BR0210684A - Célula de eletrólise para restaurar a concentração de ìons metálicos em processos de eletrodeposição - Google Patents

Célula de eletrólise para restaurar a concentração de ìons metálicos em processos de eletrodeposição

Info

Publication number
BR0210684A
BR0210684A BR0210684-1A BR0210684A BR0210684A BR 0210684 A BR0210684 A BR 0210684A BR 0210684 A BR0210684 A BR 0210684A BR 0210684 A BR0210684 A BR 0210684A
Authority
BR
Brazil
Prior art keywords
cell
metals
electrolysis cell
electrodeposition processes
electrodeposition
Prior art date
Application number
BR0210684-1A
Other languages
English (en)
Other versions
BRPI0210684B1 (pt
Inventor
Ulderico Nevosi
Paolo Rossi
Original Assignee
De Nora Elettrodi Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by De Nora Elettrodi Spa filed Critical De Nora Elettrodi Spa
Publication of BR0210684A publication Critical patent/BR0210684A/pt
Publication of BRPI0210684B1 publication Critical patent/BRPI0210684B1/pt

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/16Regeneration of process solutions
    • C25D21/22Regeneration of process solutions by ion-exchange
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/16Regeneration of process solutions
    • C25D21/18Regeneration of process solutions of electrolytes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)

Abstract

"CéLULA DE ELETRóLISE PARA RESTAURAR A CONCENTRAçãO DE ìONS METáLICOS EM PROCESSOS DE ELETRODEPOSIçãO". A presente invenção refere-se a uma célula de eletrólise na qual a dissolução anódica de metais é realizada, em particular de metais caracterizados por meio de um potencial de oxidação relativamente elevado, tais como cobre ou metais com elevado sobrepotencial de hidrogênio, por exemplo, estanho, com a intenção de restaurar ambos, a concentração dos ditos metais e o pH em banhos galvânicos utilizados em processos de eletrodeposição com anodos insolúveis. A célula da invenção compreende um compartimento anódico no qual o metal a ser dissolvido atua como um anodo consumível, e um compartimento catódico que contém um catodo para o desprendimento de hidrogênio, separados por uma membrana de troca de cátions. O acoplamento da célula da invenção com a célula de eletrodeposição permite uma grande e forte simplificação do processo global, e uma sensível redução nos custos relevantes.
BRPI0210684A 2001-06-29 2002-06-28 célula para o enriquecimento por meio de dissolução anódica de um metal, aparelho para a eletrodeposição de metal e processo de eletrodeposição. BRPI0210684B1 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IT2001MI001374A ITMI20011374A1 (it) 2001-06-29 2001-06-29 Cella di elettrolisi per il ripristino della concentrazione di ioni metallici in processi di elettrodeposizione
PCT/EP2002/007182 WO2003002784A2 (en) 2001-06-29 2002-06-28 Electrolysis cell for restoring the concentration of metal ions in electroplating processes

Publications (2)

Publication Number Publication Date
BR0210684A true BR0210684A (pt) 2005-07-12
BRPI0210684B1 BRPI0210684B1 (pt) 2016-04-19

Family

ID=11447962

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0210684A BRPI0210684B1 (pt) 2001-06-29 2002-06-28 célula para o enriquecimento por meio de dissolução anódica de um metal, aparelho para a eletrodeposição de metal e processo de eletrodeposição.

Country Status (14)

Country Link
US (1) US7264704B2 (pt)
EP (1) EP1458905B8 (pt)
JP (2) JP2004536222A (pt)
KR (1) KR100954069B1 (pt)
AT (1) ATE415505T1 (pt)
AU (1) AU2002352504A1 (pt)
BR (1) BRPI0210684B1 (pt)
CA (1) CA2449512C (pt)
DE (1) DE60230061D1 (pt)
IT (1) ITMI20011374A1 (pt)
MY (1) MY142795A (pt)
RU (1) RU2302481C2 (pt)
TW (1) TW574428B (pt)
WO (1) WO2003002784A2 (pt)

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JP2006524122A (ja) * 2003-05-15 2006-10-26 ミリポア・コーポレイション ろ過モジュール
ITTO20070704A1 (it) * 2007-10-05 2009-04-06 Create New Technology S R L Sistema e metodo di placcatura di leghe metalliche mediante tecnologia galvanica
US20100239467A1 (en) 2008-06-17 2010-09-23 Brent Constantz Methods and systems for utilizing waste sources of metal oxides
KR20110038691A (ko) 2008-07-16 2011-04-14 칼레라 코포레이션 전기화학 시스템에서 co2를 사용하는 방법
US8869477B2 (en) 2008-09-30 2014-10-28 Calera Corporation Formed building materials
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AU2010201005A1 (en) 2009-02-10 2010-08-26 Calera Corporation Low-voltage alkaline production using hydrogen and electrocatlytic electrodes
KR100928666B1 (ko) * 2009-02-17 2009-11-27 주식회사 한스머신 웨이퍼 결함 분석장치 및 이에 이용되는 이온추출장치와 이를 이용한 웨이퍼 결함 분석방법
JP2012519076A (ja) 2009-03-02 2012-08-23 カレラ コーポレイション ガス流複合汚染物質制御システムおよび方法
US10472730B2 (en) * 2009-10-12 2019-11-12 Novellus Systems, Inc. Electrolyte concentration control system for high rate electroplating
CN101962796A (zh) * 2010-08-17 2011-02-02 苏州铨笠电镀挂具有限公司 一种可持续补充镀液中金属阳离子的方法
CN101935862A (zh) * 2010-08-17 2011-01-05 苏州铨笠电镀挂具有限公司 一种阳离子发生装置
US8512541B2 (en) * 2010-11-16 2013-08-20 Trevor Pearson Electrolytic dissolution of chromium from chromium electrodes
US9017528B2 (en) 2011-04-14 2015-04-28 Tel Nexx, Inc. Electro chemical deposition and replenishment apparatus
US9005409B2 (en) 2011-04-14 2015-04-14 Tel Nexx, Inc. Electro chemical deposition and replenishment apparatus
US11000545B2 (en) 2013-03-15 2021-05-11 Cda Research Group, Inc. Copper ion compositions and methods of treatment for conditions caused by coronavirus and influenza
US10398733B2 (en) 2013-03-15 2019-09-03 Cda Research Group, Inc. Topical copper ion treatments and methods of treatment using topical copper ion treatments in the dermatological areas of the body
JP6139379B2 (ja) * 2013-10-31 2017-05-31 株式会社荏原製作所 Sn合金めっき装置及びSn合金めっき方法
US9303329B2 (en) 2013-11-11 2016-04-05 Tel Nexx, Inc. Electrochemical deposition apparatus with remote catholyte fluid management
CN103616275B (zh) * 2013-12-09 2016-01-20 嘉兴市产品质量监督检验所 一种痕量金属离子电富集样品处理方法及其装置
US10011919B2 (en) * 2015-05-29 2018-07-03 Lam Research Corporation Electrolyte delivery and generation equipment
US10692735B2 (en) 2017-07-28 2020-06-23 Lam Research Corporation Electro-oxidative metal removal in through mask interconnect fabrication
WO2019144109A2 (en) 2018-01-22 2019-07-25 Alpha-En Corporation System and process for producing lithium
US11193184B2 (en) * 2019-02-22 2021-12-07 Cda Research Group, Inc. System for use in producing a metal ion suspension and process of using same
US11339483B1 (en) 2021-04-05 2022-05-24 Alchemr, Inc. Water electrolyzers employing anion exchange membranes
CA3141101C (en) 2021-08-23 2023-10-17 Unison Industries, Llc Electroforming system and method
WO2024078627A1 (zh) * 2022-10-14 2024-04-18 叶涛 一种结合电解溶铜的不溶性阳极镀铜工艺优化方法及装置
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IT1318545B1 (it) * 2000-05-31 2003-08-27 De Nora Elettrodi Spa Cella di elettrolisi per il ripristino della concentrazione di ionimetallici in processi di elettrodeposizione.

Also Published As

Publication number Publication date
JP4422751B2 (ja) 2010-02-24
TW574428B (en) 2004-02-01
AU2002352504A1 (en) 2003-03-03
WO2003002784A3 (en) 2004-07-01
JP2004536222A (ja) 2004-12-02
ITMI20011374A0 (it) 2001-06-29
EP1458905B8 (en) 2009-03-25
EP1458905A2 (en) 2004-09-22
BRPI0210684B1 (pt) 2016-04-19
MY142795A (en) 2010-12-31
ATE415505T1 (de) 2008-12-15
DE60230061D1 (de) 2009-01-08
CA2449512A1 (en) 2003-01-09
WO2003002784A2 (en) 2003-01-09
US20040182694A1 (en) 2004-09-23
ITMI20011374A1 (it) 2002-12-29
JP2008069458A (ja) 2008-03-27
KR100954069B1 (ko) 2010-04-23
CA2449512C (en) 2010-02-02
KR20040010786A (ko) 2004-01-31
RU2004102511A (ru) 2005-04-10
EP1458905B1 (en) 2008-11-26
US7264704B2 (en) 2007-09-04
RU2302481C2 (ru) 2007-07-10

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B21F Lapse acc. art. 78, item iv - on non-payment of the annual fees in time
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