic light-emitting device and response speed are than inorganic EL device height, and the energy color display.
Display of organic electroluminescence comprises Organnic electroluminescent device, and Organnic electroluminescent device has and is stacked on suprabasil anode, organic material layer and negative electrode respectively.Organic material layer comprises organic emission layer, and organic emission layer is because the exciton that compound hole and electronics obtain and luminous.In addition, for hole and electronics are transferred to emission layer reposefully and improve emission efficiency, electron injecting layer and electron transfer layer can be arranged between negative electrode and the organic emission layer, and hole injection layer and hole transmission layer can be arranged between anode and the organic emission layer.
Above-mentioned Organnic electroluminescent device comprises first electrode, organic luminous layer and second electrode.When making organic light-emitting device, by photolithography, by etching reagent composition on ITO.When photolithography was used for preparing second electrode again, moisture infiltrated between organic luminous layer and second electrode, can shorten the life-span of organic light-emitting device significantly, reduced its performance.In order to overcome above problem, adopt evaporation process that luminous organic material is deposited on the substrate, form organic luminous layer, this method needs supporting high precision evaporation mask plate.The making of second electrode is with the making method of luminescent layer.
In evaporate process, along with the prolongation of time, temperature is also in continuous rising, high temperature can reach 60 ℃, thus since during very thin applications of mask plate if without processing, mask plate is its mask frame generation position deviation relatively, and sagging, influence the organic materials evaporating quality.
Individual layer evaporation mask plate is generally adopted in the OLED field that makes at present; as shown in Figure 1; the organic materials particle passes mask plate and is attached on the substrate from all angles; opening 11 zero drafts; when particle tilts to inject angle when being less than or equal to θ; this part particle can be run into perforated wall and crested can't arrive substrate.This phenomenon can produce following problem: make the particle that tilts to inject excalation occur, cause briliancy to descend, and can not form thickness and the shape of hope on substrate.
In sum, in the traditional technology, can't make the mask plate with big tapering opening by the technology of electroforming one deck.
Summary of the invention
Purpose of the present invention is intended to solve at least one of above-mentioned technological deficiency, particularly solves and can't make the mask plate problem with big tapering opening.
For achieving the above object, the present invention proposes a kind of evaporation with the manufacture craft of mask plate, comprise the steps: to arrange substrate; In the one side of the substrate two-layer at least mask flaggy of electroforming successively, each mask flaggy is provided with opening, and the size of mask flaggy opening enlarges along with the distance of mask flaggy and substrate and becomes big.
In one embodiment of the invention, the multilayer opening is arranged in together, and is roughly tapered, and the opening tapering is that the apertures overlie by the multilayer size increments forms.
In one embodiment of the invention, described manufacture craft comprises the making step of the first layer mask flaggy, comprises successively: core pre-treatment step, step of membrane sticking, step of exposure, development step, electroforming step, subsequent processing steps; Subsequent disposal comprises the sandblast operation, thereby increases surfaceness, improves the bonding force between the first layer and the second layer; The sand that sprays is silicon carbide, and the Grains number is the 200-500 order.
Wherein, the processing parameter of described electroforming step is as follows: soak time is 3-5min, and the electroforming time is 60min.In the described electroforming step, the additive in the electroforming solution comprises: pneumatic blending with and mechanical stirring with the agent 65ml that walks, the stablizer 25ml of wetting agent 25ml, raising ion dispersive ability and degree of depth ability.
In one embodiment of the invention, in the one side of substrate electroforming N layer mask flaggy successively, wherein, N 〉=2; Described manufacture craft comprises the making step of the second layer to the N layer mask flaggy, comprises successively respectively: step of membrane sticking, step of exposure, electroforming step, subsequent processing steps.
Wherein, the processing parameter of described electroforming step is as follows: soak time is 6-8min, and the electroforming time is 80min.
