CN101785183A - 滤波器、使用该滤波器的双工器及使用该双工器的通信机 - Google Patents
滤波器、使用该滤波器的双工器及使用该双工器的通信机 Download PDFInfo
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- CN101785183A CN101785183A CN200780100338A CN200780100338A CN101785183A CN 101785183 A CN101785183 A CN 101785183A CN 200780100338 A CN200780100338 A CN 200780100338A CN 200780100338 A CN200780100338 A CN 200780100338A CN 101785183 A CN101785183 A CN 101785183A
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- Prior art keywords
- filter
- thin film
- piezoelectric thin
- duplexer
- resonator
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- 229910052720 vanadium Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/125—Driving means, e.g. electrodes, coils
- H03H9/13—Driving means, e.g. electrodes, coils for networks consisting of piezoelectric or electrostrictive materials
- H03H9/132—Driving means, e.g. electrodes, coils for networks consisting of piezoelectric or electrostrictive materials characterized by a particular shape
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
- H03H9/171—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
- H03H9/172—Means for mounting on a substrate, i.e. means constituting the material interface confining the waves to a volume
- H03H9/174—Membranes
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
- H03H9/58—Multiple crystal filters
- H03H9/582—Multiple crystal filters implemented with thin-film techniques
- H03H9/586—Means for mounting to a substrate, i.e. means constituting the material interface confining the waves to a volume
- H03H9/588—Membranes
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
- H03H9/58—Multiple crystal filters
- H03H9/60—Electric coupling means therefor
- H03H9/605—Electric coupling means therefor consisting of a ladder configuration
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H3/04—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
- H03H2003/0414—Resonance frequency
- H03H2003/0421—Modification of the thickness of an element
- H03H2003/0428—Modification of the thickness of an element of an electrode
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Abstract
Description
轴比a∶b | 短轴长度[μm] | 长轴长度[μm] | 轴比a∶b | 短轴长度[μm] | 长轴长度[μm] | ||
S11 | 9∶5 | 149.2 | 268.5 | S4 | 8∶5 | 157.6 | 252.2 |
S12 | 8.75∶5 | 151.3 | 264.7 | P1 | 6∶5 | 159.6 | 191.6 |
S2 | 8.5∶5 | 119.0 | 202.2 | P2 | 6∶5 | 147.4 | 177.0 |
S3 | 8.25∶5 | 116.0 | 183.0 | P3 | 6∶5 | 143.8 | 172.6 |
轴比a∶b | 短轴长度[μm] | 长轴长度[μm] | 轴比a∶b | 短轴长度[μm] | 长轴长度[μm] | ||
S11 | 6∶5 | 182.6 | 219.2 | S4 | 6∶5 | 182.0 | 218.4 |
S12 | 6.5∶5 | 175.6 | 228.2 | P1 | 6∶5 | 159.6 | 191.6 |
S2 | 6∶5 | 141.6 | 170.0 | P2 | 6∶5 | 147.4 | 177.0 |
S3 | 6∶5 | 136.0 | 163.2 | P3 | 6∶5 | 143.8 | 172.6 |
Claims (6)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2007/072552 WO2009066380A1 (ja) | 2007-11-21 | 2007-11-21 | フィルタ、それを用いたデュプレクサおよびそのデュプレクサを用いた通信機 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN101785183A true CN101785183A (zh) | 2010-07-21 |
Family
ID=40667218
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200780100338A Pending CN101785183A (zh) | 2007-11-21 | 2007-11-21 | 滤波器、使用该滤波器的双工器及使用该双工器的通信机 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20100148888A1 (zh) |
JP (1) | JPWO2009066380A1 (zh) |
KR (1) | KR20100041846A (zh) |
CN (1) | CN101785183A (zh) |
WO (1) | WO2009066380A1 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111557076A (zh) * | 2018-02-02 | 2020-08-18 | 株式会社大真空 | 压电滤波器 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5394847B2 (ja) * | 2009-08-06 | 2014-01-22 | 太陽誘電株式会社 | 分波器 |
JP5613813B2 (ja) * | 2013-10-17 | 2014-10-29 | 太陽誘電株式会社 | 分波器 |
US9654983B2 (en) | 2014-04-03 | 2017-05-16 | North Carolina State University | Tunable filter employing feedforward cancellation |
US9800278B2 (en) | 2015-09-04 | 2017-10-24 | North Carolina State University | Tunable filters, cancellers, and duplexers based on passive mixers |
WO2019028288A1 (en) * | 2017-08-03 | 2019-02-07 | Akoustis, Inc. | ELLIPTICAL STRUCTURE FOR VOLUME ACOUSTIC WAVE RESONATOR |
CN115996038B (zh) * | 2022-12-26 | 2023-08-22 | 北京芯溪半导体科技有限公司 | 一种滤波器、多工器以及通信设备 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60189307A (ja) * | 1984-03-09 | 1985-09-26 | Toshiba Corp | 圧電薄膜共振器およびその製造方法 |
US6150703A (en) * | 1998-06-29 | 2000-11-21 | Trw Inc. | Lateral mode suppression in semiconductor bulk acoustic resonator (SBAR) devices using tapered electrodes, and electrodes edge damping materials |
US6215375B1 (en) * | 1999-03-30 | 2001-04-10 | Agilent Technologies, Inc. | Bulk acoustic wave resonator with improved lateral mode suppression |
DE10058339A1 (de) * | 2000-11-24 | 2002-06-06 | Infineon Technologies Ag | Bulk-Acoustic-Wave-Filter |
KR100398365B1 (ko) * | 2001-06-25 | 2003-09-19 | 삼성전기주식회사 | 폭방향 파동이 억제되는 박막 공진기 |
JP3954395B2 (ja) * | 2001-10-26 | 2007-08-08 | 富士通株式会社 | 圧電薄膜共振子、フィルタ、および圧電薄膜共振子の製造方法 |
KR100489828B1 (ko) * | 2003-04-07 | 2005-05-16 | 삼성전기주식회사 | Fbar 소자 및 그 제조방법 |
JP4010504B2 (ja) * | 2003-06-04 | 2007-11-21 | 日立金属株式会社 | マルチバンド用送受信機およびそれを用いた無線通信機 |
KR101323447B1 (ko) * | 2003-10-06 | 2013-10-29 | 트리퀸트 세미컨덕터 인코퍼레이티드 | 사다리형 필터, 무선 주파수 대역 통과 필터, 무선 주파수 수신기 및 송신기 장치, 무선 주파수 수신기 장치 및 무선 주파수 송신기 장치 |
US7161448B2 (en) * | 2004-06-14 | 2007-01-09 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Acoustic resonator performance enhancements using recessed region |
US7280007B2 (en) * | 2004-11-15 | 2007-10-09 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Thin film bulk acoustic resonator with a mass loaded perimeter |
US7388454B2 (en) * | 2004-10-01 | 2008-06-17 | Avago Technologies Wireless Ip Pte Ltd | Acoustic resonator performance enhancement using alternating frame structure |
US8981876B2 (en) * | 2004-11-15 | 2015-03-17 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Piezoelectric resonator structures and electrical filters having frame elements |
JP2006180304A (ja) * | 2004-12-24 | 2006-07-06 | Hitachi Media Electoronics Co Ltd | 圧電バルク共振子およびその製造方法、圧電バルク共振子を用いたフィルタ、それを用いた半導体集積回路装置、並びにそれを用いた高周波モジュール |
JP4629492B2 (ja) * | 2005-05-10 | 2011-02-09 | 太陽誘電株式会社 | 圧電薄膜共振子およびフィルタ |
JP4678261B2 (ja) * | 2005-08-29 | 2011-04-27 | セイコーエプソン株式会社 | 圧電薄膜振動子 |
JP4877966B2 (ja) * | 2006-03-08 | 2012-02-15 | 日本碍子株式会社 | 圧電薄膜デバイス |
JP4181185B2 (ja) * | 2006-04-27 | 2008-11-12 | 富士通メディアデバイス株式会社 | フィルタおよび分波器 |
-
2007
- 2007-11-21 WO PCT/JP2007/072552 patent/WO2009066380A1/ja active Application Filing
- 2007-11-21 JP JP2009542439A patent/JPWO2009066380A1/ja active Pending
- 2007-11-21 KR KR1020107003647A patent/KR20100041846A/ko not_active Application Discontinuation
- 2007-11-21 CN CN200780100338A patent/CN101785183A/zh active Pending
-
2010
- 2010-02-24 US US12/712,066 patent/US20100148888A1/en not_active Abandoned
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111557076A (zh) * | 2018-02-02 | 2020-08-18 | 株式会社大真空 | 压电滤波器 |
CN111557076B (zh) * | 2018-02-02 | 2024-04-16 | 株式会社大真空 | 压电滤波器 |
Also Published As
Publication number | Publication date |
---|---|
KR20100041846A (ko) | 2010-04-22 |
WO2009066380A1 (ja) | 2009-05-28 |
US20100148888A1 (en) | 2010-06-17 |
JPWO2009066380A1 (ja) | 2011-03-31 |
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