ATE300757T1 - Datenspeichermedium das ein kolloidales metall enthält und verfahren zur herstellung - Google Patents
Datenspeichermedium das ein kolloidales metall enthält und verfahren zur herstellungInfo
- Publication number
- ATE300757T1 ATE300757T1 AT01939301T AT01939301T ATE300757T1 AT E300757 T1 ATE300757 T1 AT E300757T1 AT 01939301 T AT01939301 T AT 01939301T AT 01939301 T AT01939301 T AT 01939301T AT E300757 T1 ATE300757 T1 AT E300757T1
- Authority
- AT
- Austria
- Prior art keywords
- data storage
- colloidal metal
- producing
- storage medium
- medium containing
- Prior art date
Links
- 238000013500 data storage Methods 0.000 title abstract 2
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 abstract 2
- 239000000654 additive Substances 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 238000006116 polymerization reaction Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
- G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/004—Recording, reproducing or erasing methods; Read, write or erase circuits therefor
- G11B7/0065—Recording, reproducing or erasing by using optical interference patterns, e.g. holograms
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Manufacturing & Machinery (AREA)
- Holo Graphy (AREA)
- Epoxy Resins (AREA)
- Optical Recording Or Reproduction (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US20637000P | 2000-05-23 | 2000-05-23 | |
PCT/US2001/016635 WO2001090817A2 (en) | 2000-05-23 | 2001-05-23 | Data storage medium comprising colloidal metal and preparation process thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE300757T1 true ATE300757T1 (de) | 2005-08-15 |
Family
ID=22766074
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT01939301T ATE300757T1 (de) | 2000-05-23 | 2001-05-23 | Datenspeichermedium das ein kolloidales metall enthält und verfahren zur herstellung |
Country Status (7)
Country | Link |
---|---|
US (3) | US7297448B2 (de) |
EP (1) | EP1292859B1 (de) |
JP (1) | JP2003534569A (de) |
AT (1) | ATE300757T1 (de) |
AU (1) | AU2001264832A1 (de) |
DE (1) | DE60112292T2 (de) |
WO (1) | WO2001090817A2 (de) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1598699A3 (de) | 2000-05-23 | 2009-05-20 | Aprilis, Inc. | Datenspeichermedium das ein kolloidales Metall enthält und Verfahren zur Herstellung |
WO2001090817A2 (en) * | 2000-05-23 | 2001-11-29 | Aprilis, Inc. | Data storage medium comprising colloidal metal and preparation process thereof |
JP2004507513A (ja) * | 2000-08-28 | 2004-03-11 | アプリリス,インコーポレイテッド | カチオン性重合を行いうる多官能エポキシモノマーを含むホログラフィー蓄積媒体 |
CA2431358A1 (en) * | 2000-12-11 | 2002-06-20 | Jsr Corporation | Radiation sensitive refractive index changing composition and refractive index changing method |
JP4821068B2 (ja) * | 2001-02-22 | 2011-11-24 | 大日本印刷株式会社 | 体積型ホログラム記録用感光性組成物及び体積型ホログラム記録用感光性媒体 |
WO2004038515A2 (en) | 2002-10-22 | 2004-05-06 | Zebra Imaging, Inc. | Active digital hologram display |
AU2003301206A1 (en) * | 2002-12-23 | 2004-07-22 | Aprilis, Inc. | Sensitizer dyes for photoacid generating systems |
JP2005309359A (ja) * | 2004-03-25 | 2005-11-04 | Fuji Photo Film Co Ltd | ホログラム記録材料、ホログラム記録方法、光記録媒体、3次元ディスプレイホログラムおよびホログラフィック光学素子。 |
JP4461902B2 (ja) | 2004-05-11 | 2010-05-12 | Tdk株式会社 | ホログラム記録材料及びホログラム記録媒体 |
US7122290B2 (en) * | 2004-06-15 | 2006-10-17 | General Electric Company | Holographic storage medium |
EP1869510B1 (de) * | 2005-03-16 | 2013-05-15 | General Electric Company | Datenspeichereinrichtung und -verfahren |
US8048981B2 (en) * | 2005-09-20 | 2011-11-01 | General Electric Company | Thermally curable compositions and method |
