CN101030528A - 基板处理装置以及基板操控方法 - Google Patents
基板处理装置以及基板操控方法 Download PDFInfo
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- CN101030528A CN101030528A CN200710085041.5A CN200710085041A CN101030528A CN 101030528 A CN101030528 A CN 101030528A CN 200710085041 A CN200710085041 A CN 200710085041A CN 101030528 A CN101030528 A CN 101030528A
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- 239000000758 substrate Substances 0.000 title claims abstract description 305
- 238000000034 method Methods 0.000 title claims abstract description 27
- 230000007246 mechanism Effects 0.000 claims abstract description 56
- 230000007723 transport mechanism Effects 0.000 claims description 14
- 230000005764 inhibitory process Effects 0.000 claims description 4
- 239000012530 fluid Substances 0.000 description 40
- 208000028659 discharge Diseases 0.000 description 21
- 230000001012 protector Effects 0.000 description 16
- 235000014347 soups Nutrition 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- 230000006698 induction Effects 0.000 description 13
- 239000011347 resin Substances 0.000 description 12
- 229920005989 resin Polymers 0.000 description 12
- 239000000463 material Substances 0.000 description 9
- 239000007789 gas Substances 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000007769 metal material Substances 0.000 description 6
- 238000012423 maintenance Methods 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 5
- 238000011084 recovery Methods 0.000 description 4
- 239000004696 Poly ether ether ketone Substances 0.000 description 3
- 230000004308 accommodation Effects 0.000 description 3
- 239000003153 chemical reaction reagent Substances 0.000 description 3
- 230000006378 damage Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229920002530 polyetherether ketone Polymers 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229920006361 Polyflon Polymers 0.000 description 2
- 239000004411 aluminium Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 230000003321 amplification Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 229920000840 ethylene tetrafluoroethylene copolymer Polymers 0.000 description 2
- 230000005283 ground state Effects 0.000 description 2
- 238000003199 nucleic acid amplification method Methods 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 230000000717 retained effect Effects 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 101000873785 Homo sapiens mRNA-decapping enzyme 1A Proteins 0.000 description 1
- UUAGAQFQZIEFAH-UHFFFAOYSA-N chlorotrifluoroethylene Chemical compound FC(F)=C(F)Cl UUAGAQFQZIEFAH-UHFFFAOYSA-N 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000003028 elevating effect Effects 0.000 description 1
- ZZUFCTLCJUWOSV-UHFFFAOYSA-N furosemide Chemical compound C1=C(Cl)C(S(=O)(=O)N)=CC(C(O)=O)=C1NCC1=CC=CO1 ZZUFCTLCJUWOSV-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 102100035856 mRNA-decapping enzyme 1A Human genes 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229920002493 poly(chlorotrifluoroethylene) Polymers 0.000 description 1
- 239000005023 polychlorotrifluoroethylene (PCTFE) polymer Substances 0.000 description 1
- 238000007665 sagging Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/34—Accessories
- B24B37/345—Feeding, loading or unloading work specially adapted to lapping
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67766—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68728—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of separate clamping members, e.g. clamping fingers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/137—Associated with semiconductor wafer handling including means for charging or discharging wafer cassette
