WO2023188337A1 - X-ray generation device, x-ray imaging device, and method for adjusting x-ray generation device - Google Patents

X-ray generation device, x-ray imaging device, and method for adjusting x-ray generation device Download PDF

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Publication number
WO2023188337A1
WO2023188337A1 PCT/JP2022/016710 JP2022016710W WO2023188337A1 WO 2023188337 A1 WO2023188337 A1 WO 2023188337A1 JP 2022016710 W JP2022016710 W JP 2022016710W WO 2023188337 A1 WO2023188337 A1 WO 2023188337A1
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WIPO (PCT)
Prior art keywords
ray
ray generator
deflector
target
generator according
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PCT/JP2022/016710
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French (fr)
Japanese (ja)
Inventor
洋一 安藤
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キヤノンアネルバ株式会社
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Publication date
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Priority to PCT/JP2022/016710 priority Critical patent/WO2023188337A1/en
Priority to JP2023546351A priority patent/JP7337312B1/en
Priority to PCT/JP2023/010620 priority patent/WO2023189735A1/en
Priority to TW112111516A priority patent/TW202401475A/en
Publication of WO2023188337A1 publication Critical patent/WO2023188337A1/en
Priority to US18/509,608 priority patent/US20240087833A1/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08—Anodes; Anti cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08—Anodes; Anti cathodes
    • H01J35/10—Rotary anodes; Arrangements for rotating anodes; Cooling rotary anodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/14—Arrangements for concentrating, focusing, or directing the cathode ray
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G1/00—X-ray apparatus involving X-ray tubes; Circuits therefor
    • H05G1/08—Electrical details
    • H05G1/26—Measuring, controlling or protecting
    • H05G1/30—Controlling
    • H05G1/52—Target size or shape; Direction of electron beam, e.g. in tubes with one anode and more than one cathode

Definitions

  • the present invention relates to an X-ray generation device, an X-ray imaging device, and a method for adjusting the X-ray generation device.
  • a transmission-type microfocus X-ray tube generates X-rays by irradiating a target with an electron beam.
  • such an X-ray tube has a problem in that the target tends to deteriorate because heat is generated by irradiating the target with an electron beam.
  • Patent Document 1 discloses that a magnet section is arranged around the X-ray generating tube, and the irradiation position of the electron beam on the target is changed by rotating the magnet section, thereby extending the life of the X-ray generating tube. is listed.
  • the irradiation position of the electron beam on the target is changed by moving the magnet section as described in Patent Document 1
  • the irradiation position of the X-rays from the X-ray generator that is, the focal position changes accordingly. Therefore, each time the magnet section is moved, that is, each time the focal position is changed, it is necessary to align the X-ray detector for detecting the X-rays emitted from the X-ray generator.
  • the present invention provides an advantageous technique for extending the life of the target or x-ray generating tube without changing the focal position.
  • the X-ray generator includes an electron gun and a target that receives an electron beam emitted from the electron gun and generates X-rays.
  • the X-ray generating tube is supported so as to allow the
  • a second aspect of the present invention provides an electron gun, an X-ray generation tube including a target that receives electron beams emitted from the electron gun and generates X-rays, and a support structure that supports the X-ray generation tube. and a deflector that deflects the electron beam, the adjusting method includes a rotation step of rotating at least the target while the deflector is fixed. .
  • FIG. 1 is a diagram schematically showing the configuration of an X-ray generator according to a first embodiment.
  • FIG. 3 is a diagram schematically showing how an electron beam emitted from an electron gun collides with a target in the X-ray generator of the first embodiment. The figure which shows typically the adjustment method or the usage method of the X-ray generator of a comparative example.
  • FIG. 1 is a diagram schematically showing a method of adjusting or using the X-ray generator according to the first embodiment.
  • FIG. 3 is a diagram schematically showing the configuration of an X-ray generator according to a second embodiment.
  • FIG. 7 is a diagram schematically showing the configuration of an X-ray generator according to a third embodiment.
  • FIG. 7 is a diagram schematically showing the configuration of an X-ray generator according to a fifth embodiment.
  • FIG. 7 is a diagram schematically showing the configuration of an X-ray generator according to a sixth embodiment.
  • FIG. 1 is a diagram schematically showing the configuration of an X-ray generator according to an embodiment.
  • FIG. 1 is a diagram schematically showing the configuration of an X-ray imaging device according to an embodiment.
  • FIG. 1 schematically shows the configuration of an X-ray generator 1 according to the first embodiment.
  • the X-ray generator 1 can be configured as a transmission type X-ray generator.
  • the X-ray generator 1 includes an X-ray generator tube XG.
  • the X-ray generation tube XG may include an electron gun EG and a target 22 that receives an electron beam or electrons emitted from the electron gun EG and generates X-rays.
  • the X-ray generating tube XG includes an insulated tube 10 having two open ends, an anode 20 that closes one of the two open ends of the insulated tube 10, and an anode 20 that closes the other of the two open ends of the insulated tube 10.
  • a closing member 30 may be provided.
  • the anode 20 may include a target 22, a target holding plate 21 that holds the target 22, and an electrode 23 that supports the target holding plate 21 and applies a potential to the target 22 via the target holding plate 21.
  • the closing member 30 may be configured to hold the electron gun EG.
  • the insulating tube 10, the anode 20, and the closing member 30 may constitute a container that defines a closed space. The sealed space is maintained at a vacuum or a high degree of vacuum.
  • the X-ray generator 1 may further include a tube support structure 60 that supports the X-ray generator tube XG, and a deflector 50 that deflects the electron beam emitted from the electron gun EG.
  • the X-ray generator 1 may also include a deflector support structure 70 that supports the deflector 50.
  • the tube support structure 60 can support the X-ray generating tube XG0 to allow at least the target 22 to be rotated while the deflector 50 is fixed.
  • the tube support structure 60 may support the X-ray generating tube XG to allow the X-ray generating tube XG to be rotated with the deflector 50 fixed.
  • the tube support structure 60 supports the X-ray generation tube XG0 to allow the X-ray generation tube XG to be rotated with the deflector 50 supported by the deflector support structure 70. sell.
  • the tube support structure 60 and the deflector support structure 70 are structures that support the X-ray generating tube XG and the deflector 50 independently of each other.
  • the X-ray generating tube XG may be rotated manually by an operator or the like, or may be rotated by a drive mechanism (not shown), for example.
  • the deflector 50 may be placed outside the X-ray generating tube XG.
  • a virtual plane VP3 that crosses the deflector 50 includes a virtual plane VP1 including the electron beam incident surface of the target 22 (the surface facing the electron gun EG) and the tip surface of the electron gun EG (the surface on the target 22 side). ) and a virtual plane VP2 including the virtual plane VP2.
  • the virtual planes VP1, VP2, and VP3 may be defined as planes perpendicularly intersecting the central axis AX of the electron gun EG.
  • the deflector 50 deflects the electron beam emitted from the electron gun EG by applying a magnetic field to the electron beam. By deflecting the electron beam with the deflector 50, the incident position of the electron beam on the target 22 can be adjusted or shifted.
  • the deflector 50 may be composed of a permanent magnet, an electromagnet, or a permanent magnet and an electromagnet.
  • deflector 50 may include a first magnet and a second magnet.
  • the first magnetic pole (for example, S pole) of the first magnet and the second magnetic pole (for example, N pole) of the second magnet may be arranged to face each other via the insulating tube 10 or the X-ray generating tube XG.
  • the deflector 50 may be composed of one magnet arranged so that its magnetic pole faces in the radial direction of the insulating tube 10 or the X-ray generating tube XG.
  • Deflector 50 may be removably supported by deflector support structure 70.
  • the deflector support structure 70 may include a drive mechanism that moves and/or rotates the deflector 50, or an adjustment mechanism that adjusts the position or attitude of the deflector 50. By providing such a drive mechanism or adjustment mechanism, it is possible to adjust the magnetic field that acts on the electron beam emitted from the X-ray generating tube XG.
  • the electrode 23 is electrically connected to the target 22 and applies a potential to the target 22.
  • the target 22 generates X-rays when electrons from the electron gun EG collide with the target 22.
  • the X-rays generated by the target 22 are transmitted through the target holding plate 21 and radiated to the outside of the X-ray generating tube XG.
  • Anode 20 may be maintained at, for example, ground potential, but may also be maintained at other potentials.
  • Target 22 is made of metal material.
