WO2023032851A1 - Marqueur, dispositif de détection et procédé de détection - Google Patents

Marqueur, dispositif de détection et procédé de détection Download PDF

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Publication number
WO2023032851A1
WO2023032851A1 PCT/JP2022/032231 JP2022032231W WO2023032851A1 WO 2023032851 A1 WO2023032851 A1 WO 2023032851A1 JP 2022032231 W JP2022032231 W JP 2022032231W WO 2023032851 A1 WO2023032851 A1 WO 2023032851A1
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WIPO (PCT)
Prior art keywords
pattern
posture
marker
viewpoint
posture part
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PCT/JP2022/032231
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English (en)
Japanese (ja)
Inventor
純哉 桑田
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パナソニックＩｐマネジメント株式会社
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Publication of WO2023032851A1 publication Critical patent/WO2023032851A1/fr

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/70—Determining position or orientation of objects or cameras

Definitions

  • the present disclosure relates to markers, detection devices, and detection methods.
  • Patent Document 1 discloses a marker unit that includes a striped pattern of any two colors and a lenticular lens attached on the striped pattern.
  • the interval between the cylindrical lenses included in the lenticular lens is different from the interval between the striped lines. Since the gradation pattern observed on the lenticular lens changes according to the direction in which the lenticular lens is observed, a device (for example, a robot) observing the lenticular lens observes the change in the gradation pattern to determine the marker unit. Measure posture.
  • the marker unit disclosed in Patent Document 1 requires a lenticular lens with a relatively high member cost.
  • the marker unit disclosed in Patent Document 1 requires high accuracy in aligning the striped pattern and the lenticular lens, so the manufacturing cost is relatively high.
  • An object of the present disclosure is to reduce the cost of markers used to detect the orientation of an object.
  • the present disclosure provides a marker used for measuring an orientation relative to a viewpoint, the marker comprising a posture part used for detecting the orientation relative to the viewpoint, wherein the posture part is a first period of a first period. a first surface having one pattern; and a second surface having a second pattern of a second period disposed along the first surface at a predetermined distance from the first surface; A marker whose orientation relative to the viewpoint is detected is provided based on an interference pattern observed from the viewpoint by overlapping the first pattern and the second pattern.
  • the present disclosure includes a detection device that measures an orientation relative to the viewpoint using the above-described marker, an imaging device that captures an image of the marker from the viewpoint, and an image captured by the imaging device. and a processor that detects a relative posture with respect to the imaging device based on the interference pattern observed at the posture site.
  • the present disclosure is a detection method for measuring a posture relative to the viewpoint using the marker described above, wherein the marker is imaged from the viewpoint, and the posture part included in the captured image is detected.
  • Schematic diagram showing a configuration example of a detection system according to Embodiment 1 Schematic diagram showing a configuration example of a marker according to Embodiment 1 Sectional view showing an example of the AA cross section of the lateral posture part shown in FIG.
  • Schematic diagram showing an example of a change in the period of the interference pattern of the posture part 1 is a block diagram showing an example of a hardware configuration of a detection device according to Embodiment 1;
  • FIG. 1 is a block diagram showing an example of a functional configuration of a detection device according to Embodiment 1;
  • FIG. 1 Flowchart showing an example of processing for detecting and recording a reference phase of a posture part according to Embodiment 1 4 is a flow chart showing a modification of processing for detecting and recording reference phases of posture parts according to Embodiment 1; 4 is a flowchart showing an example of processing for estimating the posture of a marker according to Embodiment 1 Schematic diagram showing a first modification of the configuration of the marker according to Embodiment 1.
  • FIG. 11 is a schematic diagram showing a third modification of the configuration of the marker according to Embodiment 1; Schematic diagram showing a configuration example of a marker according to Embodiment 2 Schematic diagram showing a first modification of the configuration of the marker according to the second embodiment Schematic diagram showing a second modification of the configuration of the marker according to the second embodiment Schematic diagram showing a first configuration example of a low-sensitivity posture part Schematic diagram showing a low-sensitivity interference pattern and a high-sensitivity interference pattern of a low-high-sensitivity posture part according to the first configuration example Cross-sectional view showing a second configuration example of the low-sensitivity posture part Cross-sectional view showing a third configuration example of the low-sensitivity posture part
  • FIG. 10 is a diagram showing a configuration example of a printing apparatus and a PC according to Embodiment 3;
  • FIG. 1 is a schematic diagram showing a configuration example of a detection system 1 according to Embodiment 1.
  • FIG. 1 is a schematic diagram showing a configuration example of a detection system 1 according to Embodiment 1.
  • the detection system 1 includes a marker 10 and a detection device 100.
  • a marker 10 is attached to a predetermined object 3 .
  • the marker 10 may be fixedly attached to the object 3 or detachably attached to the object 3 .
  • the detection device 100 is configured including an imaging device 105 .
  • the detection device 100 captures an image of the marker 10 with an imaging device 105 , detects the marker 10 from the captured image (hereinafter referred to as a captured image), and based on the detected marker 10 , determines the relative position of the marker 10 with respect to the detection device 100 . position and orientation.
  • the detection device 100 may detect the marker 10 and detect the position and orientation of the detection device 100 relative to the marker 10 .
  • the imaging device 105 is an example of a viewpoint from which the marker 10 is observed, so the imaging device 105 in the following description may be read as a viewpoint.
  • the position of the marker 10 may be expressed as X, Y, Z coordinates.
  • the horizontal plane with respect to the ground is the XY plane
  • the height direction is the Z axis.
  • the X-axis, Y-axis, and Z-axis may be determined in any way.
  • the X-axis direction is sometimes referred to as the horizontal direction
  • the Y-axis direction as the vertical direction
  • the Z-axis direction as the height direction in order to make the description easier to understand.
  • the attitude of the marker 10 may be expressed as a pitch angle, yaw angle, and roll angle.
  • the rotation angle about the X axis is the pitch angle
  • the rotation angle about the Y axis is the yaw angle
  • the rotation angle about the Z axis is the roll angle.
  • the pitch angle, yaw angle, and roll angle may be determined in any way.
  • the marker 10 may be attached to the physical space object 3 as a mark for AR.
  • the detection device 100 may be included in a smart phone, a tablet terminal, AR glasses, or the like that performs AR processing.
  • the detection apparatus 100 can accurately detect the position and orientation of the object 3 in the real space based on the detected marks, so that the computer graphic model can be accurately superimposed and displayed on the object 3 in the real space. can.
  • the marker 10 may be attached to the object 3 to be manipulated by the robot.
  • the detection device 100 may be included in a robot that manipulates the object 3 .
  • the detection apparatus 100 can accurately detect the position and orientation of the object 3 to be operated based on the detected marks, so that the robot can operate the object 3 with high accuracy.
  • the marker 10 and the detection device 100 will be described in detail below.
  • FIG. 2 is a schematic diagram showing a configuration example of the marker 10 according to the first embodiment.
  • the marker 10 may include an identification part 11, a surrounding frame 12, and a posture part 13.
  • the identification part 11 is for allowing the detection device 100 to detect the identification information of the marker 10 .
  • the identification information of the marker 10 is hereinafter referred to as a marker ID.
  • Examples of the identification part 11 include one-dimensional codes, two-dimensional codes, character strings, and the like.
  • the surrounding frame 12 is a frame arranged so as to surround the identification part 11 .
  • Enclosing frame 12 may be a square frame having a predetermined width, as shown in FIG. However, the shape of the surrounding frame 12 is not limited to a square, and may be rectangular, polygonal, circular, or the like.
  • the enclosing frame 12 may be used by the detection device 100 to detect the position of the marker 10 , detect the roll angle of the marker 10 , or roughly detect the orientation of the marker 10 .
  • the posture part 13 is for causing the detection device 100 to detect the posture of the marker 10 .
  • the detection device 100 uses the surrounding frame
  • the orientation (pitch angle or yaw angle) of the marker 10 can be roughly detected from the shape distortion of 12 .
  • the posture part 13 may be used to detect the posture of the marker 10 with sufficient accuracy even when the marker 10 is photographed from a direction close to the front.
  • the posture part 13 has a rectangular shape when viewed from the front (in the Z-axis direction), and is arranged outside the enclosing frame 12 so that its longitudinal direction is along the sides of the enclosing frame 12 .
  • the marker 10 has a horizontal position part 13A whose longitudinal direction extends in the horizontal direction (X-axis direction) and a vertical position part 13A whose longitudinal direction extends in the vertical direction (Y-axis direction). 13B may be arranged.
  • the detecting device 100 can accurately detect the Y-axis rotation angle (yaw angle) of the marker 10 using the sideways attitude part 13A, and can detect the X-axis rotation of the marker 10 using the vertical attitude part 13B.
  • the angle (pitch angle) can be detected with high accuracy.
  • the posture part 13 will be described in detail.
  • description will be made mainly on the sideways attitude portion 13A.
  • this embodiment also applies to the vertically oriented portion 13B.
  • the yaw angle in the description of this embodiment should be read as the pitch angle.
  • FIG. 3 is a cross-sectional view showing an example of the AA cross section of the sideways attitude portion 13A shown in FIG.
  • FIG. 4 is a schematic diagram showing an example of changes in the period of the interference pattern of the posture part 13A.
  • An example of the interference pattern of the posture part 13A in the case of is shown.
  • the posture part 13A has a first surface 21 and a second surface 22.
  • the first surface 21 and the second surface 22 are separated by a predetermined distance d, and the first surface 21 is arranged along (for example, parallel to) the second surface 22 .
  • the first surface 21 has a first pattern 31 with a first period p1 in the longitudinal direction (X-axis direction).
  • the second surface 22 has a second pattern 32 with a second period p2 different from the first period p1 in the longitudinal direction (X-axis direction).
  • the first pattern 31 and the second pattern 32 may be striped patterns composed of a plurality of lines extending in the lateral direction (Y-axis direction), as shown in FIG. In FIG. 4, the first pattern 31 and the second pattern 32 are shown slightly shifted in the lateral direction so that the first pattern 31 and the second pattern 32 can be distinguished from each other. Such deviation need not occur in the actual posture part 13A.
  • the position of the periodic shading of this interference pattern moves in the longitudinal direction, as shown in FIG. 4(b). That is, the phase of the interference pattern changes as the yaw angle ⁇ changes.
  • the phase of the interference pattern in this case is ⁇ 1 ( ⁇ 0).
  • the detection device 100 can detect the yaw angle ⁇ of the marker 10 by detecting the phase of the interference pattern of the posture portion 13 of the marker 10 .
  • the posture part 13 may be configured as a transparent flat plate or sheet that has a thickness d and presents a rectangular shape when viewed from the front.
  • the thickness d of the plane plate or sheet may be, for example, about 1 mm. However, the thickness d may be less than 1 mm or greater than 1 mm.
  • a first pattern 31 may be printed on the first side 21 (eg, the front side) of the plane plate or sheet, and a second pattern 32 may be printed on the second side 22 (eg, the back side) of the plane plate or sheet.
  • the plane plate or sheet may have any transparency as long as the second pattern 32 can be observed from the front direction.
  • the planar plate or sheet may have any refractive index n as long as the second pattern 32 can be observed from the front direction.
  • the posture part 13 may have a configuration different from that of the plane plate or the sheet.
  • the posture part 13 has a first surface 21 and a second surface 22 formed by arranging a plurality of hard rod-like members in a gridiron shape, and a post having a length d between the first surface 21 and the second surface 22.
  • the structure which fixes the 1st surface 21 and the 2nd surface 22 on both sides may be sufficient. In this case, the gap between the first surface 21 and the second surface 22 becomes an air layer.
  • the colors of the first pattern 31 and the second pattern 32 may be the same color (for example, black).
  • the colors of the first pattern 31 and the second pattern 32 may be different colors.
  • the first pattern 31 is red and the second pattern 32 is yellow.
  • a portion where the striped pattern of the first pattern 31 appears to cover the striped pattern of the second pattern 32 looks pink due to the combination of red and white (transparent), and the striped pattern of the first pattern 31 does not overlap with the striped pattern of the first pattern 31 .
  • the detection device 100 can detect the period T of the interference pattern that changes from pink to orange in a gradational manner in the longitudinal direction from the posture part 13A.
  • T p2 ⁇ p1/(p1 ⁇ p2) (Formula 1)
  • the detectable range of the yaw angle ⁇ may be calculated by Equation 2 below. ⁇ arctan(n ⁇ p1/d/2) ⁇ +arctan(n ⁇ p1/d/2) ... (Formula 2)
  • ⁇ is estimated based on how much the phase ⁇ 1 of the interference pattern deviates from the reference phase ⁇ 0.
  • the detectable range defined by Equation 2 is for the case where the first pattern 31 and the second pattern 32 are sufficiently long. Also, in order to calculate ⁇ , it is necessary to observe the state in which the interference pattern has moved. Therefore, when the lengths of the first pattern 31 and the second pattern 32 are exactly the period T, part of the interference pattern that has moved protrudes beyond the end of the posture part 13 and cannot be observed. There is In this case, it becomes difficult to directly obtain information on the amount of movement of the interference pattern, so there is a risk that the detection accuracy of ⁇ will decrease.
  • the lengths of the first pattern 31 and the second pattern 32 are sufficiently longer than the period T of the interference pattern.
  • the entire pattern should be visible, that is, the posture part 13, the first pattern 31, and the second pattern 32 should be longer than the period T.
  • the posture part 13, the first pattern 31, and the second pattern 32 will be described below as being sufficiently longer than the period T.
  • the posture part 13 according to the present embodiment does not require a lenticular lens whose member cost is relatively high as disclosed in Patent Document 1. Moreover, the posture part 13 according to the present embodiment does not require highly accurate alignment such as alignment between the striped pattern and the lenticular lens disclosed in Patent Document 1. Therefore, according to this embodiment, the cost of the marker 10 can be reduced.
  • the direction in which the phase of the interference pattern changes due to the change in angle is determined by the shape and period of the first pattern 31 and the second pattern 32 that constitute the posture part 13. . More specifically, patterns appearing at periods p1 and p2 in the direction perpendicular to the rotation axis of the angle to be detected are adopted as the first pattern 31 and the second pattern 32, thereby rotating the phase of the interference pattern. It changes depending on the angle. For example, in the example of FIG.
  • FIG. 5 is a block diagram showing an example of the hardware configuration of the detection device 100 according to Embodiment 1. As shown in FIG.
  • the detection device 100 includes a processor 101, a ROM (Read Only Memory) 102, a RAM (Random Access Memory) 103, a storage 104, and an imaging device 105 as hardware.
  • ROM Read Only Memory
  • RAM Random Access Memory
  • the ROM 102 is configured by a non-volatile storage medium and stores computer programs, data, and the like.
  • the RAM 103 is composed of a volatile or non-volatile storage medium, and stores computer programs and data. Note that the RAM 103 may simply be read as a memory.
  • the storage 104 is configured by a non-volatile storage medium and stores computer programs, data, and the like. Examples of the storage 104 include flash memory, SSD (Solid State Drive), and HDD (Hard Disk Drive).
  • the imaging device 105 is composed of a lens, an image sensor, and the like, captures an image of a subject, and generates a captured image.
  • the imaging device 105 may be read as a camera.
  • the processor 101 reads and executes a computer program from the ROM 102 or the storage 104, and cooperates with the imaging device 105, the RAM 103, the storage 104, etc., to implement the functions of the detection device 100. Details of the functions of the detection device 100 will be described later (see FIG. 6). Note that the processor 101 may be read as other terms such as a CPU (Central Processing Unit), a controller, and a control circuit.
  • a CPU Central Processing Unit
  • controller Central Processing Unit
  • FIG. 6 is a block diagram showing an example of the functional configuration of the detection device 100 according to Embodiment 1. As shown in FIG.
  • the detection device 100 has an image acquisition unit 201, a marker detection unit 202, a phase detection unit 203, a reference phase detection unit 204, a reference phase holding unit 205, an angle calculation unit 206, and a posture estimation unit 207 as functions. These functions may be realized by the processor 101 reading and executing a computer program from the ROM 102 or the storage 104 and cooperating with the imaging device 105, the RAM 103, the storage 104, and the like. Therefore, hereinafter, the processing mainly performed by these components can be read as the processing mainly performed by the processor 101 .
  • the image acquisition unit 201 acquires captured images from the imaging device 105 .
  • the marker detection unit 202 detects the marker 10 from the captured image acquired by the image acquisition unit 201 . In addition, the marker detection unit 202 detects the identification part 11 and the posture part 13 from the detected markers 10 .
  • the phase detection unit 203 observes the interference pattern of the posture part 13 detected by the marker detection unit 202 and detects the phase of the interference pattern.
  • the reference phase detection unit 204 observes the interference pattern of the posture part 13 detected by the marker detection unit 202 from the marker 10 in a predetermined posture, and detects the phase of the interference pattern as the reference phase.
  • the reference phase detector 204 associates the detected reference phase with the marker ID detected by the marker detector 202 .
  • the reference phase holding unit 205 holds a set of marker IDs and reference phases associated by the reference phase detection unit 204 in the storage 104, for example.
  • the angle calculator 206 calculates the angle (yaw angle or pitch angle).
  • the posture estimation unit 207 estimates the posture of the marker 10 based on the angle of the posture part 13 calculated by the angle calculation unit 206 and the position of the marker 10 in the captured image.
  • FIG. 7 is a flowchart showing an example of processing for detecting and recording the reference phase of the posture part 13 according to the first embodiment.
  • the imaging device 105 images the marker 10 in a predetermined posture (for example, the marker 10 facing the front) to generate a captured image, and the image acquisition unit 201 acquires the captured image from the imaging device 105 (S101).
  • the marker detection unit 202 detects the marker 10 from the acquired captured image (S102).
  • the marker detection unit 202 detects the identification part 11 (for example, two-dimensional code) and the posture part 13 from the detected marker 10 (S103).
  • the marker detection unit 202 detects the marker ID from the detected identification part 11 (S104).
  • the reference phase detection unit 204 detects the phase of the interference pattern from the detected posture part 13 and uses it as the reference phase (S105).
  • the reference phase holding unit 205 associates and holds the detected marker ID and the reference phase (S106).
  • the phase of the interference pattern of the posture part 13 observed when the marker 10 indicated by the marker ID is in a predetermined posture is held in the reference phase holding unit 205 as a reference phase.
  • FIG. 8 is a flow chart showing a modification of the process of detecting and recording the reference phase of the posture part 13 according to the first embodiment.
  • the imaging device 105 captures an image of the marker 10 to generate a captured image, and the image acquisition unit 201 acquires the captured image (S201).
  • the marker detection unit 202 detects the marker 10 from the acquired captured image (S202).
  • the marker detection unit 202 calculates the amount of posture deviation between the marker 10 in a predetermined posture (for example, the marker 10 facing the front) and the detected marker 10 (S203).
  • the marker detection unit 202 may calculate the amount of deviation based on the shape of the marker 10 in the captured image. For example, when the shape of the enclosing frame 12 of the marker 10 is square, the marker detection unit 202 performs the following processing. That is, when the shape of the surrounding frame 12 of the detected marker 10 is a square, the marker detection unit 202 calculates the amount of deviation to be approximately 0 because the marker 10 is in a posture that faces approximately the front.
  • the marker detection unit 202 determines that the larger the ratio of the shape of the surrounding frame 12 of the detected marker 10 that deviates from the square ), the amount of deviation is calculated to be large because the marker 10 is in a posture that is greatly inclined.
  • the marker detection unit 202 may display information such as the calculated amount of misalignment, the direction of the misalignment, or the direction in which the imaging device 105 should be moved to eliminate the misalignment on the screen so that the user can confirm it. good.
  • the marker detection unit 202 compares the deviation amount calculated last time and the deviation amount calculated this time, and determines whether or not the deviation amount this time is smaller than the deviation amount last time (S204).
  • step S204: NO If the current deviation amount is not smaller than the previous deviation amount (S204: NO), the processor 101 advances the process to step S209, and if the current deviation amount is smaller than the previous deviation amount ( S204: YES), the process proceeds to step S205.
  • the marker detection unit 202 detects the identification part 11 (for example, two-dimensional code) and the posture part 13 from the detected marker 10 (S205).
  • the marker detection unit 202 detects the marker ID from the detected recognition site (S206).
  • the reference phase detection unit 204 detects the phase of the interference pattern from the detected posture part 13 and uses it as the reference phase (S207).
  • the reference phase holding unit 205 associates and holds the detected marker ID and the reference phase (S208). That is, when the current deviation amount is smaller than the previous deviation amount (that is, when step S204 is YES), the reference phase holding unit 205 holds the reference phase, and the current deviation amount is equal to the previous deviation amount. If this is the case (that is, if step S204 is NO), the reference phase is not held. As a result, the reference phase holding unit 205 holds the phase of the interference pattern detected from the marker 10 in a posture closer to the front as the reference phase.
  • the processor 101 determines whether or not the conditions for terminating this process are satisfied (S209).
  • termination conditions include a case where the user performs a predetermined termination operation, or a case where the deviation amount becomes equal to or less than a predetermined threshold.
  • processor 101 determines that the termination condition is not satisfied (S209: NO), it returns the process to step S201, and if it determines that the termination condition is satisfied (S209: YES), it ends this process.
  • the reference phase holding unit 205 holds, as a reference phase, the phase of the interference pattern of the posture part 13 observed in a posture in which the marker 10 indicated by the marker ID faces more toward the front.
  • processing shown in FIG. 7 or 8 described above may be performed when the marker 10 is manufactured.
  • images of the marker 10 in various postures may be captured to check whether or not the interference pattern is appropriately observed in each posture.
  • FIG. 9 is a flowchart showing an example of processing for estimating the orientation of marker 10 according to the first embodiment. It is assumed that the reference phase is held in the reference phase holding unit 205 in advance by the reference phase recording processing shown in FIG. 7 or 8 before execution of this process.
  • the imaging device 105 captures the marker 10 to generate a captured image, and the image acquisition unit 201 acquires the captured image (S301).
  • the marker detection unit 202 detects the marker 10 from the acquired captured image (S302).
  • the marker detection unit 202 detects the identification part 11 (for example, two-dimensional code) and the posture part 13 from the detected marker 10 (S303).
  • the marker detection unit 202 detects the marker ID from the detected identification part 11 (S304).
  • the phase detection unit 203 detects the phase of the interference pattern from the detected posture part 13 (S305).
  • the angle calculator 206 acquires the reference phase (eg, ⁇ 0) associated with the detected marker ID from the reference phase holder 205 . Then, the angle calculator 206 calculates the angle (yaw angle or pitch angle) of the posture part 13 based on the shift between the reference phase and the phase (eg, ⁇ 1) detected in step S305 (S306).
  • the reference phase eg, ⁇ 0
  • the angle calculator 206 calculates the angle (yaw angle or pitch angle) of the posture part 13 based on the shift between the reference phase and the phase (eg, ⁇ 1) detected in step S305 (S306).
  • the posture estimation unit 207 estimates the posture of the marker 10 based on the calculated angle (eg, yaw angle or pitch angle) of the posture part 13 and the position of the marker 10 in the captured image (S307). Note that the processing shown in FIG. 9 may be repeatedly executed.
  • the detection device 100 can estimate the orientation of the marker 10 with high accuracy.
  • the marker ID and the reference phase detected in the reference phase recording process are associated and held, and the reference phase associated with the marker ID detected in the attitude estimation process is obtained. . Therefore, even if there is some error in the posture part 13 for each marker 10, the reference phase based on the error can be retained and used for posture estimation. Therefore, the detection accuracy of the yaw angle ⁇ can be ensured without performing precise alignment between the posture parts 13 .
  • the imaging device 105 used for detecting the marker 10 is the same as the imaging device 105 used for recording the reference phase, it is possible to absorb errors in the reference phase that may arise from differences in camera characteristics.
  • the reference phase held for a certain marker 10 can be It may be used for posture estimation processing using another marker 10 , or the reference phase recording processing and posture estimation processing may be performed by a different detection device 100 .
  • the main purpose is to estimate the posture, it is not necessary to distinguish the markers 10. Therefore, in the reference phase recording process and the posture estimation process, the marker 10 without the identification part 11 is used, or the marker ID The detection process itself may be omitted.
  • the marker 10 may be configured to include only one of the posture part 13A and the posture part 13B. good.
  • the posture portion 13A is arranged at the position in the negative direction of the Y-axis (that is, the lower position), and the posture portion 13B is arranged at the position in the positive direction of the X-axis. (that is, the right position), the posture parts 13A and 13B may be positioned at other positions.
  • the posture part 13A is arranged at the position in the positive direction of the Y-axis (that is, the upper position), and the posture part 13B is arranged at the position in the negative direction of the X-axis (that is, the position to the left).
  • the same effect as the marker 10 of the present embodiment can be obtained.
  • the posture part 13A may be arranged at both the upper and lower positions, or the posture part 13B may be arranged at both the left and right positions. By doing so, even if one of the posture parts 13 is hidden by an obstacle, the angle can be estimated if the other posture parts 13 can be observed.
  • the longitudinal length of the posture part 13 is substantially the same as the length of the side of the enclosing frame 12 , but the longitudinal length of the posture part 13 is the same as the length of the side of the enclosing frame 12 .
  • the length may be different from the length.
  • the angle can be detected even if the length of the posture part 13 in the longitudinal direction is shorter than the length of the side of the enclosing frame 12.
  • the range remains unchanged.
  • the posture portion 13A is arranged at the position in the negative direction of the Y-axis (that is, the lower position), and the posture portion 13B is arranged at the position in the positive direction of the X-axis. (that is, the right position), the posture parts 13A and 13B may be positioned at other positions.
  • the posture parts 13A and 13B may be positioned at other positions. For example, in FIG.
  • the posture part 13A is arranged at any position in the positive or negative direction of the X-axis (that is, any position in the left-right direction), and the posture part 13B is arranged at any position in the positive or negative direction of the Y-axis (that is, The same effect as the marker 10 of the present embodiment can be obtained even if it is arranged at any position in the vertical direction.
  • a rectangular shape is adopted as the posture part 13, and when the enclosing frame 12 of the marker 10 is rectangular, the longitudinal direction of the posture part 13 is arranged along the sides of the enclosing frame 12 of the marker 10. It is By adopting this configuration, the area occupied by the marker 10 can be suppressed.
  • the side of the enclosing frame 12 and the longitudinal direction of the posture part 13 do not necessarily have to be aligned.
  • the side of the enclosing frame 12 and the posture part 13 may be shifted by 45 degrees. Even in this case, if the relative angle between the surrounding frame 12 and the posture part 13 is known, the angle can be accurately estimated using the posture part 13 .
  • the configuration of the marker 10 according to Embodiment 1 is not limited to the example shown in FIG. Next, some modifications of the configuration of marker 10 according to Embodiment 1 will be described.
  • FIG. 10 is a schematic diagram showing a first modification of the configuration of marker 10 according to the first embodiment.
  • the marker 10 may be configured to include posture parts 13 arranged along the sides of the enclosing frame 12 inside the enclosing frame 12 .
  • the marker 10 inside the enclosing frame 12, the marker 10 has a sideways attitude portion 13A arranged along the lateral sides of the enclosing frame 12 in the longitudinal direction, and and a vertically oriented posture portion 13B arranged along the vertical side of the .
  • the detection device 100 can detect the posture parts 13A and 13B using the position of the enclosing frame 12 as a reference. Further, the detection device 100 can detect the yaw angle based on the phase change of the interference pattern of the sideways attitude part 13A, and can detect the pitch angle based on the phase change of the interference pattern of the vertical attitude part 13B.
  • the posture parts 13 may be embedded in the sides of the enclosing frame 12 . However, it is difficult to detect the shape of the enclosing frame 12 in which the posture part 13 is embedded. It is better to arrange the frame 12 and the posture part 13 at different positions.
  • FIG. 11 is a schematic diagram showing a second modification of the configuration of marker 10 according to the first embodiment.
  • the marker 10 may be configured to include a circular posture portion 13 arranged at a predetermined position (for example, the center of the enclosing frame 12) inside the enclosing frame 12.
  • the first pattern 31 and the second pattern 32 are printed on the first surface 21 and the second surface 22 of the posture part 13 as circular patterns that are periodic in the direction away from the center of the circle. good.
  • the posture part 13 is not limited to a circular shape, and may be fan-shaped with a central angle of 1/4 or more. This is because, if the central angle is at least 1/4 of the fan shape, the deviation of the interference pattern can be observed for both rotation in the yaw direction and rotation in the pitch direction. If it is sufficient to calculate only one of the yaw angle and the pitch angle, the posture part 13 may be fan-shaped with a narrower central angle (less than 1/4).
  • the detection device 100 can detect the posture part 13 with the position of the enclosing frame 12 as a reference. Further, the detection device 100 can detect the yaw angle based on the phase change of the interference pattern in the X-axis direction from the center of the posture part 13, and can detect the pitch angle based on the phase change of the interference pattern in the Y-axis direction from the center of the posture part 13. Can detect corners.
  • the marker 10 may be configured to include a ring-shaped posture portion 13 arranged so as to surround the enclosing frame 12 outside the enclosing frame 12 . Further, the marker 10 may be configured to include a ring-shaped posture portion 13 arranged at a predetermined position (for example, the center of the enclosing frame 12) inside the enclosing frame 12.
  • the posture part 13 may have a ring shape (that is, a fan shape) with a central angle of 1/4 or more, as in the case of the circular shape.
  • the posture part 13 has a ring shape (that is, a fan shape) with a narrower central angle (less than 1/4). ).
  • the length of its radius may be equal to or longer than the length of one period of the interference pattern, and when the posture part 13 is ring-shaped, the width of the ring may be longer than or equal to one cycle of .
  • the posture part 13 has a sufficient length in order to maximize the detectable range of angles.
  • the interference pattern appears concentrically and moves in the radial direction of the circle or fan or in the width direction of the ring as the angle changes.
  • the maximum detectable range can be set by increasing the length of the radius of the circle in the case of a circular or sector shape, and by increasing the width of the ring in the case of a ring shape.
  • this length does not necessarily have to be equal to or longer than the length of one cycle, and may be shorter than the length of one cycle. There is a need to.
  • FIG. 12 is a schematic diagram showing a third modification of the configuration of marker 10 according to the first embodiment.
  • the marker 10 may be configured to include a rectangular posture portion 13 arranged at a predetermined position (for example, the center of the enclosing frame 12) inside the enclosing frame 12.
  • the first pattern 31 and the second pattern 32 are lattice patterns in which patterns having periodicity corresponding to mutually different rotation axes are overlapped, and the first surface 21 and the second pattern 32 of the posture part 13 are formed.
  • Surface 22 may be printed.
  • the detection device 100 can detect the pitch angle or yaw angle of the marker 10 based on the phase movement.
  • the interference pattern moves in the Y-axis direction in FIG.
  • the interference pattern moves in the X-axis direction. Therefore, by analyzing the interference pattern focusing on each direction, a plurality of rotation angles can be calculated with one marker 10 .
  • the shape of the posture part 13 may be rectangular even in the case of the lattice pattern.
  • the length in the direction perpendicular to the rotation axis must be equal to or greater than the period of the interference pattern. Therefore, in FIG. 12, a posture portion 13 that is long in both the X-axis direction and the Y-axis direction is provided so that both the pitch angle and the yaw angle can be detected within a sufficient range.
  • the posture part 13 since a large area is required to arrange the posture part 13 outside the enclosing frame 12, the posture part 13 is arranged inside the enclosing frame 12 in FIG. However, if the area of the marker 10 is not restricted, the posture part 13 may be arranged outside the enclosing frame 12 .
  • Embodiment 2 describes a marker 10 that includes a plurality of posture parts 13 with different sensitivities.
  • the same reference numerals are given to the constituent elements that have already been explained in Embodiment 1, and the explanation may be omitted.
  • FIG. 13 is a schematic diagram showing a configuration example of the marker 10 according to the second embodiment.
  • the marker 10 includes an identification part 11, a surrounding frame 12, a low-sensitivity posture part 14, and a high-sensitivity posture part 15.
  • the basic configuration of the low-sensitivity posture part 14 and the high-sensitivity posture part 15 may be the same as that of the posture part 13 described in the first embodiment. Therefore, in the second embodiment, the low-sensitivity posture part 14 and the high-sensitivity posture part 15 may be expressed as the posture part 13 .
  • the sensitivity corresponds to the level of accuracy in detecting the angle of the posture part 13.
  • the detectable angle range is limited to a range in which the same interference pattern as when the angle is 0 degree does not appear.
  • the granularity with which changes in the phase of the interference pattern can be detected is determined by parameters that are difficult to change, such as the resolution of the imaging device 105 . Therefore, a configuration in which a small angle change causes a large phase change can detect an angle change with higher accuracy than a configuration in which a large angle change causes a small phase change.
  • the period of the interference pattern is determined by a parameter different from the detectable range of the angle (equation 1, equation 2). Therefore, if the period of the interference pattern is long (that is, the range in which the same interference pattern does not appear when the angle is 0 degrees is wide) and the parameters are designed so that the angle detection range is narrow, a slight angle change can be achieved. It is possible to design the marker 10 whose phase changes greatly at . On the other hand, however, in order to realize the angle detectable range shown in Equation 2, the length of the posture part 13 needs to be sufficiently longer than the period of the interference pattern.
  • the size of the posture part 13 will become very large, and as a result, the size of the marker 10 will also become very large. That is, in an actual environment where the size of the marker 10 (or the size of the posture part 13) is physically restricted, the higher the sensitivity, the narrower the angle detection range, and the lower the sensitivity, the wider the angle detection range. Become.
  • both the low-sensitivity posture part 14, which is the posture part 13 with relatively low sensitivity, and the high-sensitivity posture part 15, which has higher sensitivity than the low-sensitivity posture part 14, are arranged on the marker 10.
  • the marker 10 capable of detecting the angle of the posture part 13 with a wide detection range and high detection accuracy is realized.
  • the marker 10 is positioned outside the enclosing frame 12 along the lateral sides of the enclosing frame 12 (for example, the upper side and the lower side in FIG. 13).
  • the detection device 100 can detect a wide range of yaw angles with high precision using the low-sensitivity posture part 14A and the high-sensitivity posture part 15A in the horizontal direction, and detect the low-sensitivity posture part 14B and the high-sensitivity posture part 15B in the vertical direction.
  • a wide range of pitch angles can be detected with high accuracy.
  • the period T of the interference pattern is affected by the values of p1 and p2 (equation 1), but the angle detection range is not affected by p2 (equation 2). Therefore, by appropriately adjusting the values of p1 and p2, even when a material having a uniform refractive index n and a uniform distance d is used as the material of the marker 10, an interference pattern having substantially the same period T and different sensitivities can be obtained.
  • a generating marker 10 can be implemented. Also, the sensitivity may be adjusted by forming the marker 10 from a plurality of materials and changing the refractive index n or the distance d.
  • the configuration of the marker 10 according to Embodiment 2 is not limited to the configuration example shown in FIG. Next, some modifications of the configuration of marker 10 according to Embodiment 2 will be described.
  • FIG. 14 is a schematic diagram showing a first modification of the configuration of marker 10 according to the second embodiment.
  • the marker 10 has low-sensitivity posture parts 14 (14A, 14B) and high-sensitivity posture parts 15 (15A, 15B) along each of the four sides of the enclosing frame 12 outside the enclosing frame 12. may be arranged side by side. That is, the low-sensitivity posture part 14 and the high-sensitivity posture part 15 may be arranged adjacent to each other.
  • This also makes it possible to realize the marker 10 capable of detecting the angle of the posture part 13 with a wide detection range and high detection accuracy, as described above.
  • FIG. 15 is a schematic diagram showing a second modification of the configuration of marker 10 according to the second embodiment.
  • the marker 10 is positioned outside the enclosing frame 12 along the sides of the enclosing frame 12 .
  • ) 16 may be arranged. Next, some configuration examples for realizing the low-sensitivity posture part 16 will be described.
  • FIG. 16 is a schematic diagram showing a first configuration example of the low-high-sensitivity posture part 16. As shown in FIG. In FIG. 16, (a) shows the first surface 21 of the low-high-sensitivity posture part 16 viewed from the positive direction of the Z-axis, and (b) shows the second surface 22 of the low-high-sensitivity posture part 16 viewed from the Z-axis. shows a view from the positive direction.
  • the first surface 21 of the low-sensitivity posture portion 16 has a first pattern 33 for low sensitivity and a first pattern 34 for high sensitivity.
  • the second surface 22 of the low-sensitivity posture portion 16 has a second pattern 35 for low sensitivity and a second pattern 36 for high sensitivity.
  • the first pattern 33 for low sensitivity and the first pattern 34 for high sensitivity are the first pattern 31 on the first surface 21 shown in FIG. It corresponds to a line in the lateral direction (Y-axis direction).
  • the first pattern 33 for low sensitivity and the first pattern 34 for high sensitivity are patterns that do not overlap each other in the lateral direction (Y-axis direction). you can For example, as shown in FIG. 16A, the first pattern 33 for low sensitivity and the first pattern 34 for high sensitivity are patterns like dashed lines alternated in the lateral direction (Y-axis direction). is.
  • the first pattern 33 for low sensitivity and the first pattern 34 for high sensitivity may have different cycles in the longitudinal direction (X-axis direction).
  • the second pattern 35 for low sensitivity and the second pattern 36 for high sensitivity are the second pattern on the second surface 22 shown in FIG. It corresponds to a line in the lateral direction (Y-axis direction) of the pattern 32 .
  • the second pattern 35 for low sensitivity and the second pattern 36 for high sensitivity are patterns that do not overlap each other in the lateral direction (Y-axis direction). you can For example, as shown in FIG. 16B, the second pattern 35 for low sensitivity and the second pattern 36 for high sensitivity are patterns like dashed lines alternated in the lateral direction (Y-axis direction). is. Also, the second pattern 35 for low sensitivity and the second pattern 36 for high sensitivity may have different cycles in the longitudinal direction (X-axis direction).
  • an interference pattern for low sensitivity observed by interference between the first pattern 33 for low sensitivity and the second pattern 35 for low sensitivity, and the first pattern 34 for high sensitivity and for high sensitivity The interference pattern for high sensitivity observed by interference with the second pattern 36 of .
  • FIG. 17 is a schematic diagram showing a low-sensitivity interference pattern and a high-sensitivity interference pattern of the low-high-sensitivity posture portion 16 according to the first configuration example.
  • FIG. 17(a) shows an example of an interference pattern for low sensitivity
  • FIG. 17(b) shows an example of an interference pattern for high sensitivity.
  • the detection apparatus 100 detects a portion of the captured image in which the first pattern 33 for low sensitivity and the second pattern 35 for low sensitivity exist on the Y axis as a detection range.
  • the portion where the first pattern 34 and the second pattern 36 for high sensitivity are present is defined as a non-detection range (that is, a non-detection range).
  • the detection apparatus 100 detects the interference pattern for low sensitivity observed by the interference between the first pattern 33 for low sensitivity and the second pattern 35 for low sensitivity, as shown in FIG. can be detected.
  • the detection apparatus 100 detects a portion in which the first high-sensitivity pattern 34 and the second high-sensitivity pattern 36 exist on the Y-axis from the captured image as a detection range.
  • the portion where the pattern 33 of 1 and the second pattern 35 for low sensitivity exist is defined as a non-detection range (that is, a non-detection range). 17(b), the detection device 100 detects an interference pattern for high sensitivity observed by interference between the first pattern 34 for high sensitivity and the second pattern 36 for high sensitivity. can be detected.
  • the detection apparatus 100 detects a wide
  • the angle of the low-high-sensitivity posture part 16 can be calculated within the detection range and with high detection accuracy.
  • the first pattern 33 for low sensitivity and the second pattern 35 for low sensitivity are a thin checkered pattern
  • the first pattern 34 for high sensitivity and the second pattern 36 for high sensitivity are drawn as dark checkered patterns, but these patterns 33, 34, 35, and 36 may all be of the same color (for example, black).
  • FIG. 18 is a cross-sectional view showing a second configuration example of the low-high-sensitivity posture portion 16. As shown in FIG.
  • the low-sensitivity posture part 16 has a first surface 21, a second surface 22 and a third surface 23.
  • the first surface 21 has a first pattern 31
  • the second surface 22 has a second pattern 32
  • the third surface 23 has a third pattern 37 .
  • the third pattern 37 is a striped pattern composed of a plurality of lines extending in the lateral direction of the low-high-sensitivity posture portion 16 .
  • the first period of the first pattern 31, the second period of the second pattern 32, and the third period of the third pattern 37 may be periods different from each other.
  • the first pattern 31 and the second pattern 32 are configured to detect an interference pattern for low sensitivity
  • the second pattern 32 and the third pattern 37 are configured to detect an interference pattern for high sensitivity.
  • the first pattern 31 and the second pattern 32 are configured such that the interference pattern for high sensitivity is detected
  • the second pattern 32 and the third pattern 37 are configured for the interference pattern for low sensitivity. may be configured to be detected.
  • the detection device 100 detects the low-sensitivity interference pattern and the high-sensitivity interference pattern from the captured image, and calculates the angle of the low-high-sensitivity posture part 16 with a wide detection range and high detection accuracy. can.
  • the distance d1 between the first surface 21 and the second surface 22 and the distance d2 between the second surface 22 and the third surface 23 may be common or different. Further, the refractive index n1 between the first surface 21 and the second surface 22 and the refractive index n2 between the second surface 22 and the third surface 23 may be common or different. As described above, the sensitivity can be adjusted by any parameter described in Equation 2, so whether or not the distance or the refractive index is used to set the sensitivity can be freely designed.
  • the first pattern 31 and the second pattern 32 may form one interference pattern
  • the first pattern 31 and the third pattern 37 may form the other pattern.
  • FIG. 19 is a cross-sectional view showing a third configuration example of the low-high-sensitivity posture portion 16. As shown in FIG.
  • the low-high-sensitivity posture part 16 has a first pattern 33 for low-sensitivity and a first pattern 34 for high-sensitivity on the first surface 21.
  • the second surface 22 has a second pattern 35 for low sensitivity and a second pattern 36 for high sensitivity.
  • the first pattern 33 for low sensitivity and the second pattern 35 for low sensitivity have a common color
  • the first pattern 34 for high sensitivity and the second pattern 36 for high sensitivity have a common color.
  • the first pattern 33 for low sensitivity and the second pattern 35 for low sensitivity and the first pattern 34 for high sensitivity and the second pattern 36 for high sensitivity are of different colors. .
  • the first pattern 33 for low sensitivity and the second pattern 35 for low sensitivity are blue
  • the first pattern 34 for high sensitivity and the second pattern 36 for high sensitivity are green.
  • the detection device 100 uses a color filter capable of color separation to obtain a low-sensitivity interference pattern observed by interference between the low-sensitivity first pattern 33 and the low-sensitivity second pattern 35. and the high-sensitivity interference pattern observed by the interference between the high-sensitivity first pattern 34 and the high-sensitivity second pattern 36 may be detected separately.
  • the detection device 100 performs the following processing. That is, the detection device 100 extracts the first pattern 33 for low sensitivity and the second pattern 35 for low sensitivity using a color filter for detecting blue, and detects the interference pattern for low sensitivity. Then, the detection device 100 uses a color filter for detecting green to extract the first pattern 34 for high sensitivity and the second pattern 36 for high sensitivity, and detect the interference pattern for low sensitivity.
  • the detection apparatus 100 detects a wide
  • the angle of the low-high-sensitivity posture part 16 can be calculated within the detection range and with high detection accuracy.
  • the first surface 21 may have a pattern in which the first pattern 33 for low sensitivity and the first pattern 34 for high sensitivity are common.
  • the detection device 100 converts the interference pattern observed by interference between the shared pattern on the first surface 21 and the second pattern 35 for low sensitivity on the second surface 22 into the interference pattern for low sensitivity.
  • an interference pattern observed by interference between the shared pattern on the first surface 21 and the second pattern 36 for high sensitivity on the second surface 22 is detected as an interference pattern for high sensitivity. good.
  • the second surface 22 may have a pattern in which the second pattern 34 for low sensitivity and the second pattern 36 for high sensitivity are common.
  • the detection device 100 converts the interference pattern observed by interference between the shared pattern on the second surface 22 and the first pattern 33 for low sensitivity on the first surface 21 into the interference pattern for low sensitivity.
  • an interference pattern observed by interference between the common pattern on the second surface 22 and the first pattern 34 for high sensitivity on the first surface 21 is detected as an interference pattern for high sensitivity. good.
  • the first pattern 33 for low sensitivity and the second pattern 35 for low sensitivity, and the first pattern 34 for high sensitivity and the second pattern 36 for high sensitivity have mutually different polarizations. It may be painted differently.
  • the detection apparatus 100 uses a polarizing filter capable of separating polarized light, and the interference pattern for low sensitivity observed by interference between the first pattern 33 for low sensitivity and the second pattern 35 for low sensitivity is observed. and the high-sensitivity interference pattern observed by the interference between the high-sensitivity first pattern 34 and the high-sensitivity second pattern 36 may be detected separately.
  • Embodiment 3 describes an example of a method of manufacturing the posture part 13 using a printing apparatus.
  • the same reference numerals are given to the constituent elements that have already been explained in Embodiment 1 or 2, and the explanation may be omitted.
  • FIG. 20 is a diagram showing a configuration example of the printing device 300 and the PC 310 according to the third embodiment.
  • the printing apparatus 300 prints the first pattern 31 on the first surface 21 (front surface) of the set transparent sheet (or plane plate) having a thickness d, and prints the second pattern 31 on the second surface 22 (back surface).
  • pattern 32 is printed.
  • the first pattern 31 and the second pattern 32 are printed on the first side 21 and the second side 22 of the sheet (or plane plate), respectively.
  • the posture part 13 can be easily manufactured using the printer 300 .
  • printing apparatuses and printing services for printing on arbitrary shaped acrylic plates or the like have been widely provided, so these printing apparatuses or services may be used.
  • the printing device 300 may be connected to the PC 310 .
  • the PC 310 executes printing software 311 for printing the first pattern 31 and the second pattern 32 on the printing device 300 .
  • the printing software 311 may be distributed via the Internet, or via a non-volatile storage medium such as a CD, DVD, or USB memory.
  • the PC 310 is an example of a device that executes the printing software 311 . Therefore, the printing software 311 may be executed by a device different from the PC 310, such as a smartphone or tablet terminal.
  • the printing software 311 may provide a function for the user to set parameters for printing the first pattern 31 and the second pattern 32 .
  • parameters include the size of the marker 10, the angle that can be handled, or the resolution. By setting these parameters according to the resolution or accuracy of the printing device 300 , the user can manufacture the desired posture part 13 with the printing device 300 .
  • the printing software 311 may automatically correct the parameters input by the user in consideration of the performance of the printing device 300 .
  • Printing software 311 may output a warning if the parameters entered by the user are inappropriate. For example, if the size of the marker 10 is too small for the parameters input by the user and the pattern of the posture part 13 is likely to collapse, the printing software 311 outputs a warning and proposes an appropriate marker 10 size.
  • the thickness d and refractive index n may be set in advance in the printing software 311 for each type of sheet or plane plate.
  • the sheet or plate may be standard or recommended.
  • the printing software 311 may suggest sheets or flat plates suitable for the input parameters or automatically calculated parameters to the user as recommended products.
  • the first pattern 31, the second pattern 32, and the third pattern 37 are explained as having different cycles.
  • these patterns may be patterns having the same period. Specifically, even if the period of each pattern is the same, as a result of the overlapping part changing according to the change of the imaging angle, the change of the light and shade may appear as a pattern, so this pattern is used as the interference pattern. do it. Also, depending on the characteristics of the imaging device 105, even if the periods of the patterns are the same, a more pronounced interference pattern may appear. In the above-described embodiment, the imaging device 105 is sufficiently far from the marker 10 and the captured image is not distorted.
  • the imaging device 105 is very close to the marker 10 or if a lens with special optical properties such as a fisheye lens is used, an image with radial distortion can be captured. In this case, a more pronounced interference pattern appears because the above-described gray pattern is further emphasized by the distortion. If the distance between the imaging device 105 and the marker 10 or the optical characteristics of the imaging device 105 are known, the angle of the detection device 100 can be estimated by analyzing the phase shift of this interference pattern in consideration of these information. can be done.
  • the identifying portion 11 of the marker 10 is surrounded by the rectangular enclosing frame 12, but the identifying portion 11 and the enclosing frame 12 may have other shapes such as a circular shape. 12 may be omitted.
  • the posture portion 13 may be arranged along the enclosing frame 12 after matching the shape thereof. For example, when the enclosing frame 12 is circular, the ring-shaped posture portion 13 may be arranged outside or inside the enclosing frame 12 so as to follow the shape of the enclosing frame 12 . By doing so, the identification part 11, the enclosing frame 12, and the posture part 13 can be arranged efficiently.
  • the posture part 13 includes a first surface 21 having a first pattern 31 with a first period, and a second pattern 31 arranged along the first surface 21 at a predetermined distance from the first surface 21 and having a second pattern 31 different from the first period. and a second surface 22 having a second pattern 32 with a period of .
  • the orientation relative to the viewpoint is detected.
  • the interference pattern observed at the posture part 13 changes in accordance with the change in the relative posture between the viewpoint and the marker 10.
  • the relative posture can be detected.
  • this eliminates the need for a lenticular lens with a relatively high member cost, as disclosed in Patent Document 1, and does not require high-precision alignment such as alignment between the striped pattern and the lenticular lens.
  • the cost of the marker 10 can be reduced.
  • the first period and the second period are periods different from each other, and the interference pattern is observed from the viewpoint by the period shift between the first pattern and the second pattern.
  • the interference pattern observed at the posture part 13 changes in accordance with the change in the relative posture between the viewpoint and the marker 10. Therefore, based on the change in the interference pattern, the relative posture can be detected.
  • the orientation relative to the viewpoint includes the angle relative to the line of sight about the predetermined rotation axis
  • the first period and the second period are the directions perpendicular to the predetermined rotation axis.
  • the length of the posture part 13 in the direction perpendicular to the predetermined rotation axis may be longer than the length of the period of the interference pattern.
  • the amount of displacement between the phase of the interference pattern and the reference phase corresponding to the detectable range of the change in angle relative to the line of sight falls within the length of the posture part 13. can be observed with high accuracy.
  • the main surface of the posture part 13 may be rectangular, and the first pattern and the second pattern may be striped patterns that are periodic in the longitudinal direction of the posture part 13 .
  • an interference pattern is observed from a viewpoint due to the shift between the striped pattern of the first pattern and the striped pattern of the second pattern.
  • the main surface of the posture part 13 may be circular, and the first pattern and the second pattern may be circular patterns that are periodic in the direction away from the center of the posture part 13 .
  • the interference pattern is observed from the point of view due to the deviation between the circular pattern of the first pattern and the circular pattern of the second pattern.
  • the orientation relative to the viewpoint is the angle relative to the line of sight about the first rotation axis, and the line of sight about the second rotation axis perpendicular to the first rotation axis.
  • the first pattern and the second pattern have a striped pattern with a period perpendicular to the first axis of rotation and a period with a period perpendicular to the second axis of rotation It may be a lattice pattern that overlaps with the striped pattern.
  • the interference pattern is observed from the viewpoint due to the deviation between the grid pattern of the first pattern and the grid pattern of the second pattern.
  • the angles of both the first rotation axis and the second rotation axis can be summarized by observing the change in the interference pattern shift in the two-dimensional plane consisting of the first rotation axis and the second rotation axis. can be detected.
  • the marker 10 may further include an identification portion 11 used for identification of the marker 10 . Thereby, the marker 10 can be identified by detecting the identification portion 11 .
  • the posture part 13 may be arranged outside the rectangular enclosing frame 12 surrounding the identifying part 11 along the sides of the enclosing frame 12 .
  • the posture part 13 can be detected based on the position of the enclosing frame 12, and the relative posture between the viewpoint and the marker 10 can be detected based on the distortion of the shape of the enclosing frame 12 and the change in the interference pattern in the posture part 13. can be detected.
  • the posture part 13 may be arranged inside a rectangular enclosing frame 12 surrounding the identifying part 11 along the sides of the enclosing frame 12 .
  • the posture part 13 can be detected based on the position of the enclosing frame 12, and the relative posture between the viewpoint and the marker 10 can be detected based on the distortion of the shape of the enclosing frame 12 and the change in the interference pattern in the posture part 13. can be detected.
  • the first pattern 31 and the second pattern 32 may be of different colors.
  • the interference pattern observed as a gradation of different colors at the posture part 13 changes according to the change in the relative posture between the viewpoint and the marker 10. Therefore, based on the change in the interference pattern, the A relative attitude to the marker 10 can be detected.
  • the posture part 13 is defined as a first posture part 14, the marker 10 further includes a second posture part 15 where an interference pattern different from the interference pattern of the first posture part 14 is observed, and the first posture part 14 is observed.
  • the phase of the interference pattern of the posture part 14 and the phase of the interference pattern of the second posture part 15 may move by different amounts depending on the angle about the same rotation axis. Since the first posture part 14 and the second posture part 15 have different sensitivities to the change in the interference pattern with respect to the change in posture, the change in the interference pattern of the first posture part 14 and the interference pattern of the second posture part 15 are different. By observing the change in , the relative attitude between the viewpoint and the marker 10 can be detected in a wide detection range and with high detection accuracy.
  • the first posture part 14 and the second posture part 15 may be arranged substantially parallel. As a result, the change in the interference pattern of the first posture part 14 and the change of the interference pattern of the second posture part 15 are observed, and the relative posture between the viewpoint and the marker 10 is detected in a wide detection range and with high detection accuracy. can be detected.
  • first posture part 14 and second posture part 15 may be arranged substantially parallel with identification part 11 for identifying marker 10 interposed therebetween.
  • identification part 11 for identifying marker 10 interposed therebetween.
  • first posture part 14 and second posture part 15 may be arranged adjacent to each other. As a result, the change in the interference pattern of the first posture part 14 and the change of the interference pattern of the second posture part 15 are observed, and the relative posture between the viewpoint and the marker 10 is detected in a wide detection range and with high detection accuracy. can be detected.
  • ⁇ Expression 17> 16 Any one of expressions 1 through 16, wherein the posture portion 13 is a plane plate or sheet that is a predetermined distance (d) thick and transparent to light, and the first surface 21 is a plane plate or sheet and the second side 22 may be the other side of the plane plate or sheet. Thereby, the posture part 13 can be configured using a transparent plane plate or sheet having a predetermined thickness (d).
  • a detection device 100 that measures a posture relative to a viewpoint using the marker 10 according to any one of expressions 1 to 17, and an imaging device 105 that captures an image of the marker 10 from the viewpoint, and an imaging device 105 and a processor 101 that detects the relative posture with respect to the imaging device 105 based on the interference pattern observed at the posture part 13 included in the image captured by the processor 101 .
  • the detecting device 100 can detect the relative posture with respect to the marker 10 based on the captured image of the marker 10 .
  • the technology of the present disclosure is useful for markers for detecting postures and devices for detecting the markers.

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  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Theoretical Computer Science (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Image Analysis (AREA)

Abstract

La présente invention permet de réduire le coût d'un marqueur utilisé dans la détection de la posture d'un objet. Ce marqueur utilisé dans la mesure d'une posture par rapport à un point de vue comprend une section de posture utilisée pour détecter la posture par rapport au point de vue. La section de posture comprend une première surface comportant un premier motif doté d'une première périodicité, et une deuxième surface disposée le long de la première surface, à une distance déterminée de celle-ci, et comportant un deuxième motif doté d'une deuxième périodicité, différente de la première périodicité. La posture par rapport au point de vue est détectée en fonction d'un motif d'interférence observé à partir du point de vue donné, et formé par le chevauchement du premier motif et du deuxième motif.
PCT/JP2022/032231 2021-09-06 2022-08-26 Marqueur, dispositif de détection et procédé de détection WO2023032851A1 (fr)

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JP2021144981A JP2023038076A (ja) 2021-09-06 2021-09-06 マーカ、検出装置、及び、検出方法

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US20050190988A1 (en) * 2004-03-01 2005-09-01 Mass Institute Of Technology (Mit) Passive positioning sensors
WO2018135063A1 (fr) * 2017-01-17 2018-07-26 国立研究開発法人産業技術総合研究所 Marqueur, procédé d'estimation de posture et procédé d'estimation de position et de posture utilisant un marqueur
WO2021157484A1 (fr) * 2020-02-06 2021-08-12 大日本印刷株式会社 Marqueur, procédé de fabrication de marqueur et cible de détection

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Publication number Priority date Publication date Assignee Title
US20050190988A1 (en) * 2004-03-01 2005-09-01 Mass Institute Of Technology (Mit) Passive positioning sensors
WO2018135063A1 (fr) * 2017-01-17 2018-07-26 国立研究開発法人産業技術総合研究所 Marqueur, procédé d'estimation de posture et procédé d'estimation de position et de posture utilisant un marqueur
WO2021157484A1 (fr) * 2020-02-06 2021-08-12 大日本印刷株式会社 Marqueur, procédé de fabrication de marqueur et cible de détection

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