CN102627003A - 一种静电保护膜、显示装置和静电保护膜的制备方法 - Google Patents

一种静电保护膜、显示装置和静电保护膜的制备方法 Download PDF

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CN102627003A
CN102627003A CN2012100317417A CN201210031741A CN102627003A CN 102627003 A CN102627003 A CN 102627003A CN 2012100317417 A CN2012100317417 A CN 2012100317417A CN 201210031741 A CN201210031741 A CN 201210031741A CN 102627003 A CN102627003 A CN 102627003A
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戴天明
薛建设
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BOE Technology Group Co Ltd
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Priority to US13/995,463 priority patent/US20140212659A1/en
Priority to PCT/CN2012/081853 priority patent/WO2013120348A1/zh
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Abstract

本发明提供一种静电保护膜、显示装置和静电保护膜的制备方法,其中,静电保护膜包括:一层透明导电的基体和一层石墨烯;所述基体材料和所述石墨烯粘贴在一起。本发明提供的实施例中,静电保护膜包括石墨烯,通过石墨烯来保护元件免受外物刮伤或摩擦的损害,同时又能将电子元件上的静电及时释放出去,使电子元件免受静电的损害,延长了电子元件的使用寿命,同时静电保护膜的透光率高,从而大大降低了静电保护膜对电子元件所输出光线的影响。