US7960092B2 (en) * | 2006-10-23 | 2011-06-14 | Sony Corporation | Method of recording in an optical information recording medium |
JP5408704B2 (ja) * | 2008-03-26 | 2014-02-05 | 国立大学法人電気通信大学 | 金属ナノ粒子−ジチオカルバメート基含有高分子複合体を含有する感光性組成物 |
GB0818556D0 (en) * | 2008-10-09 | 2008-11-19 | Cambridge Entpr Ltd | Method of production of a holographic sensor |
GB2476275A (en) | 2009-12-17 | 2011-06-22 | Dublin Inst Of Technology | Photosensitive holographic recording medium comprising glycerol |
JP5803401B2 (ja) * | 2011-08-05 | 2015-11-04 | Tdk株式会社 | ホログラム記録材料及びホログラム記録媒体 |
US10248020B2 (en) * | 2012-12-28 | 2019-04-02 | Rohm And Haas Electronic Materials Llc | Acid generators and photoresists comprising same |
JP7168446B2 (ja) | 2015-10-30 | 2022-11-09 | クアルコム,インコーポレイテッド | スケーラブルな無線周波数フロントエンドのためのビームフォーミングアーキテクチャ |
KR101999708B1 (ko) * | 2016-11-25 | 2019-07-12 | 주식회사 엘지화학 | 이온성 화합물, 이를 포함하는 코팅 조성물 및 유기 발광 소자 |
CN106739428B (zh) * | 2016-12-07 | 2018-12-14 | 武汉华工图像技术开发有限公司 | 一种全息金属模压母版的制作方法 |
US11619880B2 (en) * | 2019-05-17 | 2023-04-04 | The Regents Of The University Of Colorado | Holographic photopolymer compositions and composites |
DE102020115042B4 (de) | 2020-06-05 | 2023-12-07 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein | Verfahren und photosensitives Material zum Herstellen einer elektrisch leitenden Vorrichtung |
Family Cites Families (30)
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US3779758A (en) * | 1969-03-25 | 1973-12-18 | Photocircuits Corp | Photosensitive process for producing printed circuits employing electroless deposition |
US4252676A (en) * | 1979-12-04 | 1981-02-24 | Xerox Corporation | Preparation of colloidal group VII-A transition metal dispersions by the polymer-catalyzed decomposition of carbonyl and organocarbonyl compounds thereof |
US4252675A (en) * | 1979-12-04 | 1981-02-24 | Xerox Corporation | Preparation of colloidal group VI-A transition metal dispersions by the polymer-catalyzed decomposition of carbonyl compounds thereof |
US4252677A (en) * | 1979-12-04 | 1981-02-24 | Xerox Corporation | Preparation of colloidal dispersion of nickel, palladium and platinum by the polymer-catalyzed decomposition of carbonyl compounds thereof |
US4252678A (en) * | 1979-12-04 | 1981-02-24 | Xerox Corporation | Preparation of colloidal dispersions of ruthenium, rhodium, osmium and iridium by the polymer-catalyzed decomposition of carbonyl cluster compounds thereof |
JPS5898289A (ja) * | 1981-12-07 | 1983-06-11 | Konishiroku Photo Ind Co Ltd | 光学的情報記録媒体 |
CA1198556A (en) * | 1982-05-14 | 1985-12-31 | Martyn C. Barker | Compositions comprising inorganic particles |
JPS5933191A (ja) * | 1982-08-18 | 1984-02-22 | Konishiroku Photo Ind Co Ltd | 光学的情報記録媒体 |
JPS6263603A (ja) * | 1985-09-12 | 1987-03-20 | Mitsubishi Electric Corp | 光化学反応による金属コロイドの生成方法 |
JPH06102146B2 (ja) * | 1985-09-12 | 1994-12-14 | 三菱電機株式会社 | 光化学反応による金属コロイドの生成方法 |
FR2613372B1 (fr) * | 1987-04-03 | 1989-06-09 | Rhone Poulenc Chimie | Particules composites polymere/metal compactes, dispersions aqueuses desdites particules, leur procede de preparation et leur application en biologie |
FR2676438B1 (fr) * | 1991-05-17 | 1994-10-28 | Rhone Poulenc Chimie | Procede de dicarbonylation lineaire de butenes difonctionnalises. |
US6479193B1 (en) * | 1992-06-30 | 2002-11-12 | Nippon Sheet Glass Co., Ltd. | Optical recording film and process for production thereof |
US5273857A (en) * | 1992-11-24 | 1993-12-28 | Eastman Kodak Company | Laser-induced thermal dye transfer with silver plated colloids as the IP absorber |
EP0853774B1 (de) * | 1995-10-06 | 2001-11-07 | Polaroid Corporation | Halographisches aufzeichnungsmaterial und verfahren |
US5952421A (en) * | 1995-12-27 | 1999-09-14 | Exxon Research And Engineering Co. | Synthesis of preceramic polymer-stabilized metal colloids and their conversion to microporous ceramics |
US6030708A (en) * | 1996-10-28 | 2000-02-29 | Nissha Printing Co., Ltd. | Transparent shielding material for electromagnetic interference |
US20030157414A1 (en) * | 1997-11-13 | 2003-08-21 | Pradeep K. Dhal | Holographic medium and process for use thereof |
US6212148B1 (en) | 1998-01-30 | 2001-04-03 | Siros Technologies, Inc. | Optical data storage by selective localized alteration of a format hologram |
DE19821968A1 (de) * | 1998-05-18 | 1999-11-25 | Studiengesellschaft Kohle Mbh | Verfahren zur Modifizierung der Dispergiereigenschaften von metallorganisch-prästabilisierten bzw. -vorbehandelten Nanometallkolloiden |
US6399270B1 (en) * | 1998-12-04 | 2002-06-04 | Konica Corporation | Support for printing plate and printing plate |
US6030553A (en) * | 1999-04-01 | 2000-02-29 | Industrial Technology Research Institute | Polymer thick film resistor pastes |
WO2001009884A1 (en) * | 1999-07-29 | 2001-02-08 | Siros Technologies, Inc. | Optical data storage system and method |
US6512606B1 (en) * | 1999-07-29 | 2003-01-28 | Siros Technologies, Inc. | Optical storage media and method for optical data storage via local changes in reflectivity of a format grating |
CA2382082A1 (en) * | 1999-08-13 | 2001-02-22 | Mark L. Brongersma | Optoelectronic device and method utilizing nanometer-scale particles |
US6593388B2 (en) * | 2000-04-04 | 2003-07-15 | Renssealer Polytechnic Institute | Oligomeric and polymeric photosensitizers comprising a polynuclear aromatic group |
WO2001090817A2 (en) * | 2000-05-23 | 2001-11-29 | Aprilis, Inc. | Data storage medium comprising colloidal metal and preparation process thereof |
JP2004507513A (ja) * | 2000-08-28 | 2004-03-11 | アプリリス,インコーポレイテッド | カチオン性重合を行いうる多官能エポキシモノマーを含むホログラフィー蓄積媒体 |
EP1591097B1 (de) * | 2004-04-30 | 2012-06-20 | 3M Deutschland GmbH | Kationisch härtbare zwei-komponenten-Materialien enthaltend einen Edelmetallkatalysator |
US20070106012A1 (en) * | 2005-02-11 | 2007-05-10 | Krzysztof Matyjaszewski | Modified carbon particles |
-
2001
- 2001-05-23 WO PCT/US2001/016635 patent/WO2001090817A2/en active IP Right Grant
- 2001-05-23 JP JP2001586525A patent/JP2003534569A/ja active Pending
- 2001-05-23 AU AU2001264832A patent/AU2001264832A1/en not_active Abandoned
- 2001-05-23 AT AT01939301T patent/ATE300757T1/de not_active IP Right Cessation
- 2001-05-23 DE DE60112292T patent/DE60112292T2/de not_active Expired - Lifetime
- 2001-05-23 EP EP01939301A patent/EP1292859B1/de not_active Expired - Lifetime
-
2002
- 2002-11-20 US US10/300,700 patent/US7297448B2/en not_active Expired - Fee Related
-
2007
- 2007-10-16 US US11/974,781 patent/US20080044737A1/en not_active Abandoned
-
2009
- 2009-06-22 US US12/456,768 patent/US20090325079A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
EP1292859A2 (de) | 2003-03-19 |
WO2001090817A3 (en) | 2002-06-20 |
JP2003534569A (ja) | 2003-11-18 |
US20080044737A1 (en) | 2008-02-21 |
US20090325079A1 (en) | 2009-12-31 |
AU2001264832A1 (en) | 2001-12-03 |
DE60112292T2 (de) | 2006-06-01 |
US7297448B2 (en) | 2007-11-20 |
US20030152842A1 (en) | 2003-08-14 |
DE60112292D1 (de) | 2005-09-01 |
EP1292859B1 (de) | 2005-07-27 |
WO2001090817A2 (en) | 2001-11-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |