ATE277865T1 - Verfahren zur herstellung von mikrostrukturen mit verschiedenen oberflächeneigenschaften in einem multischichtkörper durch plasmaätzen - Google Patents
Verfahren zur herstellung von mikrostrukturen mit verschiedenen oberflächeneigenschaften in einem multischichtkörper durch plasmaätzenInfo
- Publication number
- ATE277865T1 ATE277865T1 AT01901108T AT01901108T ATE277865T1 AT E277865 T1 ATE277865 T1 AT E277865T1 AT 01901108 T AT01901108 T AT 01901108T AT 01901108 T AT01901108 T AT 01901108T AT E277865 T1 ATE277865 T1 AT E277865T1
- Authority
- AT
- Austria
- Prior art keywords
- surface properties
- plasma etching
- different surface
- layer body
- producing microstructures
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
- B01L3/50—Containers for the purpose of retaining a material to be analysed, e.g. test tubes
- B01L3/502—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures
- B01L3/5027—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip
- B01L3/502707—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip characterised by the manufacture of the container or its components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F33/00—Other mixers; Mixing plants; Combinations of mixers
- B01F33/30—Micromixers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
- B81C1/00119—Arrangement of basic structures like cavities or channels, e.g. suitable for microfluidic systems
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00206—Processes for functionalising a surface, e.g. provide the surface with specific mechanical, chemical or biological properties
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
- G01N27/416—Systems
- G01N27/447—Systems using electrophoresis
- G01N27/44756—Apparatus specially adapted therefor
- G01N27/44791—Microapparatus
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
- G01N30/02—Column chromatography
- G01N30/60—Construction of the column
- G01N30/6095—Micromachined or nanomachined, e.g. micro- or nanosize
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0041—Etching of the substrate by chemical or physical means by plasma etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00781—Aspects relating to microreactors
- B01J2219/00819—Materials of construction
- B01J2219/00824—Ceramic
- B01J2219/00828—Silicon wafers or plates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00781—Aspects relating to microreactors
- B01J2219/00851—Additional features
- B01J2219/00858—Aspects relating to the size of the reactor
- B01J2219/0086—Dimensions of the flow channels
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2200/00—Solutions for specific problems relating to chemical or physical laboratory apparatus
- B01L2200/12—Specific details about manufacturing devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
- B29C2059/023—Microembossing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- B29L2009/00—Layered products
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
- G01N30/02—Column chromatography
- G01N30/26—Conditioning of the fluid carrier; Flow patterns
- G01N30/28—Control of physical parameters of the fluid carrier
- G01N2030/285—Control of physical parameters of the fluid carrier electrically driven carrier
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0548—Masks
- H05K2203/0554—Metal used as mask for etching vias, e.g. by laser ablation
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/002—Etching of the substrate by chemical or physical means by liquid chemical etching
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
- H05K3/0032—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- General Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Molecular Biology (AREA)
- Dispersion Chemistry (AREA)
- Plasma & Fusion (AREA)
- Biochemistry (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Nanotechnology (AREA)
- Hematology (AREA)
- Clinical Laboratory Science (AREA)
- Electrochemistry (AREA)
- Apparatus Associated With Microorganisms And Enzymes (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Surface Treatment Of Glass (AREA)
- Physical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
- Micromachines (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US17933400P | 2000-01-31 | 2000-01-31 | |
PCT/CH2001/000070 WO2001056771A2 (en) | 2000-01-31 | 2001-01-30 | Method for fabricating micro-structures with various surface properties in multilayer body by plasma etching |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE277865T1 true ATE277865T1 (de) | 2004-10-15 |
Family
ID=22656136
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT01901108T ATE277865T1 (de) | 2000-01-31 | 2001-01-30 | Verfahren zur herstellung von mikrostrukturen mit verschiedenen oberflächeneigenschaften in einem multischichtkörper durch plasmaätzen |
Country Status (9)
Country | Link |
---|---|
US (1) | US7087181B2 (de) |
EP (1) | EP1255690B1 (de) |
AT (1) | ATE277865T1 (de) |
AU (1) | AU776266C (de) |
CA (1) | CA2399027C (de) |
DE (1) | DE60105979T2 (de) |
ES (1) | ES2225466T3 (de) |
PT (1) | PT1255690E (de) |
WO (1) | WO2001056771A2 (de) |
Families Citing this family (41)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100450818B1 (ko) * | 2002-03-09 | 2004-10-01 | 삼성전자주식회사 | 다챔버 pcr 칩 |
US7745203B2 (en) | 2002-07-31 | 2010-06-29 | Kabushiki Kaisha Toshiba | Base sequence detection apparatus and base sequence automatic analyzing apparatus |
JP4057967B2 (ja) * | 2002-07-31 | 2008-03-05 | 株式会社東芝 | 塩基配列自動解析装置 |
EP1548429A4 (de) * | 2002-09-05 | 2009-06-17 | Katayanagi Inst | Verfahren zum trennen von substanzen |
US7279134B2 (en) * | 2002-09-17 | 2007-10-09 | Intel Corporation | Microfluidic devices with porous membranes for molecular sieving, metering, and separations |
US6818964B2 (en) | 2002-09-30 | 2004-11-16 | The Regents Of The University Of California | Selectively-etched nanochannel electrophoretic and electrochemical devices |
US7034854B2 (en) * | 2002-11-12 | 2006-04-25 | Nanoink, Inc. | Methods and apparatus for ink delivery to nanolithographic probe systems |
US7012017B2 (en) | 2004-01-29 | 2006-03-14 | 3M Innovative Properties Company | Partially etched dielectric film with conductive features |
WO2005078118A1 (en) | 2004-02-06 | 2005-08-25 | Bayer Healthcare Llc | Oxidizable species as an internal reference for biosensors and method of use |
FR2886652B1 (fr) * | 2005-06-06 | 2007-09-14 | Centre Nat Rech Scient | Procede de realisation d'une zone hydrophile sur un substrat hydrophobe, par voie electrochimique |
AU2006272909B2 (en) | 2005-07-20 | 2013-02-07 | Bayer Healthcare Llc | Gated amperometry |
RU2426107C2 (ru) | 2005-09-30 | 2011-08-10 | БАЙЕР ХЕЛТКЭА ЭлЭлСи | Вольтамперометрический способ определения концентрации аналита в образце и устройство для определения концентрации аналита |
DE102006004887B4 (de) * | 2006-02-03 | 2010-07-22 | Karlsruher Institut für Technologie | Vorrichtung zur Erzeugung von Flüssigkeitsströmungen, Verfahren zu ihrer Herstellung und zu ihrem Betrieb sowie ihre Verwendung |
JP4844168B2 (ja) * | 2006-02-28 | 2011-12-28 | パナソニック株式会社 | 部品接合方法および部品積層方法 |
EP2679150B1 (de) | 2006-10-24 | 2020-07-22 | Ascensia Diabetes Care Holdings AG | Nachwirkungsstrommessung |
US8921283B2 (en) * | 2006-10-30 | 2014-12-30 | Washington University | Method for generating microscopic patterns of protein and other macromolecules |
EP2623975B1 (de) * | 2006-12-26 | 2016-02-03 | Sekisui Chemical Co., Ltd. | Verfahren zur Messung von stabilem Hämoglobin A1c und Glukose |
EP2011629A1 (de) | 2007-07-03 | 2009-01-07 | F. Hoffman-la Roche AG | Verfahren zur Herstellung eines mikrofluiden Systems auf einer Polymeroberfläche |
DE102007046305A1 (de) | 2007-09-27 | 2009-04-02 | Robert Bosch Gmbh | Mikrofluidisches Bauelement sowie Herstellungsverfahren |
ATE537008T1 (de) * | 2007-10-05 | 2011-12-15 | Spanolux N V Div Balterio | Verfahren zur herstellung einer pressplatte und verfahren zur prägung einer bodenplatte |
WO2009076302A1 (en) | 2007-12-10 | 2009-06-18 | Bayer Healthcare Llc | Control markers for auto-detection of control solution and methods of use |
US20090250347A1 (en) * | 2008-04-03 | 2009-10-08 | Protea Biosciences, Inc. | Microfluidic devices & processes for electrokinetic transport |
US20090250345A1 (en) * | 2008-04-03 | 2009-10-08 | Protea Biosciences, Inc. | Microfluidic electroelution devices & processes |
DE102008027461B4 (de) | 2008-06-09 | 2011-07-21 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., 80686 | Vorrichtung und Verfahren zur mikrostrukturierten Plasmabehandlung |
DE102008042196A1 (de) | 2008-09-18 | 2010-03-25 | Robert Bosch Gmbh | Verfahren zum Herstellen eines mikrofluidischen Bauelementes sowie mikrofluidisches Bauelement |
FR2938062B1 (fr) | 2008-11-05 | 2014-02-28 | Biomerieux Sa | Dispositif de preparation et/ou de traitement d'un echantillon biologique |
US20110143378A1 (en) * | 2009-11-12 | 2011-06-16 | CyVek LLC. | Microfluidic method and apparatus for high performance biological assays |
US9700889B2 (en) | 2009-11-23 | 2017-07-11 | Cyvek, Inc. | Methods and systems for manufacture of microarray assay systems, conducting microfluidic assays, and monitoring and scanning to obtain microfluidic assay results |
US10022696B2 (en) | 2009-11-23 | 2018-07-17 | Cyvek, Inc. | Microfluidic assay systems employing micro-particles and methods of manufacture |
US9500645B2 (en) | 2009-11-23 | 2016-11-22 | Cyvek, Inc. | Micro-tube particles for microfluidic assays and methods of manufacture |
US9759718B2 (en) | 2009-11-23 | 2017-09-12 | Cyvek, Inc. | PDMS membrane-confined nucleic acid and antibody/antigen-functionalized microlength tube capture elements, and systems employing them, and methods of their use |
JP5701894B2 (ja) | 2009-11-23 | 2015-04-15 | サイヴェク・インコーポレイテッド | アッセイを行う方法及び装置 |
WO2013134742A2 (en) | 2012-03-08 | 2013-09-12 | Cyvek, Inc | Micro-tube particles for microfluidic assays and methods of manufacture |
US9855735B2 (en) | 2009-11-23 | 2018-01-02 | Cyvek, Inc. | Portable microfluidic assay devices and methods of manufacture and use |
US10065403B2 (en) | 2009-11-23 | 2018-09-04 | Cyvek, Inc. | Microfluidic assay assemblies and methods of manufacture |
WO2012129455A2 (en) | 2011-03-22 | 2012-09-27 | Cyvek, Inc | Microfluidic devices and methods of manufacture and use |
DK2802416T3 (en) | 2012-01-09 | 2016-07-04 | Sophion Bioscience As | Enhanced cell adhesion in the patch area |
ITTO20120121A1 (it) * | 2012-02-13 | 2013-08-14 | Christian Riekel | Dispositivo electrowetting-on-dielectric superidrofobico provvisto di una configurazione di elettrodi multipli |
US10228367B2 (en) | 2015-12-01 | 2019-03-12 | ProteinSimple | Segmented multi-use automated assay cartridge |
KR102137716B1 (ko) * | 2017-03-27 | 2020-07-24 | 가부시키가이샤 아루박 | 전자 부품의 제조 방법 |
TWI726225B (zh) * | 2018-07-18 | 2021-05-01 | 李俊豪 | 生醫晶片製作方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1992015408A1 (de) | 1991-02-28 | 1992-09-17 | Dyconex Patente Ag Heinze & Co | Determiniertes mikrosieb, determinierter verbundkörper |
US5985356A (en) * | 1994-10-18 | 1999-11-16 | The Regents Of The University Of California | Combinatorial synthesis of novel materials |
EP1019712A4 (de) * | 1997-09-19 | 2002-08-07 | Aclara Biosciences Inc | Vorrichtung und verfahren zur kapillarströmung mit einem elektrischen feld |
US5992820A (en) * | 1997-11-19 | 1999-11-30 | Sarnoff Corporation | Flow control in microfluidics devices by controlled bubble formation |
US6565813B1 (en) * | 1998-02-04 | 2003-05-20 | Merck & Co., Inc. | Virtual wells for use in high throughput screening assays |
US6756019B1 (en) * | 1998-02-24 | 2004-06-29 | Caliper Technologies Corp. | Microfluidic devices and systems incorporating cover layers |
US6103199A (en) * | 1998-09-15 | 2000-08-15 | Aclara Biosciences, Inc. | Capillary electroflow apparatus and method |
CN1185492C (zh) * | 1999-03-15 | 2005-01-19 | 清华大学 | 可单点选通式微电磁单元阵列芯片、电磁生物芯片及应用 |
US20030113528A1 (en) * | 1999-09-17 | 2003-06-19 | Wilson Moya | Patterned porous structures |
US6423465B1 (en) * | 2000-01-28 | 2002-07-23 | International Business Machines Corporation | Process for preparing a patterned continuous polymeric brush on a substrate surface |
AU2002211894B2 (en) * | 2000-10-10 | 2007-03-15 | Serono Genetics Institute S.A. | Surface adsorbing polymers and the uses thereof to treat hydrophobic or hydrophilic surfaces |
-
2001
- 2001-01-30 AT AT01901108T patent/ATE277865T1/de not_active IP Right Cessation
- 2001-01-30 EP EP01901108A patent/EP1255690B1/de not_active Expired - Lifetime
- 2001-01-30 DE DE60105979T patent/DE60105979T2/de not_active Expired - Lifetime
- 2001-01-30 CA CA2399027A patent/CA2399027C/en not_active Expired - Fee Related
- 2001-01-30 WO PCT/CH2001/000070 patent/WO2001056771A2/en active IP Right Grant
- 2001-01-30 ES ES01901108T patent/ES2225466T3/es not_active Expired - Lifetime
- 2001-01-30 US US10/182,577 patent/US7087181B2/en not_active Expired - Fee Related
- 2001-01-30 PT PT01901108T patent/PT1255690E/pt unknown
- 2001-01-30 AU AU26617/01A patent/AU776266C/en not_active Ceased
Also Published As
Publication number | Publication date |
---|---|
CA2399027A1 (en) | 2001-08-09 |
CA2399027C (en) | 2010-06-22 |
US20030102284A1 (en) | 2003-06-05 |
AU2661701A (en) | 2001-08-14 |
PT1255690E (pt) | 2004-12-31 |
EP1255690B1 (de) | 2004-09-29 |
AU776266B2 (en) | 2004-09-02 |
DE60105979D1 (de) | 2004-11-04 |
EP1255690A2 (de) | 2002-11-13 |
ES2225466T3 (es) | 2005-03-16 |
US7087181B2 (en) | 2006-08-08 |
AU776266C (en) | 2006-01-05 |
WO2001056771A3 (en) | 2002-01-24 |
DE60105979T2 (de) | 2005-10-06 |
WO2001056771A2 (en) | 2001-08-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ATE277865T1 (de) | Verfahren zur herstellung von mikrostrukturen mit verschiedenen oberflächeneigenschaften in einem multischichtkörper durch plasmaätzen | |
ATE517699T1 (de) | Verfahren zur herstellung eines dünnen organischen films | |
ATE507587T1 (de) | Verfahren zur herstellung einer vorrichtung aus kohlenstoff-nanoröhren | |
ATE456047T1 (de) | Verfahren zur herstellung beschichteter magnetischer mikropartikel und deren verwendungen | |
DE602006009169D1 (de) | Verfahren und Vorrichtung zur Herstellung einer Lipid-Doppelschichtmembran | |
DE50207140D1 (de) | Oberflächenmodifziertes zinkoxid zur herstellung nanopartikulärer dispersionen | |
ATE527579T1 (de) | Systeme und verfahren zur herstellung von mikrostrukturen durch abbilden einer zwischen äusseren schichten geschichteten strahlungsempfindlichen schicht und dadurch hergestellte mikrostrukturen | |
WO2008096335A3 (en) | Producing an array of nanoscale structures on a substrate surface via a self-assembled template | |
WO2009143357A3 (en) | Orthogonal processing of organic materials used in electronic and electrical devices | |
DE60305170D1 (de) | Verfahren zur herstellung von hydrophoben oberflächen | |
DE69707634D1 (de) | Verfahren zur Herstellung von Mikrostrukturen durch Mehrschicht-Strukturierung eines Photolackes und damit hergestellte Mikrostrukturen | |
ATE484006T1 (de) | Verfahren zur herstellung eines farbfilters | |
ATE470938T1 (de) | Verfahren zur herstellung von magnetischen partikeln zur selektiven entfernung von kontaminanten aus einer lösung | |
DE602006011491D1 (de) | Verfahren zur teilweisen metallisierung eines produkts | |
ATE197525T1 (de) | Verfahren zum herstellen von strukturierungen | |
WO2008121137A3 (en) | Fabrication of microstructures and nanostructures using etching resist | |
DE50009945D1 (de) | Verfahren zur herstellung von im nanometerbereich oberflächendekorierten substraten | |
ATE250323T1 (de) | Verfahren zur herstellung von leiterplatten mit groben leiterstrukturen und mindestens einem bereich mit feinen leiterstrukturen | |
ATE402806T1 (de) | Verfahren zur herstellung eines rohrteils aus fluorharz mit niedriger gas-permeabilität | |
ATE370096T1 (de) | Verfahren zur herstellung von dreidimensionalen nanostrukturen und mikrostrukturen | |
DE502004006903D1 (de) | Verfahren und vorrichtung zur herstellung von korpuskularstrahlsystemen | |
US20150154997A1 (en) | Combining features using directed self-assembly to form patterns for etching | |
Lee et al. | Low‐Temperature Plasma‐Assisted Nanotransfer Printing between Thermoplastic Polymers | |
DE60218882D1 (de) | Verfahren zur herstellung eines grossen, dreidimensionalen laminaren körpers | |
TW200717650A (en) | Substrate processing method |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |