ATE236791T1 - Positiv-arbeitende photo-empfindliche lithographische druckplatte und verfahren zu ihrer herstellung - Google Patents
Positiv-arbeitende photo-empfindliche lithographische druckplatte und verfahren zu ihrer herstellungInfo
- Publication number
- ATE236791T1 ATE236791T1 AT99972155T AT99972155T ATE236791T1 AT E236791 T1 ATE236791 T1 AT E236791T1 AT 99972155 T AT99972155 T AT 99972155T AT 99972155 T AT99972155 T AT 99972155T AT E236791 T1 ATE236791 T1 AT E236791T1
- Authority
- AT
- Austria
- Prior art keywords
- photosensitive material
- photosensitive
- printing plate
- positive
- lithographic printing
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000000463 material Substances 0.000 abstract 9
- 150000001875 compounds Chemical class 0.000 abstract 2
- 238000009792 diffusion process Methods 0.000 abstract 2
- 238000004090 dissolution Methods 0.000 abstract 2
- -1 H2O Chemical class 0.000 abstract 1
- 206010034972 Photosensitivity reaction Diseases 0.000 abstract 1
- 239000003513 alkali Substances 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 239000002131 composite material Substances 0.000 abstract 1
- 230000000694 effects Effects 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 230000036211 photosensitivity Effects 0.000 abstract 1
- 230000001681 protective effect Effects 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- 150000003459 sulfonic acid esters Chemical class 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
- B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/06—Developable by an alkaline solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/14—Multiple imaging layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
- B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/145—Infrared
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/146—Laser beam
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/165—Thermal imaging composition
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Thermal Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Printing Plates And Materials Therefor (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32473498 | 1998-11-16 | ||
JP32634098 | 1998-11-17 | ||
JP498599 | 1999-01-12 | ||
JP21195899 | 1999-07-27 | ||
JP21195799 | 1999-07-27 | ||
JP23670599 | 1999-08-24 | ||
PCT/JP1999/006343 WO2000029214A1 (en) | 1998-11-16 | 1999-11-12 | Positive-working photosensitive lithographic printing plate and method for producing the same |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE236791T1 true ATE236791T1 (de) | 2003-04-15 |
Family
ID=27547880
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT99972155T ATE236791T1 (de) | 1998-11-16 | 1999-11-12 | Positiv-arbeitende photo-empfindliche lithographische druckplatte und verfahren zu ihrer herstellung |
Country Status (13)
Country | Link |
---|---|
US (1) | US6596457B1 (de) |
EP (1) | EP1159133B1 (de) |
JP (3) | JP3979757B2 (de) |
CN (1) | CN1153666C (de) |
AT (1) | ATE236791T1 (de) |
AU (1) | AU757494B2 (de) |
