CN102267087A - Grinding method and grinding device for glass substate - Google Patents
Grinding method and grinding device for glass substate Download PDFInfo
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- CN102267087A CN102267087A CN2011101521271A CN201110152127A CN102267087A CN 102267087 A CN102267087 A CN 102267087A CN 2011101521271 A CN2011101521271 A CN 2011101521271A CN 201110152127 A CN201110152127 A CN 201110152127A CN 102267087 A CN102267087 A CN 102267087A
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- glass substrate
- workbench
- liquid
- nozzle
- abradant surface
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/24—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass
- B24B7/242—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass for plate glass
- B24B7/244—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass for plate glass continuous
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/06—Work supports, e.g. adjustable steadies
- B24B41/068—Table-like supports for panels, sheets or the like
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- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The invention relates to a grinding method and a grinding device for glass substates. The grinding method for glass substates comprises the steps of a liquid spraying process, wherein the drying-prevention liquid is injected out of a first nozzle on the whole area of the non-grinding surface of a glass substrate absorbed and fixed by a workbench and the buffer liquid is injected out of a second nozzle on the edge part of the non-grinding surface of the glass substrate; a glass substrate fixing process, wherein the whole area of the non-grinding surface of the glass substrate is fixed to the workbench and the edge part of the non-grinding surface of the glass substrate is fixed to the workbench via the buffering liquid; and a grinding process, wherein the grinding liquid is supplied to the non-grinding surface of the glass substrate while the griding surface of the glass substrate is ground via a grinding tool.
Description
Technical field
The present invention relates to the Ginding process and the lapping device of glass substrate.
Background technology
FPD such as LCD (Flat Panel Display: flat-panel monitor) for example utilize the glass tape building mortion of float glass process kiln etc. with glass substrate, fracture in the operation that the fractures glass substrate of the rectangular shape size that is processed into regulation of banded glass tape will be configured as, in chamfering process, it is carried out chamfer machining, thereby produce the glass substrate of the appearance and size of regulation.And, this glass substrate is via the matting of the back segment that is arranged at chamfering process and check operation and transferred to grinding step, remove the small concavo-convex or percent ripple on surface by grinding, satisfy the lamellar of the desired flatness of FPD usefulness glass substrate and manufacture.
In described grinding step, workbench is fixed in the non-abradant surface absorption of glass substrate, workbench is carried to grind section, on one side the abradant surface of glass substrate is supplied with lapping liquid (slurries) comes grinding glass substrate on one side by milling tool abradant surface.
When this grinds, the edge portion that lapping liquid immerses the non-abradant surface of glass substrate from the edge portion of glass substrate produces the unfavorable condition that edge portion that the composition of cutting the glass that falls as the cerium oxide of the composition of lapping liquid or because of grinding is attached to the non-abradant surface of glass substrate pollutes edge portion.
In order to prevent this unfavorable condition, in the Ginding process of the wafer of patent documentation 1, on the non-abradant surface of wafer, form the diaphragm that constitutes by plastic protective material.Via this diaphragm the non-abradant surface of wafer is fixed in grinding clamp, thereby the edge portion of the non-abradant surface of protection wafer avoids the pollution of lapping liquid.
In addition, in the Ginding process of patent documentation 2 disclosed wafers, folder is established padded coamings such as polyalcohol between the non-abradant surface of wafer and wafer mounting are with plate, thereby the edge portion of the non-abradant surface of protection wafer avoids the pollution of lapping liquid.
Patent documentation 1: Japanese kokai publication sho 62-51226 communique
Patent documentation 2: Japanese kokai publication hei 6-61203 communique
Yet, carry the workbench of the non-abradant surface of absorption fixing glass substrate that the abradant surface of glass substrate is ground while be called as the loop of lapping device utilization regulation of the glass substrate of continous way lapping device.That is, on the transport path of the workbench that constitutes loop, be provided with successively glass substrate absorption fixed part, grind section, glass substrate unload bottom, bench clean portion.The non-abradant surface of the glass substrate before grinding is absorbed and fixed on the workbench that is positioned at described absorption fixed part, then, grinds to described grind section conveying by workbench.Next, the glass substrate after the grinding is carried to the described bottom of unloading by workbench, unloads lower glass substrate at this from workbench.The workbench that has unloaded glass substrate is cleaned during by described cleaning part, prepares the absorption workbench as next glass substrate.
At this, patent documentation 1 disclosed Ginding process is to carry out abrasive method after being pre-formed diaphragm on the non-abradant surface of wafer.And patent documentation 2 disclosed Ginding process are methods that diaphragm is set between the non-abradant surface of wafer and wafer mounting are with plate.
Yet the glass substrate that the size in length and breadth of the size of glass substrate surpasses 1000mm is a main flow, but is difficult to the large-scale glass substrate of this kind is pre-formed described diaphragm.And, owing to need be used to form the equipment of diaphragm in addition, therefore there is the Ginding process that is difficult to the Ginding process of patent documentation 1 is used for glass substrate.
On the other hand; if in the lapping device of the glass substrate that directly adsorbs glass substrate by workbench, adopt the Ginding process that the patent documentation 2 of diaphragm is set between the non-abradant surface of wafer and wafer mounting are with plate; when grinding, the glass substrate instability, therefore this method is infeasible.
