CN100488855C - 输送车、制造装置、及输送*** - Google Patents
输送车、制造装置、及输送*** Download PDFInfo
- Publication number
- CN100488855C CN100488855C CNB031484883A CN03148488A CN100488855C CN 100488855 C CN100488855 C CN 100488855C CN B031484883 A CNB031484883 A CN B031484883A CN 03148488 A CN03148488 A CN 03148488A CN 100488855 C CN100488855 C CN 100488855C
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Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67724—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations by means of a cart or a vehicule
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D50/00—Combinations of methods or devices for separating particles from gases or vapours
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67736—Loading to or unloading from a conveyor
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S55/00—Gas separation
- Y10S55/18—Work bench
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S55/00—Gas separation
- Y10S55/29—Air curtains
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S55/00—Gas separation
- Y10S55/46—Spray booths
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Ventilation (AREA)
Abstract
Description
Claims (13)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP192660/2002 | 2002-07-01 | ||
JP2002192660A JP4029968B2 (ja) | 2002-07-01 | 2002-07-01 | 搬送車、製造装置及び搬送システム |
JP218027/2002 | 2002-07-26 | ||
JP2002218027A JP2004060955A (ja) | 2002-07-26 | 2002-07-26 | 無人搬送車および無人搬送システム |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNA2008100921379A Division CN101271836A (zh) | 2002-07-01 | 2003-06-27 | 输送车、制造装置、及输送*** |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1470445A CN1470445A (zh) | 2004-01-28 |
CN100488855C true CN100488855C (zh) | 2009-05-20 |
Family
ID=29782036
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB031484883A Expired - Fee Related CN100488855C (zh) | 2002-07-01 | 2003-06-27 | 输送车、制造装置、及输送*** |
Country Status (4)
Country | Link |
---|---|
US (1) | US7014672B2 (zh) |
KR (1) | KR100700928B1 (zh) |
CN (1) | CN100488855C (zh) |
TW (1) | TWI282139B (zh) |
Families Citing this family (36)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2005121027A2 (en) * | 2004-06-04 | 2005-12-22 | Durr Ecoclean, Inc. | An integrated machining module for processing workpieces and a method of assembling the same |
WO2005124853A1 (ja) * | 2004-06-21 | 2005-12-29 | Right Mfg,Co.,Ltd. | ロードポート |
US9010384B2 (en) * | 2004-06-21 | 2015-04-21 | Right Mfg. Co. Ltd. | Load port |
US20050284373A1 (en) * | 2004-06-25 | 2005-12-29 | Lg Electronics Inc. | Apparatus for manufacturing a luminescent device using a buffer cassette |
KR20060056709A (ko) * | 2004-11-22 | 2006-05-25 | 삼성전자주식회사 | 도어 입구에 에어 커튼을 가지는 반도체 제조 장비 |
US9457442B2 (en) | 2005-06-18 | 2016-10-04 | Futrfab, Inc. | Method and apparatus to support process tool modules in a cleanspace fabricator |
US10627809B2 (en) | 2005-06-18 | 2020-04-21 | Frederick A. Flitsch | Multilevel fabricators |
US9059227B2 (en) | 2005-06-18 | 2015-06-16 | Futrfab, Inc. | Methods and apparatus for vertically orienting substrate processing tools in a clean space |
US9339900B2 (en) * | 2005-08-18 | 2016-05-17 | Futrfab, Inc. | Apparatus to support a cleanspace fabricator |
US7513822B2 (en) | 2005-06-18 | 2009-04-07 | Flitsch Frederick A | Method and apparatus for a cleanspace fabricator |
US9159592B2 (en) | 2005-06-18 | 2015-10-13 | Futrfab, Inc. | Method and apparatus for an automated tool handling system for a multilevel cleanspace fabricator |
US11024527B2 (en) | 2005-06-18 | 2021-06-01 | Frederick A. Flitsch | Methods and apparatus for novel fabricators with Cleanspace |
US10651063B2 (en) | 2005-06-18 | 2020-05-12 | Frederick A. Flitsch | Methods of prototyping and manufacturing with cleanspace fabricators |
WO2007025199A2 (en) * | 2005-08-26 | 2007-03-01 | Flitsch Frederick A | Multi-level cleanspace fabricator elevator system |
US7896602B2 (en) | 2006-06-09 | 2011-03-01 | Lutz Rebstock | Workpiece stocker with circular configuration |
WO2008059457A1 (en) * | 2006-11-15 | 2008-05-22 | Dynamic Micro Systems | Removable compartments for workpiece stocker |
US20080112787A1 (en) | 2006-11-15 | 2008-05-15 | Dynamic Micro Systems | Removable compartments for workpiece stocker |
US20090013712A1 (en) * | 2007-07-11 | 2009-01-15 | Robert William Norris | Refrigerated trailer and method for same |
KR20090011216A (ko) * | 2007-07-25 | 2009-02-02 | 삼성전자주식회사 | 공기 필터링 장치 및 그를 구비한 반도체 제조설비의청정시스템 |
KR100918588B1 (ko) * | 2007-09-19 | 2009-09-28 | 세메스 주식회사 | 파티클 배출 유닛 및 이를 포함하는 기판 이송 장치 |
US9117870B2 (en) * | 2008-03-27 | 2015-08-25 | Lam Research Corporation | High throughput cleaner chamber |
JP5278698B2 (ja) * | 2009-09-04 | 2013-09-04 | 株式会社ダイフク | カセット搬送装置 |
US8562272B2 (en) * | 2010-02-16 | 2013-10-22 | Lam Research Corporation | Substrate load and unload mechanisms for high throughput |
US8893642B2 (en) | 2010-03-24 | 2014-11-25 | Lam Research Corporation | Airflow management for low particulate count in a process tool |
US8282698B2 (en) * | 2010-03-24 | 2012-10-09 | Lam Research Corporation | Reduction of particle contamination produced by moving mechanisms in a process tool |
US20120240848A1 (en) * | 2011-03-21 | 2012-09-27 | Doug Amundsen | Powder dispenser filtration system |
US9272315B2 (en) * | 2013-10-11 | 2016-03-01 | Taiwan Semiconductor Manufacturing Co., Ltd | Mechanisms for controlling gas flow in enclosure |
DE202014103672U1 (de) * | 2014-08-07 | 2015-11-10 | Reum Kunststoff- Und Metalltechnik Gmbh | Belüftungsvorrichtung |
FR3034410B1 (fr) * | 2015-04-02 | 2020-10-23 | Gebo Packaging Solutions France | Dispositif de convoyage par chariot autonome |
CN104906906A (zh) * | 2015-05-30 | 2015-09-16 | 王庆忠 | 一种高效除粉尘车间 |
CN106185138B (zh) * | 2015-07-20 | 2018-06-01 | 亚洲硅业(青海)有限公司 | 一种密闭式硅芯自动存取装置 |
KR102618491B1 (ko) | 2016-10-31 | 2023-12-28 | 삼성전자주식회사 | 기판 이송 장치 |
US11749537B2 (en) * | 2018-10-26 | 2023-09-05 | Applied Materials, Inc. | Side storage pods, equipment front end modules, and methods for operating equipment front end modules |
US20200207559A1 (en) * | 2018-12-28 | 2020-07-02 | Int Tech Co., Ltd. | Dust-free system and method of manufacturing panel |
TWI723329B (zh) * | 2019-01-19 | 2021-04-01 | 春田科技顧問股份有限公司 | 裝載埠及其氣簾裝置與吹淨方法 |
US20210242057A1 (en) * | 2020-01-30 | 2021-08-05 | Taiwan Semiconductor Manufacturing Co., Ltd. | Automated material handling systems |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4851018A (en) * | 1986-11-28 | 1989-07-25 | Commissariat A L'energie Atomique | Installation for the storage and transfer of objects in a very clean atmosphere |
US5425793A (en) * | 1992-02-13 | 1995-06-20 | Matsushita Electric Industrial Co., Ltd. | Coupling-type clean space apparatus |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4823680A (en) * | 1987-12-07 | 1989-04-25 | Union Carbide Corporation | Wide laminar fluid doors |
US5257957A (en) * | 1992-10-16 | 1993-11-02 | Diccianni Anthony M | Facility for providing a sealed work area to handle, manipulate and formulate materials |
US6207119B1 (en) * | 1994-04-25 | 2001-03-27 | Anthony Michael Diccianni | Sealed system for handling, manipulating and formulating materials in an isolated environment |
KR970007648B1 (ko) * | 1994-05-09 | 1997-05-15 | 삼성전자 주식회사 | 클린룸용 개방형 에어샤워장치 |
US5851143A (en) * | 1996-05-10 | 1998-12-22 | Thermal Industries | Disk drive test chamber |
JPH11238777A (ja) | 1998-02-23 | 1999-08-31 | Mitsubishi Electric Corp | カセット搬送装置及びこれを備えたカセット搬送システム |
US6626971B1 (en) * | 1998-09-15 | 2003-09-30 | Siemens Axiva Gmbh & Co. Kg | Method and device for protecting persons and/or products from air-borne particles |
US6272767B1 (en) * | 1999-10-21 | 2001-08-14 | Envirotronics, Inc. | Environmental test chamber |
JP3861534B2 (ja) | 1999-11-22 | 2006-12-20 | 株式会社明電舎 | クリーンルーム用無人搬送車 |
JP4483012B2 (ja) | 2000-04-05 | 2010-06-16 | 株式会社Ihi | 局所浄化方法 |
DE10164175B4 (de) * | 2001-12-27 | 2004-02-12 | Infineon Technologies Ag | Prozeßgerät mit zwei Raumeinheiten und einer die zwei Raumeinheiten verbindenden dritten Raumeinheit mit jeweils einer gegenüber der Umgebung verminderten Dichte kontaminierter Teilchen und Verfahren zum Betrieb des Prozeßgerätes |
US6835233B2 (en) * | 2003-02-20 | 2004-12-28 | Taiwan Semiconductor Manufacturing Co., Ltd | Method and apparatus for reducing particle contamination |
-
2003
- 2003-05-22 TW TW092113881A patent/TWI282139B/zh not_active IP Right Cessation
- 2003-06-17 US US10/462,732 patent/US7014672B2/en not_active Expired - Fee Related
- 2003-06-25 KR KR1020030041422A patent/KR100700928B1/ko not_active IP Right Cessation
- 2003-06-27 CN CNB031484883A patent/CN100488855C/zh not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4851018A (en) * | 1986-11-28 | 1989-07-25 | Commissariat A L'energie Atomique | Installation for the storage and transfer of objects in a very clean atmosphere |
US5425793A (en) * | 1992-02-13 | 1995-06-20 | Matsushita Electric Industrial Co., Ltd. | Coupling-type clean space apparatus |
Also Published As
Publication number | Publication date |
---|---|
TW200403791A (en) | 2004-03-01 |
KR20040004064A (ko) | 2004-01-13 |
CN1470445A (zh) | 2004-01-28 |
US7014672B2 (en) | 2006-03-21 |
KR100700928B1 (ko) | 2007-03-28 |
TWI282139B (en) | 2007-06-01 |
US20040000129A1 (en) | 2004-01-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: MITSUBISHI ELECTRIC CO., LTD.; APPLICANT Free format text: FORMER OWNER: ADVANCED DISPLAY CO., LTD.; APPLICANT Effective date: 20071228 |
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C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20071228 Address after: Tokyo Applicant after: Mitsubishi Co-applicant after: Murata Machinery Co., Ltd. Address before: Xiongben County, Japan Applicant before: Advanced display Limited by Share Ltd Co-applicant before: Murata Machinery Co., Ltd. |
|
CI01 | Publication of corrected invention patent application |
Correction item: Inventor Correct: Shieida Kiko False: Nakao Takashi Number: 4 Volume: 20 |
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CI02 | Correction of invention patent application |
Correction item: Inventor Correct: Shieida Kiko False: Nakao Takashi Number: 4 Page: The title page Volume: 20 |
|
COR | Change of bibliographic data |
Free format text: CORRECT: INVENTOR; FROM: JINGSHI SHIWEI TO: KEISHI NAKAO |
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ERR | Gazette correction |
Free format text: CORRECT: INVENTOR; FROM: JINGSHI SHIWEI TO: KEISHI NAKAO |
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C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20090109 Address after: Kyoto Japan Applicant after: Murata Machinery Co., Ltd. Address before: Tokyo Applicant before: Mitsubishi Co-applicant before: Murata Machinery Co., Ltd. |
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ASS | Succession or assignment of patent right |
Owner name: MURATA MACHINE CO., LTD. Free format text: FORMER OWNER: MITSUBISHI ELECTRIC CO., LTD. Effective date: 20090109 |
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C14 | Grant of patent or utility model | ||
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