Description

一种静电保护膜、显示装置和静电保护膜的制备方法
技术领域
本发明涉及静电保护的技术领域,具体地,涉及一种静电保护膜、显示装置和静电保护膜的制备方法。
背景技术
目前,手机屏幕、液晶显示屏和偏光片等电子元件结构精密、价格也比较昂贵,为防止电子元件在运输和使用过程中由于颠簸、夹持而受到刮伤或者其他损伤,通常在上述电子元件的表面粘贴一层静电保护膜,既保护电子元件的安全,又能防止静电对电子元件或其它电学部件造成伤害。
现有技术中,保护电子元件的静电保护膜主要是内部填充有抗静电剂的高分子薄膜,包括聚对苯二甲酸乙二脂等高分子薄膜。聚对苯二甲酸乙二脂薄膜等高分子薄膜的表面的电阻率较高,所以抗静电保护的效果不稳定,且柔韧性不够,容易造成电子元件被划伤,安全性较低。
发明内容
为解决上述问题,本发明提供一种静电保护膜、显示装置和静电保护膜的制备方法,用于解决现有技术中静电保护膜的电阻率高、安全性低的问题。
为此,本发明提供一种静电保护膜,其中包括:一层透明导电的基体和一层石墨烯;
所述基体材料和所述石墨烯粘贴在一起。
其中,所述石墨烯的厚度范围在20-200nm之间。
其中,所述基体的材料包括如下之一:聚乙烯、聚丙烯、聚碳酸酯、聚氯乙烯、聚酰亚胺、环氧树脂、酚醛树脂、聚对苯二甲酸乙二醇酯PET和橡胶;所述基体的厚度范围在50-1000nm之间。
本发明还提供一种显示装置,其中,包括上述的任意一种静电保护膜。
本发明还提供一种静电保护膜的制备方法,其中包括:
将基体清洗干净;
在所述基体上制备一层石墨烯。
其中,所述在所述基体上制备一层石墨烯包括:
将金属片放置在含碳气体的腔体内;
在预设温度将所述含碳气体裂解,以在所述金属片上沉积一层石墨烯;
将上述贴附的金属片和石墨烯粘贴在所述基体上,所述石墨烯与所述基体粘贴;
将所述金属片刻蚀去除,以得到静电保护膜。
其中,所述预设温度的范围为600-1000℃之间;
所述含碳气体包括气体中的至少一种:一氧化碳、乙烷、乙烯、乙醇、乙炔、丙烷、丁二烯、环戊二烯、苯和甲苯。
其中,所述将所述金属片刻蚀去除包括:
利用酸性溶液刻蚀去除所述金属;
所述酸性溶液包括盐酸、硫酸或醋酸。
其中,所述在所述基体上制备一层石墨烯包括:
将氧化石墨烯粉末涂覆在所述基体表面;
利用还原剂将所述石墨烯粉末还原为石墨烯;
所述还原剂包括肼、水合肼、硼氢化钠或卤酸。
其中,所述将氧化石墨烯粉末涂覆在所述基体表面包括:
将所述氧化石墨烯粉末溶于水中,氧化石墨烯水溶液的浓度在0.1~10mg/ml之间;
对上述氧化石墨烯水溶液进行超声波处理。
本发明具有下述有益效果:
本发明提供的实施例中,静电保护膜包括石墨烯,通过石墨烯来保护电子元件免受外物刮伤或摩擦的损害,同时又能将电子元件上的静电及时释放出去,使电子元件免受静电的损害,延长了电子元件的使用寿命,同时静电保护膜的透光率高,从而大大降低了静电保护膜对电子元件所输出光线的影响。
附图说明
图1为本发明静电保护膜实施例的结构示意图;
图2为本发明静电保护膜的制备方法第一实施例的流程图;
图3为本发明静电保护膜的制备方法第二实施例的流程图;
图4为本实施例中卷对卷粘贴方式的示意图;
图5为本实施例中卷对卷转印方式的示意图。
具体实施方式
为使本领域的技术人员更好地理解本发明的技术方案,下面结合附图对本发明提供的静电保护膜、显示装置和静电保护膜的制备方法进行详细描述。
图1为本发明静电保护膜实施例的结构示意图。如图1所述,本实施例静电保护膜包括透明的基体101和一层石墨烯102,基体101和石墨烯102紧密粘贴在一起;石墨烯102在室温条件下的本征电子迁移率可以达到200000cm2/V*s,电学性能优异,石墨烯102的可见光透过率为97.7%,透光率比较高,石墨烯102中的每个碳原子与周边的三个碳原子通过σ键相连接,所以石墨烯102非常坚固耐磨,有利于制备保护膜。
在实际应用中,石墨烯102的厚度范围可以在20-200nm之间,既确保石墨烯102坚固耐磨性能,又不影响透光率,例如,在石墨烯102的厚度为100nm时,需要200kN的力量才能将其撕裂;基体101的厚度范围在50-1000nm之间,基体101的材料包括:聚乙烯、聚丙烯、聚碳酸酯、聚氯乙烯、聚酰亚胺、环氧树脂、酚醛树脂或橡胶等。
在本实施例中,在静电保护膜中包括石墨烯,通过石墨烯来保护电子元件免受外物刮伤或摩擦的损害,同时又能将电子元件上的静电及时释放出去,使电子元件免受静电的损害,延长了电子元件的使用寿命,同时静电保护膜的透光率高,从而大大降低了静电保护膜对电子元件所输出光线的影响。
本发明还提供一种显示装置,显示装置的电子元件上贴附一层图1所示的静电保护膜,以为显示装置提供双重保护,既保护显示装置免受刮伤或划伤等损害,又对显示装置提供静电保护。例如,显示装置可以为液晶显示器、手机、照相机等,在液晶显示器、手机显示屏或照相机的镜片上粘贴上述的静电保护膜,以使显示装置获得双重保护。
本发明还提供一种静电保护膜的制备方法,在实际应用中,可以通过化学气相沉积(Chemical Vapor Deposition,CVD)方法或还原法在基体101上制备一层石墨烯102。在本实施例中,以还原法在基体101上制备石墨烯102为例来介绍技术方案。图2为本发明静电保护膜的制备方法第一实施例的流程图。如图2所示,本实施例中静电保护膜的制备方法的具体过程包括如下步骤:
步骤201、将基体清洗干净。
在本步骤中,首先利用去离子水等洁净液体将基体101清洗干净,再将基体101做干燥处理,然后进入步骤202。
步骤202、在基体上制备一层石墨烯,以得到静电保护膜。
在本步骤,先将氧化石墨烯粉末溶解在水中,氧化石墨烯水溶液浓度在0.1~10mg/ml之间,可以通过超声波处理上述的氧化石墨烯水溶液,以使氧化石墨烯粉末在水中充分溶解,然后将基体101放置在水中,以使石墨烯粉末均匀地涂覆在基体101上,再将涂覆有氧化石墨烯粉末的基体101晾干;最后用肼、水合肼、硼氢化钠或卤酸等还原剂对氧化石墨烯进行还原,从而在基体101上得到一层厚度均匀的石墨烯102。
在本步骤中,通过控制一层石墨烯粉末水溶液的浓度来控制所得到的一层石墨烯的厚度,操作方便;静电保护膜既能保护电子元件免受外物刮伤或摩擦的损害,又能将电子元件上的静电及时释放出去,使电子元件免受静电的损害,从而为电子元件提供双重的保护。
在本实施例中,通过将氧化石墨烯粉末均匀地涂覆在基体上,然后再用还原剂将氧化石墨烯粉末还原为一层厚度均匀的石墨烯,从而得到静电保护膜,不仅容易控制石墨烯的厚度,而且静电保护膜的制作过程简单、操作方便。
图3为本发明静电保护膜的制备方法第二实施例的流程图。如图3所示,本实施例中静电保护膜的制备方法的流程具体包括如下步骤:
步骤301、将金属片放置在含碳气体的腔体内。
在本步骤中,金属片可以为铜片、铷片或铬片等;含碳气体可以包括一氧化碳、乙烷、乙烯、乙醇、乙炔、丙烷、丁二烯、环戊二烯、苯或甲苯中至少一种,含碳气体的压强范围在20-600mTorr之间。
步骤302、在预设温度将含碳气体裂解,以在金属片上沉积一层石墨烯。
在本步骤中,预设温度可以在600-1000℃之间,含碳气体的裂解反应时间在10-40分钟之间,通过控制含碳气体的裂解反应时间可以控制所获得石墨烯层的厚度;获得一层石墨烯后,进入步骤303。
步骤303、将上述贴附一起的金属片和石墨烯粘贴在基体上。
在本步骤中,将步骤302得到的贴附一起的金属片和石墨烯与基体粘贴在一起,其中石墨烯与基体紧密接触。
在实际应用中,可以通过卷对卷方式来将贴附一起的金属片和石墨烯与基体粘贴,其中,基体可以为聚乙烯、聚丙烯、聚碳酸酯、聚氯乙烯、聚酰亚胺、环氧树脂、酚醛树脂或橡胶中任意一种,基体102的厚度范围在50-1000nm之间。
图4为本实施例中卷对卷粘贴方式的示意图。如图4所示,将基体101与固定贴附在一起的金属片103和石墨烯102***到两个压辊201之间,在固定贴附在一起的金属片103和石墨烯102与基体101紧密粘贴在一起之后,进入步骤304。
步骤304、将金属片刻蚀去除,以得到静电保护膜。
在本步骤中,通过盐酸、硫酸、醋酸等酸性溶液将金属片刻蚀去除,从而得到静电保护膜。
在实际应用中,当静电保护膜中基材为质地较软基材如聚乙烯基材时,还可以通过卷对卷方式,将静电保护膜中石墨烯层从质地较软的基材上转移到质地较硬的如PET基材上。图5为本实施例中卷对卷转印方式的示意图。如图5所示,将静电保护膜与PET基材101/,***到两个旋转的压辊201中,在压辊201的另一侧,石墨烯102与聚乙烯基材101分离,同时,石墨烯粘贴在PET基材101/上,以得到相应硬度的静电保护膜。
在本实施例中,通过化学气相沉积CVD方法,在含碳气体的环境中制备石墨烯,然后将石墨烯与基材紧密粘贴,再利用酸性溶液刻蚀掉金属片,,从而得到静电保护膜,不仅容易控制石墨烯的厚度,而且制作过程简单、操作方便。
可以理解的是,以上实施方式仅仅是为了说明本发明的原理而采用的示例性实施方式,然而本发明并不局限于此。对于本领域内的普通技术人员而言,在不脱离本发明的精神和实质的情况下,可以做出各种变型和改进,这些变型和改进也视为本发明的保护范围。

Claims (10)

1.一种静电保护膜,其特征在于包括:一层透明导电的基体和一层石墨烯;
所述基体材料和所述石墨烯粘贴在一起。
2.根据权利要求1所述的静电保护膜,其特征在于,所述石墨烯的厚度范围在20-200nm之间。
3.根据权利要求1或2所述的静电保护膜,其特征在于,所述基体的材料包括如下之一:聚乙烯、聚丙烯、聚碳酸酯、聚氯乙烯、聚酰亚胺、环氧树脂、酚醛树脂、聚对苯二甲酸乙二醇酯PET和橡胶;
所述基体的厚度范围在50-1000nm之间。
4.一种显示装置,其特征在于,包括上述的任一静电保护膜。
5.一种静电保护膜的制备方法,其特征在于包括:
将基体清洗干净;
在所述基体上制备一层石墨烯。
6.根据权利要求5所述的静电保护膜的制备方法,其特征在于,所述在所述基体上制备一层石墨烯包括:
将金属片放置在含碳气体的腔体内;
在预设温度将所述含碳气体裂解,以在所述金属片上固定贴附一层石墨烯;
将上述固定贴附的金属片和石墨烯粘贴在所述基体上,所述石墨烯与所述基体粘贴;
将所述金属片刻蚀去除,以得到静电保护膜。
7.根据权利要求6所述的静电保护膜的制备方法,其特征在于,所述预设温度的范围为600-1000℃之间;
所述含碳气体包括气体中的至少一种:一氧化碳、乙烷、乙烯、乙醇、乙炔、丙烷、丁二烯、环戊二烯、苯和甲苯。
8.根据权利要求6所述的静电保护膜的制备方法,其特征在于,所述将所述金属片刻蚀去除包括:
利用酸性溶液刻蚀去除所述金属;
所述酸性溶液包括盐酸、硫酸或醋酸。
9.根据权利要求5所述的静电保护膜的制备方法,其特征在于,所述在所述基体上制备一层石墨烯包括:
将氧化石墨烯粉末涂覆在所述基体表面;
利用还原剂将所述石墨烯粉末还原为石墨烯;
所述还原剂包括肼、水合肼、硼氢化钠或卤酸。
10.根据权利要求9所述的静电保护膜的制备方法,其特征在于,所述将氧化石墨烯粉末涂覆在所述基体表面包括:
将所述氧化石墨烯粉末溶于水中,氧化石墨烯水溶液的浓度在0.1~10mg/ml之间;
对上述氧化石墨烯水溶液进行超声波处理。
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