ATE515084T1 - Verfahren zur herstellung eines oberflächenemissionslasers, verfahren zur herstellung eines oberflächenemissionslaserarrays,oberflächenemis ionslaser, oberflächenemissionslaserarray und optische vorrichtung mit dem oberflächenemissionslaserarray - Google Patents
Verfahren zur herstellung eines oberflächenemissionslasers, verfahren zur herstellung eines oberflächenemissionslaserarrays,oberflächenemis ionslaser, oberflächenemissionslaserarray und optische vorrichtung mit dem oberflächenemissionslaserarrayInfo
- Publication number
- ATE515084T1 ATE515084T1 AT09009750T AT09009750T ATE515084T1 AT E515084 T1 ATE515084 T1 AT E515084T1 AT 09009750 T AT09009750 T AT 09009750T AT 09009750 T AT09009750 T AT 09009750T AT E515084 T1 ATE515084 T1 AT E515084T1
- Authority
- AT
- Austria
- Prior art keywords
- emission laser
- surface emission
- laser array
- producing
- forming
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 3
- 230000003287 optical effect Effects 0.000 title 1
- 238000005530 etching Methods 0.000 abstract 6
- 238000000034 method Methods 0.000 abstract 2
- 239000002344 surface layer Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18386—Details of the emission surface for influencing the near- or far-field, e.g. a grating on the surface
- H01S5/18391—Aperiodic structuring to influence the near- or far-field distribution
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S2301/00—Functional characteristics
- H01S2301/16—Semiconductor lasers with special structural design to influence the modes, e.g. specific multimode
- H01S2301/166—Single transverse or lateral mode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S2301/00—Functional characteristics
- H01S2301/17—Semiconductor lasers comprising special layers
- H01S2301/176—Specific passivation layers on surfaces other than the emission facet
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
- H01S5/18311—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement using selective oxidation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18344—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] characterized by the mesa, e.g. dimensions or shape of the mesa
- H01S5/18347—Mesa comprising active layer
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008198951A JP4639249B2 (ja) | 2008-07-31 | 2008-07-31 | 面発光レーザの製造方法及び面発光レーザアレイの製造方法、面発光レーザ及び面発光レーザアレイ、面発光レーザアレイを備えている光学機器 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE515084T1 true ATE515084T1 (de) | 2011-07-15 |
Family
ID=41202415
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT09009750T ATE515084T1 (de) | 2008-07-31 | 2009-07-28 | Verfahren zur herstellung eines oberflächenemissionslasers, verfahren zur herstellung eines oberflächenemissionslaserarrays,oberflächenemis ionslaser, oberflächenemissionslaserarray und optische vorrichtung mit dem oberflächenemissionslaserarray |
Country Status (5)
Country | Link |
---|---|
US (2) | US7863061B2 (de) |
EP (1) | EP2149945B1 (de) |
JP (1) | JP4639249B2 (de) |
CN (2) | CN102208752B (de) |
AT (1) | ATE515084T1 (de) |
Families Citing this family (36)
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JP5388666B2 (ja) * | 2008-04-21 | 2014-01-15 | キヤノン株式会社 | 面発光レーザ |
JP4639249B2 (ja) | 2008-07-31 | 2011-02-23 | キヤノン株式会社 | 面発光レーザの製造方法及び面発光レーザアレイの製造方法、面発光レーザ及び面発光レーザアレイ、面発光レーザアレイを備えている光学機器 |
JP5106487B2 (ja) * | 2008-07-31 | 2012-12-26 | キヤノン株式会社 | 面発光レーザの製造方法及び面発光レーザアレイの製造方法、該製造方法による面発光レーザアレイを備えている光学機器 |
JP5038371B2 (ja) * | 2008-09-26 | 2012-10-03 | キヤノン株式会社 | 面発光レーザの製造方法 |
JP5850075B2 (ja) * | 2009-05-28 | 2016-02-03 | 株式会社リコー | 面発光レーザ素子の製造方法 |
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JP2012009727A (ja) * | 2010-06-28 | 2012-01-12 | Fuji Xerox Co Ltd | 面発光型半導体レーザ、面発光型半導体レーザ装置、光伝送装置および情報処理装置 |
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JP5743520B2 (ja) * | 2010-12-10 | 2015-07-01 | キヤノン株式会社 | 面発光レーザ及び画像形成装置 |
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JP2012248795A (ja) * | 2011-05-31 | 2012-12-13 | Toshiba Corp | 半導体発光素子およびその製造方法 |
JP2013093439A (ja) * | 2011-10-26 | 2013-05-16 | Seiko Epson Corp | 面発光型半導体レーザーの製造方法 |
KR20130085763A (ko) * | 2012-01-20 | 2013-07-30 | 삼성전자주식회사 | 광 집적 회로용 혼성 레이저 광원 |
US8731012B2 (en) * | 2012-01-24 | 2014-05-20 | Fuji Xerox Co., Ltd. | Surface emitting semiconductor laser and its manufacturing method, surface emitting semiconductor laser device, optical transmitter, and information processor |
JP6015220B2 (ja) * | 2012-08-07 | 2016-10-26 | 富士ゼロックス株式会社 | 面発光型半導体レーザ、面発光型半導体レーザ装置、光伝送装置および情報処理装置 |
CN104078843A (zh) * | 2013-03-29 | 2014-10-01 | 新科实业有限公司 | 具有窄激光发射角度的多模垂直腔面发射激光器 |
CN104078844A (zh) * | 2013-03-29 | 2014-10-01 | 新科实业有限公司 | 具有窄激光发射角度的多模垂直腔面发射激光器 |
JP2015035596A (ja) * | 2013-07-12 | 2015-02-19 | キヤノン株式会社 | 面発光レーザ、光干渉断層像取得装置 |
JP6004063B1 (ja) * | 2015-09-09 | 2016-10-05 | 富士ゼロックス株式会社 | 面発光型半導体レーザ素子の製造方法 |
WO2017045161A1 (zh) * | 2015-09-16 | 2017-03-23 | 华为技术有限公司 | 半导体激光器及其加工方法 |
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CN112531463B (zh) * | 2017-01-16 | 2024-03-26 | 苹果公司 | 在同一基板上组合不同散度的发光元件 |
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JP7056511B2 (ja) * | 2018-10-25 | 2022-04-19 | 住友電気工業株式会社 | 面発光レーザの製造方法 |
CN113875104A (zh) * | 2019-01-17 | 2021-12-31 | 阵列光子学公司 | Vcsel空间模式和输出光束的控制 |
KR102518449B1 (ko) | 2019-02-21 | 2023-04-05 | 애플 인크. | 유전체 dbr을 갖는 인듐 인화물 vcsel |
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CN110957635B (zh) * | 2020-02-25 | 2020-09-01 | 常州纵慧芯光半导体科技有限公司 | 一种实现偏振控制的vcsel器件及其制备方法 |
CN114583550A (zh) * | 2022-03-02 | 2022-06-03 | 深圳博升光电科技有限公司 | 垂直腔面发射激光器及具有其的电子设备、制造方法 |
CN117913659B (zh) * | 2024-03-18 | 2024-06-07 | 江西德瑞光电技术有限责任公司 | 一种vcsel芯片及其制备方法、vcsel激光器 |
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JP4347369B2 (ja) * | 2007-07-31 | 2009-10-21 | キヤノン株式会社 | 面発光レーザの製造方法 |
JP5137514B2 (ja) * | 2007-09-27 | 2013-02-06 | キヤノン株式会社 | 2次元面発光レーザアレイ |
JP4709259B2 (ja) | 2007-10-12 | 2011-06-22 | キヤノン株式会社 | 面発光レーザ |
JP5171318B2 (ja) | 2008-03-05 | 2013-03-27 | キヤノン株式会社 | 面発光レーザアレイ |
JP5388666B2 (ja) * | 2008-04-21 | 2014-01-15 | キヤノン株式会社 | 面発光レーザ |
JP4639249B2 (ja) * | 2008-07-31 | 2011-02-23 | キヤノン株式会社 | 面発光レーザの製造方法及び面発光レーザアレイの製造方法、面発光レーザ及び面発光レーザアレイ、面発光レーザアレイを備えている光学機器 |
JP5106487B2 (ja) * | 2008-07-31 | 2012-12-26 | キヤノン株式会社 | 面発光レーザの製造方法及び面発光レーザアレイの製造方法、該製造方法による面発光レーザアレイを備えている光学機器 |
JP4872987B2 (ja) * | 2008-08-25 | 2012-02-08 | ソニー株式会社 | 面発光型半導体レーザ |
JP5038371B2 (ja) * | 2008-09-26 | 2012-10-03 | キヤノン株式会社 | 面発光レーザの製造方法 |
US8299351B2 (en) * | 2009-02-24 | 2012-10-30 | Hong Kong Applied Science And Technology Research Institute Co., Ltd. | Epitaxial growth of III-V compounds on (111) silicon for solar cells |
-
2008
- 2008-07-31 JP JP2008198951A patent/JP4639249B2/ja not_active Expired - Fee Related
-
2009
- 2009-07-27 US US12/509,635 patent/US7863061B2/en not_active Expired - Fee Related
- 2009-07-28 CN CN201110102885.2A patent/CN102208752B/zh not_active Expired - Fee Related
- 2009-07-28 AT AT09009750T patent/ATE515084T1/de not_active IP Right Cessation
- 2009-07-28 EP EP09009750A patent/EP2149945B1/de not_active Not-in-force
- 2009-07-28 CN CN2009101650152A patent/CN101640376B/zh not_active Expired - Fee Related
-
2010
- 2010-12-02 US US12/958,987 patent/US8068529B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP4639249B2 (ja) | 2011-02-23 |
US20100029027A1 (en) | 2010-02-04 |
CN101640376B (zh) | 2011-10-12 |
US20110076058A1 (en) | 2011-03-31 |
EP2149945B1 (de) | 2011-06-29 |
CN102208752A (zh) | 2011-10-05 |
EP2149945A1 (de) | 2010-02-03 |
CN101640376A (zh) | 2010-02-03 |
JP2010040600A (ja) | 2010-02-18 |
CN102208752B (zh) | 2013-06-12 |
US8068529B2 (en) | 2011-11-29 |
US7863061B2 (en) | 2011-01-04 |
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