ATE114061T1 - Antireflex-belag für photolithographie. - Google Patents
Antireflex-belag für photolithographie.Info
- Publication number
- ATE114061T1 ATE114061T1 AT88303400T AT88303400T ATE114061T1 AT E114061 T1 ATE114061 T1 AT E114061T1 AT 88303400 T AT88303400 T AT 88303400T AT 88303400 T AT88303400 T AT 88303400T AT E114061 T1 ATE114061 T1 AT E114061T1
- Authority
- AT
- Austria
- Prior art keywords
- layer
- aluminum
- photoresist
- titanium
- conjunction
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Materials For Photolithography (AREA)
- Laminated Bodies (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US4240287A | 1987-04-24 | 1987-04-24 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE114061T1 true ATE114061T1 (de) | 1994-11-15 |
Family
ID=21921742
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT88303400T ATE114061T1 (de) | 1987-04-24 | 1988-04-15 | Antireflex-belag für photolithographie. |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP0289174B1 (de) |
JP (1) | JP2517357B2 (de) |
AT (1) | ATE114061T1 (de) |
DE (1) | DE3852057T2 (de) |
ES (1) | ES2063032T3 (de) |
GR (1) | GR3014920T3 (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5219788A (en) * | 1991-02-25 | 1993-06-15 | Ibm Corporation | Bilayer metallization cap for photolithography |
US6040613A (en) * | 1996-01-19 | 2000-03-21 | Micron Technology, Inc. | Antireflective coating and wiring line stack |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS596540A (ja) * | 1982-07-05 | 1984-01-13 | Toshiba Corp | 半導体装置の製造方法 |
GB2145539B (en) * | 1983-08-22 | 1986-08-28 | Gen Electric | Optical preparation of molybdenum surfaces |
JPH061764B2 (ja) * | 1985-02-14 | 1994-01-05 | 日本電信電話株式会社 | パタ−ン形成法 |
-
1988
- 1988-04-15 EP EP88303400A patent/EP0289174B1/de not_active Expired - Lifetime
- 1988-04-15 AT AT88303400T patent/ATE114061T1/de not_active IP Right Cessation
- 1988-04-15 DE DE3852057T patent/DE3852057T2/de not_active Expired - Lifetime
- 1988-04-15 ES ES88303400T patent/ES2063032T3/es not_active Expired - Lifetime
- 1988-04-20 JP JP63098038A patent/JP2517357B2/ja not_active Expired - Lifetime
-
1995
- 1995-02-01 GR GR950400184T patent/GR3014920T3/el unknown
Also Published As
Publication number | Publication date |
---|---|
ES2063032T3 (es) | 1995-01-01 |
EP0289174B1 (de) | 1994-11-09 |
JPS63316053A (ja) | 1988-12-23 |
GR3014920T3 (en) | 1995-05-31 |
EP0289174A2 (de) | 1988-11-02 |
JP2517357B2 (ja) | 1996-07-24 |
EP0289174A3 (en) | 1990-11-22 |
DE3852057D1 (de) | 1994-12-15 |
DE3852057T2 (de) | 1995-05-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
UEP | Publication of translation of european patent specification | ||
REN | Ceased due to non-payment of the annual fee |