ATE236791T1 - Positiv-arbeitende photo-empfindliche lithographische druckplatte und verfahren zu ihrer herstellung - Google Patents

Positiv-arbeitende photo-empfindliche lithographische druckplatte und verfahren zu ihrer herstellung

Info

Publication number
ATE236791T1
ATE236791T1 AT99972155T AT99972155T ATE236791T1 AT E236791 T1 ATE236791 T1 AT E236791T1 AT 99972155 T AT99972155 T AT 99972155T AT 99972155 T AT99972155 T AT 99972155T AT E236791 T1 ATE236791 T1 AT E236791T1
Authority
AT
Austria
Prior art keywords
photosensitive material
photosensitive
printing plate
positive
lithographic printing
Prior art date
Application number
AT99972155T
Other languages
English (en)
Inventor
Katsuhiko Hidaka
Hiroyuki Yagisawa
Masao Akamatsu
Tatsunori Tsuchiya
Original Assignee
Mitsubishi Chem Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chem Corp filed Critical Mitsubishi Chem Corp
Application granted granted Critical
Publication of ATE236791T1 publication Critical patent/ATE236791T1/de

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • B41C1/10Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • B41C1/10Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B41C1/1016Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/02Positive working, i.e. the exposed (imaged) areas are removed
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06Developable by an alkaline solution
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/14Multiple imaging layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B41C2210/262Phenolic condensation polymers, e.g. novolacs, resols
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/145Infrared
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146Laser beam
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/165Thermal imaging composition

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AT99972155T 1998-11-16 1999-11-12 Positiv-arbeitende photo-empfindliche lithographische druckplatte und verfahren zu ihrer herstellung ATE236791T1 (de)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP32473498 1998-11-16
JP32634098 1998-11-17
JP498599 1999-01-12
JP21195899 1999-07-27
JP21195799 1999-07-27
JP23670599 1999-08-24
PCT/JP1999/006343 WO2000029214A1 (en) 1998-11-16 1999-11-12 Positive-working photosensitive lithographic printing plate and method for producing the same

Publications (1)

Publication Number Publication Date
ATE236791T1 true ATE236791T1 (de) 2003-04-15

Family

ID=27547880

Family Applications (1)

Application Number Title Priority Date Filing Date
AT99972155T ATE236791T1 (de) 1998-11-16 1999-11-12 Positiv-arbeitende photo-empfindliche lithographische druckplatte und verfahren zu ihrer herstellung

Country Status (13)

Country Link
US (1) US6596457B1 (de)
EP (1) EP1159133B1 (de)
JP (3) JP3979757B2 (de)
CN (1) CN1153666C (de)
AT (1) ATE236791T1 (de)
AU (1) AU757494B2 (de)
BR (1) BR9915407A (de)
CA (1) CA2349307A1 (de)
DE (1) DE69906818T2 (de)
ES (1) ES2196925T3 (de)
IL (1) IL143158A0 (de)
NO (1) NO20012388L (de)
WO (1) WO2000029214A1 (de)

Families Citing this family (79)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6706466B1 (en) 1999-08-03 2004-03-16 Kodak Polychrome Graphics Llc Articles having imagable coatings
JP4137345B2 (ja) 2000-06-05 2008-08-20 富士フイルム株式会社 平版印刷版原版
US6613494B2 (en) * 2001-03-13 2003-09-02 Kodak Polychrome Graphics Llc Imageable element having a protective overlayer
JP2003005354A (ja) * 2001-06-20 2003-01-08 Fuji Photo Film Co Ltd 平版印刷版用原版および平版印刷版の製版方法
US6723489B2 (en) 2002-01-30 2004-04-20 Kodak Polychrome Graphics Llp Printing form precursors
JP2003320764A (ja) * 2002-02-27 2003-11-11 Tokushu Paper Mfg Co Ltd 平版印刷版用合紙及びその製造方法
US20060234161A1 (en) 2002-10-04 2006-10-19 Eric Verschueren Method of making a lithographic printing plate precursor
JP2004163732A (ja) * 2002-11-14 2004-06-10 Fuji Photo Film Co Ltd 平版印刷版原版
KR100556503B1 (ko) * 2002-11-26 2006-03-03 엘지전자 주식회사 건조기의 건조 시간제어 방법
EP1630606B1 (de) * 2003-06-30 2008-08-13 Think Laboratory Co., Ltd. Positive lichtempfindliche zusammensetzung
CN100374296C (zh) * 2003-07-14 2008-03-12 富士胶片株式会社 涉及印刷机上显影的平版印刷方法及预敏化的平版印刷版
US7041432B2 (en) * 2004-03-29 2006-05-09 Markhart Gary T Apparatus and method for thermally developing flexographic printing elements
US7467587B2 (en) 2004-04-21 2008-12-23 Agfa Graphics, N.V. Method for accurate exposure of small dots on a heat-sensitive positive-working lithographic printing plate material
US7348126B2 (en) 2004-04-27 2008-03-25 Agfa Graphics N.V. Negative working, heat-sensitive lithographic printing plate precursor
US20070154835A1 (en) * 2004-05-27 2007-07-05 Think Laboratory Co., Ltd. Positive photosensitive composition
US7195861B2 (en) 2004-07-08 2007-03-27 Agfa-Gevaert Method for making a negative working, heat-sensitive lithographic printing plate precursor
US7354696B2 (en) 2004-07-08 2008-04-08 Agfa Graphics Nv Method for making a lithographic printing plate
US7425405B2 (en) 2004-07-08 2008-09-16 Agfa Graphics, N.V. Method for making a lithographic printing plate
JP2006058702A (ja) 2004-08-20 2006-03-02 Fuji Photo Film Co Ltd 平版印刷版原版
JP2006062188A (ja) * 2004-08-26 2006-03-09 Fuji Photo Film Co Ltd 色画像形成材料及び平版印刷版原版
US7198883B2 (en) 2004-09-24 2007-04-03 Agfa-Gevaert Processless lithographic printing plate
WO2006065261A1 (en) * 2004-12-15 2006-06-22 Anocoil Corporation Improved positive working thermal plates
CN100573316C (zh) * 2005-07-08 2009-12-23 上海纺印印刷包装有限公司 一种阳图型热敏/光敏版显影液及其制备方法
CN100500449C (zh) * 2005-12-27 2009-06-17 中国科学院化学研究所 一种计算机直接制版版材及其制备方法
US7338745B2 (en) * 2006-01-23 2008-03-04 Eastman Kodak Company Multilayer imageable element with improved chemical resistance
US7175967B1 (en) * 2006-03-02 2007-02-13 Eastman Kodak Company Heat treatment of multilayer imageable elements
DE602006006969D1 (de) 2006-03-17 2009-07-09 Agfa Graphics Nv Negativ arbeitender, hitzeempfindlicher Lithographiedruckformvorläufer
US20080008956A1 (en) * 2006-06-23 2008-01-10 Eastman Kodak Company Positive-working imageable members with branched hydroxystyrene polymers
GB2439734A (en) * 2006-06-30 2008-01-09 Peter Andrew Reath Bennett Coating for a lithographic precursor and use thereof
US7175969B1 (en) 2006-07-18 2007-02-13 Eastman Kodak Company Method of preparing negative-working radiation-sensitive elements
US7544462B2 (en) * 2007-02-22 2009-06-09 Eastman Kodak Company Radiation-sensitive composition and elements with basic development enhancers
CN101439609B (zh) * 2007-11-22 2010-11-03 乐凯集团第二胶片厂 阳图型感红外光组合物和阳图型印刷版及其使用方法
ATE468981T1 (de) 2007-11-30 2010-06-15 Agfa Graphics Nv Verfahren zur behandlung einer lithografiedruckplatte
EP2095948B1 (de) 2008-02-28 2010-09-15 Agfa Graphics N.V. Verfahren zur Herstellung einer Lithografiedruckplatte
ES2430562T3 (es) 2008-03-04 2013-11-21 Agfa Graphics N.V. Método para la fabricación de un soporte de una plancha de impresión litográfica
ATE514561T1 (de) 2008-03-31 2011-07-15 Agfa Graphics Nv Verfahren zur behandlung einer lithografischen druckplatte
CN102132212B (zh) * 2008-09-04 2013-08-28 日立化成株式会社 正型感光性树脂组合物、抗蚀图形的制造方法以及电子部件
EP2194429A1 (de) 2008-12-02 2010-06-09 Eastman Kodak Company Gummierzusammensetzungen mit Nanoteilchen zur Verbesserung der Kratzempfindlichkeit in Bild- und Nicht-Bild-Bereichen von lithografischen Druckplatten
EP2196851A1 (de) 2008-12-12 2010-06-16 Eastman Kodak Company Negativkopier-Lithographiedruckplattenvorläufer, die ein reaktives Bindemittel umfassen, das aliphatische bi- oder polycyclische Teile enthält
CN101770170B (zh) * 2008-12-30 2012-03-21 乐凯集团第二胶片厂 适合于热敏阳图ctp的感光组合物及含该组合物的平印版
EP2213690B1 (de) 2009-01-30 2015-11-11 Agfa Graphics N.V. Neues alkalisches lösliches harz
ES2381535T3 (es) 2009-06-18 2012-05-29 Agfa Graphics N.V. Precursor de plancha de impresión litográfica
ATE555904T1 (de) 2009-08-10 2012-05-15 Eastman Kodak Co Lithografische druckplattenvorläufer mit betahydroxy-alkylamid-vernetzern
EP2293144B1 (de) 2009-09-04 2012-11-07 Eastman Kodak Company Verfahren zum Trocknen von Lithographiedruckplatten nach einer Einstufenverarbeitung
EP2329951B1 (de) 2009-12-04 2012-06-20 AGFA Graphics NV Lithographiedruckplattenvorläufer
EP2365389B1 (de) * 2010-03-08 2013-01-16 Fujifilm Corporation Positiv arbeitender Lithographiedruckplattenvorläufer für einen Infrarotlaser und Verfahren zur Herstellung einer Lithographiedruckplatte
CN103328214B (zh) 2011-01-25 2015-06-17 爱克发印艺公司 平版印刷版前体
ES2427137T3 (es) 2011-02-18 2013-10-29 Agfa Graphics N.V. Precursor de plancha de impresión litográfica
JP2013130726A (ja) * 2011-12-21 2013-07-04 Eastman Kodak Co ポジ型平版印刷版原版及び平版印刷版の製造方法
JP5813063B2 (ja) 2012-07-27 2015-11-17 富士フイルム株式会社 平版印刷版用支持体およびその製造方法、並びに、平版印刷版原版
EP2735903B1 (de) 2012-11-22 2019-02-27 Eastman Kodak Company Negativ arbeitende Lithografiedruckplattenvorläufer mit hochverzweigtem Bindemittelmaterial
CN103881034B (zh) * 2012-12-21 2016-03-09 乐凯华光印刷科技有限公司 一种激光热塑性纳微米颗粒及其合成方法与用其制作的平印版