BR (1) | BR9915407A (de) |
CA (1) | CA2349307A1 (de) |
DE (1) | DE69906818T2 (de) |
ES (1) | ES2196925T3 (de) |
IL (1) | IL143158A0 (de) |
NO (1) | NO20012388L (de) |
WO (1) | WO2000029214A1 (de) |
Families Citing this family (79)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6706466B1 (en) | 1999-08-03 | 2004-03-16 | Kodak Polychrome Graphics Llc | Articles having imagable coatings |
JP4137345B2 (ja) | 2000-06-05 | 2008-08-20 | 富士フイルム株式会社 | 平版印刷版原版 |
US6613494B2 (en) * | 2001-03-13 | 2003-09-02 | Kodak Polychrome Graphics Llc | Imageable element having a protective overlayer |
JP2003005354A (ja) * | 2001-06-20 | 2003-01-08 | Fuji Photo Film Co Ltd | 平版印刷版用原版および平版印刷版の製版方法 |
US6723489B2 (en) | 2002-01-30 | 2004-04-20 | Kodak Polychrome Graphics Llp | Printing form precursors |
JP2003320764A (ja) * | 2002-02-27 | 2003-11-11 | Tokushu Paper Mfg Co Ltd | 平版印刷版用合紙及びその製造方法 |
US20060234161A1 (en) | 2002-10-04 | 2006-10-19 | Eric Verschueren | Method of making a lithographic printing plate precursor |
JP2004163732A (ja) * | 2002-11-14 | 2004-06-10 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
KR100556503B1 (ko) * | 2002-11-26 | 2006-03-03 | 엘지전자 주식회사 | 건조기의 건조 시간제어 방법 |
EP1630606B1 (de) * | 2003-06-30 | 2008-08-13 | Think Laboratory Co., Ltd. | Positive lichtempfindliche zusammensetzung |
CN100374296C (zh) * | 2003-07-14 | 2008-03-12 | 富士胶片株式会社 | 涉及印刷机上显影的平版印刷方法及预敏化的平版印刷版 |
US7041432B2 (en) * | 2004-03-29 | 2006-05-09 | Markhart Gary T | Apparatus and method for thermally developing flexographic printing elements |
US7467587B2 (en) | 2004-04-21 | 2008-12-23 | Agfa Graphics, N.V. | Method for accurate exposure of small dots on a heat-sensitive positive-working lithographic printing plate material |
US7348126B2 (en) | 2004-04-27 | 2008-03-25 | Agfa Graphics N.V. | Negative working, heat-sensitive lithographic printing plate precursor |
US20070154835A1 (en) * | 2004-05-27 | 2007-07-05 | Think Laboratory Co., Ltd. | Positive photosensitive composition |
US7195861B2 (en) | 2004-07-08 | 2007-03-27 | Agfa-Gevaert | Method for making a negative working, heat-sensitive lithographic printing plate precursor |
US7354696B2 (en) | 2004-07-08 | 2008-04-08 | Agfa Graphics Nv | Method for making a lithographic printing plate |
US7425405B2 (en) | 2004-07-08 | 2008-09-16 | Agfa Graphics, N.V. | Method for making a lithographic printing plate |
JP2006058702A (ja) | 2004-08-20 | 2006-03-02 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
JP2006062188A (ja) * | 2004-08-26 | 2006-03-09 | Fuji Photo Film Co Ltd | 色画像形成材料及び平版印刷版原版 |
US7198883B2 (en) | 2004-09-24 | 2007-04-03 | Agfa-Gevaert | Processless lithographic printing plate |
WO2006065261A1 (en) * | 2004-12-15 | 2006-06-22 | Anocoil Corporation | Improved positive working thermal plates |
CN100573316C (zh) * | 2005-07-08 | 2009-12-23 | 上海纺印印刷包装有限公司 | 一种阳图型热敏/光敏版显影液及其制备方法 |
CN100500449C (zh) * | 2005-12-27 | 2009-06-17 | 中国科学院化学研究所 | 一种计算机直接制版版材及其制备方法 |
US7338745B2 (en) * | 2006-01-23 | 2008-03-04 | Eastman Kodak Company | Multilayer imageable element with improved chemical resistance |
