CN101857949A - PVD vacuum ion plating method - Google Patents
PVD vacuum ion plating method Download PDFInfo
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- CN101857949A CN101857949A CN 201010208324 CN201010208324A CN101857949A CN 101857949 A CN101857949 A CN 101857949A CN 201010208324 CN201010208324 CN 201010208324 CN 201010208324 A CN201010208324 A CN 201010208324A CN 101857949 A CN101857949 A CN 101857949A
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- plated film
- vacuum ion
- pvd vacuum
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- ion membrane
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Abstract
The invention belongs to the technical field of plating, and particularly relates to a PVD vacuum ion plating method, which comprises the following preparation steps: (1) pretreating the substrate; (2) dewatering and drying the pre-treated substrate; (3) putting the substrate into a furnace for first plating; (4) taking the substrate out of the furnace for screen printing or offset printing and drying; (5) putting the substrate into the furnace again for second plating; (6) soaking with an organic solvent to remove printing ink in screen printing or offset printing; and (7) cleaning with water to obtain the finished product. The invention introduces the step of screen printing or offset printing in the process of vacuum ion plating so as to make the manufactured product have rich colors.
Description
Technical field
The invention belongs to the coating technique field, be specifically related to a kind of method of PVD vacuum ion membrane plating.
Background technology
Physical vapor deposition (PVD) is by evaporation, and processes such as ionization or sputter produce metallics and are deposited on workpiece surface with reactant gases reaction formation compound.The physical vapor deposition coating film technology mainly is divided three classes, vacuum vapor plating, vacuum sputtering plating and vacuum ion membrane plating.
Wherein, vacuum ion membrane plating is by means of rare gas element glow discharge, makes plating material (as metal titanium) steam raising ionization, and ion quickens through electric field, and with higher-energy bombardment workpiece surface, this moment is as feeding CO
2, N
2Deng reactant gases, just can obtain TiC, TiN tectum at workpiece surface, hardness is up to 2000HV.The important feature of vacuum ion membrane plating is that depositing temperature has only about 500 ℃, and the tectum strong adhesion.Closely during the last ten years, the development of vacuum ion plating membrane technique is the fastest, and it has become one of current state-of-the-art surface treatment mode.
At present, the product colour dullness of vacuum ion membrane plating has only a kind of color, does not have the gradual change of color, does not have color combinations, also the pattern that does not embody by change in color.
Summary of the invention
One of purpose of the present invention provides the method for the abundant vacuum ion membrane plating of a kind of prepared color that plating is combined with wire mark or offset printing.
The object of the present invention is achieved like this.
A kind of method of PVD vacuum ion membrane plating, it comprises and is prepared as follows step:
(1) base material is carried out pre-treatment;
(2) base material with pre-treatment dewaters and oven dry;
(3) advance stove, carry out the plated film first time;
(4) come out of the stove, carry out wire mark or offset printing, drying;
(5) advance stove once more, carry out the plated film second time;
Printing ink when (6) removing wire mark or offset printing with the organic solvent immersion;
(7) water cleans, and gets product.
Wherein, described plated film and wire mark can replace repeatedly and carry out.
Wherein, described plated film and offset printing can replace repeatedly and carry out.
Wherein, described base material is stainless steel, copper or titanium.
Wherein, described pre-treatment comprises successively except that cured ultrasonic cleaning, hot degreasing, electrolysis membrane removal.
Wherein, plated film carries out at vaccum ion coater, at logical N
2Condition under, the plated film time is 2.5-4 hour, coating temperature is 200-350 ℃.
Wherein, the used raw material of plated film is a kind of or several arbitrarily in titanium nitride, TiCN, TiAlN, titanium carbide, zirconium nitride, the hafnium nitride.
Beneficial effect of the present invention is: the method for this kind PVD vacuum ion membrane plating, and it comprises and is prepared as follows step: (1) carries out pre-treatment to base material; (2) base material with pre-treatment dewaters and oven dry; (3) advance stove, carry out the plated film first time; (4) come out of the stove, carry out wire mark or offset printing, drying; (5) advance stove once more, carry out the plated film second time; Printing ink when (6) removing wire mark or offset printing with the organic solvent immersion; (7) water cleans, and gets product.The present invention has introduced wire mark or this step of offset printing in the process of vacuum ion membrane plating, make the product colour that makes abundant.