US9562129B2 (en) 2013-01-01 2017-02-07 Agfa Graphics Nv (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors
EP2775351B1 (de) 2013-03-07 2017-02-22 Agfa Graphics NV Vorrichtung und Verfahren zur Verarbeitung einer Lithografiedruckplatte
EP2778782B1 (de) 2013-03-13 2015-12-30 Kodak Graphic Communications GmbH Negativ arbeitende strahlungsempfindliche Elemente
CN105283807B (zh) 2013-06-18 2019-09-27 爱克发有限公司 制备具有图案化背层的平版印刷版前体的方法
EP2871057B1 (de) 2013-11-07 2016-09-14 Agfa Graphics Nv Negativ arbeitender, wärmeempfindlicher Lithographiedruckplattenvorläufer
EP2933278B1 (de) 2014-04-17 2018-08-22 Agfa Nv (Ethylen-,Vinylacetal-)Copolymere und ihre Verwendung in Lithographiedruckplattenvorläufern
EP2944657B1 (de) 2014-05-15 2017-01-11 Agfa Graphics Nv (Ethylen-,Vinylacetal-)Copolymere und deren Verwendung in Lithographiedruckplattenvorläufern
ES2660063T3 (es) 2014-06-13 2018-03-20 Agfa Nv Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica
EP2963496B1 (de) 2014-06-30 2017-04-05 Agfa Graphics NV Lithografiedruckplattenvorläufer mit (Ethylen-, Vinylacetal-) Copolymeren
EP3032334B1 (de) 2014-12-08 2017-10-18 Agfa Graphics Nv System zur Reduzierung von Ablationsrückständen
EP3130465B1 (de) 2015-08-12 2020-05-13 Agfa Nv Wärmeempfindlicher lithografiedruckplattenvorläufer
EP3157310A1 (de) 2015-10-12 2017-04-19 Agfa Graphics Nv Erfassungsblatt zur perforation elektrischer platten, wie etwa leiterplatten
EP3170662B1 (de) 2015-11-20 2019-08-14 Agfa Nv Flachdruckplattenvorläufer
JP2019513240A (ja) 2016-03-16 2019-05-23 アグファ・ナームローゼ・フェンノートシャップAgfa Nv 平版印刷版の処理方法
EP3239184A1 (de) 2016-04-25 2017-11-01 Agfa Graphics NV Thermoplastische polymerpartikel und ein lithografiedruckplattenvorläufer
EP3441223B1 (de) 2017-08-07 2024-02-21 Eco3 Bv Lithographiedruckplattenvorläufer
WO2019039074A1 (ja) 2017-08-25 2019-02-28 富士フイルム株式会社 ネガ型平版印刷版原版、及び、平版印刷版の製版方法
EP3474073B1 (de) 2017-10-17 2022-12-07 Agfa Offset Bv Methode zur herstellung einer druckplatte
EP3637188A1 (de) 2018-10-08 2020-04-15 Agfa Nv Sprudelnder entwicklervorläufer zur verarbeitung eines lithografischen druckplattenvorläufers
EP3650938A1 (de) 2018-11-09 2020-05-13 Agfa Nv Lithographiedruckplattenvorläufer
CN113382869B (zh) * 2019-01-31 2023-02-17 富士胶片株式会社 平版印刷版原版、平版印刷版的制作方法及平版印刷方法
EP3715140A1 (de) 2019-03-29 2020-09-30 Agfa Nv Verfahren zum drucken
EP3778253A1 (de) 2019-08-13 2021-02-17 Agfa Nv Verfahren zur verarbeitung einer lithografiedruckplatte
EP3922462B1 (de) 2020-06-08 2023-03-01 Agfa Offset Bv Lithografischer photopolymerer druckplattenvorläufer mit verbesserter tageslichtstabilität
EP4263224A1 (de) 2020-12-16 2023-10-25 Eco3 Bv Make-ready-verfahren für eine lithographische druckmaschine
EP4239411A1 (de) 2022-03-04 2023-09-06 Eco3 Bv Verfahren und vorrichtung zum verarbeiten eine lithografiedruckplattenvorläufers
EP4382306A1 (de) 2022-12-08 2024-06-12 Eco3 Bv Make-ready-verfahren für eine lithographische druckmaschine

Family Cites Families (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5218172B1 (de) 1970-07-08 1977-05-20
DE2217452C3 (de) 1971-04-17 1978-03-16 Mitsubishi Chemical Industries, Ltd., Tokio Verfahren zur Herstellung von 1,4-Diacyloxybuten-(2)
JPS5218688B2 (de) 1974-03-22 1977-05-24
DE2454768C2 (de) 1974-11-19 1983-04-28 Basf Ag, 6700 Ludwigshafen Verfahren zur Isomerisierung von Butendioldiacetaten
US4095030A (en) 1977-01-21 1978-06-13 Phillips Petroleum Company Isomerization of diacyloxyolefins
DE2736695A1 (de) 1977-08-16 1979-03-01 Basf Ag Verfahren zur isomerisierung von butendioldiacetaten
JPS5511555A (en) 1978-07-13 1980-01-26 Mitsubishi Chem Ind Ltd Isomerization of diacetoxybutene
JPS55121447A (en) * 1979-03-15 1980-09-18 Fuji Photo Film Co Ltd Lithographic printing plate correcting agent
JPS57140744A (en) 1981-02-24 1982-08-31 Mitsubishi Chem Ind Ltd Isomerization of diacetoxybutene
JPS58205154A (ja) * 1982-05-25 1983-11-30 Fuji Photo Film Co Ltd 感光性平版印刷版
JP2530333B2 (ja) 1987-04-23 1996-09-04 三菱化学株式会社 不飽和グリコ−ルジエステルの製造方法
US4973572A (en) * 1987-12-21 1990-11-27 Eastman Kodak Company Infrared absorbing cyanine dyes for dye-donor element used in laser-induced thermal dye transfer
JPH05229576A (ja) * 1992-02-25 1993-09-07 Konica Corp 感光性平版印刷版の包装方法
JPH05315243A (ja) * 1992-05-12 1993-11-26 Mitsubishi Electric Corp レジスト膜およびその形成方法
JPH07100383A (ja) 1993-10-06 1995-04-18 Mitsubishi Chem Corp 共役ジエンのアシロキシ化触媒及びこれを用いた不飽和グリコ−ルジエステルの製造法
EP0732628A1 (de) * 1995-03-07 1996-09-18 Minnesota Mining And Manufacturing Company Wässrig-alkalische Lösung zum Entwickeln von Flachdruckplatten
JP3537536B2 (ja) * 1995-04-21 2004-06-14 コダックポリクロームグラフィックス株式会社 感光性平版印刷版の製造方法
JPH0943847A (ja) * 1995-07-31 1997-02-14 Dainippon Printing Co Ltd レジスト材及びパターン形成方法
JPH09114101A (ja) * 1995-10-18 1997-05-02 Konica Corp 画像形成材料の保存方法
JP3738920B2 (ja) * 1996-02-16 2006-01-25 富士写真フイルム株式会社 ポジ型感光性平版印刷版
JP3125678B2 (ja) * 1996-04-08 2001-01-22 信越化学工業株式会社 化学増幅ポジ型レジスト材料
DE825927T1 (de) 1996-04-23 1998-07-16 Horsell, Graphic Industries Ltd., Leeds Warmeempfindliche zusammensetzung und verfahren zur herstellung einer lithographischen druckform damit
JPH09311454A (ja) * 1996-05-21 1997-12-02 Konica Corp 感光性平版印刷版
JP3814961B2 (ja) * 1996-08-06 2006-08-30 三菱化学株式会社 ポジ型感光性印刷版
US6197478B1 (en) * 1996-09-25 2001-03-06 Agfa-Gevaert, N.V. Method for making a driographic printing plate involving the use of a heat-sensitive imaging element
JPH10153863A (ja) * 1996-11-22 1998-06-09 Konica Corp ポジ型感光性組成物
US6090532A (en) * 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
JPH10282652A (ja) * 1997-04-04 1998-10-23 Mitsubishi Chem Corp ポジ型感光性平版印刷版
JPH10282643A (ja) * 1997-04-04 1998-10-23 Mitsubishi Chem Corp ポジ型感光性平版印刷版
US5811221A (en) * 1997-05-30 1998-09-22 Kodak Polychrome Graphics, Llc Alkaline developing composition and method of use to process lithographic printing plates
JP3731356B2 (ja) * 1997-08-13 2006-01-05 三菱化学株式会社 ポジ型感光性組成物、感光性平版印刷版及びポジ画像の形成方法
DE69827882T2 (de) * 1997-08-13 2005-11-03 Mitsubishi Chemical Corp. Positiv arbeitende lichtempfindliche Zusammensetzung, lichtempfindliche Druckplatte und Verfahren zur Herstellung eines positiven Bildes
GB9722861D0 (en) 1997-10-29 1997-12-24 Horsell Graphic Ind Ltd Improvements in relation to the manufacture of lithographic printing forms
JP3920451B2 (ja) * 1997-10-08 2007-05-30 富士フイルム株式会社 赤外線レーザ用ポジ型感光性組成物
US6132929A (en) 1997-10-08 2000-10-17 Fuji Photo Film Co., Ltd. Positive type photosensitive composition for infrared lasers
JPH11119414A (ja) 1997-10-15 1999-04-30 Konica Corp 感光性平版印刷版積層体の加熱処理方法
JP3785833B2 (ja) * 1997-10-28 2006-06-14 三菱化学株式会社 ポジ型感光性組成物、ポジ型感光性平版印刷版及びその処理方法
DE69810242T2 (de) * 1997-10-28 2003-10-30 Mitsubishi Chemical Corp., Tokio/Tokyo Positiv arbeitendes strahlungsempfindliches Gemisch, positiv arbeitende lichtempfindliche Flachdruckplatte und Verfahren zur Bebilderung der Druckplatte
JP3949832B2 (ja) * 1997-11-14 2007-07-25 富士フイルム株式会社 赤外線レーザ用感光性画像形成材料
JP3836617B2 (ja) * 1998-02-04 2006-10-25 コダックポリクロームグラフィックス株式会社 ポジ型感光性組成物、ポジ型感光性平版印刷版及びポジ画像形成方法

Also Published As

Publication number Publication date
AU757494B2 (en) 2003-02-20
JP2005309458A (ja) 2005-11-04
NO20012388D0 (no) 2001-05-15
ES2196925T3 (es) 2003-12-16
JP2001133965A (ja) 2001-05-18
NO20012388L (no) 2001-07-16
DE69906818D1 (de) 2003-05-15
JP3979757B2 (ja) 2007-09-19
CN1153666C (zh) 2004-06-16
DE69906818T2 (de) 2004-02-26
IL143158A0 (en) 2002-04-21
US6596457B1 (en) 2003-07-22
JP2006053571A (ja) 2006-02-23
CN1331632A (zh) 2002-01-16
EP1159133A1 (de) 2001-12-05
CA2349307A1 (en) 2000-05-25
JP4541996B2 (ja) 2010-09-08
EP1159133B1 (de) 2003-04-09
WO2000029214A1 (en) 2000-05-25
AU1179900A (en) 2000-06-05
BR9915407A (pt) 2001-07-24

Similar Documents

Publication Publication Date Title
ATE236791T1 (de) Positiv-arbeitende photo-empfindliche lithographische druckplatte und verfahren zu ihrer herstellung
ATE23228T1 (de) Verfahren zur herstellung von reliefbildern.
DE68912474D1 (de) Trockenes Verfahren zur Herstellung einer Wasserstoffabsorptionslegierungselektrode.
JPS5420719A (en) Photosensitive material for image formation and image formation method
JPS533215A (en) Photosensitive material developable by stripping and image formation method using this
JPS5328375A (en) Inspecting method
EP0123153A3 (de) Druckplattenherstellung unter Verwendung einer positiv arbeitenden presensibilisierten Druckplatte
ATE11186T1 (de) Verfahren zur herstellung von reliefkopien.
JPS5334984A (en) Immobilization of enzyme by light irradiation
JPS5345180A (en) Photoetching method
JPS51116060A (en) Method of fixing fluorine in borofluoride-containing waste liquid
KR880009292A (ko) 전자선 또는 x-선 조사에 의한 레지스트 미세패턴 형성 방법
JPS5220099A (en) Automatic ticket examination method
JPS5412676A (en) Position matching method for electron beam exposure
JPS5343199A (en) Discharge system making liquid waste from atomic power plant zero
JPS52121943A (en) Water-saving-type sanitary system and apparatus therefor
JPS52133640A (en) Elevator cage
JPS53114356A (en) Exposing mask and its formation
JPS5511876A (en) Method and device for marking on transparent substance by laser
JPS52143769A (en) Removing method of positive type photo resist
KR890007398A (ko) 패턴 형성방법
JPS55155349A (en) Photosensitive image forming material
SU941212A1 (ru) Способ изготовлени трафаретной печатной формы
JPS5453966A (en) Development method of electron beam resist
JPS53135524A (en) Judging method for reading chracters

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties