ATE445579T1 - Synthetisches quarzglas für optisches element, projektionsbelichtungsvorrichtung und projektionsbelichtungsverfahren - Google Patents

Synthetisches quarzglas für optisches element, projektionsbelichtungsvorrichtung und projektionsbelichtungsverfahren

Info

Publication number
ATE445579T1
ATE445579T1 AT03719187T AT03719187T ATE445579T1 AT E445579 T1 ATE445579 T1 AT E445579T1 AT 03719187 T AT03719187 T AT 03719187T AT 03719187 T AT03719187 T AT 03719187T AT E445579 T1 ATE445579 T1 AT E445579T1
Authority
AT
Austria
Prior art keywords
projection exposure
quartz glass
synthetic quartz
optical element
exposure apparatus
Prior art date
Application number
AT03719187T
Other languages
English (en)
Inventor
Yoshiaki Ikuta
N Agata
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Application granted granted Critical
Publication of ATE445579T1 publication Critical patent/ATE445579T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Glass Compositions (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Surface Treatment Of Glass (AREA)
  • Projection-Type Copiers In General (AREA)
AT03719187T 2002-04-23 2003-04-23 Synthetisches quarzglas für optisches element, projektionsbelichtungsvorrichtung und projektionsbelichtungsverfahren ATE445579T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002120805 2002-04-23
PCT/JP2003/005193 WO2003091175A1 (fr) 2002-04-23 2003-04-23 Verre de quartz synthetique pour element optique, dispositif de projection et procede de projection

Publications (1)

Publication Number Publication Date
ATE445579T1 true ATE445579T1 (de) 2009-10-15

Family

ID=29267384

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03719187T ATE445579T1 (de) 2002-04-23 2003-04-23 Synthetisches quarzglas für optisches element, projektionsbelichtungsvorrichtung und projektionsbelichtungsverfahren

Country Status (9)

Country Link
US (1) US7368403B2 (de)
EP (1) EP1498394B1 (de)
JP (1) JPWO2003091175A1 (de)
KR (1) KR100952093B1 (de)
CN (1) CN100389085C (de)
AT (1) ATE445579T1 (de)
AU (1) AU2003235105A1 (de)
DE (1) DE60329671D1 (de)
WO (1) WO2003091175A1 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1498394B1 (de) 2002-04-23 2009-10-14 Asahi Glass Company Ltd. Synthetisches quarzglas für optisches element, projektionsbelichtungsvorrichtung und projektionsbelichtungsverfahren
JP4470479B2 (ja) * 2003-12-17 2010-06-02 旭硝子株式会社 光学部材用合成石英ガラスおよびその製造方法
US6992753B2 (en) * 2003-12-24 2006-01-31 Carl Zeiss Smt Ag Projection optical system
WO2005105685A1 (en) * 2004-04-28 2005-11-10 Asahi Glass Company, Limited Optical member made of synthetic quartz glass, and process for its production
WO2006136184A1 (de) * 2005-06-21 2006-12-28 Carl Zeiss Smt Ag Projektionsobjektiv für die mikrolithographie und abschlusselement dafür
WO2007086617A1 (en) * 2006-01-30 2007-08-02 Asahi Glass Co., Ltd. Synthetic quartz glass with fast axes of birefringence distributed in concentric-circle tangent directions and process for producing the same
JP4316589B2 (ja) 2006-06-16 2009-08-19 東京電波株式会社 人工水晶部材およびその製造方法、ならびにそれを用いた光学素子
US9034539B2 (en) * 2010-06-28 2015-05-19 Carl Zeiss Sms Gmbh Controllable transmission and phase compensation of transparent material
JP2012145869A (ja) * 2011-01-14 2012-08-02 Hitachi High-Technologies Corp 露光方法及びその装置
JP6039207B2 (ja) * 2012-03-23 2016-12-07 Hoya株式会社 Ｅｕｖリソグラフィー用多層反射膜付き基板の製造方法及びｅｕｖリソグラフィー用反射型マスクブランクの製造方法、ｅｕｖリソグラフィー用反射型マスクの製造方法、及び半導体装置の製造方法
KR101831383B1 (ko) * 2013-05-21 2018-02-22 에이에스엠엘 네델란즈 비.브이. 검사 방법 및 장치, 검사 방법 및 장치에서 사용되는 기판, 및 디바이스 제조 방법
CN110198918A (zh) * 2017-01-16 2019-09-03 Ａｇｃ株式会社 石英玻璃和使用该石英玻璃的紫外线发光元件用构件

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2784708B2 (ja) * 1992-12-28 1998-08-06 信越石英株式会社 エキシマレーザー用光学石英ガラス部材及びその製造方法
JP3451604B2 (ja) * 1994-06-17 2003-09-29 株式会社ニコン 走査型露光装置
JP3274954B2 (ja) * 1995-08-18 2002-04-15 住友金属工業株式会社 光学用合成石英ガラス材及びその製造方法
JP3188624B2 (ja) * 1995-12-27 2001-07-16 信越石英株式会社 遠紫外線用高純度合成シリカガラス及びその製造方法
IL132431A0 (en) * 1997-04-18 2001-03-19 Nikon Corp Method and device for exposure control method and device for exposure and method of manufacture of device
JP3716574B2 (ja) * 1997-10-07 2005-11-16 株式会社ニコン エキシマレーザ照射に対する光学部材の耐久性予測方法及び石英ガラス光学部材の選択方法
US6499317B1 (en) * 1998-10-28 2002-12-31 Asahi Glass Company, Limited Synthetic quartz glass and method for production thereof
JP3654500B2 (ja) * 1998-12-26 2005-06-02 信越石英株式会社 Ｆ２エキシマレーザー光学部材用石英ガラス材料及び光学部材
KR100667636B1 (ko) * 1999-06-10 2007-01-12 아사히 가라스 가부시키가이샤 합성석영유리와 그의 제조방법
JP2001110710A (ja) * 1999-10-08 2001-04-20 Nikon Corp 露光装置、露光方法、および半導体デバイスの製造方法
JP3069562B1 (ja) * 1999-10-19 2000-07-24 信越石英株式会社 エキシマレ―ザ及びエキシマランプ用のシリカガラス光学材料及びその製造方法
JP3228732B2 (ja) * 1999-11-24 2001-11-12 信越石英株式会社 真空紫外線リソグラフィーに用いられる投影レンズ用シリカガラス光学材料の製造方法
JP2001270731A (ja) * 2000-03-28 2001-10-02 Nikon Corp 合成石英ガラス部材及びこれを用いた光リソグラフィー装置
JP4763877B2 (ja) * 2000-05-29 2011-08-31 信越石英株式会社 Ｆ２エキシマレーザー用合成石英ガラス光学材料及び光学部材
WO2002021217A1 (en) * 2000-09-08 2002-03-14 Corning Incorporated Vacuum ultraviolet transmitting direct deposit vitrified silicon oxyfluoride lithography glass photomask blanks
CN1226212C (zh) * 2001-04-19 2005-11-09 株式会社尼康 石英玻璃元件和投影曝光装置
DE10159962A1 (de) * 2001-12-06 2003-07-03 Heraeus Quarzglas Quarzglasrohling für ein optisches Bauteil sowie Verfahren zur Herstellung und Verwendung desselben
EP1498394B1 (de) 2002-04-23 2009-10-14 Asahi Glass Company Ltd. Synthetisches quarzglas für optisches element, projektionsbelichtungsvorrichtung und projektionsbelichtungsverfahren
JP4470479B2 (ja) 2003-12-17 2010-06-02 旭硝子株式会社 光学部材用合成石英ガラスおよびその製造方法

Also Published As

Publication number Publication date
CN100389085C (zh) 2008-05-21
JPWO2003091175A1 (ja) 2005-09-02
AU2003235105A1 (en) 2003-11-10
CN1646440A (zh) 2005-07-27
EP1498394B1 (de) 2009-10-14
EP1498394A4 (de) 2006-06-07
WO2003091175A1 (fr) 2003-11-06
DE60329671D1 (de) 2009-11-26
KR100952093B1 (ko) 2010-04-13
US7368403B2 (en) 2008-05-06
US20050068644A1 (en) 2005-03-31
EP1498394A1 (de) 2005-01-19
KR20040104541A (ko) 2004-12-10

Similar Documents

Publication Publication Date Title
ATE445579T1 (de) Synthetisches quarzglas für optisches element, projektionsbelichtungsvorrichtung und projektionsbelichtungsverfahren
DK1079868T3 (da) Indretning til inaktivering af kontaminater i en biologisk væske
EP0835848A3 (de) Fluor enthaltendes Silicaglas, sein Herstellungsverfahren und ein dieses Glas enthaltender Projektionsbelichtungsapparat
HK1133091A1 (en) Exposure apparatus
HK1086888A1 (en) Method of fixing optical member and optical unit
JP2004511092A5 (de)
ATE83156T1 (de) Vorrichtung zur bestrahlung von medien mittels uv-licht.
ATE354548T1 (de) Optischer werkstoff aus quarzglas für excimer laser und excimer lampe, und verfahren zu dessen herstellung
DE60321723D1 (de) Optische wellenleitervorrichtung, kohärente lichtquelle und optisches gerät, welche die genannte optische wellenleitervorrichtung verwenden
EP1632810A3 (de) Belichtungsgerät und Belichtungsverfahren
ATE372306T1 (de) Quarzglaselemente für excimer-laser und verfahren zu deren herstellung
ATE439618T1 (de) Membranabdeckung und haftmittel hierfür
DE60035142D1 (de) Künstlich hergestelltes Quarzglaselement zur Anwendung in ArF-excimer-Laserlithographie
DK1084080T4 (da) Fremgangsmåde til forhindring af opformering af Cryptosporidium parvum under anvendelse af ultraviolet lys
DE60239921D1 (de) Ür eine projektionsvorrichtung
ATE333206T1 (de) Methode zum stoppen von ionen und verunreinigungen in plasma-strahlungquellen im extremem-ultaviolett oder weichen röntgenbereich durch verwendung von krypton
WO2006041544A3 (en) Solid immersion lens lithography
EP1652972A4 (de) Element aus künstlichem kristall, expositionssystem und herstellungsverfahren für das expositionssystem
EP1207141A4 (de) Synthetisches quarzglasselement, photolithographischer apparat und verfahren zur herstellung des photolithographischen apparates.
EP1172670A3 (de) Optisches Element mit optischer Beschichtung und Ultraviolett Belichtungsgerät
DE60327333D1 (de) Uv-durchlässige fluorpolymere und durch deren verwendung hergestellte pellikel
ATE447201T1 (de) Dauerhaftes optisches system für einen projektionsbelichtingsapparat und verfahren zu dessen herstellung
EP1493719A4 (de) Synthetisches quarzglas
DE602004022451D1 (de) Pellikel und neues fluoriertes polymer
ATE467901T1 (de) Optisches beleuchtungssystem, belichtungssystem und belichtungsverfahren

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties