ATE372306T1 - Quarzglaselemente für excimer-laser und verfahren zu deren herstellung - Google Patents
Quarzglaselemente für excimer-laser und verfahren zu deren herstellungInfo
- Publication number
- ATE372306T1 ATE372306T1 AT00305786T AT00305786T ATE372306T1 AT E372306 T1 ATE372306 T1 AT E372306T1 AT 00305786 T AT00305786 T AT 00305786T AT 00305786 T AT00305786 T AT 00305786T AT E372306 T1 ATE372306 T1 AT E372306T1
- Authority
- AT
- Austria
- Prior art keywords
- excimer laser
- quartz glass
- production
- glass elements
- transmittance
- Prior art date
Links
- 238000002834 transmittance Methods 0.000 abstract 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 1
- 230000008033 biological extinction Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
- C03B19/1423—Reactant deposition burners
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/04—Multi-nested ports
- C03B2207/06—Concentric circular ports
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/20—Specific substances in specified ports, e.g. all gas flows specified
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
- C03B2207/32—Non-halide
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/36—Fuel or oxidant details, e.g. flow rate, flow rate ratio, fuel additives
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/80—Feeding the burner or the burner-heated deposition site
- C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
- C03B2207/86—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid by bubbling a gas through the liquid
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/40—Gas-phase processes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Geochemistry & Mineralogy (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Epidemiology (AREA)
- Environmental & Geological Engineering (AREA)
- Thermal Sciences (AREA)
- Public Health (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Glass Compositions (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Glass Melting And Manufacturing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19335399A JP2001019465A (ja) | 1999-07-07 | 1999-07-07 | エキシマレーザ用合成石英ガラス部材及びその製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE372306T1 true ATE372306T1 (de) | 2007-09-15 |
Family
ID=16306505
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT00305786T ATE372306T1 (de) | 1999-07-07 | 2000-07-07 | Quarzglaselemente für excimer-laser und verfahren zu deren herstellung |
Country Status (5)
Country | Link |
---|---|
US (1) | US6541405B1 (de) |
EP (1) | EP1067096B1 (de) |
JP (1) | JP2001019465A (de) |
AT (1) | ATE372306T1 (de) |
DE (1) | DE60036252T2 (de) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6410192B1 (en) | 1999-11-15 | 2002-06-25 | Corning Incorporated | Photolithography method, photolithography mask blanks, and method of making |
US6317209B1 (en) | 1999-12-09 | 2001-11-13 | Corning Incorporated | Automated system for measurement of an optical property |
JP3865039B2 (ja) * | 2000-08-18 | 2007-01-10 | 信越化学工業株式会社 | 合成石英ガラスの製造方法および合成石英ガラス並びに合成石英ガラス基板 |
WO2003027035A1 (en) * | 2001-09-27 | 2003-04-03 | Corning Incorporated | Fused silica having high internal transmission and low birefringence |
US20040162211A1 (en) * | 2001-09-27 | 2004-08-19 | Domey Jeffrey J. | Fused silica having high internal transmission and low birefringence |
EP1319637A3 (de) * | 2001-12-11 | 2004-01-28 | Shin-Etsu Chemical Co., Ltd. | Ein Rohling aus Quarzglas |
JP4158009B2 (ja) * | 2001-12-11 | 2008-10-01 | 信越化学工業株式会社 | 合成石英ガラスインゴット及び合成石英ガラスの製造方法 |
JP4017863B2 (ja) | 2001-12-18 | 2007-12-05 | 信越石英株式会社 | アニール炉及び光学用合成石英ガラスの製造方法 |
DE50312961D1 (de) * | 2002-03-01 | 2010-09-23 | Schott Ag | Verfahren zu Herstellung von Quarzglas und einer Quarzglasvorform |
WO2003080525A1 (fr) * | 2002-03-25 | 2003-10-02 | Nikon Corporation | Element de verre de quartz synthetique et procede de production de celui-ci |
JP2005255423A (ja) | 2004-03-09 | 2005-09-22 | Asahi Glass Co Ltd | 合成石英ガラス製フォトマスク基板およびフォトマスク |
JP4692745B2 (ja) * | 2005-02-25 | 2011-06-01 | 株式会社ニコン | マスク基板、フォトマスク、露光方法、露光装置の管理方法、及びデバイス製造方法 |
JP2008063181A (ja) * | 2006-09-07 | 2008-03-21 | Shin Etsu Chem Co Ltd | エキシマレーザー用合成石英ガラス基板及びその製造方法 |
WO2009007977A2 (en) * | 2007-07-12 | 2009-01-15 | Pixer Technology Ltd. | Method and apparatus for duv transmission mapping |
JP2021067908A (ja) * | 2019-10-28 | 2021-04-30 | Hoya株式会社 | マスクブランク、転写用マスク、及び半導体デバイスの製造方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51102014A (en) | 1974-11-01 | 1976-09-09 | Komatsu Denshi Kinzoku Kk | Kojundotomeigarasutaino seizohoho |
US5086352A (en) | 1989-06-09 | 1992-02-04 | Shin-Etsu Quartz Products Co., Ltd. | Optical members and blanks or synthetic silica glass and method for their production |
JP2881930B2 (ja) * | 1990-03-28 | 1999-04-12 | 三菱マテリアル株式会社 | 光伝送用石英ガラスの製造方法 |
JP3114979B2 (ja) | 1990-04-05 | 2000-12-04 | 信越化学工業株式会社 | 合成石英ガラス部材およびその製造方法 |
JP3007510B2 (ja) | 1993-04-27 | 2000-02-07 | 信越化学工業株式会社 | 合成石英ガラス部材の製造方法 |
DE69806672T2 (de) | 1997-04-08 | 2003-03-20 | Shin-Etsu Chemical Co., Ltd. | Optisches synthetisches Quarzglas, Herstellungsverfahren davon, und optisches Element für Excimer-Laser mit dem synthetischen Quarzglas |
TW440548B (en) | 1997-05-14 | 2001-06-16 | Nippon Kogaku Kk | Synthetic silica glass optical member and method of manufacturing the same |
EP0917523B1 (de) * | 1997-05-20 | 2003-07-30 | Heraeus Quarzglas GmbH & Co. KG | Synthetisches quarzglas zur verwendung in uv-strahlung und verfahren zu seiner herstellung |
EP0978487A3 (de) | 1998-08-07 | 2001-02-21 | Corning Incorporated | Brenner mit abgedichtetem Kopf und ohne Vormischung für die Abscheidung von Quarzglas |
ES2248961T3 (es) | 1998-12-28 | 2006-03-16 | PIRELLI & C. S.P.A. | Procedimieto para la produccion de silice mediante descomposicion de un organolsilano. |
US6649268B1 (en) | 1999-03-10 | 2003-11-18 | Nikon Corporation | Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical member |
JP2001010833A (ja) | 1999-06-21 | 2001-01-16 | Nikon Corp | 石英ガラス部材 |
-
1999
- 1999-07-07 JP JP19335399A patent/JP2001019465A/ja active Pending
-
2000
- 2000-07-06 US US09/610,860 patent/US6541405B1/en not_active Expired - Lifetime
- 2000-07-07 AT AT00305786T patent/ATE372306T1/de not_active IP Right Cessation
- 2000-07-07 DE DE60036252T patent/DE60036252T2/de not_active Expired - Lifetime
- 2000-07-07 EP EP00305786A patent/EP1067096B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP1067096A2 (de) | 2001-01-10 |
US6541405B1 (en) | 2003-04-01 |
EP1067096A3 (de) | 2001-10-17 |
DE60036252T2 (de) | 2008-06-05 |
DE60036252D1 (de) | 2007-10-18 |
JP2001019465A (ja) | 2001-01-23 |
EP1067096B1 (de) | 2007-09-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |