ATE386830T1 - Niedrigtemperaturverfahren zur herstellung einer antireflexionsbeschichtung - Google Patents

Niedrigtemperaturverfahren zur herstellung einer antireflexionsbeschichtung

Info

Publication number
ATE386830T1
ATE386830T1 AT01998671T AT01998671T ATE386830T1 AT E386830 T1 ATE386830 T1 AT E386830T1 AT 01998671 T AT01998671 T AT 01998671T AT 01998671 T AT01998671 T AT 01998671T AT E386830 T1 ATE386830 T1 AT E386830T1
Authority
AT
Austria
Prior art keywords
sub
producing
low temperature
temperature process
antireflection coating
Prior art date
Application number
AT01998671T
Other languages
English (en)
Inventor
Yvon Helmstetter
Jean-Daniel Bernhard
Frederic Arrouy
Original Assignee
Essilor Int
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Essilor Int filed Critical Essilor Int
Application granted granted Critical
Publication of ATE386830T1 publication Critical patent/ATE386830T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • G02B1/116—Multilayers including electrically conducting layers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0694—Halides
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Eyeglasses (AREA)
  • Paints Or Removers (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
AT01998671T 2000-11-28 2001-11-26 Niedrigtemperaturverfahren zur herstellung einer antireflexionsbeschichtung ATE386830T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0015334A FR2817267B1 (fr) 2000-11-28 2000-11-28 Procede de depot de couche anti-reflets a froid sur substrat organique

Publications (1)

Publication Number Publication Date
ATE386830T1 true ATE386830T1 (de) 2008-03-15

Family

ID=8856948

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01998671T ATE386830T1 (de) 2000-11-28 2001-11-26 Niedrigtemperaturverfahren zur herstellung einer antireflexionsbeschichtung

Country Status (14)

Country Link
US (1) US7175878B2 (de)
EP (1) EP1339893B1 (de)
JP (1) JP2004514939A (de)
KR (1) KR100845244B1 (de)
CN (1) CN1239733C (de)
AT (1) ATE386830T1 (de)
AU (2) AU2002222043B2 (de)
BR (1) BR0115898B1 (de)
CA (1) CA2429150C (de)
DE (1) DE60132914T2 (de)
ES (1) ES2301578T3 (de)
FR (1) FR2817267B1 (de)
PT (1) PT1339893E (de)
WO (1) WO2002044440A1 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3555844B2 (ja) 1999-04-09 2004-08-18 三宅 正二郎 摺動部材およびその製造方法
US6969198B2 (en) 2002-11-06 2005-11-29 Nissan Motor Co., Ltd. Low-friction sliding mechanism
JP4863152B2 (ja) 2003-07-31 2012-01-25 日産自動車株式会社 歯車
US7771821B2 (en) 2003-08-21 2010-08-10 Nissan Motor Co., Ltd. Low-friction sliding member and low-friction sliding mechanism using same
FR2861182B1 (fr) * 2003-10-16 2006-02-03 Essilor Int Substrat organique transparent comprenant un empilement antireflet multicouches resistant a la temperature
JP5135753B2 (ja) * 2006-02-01 2013-02-06 セイコーエプソン株式会社 光学物品
FR2903197B1 (fr) * 2006-06-28 2009-01-16 Essilor Int Article d'optique revetu d'une sous-couche et d'un revetement anti-reflets multicouches resistant a la temperature, et procede de fabrication
FR2913116B1 (fr) * 2007-02-23 2009-08-28 Essilor Int Procede de fabrication d'un article optique revetu d'un revetement anti-reflets ou reflechissant ayant des proprietes d'adhesion et de resistance a l'abrasion ameliorees
US8318245B2 (en) 2007-02-23 2012-11-27 Essilor International (Compagnie Generale D'optique) Method for producing an optical article coated with an antireflection or a reflective coating having improved adhesion and abrasion resistance properties
JP5308640B2 (ja) * 2007-08-06 2013-10-09 Ｈｏｙａ株式会社 反射防止膜及びそれを用いた光学部材
JP4693836B2 (ja) * 2007-12-17 2011-06-01 日本電波工業株式会社 赤外線カットフィルタ及びその製造方法
US8691331B2 (en) * 2009-02-09 2014-04-08 Prashant D. Santan Surface modification of hydrophobic and/or oleophobic coatings
WO2012078197A1 (en) * 2010-01-22 2012-06-14 Oakley, Inc. Eyewear with three-dimensional viewing capability
US8547635B2 (en) * 2010-01-22 2013-10-01 Oakley, Inc. Lenses for 3D eyewear
US8883935B2 (en) 2010-04-29 2014-11-11 Battelle Memorial Institute High refractive index composition
JP5589581B2 (ja) * 2010-06-11 2014-09-17 コニカミノルタ株式会社 光学素子とその製造方法
FR2975507B1 (fr) * 2011-05-16 2014-01-10 Essilor Int Lentille ophtalmique anti-reflets et son procede de fabrication
JP5699364B2 (ja) * 2012-12-21 2015-04-08 株式会社麗光 高硬度ハードコートフイルム
CN103059617B (zh) * 2013-01-05 2015-07-22 江西安源光伏玻璃有限责任公司 一种纳米增透自洁镀膜液的制备方法
EP3346023A1 (de) * 2017-01-05 2018-07-11 Essilor International Verfahren zur schichtweisen optimierung einer dünnschicht

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3330681A (en) * 1963-07-15 1967-07-11 Eastman Kodak Co Low reflection coatings for plastics
JPS58167124A (ja) * 1982-03-29 1983-10-03 Nippon Oil & Fats Co Ltd プラスチツクレンズの製造法
JPS6022101A (ja) * 1983-07-18 1985-02-04 Matsushita Electric Ind Co Ltd プラスチツク製光学部品の反射防止膜
JPS60129702A (ja) * 1983-12-16 1985-07-11 Matsushita Electric Ind Co Ltd プラスチツクレンズの反射防止膜
JPS61250601A (ja) 1985-04-30 1986-11-07 Toray Ind Inc 反射防止性を有する光学材料およびその製造方法
US5783299A (en) * 1986-01-21 1998-07-21 Seiko Epson Corporation Polarizer plate with anti-stain layer
JPS62186203A (ja) * 1986-02-12 1987-08-14 Seiko Epson Corp プラスチツク製光学部品の反射防止膜
JPS63228101A (ja) * 1987-03-17 1988-09-22 Nippon Sheet Glass Co Ltd 防汚性を有する帯電防止無反射板
US5764416A (en) * 1988-04-19 1998-06-09 Litton Systems, Inc. Fault tolerant antireflective coatings
US5316791A (en) * 1993-01-21 1994-05-31 Sdc Coatings Inc. Process for improving impact resistance of coated plastic substrates
FR2702486B1 (fr) 1993-03-08 1995-04-21 Essilor Int Compositions de revêtement antiabrasion à base d'hydrolysats de silanes et de composés de l'aluminium, et articles revêtus correspondants résistants à l'abrasion et aux chocs.
EP0619504A1 (de) 1993-04-08 1994-10-12 Optische Werke G. Rodenstock Antireflex-Belag
JPH0727902A (ja) * 1993-07-13 1995-01-31 Dainippon Printing Co Ltd 反射防止フィルム及びその製造方法
JPH0776048A (ja) 1993-09-08 1995-03-20 Toray Ind Inc 成形体の製造方法
JP3433845B2 (ja) * 1994-08-02 2003-08-04 尾池工業株式会社 耐擦傷性と耐久性に優れた反射防止フィルム
JP3359178B2 (ja) 1995-02-22 2002-12-24 沖電気工業株式会社 半導体集積回路の配置配線方式
US5939189A (en) * 1995-05-09 1999-08-17 Flex Products, Inc. Flexible plastic substrate with anti-reflection coating having low reflective color and method
US5920431A (en) * 1996-06-27 1999-07-06 Konica Corporation Optical member having antireflection film thereon
JPH10123303A (ja) * 1996-10-18 1998-05-15 Victor Co Of Japan Ltd 反射防止光学部品
EP0947601A1 (de) 1998-03-26 1999-10-06 ESSILOR INTERNATIONAL Compagnie Générale d'Optique Organisches Substrat mit optischen Schichten hergestellt mittels Magnetron-Zerstäubung und Verfahren
JP3601580B2 (ja) * 1999-05-20 2004-12-15 信越化学工業株式会社 パーフルオロポリエーテル変性アミノシラン及び表面処理剤並びに該アミノシランの被膜が形成された物品
US6505935B2 (en) * 2000-07-21 2003-01-14 Abby Ayoub Optical lens coating and method

Also Published As

Publication number Publication date
FR2817267B1 (fr) 2003-08-29
AU2204302A (en) 2002-06-11
US20040067351A1 (en) 2004-04-08
BR0115898B1 (pt) 2011-09-20
KR20030057558A (ko) 2003-07-04
CA2429150A1 (en) 2002-06-06
FR2817267A1 (fr) 2002-05-31
CN1478154A (zh) 2004-02-25
BR0115898A (pt) 2003-11-04
KR100845244B1 (ko) 2008-07-10
CA2429150C (en) 2010-03-30
DE60132914T2 (de) 2009-03-12
EP1339893B1 (de) 2008-02-20
WO2002044440A1 (fr) 2002-06-06
JP2004514939A (ja) 2004-05-20
DE60132914D1 (de) 2008-04-03
PT1339893E (pt) 2008-05-13
US7175878B2 (en) 2007-02-13
ES2301578T3 (es) 2008-07-01
EP1339893A1 (de) 2003-09-03
AU2002222043B2 (en) 2006-10-12
CN1239733C (zh) 2006-02-01

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