DE60105979D1 - Verfahren zur herstellung von mikrostrukturen mit verschiedenen oberflächeneigenschaften in einem multischichtkörper durch plasmaätzen - Google Patents

Verfahren zur herstellung von mikrostrukturen mit verschiedenen oberflächeneigenschaften in einem multischichtkörper durch plasmaätzen

Info

Publication number
DE60105979D1
DE60105979D1 DE60105979T DE60105979T DE60105979D1 DE 60105979 D1 DE60105979 D1 DE 60105979D1 DE 60105979 T DE60105979 T DE 60105979T DE 60105979 T DE60105979 T DE 60105979T DE 60105979 D1 DE60105979 D1 DE 60105979D1
Authority
DE
Germany
Prior art keywords
surface properties
different surface
layer body
plasma etches
producing microstructures
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60105979T
Other languages
English (en)
Other versions
DE60105979T2 (de
Inventor
Walter Schmidt
Joel S Rossier
Frederic Reymond
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DiagnoSwiss SA
Original Assignee
DiagnoSwiss SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by DiagnoSwiss SA filed Critical DiagnoSwiss SA
Application granted granted Critical
Publication of DE60105979D1 publication Critical patent/DE60105979D1/de
Publication of DE60105979T2 publication Critical patent/DE60105979T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
    • B01L3/50—Containers for the purpose of retaining a material to be analysed, e.g. test tubes
    • B01L3/502—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures
    • B01L3/5027—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip
    • B01L3/502707—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip characterised by the manufacture of the container or its components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F33/00—Other mixers; Mixing plants; Combinations of mixers
    • B01F33/30—Micromixers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
    • B81C1/00119—Arrangement of basic structures like cavities or channels, e.g. suitable for microfluidic systems
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00206—Processes for functionalising a surface, e.g. provide the surface with specific mechanical, chemical or biological properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
    • G01N27/416—Systems
    • G01N27/447—Systems using electrophoresis
    • G01N27/44756—Apparatus specially adapted therefor
    • G01N27/44791—Microapparatus
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
    • G01N30/02—Column chromatography
    • G01N30/60—Construction of the column
    • G01N30/6095—Micromachined or nanomachined, e.g. micro- or nanosize
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H05K3/0041—Etching of the substrate by chemical or physical means by plasma etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00781—Aspects relating to microreactors
    • B01J2219/00819—Materials of construction
    • B01J2219/00824—Ceramic
    • B01J2219/00828—Silicon wafers or plates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00781—Aspects relating to microreactors
    • B01J2219/00851—Additional features
    • B01J2219/00858—Aspects relating to the size of the reactor
    • B01J2219/0086—Dimensions of the flow channels
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L2200/00—Solutions for specific problems relating to chemical or physical laboratory apparatus
    • B01L2200/12—Specific details about manufacturing devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • B29C2059/023—Microembossing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2009/00—Layered products
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
    • G01N30/02—Column chromatography
    • G01N30/26—Conditioning of the fluid carrier; Flow patterns
    • G01N30/28—Control of physical parameters of the fluid carrier
    • G01N2030/285—Control of physical parameters of the fluid carrier electrically driven carrier
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0548—Masks
    • H05K2203/0554—Metal used as mask for etching vias, e.g. by laser ablation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H05K3/002—Etching of the substrate by chemical or physical means by liquid chemical etching
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
    • H05K3/0032—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Molecular Biology (AREA)
  • Dispersion Chemistry (AREA)
  • Pathology (AREA)
  • Plasma & Fusion (AREA)
  • Immunology (AREA)
  • Biochemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Electrochemistry (AREA)
  • Clinical Laboratory Science (AREA)
  • Nanotechnology (AREA)
  • Hematology (AREA)
  • Apparatus Associated With Microorganisms And Enzymes (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Surface Treatment Of Glass (AREA)
  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Micromachines (AREA)
DE60105979T 2000-01-31 2001-01-30 Verfahren zur herstellung von mikrostrukturen mit verschiedenen oberflächeneigenschaften in einem multischichtkörper durch plasmaätzen Expired - Lifetime DE60105979T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US17933400P 2000-01-31 2000-01-31
US179334P 2000-01-31
PCT/CH2001/000070 WO2001056771A2 (en) 2000-01-31 2001-01-30 Method for fabricating micro-structures with various surface properties in multilayer body by plasma etching

Publications (2)

Publication Number Publication Date
DE60105979D1 true DE60105979D1 (de) 2004-11-04
DE60105979T2 DE60105979T2 (de) 2005-10-06

Family

ID=22656136

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60105979T Expired - Lifetime DE60105979T2 (de) 2000-01-31 2001-01-30 Verfahren zur herstellung von mikrostrukturen mit verschiedenen oberflächeneigenschaften in einem multischichtkörper durch plasmaätzen

Country Status (9)

Country Link
US (1) US7087181B2 (de)
EP (1) EP1255690B1 (de)
AT (1) ATE277865T1 (de)
AU (1) AU776266C (de)
CA (1) CA2399027C (de)
DE (1) DE60105979T2 (de)
ES (1) ES2225466T3 (de)
PT (1) PT1255690E (de)
WO (1) WO2001056771A2 (de)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100450818B1 (ko) * 2002-03-09 2004-10-01 삼성전자주식회사 다챔버 ｐｃｒ 칩
JP4057967B2 (ja) * 2002-07-31 2008-03-05 株式会社東芝 塩基配列自動解析装置
US7745203B2 (en) 2002-07-31 2010-06-29 Kabushiki Kaisha Toshiba Base sequence detection apparatus and base sequence automatic analyzing apparatus
CA2498040A1 (en) * 2002-09-05 2004-04-15 Katayanagi Institute Method for separating substances
US7279134B2 (en) * 2002-09-17 2007-10-09 Intel Corporation Microfluidic devices with porous membranes for molecular sieving, metering, and separations
US6818964B2 (en) 2002-09-30 2004-11-16 The Regents Of The University Of California Selectively-etched nanochannel electrophoretic and electrochemical devices
WO2004044552A2 (en) * 2002-11-12 2004-05-27 Nanoink, Inc. Methods and apparatus for ink delivery to nanolithographic probe systems
US7012017B2 (en) 2004-01-29 2006-03-14 3M Innovative Properties Company Partially etched dielectric film with conductive features
AU2005212396A1 (en) 2004-02-06 2005-08-25 Bayer Healthcare Llc Oxidizable species as an internal reference for biosensors and method of use
FR2886652B1 (fr) * 2005-06-06 2007-09-14 Centre Nat Rech Scient Procede de realisation d'une zone hydrophile sur un substrat hydrophobe, par voie electrochimique
JP5385607B2 (ja) 2005-07-20 2014-01-08 バイエル・ヘルスケア・エルエルシー ゲート化電流測定器
RU2426107C2 (ru) 2005-09-30 2011-08-10 БАЙЕР ХЕЛТКЭА ЭлЭлСи Вольтамперометрический способ определения концентрации аналита в образце и устройство для определения концентрации аналита
DE102006004887B4 (de) * 2006-02-03 2010-07-22 Karlsruher Institut für Technologie Vorrichtung zur Erzeugung von Flüssigkeitsströmungen, Verfahren zu ihrer Herstellung und zu ihrem Betrieb sowie ihre Verwendung
JP4844168B2 (ja) * 2006-02-28 2011-12-28 パナソニック株式会社 部品接合方法および部品積層方法
EP2679150B1 (de) 2006-10-24 2020-07-22 Ascensia Diabetes Care Holdings AG Nachwirkungsstrommessung
US8921283B2 (en) * 2006-10-30 2014-12-30 Washington University Method for generating microscopic patterns of protein and other macromolecules
EP2105735B1 (de) 2006-12-26 2014-11-26 Sekisui Chemical Co., Ltd. VERFAHREN ZUR MESSUNG VON STABILEM HÄMOGLOBIN A1c UND ELEKTROPHORESEGERÄT
EP2011629A1 (de) 2007-07-03 2009-01-07 F. Hoffman-la Roche AG Verfahren zur Herstellung eines mikrofluiden Systems auf einer Polymeroberfläche
DE102007046305A1 (de) 2007-09-27 2009-04-02 Robert Bosch Gmbh Mikrofluidisches Bauelement sowie Herstellungsverfahren
DK2045363T3 (da) * 2007-10-05 2012-04-02 Spanolux N V Div Balterio Fremgangsmåde til fremstilling af en presseplade og fremgangsmåde til prægning af et gulvpanel
WO2009076302A1 (en) 2007-12-10 2009-06-18 Bayer Healthcare Llc Control markers for auto-detection of control solution and methods of use
US20090250345A1 (en) * 2008-04-03 2009-10-08 Protea Biosciences, Inc. Microfluidic electroelution devices & processes
US20090250347A1 (en) * 2008-04-03 2009-10-08 Protea Biosciences, Inc. Microfluidic devices & processes for electrokinetic transport
DE102008027461B4 (de) 2008-06-09 2011-07-21 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., 80686 Vorrichtung und Verfahren zur mikrostrukturierten Plasmabehandlung
DE102008042196A1 (de) 2008-09-18 2010-03-25 Robert Bosch Gmbh Verfahren zum Herstellen eines mikrofluidischen Bauelementes sowie mikrofluidisches Bauelement
FR2938062B1 (fr) 2008-11-05 2014-02-28 Biomerieux Sa Dispositif de preparation et/ou de traitement d'un echantillon biologique
US20110143378A1 (en) * 2009-11-12 2011-06-16 CyVek LLC. Microfluidic method and apparatus for high performance biological assays
US9651568B2 (en) 2009-11-23 2017-05-16 Cyvek, Inc. Methods and systems for epi-fluorescent monitoring and scanning for microfluidic assays
US9500645B2 (en) 2009-11-23 2016-11-22 Cyvek, Inc. Micro-tube particles for microfluidic assays and methods of manufacture
US9759718B2 (en) 2009-11-23 2017-09-12 Cyvek, Inc. PDMS membrane-confined nucleic acid and antibody/antigen-functionalized microlength tube capture elements, and systems employing them, and methods of their use
US10065403B2 (en) 2009-11-23 2018-09-04 Cyvek, Inc. Microfluidic assay assemblies and methods of manufacture
WO2013134739A1 (en) 2012-03-08 2013-09-12 Cyvek, Inc. Microfluidic assay operating system and methods of use
US9700889B2 (en) 2009-11-23 2017-07-11 Cyvek, Inc. Methods and systems for manufacture of microarray assay systems, conducting microfluidic assays, and monitoring and scanning to obtain microfluidic assay results
US9855735B2 (en) 2009-11-23 2018-01-02 Cyvek, Inc. Portable microfluidic assay devices and methods of manufacture and use
WO2011063408A1 (en) 2009-11-23 2011-05-26 Cyvek, Inc. Method and apparatus for performing assays
JP5978287B2 (ja) 2011-03-22 2016-08-24 サイヴェク・インコーポレイテッド マイクロ流体装置並びに製造及び使用の方法
DK2802416T3 (en) 2012-01-09 2016-07-04 Sophion Bioscience As Enhanced cell adhesion in the patch area
ITTO20120121A1 (it) * 2012-02-13 2013-08-14 Christian Riekel Dispositivo electrowetting-on-dielectric superidrofobico provvisto di una configurazione di elettrodi multipli
US10228367B2 (en) 2015-12-01 2019-03-12 ProteinSimple Segmented multi-use automated assay cartridge
CN109716506B (zh) 2017-03-27 2023-09-22 株式会社爱发科 电子部件的制造方法
TWI726225B (zh) * 2018-07-18 2021-05-01 李俊豪 生醫晶片製作方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE154259T1 (de) * 1991-02-28 1997-06-15 Heinze Dyconex Patente Verfahren zur herstellung eines aus mikrosieben bestehenden verbundkörpers
US5985356A (en) * 1994-10-18 1999-11-16 The Regents Of The University Of California Combinatorial synthesis of novel materials
JP2001517794A (ja) * 1997-09-19 2001-10-09 アクレイラ バイオサイエンシズ，インコーポレイティド キャピラリ電気フロー装置および方法
US5992820A (en) * 1997-11-19 1999-11-30 Sarnoff Corporation Flow control in microfluidics devices by controlled bubble formation
JP4387588B2 (ja) * 1998-02-04 2009-12-16 メルク エンド カムパニー インコーポレーテッド 高スループットスクリーニングアッセイ用仮想ウェル
US6756019B1 (en) * 1998-02-24 2004-06-29 Caliper Technologies Corp. Microfluidic devices and systems incorporating cover layers
US6103199A (en) * 1998-09-15 2000-08-15 Aclara Biosciences, Inc. Capillary electroflow apparatus and method
CN1185492C (zh) * 1999-03-15 2005-01-19 清华大学 可单点选通式微电磁单元阵列芯片、电磁生物芯片及应用
US20030113528A1 (en) * 1999-09-17 2003-06-19 Wilson Moya Patterned porous structures
US6423465B1 (en) * 2000-01-28 2002-07-23 International Business Machines Corporation Process for preparing a patterned continuous polymeric brush on a substrate surface
DE60123480T2 (de) * 2000-10-10 2007-08-16 Serono Genetics Institute S.A. Behandlung von hydrophoben oder hydrophilen oberflächen mit polymeren

Also Published As

Publication number Publication date
US7087181B2 (en) 2006-08-08
WO2001056771A3 (en) 2002-01-24
EP1255690A2 (de) 2002-11-13
AU776266C (en) 2006-01-05
PT1255690E (pt) 2004-12-31
CA2399027C (en) 2010-06-22
CA2399027A1 (en) 2001-08-09
AU776266B2 (en) 2004-09-02
DE60105979T2 (de) 2005-10-06
EP1255690B1 (de) 2004-09-29
ES2225466T3 (es) 2005-03-16
WO2001056771A2 (en) 2001-08-09
ATE277865T1 (de) 2004-10-15
US20030102284A1 (en) 2003-06-05
AU2661701A (en) 2001-08-14

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