  • the target 22 is desirably made of a material with a high melting point, such as tungsten, tantalum, or molybdenum, and these materials are advantageous for improving the efficiency of generating X-rays.
  • the target holding plate 21 may be made of, for example, a material that easily transmits X-rays, such as beryllium, diamond, or the like.
  • FIG. 2 schematically shows how the electron beam EB emitted from the electron gun EG collides with the target 22.
  • the electron gun EG and the target 22 are shown close to each other, but the electron gun EG and the target 22 may be arranged further apart.
  • the electron beam EB emitted from the electron gun EG is deflected by the magnetic field generated by the deflector 50, and then impinges on or collides with the target 22.
  • the amount by which the electron beam EB is deflected, in other words, the incident position of the electron beam EB with respect to the target 22 may depend on the magnetic field generated by the deflector 50 and the accelerating voltage of the electron gun EG.
  • FIG. 3 schematically shows two states ST11 and ST12 of the X-ray generator in the comparative example.
  • the target 22 is shown as viewed from the electron gun EG side.
  • state ST11 the electron beam emitted from the electron gun EG is deflected by the magnetic field generated by the deflector 50, and the electron beam is incident on the target 22 at a position P1.
  • state ST12 is a state in which the deflector 50 is rotated relative to the arrangement of the deflector 50 in state ST11. Therefore, the position P2 at which the electron beam is incident on the target 22 in state ST12 is a position obtained by rotating the position P1 at which the electron beam is incident on the target 22 in state ST11 around the central axis AX.
  • the position at which the electron beam is incident on the target 22 is changed from position P1 to position P2 by rotating the deflector 50.
  • this makes it possible to extend the life of the target 22 or the X-ray generator 1.
  • changing the position at which the electron beam is incident on the target 22 from position P1 to position P2 means that the position at which the X-ray is emitted from the target 22, that is, the focal position of the X-ray in the X-ray inspection apparatus, means to be changed. Therefore, in the comparative example, it is necessary to adjust the position of the X-ray detector in accordance with the change in the position where the electron beam is incident on the target 22 due to the rotation of the deflector 50.
  • FIG. 4 schematically shows two states ST21 and ST22 of the X-ray generator 1 in the first embodiment.
  • the target 22 is shown as viewed from the electron gun EG side.
  • state ST21 the electron beam emitted from the electron gun EG is deflected by the magnetic field generated by the deflector 50, and the electron beam is incident on the target 22 at the position P1.
  • state ST22 the X-ray generating tube XG (target 22) is rotated with respect to the orientation of the X-ray generating tube XG (target 22) in state ST21, and the electron beam is incident on position P2 of the target 22.
  • the rotation angle of the target 22 is 90 degrees, but this rotation angle can be set arbitrarily.
  • reference numeral 25 is a virtual orientation mark given to the target 22.
  • the X-ray generating tube XG target 22
  • the deflector 50 fixed. Therefore, in state ST21 and state ST22, the electron beam is incident on mutually different positions P1 and P2 of the target 22, but the positions P1 and P2 as seen from the X-ray detector, that is, the space where the X-ray generator 1 is arranged. Positions P1 and P2 in are the same positions. Thereby, the life of the target 22 or the X-ray generator 1 can be extended without changing the positions P1 and P2 in the space where the X-ray generator 1 is placed, that is, the focal position.
  • the method for adjusting the X-ray generator 1 of one embodiment includes a rotation step of rotating the X-ray generation tube XG while the deflector 50 is fixed.
  • the rotation process can be performed depending on the amount of use of the X-ray generator 1.
  • the usage amount can be, for example, at least one of the usage time of the X-ray generator 1, the amount of electric power applied to the electrode 23, or the cumulative value of X-rays generated by the X-ray generator 1.
  • the rotation process may be performed in response to changes in the X-rays generated by the X-ray generator 1.
  • the rotation step is executed in response to the fact that the X-rays generated by the X-ray generator 1 fall below a predetermined percentage of the intensity of the X-rays generated by the X-ray generator 1 immediately after execution of the last rotation step. can do.
  • the tube support structure 60 can support the X-ray generating tube XG so as to allow the X-ray generating tube XG to be rotated around a rotation axis that coincides with the central axis AX of the electron gun EG.
  • the center axis AX of the electron gun EG may be arranged to pass through the center of the target 22.
  • FIG. 5 schematically shows the configuration of the X-ray generator 1 of the second embodiment. Items not mentioned in the X-ray generator 1 of the second embodiment may follow the first embodiment.
  • the tube support structure 60 includes a housing section 80 surrounding the X-ray generating tube XG.
  • the housing part 80 can support the X-ray generating tube XG so as to allow the X-ray generating tube XG to be rotated with the deflector 50 fixed.
  • the space between the X-ray generating tube XG and the accommodating portion 80 may be filled or disposed with an insulating fluid (for example, insulating oil).
  • the X-ray generator 1 may include an O-ring 82, and the X-ray generator tube XG and the housing section 80 may have sealing surfaces facing each other via the O-ring 82.
  • the accommodating part 80 may include a sealing part 81.
  • the seal portion 81 may include a recessed portion that covers a first surface 231 and a second surface 232 on opposite sides of the outer circumferential portion of the electrode 23 of the anode 20 and an end surface 233 of the outer circumferential portion.
  • the O-ring 82 may be placed in contact with the end surface 233 or in a recess provided in the end surface 233.
  • a deflector support structure 70 that supports the deflector 50 may be coupled to the housing part 80 .
  • FIG. 6 schematically shows the configuration of the X-ray generator 1 of the third embodiment. Items not mentioned in the X-ray generator 1 of the third embodiment may follow the first or second embodiment.
  • the electrode 23 may be provided with a through hole 24 .
  • An O-ring 82 may be disposed between the upper surface of the housing part 80 and the lower surface of the electrode 23.
  • the electrode 23 (anode 20) can be fixed to the housing part 80 by a screw 83 passing through the through hole 24.
  • the through hole 24 may be configured as a long hole, for example, to allow rotation of the X-ray generating tube XG with respect to the tube support structure 60.
  • the torque can be managed so that the seal provided by the O-ring 82 is not lost.
  • the rotation angle of the screw 83 may be limited within a predetermined angle so that the seal provided by the O-ring 82 is not lost when loosening the screw 83 to rotate the X-ray generating tube XG.
  • FIG. 7 schematically shows the configuration of the X-ray generator 1 of the fourth embodiment. Items not mentioned in the X-ray generator 1 of the fourth embodiment may follow the third embodiment.
  • a regulating member 84 that regulates the position of the electrode 23 may be provided.
  • the regulating member 84 may have a ring shape, for example.
  • a through hole 85 may be provided in the regulating member 84 .
  • An O-ring 82 may be disposed between the upper surface of the housing part 80 and the lower surface of the electrode 23.
  • the regulating member 84 can be fixed to the accommodating portion 80 by the screw 83 passing through the through hole 85 so as to press the electrode 23 against the O-ring 82 .
  • the through hole 85 may be configured as a long hole, for example, to allow rotation of the X-ray generating tube XG with respect to the tube support structure 60.
  • FIG. 8 schematically shows the configuration of the X-ray generator 1 of the fifth embodiment. Items not mentioned in the X-ray generator 1 of the fifth embodiment may follow the first to fourth embodiments.
  • the X-ray generator 1 may have a mark 93 indicating the rotation angle of the X-ray generator tube XG with respect to the tube support structure 60.
  • the X-ray generator 1 may include an engaging portion 91 that engages with a jig (not shown) for rotating the X-ray generating tube XG. The operator can rotate the X-ray generating tube XG by engaging a jig with the engaging portion 91 and operating the jig.
  • FIG. 9 schematically shows the configuration of an X-ray generator 1 according to the sixth embodiment. Items not mentioned in the X-ray generator 1 of the sixth embodiment may follow the first to fourth embodiments.
  • the X-ray generator 1 may have a mark 93 indicating the rotation angle of the X-ray generator tube XG with respect to the tube support structure 60.
  • the X-ray generator 1 may include an engaging portion 95 that engages with a jig (not shown) for rotating the X-ray generating tube XG. The operator can rotate the X-ray generating tube XG by engaging a jig with the engaging portion 95 and operating the jig.
  • FIG. 10 shows the configuration of an X-ray generator 1 according to one embodiment.
  • the X-ray generator 1 may include a booster circuit 110 and a drive circuit 120 in addition to the above-mentioned X-ray generator tube XG.
  • the booster circuit 110 can boost a voltage supplied from the outside to generate a boosted voltage, and supply the boosted voltage to the drive circuit 120.
  • the drive circuit 120 can drive the X-ray generating tube XG based on the boosted voltage supplied from the booster circuit 110.
  • the X-ray generating tube XG, the booster circuit 110, and the drive circuit 120 are housed in the housing part 80, and the space inside the housing part 80 can be filled with an insulating fluid.
  • FIG. 11 shows the configuration of an X-ray imaging device 200 according to one embodiment.
  • the X-ray imaging device 200 can include an X-ray generation device 1 and an X-ray detection device 240 that detects X-rays XR emitted from the X-ray generation device 1 and transmitted through the object 230.
  • the X-ray detection device 240 may further include a control device 210 and a display device 220.
  • the X-ray detection device 240 may include an X-ray detector 242 and a signal processing section 244.
  • Control device 210 can control X-ray generation device 1 and X-ray detection device 240.
  • the X-ray detector 242 can detect or image the X-rays XR emitted from the X-ray generator 1 and transmitted through the object 230.
  • the signal processing unit 244 may process the signal output from the X-ray detector 242 and provide the processed signal to the control device 210.
  • the control device 210 causes the display device 220 to display an image based on the signal supplied from the signal processing section 244.
  • the control device 210 determines whether or not it is necessary to execute the rotation process based on the usage amount of the X-ray generator 1 and/or changes in the X-rays generated by the X-ray generator 1, and determines whether it is necessary to perform the rotation process. If it is determined that this is the case, the display device 220 may be used to prompt the operator to perform the rotation process.
  • the X-ray detector 242 or the X-ray detector 240 is positioned accordingly. There is a need. According to the X-ray generating device 1 according to each of the embodiments described above, the life of the target or the X-ray generating tube can be extended without changing the focal position, so such alignment is unnecessary.
  • X-ray generator X-ray generator
  • EG electron gun
  • 10 electron gun
  • 20 anode
  • 21 target holding plate
  • 22 target
  • 23 electrode
  • 30 closing member
  • 50 deflector
  • 60 tube support structure
  • 70 Deflector support structure
  • AX Central axis
  • EB Electron beam
  • 80 Accommodation part

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Abstract

This X-ray generation device comprises: an X-ray generation tube including an electron gun and a target that generates X rays upon receiving an electron beam emitted from the electron gun; a support structure that supports the X-ray generation tube; and a deflector that deflects the electron beam. The support structure supports the X-ray generation tube so as to allow at least the target to rotate in a state where the deflector is fixed.

Description

Ｘ線発生装置、Ｘ線撮像装置、および、Ｘ線発生装置の調整方法X-ray generator, X-ray imaging device, and method for adjusting the X-ray generator
　本発明は、Ｘ線発生装置、Ｘ線撮像装置、および、Ｘ線発生装置の調整方法に関する。 The present invention relates to an X-ray generation device, an X-ray imaging device, and a method for adjusting the X-ray generation device.
　透過型マイクロフォーカスＸ線管では、ターゲットに電子線を照射することによってＸ線を発生する。しかし、このようなＸ線管には、ターゲットに電子線を照射することによって熱が発生するためにターゲットが劣化しやすいという課題があった。 A transmission-type microfocus X-ray tube generates X-rays by irradiating a target with an electron beam. However, such an X-ray tube has a problem in that the target tends to deteriorate because heat is generated by irradiating the target with an electron beam.
　特許文献１には、Ｘ線発生管球の周囲に磁石部を配置し、磁石部を回転させることによってターゲットに対する電子線の照射位置を変更し、これによってＸ線発生管球の寿命を延ばすことが記載されている。しかし、特許文献１に記載されたように磁石部を移動させることによってターゲットに対する電子ビームの照射位置を変更すると、それによってＸ線発生装置からのＸ線の放射位置、即ち焦点位置が変化する。したがって、磁石部を移動させる度に、即ち焦点位置を変更する度に、Ｘ線発生装置から放射されるＸ線を検出するためのＸ線検出器を位置合わせする必要があった。 Patent Document 1 discloses that a magnet section is arranged around the X-ray generating tube, and the irradiation position of the electron beam on the target is changed by rotating the magnet section, thereby extending the life of the X-ray generating tube. is listed. However, when the irradiation position of the electron beam on the target is changed by moving the magnet section as described in Patent Document 1, the irradiation position of the X-rays from the X-ray generator, that is, the focal position changes accordingly. Therefore, each time the magnet section is moved, that is, each time the focal position is changed, it is necessary to align the X-ray detector for detecting the X-rays emitted from the X-ray generator.
特許第４３０９１７６号公報Patent No. 4309176
　本発明は、焦点位置を変化させることなくターゲットあるいはＸ線発生管の寿命を延ばすために有利な技術を提供する。 The present invention provides an advantageous technique for extending the life of the target or x-ray generating tube without changing the focal position.
　本発明の１つの側面は、Ｘ線発生装置に係り、前記Ｘ線発生装置は、電子銃、および、前記電子銃から放射される電子線を受けてＸ線を発生させるターゲットを含むＸ線発生管と、前記Ｘ線発生管を支持する支持構造と、前記電子線を偏向させる偏向器と、を備え、前記支持構造は、前記偏向器が固定された状態で少なくとも前記ターゲットが回動されることを許すように前記Ｘ線発生管を支持する。 One aspect of the present invention relates to an X-ray generator, and the X-ray generator includes an electron gun and a target that receives an electron beam emitted from the electron gun and generates X-rays. A tube, a support structure that supports the X-ray generating tube, and a deflector that deflects the electron beam, and the support structure is configured such that at least the target is rotated while the deflector is fixed. The X-ray generating tube is supported so as to allow the
　本発明の第２の側面は、電子銃、および、前記電子銃から放射される電子線を受けてＸ線を発生させるターゲットを含むＸ線発生管と、前記Ｘ線発生管を支持する支持構造と、前記電子線を偏向させる偏向器と、を備えるＸ線発生装置の調整方法に係り、前記調整方法は、前記偏向器が固定された状態で少なくとも前記ターゲットを回動させる回動工程を含む。 A second aspect of the present invention provides an electron gun, an X-ray generation tube including a target that receives electron beams emitted from the electron gun and generates X-rays, and a support structure that supports the X-ray generation tube. and a deflector that deflects the electron beam, the adjusting method includes a rotation step of rotating at least the target while the deflector is fixed. .
第１実施形態のＸ線発生装置の構成を模式的に示す図。FIG. 1 is a diagram schematically showing the configuration of an X-ray generator according to a first embodiment. 第１実施形態のＸ線発生装置において電子銃から放射された電子線がターゲットに衝突する様子を模式的に示す図。FIG. 3 is a diagram schematically showing how an electron beam emitted from an electron gun collides with a target in the X-ray generator of the first embodiment. 比較例のＸ線発生装置の調整方法あるいは使用方法を模式的に示す図。The figure which shows typically the adjustment method or the usage method of the X-ray generator of a comparative example. 第１実施形態のＸ線発生装置の調整方法あるいは使用方法を模式的に示す図。FIG. 1 is a diagram schematically showing a method of adjusting or using the X-ray generator according to the first embodiment. 第２実施形態のＸ線発生装置の構成を模式的に示す図。FIG. 3 is a diagram schematically showing the configuration of an X-ray generator according to a second embodiment. 第３実施形態のＸ線発生装置の構成を模式的に示す図。FIG. 7 is a diagram schematically showing the configuration of an X-ray generator according to a third embodiment. 第４実施形態のＸ線発生装置の構成を模式的に示す図。The figure which shows typically the structure of the X-ray generator of 4th Embodiment. 第５実施形態のＸ線発生装置の構成を模式的に示す図。FIG. 7 is a diagram schematically showing the configuration of an X-ray generator according to a fifth embodiment. 第６実施形態のＸ線発生装置の構成を模式的に示す図。FIG. 7 is a diagram schematically showing the configuration of an X-ray generator according to a sixth embodiment. 一実施形態のＸ線発生装置の構成を模式的に示す図。FIG. 1 is a diagram schematically showing the configuration of an X-ray generator according to an embodiment. 一実施形態のＸ線撮像装置の構成を模式的に示す図。FIG. 1 is a diagram schematically showing the configuration of an X-ray imaging device according to an embodiment.
　以下、添付図面を参照して実施形態を詳しく説明する。尚、以下の実施形態は請求の範囲に係る発明を限定するものでない。実施形態には複数の特徴が記載されているが、これらの複数の特徴の全てが発明に必須のものとは限らず、また、複数の特徴は任意に組み合わせられてもよい。さらに、添付図面においては、同一若しくは同様の構成に同一の参照番号を付し、重複した説明は省略する。 Hereinafter, embodiments will be described in detail with reference to the accompanying drawings. Note that the following embodiments do not limit the claimed invention. Although a plurality of features are described in the embodiments, not all of these features are essential to the invention, and the plurality of features may be arbitrarily combined. Furthermore, in the accompanying drawings, the same or similar components are designated by the same reference numerals, and redundant description will be omitted.
　図１には、第１実施形態のＸ線発生装置１の構成が模式的に示されている。Ｘ線発生装置１は、透過型Ｘ線発生装置として構成されうる。Ｘ線発生装置１は、Ｘ線発生管ＸＧを備えている。Ｘ線発生管ＸＧは、電子銃ＥＧと、電子銃ＥＧから放射される電子線あるいは電子を受けてＸ線を発生させるターゲット２２とを含みうる。一例において、Ｘ線発生管ＸＧは、２つの開口端を有する絶縁管１０と、絶縁管１０の２つの開口端の一方を閉塞するアノード２０と、絶縁管１０の２つの開口端の他方を閉塞する閉塞部材３０とを備えうる。アノード２０は、ターゲット２２と、ターゲット２２を保持するターゲット保持板２１と、ターゲット保持板２１を支持しつつターゲット保持板２１を介してターゲット２２に電位を与える電極２３とを含みうる。閉塞部材３０は、電子銃ＥＧを保持するように構成されうる。絶縁管１０、アノード２０および閉塞部材３０は、密閉空間を規定する容器を構成しうる。該密閉空間は、真空、あるいは高い真空度に維持される。 FIG. 1 schematically shows the configuration of an X-ray generator 1 according to the first embodiment. The X-ray generator 1 can be configured as a transmission type X-ray generator. The X-ray generator 1 includes an X-ray generator tube XG. The X-ray generation tube XG may include an electron gun EG and a target 22 that receives an electron beam or electrons emitted from the electron gun EG and generates X-rays. In one example, the X-ray generating tube XG includes an insulated tube 10 having two open ends, an anode 20 that closes one of the two open ends of the insulated tube 10, and an anode 20 that closes the other of the two open ends of the insulated tube 10. A closing member 30 may be provided. The anode 20 may include a target 22, a target holding plate 21 that holds the target 22, and an electrode 23 that supports the target holding plate 21 and applies a potential to the target 22 via the target holding plate 21. The closing member 30 may be configured to hold the electron gun EG. The insulating tube 10, the anode 20, and the closing member 30 may constitute a container that defines a closed space. The sealed space is maintained at a vacuum or a high degree of vacuum.
　Ｘ線発生装置１は、Ｘ線発生管ＸＧを支持する管支持構造６０と、電子銃ＥＧから放射される電子線を偏向させる偏向器５０とを更に備えうる。Ｘ線発生装置１はまた、偏向器５０を支持する偏向器支持構造７０を備えうる。管支持構造６０は、偏向器５０が固定された状態で少なくともターゲット２２が回動されることを許すようにＸ線発生管ＸＧ０を支持しうる。他の観点において、管支持構造６０は、偏向器５０が固定された状態でＸ線発生管ＸＧが回動されることを許すようにＸ線発生管ＸＧを支持しうる。更に他の観点において、管支持構造６０は、偏向器５０が偏向器支持構造７０によって支持された状態でＸ線発生管ＸＧが回動されることを許すようにＸ線発生管ＸＧ０を支持しうる。管支持構造６０および偏向器支持構造７０は、それぞれＸ線発生管ＸＧおよび偏向器５０を互いに独立して支持する構造である。Ｘ線発生管ＸＧの回動は、例えば、作業者等によって手動でなされてもよいし、不図示の駆動機構によってなされてもよい。 The X-ray generator 1 may further include a tube support structure 60 that supports the X-ray generator tube XG, and a deflector 50 that deflects the electron beam emitted from the electron gun EG. The X-ray generator 1 may also include a deflector support structure 70 that supports the deflector 50. The tube support structure 60 can support the X-ray generating tube XG0 to allow at least the target 22 to be rotated while the deflector 50 is fixed. In another aspect, the tube support structure 60 may support the X-ray generating tube XG to allow the X-ray generating tube XG to be rotated with the deflector 50 fixed. In yet another aspect, the tube support structure 60 supports the X-ray generation tube XG0 to allow the X-ray generation tube XG to be rotated with the deflector 50 supported by the deflector support structure 70. sell. The tube support structure 60 and the deflector support structure 70 are structures that support the X-ray generating tube XG and the deflector 50 independently of each other. The X-ray generating tube XG may be rotated manually by an operator or the like, or may be rotated by a drive mechanism (not shown), for example.
　偏向器５０は、Ｘ線発生管ＸＧの外側に配置されうる。偏向器５０は、例えば、偏向器５０を横切る仮想平面ＶＰ３がターゲット２２の電子線入射面（電子銃ＥＧに対面する面）を含む仮想平面ＶＰ１と電子銃ＥＧの先端面（ターゲット２２側の面）を含む仮想平面ＶＰ２との間に位置するように配置されうる。仮想平面ＶＰ１、ＶＰ２、ＶＰ３は、電子銃ＥＧの中心軸ＡＸに垂直に交差する平面として定義されうる。偏向器５０は、電子銃ＥＧから放射された電子線に対して磁界を作用させることによって該電子線を偏向させる。偏向器５０が電子線を偏向させることによってターゲット２２に対する電子線の入射位置が調整あるいはシフトされうる。 The deflector 50 may be placed outside the X-ray generating tube XG. In the deflector 50, for example, a virtual plane VP3 that crosses the deflector 50 includes a virtual plane VP1 including the electron beam incident surface of the target 22 (the surface facing the electron gun EG) and the tip surface of the electron gun EG (the surface on the target 22 side). ) and a virtual plane VP2 including the virtual plane VP2. The virtual planes VP1, VP2, and VP3 may be defined as planes perpendicularly intersecting the central axis AX of the electron gun EG. The deflector 50 deflects the electron beam emitted from the electron gun EG by applying a magnetic field to the electron beam. By deflecting the electron beam with the deflector 50, the incident position of the electron beam on the target 22 can be adjusted or shifted.
　偏向器５０は、永久磁石で構成されてもよいし、電磁石で構成されてもよいし、永久磁石および電磁石で構成されてもよい。一例において、偏向器５０は、第１磁石および第２磁石を含みうる。第１磁石の第１磁極（例えば、Ｓ極）と第２磁石の第２磁極（例えば、Ｎ極）とは、絶縁管１０あるいはＸ線発生管ＸＧを介して互いに対向するように配置されうる。偏向器５０は、磁極が絶縁管１０あるいはＸ線発生管ＸＧの径方向を向くように配置された１つの磁石で構成されてもよい。偏向器５０は、偏向器支持構造７０によって着脱可能に支持されてもよい。偏向器支持構造７０は、偏向器５０を移動および／または回転させる駆動機構、または、偏向器５０の位置または姿勢を調整する調整機構を含んでもよい。このような駆動機構または調整機構を設けることによって、Ｘ線発生管ＸＧから放射される電子線に作用させる磁界を調整することができる。 The deflector 50 may be composed of a permanent magnet, an electromagnet, or a permanent magnet and an electromagnet. In one example, deflector 50 may include a first magnet and a second magnet. The first magnetic pole (for example, S pole) of the first magnet and the second magnetic pole (for example, N pole) of the second magnet may be arranged to face each other via the insulating tube 10 or the X-ray generating tube XG. . The deflector 50 may be composed of one magnet arranged so that its magnetic pole faces in the radial direction of the insulating tube 10 or the X-ray generating tube XG. Deflector 50 may be removably supported by deflector support structure 70. The deflector support structure 70 may include a drive mechanism that moves and/or rotates the deflector 50, or an adjustment mechanism that adjusts the position or attitude of the deflector 50. By providing such a drive mechanism or adjustment mechanism, it is possible to adjust the magnetic field that acts on the electron beam emitted from the X-ray generating tube XG.
　電極２３は、ターゲット２２に電気的に接続されていて、ターゲット２２に電位を与える。ターゲット２２は、電子銃ＥＧからの電子がターゲット２２に衝突することによってＸ線を発生する。ターゲット２２が発生したＸ線は、ターゲット保持板２１を透過してＸ線発生管ＸＧの外部に放射される。アノード２０は、例えば、接地電位に維持されうるが、他の電位に維持されてもよい。ターゲット２２は、金属材料で構成される。ターゲット２２は、融点が高い材料、例えば、タングステン、タンタルまたはモリブデン等で構成されることが望ましく、これらの材料は、Ｘ線の発生効率を向上させるために有利である。ターゲット保持板２１は、例えば、Ｘ線を透過し易い材料、例えば、ベリリウム、ダイヤモンド等で構成されうる。 The electrode 23 is electrically connected to the target 22 and applies a potential to the target 22. The target 22 generates X-rays when electrons from the electron gun EG collide with the target 22. The X-rays generated by the target 22 are transmitted through the target holding plate 21 and radiated to the outside of the X-ray generating tube XG. Anode 20 may be maintained at, for example, ground potential, but may also be maintained at other potentials. Target 22 is made of metal material. The target 22 is desirably made of a material with a high melting point, such as tungsten, tantalum, or molybdenum, and these materials are advantageous for improving the efficiency of generating X-rays. The target holding plate 21 may be made of, for example, a material that easily transmits X-rays, such as beryllium, diamond, or the like.
　図２には、電子銃ＥＧから放射された電子線ＥＢがターゲット２２に衝突する様子が模式的に示されている。図２では、電子銃ＥＧとターゲット２２とが近接して示されているが、電子銃ＥＧとターゲット２２とは、より離隔して配置されうる。電子銃ＥＧから放出された電子線ＥＢは、偏向器５０が発生する磁界によって偏向された後にターゲット２２に入射あるいは衝突する。電子線ＥＢが偏向される量、換言すると、ターゲット２２に対する電子線ＥＢの入射位置は、偏向器５０が発生する磁界、および、電子銃ＥＧの加速電圧に依存しうる。 FIG. 2 schematically shows how the electron beam EB emitted from the electron gun EG collides with the target 22. In FIG. 2, the electron gun EG and the target 22 are shown close to each other, but the electron gun EG and the target 22 may be arranged further apart. The electron beam EB emitted from the electron gun EG is deflected by the magnetic field generated by the deflector 50, and then impinges on or collides with the target 22. The amount by which the electron beam EB is deflected, in other words, the incident position of the electron beam EB with respect to the target 22 may depend on the magnetic field generated by the deflector 50 and the accelerating voltage of the electron gun EG.
　図３には、比較例におけるＸ線発生装置の２つの状態ＳＴ１１、ＳＴ１２が模式的に示されている。２つの状態ＳＴ１１、ＳＴ１２のいずれにも、ターゲット２２を電子銃ＥＧの側から見た様子が示されている。状態ＳＴ１１では、偏向器５０が発生する磁界によって、電子銃ＥＧから放射された電子線が偏向され、電子線がターゲット２２の位置Ｐ１に入射している。状態ＳＴ１２は、状態ＳＴ１１における偏向器５０の配置に対して偏向器５０を回動させた状態である。したがって、状態ＳＴ１２においてターゲット２２に電子線が入射する位置Ｐ２は、状態ＳＴ１１においてターゲット２２に電子線が入射する位置Ｐ１を中心軸ＡＸの周りで回動させた位置となる。つまり、比較例では、偏向器５０を回動させることによってターゲット２２に対して電子線が入射する位置が位置Ｐ１から位置Ｐ２に変更されている。比較例では、これによりターゲット２２あるいはＸ線発生装置１の寿命を延ばすことができる。しかし、ターゲット２２に対して電子線が入射する位置が位置Ｐ１から位置Ｐ２に変更されることは、ターゲット２２からＸ線が放射される位置、つまり、Ｘ線検査装置におけるＸ線の焦点位置が変更されることを意味する。よって、比較例では、偏向器５０の回動によってターゲット２２に対して電子線が入射する位置が変化することに応じてＸ線検出器の位置を調整する必要がある。 FIG. 3 schematically shows two states ST11 and ST12 of the X-ray generator in the comparative example. In both of the two states ST11 and ST12, the target 22 is shown as viewed from the electron gun EG side. In state ST11, the electron beam emitted from the electron gun EG is deflected by the magnetic field generated by the deflector 50, and the electron beam is incident on the target 22 at a position P1. State ST12 is a state in which the deflector 50 is rotated relative to the arrangement of the deflector 50 in state ST11. Therefore, the position P2 at which the electron beam is incident on the target 22 in state ST12 is a position obtained by rotating the position P1 at which the electron beam is incident on the target 22 in state ST11 around the central axis AX. That is, in the comparative example, the position at which the electron beam is incident on the target 22 is changed from position P1 to position P2 by rotating the deflector 50. In the comparative example, this makes it possible to extend the life of the target 22 or the X-ray generator 1. However, changing the position at which the electron beam is incident on the target 22 from position P1 to position P2 means that the position at which the X-ray is emitted from the target 22, that is, the focal position of the X-ray in the X-ray inspection apparatus, means to be changed. Therefore, in the comparative example, it is necessary to adjust the position of the X-ray detector in accordance with the change in the position where the electron beam is incident on the target 22 due to the rotation of the deflector 50.
　図４には、第１実施形態におけるＸ線発生装置１の２つの状態ＳＴ２１、ＳＴ２２が模式的に示されている。２つの状態ＳＴ２１、ＳＴ２２のいずれにも、ターゲット２２を電子銃ＥＧの側から見た様子が示されている。状態ＳＴ２１では、偏向器５０が発生する磁界によって、電子銃ＥＧから放射された電子線が偏向され、電子線がターゲット２２の位置Ｐ１に入射している。状態ＳＴ２２では、状態ＳＴ２１におけるＸ線発生管ＸＧ（ターゲット２２）の方位に対してＸ線発生管ＸＧ（ターゲット２２）が回動され、ターゲット２２の位置Ｐ２に電子線が入射している。この例では、ターゲット２２の回動角は９０度であるが、この回動角は任意に設定されうる。ここで、符号２５は、ターゲット２２に与えられた仮想的な方位マークである。第１実施形態では、偏向器５０が固定された状態でＸ線発生管ＸＧ（ターゲット２２）が回動される。したがって、状態ＳＴ２１と状態ＳＴ２２とでは、ターゲット２２の互いに異なる位置Ｐ１、Ｐ２に電子線が入射するが、Ｘ線検出器から見た位置Ｐ１、Ｐ２、即ちＸ線発生装置１が配置された空間における位置Ｐ１、Ｐ２は、互いに等しい位置である。これにより、Ｘ線発生装置１が配置された空間における位置Ｐ１、Ｐ２、即ち焦点位置を変化させることなくターゲット２２あるいはＸ線発生装置１の寿命を延ばすことができる。 FIG. 4 schematically shows two states ST21 and ST22 of the X-ray generator 1 in the first embodiment. In both of the two states ST21 and ST22, the target 22 is shown as viewed from the electron gun EG side. In state ST21, the electron beam emitted from the electron gun EG is deflected by the magnetic field generated by the deflector 50, and the electron beam is incident on the target 22 at the position P1. In state ST22, the X-ray generating tube XG (target 22) is rotated with respect to the orientation of the X-ray generating tube XG (target 22) in state ST21, and the electron beam is incident on position P2 of the target 22. In this example, the rotation angle of the target 22 is 90 degrees, but this rotation angle can be set arbitrarily. Here, reference numeral 25 is a virtual orientation mark given to the target 22. In the first embodiment, the X-ray generating tube XG (target 22) is rotated with the deflector 50 fixed. Therefore, in state ST21 and state ST22, the electron beam is incident on mutually different positions P1 and P2 of the target 22, but the positions P1 and P2 as seen from the X-ray detector, that is, the space where the X-ray generator 1 is arranged. Positions P1 and P2 in are the same positions. Thereby, the life of the target 22 or the X-ray generator 1 can be extended without changing the positions P1 and P2 in the space where the X-ray generator 1 is placed, that is, the focal position.
　上記の説明から明らかなように、一実施形態のＸ線発生装置１の調整方法は、偏向器５０が固定された状態でＸ線発生管ＸＧを回動させる回動工程を含む。回動工程は、Ｘ線発生装置１の使用量に応じて実行されうる。該使用量は、例えば、Ｘ線発生装置１の使用時間、電極２３に印加した電力量、または、Ｘ線発生装置１が発生したＸ線の累積値の少なくとも１つでありうる。あるいは、回動工程は、Ｘ線発生装置１が発生するＸ線の変化に応じて実行されうる。例えば、Ｘ線発生装置１が発生するＸ線が最後の回動工程の実行の直後においてＸ線発生装置１が発生したＸ線の強度の所定パーセンテージを下回ったことに応じて回動工程を実行することができる。 As is clear from the above description, the method for adjusting the X-ray generator 1 of one embodiment includes a rotation step of rotating the X-ray generation tube XG while the deflector 50 is fixed. The rotation process can be performed depending on the amount of use of the X-ray generator 1. The usage amount can be, for example, at least one of the usage time of the X-ray generator 1, the amount of electric power applied to the electrode 23, or the cumulative value of X-rays generated by the X-ray generator 1. Alternatively, the rotation process may be performed in response to changes in the X-rays generated by the X-ray generator 1. For example, the rotation step is executed in response to the fact that the X-rays generated by the X-ray generator 1 fall below a predetermined percentage of the intensity of the X-rays generated by the X-ray generator 1 immediately after execution of the last rotation step. can do.
　管支持構造６０は、電子銃ＥＧの中心軸ＡＸと一致した回動軸の周りでＸ線発生管ＸＧが回動されることを許すようにＸ線発生管ＸＧを支持しうる。電子銃ＥＧの中心軸ＡＸは、ターゲット２２の中心を通るように配置されうる。偏向器５０によって電子線ＥＢが偏向されない場合に、電子線ＥＢはターゲット２２の中心に入射しうる。 The tube support structure 60 can support the X-ray generating tube XG so as to allow the X-ray generating tube XG to be rotated around a rotation axis that coincides with the central axis AX of the electron gun EG. The center axis AX of the electron gun EG may be arranged to pass through the center of the target 22. When the electron beam EB is not deflected by the deflector 50, the electron beam EB may be incident on the center of the target 22.
　図５には、第２実施形態のＸ線発生装置１の構成が模式的に示されている。第２実施形態のＸ線発生装置１として言及しない事項は、第１実施形態に従いうる。第２実施形態では、管支持構造６０は、Ｘ線発生管ＸＧを取り囲む収容部８０を含む。収容部８０は、偏向器５０が固定された状態でＸ線発生管ＸＧが回動されることを許すようにＸ線発生管ＸＧを支持しうる。Ｘ線発生管ＸＧと収容部８０との間の空間には、絶縁流体（例えば、絶縁油）が充填あるいは配置されうる。Ｘ線発生装置１は、Ｏリング８２を備えてよく、Ｘ線発生管ＸＧおよび収容部８０は、Ｏリング８２を介して互いに対面するシール面を有しうる。 FIG. 5 schematically shows the configuration of the X-ray generator 1 of the second embodiment. Items not mentioned in the X-ray generator 1 of the second embodiment may follow the first embodiment. In the second embodiment, the tube support structure 60 includes a housing section 80 surrounding the X-ray generating tube XG. The housing part 80 can support the X-ray generating tube XG so as to allow the X-ray generating tube XG to be rotated with the deflector 50 fixed. The space between the X-ray generating tube XG and the accommodating portion 80 may be filled or disposed with an insulating fluid (for example, insulating oil). The X-ray generator 1 may include an O-ring 82, and the X-ray generator tube XG and the housing section 80 may have sealing surfaces facing each other via the O-ring 82.
　収容部８０は、シール部８１を含んでもよい。シール部８１は、アノード２０の電極２３の外周部における互いに反対側の第１面２３１、第２面２３２、および、該外周部の端面２３３を覆う凹部を含みうる。Ｏリング８２は、端面２３３と接触するように、あるいは、端面２３３に設けられた凹部に配置されうる。偏向器５０を支持する偏向器支持構造７０は、収容部８０に連結されうる。 The accommodating part 80 may include a sealing part 81. The seal portion 81 may include a recessed portion that covers a first surface 231 and a second surface 232 on opposite sides of the outer circumferential portion of the electrode 23 of the anode 20 and an end surface 233 of the outer circumferential portion. The O-ring 82 may be placed in contact with the end surface 233 or in a recess provided in the end surface 233. A deflector support structure 70 that supports the deflector 50 may be coupled to the housing part 80 .
　図６には、第３実施形態のＸ線発生装置１の構成が模式的に示されている。第３実施形態のＸ線発生装置１として言及しない事項は、第１又は第２実施形態に従いうる。第３実施形態では、電極２３に貫通孔２４が設けられうる。収容部８０の上面と電極２３の下面との間には、Ｏリング８２が配置されうる。貫通孔２４を貫通するネジ８３によって収容部８０に対して電極２３（アノード２０）が固定されうる。貫通孔２４は、例えば、管支持構造６０に対するＸ線発生管ＸＧの回動を許すように、長孔として構成されうる。Ｘ線発生管ＸＧの回動させるためにネジ８３を緩めるときは、Ｏリング８２によるシールが失われないようにトルクが管理されうる。あるいは、ネジ８３の回転角は、Ｘ線発生管ＸＧを回動させるためにネジ８３を緩めるときにＯリング８２によるシールが失われないように、所定角度以内に制限されうる。 FIG. 6 schematically shows the configuration of the X-ray generator 1 of the third embodiment. Items not mentioned in the X-ray generator 1 of the third embodiment may follow the first or second embodiment. In the third embodiment, the electrode 23 may be provided with a through hole 24 . An O-ring 82 may be disposed between the upper surface of the housing part 80 and the lower surface of the electrode 23. The electrode 23 (anode 20) can be fixed to the housing part 80 by a screw 83 passing through the through hole 24. The through hole 24 may be configured as a long hole, for example, to allow rotation of the X-ray generating tube XG with respect to the tube support structure 60. When loosening the screw 83 to rotate the X-ray generating tube XG, the torque can be managed so that the seal provided by the O-ring 82 is not lost. Alternatively, the rotation angle of the screw 83 may be limited within a predetermined angle so that the seal provided by the O-ring 82 is not lost when loosening the screw 83 to rotate the X-ray generating tube XG.
　図７には、第４実施形態のＸ線発生装置１の構成が模式的に示されている。第４実施形態のＸ線発生装置１として言及しない事項は、第３実施形態に従いうる。第４実施形態では、電極２３の位置を規制する規制部材８４が設けられてもよい。規制部材８４は、例えば、リング形状を有しうる。規制部材８４には、貫通孔８５が設けられうる。収容部８０の上面と電極２３の下面との間には、Ｏリング８２が配置されうる。貫通孔８５を貫通するネジ８３によって、Ｏリング８２に対して電極２３を押し付けるようにして、収容部８０に対して規制部材８４が固定されうる。貫通孔８５は、例えば、管支持構造６０に対するＸ線発生管ＸＧの回動を許すように、長孔として構成されうる。 FIG. 7 schematically shows the configuration of the X-ray generator 1 of the fourth embodiment. Items not mentioned in the X-ray generator 1 of the fourth embodiment may follow the third embodiment. In the fourth embodiment, a regulating member 84 that regulates the position of the electrode 23 may be provided. The regulating member 84 may have a ring shape, for example. A through hole 85 may be provided in the regulating member 84 . An O-ring 82 may be disposed between the upper surface of the housing part 80 and the lower surface of the electrode 23. The regulating member 84 can be fixed to the accommodating portion 80 by the screw 83 passing through the through hole 85 so as to press the electrode 23 against the O-ring 82 . The through hole 85 may be configured as a long hole, for example, to allow rotation of the X-ray generating tube XG with respect to the tube support structure 60.
　図８には、第５実施形態のＸ線発生装置１の構成が模式的に示されている。第５実施形態のＸ線発生装置１として言及しない事項は、第１乃至第４実施形態に従いうる。Ｘ線発生装置１は、管支持構造６０に対するＸ線発生管ＸＧの回動角を示すマーク９３を有しうる。Ｘ線発生装置１は、Ｘ線発生管ＸＧを回動させるための治具（不図示）と係合する係合部９１を備えてもよい。作業者は、係合部９１に治具を係合させ、治具を操作することによってＸ線発生管ＸＧを回動させることができる。 FIG. 8 schematically shows the configuration of the X-ray generator 1 of the fifth embodiment. Items not mentioned in the X-ray generator 1 of the fifth embodiment may follow the first to fourth embodiments. The X-ray generator 1 may have a mark 93 indicating the rotation angle of the X-ray generator tube XG with respect to the tube support structure 60. The X-ray generator 1 may include an engaging portion 91 that engages with a jig (not shown) for rotating the X-ray generating tube XG. The operator can rotate the X-ray generating tube XG by engaging a jig with the engaging portion 91 and operating the jig.
　図９には、第６実施形態のＸ線発生装置１の構成が模式的に示されている。第６実施形態のＸ線発生装置１として言及しない事項は、第１乃至第４実施形態に従いうる。Ｘ線発生装置１は、管支持構造６０に対するＸ線発生管ＸＧの回動角を示すマーク９３を有しうる。Ｘ線発生装置１は、Ｘ線発生管ＸＧを回動させるための治具（不図示）と係合する係合部９５を備えてもよい。作業者は、係合部９５に治具を係合させ、治具を操作することによってＸ線発生管ＸＧを回動させることができる。 FIG. 9 schematically shows the configuration of an X-ray generator 1 according to the sixth embodiment. Items not mentioned in the X-ray generator 1 of the sixth embodiment may follow the first to fourth embodiments. The X-ray generator 1 may have a mark 93 indicating the rotation angle of the X-ray generator tube XG with respect to the tube support structure 60. The X-ray generator 1 may include an engaging portion 95 that engages with a jig (not shown) for rotating the X-ray generating tube XG. The operator can rotate the X-ray generating tube XG by engaging a jig with the engaging portion 95 and operating the jig.
　図１０には、一実施形態のＸ線発生装置１の構成が示されている。Ｘ線発生装置１は、上記のＸ線発生管ＸＧの他、昇圧回路１１０および駆動回路１２０を備えうる。昇圧回路１１０は、外部から供給される電圧を昇圧した昇圧電圧を発生し、該昇圧電圧を駆動回路１２０に供給しうる。駆動回路１２０は、駆動回路１２０は、昇圧回路１１０から供給される昇圧電圧に基づいてＸ線発生管ＸＧを駆動しうる。Ｘ線発生管ＸＧ、昇圧回路１１０および駆動回路１２０は、収容部８０によって収容され、収容部８０の内側の空間には、絶縁流体が充填されうる。 FIG. 10 shows the configuration of an X-ray generator 1 according to one embodiment. The X-ray generator 1 may include a booster circuit 110 and a drive circuit 120 in addition to the above-mentioned X-ray generator tube XG. The booster circuit 110 can boost a voltage supplied from the outside to generate a boosted voltage, and supply the boosted voltage to the drive circuit 120. The drive circuit 120 can drive the X-ray generating tube XG based on the boosted voltage supplied from the booster circuit 110. The X-ray generating tube XG, the booster circuit 110, and the drive circuit 120 are housed in the housing part 80, and the space inside the housing part 80 can be filled with an insulating fluid.
　図１１には、一実施形態のＸ線撮像装置２００の構成が示されている。Ｘ線撮像装置２００は、Ｘ線発生装置１と、Ｘ線発生装置１から放射され物体２３０を透過したＸ線ＸＲを検出するＸ線検出装置２４０を備えうる。Ｘ線検出装置２４０は、制御装置２１０および表示装置２２０を更に備えてもよい。Ｘ線検出装置２４０は、Ｘ線検出器２４２および信号処理部２４４を含みうる。制御装置２１０は、Ｘ線発生装置１およびＸ線検出装置２４０を制御しうる。Ｘ線検出器２４２は、Ｘ線発生装置１から放射され物体２３０を透過したＸ線ＸＲを検出あるいは撮像しうる。信号処理部２４４は、Ｘ線検出器２４２から出力される信号を処理して、処理された信号を制御装置２１０に供給しうる。制御装置２１０は、信号処理部２４４から供給される信号に基づいて、表示装置２２０に画像を表示させる。制御装置２１０は、Ｘ線発生装置１の使用量および／またはＸ線発生装置１が発生するＸ線の変化に基づいて回動工程を実行する必要があるかどうかを判定し、その必要があると判定をした場合に、表示装置２２０を使って、回動工程の実施を作業者に促してもよい。 FIG. 11 shows the configuration of an X-ray imaging device 200 according to one embodiment. The X-ray imaging device 200 can include an X-ray generation device 1 and an X-ray detection device 240 that detects X-rays XR emitted from the X-ray generation device 1 and transmitted through the object 230. The X-ray detection device 240 may further include a control device 210 and a display device 220. The X-ray detection device 240 may include an X-ray detector 242 and a signal processing section 244. Control device 210 can control X-ray generation device 1 and X-ray detection device 240. The X-ray detector 242 can detect or image the X-rays XR emitted from the X-ray generator 1 and transmitted through the object 230. The signal processing unit 244 may process the signal output from the X-ray detector 242 and provide the processed signal to the control device 210. The control device 210 causes the display device 220 to display an image based on the signal supplied from the signal processing section 244. The control device 210 determines whether or not it is necessary to execute the rotation process based on the usage amount of the X-ray generator 1 and/or changes in the X-rays generated by the X-ray generator 1, and determines whether it is necessary to perform the rotation process. If it is determined that this is the case, the display device 220 may be used to prompt the operator to perform the rotation process.
　前述のように、Ｘ線発生装置１から放射されるＸ線の焦点位置（電子線の入射位置）が変更されると、それに応じてＸ線検出器２４２あるいはＸ線検出装置２４０を位置合わせする必要がある。上記の各実施形態に係るＸ線発生装置１によれば、焦点位置を変化させることなくターゲットあるいはＸ線発生管の寿命を延ばすことができるので、そのような位置合わせは不要である。 As described above, when the focal position of the X-rays emitted from the X-ray generator 1 (electron beam incident position) is changed, the X-ray detector 242 or the X-ray detector 240 is positioned accordingly. There is a need. According to the X-ray generating device 1 according to each of the embodiments described above, the life of the target or the X-ray generating tube can be extended without changing the focal position, so such alignment is unnecessary.
１：Ｘ線発生装置、ＥＧ:電子銃、１０：電子銃、２０：アノード、２１：ターゲット保持板、２２：ターゲット、２３：電極、３０：閉塞部材、５０：偏向器、６０：管支持構造、７０：偏向器支持構造、ＡＸ：中心軸、ＥＢ：電子線、８０：収容部 1: X-ray generator, EG: electron gun, 10: electron gun, 20: anode, 21: target holding plate, 22: target, 23: electrode, 30: closing member, 50: deflector, 60: tube support structure , 70: Deflector support structure, AX: Central axis, EB: Electron beam, 80: Accommodation part

Claims (20)

  1. 　電子銃、および、前記電子銃から放射される電子線を受けてＸ線を発生させるターゲットを含むＸ線発生管と、
    　前記Ｘ線発生管を支持する支持構造と、
    　前記電子線を偏向させる偏向器と、を備え、
    　前記支持構造は、前記偏向器が固定された状態で少なくとも前記ターゲットが回動されることを許すように前記Ｘ線発生管を支持する、
    　ことを特徴とするＸ線発生装置。     an X-ray generation tube including an electron gun and a target that receives electron beams emitted from the electron gun and generates X-rays;
    a support structure that supports the X-ray generating tube;
    a deflector that deflects the electron beam,
    The support structure supports the X-ray generating tube so as to allow at least the target to be rotated while the deflector is fixed.
    An X-ray generator characterized by:
  2. 　前記支持構造は、前記偏向器が固定された状態で前記Ｘ線発生管が回動されることを許すように前記Ｘ線発生管を支持する、
    　ことを特徴とする請求項１に記載のＸ線発生装置。     The support structure supports the X-ray generating tube so as to allow the X-ray generating tube to be rotated while the deflector is fixed.
    The X-ray generator according to claim 1, characterized in that:
  3. 　前記支持構造は、前記電子銃の中心軸と一致した回動軸の周りで前記Ｘ線発生管が回動されることを許すように前記Ｘ線発生管を支持する、
    　ことを特徴とする請求項１又は２に記載のＸ線発生装置。     The support structure supports the X-ray generation tube to allow the X-ray generation tube to be rotated around a rotation axis that coincides with a central axis of the electron gun.
    The X-ray generator according to claim 1 or 2, characterized in that:
  4. 　前記電子銃の中心軸は、前記ターゲットの中心を通る、
    　ことを特徴とする請求項３に記載のＸ線発生装置。     a central axis of the electron gun passes through the center of the target;
    The X-ray generator according to claim 3, characterized in that:
  5. 　前記偏向器によって前記電子線が偏向されない場合に、前記電子線が前記ターゲットの中心に入射する、
    　ことを特徴とする請求項１乃至４のいずれか１項に記載のＸ線発生装置。     When the electron beam is not deflected by the deflector, the electron beam is incident on the center of the target.
    The X-ray generator according to any one of claims 1 to 4, characterized in that:
  6. 　前記支持構造は、前記Ｘ線発生管を取り囲む収容部を含み、
    　前記収容部は、前記偏向器が固定された状態で前記Ｘ線発生管が回動されることを許すように前記Ｘ線発生管を支持する、
    　ことを特徴とする請求項１乃至５のいずれか１項に記載のＸ線発生装置。     The support structure includes a housing portion surrounding the X-ray generating tube,
    The housing section supports the X-ray generating tube so as to allow the X-ray generating tube to be rotated while the deflector is fixed.
    The X-ray generator according to any one of claims 1 to 5, characterized in that:
  7. 　前記Ｘ線発生管と前記収容部との間の空間に絶縁流体が配置されている、
    　ことを特徴とする請求項６に記載のＸ線発生装置。     an insulating fluid is disposed in a space between the X-ray generating tube and the housing section;
    The X-ray generator according to claim 6, characterized in that:
  8. 　Ｏリングを更に備え、
    　前記Ｘ線発生管および前記収容部は、前記Ｏリングを介して互いに対面するシール面を有する、
    　ことを特徴とする請求項７に記載のＸ線発生装置。     Further equipped with an O-ring,
    The X-ray generating tube and the accommodating portion have sealing surfaces facing each other via the O-ring.
    The X-ray generator according to claim 7, characterized in that:
  9. 　前記偏向器は、前記収容部を介して互いに対向するように配置された第１磁石および第２磁石を含む、
    　ことを特徴とする請求項６乃至８のいずれか１項に記載のＸ線発生装置。     The deflector includes a first magnet and a second magnet that are arranged to face each other through the housing part.
    The X-ray generator according to any one of claims 6 to 8.
  10. 　前記Ｘ線発生管は、前記支持構造に対する前記Ｘ線発生管の回動角を示すマークを有する、
    　ことを特徴とする請求項１乃至９のいずれか１項に記載のＸ線発生装置。     The X-ray generating tube has a mark indicating a rotation angle of the X-ray generating tube with respect to the support structure.
    The X-ray generator according to any one of claims 1 to 9.
  11. 　請求項１乃至１０のいずれか１項に記載のＸ線発生装置と、
    　前記Ｘ線発生装置から放射されたＸ線を検出するＸ線検出器と、
    　を備えることを特徴とするＸ線撮像装置。     The X-ray generator according to any one of claims 1 to 10,
    an X-ray detector that detects X-rays emitted from the X-ray generator;
    An X-ray imaging device comprising:
  12. 　電子銃、および、前記電子銃から放射される電子線を受けてＸ線を発生させるターゲットを含むＸ線発生管と、前記Ｘ線発生管を支持する支持構造と、前記電子線を偏向させる偏向器と、を備えるＸ線発生装置の調整方法であって、
    　前記偏向器が固定された状態で少なくとも前記ターゲットを回動させる回動工程を含む、
    　ことを特徴とするＸ線発生装置の調整方法。     an electron gun, an X-ray generation tube including a target that receives an electron beam emitted from the electron gun and generates X-rays, a support structure that supports the X-ray generation tube, and a deflector that deflects the electron beam. A method for adjusting an X-ray generator comprising:
    a rotating step of rotating at least the target while the deflector is fixed;
    A method for adjusting an X-ray generator, characterized in that:
  13. 　前記回動工程では、前記偏向器が固定された状態で前記Ｘ線発生管が回動される、
    　ことを特徴とする請求項１２に記載のＸ線発生装置の調整方法。     In the rotating step, the X-ray generating tube is rotated while the deflector is fixed.
    13. The method for adjusting an X-ray generator according to claim 12.
  14. 　前記回動工程では、前記電子銃の中心軸と一致した回動軸の周りで前記Ｘ線発生管を回動させる、
    　ことを特徴とする請求項１２又は１３に記載のＸ線発生装置の調整方法。     In the rotation step, the X-ray generating tube is rotated around a rotation axis that coincides with the central axis of the electron gun.
    14. The method for adjusting an X-ray generator according to claim 12 or 13.
  15. 　前記電子銃の中心軸は、前記ターゲットの中心を通る、
    　ことを特徴とする請求項１４に記載のＸ線発生装置の調整方法。     a central axis of the electron gun passes through the center of the target;
    The method for adjusting an X-ray generator according to claim 14.
  16. 　前記偏向器によって前記電子線が偏向されない場合に、前記電子線が前記ターゲットの中心に入射する、
    　ことを特徴とする請求項１２乃至１５のいずれか１項に記載のＸ線発生装置の調整方法。     When the electron beam is not deflected by the deflector, the electron beam is incident on the center of the target.
    The method for adjusting an X-ray generator according to any one of claims 12 to 15.
  17. 　前記支持構造は、前記Ｘ線発生管を取り囲む収容部を含み、
    　前記回動工程では、前記偏向器および前記収容部が固定された状態で前記Ｘ線発生管が回動される、
    　ことを特徴とする請求項１２乃至１６のいずれか１項に記載のＸ線発生装置の調整方法。     The support structure includes a housing portion surrounding the X-ray generating tube,
    In the rotating step, the X-ray generating tube is rotated with the deflector and the housing section being fixed.
    The method for adjusting an X-ray generator according to any one of claims 12 to 16.
  18. 　前記偏向器は、前記収容部を介して互いに対向するように配置された第１磁石および第２磁石を含む、
    　ことを特徴とする請求項１７に記載のＸ線発生装置の調整方法。     The deflector includes a first magnet and a second magnet that are arranged to face each other through the housing part.
    The method for adjusting an X-ray generator according to claim 17.
  19. 　前記回動工程は、前記Ｘ線発生装置の使用量に応じて実行される、
    　ことを特徴とする請求項１２乃至１８のいずれか１項に記載のＸ線発生装置の調整方法。     The rotation step is performed according to the amount of use of the X-ray generator,
    The method for adjusting an X-ray generator according to any one of claims 12 to 18.
  20. 　前記回動工程は、前記Ｘ線発生装置が発生するＸ線の変化に応じて実行される、
    　ことを特徴とする請求項１２乃至１８のいずれか１項に記載のＸ線発生装置の調整方法。     The rotation step is performed according to a change in X-rays generated by the X-ray generator.
    The method for adjusting an X-ray generator according to any one of claims 12 to 18.
PCT/JP2022/016710 2022-03-31 2022-03-31 X-ray generation device, x-ray imaging device, and method for adjusting x-ray generation device WO2023188337A1 (en)

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JP2023546351A JP7337312B1 (en) 2022-03-31 2023-03-17 X-RAY GENERATOR, X-RAY IMAGING DEVICE, AND X-RAY GENERATOR ADJUSTMENT METHOD
PCT/JP2023/010620 WO2023189735A1 (en) 2022-03-31 2023-03-17 X-ray generator, x-ray imager, and method for adjusting x-ray generator
TW112111516A TW202401475A (en) 2022-03-31 2023-03-27 X-ray generator, X-ray imager, and method for adjusting X-ray generator
US18/509,608 US20240087833A1 (en) 2022-03-31 2023-11-15 X-ray generation apparatus, x-ray imaging apparatus, and adjustment method of x-ray generation apparatus

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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016162525A (en) * 2015-02-27 2016-09-05 東芝電子管デバイス株式会社 X-ray tube device
JP2020053217A (en) * 2018-09-26 2020-04-02 株式会社リガク X-ray generator and X-ray analyzer

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016162525A (en) * 2015-02-27 2016-09-05 東芝電子管デバイス株式会社 X-ray tube device
JP2020053217A (en) * 2018-09-26 2020-04-02 株式会社リガク X-ray generator and X-ray analyzer

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