The adsorption plane of the workbench of the lapping device of described glass substrate is made of the sheet material that self has adsorptivity.If drying is carried out on the surface of sheet material, then the adsorptivity of sheet material self weakens, and in the grinding of glass substrate, glass substrate might break.Therefore, for the dry of the non-abradant surface that prevents to be absorbed and fixed at the glass substrate on this sheet material or improve self adsorptivity of sheet material, and need dryly glass substrate be absorbed and fixed on the sheet material via preventing with liquid.Also need in this case and will prevent that drying from supplying between glass substrate and the sheet material well with liquid.
Summary of the invention
Given this present invention plants situation and makes, and its purpose is to provide a kind of lapping liquid that can prevent to the pollution of the edge portion of the non-abradant surface of glass substrate and the non-abradant surface of glass substrate can be absorbed and fixed at well the Ginding process and the lapping device of the glass substrate on the workbench.
To achieve these goals, the Ginding process of glass substrate of the present invention comprises: liquid spraying operation, towards the workbench of the non-abradant surface of absorption fixing glass substrate the zone in the whole zone of the non-abradant surface of the absorption fixing glass substrate of described workbench is prevented the dry liquid of use from the ejection of first nozzle, then the zone of the edge portion of the non-abradant surface of the absorption fixing glass substrate of described workbench is sprayed buffer solution from second nozzle with respect to described workbench; Glass substrate is operation fixedly, the dry whole zone of the non-abradant surface of glass substrate absorption with liquid is fixed in described workbench via described preventing, and via described buffer solution described workbench is fixed in the edge portion absorption of the non-abradant surface of described glass substrate; And grinding step, to non-abradant surface be adsorbed the abradant surface that be fixed in described glass substrate described workbench on and supply with lapping liquid on one side utilize milling tool grind this abradant surface on one side.
To achieve these goals, the lapping device of glass substrate of the present invention comprises: workbench, the non-abradant surface of absorption fixing glass substrate; Liquid spraying portion, have first nozzle and second nozzle, described first nozzle is towards described workbench, zone ejection to the whole zone of the non-abradant surface of the absorption fixing glass substrate of described workbench prevents the dry liquid of using, described second nozzle is with respect to described workbench, to the zone ejection buffer solution of the edge portion of the non-abradant surface of the absorption fixing glass substrate of described workbench; The glass substrate fixed part is fixed in described workbench via described preventing, and via described buffer solution described workbench is fixed in the edge portion absorption of the non-abradant surface of described glass substrate the dry whole zone of the non-abradant surface of glass substrate absorption with liquid; And grind section, to non-abradant surface be adsorbed the abradant surface that be fixed in described glass substrate described workbench on and supply with lapping liquid on one side utilize milling tool grind this abradant surface on one side.
According to the present invention, at first prevent the dry liquid of using towards the workbench ejection from first nozzle, zone coating to the whole zone of the non-abradant surface of absorption fixing glass substrate prevents the dry liquid of using, then spray buffer solution towards workbench from second nozzle, with respect to workbench, to the zone coating buffer solution of the edge portion of the non-abradant surface of absorption fixing glass substrate.
Then, by the glass substrate fixed part, the dry whole zone of the non-abradant surface of glass substrate absorption be fixed in workbench via described preventing, and workbench be fixed in the edge portion absorption of the non-abradant surface of glass substrate via described buffer solution with liquid.
Then, utilize grind section, to the abradant surface of glass substrate supply with lapping liquid and on one side utilize milling tool grind abradant surface on one side.In this ground, because the edge portion of the non-abradant surface of glass substrate is subjected to the protection of buffer solution, therefore described edge portion can not polluted by lapping liquid.
As mentioned above, the present invention prevents dry with liquid and buffer solution from liquid spraying portion towards the workbench ejection, therefore can prevent the pollution of lapping liquid, and the non-abradant surface of glass substrate can be absorbed and fixed on the workbench well the edge portion of the non-abradant surface of glass substrate.
Ginding process according to glass substrate of the present invention, described liquid spraying operation is preferred, at least one side in described workbench and described first, second nozzle is relatively moved on one side, from described first nozzle ejection described prevent drying with liquid and from described second nozzle spray described buffer solution on one side.
Lapping device according to glass substrate of the present invention, the choosing of described liquid spraying quality award from the ministry, at least one side in described workbench and described first, second nozzle is relatively moved on one side, from described first nozzle ejection described prevent drying with liquid and from described second nozzle spray described buffer solution on one side.
When making movable workbench, at first, the workbench of sky is carried to liquid spraying portion along the workbench transport path.And, carry this workbench along the workbench transport path on one side, from first nozzle towards workbench ejection prevent dry use liquid on one side, coating prevents the dry liquid of using to workbench, and spray buffer solution from second nozzle towards workbench, to workbench coating buffer solution.
In addition, when first, second nozzle is moved, make first, second nozzle and move and ejection prevents dry with liquid and buffer solution to workbench with respect to the upper surface of the workbench that is fixed.Yet, while workbench is moved when glass substrate ground along transport path, form fixed and utilize the workbench ejection of existing workbench conveying equipment in carrying to prevent dry structure for establishing first, second nozzle with liquid and buffer solution, prevent drying with liquid and buffer solution owing to just spraying without the additional nozzle mobile device, therefore preferred.
According to the Ginding process and the lapping device of glass substrate of the present invention, preferred, the described drying that prevents is same liquid with liquid and described buffer solution.
According to the Ginding process and the lapping device of glass substrate of the present invention, preferred, described liquid is polyalcohol.
According to the present invention, when using same liquid conduct to prevent drying with liquid and buffer solution, preferred polyol.In addition, can the conduct of illustration water prevent drying liquid.Yet, because polyalcohol prevents desiccation height so preferred polyol than water.And polyalcohol is also preferred as preventing the prevent contaminated liquid of lapping liquid to the pollution of the edge portion of glass substrate.
The kind of polyalcohol does not limit especially, and particularly, illustration has glycerine, polyethylene glycol, ethylene glycol, propane diols, diethylene glycol etc.And, preventing that drying from both can be made of two or more polyalcohols with liquid and buffer solution, also polynary alcohol and water can be mixed and the formation polyatomic alcohol water solution.
Ginding process according to glass substrate of the present invention, preferably, with the direction of described workbench quadrature on, the a plurality of same all-purpose nozzles that described first nozzle and the described second nozzle generalization are formed of configuration spray described liquid from described all-purpose nozzle towards described workbench above described workbench.
Lapping device according to glass substrate of the present invention, preferably, with the direction of described workbench quadrature on, the a plurality of same all-purpose nozzles that described first nozzle and the described second nozzle generalization are formed of configuration spray described liquid from described all-purpose nozzle towards described workbench above described workbench.
According to the present invention, to the zone coating of the workbench in the whole zone of the non-abradant surface of absorption fixing glass substrate same liquid such as polyalcohol, and the zone of the workbench of the whole edge portion of the non-abradant surface of absorption fixing glass substrate applied described liquid from a plurality of all-purpose nozzles ejections.So, can make first, second nozzle generalization, therefore can simplify liquid-supplying system with respect to nozzle by using same liquid.Thus, the present invention can constitute liquid spraying portion with simple equipment.
In the present invention, be provided with towards the workbench ejection and prevent dry liquid spraying operation with liquid and buffer solution, but also can replace this operation, prevent dry with liquid and to the operation of the edge portion coating buffer solution of described non-abradant surface and whole zone coating to the non-abradant surface of glass substrate is set.
[invention effect]
Ginding process and lapping device according to glass substrate of the present invention, owing to prevent dry towards the workbench ejection with liquid and buffer solution from liquid spraying portion, therefore can prevent the pollution of lapping liquid, and the non-abradant surface of glass substrate can be absorbed and fixed on the workbench well the edge portion of the non-abradant surface of glass substrate.
Description of drawings
Fig. 1 is the integrally-built vertical view of lapping device of the glass substrate of expression embodiment.
Fig. 2 is the front view from the structure of the observed liquid spraying in the downstream of workbench transport path portion.
Fig. 3 is the vertical view of liquid spraying portion shown in Figure 2.
Fig. 4 is expression by the zone of second nozzle sets ejection buffer solution and does not spray the key diagram in the zone of buffer solution.
Fig. 5 is the time diagram of on-off action of the magnetic valve of expression second nozzle sets.
Fig. 6 is the front view from the structure of the liquid spraying portion of observed another embodiment in downstream of workbench transport path.
Fig. 7 is the vertical view of liquid spraying portion shown in Figure 6.
Fig. 8 is the liquid piping system of polyalcohol is supplied with in a block diagram from expression to all-purpose nozzle.
Fig. 9 is the block diagram that the air piping system of open-close control is carried out in injection that expression is used for the polyalcohol that the subtend all-purpose nozzle supplies with.
Figure 10 is the key diagram in zone of the speed of the change workbench in the express liquid spraying portion.
Figure 11 is the time diagram of the speed of the workbench in the express liquid spraying portion.
Label declaration:
The G glass substrate
The lapping device of 10 glass substrates
12 workbench
14 liquid spraying portions
16 glass substrate fixed parts
18 grind section
20a～20d first nozzle
22 first nozzle sets
24 liquid-supplying systems
26 binding domains
28a～28n second nozzle
30 second nozzle sets
32 liquid-supplying systems
34A, 34B zone
36A, 36B zone
40 liquid spraying portions
42a～42n all-purpose nozzle
43a～43n flowmeter
44 all-purpose nozzle groups
46 liquid-supplying systems
48 polyalcohol supply units
50A, 50B zone
52 magnetic valves
54,56,58 all-purpose nozzle groups
60,62,64 magnetic valves
66 binding domains
70 jars
72 pumps
74 flowmeters
76 check-valves
78 filters
The specific embodiment
Below, with reference to the accompanying drawings, the Ginding process of the glass substrate of detailed description embodiments of the present invention and the preferred mode of lapping device.
Fig. 1 is the integrally-built vertical view of lapping device 10 of the glass substrate of expression embodiment.In Fig. 1, arrow represents the non-abradant surface of the glass substrate G of rectangular shape is adsorbed the workbench transport path of the workbench 12 of fixing rectangular shape.
On the workbench transport path, dispose liquid spraying portion 14, glass substrate fixed part 16 and grind section 18 successively towards the downstream from the upstream side of workbench transport path.And, be provided with not shown glass substrate in the downstream of grind section 18 and unload bottom and bench clean portion.
In grind section 18, glass substrate G is carried on one side by many milling tool continuously grindings along the configuration of workbench transport path along the workbench transport path by the fixing state of workbench 12 absorption on one side with the non-abradant surface of glass substrate G.At this moment, on one side the abradant surface of glass substrate G is supplied with lapping liquid, the described milling tool by rotation grinds abradant surface on one side.And in the outlet of grind section 18, glass substrate G is manufactured into and satisfies the lamellar of the desired flatness of FPD usefulness glass substrate.The platform number that is disposed at the milling tool of grind section 18 is not limited to many.That is, also can be a milling tool, according to the size of glass substrate G.
Glass substrate G after grinding finishes is sent and is sent to described glass substrate from grind section 18 and unloaded the bottom, unloads lower glass substrate at this from workbench 12.Then, the workbench 12 that has unloaded glass substrate G is cleaned liquid and cleans by described bench clean portion the time, be transported to liquid spraying portion 14 once more in order to adsorb fixing next glass substrate G then.As mentioned above, the workbench transport path constitutes ring-type, so that workbench 12 unloads bottom and bench clean portion by liquid spraying portion 14, glass substrate fixed part 16, grind section 18, glass substrate successively.
The workbench 12 of embodiment disposes many on the workbench transport path, and absorption is fixed with two glass substrate G on a workbench 12.The platform number that is configured in the workbench 12 on the workbench transport path is not defined, and the number that is absorbed and fixed at the glass substrate G on the workbench 12 also is not limited to two.That is, according to the size of glass substrate G, both can be one, also can be more than three.
Fig. 2 is the front view from the structure of the observed liquid spraying in the downstream of workbench transport path portion 14.That is, workbench 12 is carried towards the paper outside from the paper inboard of Fig. 2.And Fig. 3 is the vertical view of liquid spraying portion 14.In Fig. 3, the edge portion that is positioned workbench 12 and is adsorbed fixing glass substrate G is represented in illustrated double dot dash line on the workbench 12.
As shown in Figure 2, above the workbench transport path, dispose the binding domain on workbench ejection is prevented dry first nozzle sets 22 that is made of four first nozzle 20a, 20b, 20c, 20d with liquid.Described first nozzle 20a～20d with the direction of workbench transport path quadrature on be fixed in workbench 12 above not shown stand on, and via liquid-supplying system 24 with prevent from dryly to link with liquid supply unit (not shown).By the dry liquid of use that prevents from described first nozzle 20a～20d ejection, and the whole zone of the non-abradant surface of the glass substrate G that double dot dash line shown in Figure 3 is surrounded is adsorbed fixing binding domain 26 and applies and prevent drying liquid.Prevent that dry spray area with liquid from also can be whole of workbench 12, but prevent dry viewpoint from saving, preferred binding domain 26 with liquid.
This first nozzle 20a～20d links with the liquid supply unit via magnetic valve and the described drying that prevents.This magnetic valve carries out the open and close controlling at intermittence by not shown control part, make this magnetic valve only binding domain 26 by first nozzle 20a～20d below during open.Therefore, only 26 coatings prevent drying liquid to binding domain by first nozzle 20a～20d.
In addition, second nozzle sets 30 that configuration is made of 14 second nozzle 28a, 28b, 28c, 28d, 28e, 28f, 28g, 28h, 28i, 28j, 28k, 28l, 28m, 28n above the workbench transport path, the edge portion of the non-abradant surface of the glass substrate G on 30 pairs of workbench 12 of described second nozzle sets is adsorbed fixing zone ejection buffer solution.Described second nozzle 28a～28n with the direction of workbench transport path quadrature on be fixed in workbench 12 above not shown stand on, and link via liquid-supplying system 32 and buffer solution supply unit (not shown).Buffer solution is to be used to prevent the liquid of lapping liquid to the pollution of the non-abradant surface of glass substrate G.
Two second nozzle 28a, 28n being configured in both sides among second nozzle 28a～28n respectively with Fig. 3 in double dot dash line shown in the edge portion of glass substrate G in relative regional 34A, 34B that short leg passed through dispose relatively.These two second nozzle 28a, 28n link via magnetic valve and described buffer solution supply unit.This magnetic valve carries out the open and close controlling at intermittence by not shown control part, make this magnetic valve only regional 34A, 34B by two second nozzle 28a, 28n below during open.Therefore, only regional 34A, 34B are applied buffer solution by two second nozzle 28a, 28n.
On the other hand, relative regional 36A, the 36B that long leg passed through in the edge portion of the glass substrate G shown in the double dot dash line among the nozzle 28b～28m except that the second nozzle 28a and nozzle 28n and Fig. 3 disposes relatively.And described second nozzle 28b～28m links via magnetic valve and described buffer solution supply unit.This magnetic valve carries out the open and close controlling at intermittence by not shown control part, make this magnetic valve only regional 36A, 36B by second nozzle 28b～28m below during open.
Promptly, among second nozzle 28b～28m, by the switching of described control part control magnetic valve, open by making magnetic valve during the below of second nozzle 28b～28m as shown in Figure 5 with cut zone A, the C suitable (E too) in the cut zone of A～E shown in Figure 4 with regional 36A, the 36B of Fig. 3.Therefore, only regional 36A, 36B are applied buffer solution by 12 second nozzle 28b～28m.
As mentioned above, the roughly whole zone of the non-abradant surface of the glass substrate G that is surrounded by double dot dash line among Fig. 3 is adsorbed 26 coatings of fixing binding domain prevents from dryly to use liquid, and regional 34A, 34B, 36A, the 36B of the edge portion of the non-abradant surface of the glass substrate G shown in the double dot dash line among Fig. 3 applied buffer solution.And, because first nozzle sets 22 is configured in the upstream side of workbench transport path and the downstream that second nozzle sets 30 is configured in the workbench transport path, therefore in regional 34A, 34B, 36A, 36B, preventing dry upper strata coating buffer solution with liquid.
So, be coated with and prevent that dry workbench 12 with liquid and buffer solution is transported to glass substrate fixed part 16 shown in Figure 1 along the workbench transport path.At this, the non-abradant surface of glass substrate G is positioned on workbench 12 and is absorbed and fixed at the position by the glass substrate G shown in the double dot dash line among Fig. 3.
Two glass substrate G that are absorbed and fixed on the workbench 12 are transported to the grind section 18 of Fig. 1 along the workbench transport path, by a plurality of milling tools the abradant surface of glass substrate G are carried out continuously grinding as mentioned above at this.
The effect of the lapping device of the glass substrate that constitutes as mentioned above then, is described.
At first, along the workbench transport path workbench 12 of sky is carried to liquid spraying portion 14.Then, along workbench transport path carry this workbench 12 on one side, 12 ejections prevent the dry liquid of using from first nozzle sets 22 towards workbench on one side, and binding domain 26 coatings of Fig. 3 are prevented drying liquid.Then, towards workbench 12 ejection buffer solutions, and regional 34A, 34B, 36A, the 36B of the edge portion of the non-abradant surface of glass substrate G applied buffer solution from second nozzle sets 30.
Then, this workbench 12 is carried to glass substrate fixed part 16, at this whole zone of non-abradant surface of glass substrate G dryly is absorbed and fixed on the workbench 12 with liquid via described preventing, and the whole edge portion of the non-abradant surface of glass substrate G is absorbed and fixed on the workbench 12 via described buffer solution.
Then, this workbench 12 is carried to grind section 18, the abradant surface of glass substrate G is supplied with lapping liquid on one side at this, by milling tool abradant surface ground on one side.In this ground, the edge portion of the non-abradant surface of glass substrate G was subjected to the protection of buffer solution, and therefore described edge portion can not polluted by lapping liquid.
So, lapping device 10 according to above-mentioned embodiment, liquid spraying portion 14 is set on the workbench transport path, prevents the dry liquid of using from workbench 12 ejections of first nozzle sets 22 towards carrying along the workbench transport path, and from second nozzle sets, 30 ejection buffer solutions.
Therefore, lapping device 10 according to this glass substrate, grind on one side in the lapping device 10 of glass substrate that non-abradant surface is absorbed and fixed at the glass substrate G on the workbench 12 at one side conveying workbench 12, can prevent the pollution of lapping liquid, and the non-abradant surface of glass substrate G can be absorbed and fixed on the workbench 12 well the edge portion of the non-abradant surface of glass substrate G.
Can the illustration polyalcohol, polyatomic alcohol water solution, water be as preventing the dry liquid of using, and can the illustration polyalcohol, polyatomic alcohol water solution is as buffer solution.
Fig. 6～Figure 11 is the figure that is used to illustrate another embodiment of liquid spraying portion.Fig. 6 is the front view from the structure of the liquid spraying portion 40 of observed another embodiment in downstream of workbench transport path.And Fig. 7 is the vertical view of liquid spraying portion 40.Illustrated double dot dash line represents to locate and be absorbed and fixed at the edge portion of the glass substrate G on the workbench 12 on the workbench 12 of Fig. 7.
In Fig. 6, liquid spraying portion 40 shown in Figure 7, the ejection same liquid is that polyalcohol is dry with liquid and buffer solution as preventing.And liquid spraying portion 40 possesses the all-purpose nozzle group 44 that first nozzle and the second nozzle generalization is formed, be made of 14 all-purpose nozzle 42a, 42b, 42c, 42d, 42e, 42f, 42g, 42h, 42i, 42j, 42k, 42l, 42m, 42n of same structure.Described all-purpose nozzle 42a～42n with the direction of workbench transport path quadrature on be fixed on the not shown stand above the workbench 12, and link via liquid-supplying system 46 and Fig. 8, polyalcohol supply unit 48 shown in Figure 9.Figure 8 illustrates liquid piping system from polyalcohol to all-purpose nozzle 42a～42n that supply with, the air piping system that open-close is controlled is carried out in the injection that is used for the polyalcohol of subtend all-purpose nozzle 42a～42n supply shown in Fig. 9.That is, control the compressed air of self-pumping 72, use the compressed air of so control to make each piston action of all-purpose nozzle 42a～42n, thereby open-close control is carried out in the injection of polyalcohol by magnetic valve 52,60,62,64 open-closes.
Relative regional 50A, 50B that short leg passed through in the edge portion of the glass substrate G that double dot dash line is represented among two all- purpose nozzle 42a, 42n being configured in both sides among all-purpose nozzle 42a～42n and Fig. 7 dispose relatively.As shown in Figure 8, these two all- purpose nozzle 42a, 42n link with polyalcohol supply unit 48 via flowmeter 43a, 43n, liquid-supplying system 46, filter 78.And magnetic valve 52 shown in Figure 9 carries out the open and close controlling at intermittence by not shown control part, make this magnetic valve only regional 50A, 50B by two all- purpose nozzle 42a, 42n below during open.Therefore, only regional 50A, 50B are applied polyalcohol by two the general second nozzle 42a, 42n.
On the other hand, relative regional 52A, the 52B that long leg passed through in the edge portion of the glass substrate G shown in the double dot dash line among the all-purpose nozzle 42b～42m except that all-purpose nozzle 42a and nozzle 42n and Fig. 7 disposes relatively.And as shown in Figure 9, the system of described all-purpose nozzle 42b～42m is divided into all-purpose nozzle 42b～42e, all-purpose nozzle 42f～42i and these three of all-purpose nozzle 42j～42m and constitutes all- purpose nozzle group 54,56,58.Described all- purpose nozzle group 54,56,58 links via magnetic valve 60,62,64 and pump 72, and, as shown in Figure 8, link with polyalcohol supply unit 48 via flowmeter 43b～43m, liquid-supplying system 46, filter 78. Magnetic valve 60,62,64 carries out the open and close controlling at intermittence by not shown control part, make this magnetic valve 60,62,64 only the binding domain 66 of inclusion region 52A, the 52B glass substrate G that double dot dash line is surrounded in interior Fig. 7 by 12 all-purpose nozzle 42b～42m below during open.
As shown in Figure 8, polyalcohol supply unit 48 constitutes and comprises the jar 70 that accumulates polyalcohol, supplies with compressed-air actuated not shown pump, instrumentation to the flowmeter 74 of jar 70 compressed and supplied air capacities and prevent the check-valves 76 of the backflow of the polyalcohol carried to liquid-supplying system 46 from jar 70 to jar 70.
According to this polyalcohol supply unit 48, by supplying with compressed air to jar 70, and the polyalcohols in the jar 70 are carried to liquid-supplying system 46 via filter 78 from check-valves 76 from described pump.Jar 70, flowmeter 74 and check-valves 76 can be set up in parallel two as shown in Figure 8.
Yet, to prevent the function of lapping liquid in order bringing into play, and preferably will to set the amount (coating amount of per unit area) that prevents the dry polyalcohol that applies with liquid more than conduct for to the amount (coating amount of per unit area) of the polyalcohol of workbench 12 coatings as buffer solution to this buffer solution of pollution of the edge portion of the non-abradant surface of glass substrate.
In other words, the transporting velocity that makes workbench 12 is certain and when making polyalcohol spray amount from whole all-purpose nozzle 42a～42n identical, can't carry out above-mentioned setting.And, will from the polyalcohol spray amount of whole all-purpose nozzle 42a～42n set for to regional 50A, the 50B corresponding, 52A, 52B spraying with edge portion as the coating amount of buffer solution the time, to the unnecessary polyalcohol of zone 66 coatings, and wasted polyalcohol.
Therefore, in the liquid spraying portion 40 of embodiment, will set the coating amount of conduct for from the spray amount of 12 nozzle 42b～42m except that all-purpose nozzle 42a, the 42n of both sides to the buffer solution of regional 52A, 52B spraying.And, will have more some amounts from the spray amount that the spray amount of all-purpose nozzle 42a, the 42n of both sides is set for recently from other all-purpose nozzles 42b～42m, then, the control as described below of the transporting velocity of workbench 12.At this, what is called has more some amounts and is meant that the spray amount from all- purpose nozzle 42a, 42n is more than 100 times of spray amount from other all-purpose nozzles 42b～42m.
Promptly, in the cut zone of A～E shown in Figure 10, cut zone A, C that will be suitable with regional 52A, the 52B of Fig. 7 (B too) sets common workbench transporting velocity S1 as shown in figure 11 for, will the cut zone B (D too) suitable with the zone 66 of Fig. 7 sets the high speed S2 of ratio S1 as shown in figure 11 for.
Coating amount as the buffer solution that sprays to regional 50A, the 50B corresponding with edge portion, 52A, 52B is preferably 0.001ml/cm
2, be preferably more than 100 times of coating amount as the buffer solution that sprays to zone 66.
Thus, the amount that is coated in the polyalcohol on regional 52A, the 52B of Fig. 7 becomes as buffer solution preferably to be measured, and the polyalcohol amounts of spraying to zone 66 become to liken to the few conduct of the preferred amounts of buffer solution and prevent dry preferred amounts with liquid.And, workbench transporting velocity S2 is at a high speed, but, therefore become preferred amounts as buffer solution to the amount of the polyalcohol of regional 50A, 50B ejection because the spray amount of setting for recently from other all-purpose nozzles 42b～42m from the spray amount of all-purpose nozzle 42a, the 42n of both sides has more some amounts.At this, what is called has more some amounts and is meant that the spray amount from all- purpose nozzle 42a, 42n is more than 100 times of spray amount from other all-purpose nozzles 42b～42m.
Polyalcohol by using same liquid is as the liquid that so sprays, thereby therefore Fig. 2, first nozzle sets 22 and 30 generalizations of second nozzle sets shown in Figure 3 can be able to be simplified the liquid-supplying system to all-purpose nozzle 42a～42n.Thus, the liquid spraying portion 40 of this embodiment and Fig. 2, liquid spraying portion 14 shown in Figure 3 compare and become simple equipment.
In liquid spraying portion 40, the variable and coating amount of control polyalcohol of the transporting velocity that makes workbench 12, but be not limited to this.
For example, make the transporting velocity of workbench 12 certain, will set optimised quantity for, and control the spray amount of other 12 all-purpose nozzle 42b～42m from the spray amount of all-purpose nozzle 42a, the 42n of both sides as buffer solution.Promptly, when regional 52A, 52B pass through the below of all-purpose nozzle 42b～42m, set spray amount for optimised quantity, when the below of zone 66 by all-purpose nozzle 42b～42m, spray amount set for as the optimised quantity that prevents dry usefulness liquid get final product as buffer solution.This kind flow-control can and possess the control part of controlling the aperture of flow vario valve according to the shift position of workbench 12 by the use traffic vario valve and realize.
In addition, in embodiment, illustrated that workbench is a mobile model and first, second nozzle is the structure of fixed, but be not limited to this.Promptly, also can make workbench is that to make first, second nozzle be mobile model to fixed, above the workbench of fixing, first, second nozzle is moved on one side, to workbench ejection prevent drying liquid, buffer solution on one side, and on workbench, form desirable spray pattern.
On the other hand, also can make workbench and first, second nozzle is fixed.In this case, in order on workbench desirable spray pattern to be formed at workbench, and mask parts such as configuration metal mask comes the general liquid (polyalcohol) of the whole ejection of workbench above workbench.Thus, spray pattern can be formed at workbench.By as one man above workbench, adjusting the allocation position of first nozzle, second nozzle, also can on workbench, form desirable spray pattern with spray pattern.
In detail or with reference to specific embodiment the present invention has been described, but to those skilled in the art, it is self-evident not departing from the scope of the present invention the situation that can apply various modifications or change with spirit.
The application is based on the application of the Japanese patent application 2010-126083 that filed an application on June 1st, 2010 and makes, and quotes its content at this as reference.
Claims (10)
1. the Ginding process of a glass substrate comprises:
Liquid spraying operation, towards the workbench of the non-abradant surface of absorption fixing glass substrate the zone in the whole zone of the non-abradant surface of the absorption fixing glass substrate of described workbench is prevented the dry liquid of use from the ejection of first nozzle, then the zone of the edge portion of the non-abradant surface of the absorption fixing glass substrate of described workbench is sprayed buffer solution from second nozzle with respect to described workbench;
Glass substrate is operation fixedly, the dry whole zone of the non-abradant surface of glass substrate absorption with liquid is fixed in described workbench via described preventing, and via described buffer solution described workbench is fixed in the edge portion absorption of the non-abradant surface of described glass substrate; And
Grinding step, to non-abradant surface be adsorbed the abradant surface that be fixed in described glass substrate described workbench on and supply with lapping liquid on one side utilize milling tool grind this abradant surface on one side.
2. the Ginding process of glass substrate according to claim 1, wherein,
In the described liquid spraying operation, Yi Bian at least one side in described workbench and described first, second nozzle is relatively moved, Yi Bian spray described buffer solution with liquid and from described second nozzle from the described drying that prevents of described first nozzle ejection.
3. the Ginding process of glass substrate according to claim 2, wherein,
The described drying that prevents is same liquid with liquid and described buffer solution.
4. the Ginding process of glass substrate according to claim 3, wherein,
Described liquid is polyalcohol.
5. according to the Ginding process of claim 3 or 4 described glass substrates, wherein,
With the direction of the direction quadrature that relatively moves of described workbench on, the a plurality of same all-purpose nozzles that described first nozzle and the described second nozzle generalization are formed of configuration spray described liquid from described all-purpose nozzle towards described workbench above described workbench.