In one embodiment of the invention, in the one side of substrate electroforming N layer mask flaggy successively, wherein, N 〉=2; Described manufacture craft comprises the making step of N layer mask flaggy, comprises successively respectively: step of membrane sticking, step of exposure, electroforming step, ultrasonic demoulding step.
In one embodiment of the invention, the processing parameter of described electroforming step is as follows: soak time is 6-8min, and the electroforming time is 80min.
Wherein, in the described ultrasonic demoulding step, ultrasonic demoulding 3 times, each 5min.
The present invention proposes a kind of evaporation mask plate simultaneously, comprising: substrate, in the one side of the substrate two-layer at least mask flaggy of electroforming successively; Each mask flaggy is provided with opening, and the size of mask flaggy opening is along with distance expansion and the change of mask flaggy and substrate are big.
Evaporation mask plate and manufacture craft thereof by the present invention proposes by electroformed multilayer mask flaggy, have improved the positional precision of OLED evaporation with mask plate; Improved the precision of OLED evaporation with the mask plate opening size; Can control the angle of upper and lower opening arbitrarily, to satisfy the evaporation requirement.
Because mask plate of the present invention divides the evaporation mask plate of multilayer electroforming different thickness, by design and the electroforming process parameter control of opening size, realize along with the number of plies increases progressively, opening size increases progressively, the opening tapering that forms is σ, to satisfy the evaporation requirement, improves the quality of precision and OLED.
The aspect that the present invention adds and advantage part in the following description provide, and part will become obviously from the following description, or recognize by practice of the present invention.
Description of drawings
Above-mentioned and/or the additional aspect of the present invention and advantage are from obviously and easily understanding becoming the description of embodiment below in conjunction with accompanying drawing, wherein:
Fig. 1 is the structural representation of existing individual layer evaporation with mask plate;
Fig. 2 is the schematic cross-section that evaporation is used mask plate in the one embodiment of the invention;
Fig. 3 is the structural representation () that evaporation is used mask plate in the one embodiment of the invention;
Fig. 4 is the structural representation (two) that evaporation is used mask plate in the one embodiment of the invention;
Fig. 5 is the partial schematic diagram of Fig. 4.
Embodiment
Describe embodiments of the invention below in detail, the example of described embodiment is shown in the drawings, and wherein identical or similar label is represented identical or similar elements or the element with identical or similar functions from start to finish.Be exemplary below by the embodiment that is described with reference to the drawings, only be used for explaining the present invention, and can not be interpreted as limitation of the present invention.
In description of the invention, it will be appreciated that, term " on ", close the orientation of indications such as D score, " preceding ", " back ", " interior ", " outward " or position is based on orientation shown in the drawings or position relation, only be that the present invention for convenience of description and simplification are described, rather than indication or the hint device of indication or element must have specific orientation, with specific orientation structure and operation, therefore can not be interpreted as limitation of the present invention.In addition, term " first ", " second " only are used for describing purpose, and can not be interpreted as indication or hint relative importance.
Main innovation part of the present invention is, the present invention has proposed a kind of evaporation mask plate with innovating, see also Fig. 2-Fig. 5, evaporation with mask plate comprise substrate 10, a side of substrate 10 is provided with the tri-layer mask flaggy in the two-layer at least mask flaggy 21,22 of the one side of substrate 10 electroforming successively, 23(present embodiment).Each mask flaggy 21,22,23 is provided with opening, the size of mask flaggy opening along with mask flaggy 21,22,23 and the distance of substrate 10 enlarge and become big.The multilayer opening is arranged in together, and is roughly tapered, and the opening tapering is that the apertures overlie by the multilayer size increments forms.Preferably, as shown in Figure 2, the tapering of each opening is σ, thereby satisfies the evaporation requirement, improves the quality of precision and OLED.