Embodiment
The invention will be further described below by embodiment, but practical range of the present invention is not limited to this.
A kind of method of PVD vacuum ion membrane plating, it comprises and is prepared as follows step:
(1) base material is carried out pre-treatment, strengthen the sticking power of substrate surface;
(2) base material with pre-treatment dewaters and oven dry;
(3) advance stove, carry out the plated film first time;
(4) come out of the stove, carry out wire mark or offset printing, drying, existing wire mark or offset printing are adopted in wire mark or offset printing, form a pattern by wire mark or offset printing at the substrate surface of plated film, described pattern is the protection pattern, protect primary plated film, for the second time plated film prepare, but both Air drying of drying, also can carry out drying, be preferably 150 ℃ and carry out drying at 120 ℃-160 ℃;
(5) advance stove once more, carry out the plated film second time, for the first time plated film with the second time plated film color different;
Printing ink when (6) removing wire mark or offset printing with the organic solvent immersion, then for the first time plated film and for the second time plated film all can manifest, because the protection pattern that printing ink forms has been protected the color of plated film for the first time, remove the color that then can show plated film for the first time behind the removal ink and be shown as wire mark or the pattern during offset printing;
(7) water cleans, and gets product.
Wherein, described plated film and wire mark or offset printing can replace repeatedly and carry out, and can make the more product of horn of plenty of color like this.
Wherein, described base material is stainless steel, copper or titanium, can certainly can adopt the material of vacuum ion membrane plating for other.
Wherein, described pre-treatment comprises successively except that cured ultrasonic cleaning, hot degreasing (immersion), electrolysis membrane removal.The used raw material of electrolysis membrane removal is activation hydrochlorate and tartrate, carries out anode electrolysis, removes the sull of substrate surface.
Wherein, plated film carries out at vaccum ion coater, at logical N
2Condition under, the plated film time is 2.5-4 hour, coating temperature is 200-350 ℃, specifically can regulate according to the thickness of base material, wherein base vacuum is 6 * 10
-3Pa, making the goods vacuum is 2 * 10
-1Pa.
Wherein, the used raw material of plated film is a kind of or several arbitrarily in titanium nitride, TiCN, TiAlN, titanium carbide, zirconium nitride, the hafnium nitride.
The above only is a better embodiment of the present invention, so all equivalences of doing according to the described structure of patent claim of the present invention, feature and principle change or modify, is included in the patent claim of the present invention.
Claims (7)
1. the method for a PVD vacuum ion membrane plating is characterized in that: it comprises and is prepared as follows step:
(1) base material is carried out pre-treatment;
(2) base material with pre-treatment dewaters and oven dry;
(3) advance stove, carry out the plated film first time;
(4) come out of the stove, carry out wire mark or offset printing, drying;
(5) advance stove once more, carry out the plated film second time;
Printing ink when (6) removing wire mark or offset printing with the organic solvent immersion;
(7) water cleans, and gets product.
2. the method for a kind of PVD vacuum ion membrane plating according to claim 1 is characterized in that: described plated film and wire mark can replace repeatedly and carry out.
3. the method for a kind of PVD vacuum ion membrane plating according to claim 1 is characterized in that: described plated film and offset printing can replace repeatedly and carry out.
4. the method for a kind of PVD vacuum ion membrane plating according to claim 1 is characterized in that: described base material is stainless steel, copper or titanium.
5. the method for a kind of PVD vacuum ion membrane plating according to claim 1 is characterized in that: described pre-treatment comprises successively except that cured ultrasonic cleaning, hot degreasing, electrolysis membrane removal.
6. the method for a kind of PVD vacuum ion membrane plating according to claim 1 is characterized in that: plated film carries out at vaccum ion coater, at logical N
2Condition under, the plated film time is 2.5-4 hour, coating temperature is 200-350 ℃.
7. the method for a kind of PVD vacuum ion membrane plating according to claim 1 is characterized in that: the used raw material of plated film is a kind of or several arbitrarily in titanium nitride, TiCN, TiAlN, titanium carbide, zirconium nitride, the hafnium nitride.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010208324 CN101857949A (en) | 2010-06-24 | 2010-06-24 | PVD vacuum ion plating method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010208324 CN101857949A (en) | 2010-06-24 | 2010-06-24 | PVD vacuum ion plating method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101857949A true CN101857949A (en) | 2010-10-13 |
Family
ID=42944104
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201010208324 Pending CN101857949A (en) | 2010-06-24 | 2010-06-24 | PVD vacuum ion plating method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101857949A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102501463A (en) * | 2011-11-03 | 2012-06-20 | 厦门建霖工业有限公司 | Method for preparing simulated metal drawn wire on surface of plastic |
| CN103085575A (en) * | 2011-11-02 | 2013-05-08 | 森科五金(深圳)有限公司 | Preparation and color separation method of double-color film |
| CN110616411A (en) * | 2019-09-23 | 2019-12-27 | 海盐鑫中岳电子科技有限公司 | PVD vacuum coating process and coated workpiece |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6475660A (en) * | 1987-09-18 | 1989-03-22 | Kowa Eng Kk | Multicoloration method for metallic surface |
| CN101376602A (en) * | 2008-09-23 | 2009-03-04 | 林敏� | Method for forming one layer or multiple layers of metal patterns on surface of ceramic products |
| CN201309290Y (en) * | 2008-07-01 | 2009-09-16 | 比亚迪股份有限公司 | Metal plate |
| CN101654769A (en) * | 2009-08-26 | 2010-02-24 | 杭州泛亚水暖器材有限公司 | Vacuum ion plating method |
-
2010
- 2010-06-24 CN CN 201010208324 patent/CN101857949A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6475660A (en) * | 1987-09-18 | 1989-03-22 | Kowa Eng Kk | Multicoloration method for metallic surface |
| CN201309290Y (en) * | 2008-07-01 | 2009-09-16 | 比亚迪股份有限公司 | Metal plate |
| CN101376602A (en) * | 2008-09-23 | 2009-03-04 | 林敏� | Method for forming one layer or multiple layers of metal patterns on surface of ceramic products |
| CN101654769A (en) * | 2009-08-26 | 2010-02-24 | 杭州泛亚水暖器材有限公司 | Vacuum ion plating method |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103085575A (en) * | 2011-11-02 | 2013-05-08 | 森科五金(深圳)有限公司 | Preparation and color separation method of double-color film |
| CN102501463A (en) * | 2011-11-03 | 2012-06-20 | 厦门建霖工业有限公司 | Method for preparing simulated metal drawn wire on surface of plastic |
| CN102501463B (en) * | 2011-11-03 | 2015-04-08 | 厦门建霖工业有限公司 | Method for preparing simulated metal drawn wire on surface of plastic |
| CN110616411A (en) * | 2019-09-23 | 2019-12-27 | 海盐鑫中岳电子科技有限公司 | PVD vacuum coating process and coated workpiece |
| CN110616411B (en) * | 2019-09-23 | 2021-09-07 | 海盐鑫中岳电子科技有限公司 | PVD vacuum coating process and coated workpiece |
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| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| ASS | Succession or assignment of patent right |
Owner name: DONGGUAN QUANSHUO HARDWARE MACHINING CO., LTD. Free format text: FORMER OWNER: WU RUIEN Effective date: 20110812 |
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| C41 | Transfer of patent application or patent right or utility model | ||
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Free format text: CORRECT: ADDRESS; FROM: 523850 DONGGUAN, GUANGDONG PROVINCE TO: 523860 DONGGUAN, GUANGDONG PROVINCE |
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| TA01 | Transfer of patent application right |
Effective date of registration: 20110812 Address after: 523860 Guangdong city of Dongguan province Changan Zhen Xiao Chong Industrial Zone Dongguan City Quan Shuo Hardware Processing Co. Ltd. Applicant after: Dongguan Quanshuo Metal Processing Co.,Ltd. Address before: 523850, Changan Town, Guangdong City, Dongguan Province, Changan automobile station opposite Changan industrial city, Dongguan Quan Shuo Hardware Processing Co., Ltd. Applicant before: Wu Ruien |
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| WD01 | Invention patent application deemed withdrawn after publication |
Open date: 20101013 |