6. the lapping device of a glass substrate comprises:
Workbench, the non-abradant surface of absorption fixing glass substrate;
Liquid spraying portion, have first nozzle and second nozzle, described first nozzle prevents the dry liquid of use towards described workbench to the ejection of the zone in the whole zone of the non-abradant surface of the absorption fixing glass substrate of described workbench, and described second nozzle sprays buffer solution with respect to described workbench to the zone of the edge portion of the non-abradant surface of the absorption fixing glass substrate of described workbench;
The glass substrate fixed part is fixed in described workbench via described preventing, and via described buffer solution described workbench is fixed in the edge portion absorption of the non-abradant surface of described glass substrate the dry whole zone of the non-abradant surface of glass substrate absorption with liquid; And
Grind section, on one side be fixed in abradant surface from the described glass substrate on the described workbench to the absorption of non-abradant surface supply with lapping liquid and utilize milling tool to grind this abradant surface on one side.
7. the lapping device of glass substrate according to claim 6, wherein,
Described liquid spraying portion makes at least one side in described workbench and described first, second nozzle relatively move on one side, from described first nozzle ejection described prevent dry with liquid and from described second nozzle spray described buffer solution on one side.
8. the lapping device of glass substrate according to claim 7, wherein,
The described drying that prevents is same liquid with liquid and described buffer solution.
9. the lapping device of glass substrate according to claim 8, wherein,
Described liquid is polyalcohol.
10. according to Claim 8 or the lapping device of 9 described glass substrates, wherein,
With the direction of the direction quadrature that relatively moves of described workbench on, the a plurality of same all-purpose nozzles that described first nozzle and the described second nozzle generalization are formed of configuration spray described liquid from described all-purpose nozzle towards described workbench above described workbench.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010-126083 | 2010-06-01 | ||
| JP2010126083 | 2010-06-01 | ||
| JP2011-112075 | 2011-05-19 | ||
| JP2011112075A JP5674148B2 (en) | 2010-06-01 | 2011-05-19 | Glass substrate polishing method and polishing apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102267087A true CN102267087A (en) | 2011-12-07 |
Family
ID=45049648
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011101521271A Pending CN102267087A (en) | 2010-06-01 | 2011-06-01 | Grinding method and grinding device for glass substate |
Country Status (2)
| Country | Link |
|---|---|
| KR (1) | KR20110132284A (en) |
| CN (1) | CN102267087A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103659572A (en) * | 2012-09-05 | 2014-03-26 | 三星康宁精密素材株式会社 | Edge grinding apparatus and method for grinding glass substrate |
| CN105364719A (en) * | 2014-08-13 | 2016-03-02 | Lg矽得荣株式会社 | Slurry supply device and polishing apparatus including the same |
| CN108136561A (en) * | 2015-10-23 | 2018-06-08 | 坂东机工株式会社 | Glass plate processing unit (plant) |
| CN110587406A (en) * | 2019-10-09 | 2019-12-20 | 彩虹（合肥）液晶玻璃有限公司 | Grinding adjusting device and grinding device |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101305199B1 (en) | 2011-12-09 | 2013-09-12 | 한양대학교 에리카산학협력단 | Heat storage device of vehicle |
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| JPH0661203A (en) * | 1992-08-05 | 1994-03-04 | Asahi Glass Co Ltd | Method of grinding semiconductor wafer |
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| JP3974539B2 (en) * | 2003-02-21 | 2007-09-12 | Ｈｏｙａ株式会社 | Polishing apparatus and polishing method, and method for manufacturing mask blank substrate |
| CN201176418Y (en) * | 2008-02-13 | 2009-01-07 | 高雄永富茂自动化有限公司 | Glass processing device |
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- 2011-06-01 CN CN2011101521271A patent/CN102267087A/en active Pending
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| JPS6251226A (en) * | 1985-08-30 | 1987-03-05 | Toshiba Corp | Polishing method |
| JPH0661203A (en) * | 1992-08-05 | 1994-03-04 | Asahi Glass Co Ltd | Method of grinding semiconductor wafer |
| JP3974539B2 (en) * | 2003-02-21 | 2007-09-12 | Ｈｏｙａ株式会社 | Polishing apparatus and polishing method, and method for manufacturing mask blank substrate |
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103659572A (en) * | 2012-09-05 | 2014-03-26 | 三星康宁精密素材株式会社 | Edge grinding apparatus and method for grinding glass substrate |
| CN103659572B (en) * | 2012-09-05 | 2016-08-17 | 康宁精密素材株式会社 | Edge grinding apparatus and method for grinding a glass substrate |
| CN105364719A (en) * | 2014-08-13 | 2016-03-02 | Lg矽得荣株式会社 | Slurry supply device and polishing apparatus including the same |
| CN105364719B (en) * | 2014-08-13 | 2017-11-24 | Lg矽得荣株式会社 | Slurry supply apparatus and the polissoir including slurry supply apparatus |
| CN108136561A (en) * | 2015-10-23 | 2018-06-08 | 坂东机工株式会社 | Glass plate processing unit (plant) |
| CN110936249A (en) * | 2015-10-23 | 2020-03-31 | 坂东机工株式会社 | Glass plate processing device |
| CN110587406A (en) * | 2019-10-09 | 2019-12-20 | 彩虹（合肥）液晶玻璃有限公司 | Grinding adjusting device and grinding device |
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| Publication number | Publication date |
|---|---|
| KR20110132284A (en) | 2011-12-07 |
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Application publication date: 20111207 |