CN100398413C - Container box for framed pellicle - Google Patents
Container box for framed pellicle Download PDFInfo
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- CN100398413C CN100398413C CNB2006100549512A CN200610054951A CN100398413C CN 100398413 C CN100398413 C CN 100398413C CN B2006100549512 A CNB2006100549512 A CN B2006100549512A CN 200610054951 A CN200610054951 A CN 200610054951A CN 100398413 C CN100398413 C CN 100398413C
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- China
- Prior art keywords
- pellicle
- vessel
- container box
- framed
- container
- Prior art date
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D85/00—Containers, packaging elements or packages, specially adapted for particular articles or materials
- B65D85/30—Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure
- B65D85/48—Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure for glass sheets
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D85/00—Containers, packaging elements or packages, specially adapted for particular articles or materials
- B65D85/30—Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure
- B65D85/38—Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure for delicate optical, measuring, calculating or control apparatus
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D85/00—Containers, packaging elements or packages, specially adapted for particular articles or materials
- B65D85/30—Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure
- B65D85/42—Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure for ampoules; for lamp bulbs; for electronic valves or tubes
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
Abstract
There is provided a pellicle container for use in photolithography, with which no dust particles are deposited onto the pellicle contained therein, and contamination of the pellicle can be prevented and good condition is ensured. The present invention provides a pellicle container consisting of a container base on which a pellicle is mounted, and a covering body that covers the pellicle and latches with the container base by engagement together with the container base along the peripheral edges, wherein the pellicle is supported by inserting a frame supporting pin in the opening of a sleeve provided on the outside surface of the pellicle frame. Preferably, the container base is made from a plastic resin and a metal component is joined to the container base; the metal component fixedly connected to the container base is mechanically connected to a positioning component that positions the frame supporting pin that supports the pellicle; and an elastic member is disposed on the point of contact between the frame supporting pin that supports the pellicle and the pellicle frame. It is even more preferable that the container boase and the Icovering body are made of a plastic resin, and these have antistatic performance such that their surface resistivity is no higher than 1x10<SUP>12 </SUP>ohms.
Description
Technical field
The present invention is about in order to accommodate, to take care of, to transport when making semiconductor device, printed circuit board (PCB) or Liquid Crystal Display (LCD) etc. by the container box for framed pellicle of the lithography that uses as dust exhaustor with pellicle.
Background technology
When semiconductor device such as LSI or Liquid Crystal Display (LCD) etc. are made, be to utilize semiconductor crystal wafer or liquid crystal are formed pattern with glass raw sheet irradiates light, yet, this moment, employed light shield or graticule (being designated hereinafter simply as light shield) were if adhering to dust, then this dust can intercept light or light is turned to, and the impaired problem of pattern of transfer printing is arranged.
Therefore, relevant operation is normally carried out in dust free room, yet, still be difficult to all keep at any time the peace and quiet of light shield.Therefore, adopt the method for using as dust exhaustor at light shield surface attaching pellicle.
At this moment, be not attached to pellicle because foreign matter can directly not be attached to the surface of light shield, when lithography, as long as make the pattern of light shield in focus, then the foreign matter on the pellicle can not influence transfer printing.
Yet, though having, pellicle prevents that foreign matter from invading the in-to-in effect from the outside that is attached at formed enclosure space of when shielding, when pellicle itself is adhering to foreign matter and this foreign matter and is positioned at the inside of enclosure space, can't prevent that then foreign matter is attached to the light shield surface.Therefore, not only require pellicle itself must have high detergency, for the keeping and transport employed container box for framed pellicle also strong request its have the performance that can keep detergency.
As described above, the strong request container box for framed pellicle should have in the keeping of pellicle and can keep the performance of the detergency of pellicle when transporting, and therefore, reduce dust that the key element in source takes place is very important as far as possible.
The key element that the source takes place dust comprises that the contact of contact, container box for framed pellicle and pellicle between the member of material, electric characteristics, cleanliness factor, formation container box for framed pellicle of the member that constitutes container box for framed pellicle and external force are to friction that container box for framed pellicle caused etc.
Therefore, constitute the material of container box for framed pellicle material, intensity, electric characteristics, and the various key elements such as fixing means of pellicle all must consider.
General quartz conductor container box for framed pellicle is by in order to the vessel of mounting pellicle, and in order to keep the mutual chimeric fixing lid of pellicle and edge part and vessel to be constituted, its material is resin, and lid has the transparency.
Pellicle is fixed in quartz conductor the method shown in following is arranged with the method for container box for framed pellicle.
One is with the method (with reference to patent documentation 1) of the upper surface of lid inwall compressing pellicle frame.
Method shown in the patent documentation 1 with the upper surface of lid inwall compressing pellicle frame, have can be simple member constitute the advantage positively keep pellicle frame, yet, because general container box for framed pellicle is made by resin, for from the ability to bear of the power of external container a little less than, when container box for framed pellicle integral body is distorted because of external force etc., powerful masterpiece is used for pellicle frame, and may become reason or appearance distortion that dust takes place.
This kind phenomenon is more obvious when 1 edge lengths is used pellicle above the large-scale liquid crystal of 400mm.
Other method aspect is for example set up flank at vessel and is constructed the method (with reference to patent documentation 2) that improves rigidity.
Setting up flank at vessel and construct the method that improves rigidity shown in the patent documentation 2, has the advantage that outer temperature degree in transit such as the carage that can reduce under the burning sun or air transport changes the thermal deformation that is caused, yet, in the use, the distortion that is caused when being difficult to the one-sided edge with operator's hand-held container suppresses in the degree that can not have influence on pellicle.
Other fixing means still has and utilizes that the pushing body is fixing coats the method (with reference to patent documentation 3) that the protective film of the adhesion material of pellicle comes the indirect securement pellicle frame in order to protection.
Utilization shown in the patent documentation 2 pushing body is fixing coats the method that the protective film of the adhesion material of pellicle comes the indirect securement pellicle frame in order to protection; can be under the state that does not contact the pellicle frame body clamp protective film; so have the advantage that pellicle frame is not had influence from the exterior power of container box for framed pellicle; yet; in order to peel off from the adhesion material easily; protective film can be coated with mold release usually, so vibration in transit may cause pellicle frame to break away from protective film.
The thing that uses heavy peel-away type in order to prevent said circumstances is during as the mold release of protective film; when peeling off protective film, sticker may cause the distortion of sticker; when pellicle being attached at shielding, then the situation that this deformation place can't be attached at shielding may occur, and the problem of air flow circuit occur.
The real fair 6-45965 communique of [patent documentation 1] Japan
[patent documentation 2] TOHKEMY 2000-173887 communique
[patent documentation 3] Japanese kokai publication hei 11-052553 communique
Summary of the invention
Because the problems referred to above, purpose of the present invention can make foreign matter can not be attached to the pellicle of taking in taking care of, transporting, operate and can prevent the stained of pellicle and keep the photolithograph container box for framed pellicle of quality providing.
To solve the present invention that above-mentioned problem is a purpose, be by in order to the vessel of mounting pellicle, and covered protection adhesive film assembly and edge part and the mutual chimeric fixing container box for framed pellicle that lid constituted of vessel, it is characterized by, keep pin to insert the hole of being located at the pellicle frame lateral surface framework and keep pellicle.Aforementioned vessel is that resin, aforementioned vessel engaging hard ware, the aforesaid frame that keeps pellicle is kept align member that pin positions and the aforementioned metal member that is assembled in vessel is to be good when mechanically linking and keeping the aforesaid frame of pellicle to keep the contact part of pin and pellicle frame that elastic body is being set, and the material of aforementioned vessel and aforementioned lid is a resin and to have sheet resistance value be per unit area 1 * 10
12Antistatic properties below the Ω is better.
According to the present invention, can avoid touching under the situation of contact part doing one's utmost, positively grip pellicle frame, and the possibility of dust takes place in reduction, and the vessel that improves in rigidity is provided with framework maintenance pin, can reduce the effect of external force to the influence of pellicle so have.In addition, be the example that resin and vessel are engaging hard ware according to vessel, can supply the shortcoming of easy deformation of the resin of advantage, as long as and the shape that necessary part is had at external force keeps function with light weight.
Secondly, according to the framework maintenance that keeps pellicle being sold the example that member that positions and the hard ware that is assembled in vessel mechanically link, also can make the position of pellicle remain in certain position in taking care of, transporting, operate, dust takes place and distortion so can reduce.
In addition, foundation keeps the framework maintenance pin of pellicle and the contact part of pellicle frame that elastomeric example is being set, and in taking care of, carry, operating, can reduce the influence of vibration to pellicle.
According to the material of vessel and lid is resin and to have sheet resistance value be per unit area 1 * 10
12The example of the antistatic properties that Ω is following has the foreign matter that can prevent electrostatic problem that the incidental especially packaging bag friction of large-scale liquid crystal container box for framed pellicle is caused etc. and adheres to and prevent effect.
Description of drawings
Fig. 1 is the cross sectional illustration figure of an example of container box for framed pellicle of the present invention.
Fig. 2 is the part enlarged drawing of framework maintaining part of an example of container box for framed pellicle of the present invention.
Fig. 3 is the instruction diagram on surface of vessel of an example of container box for framed pellicle of the present invention, (a) is surface description figure, (b) is the cross sectional illustration figure of vessel.
Fig. 4 is the instruction diagram at the back side of vessel of an example of container box for framed pellicle of the present invention, (a) is the cross sectional illustration figure of vessel, (b) is back side instruction diagram.
Fig. 5 is the instruction diagram of traditional container box for framed pellicle.
The primary clustering nomenclature
1 vessel
2 lids
3 frameworks keep pin
4 pin stationary members
5 reinforcement of weld members
6 pellicle frames
7 pellicle diaphragms
8 elastic bodys
9 binding screws
10 anchor clamps holes
The specific embodiment
Below, describe at example of the present invention with reference to accompanying drawing, yet the present invention is not subject to this.
Fig. 1 is the cross sectional illustration figure of an example of container box for framed pellicle of the present invention, and Fig. 2 is its a part of enlarged drawing.
Fig. 3 is the vessel surface description figure of an example of container box for framed pellicle of the present invention, and Fig. 4 is a vessel back side instruction diagram.
Among Fig. 1, container box for framed pellicle of the present invention is to keep pin 3, pin stationary member 4 and reinforcement of weld member 5 to be constituted by vessel 1, lid 2, framework.
Identical with traditional container box for framed pellicle, the central authorities of vessel 1 are setting the higher mounting table in order to the mounting pellicle, cover with edge part with vessel 1 mutual chimeric fixing lid 2 the formation enclosure space.
The material aspect of vessel and lid, consider the lightweight of integral container, with resin is good, yet, during large pellicle that liquid crystal is used, when especially the distortion of resin can make a big impact to goods, be purpose, and engage reinforcement of weld member 5 at the back side of vessel 1 with the reflex action that reduces vessel 1.
In order to prevent that pellicle is charged and become the reason that dust adheres to, vessel 1 and lid 2 employed resins should have antistatic properties.Antistatic properties is per unit area 1 * 10 with the sheet resistance value
12Ω is following to be good.
The material aspect of resin, there is no particular restriction, can use acryl resin, polyethylene terephthalate resin, propylene fat-butadiene styrene resin, polystyrene resin, polycarbonate resin, ethylene chloride resin, acrylic resin, poly-vinyl resin and propylene fat-ethene-styrene etc.
The problem of the short of generation dust of the mode of electrostatic prevention can be from selected to mode, the covering of conducting film and the refining of conductive material etc. of substrate polymer blending hydrophilic polymer.
In addition, metallic material can be aluminium, corrosion-resistant steel, carbon steel, copper, brass etc., considers proportion and spring rate, is good with aluminium.
Shown in the enlarged drawing of Fig. 2, pellicle frame 6 fixedly be to keep pin 3 to insert the anchor clamps hole 10 of being located at the framework lateral surface framework to implement.In order more mildly to grip pellicle frame, should keep the front end of pin 3 that elastic body 8 is set at framework.
Pin stationary member 4 is the members that keep the location of pin 3 in order to implementation framework, yet, because the reinforcement of weld member 5 that utilization links with the back side of screw 9 grades and vessel carries out the binding of mechanical system, even so have when twisting because of thermal deformation, also can keep framework and keep the positional precision of selling from the power of external container or vessel.
Elastomeric material aspect, as nitrile rubber, styrene rubber, silaatic, contain viton, chloroprene rubber, polyamine formic ether rubber, 4 polyfurolresins, polypropylene rubber and ethylene propylene rubber etc., with the viewpoint of durability, be good with silaatic and 4 ethylene fluoride rubber.With the static countermeasure, it is better to make associated materials have the electrostatic prevention function.
Utilize framework to keep the position of pin 3 fixed protection glued membrane frameworks 6 to need at least more than 3 places, as shown in Figure 3, be preferably more than near 4 places the bight that comprises pellicle frame 6.
Shown in the planar view at the back side of the vessel of Fig. 4,, reinforcement of weld member 5 is set at the back side of vessel in order to prevent the distortion of vessel 1.Reinforcement of weld member 5 should mechanically be linked to pin stationary member 4.Though the monomer of reinforcement of weld member 5 also can obtain effect, yet, as shown in the figure, be provided with in the mode that links in length and breadth, can obtain higher effect.
[embodiment]
Below, describe at embodiments of the invention, yet the present invention is not subject to this.Construction drawing 1～container box for framed pellicle shown in Figure 4.
On the formation of container box for framed pellicle, mainly be that ((thigh) TORAY system, trademark: TOYOLACPAREL TP10, sheet resistance value are per unit area 5 * 10 with the static electricity resistance ABS resin by utilizing vacuum forming
11Ω) carry out the resulting vessel 1 of moulding, and utilize vacuum forming equally ((thigh) TORAY system, trademark: TOYOLACPARELTP10, sheet resistance value be per unit area 5 * 10 with the static electricity resistance ABS resin
11Ω) carrying out the resulting container top 2 of moulding constitutes.The back side of vessel is being provided with the aluminum alloy system reinforcement of weld member 5 that section is 40 * 6mm, as shown in Figure 4, intersects in length and breadth and is linking 5 reinforcement of weld members 5.
In addition, the reinforcement of weld member 5 that is arranged at the pin stationary member 4 on vessel surface and is arranged at the vessel back side is to clip vessel carries out mechanical system with the screw of M4 binding.In addition, it is PPS that pin stationary member 4 and framework keep the material of pin 3, and as shown in Figure 3, near 4 places the bight of pellicle frame 6 are setting framework and keeping pin 3, and this framework keeps the front end of pin 3 that the elastic body 8 that contains viton system then is being set.
Externally be of a size of an end face silicon-coating sticker (SHIN-ETSU HANTOTAI's chemical frbre industry (thigh) system of the aluminum alloy system pellicle frame 6 of 782 * 474 * 6mm, trademark: KR120) as pellicle diaphragm sticker, and in other end silicon-coating sticker (SHIN-ETSU HANTOTAI's chemical frbre industry (thigh) system, trademark: KR120) as the shielding sticker, its heating is cured, again pellicle frame 6 is being attached and utilizing the resulting fluorine based polymer (trademark: CYTOP of spin-coating method, the box for framed pellicle of the pellicle diaphragm 7 of the about 4 μ m of thickness Asahi Glass (thigh) system) is in the container box for framed pellicle of finishing, come and go air transport between Tokyo-Fukuoka, the foreign matter that detects on the pellicle diaphragm before and after transporting increases number.
In the dust free room of grade 100, take out pellicle from container box for framed pellicle, and in dark place internal radiation 4 * 10
5The light of Lx, the foreign matter on investigation pellicle diaphragm 7 surfaces increases number, the result, the foreign matter on the pellicle diaphragm 7 does not increase, and in addition, the member that constitutes pellicle is not also observed distortion or impaired.In addition, utilize carried charge that the ION SYSTEM/MODEL775 of ION SYSTEM company (California, USA) system detects the pellicle diaphragm after transporting to be-0.1kV.
[comparative example]
Make the container box for framed pellicle with the formation of the upper surface of lid inwall 2 compressing pellicle frames 6 of conventional known shown in Figure 5.The material of vessel 1 and lid 2 is that sheet resistance value is a per unit area 10
18The acryl resin that Ω is above.
Externally be of a size of an end face silicon-coating sticker (SHIN-ETSU HANTOTAI's chemical frbre industry (thigh) system of the aluminum alloy system pellicle frame 6 of 782 * 474 * 6mm, trademark: KR120) as pellicle diaphragm sticker, and in other end silicon-coating sticker (SHIN-ETSU HANTOTAI's chemical frbre industry (thigh) system, trademark: KR120) as the shielding sticker, its heating is cured, again pellicle frame 6 is being attached and utilizing the resulting fluorine based polymer (trademark: CYTOP of spin-coating method, the box for framed pellicle of the pellicle diaphragm 7 of the about 4 μ m of thickness Asahi Glass (thigh) system) is in this container box for framed pellicle, come and go air transport between Tokyo-Fukuoka, the foreign matter that detects on the pellicle diaphragm before and after transporting increases number.
In the dust free room of grade 100, take out pellicle from container box for framed pellicle, and in dark place internal radiation 4 * 10
5The light of Lx, the foreign matter on investigation pellicle diaphragm 7 surfaces increases number, the result, the above foreign matter of 10 μ m on the pellicle diaphragm 7 has increased by 48, in addition, observes the impression that does not have before transporting in the part of the lid of butt pellicle diaphragm sticker.In addition, the carried charge that utilizes ION SYSTEM/MODEL775 to detect the pellicle diaphragm after transporting is-3.8kV to represent it charged.
As shown above, according to the present invention, the pellicle of taking in can not adhere to foreign matter in taking care of, transporting, operate, and, can prevent the stained of pellicle and keep quality.
Claims (5)
1. container box for framed pellicle comprises: vessel, for resinous, in order to the mounting pellicle; And lid, the covered protection adhesive film assembly, and end with the chimeric card of edge part mutually with vessel; It is characterized in that more comprising:
Align member is fixed on this vessel; And
Framework keeps pin, is fixed the position by this align member, and this framework keeps pin can insert and be embedded in the hole that is arranged on the pellicle frame lateral surface, this pellicle is remained on both on the allocation.
2. container box for framed pellicle according to claim 1 is characterized in that
This vessel is a resin, and this vessel is engaging hard ware.
3. container box for framed pellicle according to claim 2 is characterized in that
This align member is mechanically to link with this hard ware that is assembled in vessel.
4. container box for framed pellicle according to claim 1 and 2 is characterized in that
Keep the pin and the contact part of pellicle frame that elastic body is being set at this framework that keeps pellicle.
5. container box for framed pellicle according to claim 1 and 2 is characterized in that
The material of this vessel and this lid is a resin, and it is per unit area 1 * 10 that this vessel and this lid have sheet resistance value
12The antistatic properties that Ω is following.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP081533/05 | 2005-03-22 | ||
| JP2005081533A JP4391435B2 (en) | 2005-03-22 | 2005-03-22 | Pellicle storage container |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1836988A CN1836988A (en) | 2006-09-27 |
| CN100398413C true CN100398413C (en) | 2008-07-02 |
Family
ID=37014532
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2006100549512A Active CN100398413C (en) | 2005-03-22 | 2006-02-27 | Container box for framed pellicle |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20060213797A1 (en) |
| JP (1) | JP4391435B2 (en) |
| KR (1) | KR101223967B1 (en) |
| CN (1) | CN100398413C (en) |
| HK (1) | HK1096928A1 (en) |
| TW (1) | TWI293477B (en) |
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| JP4664746B2 (en) | 2005-06-20 | 2011-04-06 | 信越化学工業株式会社 | Large pellicle container for lithography |
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| US7581372B2 (en) * | 2006-08-17 | 2009-09-01 | Microtome Precision, Inc. | High cleanliness article transport system |
| JP4672636B2 (en) * | 2006-11-02 | 2011-04-20 | 信越化学工業株式会社 | Pellicle storage container |
| JP5052106B2 (en) * | 2006-11-22 | 2012-10-17 | 旭化成イーマテリアルズ株式会社 | How to store the pellicle |
| JP4796946B2 (en) * | 2006-11-30 | 2011-10-19 | 信越化学工業株式会社 | Pellicle storage container |
| JP2008216846A (en) * | 2007-03-07 | 2008-09-18 | Asahi Kasei Electronics Co Ltd | Pellicle storage container |
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| KR101987741B1 (en) * | 2019-01-17 | 2019-06-12 | 피엠씨글로벌 주식회사 | Photo mask keeping box |
| JP2021184068A (en) * | 2020-05-22 | 2021-12-02 | 旭化成株式会社 | Pellicle case, holding unit and release film |
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- 2005-03-22 JP JP2005081533A patent/JP4391435B2/en active Active
- 2005-12-21 KR KR1020050126676A patent/KR101223967B1/en active IP Right Grant
-
2006
- 2006-02-27 TW TW095106577A patent/TWI293477B/en active
- 2006-02-27 CN CNB2006100549512A patent/CN100398413C/en active Active
- 2006-03-08 US US11/370,043 patent/US20060213797A1/en not_active Abandoned
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2007
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| JPH06230561A (en) * | 1993-01-29 | 1994-08-19 | Shin Etsu Chem Co Ltd | Production of pellicle for lithography |
| US5577610A (en) * | 1994-10-12 | 1996-11-26 | Shin-Etsu Polymer Co., Ltd. | Casing for frame-supported pellicles |
| JPH09204039A (en) * | 1996-01-25 | 1997-08-05 | Shin Etsu Chem Co Ltd | Pellicle frame holder |
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| JP2004361705A (en) * | 2003-06-05 | 2004-12-24 | Asahi Kasei Electronics Co Ltd | Method for housing large pellicle |
Also Published As
| Publication number | Publication date |
|---|---|
| TW200634909A (en) | 2006-10-01 |
| TWI293477B (en) | 2008-02-11 |
| KR20060102264A (en) | 2006-09-27 |
| CN1836988A (en) | 2006-09-27 |
| HK1096928A1 (en) | 2007-06-15 |
| JP2006267179A (en) | 2006-10-05 |
| JP4391435B2 (en) | 2009-12-24 |
| KR101223967B1 (en) | 2013-01-18 |
| US20060213797A1 (en) | 2006-09-28 |
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