ATE484840T1 - Verfahren und vorrichtung zur ausrichtung einer säule für strahlen geladener teilchen - Google Patents
Verfahren und vorrichtung zur ausrichtung einer säule für strahlen geladener teilchenInfo
- Publication number
- ATE484840T1 ATE484840T1 AT02016838T AT02016838T ATE484840T1 AT E484840 T1 ATE484840 T1 AT E484840T1 AT 02016838 T AT02016838 T AT 02016838T AT 02016838 T AT02016838 T AT 02016838T AT E484840 T1 ATE484840 T1 AT E484840T1
- Authority
- AT
- Austria
- Prior art keywords
- aligning
- column
- charged particle
- particle beams
- aperture
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
- H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical or photographic arrangements associated with the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/261—Details
- H01J37/263—Contrast, resolution or power of penetration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/261—Details
- H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/045—Diaphragms
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/15—Means for deflecting or directing discharge
- H01J2237/1501—Beam alignment means or procedures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/153—Correcting image defects, e.g. stigmators
- H01J2237/1532—Astigmatism
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/21—Focus adjustment
- H01J2237/216—Automatic focusing methods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/22—Treatment of data
- H01J2237/221—Image processing
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
- Electron Beam Exposure (AREA)
- Measurement Of Radiation (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US32845201P | 2001-10-10 | 2001-10-10 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE484840T1 true ATE484840T1 (de) | 2010-10-15 |
Family
ID=23281045
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT02016839T ATE453205T1 (de) | 2001-10-10 | 2002-07-29 | Verfahren und vorrichtung zur automatischen bilderzeugung geeignet zur ausrichtung einer geladenen teilchen strahlsäule |
AT02016838T ATE484840T1 (de) | 2001-10-10 | 2002-07-29 | Verfahren und vorrichtung zur ausrichtung einer säule für strahlen geladener teilchen |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT02016839T ATE453205T1 (de) | 2001-10-10 | 2002-07-29 | Verfahren und vorrichtung zur automatischen bilderzeugung geeignet zur ausrichtung einer geladenen teilchen strahlsäule |
Country Status (6)
Country | Link |
---|---|
US (3) | US7335893B2 (de) |
EP (2) | EP1306878B1 (de) |
JP (1) | JP4928506B2 (de) |
CN (1) | CN100397549C (de) |
AT (2) | ATE453205T1 (de) |
DE (2) | DE60237952D1 (de) |
Families Citing this family (44)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020176113A1 (en) * | 2000-09-21 | 2002-11-28 | Edgar Albert D. | Dynamic image correction and imaging systems |
ATE453205T1 (de) * | 2001-10-10 | 2010-01-15 | Applied Materials Israel Ltd | Verfahren und vorrichtung zur automatischen bilderzeugung geeignet zur ausrichtung einer geladenen teilchen strahlsäule |
CN100524601C (zh) * | 2001-10-10 | 2009-08-05 | 应用材料以色列有限公司 | 对准带电颗粒束列的方法与装置 |
EP1489641B1 (de) * | 2003-06-18 | 2019-08-14 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Ablenksystem für geladene Teilchen |
JP4111908B2 (ja) * | 2003-12-15 | 2008-07-02 | 株式会社日立ハイテクノロジーズ | 走査電子顕微鏡 |
DE602004031817D1 (de) | 2004-01-21 | 2011-04-28 | Integrated Circuit Testing | Strahlenoptische Komponente mit einer teilchenoptischen Linse |
JP4351108B2 (ja) * | 2004-04-07 | 2009-10-28 | 日本電子株式会社 | Semの収差自動補正方法及び収差自動補正装置 |
JP4383950B2 (ja) * | 2004-04-23 | 2009-12-16 | 株式会社日立ハイテクノロジーズ | 荷電粒子線調整方法、及び荷電粒子線装置 |
JP4522203B2 (ja) * | 2004-09-14 | 2010-08-11 | 日本電子株式会社 | 荷電粒子ビーム装置の色収差補正方法及び装置並びに荷電粒子ビーム装置 |
US7492057B2 (en) * | 2004-11-10 | 2009-02-17 | Baldwin Mark H | High reliability DC power distribution system |
JP2006173038A (ja) * | 2004-12-20 | 2006-06-29 | Hitachi High-Technologies Corp | 荷電粒子線装置、試料像表示方法及びイメージシフト感度計測方法 |
JP4611755B2 (ja) * | 2005-01-13 | 2011-01-12 | 株式会社日立ハイテクノロジーズ | 走査電子顕微鏡及びその撮像方法 |
JP4652830B2 (ja) * | 2005-01-26 | 2011-03-16 | キヤノン株式会社 | 収差調整方法、デバイス製造方法及び荷電粒子線露光装置 |
US8026491B2 (en) * | 2006-03-08 | 2011-09-27 | Hitachi High-Technologies Corporation | Charged particle beam apparatus and method for charged particle beam adjustment |
JP4857101B2 (ja) * | 2006-12-21 | 2012-01-18 | 株式会社日立ハイテクノロジーズ | プローブ評価方法 |
US8345162B2 (en) * | 2007-07-31 | 2013-01-01 | Verint Systems Inc. | Systems and methods for triggering an out of focus alert |
JP5188846B2 (ja) * | 2008-03-10 | 2013-04-24 | 日本電子株式会社 | 走査型透過電子顕微鏡の収差補正装置及び収差補正方法 |
EP2308272B1 (de) * | 2008-07-28 | 2012-09-19 | Philips Intellectual Property & Standards GmbH | Verfahren und vorrichtung zur erzeugung von euv-strahlung oder weichen röntgenstrahlen |
EP2166557A1 (de) * | 2008-09-22 | 2010-03-24 | FEI Company | Verfahren zur Berichtigung von Verzerrungen in einer teilchenoptischen Vorrichtung |
EP2228817B1 (de) * | 2009-03-09 | 2012-07-18 | IMS Nanofabrication AG | Allgemeine Punktverbreitungsfunktion bei Mehrstrahlenmusterung |
GB0912332D0 (en) * | 2009-07-16 | 2009-08-26 | Vg Systems Ltd | Magnetic lens,method for focussing charged particles and charged particle energy analyser |
EP2316799A1 (de) * | 2009-10-30 | 2011-05-04 | AGC Glass Europe | Beschichtetes Flachglas |
WO2012042738A1 (ja) * | 2010-09-30 | 2012-04-05 | 株式会社日立ハイテクノロジーズ | 走査電子顕微鏡 |
JP5537460B2 (ja) * | 2011-02-17 | 2014-07-02 | 株式会社日立ハイテクノロジーズ | 荷電粒子線顕微鏡及びそれを用いた計測画像の補正方法 |
EP2511936B1 (de) * | 2011-04-13 | 2013-10-02 | Fei Company | Verzerrungsfreie Stigmation eines TEM |
JP5386544B2 (ja) * | 2011-06-07 | 2014-01-15 | 株式会社アドバンテスト | 電子ビーム露光装置及び電子ビーム露光方法 |
US8507855B2 (en) * | 2011-07-28 | 2013-08-13 | Applied Materials Israel, Ltd. | Inductive modulation of focusing voltage in charged beam system |
JP5959320B2 (ja) * | 2012-05-31 | 2016-08-02 | 日本電子株式会社 | 荷電粒子ビームの軸合わせ方法および荷電粒子ビーム装置 |
US9002097B1 (en) * | 2013-02-26 | 2015-04-07 | Hermes Microvision Inc. | Method and system for enhancing image quality |
US9437394B1 (en) * | 2014-03-28 | 2016-09-06 | Carl Zeiss Microscopy Ltd. | Method of operating a charged particle microscope and charged particle microscope operating according to such method |
US10573489B2 (en) | 2016-01-29 | 2020-02-25 | Hitachi High-Technologies Corporation | Charged particle beam device and optical-axis adjusting method thereof |
US10460903B2 (en) * | 2016-04-04 | 2019-10-29 | Kla-Tencor Corporation | Method and system for charge control for imaging floating metal structures on non-conducting substrates |
JP6804043B2 (ja) * | 2016-10-21 | 2020-12-23 | コニカミノルタ株式会社 | 画像形成装置、画像形成システムおよび制御プログラム |
US10790114B2 (en) * | 2017-06-29 | 2020-09-29 | Kla-Tencor Corporation | Scanning electron microscope objective lens calibration using X-Y voltages iteratively determined from images obtained using said voltages |
DE102017220398B3 (de) | 2017-11-15 | 2019-02-28 | Carl Zeiss Microscopy Gmbh | Verfahren zum Justieren eines Teilchenstrahlmikroskops |
JP6953324B2 (ja) * | 2018-02-07 | 2021-10-27 | Tasmit株式会社 | 走査電子顕微鏡のオートフォーカス方法 |
DE102018010335B3 (de) | 2018-02-22 | 2023-08-10 | Carl Zeiss Microscopy Gmbh | Verfahren zum Betrieb eines Teilchenstrahlgeräts, Computerprogrammprodukt und Teilchenstrahlgerät zur Durchführung des Verfahrens |
DE102018202728B4 (de) * | 2018-02-22 | 2019-11-21 | Carl Zeiss Microscopy Gmbh | Verfahren zum Betrieb eines Teilchenstrahlgeräts, Computerprogrammprodukt und Teilchenstrahlgerät zur Durchführung des Verfahrens |
JP7040199B2 (ja) * | 2018-03-26 | 2022-03-23 | 株式会社島津製作所 | 荷電粒子ビーム軸合わせ装置、荷電粒子ビーム照射装置および荷電粒子ビーム軸合わせ方法 |
EP3651182A1 (de) * | 2018-11-12 | 2020-05-13 | FEI Company | Ladungsteilchenmikroskop zur untersuchung einer probe und verfahren zur bestimmung einer aberration des ladungsteilchenmikroskops |
US11086118B2 (en) * | 2019-04-29 | 2021-08-10 | Molecular Devices, Llc | Self-calibrating and directional focusing systems and methods for infinity corrected microscopes |
JP7308581B2 (ja) * | 2019-10-18 | 2023-07-14 | 株式会社日立ハイテクサイエンス | 荷電粒子ビーム装置、複合荷電粒子ビーム装置、及び荷電粒子ビーム装置の制御方法 |
NL2024065B1 (en) * | 2019-10-21 | 2021-06-22 | Univ Delft Tech | Multi-beam charged particle source with alignment means |
JP7431136B2 (ja) * | 2020-10-09 | 2024-02-14 | 株式会社日立ハイテク | 荷電粒子線装置、及び制御方法 |
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ATE453205T1 (de) * | 2001-10-10 | 2010-01-15 | Applied Materials Israel Ltd | Verfahren und vorrichtung zur automatischen bilderzeugung geeignet zur ausrichtung einer geladenen teilchen strahlsäule |
US7539340B2 (en) * | 2003-04-25 | 2009-05-26 | Topcon Corporation | Apparatus and method for three-dimensional coordinate measurement |
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JP4587742B2 (ja) * | 2004-08-23 | 2010-11-24 | 株式会社日立ハイテクノロジーズ | 荷電粒子線顕微方法及び荷電粒子線応用装置 |
JP4708856B2 (ja) * | 2005-05-16 | 2011-06-22 | 株式会社日立ハイテクノロジーズ | 電子ビーム校正方法及び電子ビーム装置 |
-
2002
- 2002-07-29 AT AT02016839T patent/ATE453205T1/de not_active IP Right Cessation
- 2002-07-29 EP EP02016838A patent/EP1306878B1/de not_active Expired - Lifetime
- 2002-07-29 EP EP02016839A patent/EP1302971B1/de not_active Expired - Lifetime
- 2002-07-29 DE DE60237952T patent/DE60237952D1/de not_active Expired - Lifetime
- 2002-07-29 AT AT02016838T patent/ATE484840T1/de not_active IP Right Cessation
- 2002-07-29 DE DE60234802T patent/DE60234802D1/de not_active Expired - Lifetime
- 2002-10-04 US US10/492,257 patent/US7335893B2/en not_active Expired - Lifetime
- 2002-10-04 US US10/492,574 patent/US7271396B2/en not_active Expired - Lifetime
- 2002-10-09 CN CNB028246330A patent/CN100397549C/zh not_active Expired - Lifetime
-
2007
- 2007-03-22 US US11/689,870 patent/US7385205B2/en not_active Expired - Lifetime
-
2008
- 2008-07-11 JP JP2008181754A patent/JP4928506B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE60234802D1 (de) | 2010-02-04 |
EP1302971A2 (de) | 2003-04-16 |
EP1306878B1 (de) | 2010-10-13 |
EP1306878A2 (de) | 2003-05-02 |
EP1306878A3 (de) | 2006-04-19 |
JP2008300358A (ja) | 2008-12-11 |
JP4928506B2 (ja) | 2012-05-09 |
ATE453205T1 (de) | 2010-01-15 |
US20070235659A1 (en) | 2007-10-11 |
US20050006598A1 (en) | 2005-01-13 |
US20050012050A1 (en) | 2005-01-20 |
US7271396B2 (en) | 2007-09-18 |
EP1302971A3 (de) | 2006-04-19 |
EP1302971B1 (de) | 2009-12-23 |
US7385205B2 (en) | 2008-06-10 |
CN100397549C (zh) | 2008-06-25 |
CN1602537A (zh) | 2005-03-30 |
US7335893B2 (en) | 2008-02-26 |
DE60237952D1 (de) | 2010-11-25 |
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