BE757573A - FLEXIBLE COPPER CURRENT FREE DEPOSIT - Google Patents

FLEXIBLE COPPER CURRENT FREE DEPOSIT

Info

Publication number
BE757573A
BE757573A BE757573DA BE757573A BE 757573 A BE757573 A BE 757573A BE 757573D A BE757573D A BE 757573DA BE 757573 A BE757573 A BE 757573A
Authority
BE
Belgium
Prior art keywords
flexible copper
copper current
current free
free deposit
deposit
Prior art date
Application number
Other languages
French (fr)
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication date
Publication of BE757573A publication Critical patent/BE757573A/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/38Coating with copper
    • C23C18/40Coating with copper using reducing agents
    • C23C18/405Formaldehyde
BE757573D 1969-10-16 FLEXIBLE COPPER CURRENT FREE DEPOSIT BE757573A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL6915718A NL6915718A (en) 1969-10-16 1969-10-16

Publications (1)

Publication Number Publication Date
BE757573A true BE757573A (en) 1971-04-15

Family

ID=19808149

Family Applications (1)

Application Number Title Priority Date Filing Date
BE757573D BE757573A (en) 1969-10-16 FLEXIBLE COPPER CURRENT FREE DEPOSIT

Country Status (11)

Country Link
US (1) US3804638A (en)
AT (1) AT311145B (en)
AU (1) AU2101370A (en)
BE (1) BE757573A (en)
CA (1) CA947458A (en)
CH (1) CH550255A (en)
DE (1) DE2049061C3 (en)
FR (1) FR2065996A5 (en)
GB (1) GB1330332A (en)
HK (1) HK49576A (en)
NL (1) NL6915718A (en)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5627594B2 (en) * 1975-03-14 1981-06-25
US4171225A (en) 1976-01-23 1979-10-16 U.S. Philips Corporation Electroless copper plating solutions
US4211564A (en) * 1978-05-09 1980-07-08 Hitachi, Ltd. Chemical copper plating solution
US4301196A (en) * 1978-09-13 1981-11-17 Kollmorgen Technologies Corp. Electroless copper deposition process having faster plating rates
US4303443A (en) * 1979-06-15 1981-12-01 Hitachi, Ltd. Electroless copper plating solution
JPS56156749A (en) * 1980-05-08 1981-12-03 Toshiba Corp Chemical copper plating solution
CA1184359A (en) * 1981-10-23 1985-03-26 Donald A. Arcilesi Metallic impurity control for electroless copper plating
IT1157006B (en) * 1982-03-09 1987-02-11 Alfachimici Spa STABILIZING MIXTURE FOR A CHEMICAL COPPER BATH
US4548644A (en) * 1982-09-28 1985-10-22 Hitachi Chemical Company, Ltd. Electroless copper deposition solution
US4563217A (en) * 1983-07-25 1986-01-07 Hitachi, Ltd. Electroless copper plating solution
US4908242A (en) * 1986-10-31 1990-03-13 Kollmorgen Corporation Method of consistently producing a copper deposit on a substrate by electroless deposition which deposit is essentially free of fissures
US5925403A (en) * 1994-01-31 1999-07-20 Matsushita Electric Works, Ltd. Method of coating a copper film on a ceramic substrate
US6852152B2 (en) * 2002-09-24 2005-02-08 International Business Machines Corporation Colloidal seed formulation for printed circuit board metallization
US20050016416A1 (en) * 2003-07-23 2005-01-27 Jon Bengston Stabilizer for electroless copper plating solution
TWI335632B (en) * 2003-09-19 2011-01-01 Applied Materials Inc Apparatus and method of detecting the electroless deposition endpoint
US20050067297A1 (en) * 2003-09-26 2005-03-31 Innovative Technology Licensing, Llc Copper bath for electroplating fine circuitry on semiconductor chips
US20060062897A1 (en) * 2004-09-17 2006-03-23 Applied Materials, Inc Patterned wafer thickness detection system
JP2006342428A (en) * 2005-06-10 2006-12-21 Enthone Inc Method for direct metallization of non-conductive substrate
US20160273112A1 (en) * 2013-03-27 2016-09-22 Atotech Deutschland Gmbh Electroless copper plating solution
US10060034B2 (en) 2017-01-23 2018-08-28 Rohm And Haas Electronic Materials Llc Electroless copper plating compositions
US10294569B2 (en) 2017-10-06 2019-05-21 Rohm And Haas Electronic Materials Llc Stable electroless copper plating compositions and methods for electroless plating copper on substrates
US10655227B2 (en) 2017-10-06 2020-05-19 Rohm And Haas Electronic Materials Llc Stable electroless copper plating compositions and methods for electroless plating copper on substrates
CN110498532A (en) * 2019-08-15 2019-11-26 深南电路股份有限公司 The processing method and processing unit of printed wiring board waste water
CN113388829A (en) * 2021-06-11 2021-09-14 惠州金晟新电子科技有限公司 Electroless copper plating solution and method for plating copper on substrate by using electroless copper plating solution

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3075856A (en) * 1958-03-31 1963-01-29 Gen Electric Copper plating process and solution
US3300335A (en) * 1963-11-20 1967-01-24 Dow Chemical Co Electroless metal plating with foam
US3485643A (en) * 1966-05-06 1969-12-23 Photocircuits Corp Electroless copper plating
US3472664A (en) * 1966-09-15 1969-10-14 Enthone Inhibiting stardusting in electroless copper plating
US3515563A (en) * 1967-12-28 1970-06-02 Photocircuits Corp Autocatalytic metal plating solutions

Also Published As

Publication number Publication date
CH550255A (en) 1974-06-14
NL6915718A (en) 1971-04-20
CA947458A (en) 1974-05-21
GB1330332A (en) 1973-09-19
FR2065996A5 (en) 1971-08-06
AU2101370A (en) 1972-04-20
HK49576A (en) 1976-08-06
AT311145B (en) 1973-10-25
DE2049061C3 (en) 1981-04-30
DE2049061B2 (en) 1980-07-24
US3804638A (en) 1974-04-16
DE2049061A1 (en) 1971-04-29

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Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: N.V. PHILIPS'GLOEILAMPENFABRIEKEN

Effective date: 19861031