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/141—Associated with semiconductor wafer handling includes means for gripping wafer
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Mechanical Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Weting (AREA)
Abstract
Description
Claims (5)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006055135A JP2007234882A (ja) | 2006-03-01 | 2006-03-01 | 基板処理装置および基板取り扱い方法 |
JP2006055135 | 2006-03-01 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101030528A true CN101030528A (zh) | 2007-09-05 |
CN100570817C CN100570817C (zh) | 2009-12-16 |
Family
ID=38472007
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200710085041.5A Active CN100570817C (zh) | 2006-03-01 | 2007-02-28 | 基板处理装置以及基板操控方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7335090B2 (zh) |
JP (1) | JP2007234882A (zh) |
KR (1) | KR100889649B1 (zh) |
CN (1) | CN100570817C (zh) |
TW (1) | TWI329347B (zh) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102569128A (zh) * | 2010-12-09 | 2012-07-11 | 台湾积体电路制造股份有限公司 | 用于清洁薄晶圆的旋转夹盘 |
CN102683243A (zh) * | 2011-03-04 | 2012-09-19 | 三菱瓦斯化学株式会社 | 基板处理装置以及基板处理方法 |
CN102782832A (zh) * | 2010-04-16 | 2012-11-14 | 朗姆研究公司 | 接地的卡盘 |
CN102150251B (zh) * | 2008-09-08 | 2013-06-19 | 芝浦机械电子株式会社 | 基板处理装置及基板处理方法 |
CN103693438A (zh) * | 2013-12-18 | 2014-04-02 | 京东方科技集团股份有限公司 | 用于基板的支撑装置及其运送基板的方法 |
WO2018176918A1 (zh) * | 2017-03-31 | 2018-10-04 | 京东方科技集团股份有限公司 | 传送装置、传送方法以及真空蒸镀装置 |
CN110021535A (zh) * | 2018-01-10 | 2019-07-16 | 弘塑科技股份有限公司 | 基板处理装置及其旋转台 |
CN111524838A (zh) * | 2012-08-31 | 2020-08-11 | 斯克林集团公司 | 基板处理装置 |
CN112135980A (zh) * | 2018-05-23 | 2020-12-25 | 大冶美有限公司 | 烧结轴承 |
CN113543434A (zh) * | 2020-04-16 | 2021-10-22 | 杰宜斯科技有限公司 | 基板处理用通电装置 |
CN113543432A (zh) * | 2020-04-16 | 2021-10-22 | 杰宜斯科技有限公司 | 基板用通电装置 |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7694688B2 (en) * | 2007-01-05 | 2010-04-13 | Applied Materials, Inc. | Wet clean system design |
JP2008198836A (ja) * | 2007-02-14 | 2008-08-28 | Dainippon Screen Mfg Co Ltd | 基板処理装置および基板処理方法 |
JP5006122B2 (ja) * | 2007-06-29 | 2012-08-22 | 株式会社Sokudo | 基板処理装置 |
JP5128918B2 (ja) | 2007-11-30 | 2013-01-23 | 株式会社Sokudo | 基板処理装置 |
JP5001828B2 (ja) | 2007-12-28 | 2012-08-15 | 株式会社Sokudo | 基板処理装置 |
JP5179170B2 (ja) | 2007-12-28 | 2013-04-10 | 株式会社Sokudo | 基板処理装置 |
JP4766156B2 (ja) * | 2009-06-11 | 2011-09-07 | 日新イオン機器株式会社 | イオン注入装置 |
JP5893823B2 (ja) * | 2009-10-16 | 2016-03-23 | 東京エレクトロン株式会社 | 基板液処理装置及び基板液処理方法並びに基板液処理プログラムを記録したコンピュータ読み取り可能な記録媒体 |
DE102010004205B4 (de) * | 2010-01-08 | 2012-11-08 | Fecken-Kirfel Gmbh & Co. Kg | Vorrichtung und Verfahren zum Spalten von Schaumstoffkörpern |
JP2011171591A (ja) * | 2010-02-19 | 2011-09-01 | Disco Corp | ウエーハの搬出入装置 |
JP5654807B2 (ja) * | 2010-09-07 | 2015-01-14 | 東京エレクトロン株式会社 | 基板搬送方法及び記憶媒体 |
JP5642574B2 (ja) * | 2011-01-25 | 2014-12-17 | 東京エレクトロン株式会社 | 液処理装置および液処理方法 |
US8945341B2 (en) * | 2011-08-22 | 2015-02-03 | Lam Research Ag | Method and device for wet treatment of plate-like articles |
US9147593B2 (en) * | 2012-10-10 | 2015-09-29 | Lam Research Ag | Apparatus for liquid treatment of wafer shaped articles |
US9287147B2 (en) * | 2013-03-14 | 2016-03-15 | Applied Materials, Inc. | Substrate support with advanced edge control provisions |
JP6255650B2 (ja) * | 2013-05-13 | 2018-01-10 | 株式会社Screenホールディングス | 基板処理装置 |
JP6234736B2 (ja) * | 2013-08-30 | 2017-11-22 | 芝浦メカトロニクス株式会社 | スピン処理装置 |
US9779979B2 (en) * | 2014-02-24 | 2017-10-03 | Lam Research Ag | Apparatus for liquid treatment of wafer shaped articles |
US9624574B2 (en) * | 2014-05-12 | 2017-04-18 | Varian Semiconductor Equipment Associates, Inc. | Platen with multiple shaped grounding structures |
JP6462620B2 (ja) * | 2016-03-29 | 2019-01-30 | 東京エレクトロン株式会社 | 基板処理装置および基板処理方法 |
JP6691836B2 (ja) * | 2016-06-20 | 2020-05-13 | 株式会社Screenホールディングス | 基板処理装置 |
JP2018019016A (ja) * | 2016-07-29 | 2018-02-01 | 株式会社Screenホールディングス | 基板処理装置 |
JP7032217B2 (ja) * | 2018-04-05 | 2022-03-08 | 株式会社ディスコ | 研磨装置 |
KR102176464B1 (ko) * | 2018-12-13 | 2020-11-09 | 세메스 주식회사 | 기판 처리 장치 및 기판 처리 방법 |
KR102338417B1 (ko) * | 2019-07-08 | 2021-12-10 | 세메스 주식회사 | 기판 처리 장치 |
GB202012725D0 (en) * | 2020-08-14 | 2020-09-30 | Lam Res Ag | Apparatus for processing a wafer-shaped article |
KR102452625B1 (ko) * | 2021-08-18 | 2022-10-07 | 김은숙 | 하이브리드형 웨이퍼 고정용 척 |
Family Cites Families (20)
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DE69123626T2 (de) * | 1990-04-16 | 1997-04-17 | Fujitsu Ltd | Chipträger zum Herstellen einer Mikrowellen-Halbleiteranordnung hoher Leistung durch Anordnen eines Halbleiterchips darauf |
JP3077117B2 (ja) * | 1993-07-20 | 2000-08-14 | 東京応化工業株式会社 | 基板の移載及び搬送装置 |
JPH09148402A (ja) * | 1995-11-16 | 1997-06-06 | Kokusai Electric Co Ltd | ウェーハ搬送プレート |
US5679055A (en) * | 1996-05-31 | 1997-10-21 | Memc Electronic Materials, Inc. | Automated wafer lapping system |
US5788082A (en) * | 1996-07-12 | 1998-08-04 | Fluoroware, Inc. | Wafer carrier |
KR100476859B1 (ko) * | 1997-05-30 | 2005-07-21 | 삼성전자주식회사 | 반도체장치제조설비의파티클제거장치와이를적용한반도체장치제조설비및제거방법 |
JPH11207611A (ja) * | 1998-01-21 | 1999-08-03 | Shin Etsu Handotai Co Ltd | 両面研磨装置におけるワークの自動搬送装置 |
DE69908591T2 (de) * | 1998-02-14 | 2004-04-29 | Lam Research Corp., Fremont | Vorrichtung zum Laden von Halbleiterscheiben |
TW388978B (en) * | 1998-02-18 | 2000-05-01 | United Microelectronics Corp | Device for preventing electrostatic discharge from wafer delivering |
US6072157A (en) * | 1998-12-11 | 2000-06-06 | Euv Llc | Thermophoretic vacuum wand |
US6875282B2 (en) * | 2001-05-17 | 2005-04-05 | Ebara Corporation | Substrate transport container |
KR20030056521A (ko) * | 2001-12-28 | 2003-07-04 | 동부전자 주식회사 | 웨이퍼 잔류전하 제거 장치 |
JP3920720B2 (ja) * | 2002-03-29 | 2007-05-30 | 株式会社荏原製作所 | 基板受渡し方法、基板受渡し機構及び基板研磨装置 |
JP4214509B2 (ja) * | 2002-12-03 | 2009-01-28 | 株式会社ニコン | 吸着保持部材及び吸着保持装置 |
JP2004303836A (ja) * | 2003-03-28 | 2004-10-28 | Tokyo Electron Ltd | 基板処理装置 |
KR100957457B1 (ko) * | 2003-06-07 | 2010-05-14 | 주성엔지니어링(주) | 정전척 및 기판 사이의 잔여 전하 제거 장치와 그 제거방법 |
JP2005123485A (ja) * | 2003-10-17 | 2005-05-12 | Ebara Corp | 研磨装置 |
JP2005191511A (ja) | 2003-12-02 | 2005-07-14 | Dainippon Screen Mfg Co Ltd | 基板処理装置および基板処理方法 |
US20060081968A1 (en) * | 2004-10-15 | 2006-04-20 | Bai Shwang S | Semiconductor package |
JP2006216903A (ja) * | 2005-02-07 | 2006-08-17 | Hitachi High-Technologies Corp | プラズマ処理装置 |
-
2006
- 2006-03-01 JP JP2006055135A patent/JP2007234882A/ja active Pending
-
2007
- 2007-02-27 US US11/679,537 patent/US7335090B2/en active Active
- 2007-02-28 CN CN200710085041.5A patent/CN100570817C/zh active Active
- 2007-02-28 KR KR1020070020194A patent/KR100889649B1/ko active IP Right Grant
- 2007-03-01 TW TW096106963A patent/TWI329347B/zh active
Cited By (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102150251B (zh) * | 2008-09-08 | 2013-06-19 | 芝浦机械电子株式会社 | 基板处理装置及基板处理方法 |
CN102782832A (zh) * | 2010-04-16 | 2012-11-14 | 朗姆研究公司 | 接地的卡盘 |
CN102782832B (zh) * | 2010-04-16 | 2015-08-26 | 朗姆研究公司 | 接地的卡盘 |
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KR20070090103A (ko) | 2007-09-05 |
KR100889649B1 (ko) | 2009-03-19 |
US7335090B2 (en) | 2008-02-26 |
TWI329347B (en) | 2010-08-21 |
US20070207706A1 (en) | 2007-09-06 |
JP2007234882A (ja) | 2007-09-13 |
CN100570817C (zh) | 2009-12-16 |
TW200741954A (en) | 2007-11-01 |
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