CN101466639A - 生产纳米颗粒状固体的悬浮液的方法 - Google Patents
生产纳米颗粒状固体的悬浮液的方法 Download PDFInfo
- Publication number
- CN101466639A CN101466639A CNA2007800168477A CN200780016847A CN101466639A CN 101466639 A CN101466639 A CN 101466639A CN A2007800168477 A CNA2007800168477 A CN A2007800168477A CN 200780016847 A CN200780016847 A CN 200780016847A CN 101466639 A CN101466639 A CN 101466639A
- Authority
- CN
- China
- Prior art keywords
- reaction
- reaction zone
- nanoparticulate
- gas
- particle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 67
- 239000007787 solid Substances 0.000 title claims abstract description 39
- 239000000725 suspension Substances 0.000 title claims abstract description 28
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 239000011164 primary particle Substances 0.000 claims abstract description 15
- 238000006243 chemical reaction Methods 0.000 claims description 80
- 239000007789 gas Substances 0.000 claims description 58
- 239000002994 raw material Substances 0.000 claims description 31
- 238000001816 cooling Methods 0.000 claims description 30
- 239000007788 liquid Substances 0.000 claims description 24
- 239000000047 product Substances 0.000 claims description 24
- 239000007795 chemical reaction product Substances 0.000 claims description 19
- 238000010791 quenching Methods 0.000 claims description 19
- 239000001257 hydrogen Substances 0.000 claims description 18
- 229910052739 hydrogen Inorganic materials 0.000 claims description 18
- 229910052751 metal Inorganic materials 0.000 claims description 16
- 239000002184 metal Substances 0.000 claims description 16
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 12
- 239000003921 oil Substances 0.000 claims description 12
- 229910052782 aluminium Inorganic materials 0.000 claims description 11
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 10
- -1 hydrogen compound Chemical class 0.000 claims description 10
- 230000008569 process Effects 0.000 claims description 10
- 239000003795 chemical substances by application Substances 0.000 claims description 9
- 229910052746 lanthanum Inorganic materials 0.000 claims description 9
- 230000004044 response Effects 0.000 claims description 9
- 229910052796 boron Inorganic materials 0.000 claims description 8
- 239000000376 reactant Substances 0.000 claims description 8
- 239000004411 aluminium Substances 0.000 claims description 7
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 7
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 6
- 230000008859 change Effects 0.000 claims description 6
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims description 6
- 150000002739 metals Chemical class 0.000 claims description 6
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 6
- 229910052744 lithium Inorganic materials 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 229910052725 zinc Inorganic materials 0.000 claims description 5
- 239000011701 zinc Substances 0.000 claims description 5
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 4
- 238000000354 decomposition reaction Methods 0.000 claims description 4
- 229910052697 platinum Inorganic materials 0.000 claims description 4
- 229910052703 rhodium Inorganic materials 0.000 claims description 4
- 239000010948 rhodium Substances 0.000 claims description 4
- 229910052718 tin Inorganic materials 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 239000010936 titanium Substances 0.000 claims description 4
- 229910052684 Cerium Inorganic materials 0.000 claims description 3
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 3
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical compound [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 claims description 3
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 239000011733 molybdenum Substances 0.000 claims description 3
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 3
- 229910052707 ruthenium Inorganic materials 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- 239000002904 solvent Substances 0.000 claims description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- 239000010937 tungsten Substances 0.000 claims description 3
- 150000001639 boron compounds Chemical class 0.000 claims description 2
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 claims description 2
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 claims description 2
- 239000012280 lithium aluminium hydride Substances 0.000 claims description 2
- 150000002431 hydrogen Chemical class 0.000 claims 2
- 230000010512 thermal transition Effects 0.000 claims 1
- 239000002245 particle Substances 0.000 description 40
- 239000000203 mixture Substances 0.000 description 29
- 238000001556 precipitation Methods 0.000 description 18
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 17
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 14
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 14
- 239000012071 phase Substances 0.000 description 12
- 230000000171 quenching effect Effects 0.000 description 12
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 10
- 229910052786 argon Inorganic materials 0.000 description 10
- 239000012159 carrier gas Substances 0.000 description 10
- 239000002105 nanoparticle Substances 0.000 description 10
- 238000002360 preparation method Methods 0.000 description 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 7
- 229910052757 nitrogen Inorganic materials 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- 239000011343 solid material Substances 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 6
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 6
- 239000003507 refrigerant Substances 0.000 description 6
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 238000001704 evaporation Methods 0.000 description 5
- 230000008020 evaporation Effects 0.000 description 5
- 229910052734 helium Inorganic materials 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 230000004048 modification Effects 0.000 description 5
- 238000012986 modification Methods 0.000 description 5
- 239000011787 zinc oxide Substances 0.000 description 5
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- 239000013543 active substance Substances 0.000 description 4
- 238000005054 agglomeration Methods 0.000 description 4
- 230000002776 aggregation Effects 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 239000001307 helium Substances 0.000 description 4
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 4
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- 239000000443 aerosol Substances 0.000 description 3
- 235000011089 carbon dioxide Nutrition 0.000 description 3
- 229910002091 carbon monoxide Inorganic materials 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000010574 gas phase reaction Methods 0.000 description 3
- 239000008246 gaseous mixture Substances 0.000 description 3
- 239000007791 liquid phase Substances 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 150000004706 metal oxides Chemical class 0.000 description 3
- PDKHNCYLMVRIFV-UHFFFAOYSA-H molybdenum;hexachloride Chemical compound [Cl-].[Cl-].[Cl-].[Cl-].[Cl-].[Cl-].[Mo] PDKHNCYLMVRIFV-UHFFFAOYSA-H 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 238000010408 sweeping Methods 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 239000001273 butane Substances 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 2
- 230000000977 initiatory effect Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 2
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000006722 reduction reaction Methods 0.000 description 2
- 230000002829 reductive effect Effects 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- 239000006200 vaporizer Substances 0.000 description 2
- 239000002912 waste gas Substances 0.000 description 2
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 1
- 229940058015 1,3-butylene glycol Drugs 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 208000035126 Facies Diseases 0.000 description 1
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 241000872198 Serjania polyphylla Species 0.000 description 1
