ATE138049T1 - Oxidpulver, sinterkörper, verfahren zu dessen herstellung und daraus zusammengesetztes target - Google Patents
Oxidpulver, sinterkörper, verfahren zu dessen herstellung und daraus zusammengesetztes targetInfo
- Publication number
- ATE138049T1 ATE138049T1 AT90302147T AT90302147T ATE138049T1 AT E138049 T1 ATE138049 T1 AT E138049T1 AT 90302147 T AT90302147 T AT 90302147T AT 90302147 T AT90302147 T AT 90302147T AT E138049 T1 ATE138049 T1 AT E138049T1
- Authority
- AT
- Austria
- Prior art keywords
- oxide powder
- indium
- tin
- sintered body
- particle diameter
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G15/00—Compounds of gallium, indium or thallium
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G19/00—Compounds of tin
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Physical Vapour Deposition (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4545789 | 1989-02-28 | ||
JP4545889 | 1989-02-28 | ||
JP4545689 | 1989-02-28 | ||
JP4545589 | 1989-02-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE138049T1 true ATE138049T1 (de) | 1996-06-15 |
Family
ID=27461706
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT90302147T ATE138049T1 (de) | 1989-02-28 | 1990-02-28 | Oxidpulver, sinterkörper, verfahren zu dessen herstellung und daraus zusammengesetztes target |
Country Status (5)
Country | Link |
---|---|
US (1) | US5071800A (de) |
EP (1) | EP0386932B1 (de) |
KR (1) | KR950010806B1 (de) |
AT (1) | ATE138049T1 (de) |
DE (1) | DE69026973T2 (de) |
Families Citing this family (45)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4124471C1 (en) * | 1991-07-24 | 1992-06-11 | Degussa Ag, 6000 Frankfurt, De | Target for cathodic sputtering - produced from partially reduced mixtures of indium oxide and tin oxide by hot pressing in inert protective gas |
US5480531A (en) * | 1991-07-24 | 1996-01-02 | Degussa Aktiengesellschaft | Target for cathode sputtering and method of its production |
FR2685011B1 (fr) * | 1991-12-13 | 1994-02-04 | Elf Aquitaine Ste Nale | Procede de preparation d'un element de cible pour pulverisation cathodique et cibles, notamment de grande surface, realisees a partir de cet element. |
US5401701A (en) * | 1992-08-19 | 1995-03-28 | Tosoh Corporation | Ito sintered body and method of manufacturing the same |
JPH06158308A (ja) * | 1992-11-24 | 1994-06-07 | Hitachi Metals Ltd | インジウム・スズ酸化物膜用スパッタリング用ターゲットおよびその製造方法 |
US5417816A (en) * | 1992-12-09 | 1995-05-23 | Nikko Kyodo, Ltd. | Process for preparation of indium oxide-tin oxide powder |
US5433901A (en) * | 1993-02-11 | 1995-07-18 | Vesuvius Crucible Company | Method of manufacturing an ITO sintered body |
US5580496A (en) * | 1993-04-05 | 1996-12-03 | Sumitomo Metal Mining Company Limited | Raw material for producing powder of indium-tin oxide aciculae and method of producing the raw material, powder of indium-tin oxide aciculae and method of producing the powder, electroconductive paste and light-transmitting |
DE4407774C1 (de) * | 1994-03-09 | 1995-04-20 | Leybold Materials Gmbh | Target für die Kathodenzerstäubung zur Herstellung transparenter, leitfähiger Schichten und Verfahren zu seiner Herstellung |
DE4413344A1 (de) * | 1994-04-18 | 1995-10-19 | Leybold Materials Gmbh | Verfahren zur Herstellung teilreduzierter Indiumoxid-Zinnoxid Targets |
DE4427060C1 (de) * | 1994-07-29 | 1995-11-30 | Heraeus Gmbh W C | Bauteil aus Indium-Zinn-Oxid und Verfahren für seine Herstellung |
DE4438323C1 (de) * | 1994-10-27 | 1995-07-27 | Leybold Materials Gmbh | Verfahren zum Recyceln von abgesputterten Indiumoxid-Zinnoxid-Targets |
DE19508898A1 (de) | 1995-03-11 | 1996-09-12 | Leybold Materials Gmbh | Indiumoxid/Zinnoxid Sputtertarget für die Kathodenzerstäubung |
US6033620A (en) * | 1995-04-18 | 2000-03-07 | Tosoh Corporation | Process of preparing high-density sintered ITO compact and sputtering target |
US6027673A (en) * | 1995-11-21 | 2000-02-22 | The Aerospace Corporation | Method of making indium oxide microspheres for antistatic coatings |
US5866493A (en) * | 1995-11-30 | 1999-02-02 | Korea Academy Of Industrial Technology | Method of manufacturing a sintered body of indium tin oxide |
NL1004635C2 (nl) * | 1995-12-06 | 1999-01-12 | Sumitomo Chemical Co | Indiumoxyde-tinoxydepoeders en werkwijze voor het voortbrengen daarvan. |
US5876633A (en) * | 1995-12-26 | 1999-03-02 | Monsanto Company | Electrochromic metal oxides |
CA2241286A1 (en) * | 1995-12-26 | 1997-07-03 | Monsanto Company | Electrochromic tin oxide |
JPH10133216A (ja) * | 1996-11-01 | 1998-05-22 | Hitachi Ltd | アクティブマトリクス型液晶表示装置 |
JP3781878B2 (ja) * | 1996-10-04 | 2006-05-31 | 同和鉱業株式会社 | Ito焼結体およびitoスパッタリングターゲット |
JP3862385B2 (ja) * | 1996-11-08 | 2006-12-27 | Dowaホールディングス株式会社 | 酸化スズ含有酸化インジウム粉及び焼結体の製造方法 |
JP3931363B2 (ja) * | 1996-12-20 | 2007-06-13 | 東ソー株式会社 | Ito焼結体の製造法 |
DE19721649C2 (de) * | 1997-05-23 | 2003-02-20 | Heraeus Gmbh W C | Verfahren zur Herstellung eines Mischkristallpulvers mit geringem spezifischen elektrischen Widerstand |
JP2972996B2 (ja) * | 1997-12-02 | 1999-11-08 | 三井金属鉱業株式会社 | Ito微粉末及びその製造方法 |
US6500225B2 (en) * | 1998-12-03 | 2002-12-31 | Sumitomo Chemical Company, Limited | Method for producing high density indium-tin-oxide sintered body |
JP3585033B2 (ja) * | 2000-04-29 | 2004-11-04 | 喜萬 中山 | カーボンナノコイル生成用のインジウム・スズ・鉄系触媒の製造方法 |
KR100490234B1 (ko) * | 2001-03-28 | 2005-05-17 | 가부시키 가이샤 닛코 마테리알즈 | 산화 인듐 중에 주석이 고용된아이티오(산화주석-산화인듐) 분말의 제조방법 및아이티오(산화주석-산화인듐) 타겟트의 제조방법 |
DE10129376A1 (de) * | 2001-06-20 | 2003-01-09 | Degussa | Indium-Zinn-Oxide |
KR100744017B1 (ko) * | 2001-06-26 | 2007-07-30 | 미츠이 긴조쿠 고교 가부시키가이샤 | 고저항 투명 도전막용 스퍼터링 타겟 및 고저항 투명도전막의 제조방법 |
TW200523226A (en) * | 2003-12-25 | 2005-07-16 | Mitsui Mining & Smelting Co | Indium oxide-tin oxide powder and sputtering target using the same |
GB0411945D0 (en) * | 2004-05-28 | 2004-06-30 | Ici Plc | Mixed metal oxides |
DE102004037210A1 (de) * | 2004-07-30 | 2006-03-23 | Nanogate Advanced Materials Gmbh | Multifunktionsadditiv |
DE102004039358A1 (de) * | 2004-08-12 | 2006-02-23 | Merck Patent Gmbh | Härtungsbeschleuniger |
WO2007134439A1 (fr) * | 2006-05-18 | 2007-11-29 | Hydro-Quebec | Procédé de préparation de céramiques, céramiques ainsi obtenues et leurs utilisations notamment comme cible pour pulvérisation cathodique |
CA2547091A1 (fr) * | 2006-05-18 | 2007-11-18 | Hydro Quebec | Procede de preparation de ceramiques, ceramiques ainsi obtenues et leurs utilisations notamment comme cible pour pulverisation cathodique |
TWI432592B (zh) * | 2007-04-27 | 2014-04-01 | Honeywell Int Inc | 具有降低預燒時間之濺鍍靶,其製造方法及其用途 |
WO2008150867A2 (en) | 2007-05-29 | 2008-12-11 | Innova Materials, Llc | Surfaces having particles and related methods |
GB2459917B (en) * | 2008-05-12 | 2013-02-27 | Sinito Shenzhen Optoelectrical Advanced Materials Company Ltd | A process for the manufacture of a high density ITO sputtering target |
KR20110020235A (ko) * | 2008-06-18 | 2011-03-02 | 스미또모 가가꾸 가부시끼가이샤 | 티탄산알루미늄계 세라믹스의 제조 방법 |
US10105875B2 (en) | 2008-08-21 | 2018-10-23 | Cam Holding Corporation | Enhanced surfaces, coatings, and related methods |
CA2829242A1 (en) | 2010-08-07 | 2012-02-16 | Arjun Daniel Srinivas | Device components with surface-embedded additives and related manufacturing methods |
AU2012275284B2 (en) * | 2011-06-28 | 2015-06-11 | Innova Dynamics, Inc. | Transparent conductors incorporating additives and related manufacturing methods |
KR101297581B1 (ko) * | 2011-08-17 | 2013-08-19 | 전북대학교산학협력단 | Izto 미세분말 및 이의 제조방법 |
US9981900B2 (en) | 2014-04-12 | 2018-05-29 | Cn Innovations | Methods of metal oxide nanocrystals preparation |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3300525A1 (de) * | 1983-01-10 | 1984-07-12 | Merck Patent Gmbh, 6100 Darmstadt | Targets fuer die kathodenzerstaeubung |
JPS63199862A (ja) * | 1987-02-17 | 1988-08-18 | Asahi Glass Co Ltd | 錫を含む物理蒸着用酸化インジウム焼結体 |
DE68924095T2 (de) * | 1988-05-16 | 1996-04-04 | Tosoh Corp | Verfahren zur Herstellung eines Sputtertargets zur Erzeugung einer elektrisch leitenden, durchsichtigen Schicht. |
-
1990
- 1990-02-27 US US07/485,877 patent/US5071800A/en not_active Expired - Lifetime
- 1990-02-28 AT AT90302147T patent/ATE138049T1/de not_active IP Right Cessation
- 1990-02-28 KR KR1019900002644A patent/KR950010806B1/ko not_active IP Right Cessation
- 1990-02-28 DE DE69026973T patent/DE69026973T2/de not_active Expired - Fee Related
- 1990-02-28 EP EP90302147A patent/EP0386932B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0386932A1 (de) | 1990-09-12 |
DE69026973T2 (de) | 1996-10-02 |
US5071800A (en) | 1991-12-10 |
KR950010806B1 (ko) | 1995-09-23 |
KR910015498A (ko) | 1991-09-30 |
DE69026973D1 (de) | 1996-06-20 |
EP0386932B1 (de) | 1996-05-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
UEP | Publication of translation of european patent specification | ||
REN | Ceased due to non-payment of the annual fee |