AR248459A1 - Composicion insaturada, fotoendurecible y electrodepositable que comprende un fotoiniciador, y un procedimiento para preparar una capa de revestimiento fotoendurecible mediante dicha composicion. - Google Patents
Composicion insaturada, fotoendurecible y electrodepositable que comprende un fotoiniciador, y un procedimiento para preparar una capa de revestimiento fotoendurecible mediante dicha composicion.Info
- Publication number
- AR248459A1 AR248459A1 AR91320310A AR32031091A AR248459A1 AR 248459 A1 AR248459 A1 AR 248459A1 AR 91320310 A AR91320310 A AR 91320310A AR 32031091 A AR32031091 A AR 32031091A AR 248459 A1 AR248459 A1 AR 248459A1
- Authority
- AR
- Argentina
- Prior art keywords
- photoimageable
- photoresist composition
- electrodepositable photoresist
- unsaturated
- electrodepositable
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/164—Coating processes; Apparatus therefor using electric, electrostatic or magnetic means; powder coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/107—Polyamide or polyurethane
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/136—Coating process making radiation sensitive element
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Materials For Photolithography (AREA)
- Paints Or Removers (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Polymerisation Methods In General (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
UNA COMPOSICION INSATURADA, FOTOENDURECIBLE Y ELECTRODEPOSITABLE QUE COMPRENDE UN FOTOINICIADOR, DONDE LA INSATURACION ES RESULTANTE DE UNA DISPERSION ACUOSA QUE CONTIENE UNA COMBINACION DE (A) UN MATERIAL POLIMERICO CATIONICO NO SATURADO, DISPERSABLE EN AGUA, QUE ES UN PRODUCTO DE REACCION DE UN PRIMER MONOMERO QUE TIENE POR LO MENOS UN GRUPO EPOXI POR MOLECULA Y UN SEGUNDO MONOMERO ELEGIDO DEL GRUPO QUE CONSISTE DE AMINAS, SULFUROS, FOSFINAS Y MEZCLAS DE LOS MISMOS, Y (B) UN MATERIAL NO IONICO INSATURADO.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US56205790A | 1990-08-02 | 1990-08-02 | |
US69735591A | 1991-01-14 | 1991-01-14 |
Publications (1)
Publication Number | Publication Date |
---|---|
AR248459A1 true AR248459A1 (es) | 1995-08-18 |
Family
ID=27072823
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AR91320310A AR248459A1 (es) | 1990-08-02 | 1991-08-01 | Composicion insaturada, fotoendurecible y electrodepositable que comprende un fotoiniciador, y un procedimiento para preparar una capa de revestimiento fotoendurecible mediante dicha composicion. |
Country Status (12)
Country | Link |
---|---|
US (2) | US5674660A (es) |
EP (1) | EP0469537B1 (es) |
JP (1) | JP2547904B2 (es) |
KR (1) | KR950001005B1 (es) |
AR (1) | AR248459A1 (es) |
AT (1) | ATE175280T1 (es) |
AU (1) | AU649695B2 (es) |
BR (1) | BR9103260A (es) |
CA (1) | CA2048164C (es) |
DE (1) | DE69130691T2 (es) |
ES (1) | ES2126558T3 (es) |
MX (1) | MX9100508A (es) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05343837A (ja) * | 1992-06-05 | 1993-12-24 | Taiyo Ink Mfg Ltd | ソルダーレジストインキ組成物及びソルダーレジストパターン形成方法 |
JPH06164102A (ja) * | 1992-11-25 | 1994-06-10 | Nippon Paint Co Ltd | 電着型感光性樹脂被膜の表面処理方法 |
US5721088A (en) * | 1995-12-20 | 1998-02-24 | Ppg Industries, Inc. | Electrodepositable photoimageable compositions with improved edge coverage |
AU4252997A (en) * | 1996-09-19 | 1998-04-14 | Ericsson Inc. | Battery charging methods and apparatuses |
US6559222B1 (en) | 1997-10-16 | 2003-05-06 | Sun Chemical Corporation | Photoneutralization of pH sensitive aqueous polymeric dispersions and methods for using same |
US6268109B1 (en) | 1999-10-12 | 2001-07-31 | E. I. Du Pont De Nemours And Company | Composite photosensitive element |
JP4440590B2 (ja) * | 2003-09-29 | 2010-03-24 | 関西ペイント株式会社 | カチオン性塗料組成物及び塗膜形成方法 |
JP2005305689A (ja) * | 2004-04-19 | 2005-11-04 | Konica Minolta Medical & Graphic Inc | 印刷版材料および印刷方法 |
US7537884B2 (en) * | 2004-10-20 | 2009-05-26 | National Taiwan University | Method for forming self-synthesizing conductive or conjugated polymer film and application |
EP2868681A1 (en) * | 2013-10-31 | 2015-05-06 | ALLNEX AUSTRIA GmbH | Waterborne curing compositions for electrodeposition and radiation curing and processes to obtain such compositions |
Family Cites Families (57)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3501391A (en) * | 1966-10-03 | 1970-03-17 | Ford Motor Co | Electrocoatacure process and paint binders therefor |
US3501390A (en) * | 1966-10-03 | 1970-03-17 | Ford Motor Co | Process for electrocoating and polymerizing by radiation |
US3937679A (en) * | 1968-10-31 | 1976-02-10 | Ppg Industries, Inc. | Electrodepositable compositions |
JPS4836163B1 (es) * | 1969-12-03 | 1973-11-01 | ||
US3738835A (en) * | 1971-10-21 | 1973-06-12 | Ibm | Electrophoretic photoresist composition and a method of forming etch resistant masks |
JPS5221526B2 (es) * | 1972-01-10 | 1977-06-11 | ||
US3894922A (en) * | 1972-01-12 | 1975-07-15 | Ppg Industries Inc | Electrodeposition method utilizing quaternary phosphonium group-containing resins |
US3936405A (en) * | 1972-08-16 | 1976-02-03 | Ppg Industries, Inc. | Novel pigment grinding vehicles |
US4038232A (en) * | 1972-12-19 | 1977-07-26 | Ppg Industries, Inc. | Electrodepositable compositions containing sulfonium resins and capped polyisocyanates |
US3935087A (en) * | 1972-12-22 | 1976-01-27 | Ppg Industries, Inc. | Method for electrodeposition of self-crosslinking cationic compositions |
US3959106A (en) * | 1974-03-27 | 1976-05-25 | Ppg Industries, Inc. | Method of electrodepositing quaternary sulfonium group-containing resins |
US4039414A (en) * | 1974-06-19 | 1977-08-02 | Scm Corporation | Ultraviolet curing of electrocoating compositions |
US4066523A (en) * | 1976-02-17 | 1978-01-03 | Scm Corporation | Dual cure cathodic electrocoating composition |
US4166017A (en) * | 1976-05-24 | 1979-08-28 | Scm Corporation | Process for cathodic electrocoating and photocuring |
US4338232A (en) * | 1977-12-27 | 1982-07-06 | The Dow Chemical Company | Radiation-curable resins |
US4260720A (en) * | 1979-10-31 | 1981-04-07 | Ppg Industries, Inc. | Novel mercapto chain extended products and their use in cationic electrodeposition |
US4321304A (en) * | 1980-10-02 | 1982-03-23 | Ppg Industries, Inc. | Beta-diketone-epoxy resin reaction products blended with monomeric or polymeric phosphonium salts useful for providing corrosion resistance |
CA1255952A (en) * | 1983-03-04 | 1989-06-20 | Akihiro Furuta | Positive type photoresist composition |
DE3586263D1 (de) * | 1984-03-07 | 1992-08-06 | Ciba Geigy Ag | Verfahren zur herstellung von abbildungen. |
US4601916A (en) * | 1984-07-18 | 1986-07-22 | Kollmorgen Technologies Corporation | Process for bonding metals to electrophoretically deposited resin coatings |
US4592816A (en) * | 1984-09-26 | 1986-06-03 | Rohm And Haas Company | Electrophoretic deposition process |
US4877818A (en) * | 1984-09-26 | 1989-10-31 | Rohm And Haas Company | Electrophoretically depositable photosensitive polymer composition |
US4632891A (en) * | 1984-10-04 | 1986-12-30 | Ciba-Geigy Corporation | Process for the production of images |
GB8430377D0 (en) * | 1984-12-01 | 1985-01-09 | Ciba Geigy Ag | Modified phenolic resins |
JPS61206293A (ja) * | 1985-03-08 | 1986-09-12 | 日本ペイント株式会社 | 回路板の製造方法 |
JPS61247090A (ja) * | 1985-04-24 | 1986-11-04 | 日本ペイント株式会社 | 半田スル−ホ−ルを有する回路板の製造方法 |
FI82866C (fi) * | 1985-06-24 | 1991-04-25 | Siemens Ag | Foerfarande foer framstaellning av strukturerade vaermebestaendiga skikt och deras anvaendning. |
DE3588111T2 (de) * | 1985-06-29 | 1996-10-31 | Asahi Chem Res Lab | Kunststoffzusammensetzung für Lötschutztinte |
JPH0644150B2 (ja) * | 1986-05-09 | 1994-06-08 | 関西ペイント株式会社 | プリント配線フオトレジスト用電着塗料組成物 |
GB8614868D0 (en) * | 1986-06-18 | 1986-07-23 | Ciba Geigy Ag | Metallic patterns |
JPS6317592A (ja) * | 1986-07-09 | 1988-01-25 | 三菱電機株式会社 | プリント配線板の製造方法 |
US4751172A (en) * | 1986-08-01 | 1988-06-14 | Shipley Company Inc. | Process for forming metal images |
JPH0770812B2 (ja) * | 1986-08-08 | 1995-07-31 | 関西ペイント株式会社 | プリント回路板の形成方法 |
GB8620001D0 (en) * | 1986-08-16 | 1986-09-24 | Ciba Geigy Ag | Production of images |
EP0259723B1 (de) * | 1986-09-11 | 1993-04-07 | Siemens Aktiengesellschaft | Verfahren zur Herstellung wärmebeständiger strukturierter Schichten |
US4863827A (en) * | 1986-10-20 | 1989-09-05 | American Hoechst Corporation | Postive working multi-level photoresist |
JPS63178228A (ja) * | 1987-01-20 | 1988-07-22 | Fuji Photo Film Co Ltd | ポジ型フオトレジスト組成物 |
JPS63182888A (ja) * | 1987-01-26 | 1988-07-28 | 関西ペイント株式会社 | プリント配線板の製造方法 |
US4863757A (en) * | 1987-02-06 | 1989-09-05 | Key-Tech, Inc. | Printed circuit board |
US4760013A (en) * | 1987-02-17 | 1988-07-26 | International Business Machines Corporation | Sulfonium salt photoinitiators |
GB8708747D0 (en) * | 1987-04-11 | 1987-05-20 | Ciba Geigy Ag | Formation of image |
EP0302827B1 (en) * | 1987-08-05 | 1994-07-06 | Ciba-Geigy Ag | Process for the formation of images |
JPH07119374B2 (ja) * | 1987-11-06 | 1995-12-20 | 関西ペイント株式会社 | ポジ型感光性カチオン電着塗料組成物 |
US5196098A (en) * | 1988-01-04 | 1993-03-23 | Shipley Company Inc. | Apparatus and process for electrophoretic deposition |
GB8801736D0 (en) * | 1988-01-27 | 1988-02-24 | Ciba Geigy Ag | Method of making patterns |
US4898656A (en) * | 1988-03-28 | 1990-02-06 | Kansai Paint Co., Ltd. | Electrodeposition coating process of photoresist for printed circuit board |
JPH0769613B2 (ja) * | 1988-05-02 | 1995-07-31 | 三菱電機株式会社 | プリント配線フオトレジスト用カチオン型電着塗装方法 |
US5102775A (en) * | 1988-09-30 | 1992-04-07 | Kansai Paint Co., Ltd. | Visible light sensitive electrodeposition coating composition and image-forming method using the same |
JP2758039B2 (ja) * | 1988-09-30 | 1998-05-25 | 関西ペイント株式会社 | 可視光感光性電着塗料用組成物及びそれを用いた画像形成方法 |
GB8827847D0 (en) * | 1988-11-29 | 1988-12-29 | Ciba Geigy Ag | Method |
JP2696419B2 (ja) * | 1990-07-04 | 1998-01-14 | 日本石油株式会社 | カチオン電着型ネガ型エッチングレジスト組成物 |
JPH0486666A (ja) * | 1990-07-27 | 1992-03-19 | Toagosei Chem Ind Co Ltd | フォトレジスト膜形成用電着塗料組成物 |
JPH04116181A (ja) * | 1990-09-03 | 1992-04-16 | Nippon Oil Co Ltd | カチオン電着型ネガ型エッチングレジスト組成物 |
US5246816A (en) * | 1990-09-03 | 1993-09-21 | Nippon Oil Co., Ltd. | Cationic electrodeposition negative type resist composition |
JP2681546B2 (ja) * | 1991-01-11 | 1997-11-26 | 日本石油株式会社 | カチオン電着型ネガ型レジスト組成物 |
JPH0616978A (ja) * | 1990-10-16 | 1994-01-25 | Hitachi Chem Co Ltd | ネガ型感光性電着塗料樹脂組成物、これを用いた電着塗装浴及びレジストパターンの製造法 |
US5403698A (en) * | 1990-10-16 | 1995-04-04 | Hitachi Chemical Company, Ltd. | Negative type photosensitive electrodepositing resin composition |
-
1991
- 1991-07-30 AU AU81471/91A patent/AU649695B2/en not_active Ceased
- 1991-07-30 DE DE69130691T patent/DE69130691T2/de not_active Expired - Fee Related
- 1991-07-30 AT AT91112767T patent/ATE175280T1/de not_active IP Right Cessation
- 1991-07-30 EP EP91112767A patent/EP0469537B1/en not_active Expired - Lifetime
- 1991-07-30 CA CA002048164A patent/CA2048164C/en not_active Expired - Fee Related
- 1991-07-30 BR BR919103260A patent/BR9103260A/pt not_active IP Right Cessation
- 1991-07-30 ES ES91112767T patent/ES2126558T3/es not_active Expired - Lifetime
- 1991-08-01 AR AR91320310A patent/AR248459A1/es active
- 1991-08-01 KR KR1019910013329A patent/KR950001005B1/ko not_active IP Right Cessation
- 1991-08-02 JP JP3194487A patent/JP2547904B2/ja not_active Expired - Fee Related
- 1991-08-02 MX MX9100508A patent/MX9100508A/es unknown
-
1994
- 1994-06-30 US US08/268,778 patent/US5674660A/en not_active Expired - Fee Related
-
1995
- 1995-06-07 US US08/478,151 patent/US5595859A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR920004903A (ko) | 1992-03-28 |
CA2048164C (en) | 1998-11-10 |
AU649695B2 (en) | 1994-06-02 |
BR9103260A (pt) | 1992-02-18 |
MX9100508A (es) | 1992-04-01 |
CA2048164A1 (en) | 1992-02-03 |
JP2547904B2 (ja) | 1996-10-30 |
DE69130691D1 (de) | 1999-02-11 |
AU8147191A (en) | 1992-02-13 |
ES2126558T3 (es) | 1999-04-01 |
EP0469537A2 (en) | 1992-02-05 |
US5674660A (en) | 1997-10-07 |
KR950001005B1 (ko) | 1995-02-06 |
JPH04251847A (ja) | 1992-09-08 |
ATE175280T1 (de) | 1999-01-15 |
EP0469537A3 (en) | 1992-04-29 |
EP0469537B1 (en) | 1998-12-30 |
US5595859A (en) | 1997-01-21 |
DE69130691T2 (de) | 1999-07-22 |
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