US7175967B1 (en) * | 2006-03-02 | 2007-02-13 | Eastman Kodak Company | Heat treatment of multilayer imageable elements |
DE602006006969D1 (de) | 2006-03-17 | 2009-07-09 | Agfa Graphics Nv | Negativ arbeitender, hitzeempfindlicher Lithographiedruckformvorläufer |
US20080008956A1 (en) * | 2006-06-23 | 2008-01-10 | Eastman Kodak Company | Positive-working imageable members with branched hydroxystyrene polymers |
GB2439734A (en) * | 2006-06-30 | 2008-01-09 | Peter Andrew Reath Bennett | Coating for a lithographic precursor and use thereof |
US7175969B1 (en) | 2006-07-18 | 2007-02-13 | Eastman Kodak Company | Method of preparing negative-working radiation-sensitive elements |
US7544462B2 (en) * | 2007-02-22 | 2009-06-09 | Eastman Kodak Company | Radiation-sensitive composition and elements with basic development enhancers |
CN101439609B (zh) * | 2007-11-22 | 2010-11-03 | 乐凯集团第二胶片厂 | 阳图型感红外光组合物和阳图型印刷版及其使用方法 |
ATE468981T1 (de) | 2007-11-30 | 2010-06-15 | Agfa Graphics Nv | Verfahren zur behandlung einer lithografiedruckplatte |
EP2095948B1 (de) | 2008-02-28 | 2010-09-15 | Agfa Graphics N.V. | Verfahren zur Herstellung einer Lithografiedruckplatte |
ES2430562T3 (es) | 2008-03-04 | 2013-11-21 | Agfa Graphics N.V. | Método para la fabricación de un soporte de una plancha de impresión litográfica |
ATE514561T1 (de) | 2008-03-31 | 2011-07-15 | Agfa Graphics Nv | Verfahren zur behandlung einer lithografischen druckplatte |
CN102132212B (zh) * | 2008-09-04 | 2013-08-28 | 日立化成株式会社 | 正型感光性树脂组合物、抗蚀图形的制造方法以及电子部件 |
EP2194429A1 (de) | 2008-12-02 | 2010-06-09 | Eastman Kodak Company | Gummierzusammensetzungen mit Nanoteilchen zur Verbesserung der Kratzempfindlichkeit in Bild- und Nicht-Bild-Bereichen von lithografischen Druckplatten |
EP2196851A1 (de) | 2008-12-12 | 2010-06-16 | Eastman Kodak Company | Negativkopier-Lithographiedruckplattenvorläufer, die ein reaktives Bindemittel umfassen, das aliphatische bi- oder polycyclische Teile enthält |
CN101770170B (zh) * | 2008-12-30 | 2012-03-21 | 乐凯集团第二胶片厂 | 适合于热敏阳图ctp的感光组合物及含该组合物的平印版 |
EP2213690B1 (de) | 2009-01-30 | 2015-11-11 | Agfa Graphics N.V. | Neues alkalisches lösliches harz |
ES2381535T3 (es) | 2009-06-18 | 2012-05-29 | Agfa Graphics N.V. | Precursor de plancha de impresión litográfica |
ATE555904T1 (de) | 2009-08-10 | 2012-05-15 | Eastman Kodak Co | Lithografische druckplattenvorläufer mit betahydroxy-alkylamid-vernetzern |
EP2293144B1 (de) | 2009-09-04 | 2012-11-07 | Eastman Kodak Company | Verfahren zum Trocknen von Lithographiedruckplatten nach einer Einstufenverarbeitung |
EP2329951B1 (de) | 2009-12-04 | 2012-06-20 | AGFA Graphics NV | Lithographiedruckplattenvorläufer |
EP2365389B1 (de) * | 2010-03-08 | 2013-01-16 | Fujifilm Corporation | Positiv arbeitender Lithographiedruckplattenvorläufer für einen Infrarotlaser und Verfahren zur Herstellung einer Lithographiedruckplatte |
CN103328214B (zh) | 2011-01-25 | 2015-06-17 | 爱克发印艺公司 | 平版印刷版前体 |
ES2427137T3 (es) | 2011-02-18 | 2013-10-29 | Agfa Graphics N.V. | Precursor de plancha de impresión litográfica |
JP2013130726A (ja) * | 2011-12-21 | 2013-07-04 | Eastman Kodak Co | ポジ型平版印刷版原版及び平版印刷版の製造方法 |
JP5813063B2 (ja) | 2012-07-27 | 2015-11-17 | 富士フイルム株式会社 | 平版印刷版用支持体およびその製造方法、並びに、平版印刷版原版 |
EP2735903B1 (de) | 2012-11-22 | 2019-02-27 | Eastman Kodak Company | Negativ arbeitende Lithografiedruckplattenvorläufer mit hochverzweigtem Bindemittelmaterial |
CN103881034B (zh) * | 2012-12-21 | 2016-03-09 | 乐凯华光印刷科技有限公司 | 一种激光热塑性纳微米颗粒及其合成方法与用其制作的平印版 |
US9562129B2 (en) | 2013-01-01 | 2017-02-07 | Agfa Graphics Nv | (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors |
EP2775351B1 (de) | 2013-03-07 | 2017-02-22 | Agfa Graphics NV | Vorrichtung und Verfahren zur Verarbeitung einer Lithografiedruckplatte |
EP2778782B1 (de) | 2013-03-13 | 2015-12-30 | Kodak Graphic Communications GmbH | Negativ arbeitende strahlungsempfindliche Elemente |
CN105283807B (zh) | 2013-06-18 | 2019-09-27 | 爱克发有限公司 | 制备具有图案化背层的平版印刷版前体的方法 |
EP2871057B1 (de) | 2013-11-07 | 2016-09-14 | Agfa Graphics Nv | Negativ arbeitender, wärmeempfindlicher Lithographiedruckplattenvorläufer |
EP2933278B1 (de) | 2014-04-17 | 2018-08-22 | Agfa Nv | (Ethylen-,Vinylacetal-)Copolymere und ihre Verwendung in Lithographiedruckplattenvorläufern |
EP2944657B1 (de) | 2014-05-15 | 2017-01-11 | Agfa Graphics Nv | (Ethylen-,Vinylacetal-)Copolymere und deren Verwendung in Lithographiedruckplattenvorläufern |
ES2660063T3 (es) | 2014-06-13 | 2018-03-20 | Agfa Nv | Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica |
EP2963496B1 (de) | 2014-06-30 | 2017-04-05 | Agfa Graphics NV | Lithografiedruckplattenvorläufer mit (Ethylen-, Vinylacetal-) Copolymeren |
EP3032334B1 (de) | 2014-12-08 | 2017-10-18 | Agfa Graphics Nv | System zur Reduzierung von Ablationsrückständen |
EP3130465B1 (de) | 2015-08-12 | 2020-05-13 | Agfa Nv | Wärmeempfindlicher lithografiedruckplattenvorläufer |
EP3157310A1 (de) | 2015-10-12 | 2017-04-19 | Agfa Graphics Nv | Erfassungsblatt zur perforation elektrischer platten, wie etwa leiterplatten |
EP3170662B1 (de) | 2015-11-20 | 2019-08-14 | Agfa Nv | Flachdruckplattenvorläufer |
JP2019513240A (ja) | 2016-03-16 | 2019-05-23 | アグファ・ナームローゼ・フェンノートシャップAgfa Nv | 平版印刷版の処理方法 |
EP3239184A1 (de) | 2016-04-25 | 2017-11-01 | Agfa Graphics NV | Thermoplastische polymerpartikel und ein lithografiedruckplattenvorläufer |
EP3441223B1 (de) | 2017-08-07 | 2024-02-21 | Eco3 Bv | Lithographiedruckplattenvorläufer |
WO2019039074A1 (ja) | 2017-08-25 | 2019-02-28 | 富士フイルム株式会社 | ネガ型平版印刷版原版、及び、平版印刷版の製版方法 |
EP3474073B1 (de) | 2017-10-17 | 2022-12-07 | Agfa Offset Bv | Methode zur herstellung einer druckplatte |
EP3637188A1 (de) | 2018-10-08 | 2020-04-15 | Agfa Nv | Sprudelnder entwicklervorläufer zur verarbeitung eines lithografischen druckplattenvorläufers |
EP3650938A1 (de) | 2018-11-09 | 2020-05-13 | Agfa Nv | Lithographiedruckplattenvorläufer |
CN113382869B (zh) * | 2019-01-31 | 2023-02-17 | 富士胶片株式会社 | 平版印刷版原版、平版印刷版的制作方法及平版印刷方法 |
EP3715140A1 (de) | 2019-03-29 | 2020-09-30 | Agfa Nv | Verfahren zum drucken |
EP3778253A1 (de) | 2019-08-13 | 2021-02-17 | Agfa Nv | Verfahren zur verarbeitung einer lithografiedruckplatte |
EP3922462B1 (de) | 2020-06-08 | 2023-03-01 | Agfa Offset Bv | Lithografischer photopolymerer druckplattenvorläufer mit verbesserter tageslichtstabilität |
EP4263224A1 (de) | 2020-12-16 | 2023-10-25 | Eco3 Bv | Make-ready-verfahren für eine lithographische druckmaschine |
EP4239411A1 (de) | 2022-03-04 | 2023-09-06 | Eco3 Bv | Verfahren und vorrichtung zum verarbeiten eine lithografiedruckplattenvorläufers |
EP4382306A1 (de) | 2022-12-08 | 2024-06-12 | Eco3 Bv | Make-ready-verfahren für eine lithographische druckmaschine |
Family Cites Families (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5218172B1 (de) | 1970-07-08 | 1977-05-20 | ||
DE2217452C3 (de) | 1971-04-17 | 1978-03-16 | Mitsubishi Chemical Industries, Ltd., Tokio | Verfahren zur Herstellung von 1,4-Diacyloxybuten-(2) |
JPS5218688B2 (de) | 1974-03-22 | 1977-05-24 | ||
DE2454768C2 (de) | 1974-11-19 | 1983-04-28 | Basf Ag, 6700 Ludwigshafen | Verfahren zur Isomerisierung von Butendioldiacetaten |
US4095030A (en) | 1977-01-21 | 1978-06-13 | Phillips Petroleum Company | Isomerization of diacyloxyolefins |
DE2736695A1 (de) | 1977-08-16 | 1979-03-01 | Basf Ag | Verfahren zur isomerisierung von butendioldiacetaten |
JPS5511555A (en) | 1978-07-13 | 1980-01-26 | Mitsubishi Chem Ind Ltd | Isomerization of diacetoxybutene |
JPS55121447A (en) * | 1979-03-15 | 1980-09-18 | Fuji Photo Film Co Ltd | Lithographic printing plate correcting agent |
JPS57140744A (en) | 1981-02-24 | 1982-08-31 | Mitsubishi Chem Ind Ltd | Isomerization of diacetoxybutene |
JPS58205154A (ja) * | 1982-05-25 | 1983-11-30 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
JP2530333B2 (ja) | 1987-04-23 | 1996-09-04 | 三菱化学株式会社 | 不飽和グリコ−ルジエステルの製造方法 |
US4973572A (en) * | 1987-12-21 | 1990-11-27 | Eastman Kodak Company | Infrared absorbing cyanine dyes for dye-donor element used in laser-induced thermal dye transfer |
JPH05229576A (ja) * | 1992-02-25 | 1993-09-07 | Konica Corp | 感光性平版印刷版の包装方法 |
JPH05315243A (ja) * | 1992-05-12 | 1993-11-26 | Mitsubishi Electric Corp | レジスト膜およびその形成方法 |
JPH07100383A (ja) | 1993-10-06 | 1995-04-18 | Mitsubishi Chem Corp | 共役ジエンのアシロキシ化触媒及びこれを用いた不飽和グリコ−ルジエステルの製造法 |
EP0732628A1 (de) * | 1995-03-07 | 1996-09-18 | Minnesota Mining And Manufacturing Company | Wässrig-alkalische Lösung zum Entwickeln von Flachdruckplatten |
JP3537536B2 (ja) * | 1995-04-21 | 2004-06-14 | コダックポリクロームグラフィックス株式会社 | 感光性平版印刷版の製造方法 |
JPH0943847A (ja) * | 1995-07-31 | 1997-02-14 | Dainippon Printing Co Ltd | レジスト材及びパターン形成方法 |
JPH09114101A (ja) * | 1995-10-18 | 1997-05-02 | Konica Corp | 画像形成材料の保存方法 |
JP3738920B2 (ja) * | 1996-02-16 | 2006-01-25 | 富士写真フイルム株式会社 | ポジ型感光性平版印刷版 |
JP3125678B2 (ja) * | 1996-04-08 | 2001-01-22 | 信越化学工業株式会社 | 化学増幅ポジ型レジスト材料 |
DE825927T1 (de) | 1996-04-23 | 1998-07-16 | Horsell, Graphic Industries Ltd., Leeds | Warmeempfindliche zusammensetzung und verfahren zur herstellung einer lithographischen druckform damit |
JPH09311454A (ja) * | 1996-05-21 | 1997-12-02 | Konica Corp | 感光性平版印刷版 |
JP3814961B2 (ja) * | 1996-08-06 | 2006-08-30 | 三菱化学株式会社 | ポジ型感光性印刷版 |
US6197478B1 (en) * | 1996-09-25 | 2001-03-06 | Agfa-Gevaert, N.V. | Method for making a driographic printing plate involving the use of a heat-sensitive imaging element |
JPH10153863A (ja) * | 1996-11-22 | 1998-06-09 | Konica Corp | ポジ型感光性組成物 |
US6090532A (en) * | 1997-03-21 | 2000-07-18 | Kodak Polychrome Graphics Llc | Positive-working infrared radiation sensitive composition and printing plate and imaging method |
JPH10282652A (ja) * | 1997-04-04 | 1998-10-23 | Mitsubishi Chem Corp | ポジ型感光性平版印刷版 |
JPH10282643A (ja) * | 1997-04-04 | 1998-10-23 | Mitsubishi Chem Corp | ポジ型感光性平版印刷版 |
US5811221A (en) * | 1997-05-30 | 1998-09-22 | Kodak Polychrome Graphics, Llc | Alkaline developing composition and method of use to process lithographic printing plates |
JP3731356B2 (ja) * | 1997-08-13 | 2006-01-05 | 三菱化学株式会社 | ポジ型感光性組成物、感光性平版印刷版及びポジ画像の形成方法 |
DE69827882T2 (de) * | 1997-08-13 | 2005-11-03 | Mitsubishi Chemical Corp. | Positiv arbeitende lichtempfindliche Zusammensetzung, lichtempfindliche Druckplatte und Verfahren zur Herstellung eines positiven Bildes |
GB9722861D0 (en) | 1997-10-29 | 1997-12-24 | Horsell Graphic Ind Ltd | Improvements in relation to the manufacture of lithographic printing forms |
JP3920451B2 (ja) * | 1997-10-08 | 2007-05-30 | 富士フイルム株式会社 | 赤外線レーザ用ポジ型感光性組成物 |
US6132929A (en) | 1997-10-08 | 2000-10-17 | Fuji Photo Film Co., Ltd. | Positive type photosensitive composition for infrared lasers |
JPH11119414A (ja) | 1997-10-15 | 1999-04-30 | Konica Corp | 感光性平版印刷版積層体の加熱処理方法 |
JP3785833B2 (ja) * | 1997-10-28 | 2006-06-14 | 三菱化学株式会社 | ポジ型感光性組成物、ポジ型感光性平版印刷版及びその処理方法 |
DE69810242T2 (de) * | 1997-10-28 | 2003-10-30 | Mitsubishi Chemical Corp., Tokio/Tokyo | Positiv arbeitendes strahlungsempfindliches Gemisch, positiv arbeitende lichtempfindliche Flachdruckplatte und Verfahren zur Bebilderung der Druckplatte |
JP3949832B2 (ja) * | 1997-11-14 | 2007-07-25 | 富士フイルム株式会社 | 赤外線レーザ用感光性画像形成材料 |
JP3836617B2 (ja) * | 1998-02-04 | 2006-10-25 | コダックポリクロームグラフィックス株式会社 | ポジ型感光性組成物、ポジ型感光性平版印刷版及びポジ画像形成方法 |
-
1999
- 1999-11-12 BR BR9915407-2A patent/BR9915407A/pt not_active Application Discontinuation
- 1999-11-12 ES ES99972155T patent/ES2196925T3/es not_active Expired - Lifetime
- 1999-11-12 CN CNB998147184A patent/CN1153666C/zh not_active Expired - Lifetime
- 1999-11-12 EP EP99972155A patent/EP1159133B1/de not_active Expired - Lifetime
- 1999-11-12 AT AT99972155T patent/ATE236791T1/de not_active IP Right Cessation
- 1999-11-12 DE DE69906818T patent/DE69906818T2/de not_active Expired - Lifetime
- 1999-11-12 IL IL14315899A patent/IL143158A0/xx unknown
- 1999-11-12 CA CA002349307A patent/CA2349307A1/en not_active Abandoned
- 1999-11-12 WO PCT/JP1999/006343 patent/WO2000029214A1/en active IP Right Grant
- 1999-11-12 JP JP32219099A patent/JP3979757B2/ja not_active Expired - Fee Related
- 1999-11-12 AU AU11799/00A patent/AU757494B2/en not_active Ceased
- 1999-11-16 US US09/441,094 patent/US6596457B1/en not_active Expired - Lifetime
-
2001
- 2001-05-15 NO NO20012388A patent/NO20012388L/no not_active Application Discontinuation
-
2005
- 2005-05-27 JP JP2005154954A patent/JP2005309458A/ja active Pending
- 2005-08-30 JP JP2005249272A patent/JP4541996B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
AU757494B2 (en) | 2003-02-20 |
JP2005309458A (ja) | 2005-11-04 |
NO20012388D0 (no) | 2001-05-15 |
ES2196925T3 (es) | 2003-12-16 |
JP2001133965A (ja) | 2001-05-18 |
NO20012388L (no) | 2001-07-16 |
DE69906818D1 (de) | 2003-05-15 |
JP3979757B2 (ja) | 2007-09-19 |
CN1153666C (zh) | 2004-06-16 |
DE69906818T2 (de) | 2004-02-26 |
IL143158A0 (en) | 2002-04-21 |
US6596457B1 (en) | 2003-07-22 |
JP2006053571A (ja) | 2006-02-23 |
CN1331632A (zh) | 2002-01-16 |
EP1159133A1 (de) | 2001-12-05 |
CA2349307A1 (en) | 2000-05-25 |
JP4541996B2 (ja) | 2010-09-08 |
EP1159133B1 (de) | 2003-04-09 |
WO2000029214A1 (en) | 2000-05-25 |
AU1179900A (en) | 2000-06-05 |
BR9915407A (pt) | 2001-07-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ATE236791T1 (de) | Positiv-arbeitende photo-empfindliche lithographische druckplatte und verfahren zu ihrer herstellung | |
ATE23228T1 (de) | Verfahren zur herstellung von reliefbildern. | |
DE68912474D1 (de) | Trockenes Verfahren zur Herstellung einer Wasserstoffabsorptionslegierungselektrode. | |
JPS5420719A (en) | Photosensitive material for image formation and image formation method | |
JPS533215A (en) | Photosensitive material developable by stripping and image formation method using this | |
JPS5328375A (en) | Inspecting method | |
EP0123153A3 (de) | Druckplattenherstellung unter Verwendung einer positiv arbeitenden presensibilisierten Druckplatte | |
ATE11186T1 (de) | Verfahren zur herstellung von reliefkopien. | |
JPS5334984A (en) | Immobilization of enzyme by light irradiation | |
JPS5345180A (en) | Photoetching method | |
JPS51116060A (en) | Method of fixing fluorine in borofluoride-containing waste liquid | |
KR880009292A (ko) | 전자선 또는 x-선 조사에 의한 레지스트 미세패턴 형성 방법 | |
JPS5220099A (en) | Automatic ticket examination method | |
JPS5412676A (en) | Position matching method for electron beam exposure | |
JPS5343199A (en) | Discharge system making liquid waste from atomic power plant zero | |
JPS52121943A (en) | Water-saving-type sanitary system and apparatus therefor | |
JPS52133640A (en) | Elevator cage | |
JPS53114356A (en) | Exposing mask and its formation | |
JPS5511876A (en) | Method and device for marking on transparent substance by laser | |
JPS52143769A (en) | Removing method of positive type photo resist | |
KR890007398A (ko) | 패턴 형성방법 | |
JPS55155349A (en) | Photosensitive image forming material | |
SU941212A1 (ru) | Способ изготовлени трафаретной печатной формы | |
JPS5453966A (en) | Development method of electron beam resist | |
JPS53135524A (en) | Judging method for reading chracters |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |