GB1242527A
(en)
*
|
1967-10-20 |
1971-08-11 |
Kodak Ltd |
Optical instruments
|
US3573975A
(en)
*
|
1968-07-10 |
1971-04-06 |
Ibm |
Photochemical fabrication process
|
US4509852A
(en)
*
|
1980-10-06 |
1985-04-09 |
Werner Tabarelli |
Apparatus for the photolithographic manufacture of integrated circuit elements
|
US4390273A
(en)
*
|
1981-02-17 |
1983-06-28 |
Censor Patent-Und Versuchsanstalt |
Projection mask as well as a method and apparatus for the embedding thereof and projection printing system
|
US4407956A
(en)
|
1981-03-13 |
1983-10-04 |
The Regents Of The University Of California |
Cloned cauliflower mosaic virus DNA as a plant vehicle
|
EP0160692A1
(fr)
|
1983-11-03 |
1985-11-13 |
DE WET, Johannes Martenis Jacob |
Procede de transfert de genes exogenes dans des plantes en utilisant le pollen comme vecteur
|
US4683202A
(en)
|
1985-03-28 |
1987-07-28 |
Cetus Corporation |
Process for amplifying nucleic acid sequences
|
EP0262972A3
(fr)
|
1986-10-01 |
1990-08-29 |
The Plant Cell Research Institute Inc. |
Transformation génétique et régénération contrôlée de cucumis SP in vitro
|
US5990387A
(en)
|
1988-06-10 |
1999-11-23 |
Pioneer Hi-Bred International, Inc. |
Stable transformation of plant cells
|
US5550318A
(en)
|
1990-04-17 |
1996-08-27 |
Dekalb Genetics Corporation |
Methods and compositions for the production of stably transformed, fertile monocot plants and cells thereof
|
US5121256A
(en)
*
|
1991-03-14 |
1992-06-09 |
The Board Of Trustees Of The Leland Stanford Junior University |
Lithography system employing a solid immersion lens
|
US5591616A
(en)
|
1992-07-07 |
1997-01-07 |
Japan Tobacco, Inc. |
Method for transforming monocotyledons
|
JP2753930B2
(ja)
*
|
1992-11-27 |
1998-05-20 |
キヤノン株式会社 |
液浸式投影露光装置
|
US5426039A
(en)
|
1993-09-08 |
1995-06-20 |
Bio-Rad Laboratories, Inc. |
Direct molecular cloning of primer extended DNA containing an alkane diol
|
EP0733059B1
(fr)
|
1993-12-09 |
2000-09-13 |
Thomas Jefferson University |
Composes et procedes pour realiser des mutations dirigees sur le site dans des cellules eucaryotes
|
JPH08316124A
(ja)
*
|
1995-05-19 |
1996-11-29 |
Hitachi Ltd |
投影露光方法及び露光装置
|
US5534123A
(en)
|
1995-07-10 |
1996-07-09 |
Molecular Dynamics |
Denaturing separation matrix having hydroxyethyl cellulose for nucleic acid electrophoresis
|
WO1998009278A1
(fr)
*
|
1996-08-26 |
1998-03-05 |
Digital Papyrus Technologies |
Procede et appareillage de couplage d'une lentille optique a un disque, a travers un milieu de couplage possedant un indice de refraction relativement eleve
|
US5825043A
(en)
*
|
1996-10-07 |
1998-10-20 |
Nikon Precision Inc. |
Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus
|
US5900354A
(en)
*
|
1997-07-03 |
1999-05-04 |
Batchelder; John Samuel |
Method for optical inspection and lithography
|
US6560547B1
(en)
*
|
1999-09-28 |
2003-05-06 |
Asi Datamyte, Inc. |
Real time sampling system and method for measuring an interrupted surface
|
US6995930B2
(en)
*
|
1999-12-29 |
2006-02-07 |
Carl Zeiss Smt Ag |
Catadioptric projection objective with geometric beam splitting
|
TW591653B
(en)
*
|
2000-08-08 |
2004-06-11 |
Koninkl Philips Electronics Nv |
Method of manufacturing an optically scannable information carrier
|
KR100866818B1
(ko)
*
|
2000-12-11 |
2008-11-04 |
가부시키가이샤 니콘 |
투영광학계 및 이 투영광학계를 구비한 노광장치
|
WO2003040830A2
(fr)
*
|
2001-11-07 |
2003-05-15 |
Applied Materials, Inc. |
Imprimante a matrice en grille de points optique
|
US7092069B2
(en)
*
|
2002-03-08 |
2006-08-15 |
Carl Zeiss Smt Ag |
Projection exposure method and projection exposure system
|
DE10210899A1
(de)
*
|
2002-03-08 |
2003-09-18 |
Zeiss Carl Smt Ag |
Refraktives Projektionsobjektiv für Immersions-Lithographie
|
DE10229818A1
(de)
*
|
2002-06-28 |
2004-01-15 |
Carl Zeiss Smt Ag |
Verfahren zur Fokusdetektion und Abbildungssystem mit Fokusdetektionssystem
|
US6788477B2
(en)
*
|
2002-10-22 |
2004-09-07 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
Apparatus for method for immersion lithography
|
US7110081B2
(en)
*
|
2002-11-12 |
2006-09-19 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
SG121822A1
(en)
*
|
2002-11-12 |
2006-05-26 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
SG131766A1
(en)
*
|
2002-11-18 |
2007-05-28 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
SG121829A1
(en)
*
|
2002-11-29 |
2006-05-26 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
DE10258718A1
(de)
*
|
2002-12-09 |
2004-06-24 |
Carl Zeiss Smt Ag |
Projektionsobjektiv, insbesondere für die Mikrolithographie, sowie Verfahren zur Abstimmung eines Projektionsobjektives
|
JP4352874B2
(ja)
*
|
2002-12-10 |
2009-10-28 |
株式会社ニコン |
露光装置及びデバイス製造方法
|
EP1429190B1
(fr)
*
|
2002-12-10 |
2012-05-09 |
Canon Kabushiki Kaisha |
Appareil et méthode d'exposition
|
US7010958B2
(en)
*
|
2002-12-19 |
2006-03-14 |
Asml Holding N.V. |
High-resolution gas gauge proximity sensor
|
US6781670B2
(en)
*
|
2002-12-30 |
2004-08-24 |
Intel Corporation |
Immersion lithography
|
EP2166413A1
(fr)
*
|
2003-04-11 |
2010-03-24 |
Nikon Corporation |
Méthode de nettoyage pour des optiques en lithographie par immersion
|
TWI295414B
(en)
*
|
2003-05-13 |
2008-04-01 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
EP2261742A3
(fr)
*
|
2003-06-11 |
2011-05-25 |
ASML Netherlands BV |
Appareil lithographique et méthode de fabrication d'un dispositif
|
JP2005019616A
(ja)
*
|
2003-06-25 |
2005-01-20 |
Canon Inc |
液浸式露光装置
|
JP4343597B2
(ja)
*
|
2003-06-25 |
2009-10-14 |
キヤノン株式会社 |
露光装置及びデバイス製造方法
|
EP1498778A1
(fr)
*
|
2003-06-27 |
2005-01-19 |
ASML Netherlands B.V. |
Appareil lithographique et méthode de fabrication d'un dispositif
|
SG109000A1
(en)
*
|
2003-07-16 |
2005-02-28 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
US7175968B2
(en)
*
|
2003-07-28 |
2007-02-13 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and a substrate
|
US7579135B2
(en)
*
|
2003-08-11 |
2009-08-25 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Lithography apparatus for manufacture of integrated circuits
|
US7061578B2
(en)
*
|
2003-08-11 |
2006-06-13 |
Advanced Micro Devices, Inc. |
Method and apparatus for monitoring and controlling imaging in immersion lithography systems
|
US7700267B2
(en)
*
|
2003-08-11 |
2010-04-20 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Immersion fluid for immersion lithography, and method of performing immersion lithography
|
US7085075B2
(en)
*
|
2003-08-12 |
2006-08-01 |
Carl Zeiss Smt Ag |
Projection objectives including a plurality of mirrors with lenses ahead of mirror M3
|
US7070915B2
(en)
*
|
2003-08-29 |
2006-07-04 |
Tokyo Electron Limited |
Method and system for drying a substrate
|
US6954256B2
(en)
*
|
2003-08-29 |
2005-10-11 |
Asml Netherlands B.V. |
Gradient immersion lithography
|
US7014966B2
(en)
*
|
2003-09-02 |
2006-03-21 |
Advanced Micro Devices, Inc. |
Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems
|
JP3870182B2
(ja)
*
|
2003-09-09 |
2007-01-17 |
キヤノン株式会社 |
露光装置及びデバイス製造方法
|
US6961186B2
(en)
*
|
2003-09-26 |
2005-11-01 |
Takumi Technology Corp. |
Contact printing using a magnified mask image
|
US7369217B2
(en)
*
|
2003-10-03 |
2008-05-06 |
Micronic Laser Systems Ab |
Method and device for immersion lithography
|
US7678527B2
(en)
*
|
2003-10-16 |
2010-03-16 |
Intel Corporation |
Methods and compositions for providing photoresist with improved properties for contacting liquids
|
JP2005159322A
(ja)
*
|
2003-10-31 |
2005-06-16 |
Nikon Corp |
定盤、ステージ装置及び露光装置並びに露光方法
|
US7924397B2
(en)
*
|
2003-11-06 |
2011-04-12 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Anti-corrosion layer on objective lens for liquid immersion lithography applications
|
US7528929B2
(en)
*
|
2003-11-14 |
2009-05-05 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7545481B2
(en)
*
|
2003-11-24 |
2009-06-09 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7125652B2
(en)
*
|
2003-12-03 |
2006-10-24 |
Advanced Micro Devices, Inc. |
Immersion lithographic process using a conforming immersion medium
|
JP2005175016A
(ja)
*
|
2003-12-08 |
2005-06-30 |
Canon Inc |
基板保持装置およびそれを用いた露光装置ならびにデバイス製造方法
|
JP2005175034A
(ja)
*
|
2003-12-09 |
2005-06-30 |
Canon Inc |
露光装置
|
JP4579927B2
(ja)
*
|
2003-12-23 |
2010-11-10 |
コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ |
浸漬リソグラフィのための除去可能なペリクル
|
US7394521B2
(en)
*
|
2003-12-23 |
2008-07-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7589818B2
(en)
*
|
2003-12-23 |
2009-09-15 |
Asml Netherlands B.V. |
Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus
|
JP2005191393A
(ja)
*
|
2003-12-26 |
2005-07-14 |
Canon Inc |
露光方法及び装置
|
JP2005191381A
(ja)
*
|
2003-12-26 |
2005-07-14 |
Canon Inc |
露光方法及び装置
|
US20050147920A1
(en)
*
|
2003-12-30 |
2005-07-07 |
Chia-Hui Lin |
Method and system for immersion lithography
|
US7088422B2
(en)
*
|
2003-12-31 |
2006-08-08 |
International Business Machines Corporation |
Moving lens for immersion optical lithography
|
JP4371822B2
(ja)
*
|
2004-01-06 |
2009-11-25 |
キヤノン株式会社 |
露光装置
|
JP4429023B2
(ja)
*
|
2004-01-07 |
2010-03-10 |
キヤノン株式会社 |
露光装置及びデバイス製造方法
|
US20050153424A1
(en)
*
|
2004-01-08 |
2005-07-14 |
Derek Coon |
Fluid barrier with transparent areas for immersion lithography
|
US7026259B2
(en)
*
|
2004-01-21 |
2006-04-11 |
International Business Machines Corporation |
Liquid-filled balloons for immersion lithography
|
US7391501B2
(en)
*
|
2004-01-22 |
2008-06-24 |
Intel Corporation |
Immersion liquids with siloxane polymer for immersion lithography
|
US7050146B2
(en)
*
|
2004-02-09 |
2006-05-23 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
WO2005076323A1
(fr)
*
|
2004-02-10 |
2005-08-18 |
Nikon Corporation |
Aligneur, procede de fabrication de dispositif, procede de maintenance et procede d'alignement
|
US7224427B2
(en)
*
|
2004-08-03 |
2007-05-29 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Megasonic immersion lithography exposure apparatus and method
|
JP4772306B2
(ja)
*
|
2004-09-06 |
2011-09-14 |
株式会社東芝 |
液浸光学装置及び洗浄方法
|
US7385670B2
(en)
*
|
2004-10-05 |
2008-06-10 |
Asml Netherlands B.V. |
Lithographic apparatus, cleaning system and cleaning method for in situ removing contamination from a component in a lithographic apparatus
|
JP2006120674A
(ja)
*
|
2004-10-19 |
2006-05-11 |
Canon Inc |
露光装置及び方法、デバイス製造方法
|
JP2006133661A
(ja)
*
|
2004-11-09 |
2006-05-25 |
Minebea Co Ltd |
カラーホイールおよびその製造方法と製造用治具
|
US7362412B2
(en)
*
|
2004-11-18 |
2008-04-22 |
International Business Machines Corporation |
Method and apparatus for cleaning a semiconductor substrate in an immersion lithography system
|
US7880860B2
(en)
*
|
2004-12-20 |
2011-02-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7315033B1
(en)
*
|
2005-05-04 |
2008-01-01 |
Advanced Micro Devices, Inc. |
Method and apparatus for reducing biological contamination in an immersion lithography system
|
US20070085989A1
(en)
*
|
2005-06-21 |
2007-04-19 |
Nikon Corporation |
Exposure apparatus and exposure method, maintenance method, and device manufacturing method
|
US20070002296A1
(en)
*
|
2005-06-30 |
2007-01-04 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Immersion lithography defect reduction
|
US7262422B2
(en)
*
|
2005-07-01 |
2007-08-28 |
Spansion Llc |
Use of supercritical fluid to dry wafer and clean lens in immersion lithography
|
JP2007103658A
(ja)
*
|
2005-10-04 |
2007-04-19 |
Canon Inc |
露光方法および装置ならびにデバイス製造方法
|
US7986395B2
(en)
*
|
2005-10-24 |
2011-07-26 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Immersion lithography apparatus and methods
|
US8125610B2
(en)
*
|
2005-12-02 |
2012-02-28 |
ASML Metherlands B.V. |
Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus
|
US7405417B2
(en)
*
|
2005-12-20 |
2008-07-29 |
Asml Netherlands B.V. |
Lithographic apparatus having a monitoring device for detecting contamination
|
US20070146658A1
(en)
*
|
2005-12-27 |
2007-06-28 |
Asml Netherlands B.V. |
Lithographic apparatus and method
|
US7522263B2
(en)
*
|
2005-12-27 |
2009-04-21 |
Asml Netherlands B.V. |
Lithographic apparatus and method
|
JP4704221B2
(ja)
*
|
2006-01-26 |
2011-06-15 |
株式会社Sokudo |
基板処理装置および基板処理方法
|
US7969548B2
(en)
*
|
2006-05-22 |
2011-06-28 |
Asml Netherlands B.V. |
Lithographic apparatus and lithographic apparatus cleaning method
|
NL1033850C2
(nl)
|
2007-05-15 |
2008-11-18 |
3Force B V |
Brandersysteem met voorgemengde branders en vlam-overdrachtsmiddelen.
|
US7916269B2
(en)
*
|
2007-07-24 |
2011-03-29 |
Asml Netherlands B.V. |
Lithographic apparatus and contamination removal or prevention method
|
US20090025753A1
(en)
*
|
2007-07-24 |
2009-01-29 |
Asml Netherlands B.V. |
Lithographic Apparatus And Contamination Removal Or Prevention Method
|
SG151198A1
(en)
*
|
2007-09-27 |
2009-04-30 |
Asml Netherlands Bv |
Methods relating to immersion lithography and an immersion lithographic apparatus
|
NL1035942A1
(nl)
*
|
2007-09-27 |
2009-03-30 |
Asml Netherlands Bv |
Lithographic Apparatus and Method of Cleaning a Lithographic Apparatus.
|