- 229910020175 SiOH Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 229910000085 borane Inorganic materials 0.000 description 1
- 235000019437 butane-1,3-diol Nutrition 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 239000011852 carbon nanoparticle Substances 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 235000019504 cigarettes Nutrition 0.000 description 1
- 238000005345 coagulation Methods 0.000 description 1
- 230000015271 coagulation Effects 0.000 description 1
- 238000002288 cocrystallisation Methods 0.000 description 1
- 239000000567 combustion gas Substances 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- SJJCABYOVIHNPZ-UHFFFAOYSA-N cyclohexyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)C1CCCCC1 SJJCABYOVIHNPZ-UHFFFAOYSA-N 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- RCJVRSBWZCNNQT-UHFFFAOYSA-N dichloridooxygen Chemical compound ClOCl RCJVRSBWZCNNQT-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000002296 dynamic light scattering Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005367 electrostatic precipitation Methods 0.000 description 1
- CWAFVXWRGIEBPL-UHFFFAOYSA-N ethoxysilane Chemical compound CCO[SiH3] CWAFVXWRGIEBPL-UHFFFAOYSA-N 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000002608 ionic liquid Substances 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 229910052987 metal hydride Inorganic materials 0.000 description 1
- 150000004681 metal hydrides Chemical class 0.000 description 1
- 229910001960 metal nitrate Inorganic materials 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- MSRJTTSHWYDFIU-UHFFFAOYSA-N octyltriethoxysilane Chemical compound CCCCCCCC[Si](OCC)(OCC)OCC MSRJTTSHWYDFIU-UHFFFAOYSA-N 0.000 description 1
- 229960003493 octyltriethoxysilane Drugs 0.000 description 1
- 150000001282 organosilanes Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 239000012716 precipitator Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 230000011218 segmentation Effects 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000012265 solid product Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000006557 surface reaction Methods 0.000 description 1
- ONWXNHPOAGOMTG-UHFFFAOYSA-N suxibuzone Chemical compound O=C1C(CCCC)(COC(=O)CCC(O)=O)C(=O)N(C=2C=CC=CC=2)N1C1=CC=CC=C1 ONWXNHPOAGOMTG-UHFFFAOYSA-N 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 230000032258 transport Effects 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- UORVGPXVDQYIDP-UHFFFAOYSA-N trihydridoboron Substances B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 1
- XYJRNCYWTVGEEG-UHFFFAOYSA-N trimethoxy(2-methylpropyl)silane Chemical compound CO[Si](OC)(OC)CC(C)C XYJRNCYWTVGEEG-UHFFFAOYSA-N 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
- B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G1/00—Methods of preparing compounds of metals not covered by subclasses C01B, C01C, C01D, or C01F, in general
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B35/00—Boron; Compounds thereof
- C01B35/02—Boron; Borides
- C01B35/04—Metal borides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B6/00—Hydrides of metals including fully or partially hydrided metals, alloys or intermetallic compounds ; Compounds containing at least one metal-hydrogen bond, e.g. (GeH3)2S, SiH GeH; Monoborane or diborane; Addition complexes thereof
- C01B6/06—Hydrides of aluminium, gallium, indium, thallium, germanium, tin, lead, arsenic, antimony, bismuth or polonium; Monoborane; Diborane; Addition complexes thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B6/00—Hydrides of metals including fully or partially hydrided metals, alloys or intermetallic compounds ; Compounds containing at least one metal-hydrogen bond, e.g. (GeH3)2S, SiH GeH; Monoborane or diborane; Addition complexes thereof
- C01B6/24—Hydrides containing at least two metals; Addition complexes thereof
- C01B6/243—Hydrides containing at least two metals; Addition complexes thereof containing only hydrogen, aluminium and alkali metals, e.g. Li(AlH4)
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G39/00—Compounds of molybdenum
- C01G39/06—Sulfides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G9/00—Compounds of zinc
- C01G9/02—Oxides; Hydroxides
- C01G9/03—Processes of production using dry methods, e.g. vapour phase processes
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/58—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
- C04B35/5805—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on borides
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/58—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
- C04B35/58085—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on silicides
- C04B35/58092—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on silicides based on refractory metal silicides
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
- C04B35/62605—Treating the starting powders individually or as mixtures
- C04B35/62645—Thermal treatment of powders or mixtures thereof other than sintering
- C04B35/62665—Flame, plasma or melting treatment
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/04—Compounds of zinc
- C09C1/043—Zinc oxide
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/51—Particles with a specific particle size distribution
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3224—Rare earth oxide or oxide forming salts thereof, e.g. scandium oxide
- C04B2235/3227—Lanthanum oxide or oxide-forming salts thereof
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3231—Refractory metal oxides, their mixed metal oxides, or oxide-forming salts thereof
- C04B2235/3256—Molybdenum oxides, molybdates or oxide forming salts thereof, e.g. cadmium molybdate
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/42—Non metallic elements added as constituents or additives, e.g. sulfur, phosphor, selenium or tellurium
- C04B2235/421—Boron
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Structural Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Plasma & Fusion (AREA)
- Thermal Sciences (AREA)
- Composite Materials (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
- Colloid Chemistry (AREA)
Abstract
本发明涉及一种制备纳米颗粒状固体的悬浮液的方法。所述方法的特征在于悬浮液中包含的固体以纳米颗粒状初级粒子或极小聚集体的形式提供。
Description
本发明涉及一种制备纳米颗粒状固体的悬浮液的方法。
纳米粒子指纳米数量级的粒子。它们的尺寸在介于原子或单分子体系和连续宏观结构之间的过渡区内。除了其通常很大的表面积外,纳米粒子还以显著不同于较大粒子的特殊物理和化学性能而著名。例如,纳米粒子相对于相同物质的宏观粒子具有较低熔点、吸收较短波长的光并具有不同的机械、电和磁性能。使用纳米粒子作为结构单元还允许这些特性中的很多用于宏观材料(Winnacker/Küchler,Chemische Technik:Prozesse undProdukte[化学技术:方法和产品](编辑:R.Dittmayer,W.Keim,G.Kreysa,A.Oberholz),第2卷:Neue Technologien[新技术],第9章,Wiley-VCH Verlag 2004)。
纳米粒子可在气相中制备。文献公开了大量气相合成纳米粒子的方法,包括在火焰反应器、等离子体反应器和热壁反应器中的方法,惰性气体冷凝方法,自由气流体系和超临界膨胀(Winnacker/Küchler,参见上文)。这些方法的缺陷是所得粒子因其高流动性还可以在气相中聚集并且所得聚集体因强范德华相互作用及得到的在粒子之间的高粘合力而仅极差地再分散于流体中。粒子越小,该问题越大。除范德华相互作用外,烧结或共价键也可以对再分散性产生不利影响。
为获得具有非常均匀性能的纳米粒子,作为本领域熟练技术人员所公知的常识,根据空时来稳定气相转化率是有利的。这可以确保实际上所有原料在反应过程中都处于相同条件下并由此反应而给出均匀的产物粒子。
US 20040050207描述了通过燃烧器制备纳米粒子,其中将反应物输送到多个管中的反应区并且直到它们到达那里才进行混合和反应。以类似方式,US 20020047110阐述了氮化铝粉末的制备以及JP 61-031325阐述了光学玻璃粉末的合成。
DE 10243307描述了烟灰纳米粒子的合成。气相反应在用作回吹防护的多孔体和排列于其上的蓄积板之间进行。使反应气体通过该多孔体进入反应室并在那里转化。
在气相中制备碳纳米粒子的燃烧器和方法描述于US 20030044342中。此时,反应气体在多孔体外转化。
EP 1004545提出一种高温制备金属氧化物的方法,其中将反应物通过带有连续孔道的成型体并在反应室中转化。
本发明的目的是提供一种制备纳米颗粒状固体的悬浮液的方法,其中该悬浮液中存在的固体以纳米颗粒状初级粒子或极小聚集体的形式存在。这些悬浮液应允许简化纳米颗粒状固体的进一步加工。本发明的另一目的是提供一种制备仅可通过其他路线较难获得的热不稳定产物的纳米颗粒状固体的悬浮液的方法。
该目的通过一种其中将气相反应中所得纳米颗粒状固体直接转化成液相的方法实现。
因此本发明提供一种制备纳米颗粒状固体的悬浮液的方法,其包括:
(a)将至少一种原料和可能的话其他组分输送通过至少一个反应区而使其进行热反应,其中形成纳米颗粒状初级粒子,
(b)将步骤(a)中所得反应产物快速冷却,以及
(c)将步骤(b)中所得冷却反应产物引入液体中而形成悬浮液,其中存在的固体以纳米颗粒状初级粒子或极小聚集体的形式存在。
通过本发明方法进行的热反应原则上可以为热引发并导致纳米颗粒状固体形成的任何化学反应。优选实施方案为氧化、还原、热解和水解反应。此外,该反应还可以为其中反应所需能量由外部供应的异热方法或其中所需能量来自原料的部分转化的自热方法。为在固定位置引发反应,燃烧器是有用的,正如等离子体源一样。
可通过本发明方法以纳米颗粒状固体获得的一般产物为炭黑,至少一种元素Si、Al、Ti、In、Zn、Ce、Fe、Nb、Zr、Sn、Cr、Mn、Co、Ni、Cu、Ag、Au、Pt、Pd、Rh、Ru、Bi、Ba、B、Y、V、La的氧化物,及至少一种元素Li、Na、K、Rb、Cs、B、Al的氢化物,以及硫化物如MoS2,碳化物,氮化物,氯化物,氯氧化物和单质金属或半金属如Li、Na、B、Ga、Si、Ge、P、As、Sb、La及其混合物。
本发明方法能够由多种不同原料和可能的话其他组分制备上述纳米颗粒状固体的悬浮液。获得至少一种上述产物的合适方法构建在下文详述。
除其他参数外,气相反应过程可以通过下列参数控制:
-反应气体的组成(原料类型和用量、额外组分、惰性成分),以及
-反应过程中的反应条件(反应温度、停留时间、在反应区中原料的供应、催化剂的存在)。
本发明制备纳米颗粒状固体的悬浮液的方法可以细分成下列步骤,于下文详细描述。
步骤a)
根据本发明,在反应区供入进行热反应的至少一种原料和可能的话一种或多种其他组分,其中形成纳米颗粒状初级粒子。
有用的原料包括可优选转化成气相的任何物质,这样它们在反应条件下以气态存在并且可通过热反应形成纳米颗粒状固体。根据所需产物,本发明方法的原料例如可以为元素氢化合物,例如烃,硼烷或磷氢化物,以及金属氧化物,金属氢化物,羰基金属,烷基金属,金属卤化物如氟化物、氯化物、溴化物或碘化物,金属硫酸盐,金属硝酸盐,金属-烯烃配合物,金属醇盐,金属甲酸盐,金属乙酸盐,金属草酸盐,金属硼酸盐或金属乙酰丙酮酸盐,以及单质金属如锂、钠、钾、硼、镧、锡、铈、钛、硅、钼、钨、铂、铑、钌、锌或铝。优选原料为元素氢化合物和单质金属硼、锌、镧、锡、铈、钛、硅、钼、钨、铂、铑、钌和铝。
除至少一种原料外,可向反应区供入作为其他组分的氧化剂,例如分子氧、含氧气体混合物、含氧化合物及其混合物。在优选实施方案中,所用氧源为分子氧。这能使反应区中惰性化合物含量最小化。然而,还可以将空气或空气/氧气混合物用作氧源。所用含氧化合物例如为水(优选呈蒸汽态)和/或二氧化碳。当使用二氧化碳时,其可以为来自反应所得气体反应产物的再循环二氧化碳。
在本发明另一实施方案中,可向反应区供入作为其他组分的还原剂,例如分子氢、氨、肼、甲烷、含氢气体混合物、含氢化合物及其混合物。特别优选使铝在氢气-氩气等离子体中转化形成氢化铝(AlH3)并且使氧化镧与硼或硼化合物反应形成六硼化镧(LaB6)。
需要的话,可向反应区供入作为其他组分的燃烧气体,其提供反应所需能量。例如这可以为H2/O2气体混合物,H2/空气混合物,甲烷、乙烷、丙烷、丁烷、乙烯或乙炔与空气或其他含氧气体混合物的混合物。
至此除上述可以单独或一起使用的成分外,还可以向反应区供入至少一种其他组分。这些例如包括再循环的任何气体反应产物、粗合成气、一氧化碳(CO)、二氧化碳(CO2)和影响特定产物产率和/或选择性或粒度的其他气体如氢气或惰性气体如氮气或稀有气体。此外,还可以气溶胶供入细碎固体或液体。这些例如可以为在本方法中用于改性、后处理或涂布或为原料本身的固体或液体。
在本发明优选实施方案中,将两种不同金属同时供入反应区。这可以两种金属预混合物的形式或通过分开供入单独两种金属来进行。特别优选将金属锂和铝在氢气存在下在等离子体中转化成氢化铝锂。
向反应区供入固体原料例如可借助本领域熟练技术人员已知的装置,例如通过刷式进料器或螺杆进料器及随后的夹带流输送来完成。所述固体原料优选以粉状使用并与载气形成气溶胶,其中固体原料的粒度可以在与可通过本发明方法获得的纳米颗粒状固体的粒度相同的范围内。固体原料平均的粒子或聚集体尺寸通常为0.01-500μm,优选0.1-50μm,更优选0.1-5μm。在较大平均粒子或聚集体尺寸的情况下,在反应区存在气相转化不完全的风险,以致该类较大粒子仅不完全地用于该反应(若有的话)。在某些情况下,在不完全蒸发粒子上的表面反应可导致其钝化。
可同样借助本领域熟练技术人员已知的装置将液体原料例如以气态或以包含液滴的蒸气态供入反应区。用于该目的的合适装置包括蒸发器如薄膜蒸发器或闪蒸器、雾化与夹带流蒸发器的结合或在放热反应(低温火焰)存在下的蒸发。通常没有雾化液体原料不完全反应的风险,只要液滴的尺寸小于气溶胶常见的50μm。
在本发明优选实施方案中,将原料和存在的任何其他组分在将它们实际引入反应区之前转化成气相并相互混合。尤其在低沸点的原料和存在任何其他组分的情况下这是可能的,因为它们可以在还不存在化学转化的温度下已经以气态存在。或者,还可以将不同原料和存在的任何其他组分分别转化成气态并以相互分开的气流供入反应区,在这种情况下在其刚进入反应区就有利地进行混合。
当使用固体原料和可能的话其他组分并将其通过载气各自分开输入反应区时,每种情况下载气负荷通常为0.01-2.0g/l,优选0.05-0.5g/l。在使用固体原料和可能的话其他组分并将其已经作为混合物通过载气输入反应区的情况下,在全部量固体原料下的载气负荷通常为0.01-2.0g/l,优选0.05-0.5g/l。在液体和气体原料的情况下,通常比提及的那些高的负荷是可能的。适合于特定工艺条件的负荷通常可容易地通过适当的初步试验测定。
用于将固体或液体原料和可能的话其他组分输送到反应区的载气可以为任何上述气体,只要它不阻碍热反应。优选将稀有气体用作载气。
将引入本发明反应区的原料和任何其他组分进行热反应,其中形成纳米颗粒状初级粒子。这通常通过加热到高温进行,有用的方法尤其包括火焰或热等离子体、微波等离子体、光电弧等离子体、诱导等离子体、对流和/或辐射加热、自热反应或上述方法的结合。
通过火焰或热等离子体、微波等离子体、光电弧等离子体、诱导等离子体、对流和/或辐射加热、自热反应或上述方法的结合引起反应区中组分加热的适当程序和工艺条件对本领域熟练技术人员是完全已知的。
在自热反应情况下,例如通过使用氢气和卤气(尤其是氯气)的混合物产生火焰。此外,还可一方面用烃,例如甲烷、乙烷、丙烷、丁烷、乙烯或乙炔或上述气体的混合物并另一方面用氧化剂如氧气或含氧气体混合物获得火焰,当火焰反应区中优选还原条件时氧化剂还可以不足量使用。
为获得等离子体,通常使用所谓的等离子体喷枪。它例如由作为阳极的壳和其中在中心排列的水冷却的铜阴极组成,高能量密度的电光弧在阴极和壳之间燃烧。将供入的等离子体气体,例如氩气或氢气/氩气混合物离子化成等离子体并在15000-20000K的温度下以高速(约300-700m/s)离开枪筒。将原料直接引入该等离子束中、在那里蒸发并随后在预先冷却之后在反应性气氛中在合适温度下转化成所需产物。
获得等离子体所用的气体或气体混合物通常为稀有气体如氦气或氩气或稀有气体混合物如氦气和氩气混合物或氢气。
稀有气体如氦气或氩气或稀有气体混合物如氦气和氩气混合物还可以用作反应区中的惰性组分。在该特定情况下,还可以将氮气合适的话以与上述稀有气体的混合物用作反应区中的惰性组分,但在这里必须想到在较高温度下并取决于原料的性质可能形成氮化物。
在等离子体中引入的一般功率为几kW至几百kW。原则上还可以将较高功率的等离子体源用于合成。然而,产生稳定等离子体火焰的程序是本领域熟练技术人员所熟悉的,尤其是引入功率、气压、等离子体气体和保护气体的气流量。此外,通常使用惰性保护气体,其将气体层置于用于产生等离子体的反应器壁和反应区之间,后者基本对应于其中反应器中存在等离子体的区域。
在本发明反应过程中,一旦成核完全,就开始形成纳米颗粒状初级粒子,可通过聚沉和聚结程序进行粒子的进一步生长。粒子形成和生长通常在整个反应区内进行并且还可以在离开反应区后进一步继续直到快速冷却。当在该反应过程中形成一种以上固体产物时,所形成的不同初级粒子还可以相互结合形成例如呈共结晶或无定形混合物形式的纳米颗粒状产物混合物。当在该反应过程中在不同时间形成大量不同固体时,还可以形成包封产物,其中最初所形成的产物初级粒子被一种或多种其他产物层包围。
本发明的又一实施方案包括将原料分段添加到反应区中。这允许合适的话以壳均匀包覆核,如果尤其确保在第一阶段形成的粒子与第二阶段添加的原料极快速(在几ms内)均匀混合。通过合适的工艺控制,用厚度为几纳米的第二阶段产物层均匀包覆第一阶段的粒子由此是可能的,即使该排列在热力学上是不利的(例如在氧化锌粒子上的二氧化硅层)。
除原料和任何其他组分的组成及反应条件外,这些粒子形成方法的控制还可以通过步骤b)中描述的反应产物的冷却类型和时机控制。
总之,反应区内的温度必需高于所用原料和存在的任何其他组分的沸点。自热反应的反应区中的反应优选在600-1800℃,优选800-1500℃的温度下进行,并且等离子体方法反应区中的反应优选在600-10000℃,优选800-6000℃的温度下进行。
通常,原料和任何其他组分在反应区中的停留时间为0.002-2s,优选0.005-0.2s。
在本发明方法中,制备本发明纳米颗粒状固体的悬浮液的原料与任何其他组分的热反应可在任何压力,优选0.05-5巴,尤其是大气压下进行。
步骤b)
根据本发明,在原料和任何其他组分在步骤a)中转化后,将所得反应产物在步骤b)中快速冷却。在本发明正文中,快速冷却理解为以至少104K/s,优选至少105K/s,更优选至少106K/s的冷却速率来降低温度。
该快速冷却例如可以通过直接冷却、间接冷却、膨胀冷却或直接与间接冷却相结合进行。在直接冷却(骤冷)的情况下,将冷却剂与热反应产物直接接触来使其冷却。直接冷却例如可通过供入作为冷却剂的骤冷油、水、蒸汽、液氮或冷气以及合适的话冷再循环气体进行。为供入冷却剂,例如可使用能产生非常高且均匀的骤冷速率并为本领域熟练技术人员本身所熟悉的环隙燃烧器。
在间接冷却情况下,在反应产物不与冷却剂直接接触下将热能从反应产物中除去。间接冷却的优势是通常能有效利用转移到冷却剂上的热能。所以反应产物可与合适热交换器的交换表面接触。加热的冷却剂例如可以用来加热本发明方法中或不同吸热方法中的原料。此外,从反应产物中除去的热量例如还可以用来运行蒸汽发生器。
优选以在步骤b)中将所得反应产物冷却到1800-20℃的方式进行本发明方法。根据该方法和产物,可能必要的是冷却到低于650℃或甚至低于250℃的温度来防止粒子的进一步生长及其聚集或烧结。
在本发明优选实施方案中,冷却在两步中进行,在这种情况下将直接冷却(初步骤冷)和间接冷却结合使用也是可能的。在这种情况下,直接冷却(初步骤冷)可优选将步骤a)中所得反应产物冷却至低于1000℃的温度。两步冷却尤其可用于热不稳定产物来防止其分解。在这种情况下,应在第一步将该产物以极快速冷却(即以至少105K/s,优选至少106K/s的极高冷却速率)冷却到低于分解温度的温度。在第一步中,优选快速冷却到低于产物特定熔化或分解温度三分之一的温度(K)来尽可能抑制分解或烧结过程。然后,冷却可以较低冷却速率继续。第一步例如还可以包括通过在气流中添加液氮或白油来直接冷却,第二步包括通过热交换器来间接冷却。
通过本发明方法制备的纳米颗粒状固体的悬浮液中固体粒子的尺寸通常为1-500nm,优选2-100nm。
在本发明方法又一实施方案中,可将所形成粒子在骤冷过程中或在骤冷之后立即在气相中进一步加工,例如通过有机涂层涂布和/或通过有机化合物对表面改性。在这种情况下优选同时添加骤冷气和改性剂。适合作为改性剂的有机化合物原则上是本领域熟练技术人员已知的。优选使用那些可不分解地转化成气相并可与所形成粒子表面形成共价或粘合键的化合物。例如对于金属氧化物粒子的有机涂布或有机改性可以使用不同的有机硅烷如二甲基二甲氧基硅烷、甲基三甲氧基硅烷、甲基三乙氧基硅烷、甲基环己基二甲氧基硅烷、异辛基三甲氧基硅烷、丙基三甲氧基硅烷、异丁基三甲氧基硅烷、苯基三甲氧基硅烷或辛基三乙氧基硅烷。当所述粒子包含SiO2或以SiO2涂布粒子存在时,粒子表面的SiOH基团可尽可能地与硅烷直接缔结形成共价或粘合键。期望粒子表面存在的硅烷作为间隔基来降低粒子之间相互作用、在湿法沉淀器中促进向有机基质中的传质并能够在随后任何其他官能化中(合适的话在浓缩之后)用作偶联点。
优选以供入骤冷气或在供入骤冷气后的可控热去除允许将改性剂可控缩合到粒子上的方式进行改性操作。此外,在下游步骤中,可添加其他含水或有机改性剂来促进缩合。特别优选使用还在步骤c)中所用液体中存在的改性剂。
步骤c)
在本发明方法中,将步骤b)中所得冷却反应产物引入液体中形成悬浮液,其中存在的固体以纳米颗粒状初级粒子或其极小聚集体形式存在。因此,通过直接引入液相中来防止仍以分离形式或极小聚集体存在的纳米颗粒状初级粒子的进一步附聚。
根据本发明,该液体可包括含水或非水、有机或无机液体或这些液体中至少两种的混合物。此外,还可以使用离子液体。优选液体为白油、四氢呋喃、二甘醇二甲醚、溶剂石脑油、水或1,4-丁二醇。其他成分可溶于上述液体中,例如为可尤其用作改性剂并可提高悬浮液稳定性的盐、表面活性剂或聚合物。优选使用含水或有机液体,特别是水。
为进行本发明方法步骤c),可以使用本领域熟练技术人员已知的常规装置,例如湿法静电沉淀器或文丘里洗涤器。合适的话,所形成纳米颗粒状固体可例如通过分级沉淀法在沉淀过程中分级。该沉淀法可尽可能地通过促进冷凝来加强并且所形成悬浮液可通过改性剂进一步稳定。用于表面改性的合适物质为阴离子、阳离子、两性或非离子表面活性剂,例如购于BASF Aktiengesellschaft的或品牌。
在本发明优选实施方案中,将包含表面活性剂的液体连续计量加入湿法静电沉淀器的上游部分。连续液体膜因湿法静电沉淀器通常垂直排列而在其管式沉淀容器壁上形成。在湿法静电沉淀器下游部分收集连续循环液体并通过泵输送。优选将承载纳米颗粒状固体的气流以与液体呈逆流的方式流过该湿法静电沉淀器。在管式沉淀容器中存在作为喷射电极的中心线。在作为对电极的容器壁和喷射电极之间施加约50-70kV的电压。使承载纳米颗粒状固体的气流从上部流入该沉淀容器,气生粒子通过喷射电极充电并由此导致粒子在对电极(即湿法静电沉淀器壁)上的沉淀。所述粒子因液体膜沿该壁流动而在膜中直接沉淀。对粒子充电同时使不期望的粒子附聚得以防止。表面活性剂导致形成稳定的悬浮液。沉淀程度通常大于95%。
在本发明又一优选实施方案中,将文丘里洗涤器用于沉淀。因文丘里喉管区域中高的湍流度,甚至存在纳米颗粒状固体的极有效沉淀。在循环沉淀介质(例如水、白油、四氢呋喃)中添加表面活性剂允许沉淀粒子的附聚得以防止。优选在文丘里洗涤器喉管上建立20-1000毫巴,更优选150-300毫巴的压差。该方法允许粒径小于50nm的纳米粒子以大于90%的沉淀程度沉淀。
对于后处理,可将步骤b)中所得反应产物在引入液体之前进行至少一次分离和/或提纯步骤。将所形成的纳米颗粒状固体与反应产物的其他成分分离。
因此本发明方法适合于连续或间歇制备纳米颗粒状固体的悬浮液。该方法的重要特征为在高温级、通常在反应条件下的短且一致的停留时间和反应产物的快速冷却(“骤冷”)下以随后的粒子转化成液相而进行快速能量供应,这使所形成纳米颗粒状初级粒子的附聚或太大范围的转化得以防止。可通过本发明方法获得的产物可容易地进一步加工并允许简单地得到基于纳米颗粒状固体的新颖材料性能。
本发明通过下列实施例详细阐明。
实施例1-3:制备纳米颗粒状氧化锌悬浮液
使单质锌与氮气载气流(1m3(STP)/h)以10-40g/h的质量流速用刷式进料器供入管式炉中并在约1000℃下在那里蒸发,然后将其以气态引入燃烧器的反应区中并在950-1200℃的温度下与大气氧(4m3(STP)/h)在那里反应得到氧化锌。为维持并调节反应温度,额外将氢气(1m3(STP)/h)和空气(6m3(STP)/h)计量加入反应区中。在反应区停留20-50ms后,通过带有作为骤冷介质的空气(100-150m3(STP)/h)的环隙将反应产物冷却到约150℃,冷却速率为至少105K/s。添加蒸发的六甲基二硅醚来进行表面改性。
随后,将气生氧化锌粒子通过湿法静电沉淀器沉淀,其中作为沉淀介质的1,3-丁二醇与2重量%六甲基二硅醚(HMDS,实施例1)或2重量%AO5(实施例2)或溶剂石脑油与2重量%HMDS(实施例3)已通过泵循环。通过在湿法静电沉淀器中心排列的喷射电极将电荷施加到进入湿法静电沉淀器的氧化锌粒子上。施加电压为60kV。图1-3显示所得悬浮液的粒度分布。
这些结果表明制备的样品具有低分散硬度并且粒度分布显著取决于配方。
实施例4:在白油中制备纳米颗粒状氢化铝悬浮液
使用等离子体***(购于Sulzer Metco)来提供45kW电功率的光电弧等离子体并且因引入的热功率而得到T~10000K的温度。所用等离子体气体为体积流 的氩气和 的氢气。此外,将平均尺寸d50=9μm的铝粒子作为原料借助 的氩载气流输入等离子体反应区。在反应器入口上游,将氢气作为反应气体以 计量加入以作为反应物与铝反应得到氢化铝。在几μs后,通过添加氩气(最大 在反应区中经环隙进行骤冷。骤冷后的温度为约350K;骤冷速率为106K/s。
在喉管直径为14mm的文丘里洗涤器中,将粒子在白油 中沉淀并且又在旋风分离器中沉淀及在容器中收集。将废气通过喷雾洗涤器。该洗涤器中的工艺压力为约1.5巴(绝对)。在该洗涤器下游,将主要由氩气和氢气组成的无固体工艺气体通过使其重复用作骤冷介质而再循环。
所得产物粒度分布显示约30-50nm的平均粒度。图4显示由产物分离出的固体的透射电子显微镜(TEM)图像。
实施例5:在白油中制备纳米颗粒状六硼化镧悬浮液
将20g/h40重量%无定形硼和60重量% La2O3的高分散度混合物(B:La摩尔比=10:1)在高于5000K的温度下用氩载气流(180l/h)计量加入诱导等离子体反应区。此外,将3.6m3(STP)/h由75体积%Ar、10体积%氢气和15体积%He组成的气体混合物流添加到该诱导等离子体中。用30kW的功率激发该等离子体。在快速骤冷后,将承载粒子的气流通入其中作为沉淀介质的白油循环的文丘里洗涤器。由形成的LaB6组成的纳米颗粒状产物因快速骤冷和LaB6粒子在白油中的立即沉淀而基本上不含有附聚体。所得初级粒子的尺寸为25-50nm。通过动态光散射在该悬浮液中测定的粒度分布显示D50值为50nm和D90值为85nm。
实施例6:在白油中制备纳米颗粒状二硫化钼悬浮液
在30kW电功率的热壁反应器中提供800℃的温度。用于加热管的吹扫气体为 的氮气和 的氢气。将吹扫气体预热到175℃并使其通过包含加热到175℃的氯化钼的容器。这使氯化钼挥发直到获得饱和吹扫气体。刚进入该热壁反应器就将混合物与30l(STP)/h硫化氢混合。在该反应区中,使氯化钼与硫化氢反应得到二硫化钼。在约150ms的停留时间后,将氮气作为骤冷剂以10m3(STP)/h的体积流量通入热气中。骤冷剂下游温度为约350K;工艺压力为980绝对毫巴。在下游文丘里洗涤器中,将粒度为20-50nm的粒子在白油中沉淀 又在旋风分离器中沉淀并在容器中收集。将废气送去后燃烧。图5显示由产物分离出的固体的透射电子显微镜(TEM)图像。
Claims (14)
1.一种制备纳米颗粒状固体的悬浮液的方法,其包括:
(a)将至少一种原料和可能的话其他组分输送通过至少一个反应区而使其进行热反应,其中形成纳米颗粒状初级粒子,
(b)将步骤(a)中所得反应产物快速冷却,以及
(c)将步骤(b)中所得冷却反应产物引入液体中而形成悬浮液,其中存在的固体以纳米颗粒状初级粒子或极小聚集体的形式存在。
2.根据权利要求1的方法,其中所述原料包含元素氢化合物或选自由硼、锌、镧、锡、铈、钛、硅、钼、钨、铂、铑、钌和铝组成的组的单质金属。
3.根据权利要求1或2的方法,其中所用原料为铝且所用其他组分为氢气,它们在反应区中转化成氢化铝。
4.根据权利要求1或2的方法,其中所用原料为氧化镧和硼或硼化合物,它们在反应区中转化成六硼化镧。
5.根据权利要求1或2的方法,其中所用原料为锂和铝且所用其他组分为氢气,它们在反应区中转化成氢化铝锂。
6.根据权利要求1-5中任一项的方法,其中所述纳米颗粒状固体的粒度为1-500nm。
7.根据权利要求1-6中任一项的方法,其中原料和任何其他组分在反应区中的停留时间为0.002-2s。
8.根据权利要求1-7中任一项的方法,其中反应气体的热转化在0.05-5巴的压力下进行。
9.根据权利要求1-8中任一项的方法,其中步骤b)中的快速冷却以至少104K/s的冷却速率进行。
10.根据权利要求1-9中任一项的方法,其中步骤b)中的快速冷却进行到低于产物熔化或分解温度三分之一的温度,以K表示。
11.根据权利要求1-10中任一项的方法,其中步骤c)中所用液体为白油、四氢呋喃、二甘醇二甲醚、溶剂石脑油、水或1,4-丁二醇。
12.根据权利要求1-11中任一项的方法,其中在步骤c)中使用湿法静电沉淀器或文丘里洗涤器。
13.根据权利要求1的方法,其中步骤b)包括添加改性剂。
14.根据权利要求13的方法,其中同时添加骤冷气和改性剂。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP06113735.2 | 2006-05-09 | ||
EP06113735 | 2006-05-09 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN101466639A true CN101466639A (zh) | 2009-06-24 |
Family
ID=38668120
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNA2007800168477A Pending CN101466639A (zh) | 2006-05-09 | 2007-05-08 | 生产纳米颗粒状固体的悬浮液的方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20090093553A1 (zh) |
EP (1) | EP2041030A2 (zh) |
JP (1) | JP2009536093A (zh) |
KR (1) | KR20090012347A (zh) |
CN (1) | CN101466639A (zh) |
CA (1) | CA2650123A1 (zh) |
WO (1) | WO2007128821A2 (zh) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE602007005399D1 (de) * | 2006-12-01 | 2010-04-29 | Umicore Nv | Verfahren zur herstellung von nanoskaligen pulvern |
KR20110089131A (ko) * | 2008-10-27 | 2011-08-04 | 바스프 에스이 | 나노미립자 금속 붕소화물의 현탁액의 제조 방법 |
JP5566723B2 (ja) * | 2010-03-01 | 2014-08-06 | 古河電気工業株式会社 | 微粒子混合物、活物質凝集体、正極活物質材料、正極、2次電池及びこれらの製造方法 |
FR2960303B1 (fr) * | 2010-05-18 | 2013-04-05 | Onectra | Appareil de detection de neutrons et procede de depot d'une couche solide de bore pour un tel appareil |
US8507090B2 (en) * | 2011-04-27 | 2013-08-13 | Climax Engineered Materials, Llc | Spherical molybdenum disulfide powders, molybdenum disulfide coatings, and methods for producing same |
US10477665B2 (en) | 2012-04-13 | 2019-11-12 | Amastan Technologies Inc. | Microwave plasma torch generating laminar flow for materials processing |
US9206085B2 (en) * | 2012-11-13 | 2015-12-08 | Amastan Technologies Llc | Method for densification and spheroidization of solid and solution precursor droplets of materials using microwave generated plasma processing |
US9023259B2 (en) * | 2012-11-13 | 2015-05-05 | Amastan Technologies Llc | Method for the densification and spheroidization of solid and solution precursor droplets of materials using microwave generated plasma processing |
JP6016729B2 (ja) * | 2013-08-02 | 2016-10-26 | 東邦チタニウム株式会社 | 金属粉末の製造方法及び製造装置 |
US20150096887A1 (en) | 2013-10-04 | 2015-04-09 | Toyota Motor Engineering & Manufacturing North America, Inc. | Electrodes containing iridium nanoparticles for the electrolytic production of oxygen from water |
DE102015103720B4 (de) | 2014-03-19 | 2018-03-01 | Toyota Motor Engineering & Manufacturing North America Inc. | Mittels eines neuen Reagens synthetisierte Metallnanopartikel und Anwendung auf elektrochemische Vorrichtungen |
KR101455040B1 (ko) * | 2014-07-29 | 2014-10-27 | (주)일신오토클레이브 | 초고압 균질기를 이용한 연속식 금속산화물 나노입자의 제조 장치 및 이를 이용한 제조 방법 |
US10023595B2 (en) | 2015-01-09 | 2018-07-17 | Toyota Motor Engineering & Manufacturing North America, Inc. | Ligated anionic-element reagent complexes as novel reagents formed with metal, metalloid, and non-metal elements |
US10987735B2 (en) | 2015-12-16 | 2021-04-27 | 6K Inc. | Spheroidal titanium metallic powders with custom microstructures |
PL3389862T3 (pl) | 2015-12-16 | 2024-03-04 | 6K Inc. | Sferoidalne metale podlegające odwodornieniu oraz cząstki stopów metali |
EP3810358A1 (en) | 2018-06-19 | 2021-04-28 | 6K Inc. | Process for producing spheroidized powder from feedstock materials |
CA3134579A1 (en) | 2019-04-30 | 2020-11-05 | Gregory Wrobel | Lithium lanthanum zirconium oxide (llzo) powder |
SG11202111576QA (en) | 2019-04-30 | 2021-11-29 | 6K Inc | Mechanically alloyed powder feedstock |
CN114641462A (zh) | 2019-11-18 | 2022-06-17 | 6K有限公司 | 用于球形粉末的独特原料及制造方法 |
US11590568B2 (en) | 2019-12-19 | 2023-02-28 | 6K Inc. | Process for producing spheroidized powder from feedstock materials |
CA3180426A1 (en) | 2020-06-25 | 2021-12-30 | Richard K. Holman | Microcomposite alloy structure |
US11963287B2 (en) | 2020-09-24 | 2024-04-16 | 6K Inc. | Systems, devices, and methods for starting plasma |
KR20230095080A (ko) | 2020-10-30 | 2023-06-28 | 6케이 인크. | 구상화 금속 분말을 합성하는 시스템 및 방법 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB963390A (en) * | 1959-08-19 | 1964-07-08 | Laporte Titanium Ltd | Improvements in and relating to the manufacture of titanium dioxide |
EP0946414B1 (en) * | 1996-11-04 | 2005-06-29 | Materials Modification, Inc. | Microwave plasma chemical synthesis of ultrafine powders |
JP2002019268A (ja) * | 2000-07-03 | 2002-01-23 | Nippon Aerosil Co Ltd | インクジェット記録媒体のインク吸収層形成用超微粒セラミック粉末凝集体分散水 |
JP3991098B2 (ja) * | 2000-10-23 | 2007-10-17 | 独立行政法人産業技術総合研究所 | 火炎で合成した窒化アルミニウム製フィラー粉体 |
US20020155059A1 (en) * | 2001-04-24 | 2002-10-24 | Tekna Plasma Systems Inc. | Plasma synthesis of titanium dioxide nanopowder and powder doping and surface modification process |
US7279137B2 (en) * | 2001-08-30 | 2007-10-09 | Tda Research, Inc. | Burners and combustion apparatus for carbon nanomaterial production |
US20040050207A1 (en) * | 2002-07-17 | 2004-03-18 | Wooldridge Margaret S. | Gas phase synthesis of nanoparticles in a multi-element diffusion flame burner |
DE10243307B4 (de) * | 2002-09-13 | 2006-06-08 | Deutsches Zentrum für Luft- und Raumfahrt e.V. | Vorrichtung und Verfahren zur kontrollierten Erzeugung von Nano-Rußpartikeln |
US20040065171A1 (en) * | 2002-10-02 | 2004-04-08 | Hearley Andrew K. | Soild-state hydrogen storage systems |
US7217407B2 (en) * | 2003-09-11 | 2007-05-15 | E. I. Du Pont De Nemours And Company | Plasma synthesis of metal oxide nanoparticles |
-
2007
- 2007-05-08 WO PCT/EP2007/054457 patent/WO2007128821A2/de active Application Filing
- 2007-05-08 JP JP2009508376A patent/JP2009536093A/ja not_active Withdrawn
- 2007-05-08 US US12/299,336 patent/US20090093553A1/en not_active Abandoned
- 2007-05-08 CN CNA2007800168477A patent/CN101466639A/zh active Pending
- 2007-05-08 KR KR1020087029378A patent/KR20090012347A/ko not_active Application Discontinuation
- 2007-05-08 EP EP07728909A patent/EP2041030A2/de not_active Withdrawn
- 2007-05-08 CA CA002650123A patent/CA2650123A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
EP2041030A2 (de) | 2009-04-01 |
WO2007128821A3 (de) | 2009-02-19 |
WO2007128821A2 (de) | 2007-11-15 |
CA2650123A1 (en) | 2007-11-15 |
US20090093553A1 (en) | 2009-04-09 |
WO2007128821A9 (de) | 2009-05-07 |
KR20090012347A (ko) | 2009-02-03 |
JP2009536093A (ja) | 2009-10-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN101466639A (zh) | 生产纳米颗粒状固体的悬浮液的方法 | |
Ojha et al. | Boron for liquid fuel Engines-A review on synthesis, dispersion stability in liquid fuel, and combustion aspects | |
EP1727767B1 (en) | Method for producing carbon nanotubes | |
CN100369803C (zh) | 一种制备气相法纳米氧化物的方法和装置 | |
CN104995134B (zh) | 生产碳纳米结构的方法及装置 | |
JP2012255163A (ja) | ナノ材料を含むタングステンおよび関連するナノテクノロジー | |
JPH0625701A (ja) | 微粒子金属粉末 | |
CN103060770A (zh) | 一种铁包铝型复合粉体的制备方法及其产品 | |
Choi et al. | Synthesis of cobalt boride nanoparticles using RF thermal plasma | |
CN101784342A (zh) | 具有可调节涂层的SiO2涂覆的二氧化钛颗粒的制备 | |
Sung et al. | Preparation of ultrathin TiO2 coating on boron particles by thermal chemical vapor deposition and their oxidation-resistance performance | |
US6416862B1 (en) | Ultrafine particulate zinc oxide and production process thereof | |
US3469941A (en) | Ultrafine boron nitride and process of making same | |
TWI717497B (zh) | 矽粉末之製造方法、及矽粉末 | |
KR101174136B1 (ko) | 탄소 나노 튜브의 나노 구조 및 합성 제어 방법 | |
EP1215174A1 (en) | Highly white zinc oxide fine particles and method for preparation thereof | |
Li et al. | Preparation of nanocrystalline SnO2 thin film coated Al2O3 ultrafine particles by fluidized chemical vapor deposition | |
JP2010095433A (ja) | シリコンの製造方法 | |
CN205517602U (zh) | 一种熔融雾化*** | |
JPH06247712A (ja) | セラミックス微粒子の製造方法及びその装置 | |
JPH0725614A (ja) | 酸化亜鉛超微粒子及びその製造方法 | |
RU2359906C2 (ru) | Способ получения нанокристаллических порошков кремния | |
Okuyama et al. | Preparation of micro controlled particles using aerosol process technology | |
AU2010237618A1 (en) | A process and apparatus for depositing nanostructured material onto a substrate material | |
Okada et al. | Formation of non-agglomerated titania nanoparticles in a flame reactor |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
WD01 | Invention patent application deemed withdrawn after publication |
Open date: 20090624 |