CN100363776C - 曝光头 - Google Patents
曝光头 Download PDFInfo
- Publication number
- CN100363776C CN100363776C CNB2004100588556A CN200410058855A CN100363776C CN 100363776 C CN100363776 C CN 100363776C CN B2004100588556 A CNB2004100588556 A CN B2004100588556A CN 200410058855 A CN200410058855 A CN 200410058855A CN 100363776 C CN100363776 C CN 100363776C
- Authority
- CN
- China
- Prior art keywords
- mentioned
- pixel
- collecting device
- light collecting
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000003384 imaging method Methods 0.000 claims description 46
- 230000003287 optical effect Effects 0.000 claims description 36
- 230000021615 conjugation Effects 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims 7
- 241000219739 Lens Species 0.000 description 66
- 210000000695 crystalline len Anatomy 0.000 description 66
- 239000013307 optical fiber Substances 0.000 description 23
- 230000015572 biosynthetic process Effects 0.000 description 16
- 239000000463 material Substances 0.000 description 13
- 230000000694 effects Effects 0.000 description 12
- 238000009826 distribution Methods 0.000 description 10
- 238000010586 diagram Methods 0.000 description 9
- 239000000835 fiber Substances 0.000 description 8
- 238000011144 upstream manufacturing Methods 0.000 description 8
- 230000004075 alteration Effects 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 5
- 230000008859 change Effects 0.000 description 4
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- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 2
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- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
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Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
- B41J2/465—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using masks, e.g. light-switching masks
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
Claims (19)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003204404 | 2003-07-31 | ||
JP2003204404 | 2003-07-31 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1580864A CN1580864A (zh) | 2005-02-16 |
CN100363776C true CN100363776C (zh) | 2008-01-23 |
Family
ID=34100662
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2004100588556A Expired - Lifetime CN100363776C (zh) | 2003-07-31 | 2004-08-02 | 曝光头 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7187399B2 (zh) |
KR (1) | KR100738284B1 (zh) |
CN (1) | CN100363776C (zh) |
TW (1) | TWI267656B (zh) |
Families Citing this family (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB0124254D0 (en) * | 2001-10-09 | 2001-11-28 | Payne P P Ltd | Anti-counterfeit packaging |
EP1660942A2 (en) * | 2003-08-27 | 2006-05-31 | Koninklijke Philips Electronics N.V. | Method of forming optical images, a control circuit for use with this method, apparatus for carrying out said method and process for manufacturing a device using said method |
JP4549891B2 (ja) * | 2005-03-04 | 2010-09-22 | 富士フイルム株式会社 | パターン形成材料、並びにパターン形成装置及びパターン形成方法 |
JP2006243546A (ja) * | 2005-03-04 | 2006-09-14 | Fuji Photo Film Co Ltd | パターン形成材料、並びにパターン形成装置及びパターン形成方法 |
WO2006105911A2 (de) * | 2005-04-02 | 2006-10-12 | Punch Graphix Prepress Germany Gmbh | Belichtungsvorrichtung für druckplatten |
JP2006293039A (ja) * | 2005-04-11 | 2006-10-26 | Fuji Photo Film Co Ltd | パターン形成材料、並びにパターン形成装置及びパターン形成方法 |
US20060239312A1 (en) * | 2005-04-23 | 2006-10-26 | Telaris Inc. | Semiconductor Lasers in Optical Phase-Locked Loops |
EP1731955A1 (en) * | 2005-06-09 | 2006-12-13 | Sony Ericsson Mobile Communications AB | Flash device for an electronic equipment for a wireless communication system and method for operating a flash device for an electronic equipment |
US7532403B2 (en) * | 2006-02-06 | 2009-05-12 | Asml Holding N.V. | Optical system for transforming numerical aperture |
US8264667B2 (en) * | 2006-05-04 | 2012-09-11 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method using interferometric and other exposure |
US7932993B2 (en) * | 2006-09-16 | 2011-04-26 | Wenhui Mei | Divided sub-image array scanning and exposing system |
US8035669B2 (en) * | 2007-09-10 | 2011-10-11 | Kabushiki Kaisha Toshiba | Image forming apparatus and shutter control method |
JP4617348B2 (ja) * | 2007-12-20 | 2011-01-26 | シャープ株式会社 | レーザ露光装置、清掃具及び画像形成装置 |
KR101614562B1 (ko) | 2008-07-31 | 2016-05-02 | 코닝 인코포레이티드 | 스팟이 조정되는 능동형 스팟 어레이 리소그래픽 프로젝터 시스템 |
JP5381538B2 (ja) * | 2009-04-09 | 2014-01-08 | 富士ゼロックス株式会社 | 露光装置及び画像形成装置 |
US8427630B2 (en) * | 2009-08-21 | 2013-04-23 | Samsung Electronics Co., Ltd. | Semiconductor manufacturing apparatus |
CN103140353A (zh) * | 2010-09-30 | 2013-06-05 | 富士胶片株式会社 | 图像形成装置和图像形成方法 |
JP5760293B2 (ja) * | 2011-03-02 | 2015-08-05 | 株式会社ブイ・テクノロジー | 露光装置 |
JP5760250B2 (ja) * | 2011-08-03 | 2015-08-05 | 株式会社ブイ・テクノロジー | マイクロレンズアレイ及びそれを使用したスキャン露光装置 |
FR2996016B1 (fr) * | 2012-09-25 | 2014-09-19 | Sagem Defense Securite | Illuminateur de photolithographie telecentrique selon deux directions |
CN103092006B (zh) * | 2013-01-25 | 2015-02-18 | 中国科学院上海光学精密机械研究所 | 光刻照明*** |
KR102120624B1 (ko) * | 2013-04-04 | 2020-06-10 | 삼성디스플레이 주식회사 | Glv를 이용한 디지털 노광기 및 dmd를 이용한 디지털 노광기 |
JP6283798B2 (ja) * | 2013-07-01 | 2018-02-28 | 株式会社ブイ・テクノロジー | 露光装置および照明ユニット |
KR102171301B1 (ko) | 2013-07-09 | 2020-10-29 | 삼성디스플레이 주식회사 | Dmd를 이용한 디지털 노광기 및 그 제어 방법 |
CN103399463B (zh) * | 2013-07-19 | 2015-07-29 | 中国科学院上海光学精密机械研究所 | 投影光刻机照明装置和使用方法 |
KR101531817B1 (ko) * | 2014-07-17 | 2015-06-25 | 주식회사 엘아이에스 | 렌즈 어레이 오차 보상장치 |
CN104865801B (zh) * | 2015-06-01 | 2017-03-01 | 京东方科技集团股份有限公司 | 曝光装置 |
US10042121B1 (en) * | 2017-03-28 | 2018-08-07 | Nistica, Inc. | Toroidal micro lens array for use in a wavelength selective switch |
CN108061967A (zh) * | 2017-12-21 | 2018-05-22 | 北京理工大学 | 一种基于数字微镜器件的光束角度快速调制装置 |
CN108594432B (zh) * | 2018-04-02 | 2021-05-28 | 东莞广辰光电科技有限公司 | 一种使用三原色光源的高效率抬头显示器照明*** |
CN114019662B (zh) * | 2021-09-23 | 2023-07-14 | 北京控制工程研究所 | 一种基于微透镜阵列探测器的大视场照度均匀性光学*** |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09244254A (ja) * | 1996-03-13 | 1997-09-19 | Nikon Corp | 液晶用露光装置 |
US6133986A (en) * | 1996-02-28 | 2000-10-17 | Johnson; Kenneth C. | Microlens scanner for microlithography and wide-field confocal microscopy |
CN1071457C (zh) * | 1994-01-18 | 2001-09-19 | 大宇电子株式会社 | 真有新透镜***的光学投影*** |
EP1202096A2 (en) * | 2000-10-31 | 2002-05-02 | Microsoft Corporation | Microelectrical mechanical structure (MEMS) optical modulator and optical display system |
US6473237B2 (en) * | 2000-11-14 | 2002-10-29 | Ball Semiconductor, Inc. | Point array maskless lithography |
CN1395691A (zh) * | 2000-11-16 | 2003-02-05 | 皇家菲利浦电子有限公司 | 去除由微透镜阵列集成器产生的散射旁瓣的***和方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5231464A (en) * | 1990-03-26 | 1993-07-27 | Research Development Corporation Of Japan | Highly directional optical system and optical sectional image forming apparatus employing the same |
GB9509487D0 (en) * | 1995-05-10 | 1995-07-05 | Ici Plc | Micro relief element & preparation thereof |
JP2001185792A (ja) * | 1999-12-22 | 2001-07-06 | Ricoh Co Ltd | レーザー用光学素子 |
EP1369731A3 (en) * | 2002-06-07 | 2008-02-13 | FUJIFILM Corporation | Exposure head and exposure apparatus |
US7186004B2 (en) * | 2002-12-31 | 2007-03-06 | Karlton David Powell | Homogenizing optical sheet, method of manufacture, and illumination system |
-
2004
- 2004-07-26 US US10/898,233 patent/US7187399B2/en active Active
- 2004-07-30 KR KR1020040060594A patent/KR100738284B1/ko active IP Right Grant
- 2004-07-30 TW TW093122821A patent/TWI267656B/zh active
- 2004-08-02 CN CNB2004100588556A patent/CN100363776C/zh not_active Expired - Lifetime
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1071457C (zh) * | 1994-01-18 | 2001-09-19 | 大宇电子株式会社 | 真有新透镜***的光学投影*** |
US6133986A (en) * | 1996-02-28 | 2000-10-17 | Johnson; Kenneth C. | Microlens scanner for microlithography and wide-field confocal microscopy |
JPH09244254A (ja) * | 1996-03-13 | 1997-09-19 | Nikon Corp | 液晶用露光装置 |
EP1202096A2 (en) * | 2000-10-31 | 2002-05-02 | Microsoft Corporation | Microelectrical mechanical structure (MEMS) optical modulator and optical display system |
US6473237B2 (en) * | 2000-11-14 | 2002-10-29 | Ball Semiconductor, Inc. | Point array maskless lithography |
CN1395691A (zh) * | 2000-11-16 | 2003-02-05 | 皇家菲利浦电子有限公司 | 去除由微透镜阵列集成器产生的散射旁瓣的***和方法 |
Also Published As
Publication number | Publication date |
---|---|
TWI267656B (en) | 2006-12-01 |
KR20050014766A (ko) | 2005-02-07 |
TW200510770A (en) | 2005-03-16 |
US20050024477A1 (en) | 2005-02-03 |
CN1580864A (zh) | 2005-02-16 |
US7187399B2 (en) | 2007-03-06 |
KR100738284B1 (ko) | 2007-07-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: FUJI PHOTO FILM CO., LTD. Free format text: FORMER OWNER: FUJIFILM HOLDINGS CORP. Effective date: 20070921 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20070921 Address after: Tokyo, Japan Applicant after: Fuji Film Corp. Address before: Tokyo, Japan Applicant before: Fuji Photo Film Co., Ltd. |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: YADE TECHNOLOGIES + ENGINEERING CO., LTD. Free format text: FORMER OWNER: FUJI FILM CORP. Effective date: 20140227 |
|
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20140227 Address after: Tokyo, Japan Patentee after: Adrian Engineering Technology Co. Ltd. Address before: Tokyo, Japan Patentee before: Fuji Film Corp. |