Simultaneously, the invention allows for a kind of evaporation with the manufacture craft of mask plate, comprise the steps:
Step S1: substrate is set;
Step S2: in the one side of the substrate two-layer at least mask flaggy of electroforming successively, each mask flaggy is provided with opening, and the size of mask flaggy opening enlarges along with the distance of mask flaggy and substrate and becomes big.The multilayer opening is arranged in together, and is roughly tapered.
In one embodiment of the invention, a side of substrate 10 is provided with N layer mask flaggy, N 〉=2.Step S2 specifically comprises:
Step S21: the making step of the first layer mask flaggy comprises successively: core pre-treatment step, step of membrane sticking, step of exposure, development step, electroforming step, subsequent processing steps.Wherein, the processing parameter of described electroforming step is as follows: soak time is 3-5min, and the electroforming time is that 60min(is certain, also can be other times, as 50min-100min).Additive in the electroforming solution comprises: pneumatic blending is used and mechanical stirring uses wetting agent 25ml(certain, the consumption of wetting agent also can be worth for other, as 15ml-40ml), the agent 65ml(that walks that improves ion dispersive ability and degree of depth ability is certain, the consumption of agent of walking also can be worth for other, as 30ml-100ml), stablizer 25ml(is certain, the consumption of stablizer also can be for other be worth, as 10ml-50ml).The amount ratio of wetting agent, the agent that walks, stablizer is preferably 25:65:25.In this step, subsequent disposal comprises the sandblast operation, thereby increases surfaceness, improves the bonding force between the first layer and the second layer; The sand that sprays is silicon carbide, and the Grains number is the 200-500 order.
Step S22: the making step of the second layer to the N layer mask flaggy comprises respectively successively: step of membrane sticking, step of exposure, electroforming step, subsequent processing steps.Wherein, the processing parameter of described electroforming step is as follows: soak time is 6-8min, and the electroforming time is 80min.Control by subsequent processing steps and soak time improves the bonding force between first and second layer.
Step S23: the making step of N layer mask flaggy comprises respectively successively: step of membrane sticking, step of exposure, electroforming step, ultrasonic demoulding step.Wherein, the processing parameter of described electroforming step is as follows: soak time is 6-8min, and the electroforming time is 80min.In addition, in the described ultrasonic demoulding step, ultrasonic demoulding 3 times, each 5min.
Although illustrated and described embodiments of the invention, for the ordinary skill in the art, be appreciated that without departing from the principles and spirit of the present invention and can carry out multiple variation, modification, replacement and modification to these embodiment that scope of the present invention is by claims and be equal to and limit.
Claims (11)
1. the manufacture craft of an evaporation usefulness mask plate is characterized in that, comprises the steps:
Substrate is set;
In the one side of the substrate two-layer at least mask flaggy of electroforming successively, each mask flaggy is provided with opening, and the size of mask flaggy opening enlarges along with the distance of mask flaggy and substrate and becomes big.
2. evaporation as claimed in claim 1 is characterized in that with the manufacture craft of mask plate the multilayer opening is arranged in together, and is roughly tapered, and the opening tapering is that the apertures overlie by the multilayer size increments forms.
3. evaporation as claimed in claim 1 is characterized in that with the manufacture craft of mask plate described manufacture craft comprises the making step of the first layer mask flaggy, comprise successively: core pre-treatment step, step of membrane sticking, step of exposure, development step, electroforming step, subsequent processing steps; Subsequent disposal comprises the sandblast operation, thereby increases surfaceness, improves the bonding force between the first layer and the second layer; The sand that sprays is silicon carbide, and the Grains number is the 200-500 order.
4. evaporation as claimed in claim 3 is with the manufacture craft of mask plate, and it is characterized in that the processing parameter of described electroforming step is as follows: soak time is 3-5min, and the electroforming time is 60min.
5. evaporation as claimed in claim 3 is with the manufacture craft of mask plate, it is characterized in that, in the described electroforming step, the additive in the electroforming solution comprises: pneumatic blending with and mechanical stirring with the agent 65ml that walks, the stablizer 25ml of wetting agent 25ml, raising ion dispersive ability and degree of depth ability.
6. evaporation as claimed in claim 1 is characterized in that with the manufacture craft of mask plate, in the one side of substrate electroforming N layer mask flaggy successively, wherein, N 〉=2; Described manufacture craft comprises the making step of the second layer to the N layer mask flaggy, comprises successively respectively: step of membrane sticking, step of exposure, electroforming step, subsequent processing steps.
7. evaporation as claimed in claim 6 is with the manufacture craft of mask plate, and it is characterized in that the processing parameter of described electroforming step is as follows: soak time is 6-8min, and the electroforming time is 80min.
8. evaporation as claimed in claim 1 is characterized in that with the manufacture craft of mask plate, in the one side of substrate electroforming N layer mask flaggy successively, wherein, N 〉=2; Described manufacture craft comprises the making step of N layer mask flaggy, comprises successively respectively: step of membrane sticking, step of exposure, electroforming step, ultrasonic demoulding step.
9. evaporation as claimed in claim 8 is with the manufacture craft of mask plate, and it is characterized in that the processing parameter of described electroforming step is as follows: soak time is 6-8min, and the electroforming time is 80min.
10. evaporation as claimed in claim 8 is characterized in that with the manufacture craft of mask plate, in the described ultrasonic demoulding step, and ultrasonic demoulding 3 times, each 5min.
11. an evaporation mask plate is characterized in that, comprising: substrate, in the one side of the substrate two-layer at least mask flaggy of electroforming successively; Each mask flaggy is provided with opening, and the size of mask flaggy opening is along with distance expansion and the change of mask flaggy and substrate are big.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210010754.6A CN103205695B (en) | 2012-01-16 | 2012-01-16 | A kind of evaporation mask plate and manufacture craft thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210010754.6A CN103205695B (en) | 2012-01-16 | 2012-01-16 | A kind of evaporation mask plate and manufacture craft thereof |
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| CN103205695A true CN103205695A (en) | 2013-07-17 |
| CN103205695B CN103205695B (en) | 2015-11-25 |
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| CN201210010754.6A Expired - Fee Related CN103205695B (en) | 2012-01-16 | 2012-01-16 | A kind of evaporation mask plate and manufacture craft thereof |
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Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103374734A (en) * | 2012-04-17 | 2013-10-30 | 昆山允升吉光电科技有限公司 | Method for raising coating binding force |
| CN105063551A (en) * | 2015-07-15 | 2015-11-18 | 中国工程物理研究院激光聚变研究中心 | Mask method for preparing thin mask layer composed of multiple materials in zoning mode |
| CN106086781A (en) * | 2016-06-15 | 2016-11-09 | 京东方科技集团股份有限公司 | Mask assembly and manufacture method, display device |
| CN107059071A (en) * | 2017-04-20 | 2017-08-18 | 上海天马有机发光显示技术有限公司 | A kind of release method of electroforming mask plate |
| CN107208251A (en) * | 2015-02-10 | 2017-09-26 | 大日本印刷株式会社 | The manufacture method and deposition mask of deposition mask |
| CN108468072A (en) * | 2018-03-13 | 2018-08-31 | 阿德文泰克全球有限公司 | Iron-nickel alloy shadow mask and preparation method thereof |
| CN108486616A (en) * | 2018-03-13 | 2018-09-04 | 阿德文泰克全球有限公司 | Metal shadow mask and preparation method thereof |
| CN108628091A (en) * | 2017-03-20 | 2018-10-09 | 昆山国显光电有限公司 | Mask plate and preparation method thereof |
| CN108630832A (en) * | 2018-03-13 | 2018-10-09 | 阿德文泰克全球有限公司 | Metal shadow mask and preparation method thereof |
| CN110578120A (en) * | 2013-11-14 | 2019-12-17 | 大日本印刷株式会社 | Vapor deposition mask and method for manufacturing vapor deposition mask |
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| JP2005154879A (en) * | 2003-11-28 | 2005-06-16 | Canon Components Inc | Metal mask for vapor deposition, and method of producing vapor deposition pattern using the same |
| CN1804138A (en) * | 2005-11-14 | 2006-07-19 | 深圳市允升吉电子有限公司 | Mask electro-forming method for vaporization coating of organic light-emitting display |
| JP2011074404A (en) * | 2009-09-29 | 2011-04-14 | Nippon Seiki Co Ltd | Mask for vapor deposition |
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2005154879A (en) * | 2003-11-28 | 2005-06-16 | Canon Components Inc | Metal mask for vapor deposition, and method of producing vapor deposition pattern using the same |
| CN1804138A (en) * | 2005-11-14 | 2006-07-19 | 深圳市允升吉电子有限公司 | Mask electro-forming method for vaporization coating of organic light-emitting display |
| JP2011074404A (en) * | 2009-09-29 | 2011-04-14 | Nippon Seiki Co Ltd | Mask for vapor deposition |
Cited By (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103374734A (en) * | 2012-04-17 | 2013-10-30 | 昆山允升吉光电科技有限公司 | Method for raising coating binding force |
| CN110578120B (en) * | 2013-11-14 | 2022-03-08 | 大日本印刷株式会社 | Vapor deposition mask and method for manufacturing vapor deposition mask |
| CN110578120A (en) * | 2013-11-14 | 2019-12-17 | 大日本印刷株式会社 | Vapor deposition mask and method for manufacturing vapor deposition mask |
| CN107208251A (en) * | 2015-02-10 | 2017-09-26 | 大日本印刷株式会社 | The manufacture method and deposition mask of deposition mask |
| CN105063551A (en) * | 2015-07-15 | 2015-11-18 | 中国工程物理研究院激光聚变研究中心 | Mask method for preparing thin mask layer composed of multiple materials in zoning mode |
| CN106086781A (en) * | 2016-06-15 | 2016-11-09 | 京东方科技集团股份有限公司 | Mask assembly and manufacture method, display device |
| US10648070B2 (en) | 2016-06-15 | 2020-05-12 | Boe Technology Group Co., Ltd. | Mask assembly and method for manufacturing the same and display device |
| CN106086781B (en) * | 2016-06-15 | 2018-09-11 | 京东方科技集团股份有限公司 | Mask assembly and its manufacturing method, display device |
| CN108628091A (en) * | 2017-03-20 | 2018-10-09 | 昆山国显光电有限公司 | Mask plate and preparation method thereof |
| CN107059071B (en) * | 2017-04-20 | 2019-05-24 | 上海天马有机发光显示技术有限公司 | A kind of release method of electroforming mask plate |
| CN107059071A (en) * | 2017-04-20 | 2017-08-18 | 上海天马有机发光显示技术有限公司 | A kind of release method of electroforming mask plate |
| KR20190108028A (en) * | 2018-03-13 | 2019-09-23 | 어드밴텍 글로벌, 리미티드 | Metal shadow mask and preparation method thereof |
| CN108630832A (en) * | 2018-03-13 | 2018-10-09 | 阿德文泰克全球有限公司 | Metal shadow mask and preparation method thereof |
| CN108486616B (en) * | 2018-03-13 | 2020-05-05 | 阿德文泰克全球有限公司 | Metal shadow mask and method for manufacturing the same |
| CN108486616A (en) * | 2018-03-13 | 2018-09-04 | 阿德文泰克全球有限公司 | Metal shadow mask and preparation method thereof |
| KR102127568B1 (en) | 2018-03-13 | 2020-06-29 | 어드밴텍 글로벌, 리미티드 | Metal shadow mask and preparation method thereof |
| CN108468072A (en) * | 2018-03-13 | 2018-08-31 | 阿德文泰克全球有限公司 | Iron-nickel alloy shadow mask and preparation method thereof |
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