ATE204030T1 - Verfahren zur herstellung einer hartstoffschutzschicht - Google Patents
Verfahren zur herstellung einer hartstoffschutzschichtInfo
- Publication number
- ATE204030T1 ATE204030T1 AT95939327T AT95939327T ATE204030T1 AT E204030 T1 ATE204030 T1 AT E204030T1 AT 95939327 T AT95939327 T AT 95939327T AT 95939327 T AT95939327 T AT 95939327T AT E204030 T1 ATE204030 T1 AT E204030T1
- Authority
- AT
- Austria
- Prior art keywords
- pct
- producing
- protective layer
- hard material
- date
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
- C23C14/0658—Carbon nitride
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
- C23C16/347—Carbon nitride
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Vapour Deposition (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Laminated Bodies (AREA)
- Carbon And Carbon Compounds (AREA)
- Glass Compositions (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9413323A FR2726579A1 (fr) | 1994-11-07 | 1994-11-07 | Procede de depot d'un revetement protecteur de type pseudo carbonne diamant amorphe |
PCT/FR1995/001455 WO1996014448A1 (fr) | 1994-11-07 | 1995-11-06 | Procede de depot d'un revetement protecteur de grande durete |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE204030T1 true ATE204030T1 (de) | 2001-08-15 |
Family
ID=9468576
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT95939327T ATE204030T1 (de) | 1994-11-07 | 1995-11-06 | Verfahren zur herstellung einer hartstoffschutzschicht |
Country Status (9)
Country | Link |
---|---|
US (1) | US5846613A (de) |
EP (1) | EP0787222B1 (de) |
CN (1) | CN1053931C (de) |
AT (1) | ATE204030T1 (de) |
AU (1) | AU4119696A (de) |
DE (1) | DE69522115T2 (de) |
ES (1) | ES2162639T3 (de) |
FR (1) | FR2726579A1 (de) |
WO (1) | WO1996014448A1 (de) |
Families Citing this family (44)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19646475A1 (de) * | 1996-11-11 | 1998-05-14 | Notter Werkzeugbau Gmbh | Tablettierwerkzeug mit adhäsionshemmender Beschichtung |
DE19651953A1 (de) * | 1996-12-13 | 1998-07-02 | Bayer Bitterfeld Gmbh | Vorrichtung zum Verpressen von fließfähigen Feststoffen oder halbfesten Stoffen |
IT1289815B1 (it) * | 1996-12-30 | 1998-10-16 | Sorin Biomedica Cardio Spa | Stent per angioplastica e relativo procedimento di produzione |
JPH10330932A (ja) * | 1997-05-28 | 1998-12-15 | Anelva Corp | スパッタリング装置 |
ATA119098A (de) * | 1998-07-09 | 1999-05-15 | Ims Ionen Mikrofab Syst | Verfahren zur erzeugung eines kohlenstoffilmes auf einem substrat |
GB2342660B (en) * | 1998-10-12 | 2000-09-27 | Univ Houston | Process for producing a carbon film on a substrate |
US6660365B1 (en) | 1998-12-21 | 2003-12-09 | Cardinal Cg Company | Soil-resistant coating for glass surfaces |
US6368664B1 (en) | 1999-05-03 | 2002-04-09 | Guardian Industries Corp. | Method of ion beam milling substrate prior to depositing diamond like carbon layer thereon |
US6312808B1 (en) | 1999-05-03 | 2001-11-06 | Guardian Industries Corporation | Hydrophobic coating with DLC & FAS on substrate |
US6475573B1 (en) | 1999-05-03 | 2002-11-05 | Guardian Industries Corp. | Method of depositing DLC inclusive coating on substrate |
US6461731B1 (en) | 1999-05-03 | 2002-10-08 | Guardian Industries Corp. | Solar management coating system including protective DLC |
US6335086B1 (en) | 1999-05-03 | 2002-01-01 | Guardian Industries Corporation | Hydrophobic coating including DLC on substrate |
US6277480B1 (en) | 1999-05-03 | 2001-08-21 | Guardian Industries Corporation | Coated article including a DLC inclusive layer(s) and a layer(s) deposited using siloxane gas, and corresponding method |
US6338901B1 (en) | 1999-05-03 | 2002-01-15 | Guardian Industries Corporation | Hydrophobic coating including DLC on substrate |
US6280834B1 (en) | 1999-05-03 | 2001-08-28 | Guardian Industries Corporation | Hydrophobic coating including DLC and/or FAS on substrate |
US6447891B1 (en) | 1999-05-03 | 2002-09-10 | Guardian Industries Corp. | Low-E coating system including protective DLC |
US6261693B1 (en) | 1999-05-03 | 2001-07-17 | Guardian Industries Corporation | Highly tetrahedral amorphous carbon coating on glass |
GB9910841D0 (en) * | 1999-05-10 | 1999-07-07 | Univ Nanyang | Heat transfer surface |
US6265305B1 (en) * | 1999-10-01 | 2001-07-24 | United Microelectronics Corp. | Method of preventing corrosion of a titanium layer in a semiconductor wafer |
DE10002861A1 (de) * | 2000-01-24 | 2001-08-09 | Walter Ag | Zerspannungswerkzeug mit Carbonitrid-Beschichtung |
DE10056242A1 (de) * | 2000-11-14 | 2002-05-23 | Alstom Switzerland Ltd | Kondensationswärmeübertrager |
US6537429B2 (en) | 2000-12-29 | 2003-03-25 | Lam Research Corporation | Diamond coatings on reactor wall and method of manufacturing thereof |
JP5013353B2 (ja) * | 2001-03-28 | 2012-08-29 | 隆 杉野 | 成膜方法及び成膜装置 |
JP4153212B2 (ja) * | 2002-02-04 | 2008-09-24 | 富士通株式会社 | テトラヘドラルアモルファスカーボン膜およびその製造方法 |
FR2867247B1 (fr) * | 2004-03-05 | 2006-06-02 | Skf Ab | Dispositif de galet tendeur |
WO2006001340A1 (ja) * | 2004-06-23 | 2006-01-05 | Komatsu Denshi Kinzoku Kabushiki Kaisha | 両面研磨用キャリアおよびその製造方法 |
CA2570369C (en) | 2004-07-12 | 2008-02-19 | Cardinal Cg Company | Low-maintenance coatings |
DE102004041235A1 (de) * | 2004-08-26 | 2006-03-02 | Ina-Schaeffler Kg | Verschleißfeste Beschichtung und Verfahren zur Herstellung derselben |
US7923114B2 (en) | 2004-12-03 | 2011-04-12 | Cardinal Cg Company | Hydrophilic coatings, methods for depositing hydrophilic coatings, and improved deposition technology for thin films |
US8092660B2 (en) | 2004-12-03 | 2012-01-10 | Cardinal Cg Company | Methods and equipment for depositing hydrophilic coatings, and deposition technologies for thin films |
CN1870863B (zh) * | 2005-05-28 | 2011-06-08 | 鸿富锦精密工业(深圳)有限公司 | 便携式电子装置外壳及其制作方法 |
TWI386494B (zh) * | 2005-11-18 | 2013-02-21 | Hon Hai Prec Ind Co Ltd | 一種具有多層鍍膜之模具 |
CN1970827B (zh) * | 2005-11-25 | 2010-05-05 | 鸿富锦精密工业(深圳)有限公司 | 一种具有多层类金刚石碳膜的模具的制作方法 |
CN100390316C (zh) * | 2006-01-19 | 2008-05-28 | 上海电机学院 | n型CVD共掺杂金刚石薄膜的制备方法 |
US7989094B2 (en) | 2006-04-19 | 2011-08-02 | Cardinal Cg Company | Opposed functional coatings having comparable single surface reflectances |
US20080011599A1 (en) | 2006-07-12 | 2008-01-17 | Brabender Dennis M | Sputtering apparatus including novel target mounting and/or control |
US8646444B2 (en) * | 2007-03-27 | 2014-02-11 | Electrolux Home Products, Inc. | Glide rack |
EP2261186B1 (de) | 2007-09-14 | 2017-11-22 | Cardinal CG Company | Pflegeleichte beschichtungstechnologie |
KR100991770B1 (ko) * | 2010-03-15 | 2010-11-03 | 한국과학기술연구원 | 입방정계 질화붕소 박막의 증착 방법 |
CN103160781B (zh) * | 2011-12-16 | 2015-07-01 | 中国科学院兰州化学物理研究所 | 模具钢表面多层梯度纳米复合类金刚石薄膜的制备方法 |
CN102816913B (zh) * | 2012-09-04 | 2013-11-13 | 北京理工大学 | 一种利用超音速颗粒轰击技术提高非晶合金塑性的方法 |
WO2018093985A1 (en) | 2016-11-17 | 2018-05-24 | Cardinal Cg Company | Static-dissipative coating technology |
CN109994351B (zh) * | 2018-01-02 | 2021-07-13 | 台湾积体电路制造股份有限公司 | 离子布植机及离子布植机腔室的制造方法 |
WO2023230406A1 (en) * | 2022-05-24 | 2023-11-30 | Lam Research Corporation | Underlayer with bonded dopants for photolithography |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS552715A (en) * | 1978-06-20 | 1980-01-10 | Mitsubishi Metal Corp | Coating method for base material surface with metallic nitride |
JPS6075579A (ja) * | 1983-09-30 | 1985-04-27 | Toshiba Corp | 金色装飾品 |
EP0244874A3 (de) * | 1986-05-08 | 1988-10-12 | Kabushiki Kaisha Meidensha | Lumineszentes Material, Verfahren zu seiner Herstellung und lumineszentes Halbleiterelement |
JPS63134661A (ja) * | 1986-11-22 | 1988-06-07 | Sumitomo Electric Ind Ltd | 高硬度窒化硼素の合成法 |
JPS63195266A (ja) * | 1987-02-10 | 1988-08-12 | Semiconductor Energy Lab Co Ltd | 炭素膜がコーティングされた時計 |
KR900008505B1 (ko) * | 1987-02-24 | 1990-11-24 | 세미콘덕터 에너지 라보라터리 캄파니 리미티드 | 탄소 석출을 위한 마이크로파 강화 cvd 방법 |
DE3941202A1 (de) * | 1989-12-14 | 1990-06-07 | Fried. Krupp Gmbh, 4300 Essen | Verfahren zur erzeugung von schichten aus harten kohlenstoffmodifikationen und vorrichtung zur durchfuehrung des verfahrens |
DE4113791A1 (de) * | 1991-04-26 | 1992-10-29 | Solvay Deutschland | Verfahren zur abscheidung einer bor und stickstoff enthaltenden schicht |
-
1994
- 1994-11-07 FR FR9413323A patent/FR2726579A1/fr active Pending
-
1995
- 1995-11-06 AT AT95939327T patent/ATE204030T1/de not_active IP Right Cessation
- 1995-11-06 WO PCT/FR1995/001455 patent/WO1996014448A1/fr active IP Right Grant
- 1995-11-06 EP EP95939327A patent/EP0787222B1/de not_active Expired - Lifetime
- 1995-11-06 CN CN95196758A patent/CN1053931C/zh not_active Expired - Fee Related
- 1995-11-06 DE DE69522115T patent/DE69522115T2/de not_active Expired - Fee Related
- 1995-11-06 ES ES95939327T patent/ES2162639T3/es not_active Expired - Lifetime
- 1995-11-06 US US08/836,630 patent/US5846613A/en not_active Expired - Fee Related
- 1995-11-06 AU AU41196/96A patent/AU4119696A/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
DE69522115T2 (de) | 2002-04-25 |
EP0787222A1 (de) | 1997-08-06 |
DE69522115D1 (de) | 2001-09-13 |
US5846613A (en) | 1998-12-08 |
EP0787222B1 (de) | 2001-08-08 |
CN1053931C (zh) | 2000-06-28 |
AU4119696A (en) | 1996-05-31 |
CN1169757A (zh) | 1998-01-07 |
ES2162639T3 (es) | 2002-01-01 |
FR2726579A1 (fr) | 1996-05-10 |
WO1996014448A1 (fr) | 1996-05-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |