WO2022180808A1 - 光加工装置 - Google Patents
光加工装置 Download PDFInfo
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- WO2022180808A1 WO2022180808A1 PCT/JP2021/007455 JP2021007455W WO2022180808A1 WO 2022180808 A1 WO2022180808 A1 WO 2022180808A1 JP 2021007455 W JP2021007455 W JP 2021007455W WO 2022180808 A1 WO2022180808 A1 WO 2022180808A1
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- optical system
- wavelength
- optical
- condensing
- processing device
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- 230000003287 optical effect Effects 0.000 title claims abstract description 972
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/03—Observing, e.g. monitoring, the workpiece
- B23K26/032—Observing, e.g. monitoring, the workpiece using optical means
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/0665—Shaping the laser beam, e.g. by masks or multi-focusing by beam condensation on the workpiece, e.g. for focusing
Definitions
- the present invention relates to an optical processing device.
- Patent Document 1 describes a processing device that forms a structure by irradiating the surface of an object with a laser beam. This type of processing apparatus is required to appropriately process an object (Patent Document 1).
- the optical processing device is a synthesizing element for synthesizing a first optical path of a first light flux having a first wavelength and a second optical path of a second light flux having a second wavelength longer than the first wavelength. and a condensing optical system having a positive refractive power and condensing the first light flux and the second light flux from the synthesizing element toward a workpiece, and a corrector having a negative refractive power. and an optical system, wherein the correcting optical system is arranged on the first optical path on the incident side of the combining element, and one of the first light flux and the second light flux processes the workpiece. and the other one of the first and second beams is a beam for measuring the workpiece.
- the optical processing device is a synthesizing element for synthesizing a first optical path of a first light flux having a first wavelength and a second optical path of a second light flux having a second wavelength longer than the first wavelength. and a condensing optical system having a positive refractive power and condensing the first light flux and the second light flux from the synthesizing element toward an object to be processed, and a corrector having a positive refractive power. and an optical system, wherein the correcting optical system is arranged in the first optical path on the incident side of the combining element, and the back focus of the condensing optical system at the first wavelength is the converging optical system at the second wavelength.
- the optical processing device is a synthesizing element for synthesizing a first optical path of a first light flux having a first wavelength and a second optical path of a second light flux having a second wavelength longer than the first wavelength. and a condensing optical system having a positive refractive power and condensing the first light flux and the second light flux from the synthesizing element toward an object to be processed, and a corrector having a positive refractive power.
- the optical processing device is a synthesizing element that synthesizes a first optical path of a first light flux having a first wavelength and a second optical path of a second light flux having a second wavelength longer than the first wavelength. and a condensing optical system having a positive refractive power and condensing the first light flux and the second light flux from the synthesizing element toward a workpiece, and a corrector having a negative refractive power.
- the correcting optical system is arranged in the second optical path on the incident side of the combining element, and the back focus of the condensing optical system at the first wavelength is the converging optical system at the second wavelength.
- one of the first light flux and the second light flux is longer than the back focus of the optical optical system and is a light flux for processing the workpiece, and the other light flux of the first light flux and the second light flux is , the light flux for measuring the workpiece.
- FIG. 4 is a diagram showing an optical design example of the optical device of the first embodiment; The figure which shows roughly the structure of the condensing optical system with which the optical apparatus of 2nd Embodiment is provided.
- FIG. 10 is a diagram showing an optical design example of the optical device of the second embodiment; The figure which shows roughly the structure of the optical processing apparatus of a modification.
- FIG. 1 is a diagram schematically showing the configuration of an optical processing device 1 of the first embodiment.
- the X direction, Y direction, and Z direction indicated by arrows in FIG. 1 and each figure to be described later are directions orthogonal to each other, and each of the X direction, Y direction, and Z direction indicates the same direction in each figure.
- the XZ direction indicated by the arrow in FIG. 1 is a direction intermediate between the X direction and the Z direction described above, that is, a direction perpendicular to the Y direction and separated from the X direction and the Z direction by 45°.
- +X direction the directions indicated by the arrows
- +Y direction the position in the X direction
- +Z direction the position in the Z direction
- Z position the position in the Z direction
- the optical processing device 1 of the first embodiment includes an optical device 2, a guide 20, a sample stage 19, a control unit 22, a measurement unit 23, a calculation unit 24, position information and a correction unit 25 .
- a first light beam R ⁇ b>1 having a first wavelength which is emitted from a light source 10 and is incident on the optical device 2 via a first optical path P ⁇ b>1 , is condensed onto an irradiated surface 17 by the optical device 2 .
- a workpiece 18 is placed on a sample table 19 , and the workpiece 18 is placed on the sample table 19 so that a surface 18 s to be processed of the workpiece 18 coincides with the surface 17 to be irradiated of the optical device 2 .
- the sample stage 19 has a driving member such as a linear motor, and moves on the guide 20 in at least one of the X direction and the Y direction.
- the sample table 19 may move the workpiece 18 along the Z direction (the optical axis direction of the condensing optical system 16).
- the optical device 2 may be movable along the Z direction.
- a focus adjustment optical system (not shown) may be arranged to change the condensing positions of the first light beam R1 and the second light beam R2, which will be described later, on the workpiece 18 along the Z direction.
- the focus adjustment optical system is a front-stage third optical path P3a (in other words, an optical path in which the first optical path P1 and the second optical path P2 are superimposed) between the synthesizing element 12 and the fixed mirror 13 (polarization scanning unit), which will be described later. ).
- the focus adjustment optical system is positioned on at least one of a first optical path P1 (described later) between the light source 10 and the synthesizing element 12 and a second optical path P2 (described later) between the measuring unit 23 and the synthesizing element 12. may be placed.
- the X-position, Y-position, and Z-position of the sample table 19 are measured by an optical encoder 21, for example, and the positional information of the sample table 19 is sent to the controller 22 as a measurement signal S1. Based on the measurement signal S1, the controller 22 sends a control signal S2 to the sample stage 19 to set the sample stage 19 at a desired position.
- the sample table 19 can also be referred to as a holder that holds the sample. Details of the measurement unit 23, the calculation unit 24, and the position information correction unit 25 will be described later.
- the optical device 2 includes, in order from the side of the light source 10 supplied with the first light flux R1 of the first wavelength, a correction optical system 11, a synthesizing element 12, a fixed mirror 13, an oscillating mirror 14, and a It has a condensing optical system 16 shown.
- a first beam R1 which is supplied from the light source 10 as a parallel beam as an example and travels in the +Z direction, is made up of one or more lenses or mirrors and enters a correction optical system 11 having a predetermined refractive power (power).
- the first light beam R ⁇ b>1 exiting the correction optical system 11 enters the combining element 12 .
- the refractive power of an optical system or optical element can be the reciprocal of the focal length of the optical system or optical element.
- the optical path of the first light beam R1 between the light source 10 and the combining element 12 is called the first optical path P1. Therefore, it can be said that the correction optical system 11 is arranged on the first optical path P1.
- the first optical path P1 is not limited to between the light source 10 and the synthesizing element 12 .
- the first optical path P1 of the first light flux R1 passes from the light source 10 through the combining element 12, the fixed mirror 13, the oscillating mirror 14, and the condensing optical system 16. It can also be said that this is the optical path of the first light beam R1 traveling toward the workpiece 18 .
- the correction optical system 11 is arranged in the first optical path P1 on the incident side of the first beam R1 of the combining element 12 .
- the measurement unit 23 includes a measurement light source 23a that emits a second light beam R2, a light receiving unit 23c that receives detection light (second light beam R2) returning from the workpiece 18 as will be described later, and light emitted from the measurement light source 23a. It has a beam splitter 23b that separates and combines the light and the light returning from the workpiece 18 . Note that the beam splitter 23b may be a half mirror.
- the second optical path P2 is not limited to between the measurement unit 23 and the combining element 12.
- the second optical path P2 of the second light beam R2 passes from the measurement light source 23a (measurement unit 23) to the combining element 12, the fixed mirror 13, the oscillating mirror 14, and the light condensing device 1 (optical device 2) in the optical processing device 1 (optical device 2). It can also be said that this is the optical path of the second light beam R2 traveling toward the workpiece 18 via the optical system 16 .
- a second light beam R2 from the measurement light source 23a (measurement unit 23) to reach the combining element 12 through the second optical path P2 is also incident on the combining element 12.
- the second light beam R2 is a light beam having a second wavelength different from the first wavelength of the first light beam R1. More specifically, the second wavelength of the second beam R2 is longer than the first wavelength of the first beam R1.
- the first optical path P1 is synthesized with the second optical path P2 from the measurement light source 23a (measurement section 23). Therefore, the combining element 12 combines the first light flux R1 and the second light flux R2.
- the synthesizing element 12 is, for example, a dichroic prism, and the dichroic reflecting surface 12r transmits a first light flux R1 of a first wavelength and reflects a second light flux R2 of a second wavelength different from the first wavelength.
- the synthesizing element 12 is not limited to the dichroic prism described above, and may be composed of flat glass having a dichroic mirror.
- a polarizing beam splitter may be used.
- the first light flux R1 and the second light flux R2 combined by the synthesizing element 12 are both emitted from the synthesizing element 12 in the +Z direction and are incident on the fixed mirror 13 .
- the fixed mirror 13 is, for example, a plane mirror arranged along a plane parallel to the XZ direction and the Y direction.
- the first light flux R1 and the second light flux R2 that have traveled in the +Z direction and entered the fixed mirror 13 are reflected in the +X direction by the fixed mirror 13 and enter the oscillating mirror 14, which is a plane mirror.
- the first light beam R1 and the second light beam R2 reflected approximately in the +Z direction by the oscillating mirror 14 enter the condensing optical system 16 .
- the optical path between the synthesizing element 12 and the condensing optical system 16 is called a third optical path P3. Therefore, it can be said that the fixed mirror 13 and the oscillating mirror 14 are arranged in the third optical path P3. Further, in the third optical path P3, a front stage third optical path P3a is between the synthesizing element 12 and the fixed mirror 13, a middle stage third optical path P3b is between the fixed mirror 13 and the oscillating mirror 14, and the oscillating mirror 14 and the condensing optics are arranged.
- the path to the system 16 is also referred to as a post-stage third optical path P3c.
- the first optical path P1 of the first light beam R1 passes from the light source 10 through the combining element 12, the fixed mirror 13, the oscillating mirror 14, and the condensing optical system 16. It can also be said that this is the optical path of the first light beam R1 traveling toward the workpiece 18 .
- the second optical path P2 of the second light flux R2 passes from the measurement light source 23a (measurement unit 23) through the combining element 12, the fixed mirror 13, the oscillating mirror 14, and the condensing optical system 16. can also be said to be the optical path of the second light flux R2 traveling toward the workpiece 18. Therefore, it can be said that the third optical path P3 is an optical path in which at least a part of the first optical path P1 of the first light flux R1 and the second optical path P2 of the second light flux R2 overlap.
- the fixed mirror 13 and the oscillating mirror 14 are arranged on the first optical path P1 and the second optical path P2 between the combining element 12 and the condensing optical system 16 .
- the condensing optical system 16 is an optical system including a plurality of lenses (L11 to L15).
- An optical axis AX of the condensing optical system 16 is indicated by a dashed line in FIG.
- the optical axis AX of the condensing optical system 16 may be referred to as the exit-side optical axis of the processing device 2 .
- the lens L11 arranged on the most incident side is, for example, a lens having a negative refractive power.
- the lens L11 is also called the first lens.
- the lenses (L12 to L15) arranged closer to the irradiated surface 17 side (downstream side) than the lens L11 constitute the second lens group G20 and have positive refractive power as a whole.
- the first light flux R ⁇ b>1 and the second light flux R ⁇ b>2 are generally condensed on the illuminated surface 17 by the refractive power of the condensing optical system 16 .
- the first light flux R1 and the second light flux R2 are condensed on the surface to be illuminated 17. It does not have to be on the top (that is, on the irradiated surface 17).
- the oscillating mirror 14 is held by the drive member 15 so as to be able to oscillate within a predetermined angle range, for example, about a rotation axis parallel to the Y direction.
- a so-called galvanomirror may be used as an example of the swing mirror 14 and the driving member 15 .
- the oscillating mirror 14 oscillates within a predetermined angular range about the Y direction as the center of rotation, the traveling directions of the first light flux R1 and the second light flux R2 reflected by the oscillating mirror 14 change from the +Z direction to the above-described predetermined direction. It changes (oscillates) between two directions separated in the ⁇ X direction by twice the angle.
- the first light beam R1 and the second light beam R2 reflected by the rocking mirror 14 travel along the central optical path
- the light generally converges on the central condensing point Fa on the surface 17 to be illuminated through P4a.
- the oscillating mirror 14 rotates counterclockwise around the rotation axis parallel to the Y direction from the reference position
- the first light flux R1 and the second light flux R2 reflected by the oscillating mirror 14 pass through the right optical path P4b and are irradiated.
- the light is generally condensed on the right condensing point Fb located on the +X side of the central condensing point Fa on the surface 17 .
- the swing mirror 14 rotates clockwise around the rotation axis parallel to the Y direction from the reference position, the first light beam R1 and the second light beam R2 reflected by the swing mirror 14 pass through the left optical path P4c.
- the light generally converges on the left condensing point Fc located on the -X side of the central condensing point Fa on the illuminated surface 17 . Therefore, it can also be said that the swing mirror 14 is a deflection scanning unit that deflects the first light beam R1 and the second light beam R2 and causes the surface to be illuminated 17 to be scanned.
- the deflection scanning unit is not limited to the galvanomirror.
- the deflection scanning unit deflects the first light beam R1 and the second light beam R2 from the synthesizing element 12, and directs the first light beam R1 and the second light beam R2 toward the workpiece 18 via the condensing optical system 16.
- An existing member capable of scanning each focal point of the light beam R2 may be used.
- the deflection scanner may be a polygon mirror.
- the control unit 22 sends a control signal S3 to the drive member 15 to set the orientation of the swing mirror 14 to a predetermined orientation.
- the central optical path P4a, the right optical path P4b, and the left optical path P4c are also collectively or individually referred to as the fourth optical path P4.
- the central condensing point Fa, the right condensing point Fb, and the left condensing point Fc are also collectively or individually referred to as the condensing point FP.
- the condensing optical system 16 is a so-called f ⁇ lens system.
- the distance from the central condensing point Fa on the illuminated surface 17 to the right condensing point Fb or the left condensing point Fc is the first light flux exiting the swing mirror 14. It is proportional to the deviation angle from the +Z direction of the traveling direction of R1 and the second light beam R2.
- the X position of the focal point FP on the illuminated surface 17 is proportional to the rotation angle ⁇ of the swing mirror 14 from the above-described reference position about the Y direction.
- the projection characteristic of the condensing optical system 16 is not limited to f ⁇ .
- the projection characteristic of the condensing optical system 16 may be, for example, an equisolid angle projection characteristic or an orthogonal projection characteristic.
- the first light beam R1 supplied from the light source 10 passes through the first optical path P1, the third optical path P3, and the fourth optical path P4, and reaches the processed surface 18s of the workpiece 18 arranged on the irradiated surface 17. be irradiated.
- the second light beam R2 emitted from the measurement light source 23a (measurement unit 23) passes through the above-described second optical path P2, third optical path P3, and fourth optical path P4, and reaches the workpiece 18 placed on the irradiation surface 17. is applied to the surface 18s to be processed.
- the fourth optical path P4 can also be said to be an optical path in which at least a portion of the first optical path P1 for the first light flux R1 and the second optical path P2 for the second light flux R2 overlap.
- the first beam R1 is a beam for processing the surface 18s to be processed. That is, the first light beam R1 evaporates or melts the surface to be processed 18s itself (so-called removal processing), adds an object to the surface to be processed 18s (so-called additional processing), alters the surface to be processed 18s, Alternatively, the portion of the surface to be processed 18s irradiated with the first light flux R1 is processed by exposing, evaporating, or causing a chemical reaction in the film material formed on the surface to be processed 18s. Note that the first light beam R1 may not be a light beam for processing the surface 18s to be processed. The first beam R1 may be, for example, a beam for measuring the surface to be processed 18s.
- the second light flux R2 of the second wavelength is, for example, a light flux for measuring the position of the surface to be processed 18s.
- the second light flux R2 is applied to a portion of the surface 18s to be processed, and the second light flux R2 reflected or scattered by the surface 18s to be processed returns to the combining element 12 via the fourth optical path P4 and the third optical path P3. .
- the second light beam R2 is reflected by the dichroic reflecting surface 12r of the synthesizing element 12, passes through the second optical path P2, and is received by the measuring section 23 (light receiving section 23c).
- the second light beam R2 reflected or scattered by the surface 18s to be processed and received by the measurement unit 23 (light receiving unit 23c) can also be referred to as detection light.
- the second light flux R2 may not be a light flux for measuring the surface to be processed 18s.
- the second beam R2 may be, for example, a beam for processing the surface 18s to be processed.
- the first light beam R1 is for measuring the surface 18s to be processed
- the second light beam R2 may be for processing the surface 18s to be processed.
- the second light beam R2 may also be for processing the surface 18s to be processed.
- the second beam R2 may also be for measuring the surface 18s to be processed.
- the second wavelength is longer than the first wavelength in this embodiment, the second wavelength may be shorter than the first wavelength.
- Information about the intensity of the detected light detected by the measurement unit 23 is sent to the calculation unit 24.
- the calculator 24 calculates position information about the portion of the surface to be processed 18s irradiated with the second beam R2 based on the information about the intensity of the detection light detected by the measuring unit 23 .
- the position information calculated by the calculator 24 is one or more of information on the X position, information on the Y position, and information on the Z position of the surface 18s to be processed.
- the measurement unit 23 may include an interferometer, for example.
- a three-dimensional shape measuring device disclosed in Japanese Patent No. 5231883 may be applied as such a position measuring unit.
- the calculation unit 24 also calculates the position information regarding the surface 18s to be processed based on the signal S6 including the information regarding the position information of the sample table 19 or the rotation angle of the oscillating mirror 14 transmitted from the control unit 22. Also good.
- the position information of the workpiece 18s calculated by the calculator 24 is the coordinates of the workpiece 18s, a point group of a plurality of points included in the workpiece 18s, and a three-dimensional model representing the workpiece 18s. Also good.
- the measurement unit 23 measures the shape of the surface 18s to be processed, the surface roughness of the surface 18s to be processed, the temperature of the surface 18s to be processed, the reflection of the surface 18s to be processed, At least one of the transmission rate and the transmittance of the surface 18s to be processed may be detected.
- FIG. 2 is a conceptual diagram showing a fourth optical path P4 condensed on the surface 17 to be illuminated by the condensing optical system 16.
- the condensing point FP of the light irradiated onto the illuminated surface 17 through the fourth optical path P4 is the first condensing point FP1 of the first light beam R1 of the first wavelength, and the light of the first wavelength different from the first wavelength. It is separated into a second condensing point FP2 of a second light flux R2 of two wavelengths.
- the difference in Z position between the first focal point FP1 and the second focal point FP2 will be referred to as axial chromatic aberration D1, and the difference in position in the XY in-plane direction will be referred to as lateral chromatic aberration D2.
- the surface on which the first focal point FP1 is formed is shown as the irradiated surface 17.
- the plane on which the first condensing point FP1 is formed may be referred to as the image plane of the condensing optical system 16 .
- the optical processing device 1 uses the second beam R2 to determine the irradiation position of the first beam R1 on the surface to be processed 18s based on the position information of the surface to be processed 18s detected and calculated by the measurement unit 23 and the calculation unit 24. , the number of times of irradiation, and irradiation conditions.
- the number of times of irradiation of the first light beam R1 is the number of times of irradiation of the first light beam R1 per unit time, the number of times of irradiation of the first light beam R1 to a predetermined position on the surface 18s to be processed, and the like.
- the conditions may include, for example, the intensity of the first light flux R1, the wavelength of the first light flux R1, and the like.
- the positional information of the surface to be processed 18s detected and calculated by the measuring unit 23 and the calculating unit 24 is positional information measured using the second light beam R2 of the second wavelength. Therefore, this position information has an error corresponding to the above-described axial chromatic aberration D1 and chromatic aberration of magnification D2 with respect to the position of the surface to be processed 18s based on the first light flux R1 of the first wavelength used for optical processing. .
- the correction optical system 11 arranged on the first optical path P1 of the optical device 2 is arranged at a condensing position (first condensing position) of the first light beam R1 near the surface 17 to be illuminated.
- the position of the point FP1) is brought closer to the condensing position of the second light flux R2 (the position of the second condensing point FP2). Therefore, compared to the case where the correction optical system 11 is not provided, the magnitude of the longitudinal chromatic aberration D1 described above is reduced.
- the focal length of the condensing optical system 16 is positive (positive refractive power) and the axial chromatic aberration of the condensing optical system 16 is insufficiently corrected (that is, the back focus of the condensing optical system 16 at the first wavelength is is shorter than the back focus of the condensing optical system 16 at the second wavelength)
- the focal length of the correction optical system 11 arranged in the first optical path P1 of the optical device 2 negative (negative refractive power)
- the absolute value of the difference between the back focus at the first wavelength of the combined optical system of the light optical system 16 and the correction optical system 11 and the back focus at the second wavelength of the condensing optical system 16 is It can be smaller than the absolute value of the difference between the back focus at the first wavelength and the back focus at the second wavelength of the condensing optical system 16 .
- the focal length of the condensing optical system 16 is positive (positive refractive power) and the longitudinal chromatic aberration of the condensing optical system 16 is overcorrected (that is, the back focus of the condensing optical system 16 at the first wavelength is longer than the back focus of the condensing optical system 16 at the second wavelength)
- the focal length of the correction optical system 11 arranged in the first optical path P1 of the optical device 2 positive (positive refractive power)
- the absolute value of the difference between the back focus at the first wavelength of the combined optical system of the condensing optical system 16 and the correction optical system 11 and the back focus of the condensing optical system 16 at the second wavelength, 16 at the first wavelength and the back focus at the second wavelength of the condensing optical system 16 when the refractive power of the condensing optical system 16 is positive and the condensing optical system 16 is overcorrected, the optical device will be described in detail in the second embodiment).
- the back focus of the optical system can be the distance along the optical axis of the optical system from the optical surface of the optical member closest to the emission side of the optical system to the rear focal position of the optical system. Therefore, the error due to the longitudinal chromatic aberration D1 included in the positional information of the surface to be processed 18s detected and calculated by the measuring unit 23 and the calculating unit 24 is reduced, and the positional information of the surface to be processed 18s is calculated more accurately. be able to.
- the angle ⁇ 1 of the principal ray R1p of the first light beam R1 with respect to the normal N1 of the surface to be irradiated 17 and the second angle with respect to the normal N2 of the surface to be irradiated 17 may be different.
- the absolute values of the angles ⁇ 1 and ⁇ 2 are both set to 1° or less. That is, even if the position of the fourth optical path P4 changes to the position of the central optical path P4a, the right optical path P4b, the left optical path P4c, etc. shown in FIG.
- the light ray R2p is incident on the illuminated surface 17 at an incident angle of 1° or less.
- the angles of the principal ray R1p of the first light beam R1 and the principal ray R2p of the second light beam R2 with respect to the normal line (Z direction) at the condensing positions are within 1°.
- the object side (surface to be processed 18s side) of the optical device 2 (optical processing device 1) has telecentric characteristics.
- the desired X and Y positions of the surface to be processed 18s can be obtained. It is possible to irradiate one light flux R1 and accurately process the surface 18s to be processed. Similarly, the desired X-position and Y-position of the surface 18s to be processed can be accurately measured.
- the incidence of the principal ray R1p and the principal ray R2p on the surface to be irradiated 17 The angle may be 1° or more.
- the “principal ray” may be a line connecting the center of gravity of light amount in the cross section of each light beam at different Z positions in each of the first light beam R1 and the second light beam R2.
- the axial chromatic aberration D1 or the chromatic aberration of magnification D2 occurring between the first light flux R1 and the second light flux R2 is reduced.
- the position information correction unit 25 described below may be used to further reduce the adverse effects of the longitudinal chromatic aberration D1 or the chromatic aberration of magnification D2 by numerical correction.
- the position information correction unit 25 is a unit that numerically corrects the longitudinal chromatic aberration D1 or the chromatic aberration of magnification D2.
- Information about the rotation angle of the oscillating mirror 14 or information about the X position of the focal point FP of the light beam traveling along the fourth optical path P4 determined by the rotation angle of the oscillating mirror 14 is sent from the control unit 22 to the position information correction unit 25.
- a signal S8 is input, including:
- the position information correction unit 25 provides numerical data indicating the relationship between the rotation angle of the swing mirror 14 or the X position of the focal point FP of the light beam traveling along the fourth optical path P4 and at least one of the longitudinal chromatic aberration D1 and the chromatic aberration of magnification D2.
- the aberration information of the condensing optical system 16 is stored.
- the position information correction unit 25 may also store information on the so-called telecentricity of the condensing optical system 16 .
- the above-described aberration information and information on telecentricity may be collectively referred to as information on the characteristics of the condensing optical system 16 .
- the position information correction unit 25 Based on the information on the rotation angle of the oscillating mirror 14 sent from the control unit 22 or the information on the X position of the focal point FP, the position information correction unit 25 corrects the information on the characteristics of the condensing optical system 16 to: At least one of the longitudinal chromatic aberration D1 and the lateral chromatic aberration D2 at the focal point FP is calculated.
- the position information correction unit 25 corrects the position information of the surface to be processed 18s calculated by the calculation unit 24 and transmitted as the signal S9 based on at least one of the axial chromatic aberration D1 and the chromatic aberration of magnification D2 calculated as described above. Then, the position information correction unit 25 sends back the corrected position information of the surface 18s to be processed to the calculation unit 24 as a signal S10.
- the position information correction unit 25 may return the amount by which the position information should be corrected as the signal S10 to the calculation unit 24 instead of correcting the position information itself of the surface to be processed 18s described above.
- the calculation unit 24 may correct the position information of the surface to be processed 18s using the correction amount transmitted from the position information correction unit 25 .
- the position information corrector 25 may not be provided. Further, when the longitudinal chromatic aberration D1 generated between the first light beam R1 and the second light beam R2 is sufficiently suppressed by the correction optical system 11 and the chromatic aberration of magnification D2 is large, the position information corrector 25 is used. may be used to correct the position information of the surface to be processed 18s.
- FIG. 3 is a diagram showing an optical design example of the optical device 2. As shown in FIG. As an example, the optical device 2 of the design example shown in FIG. Light is generally condensed on the irradiation surface 17 .
- the numerical table shown in FIG. 3 includes the radius of curvature R [mm] of each surface of optical parts such as lenses and mirrors constituting the optical device 2, which is defined by the surface number (Surface No.) shown on the left end, and It represents the surface distance D [mm] and the refractive index of the optical component.
- the surface numbers shown in FIG. 3 are the surface numbers of the surfaces on which the light from the light source 10 or the measurement unit 23 is incident among the above-described optical components (correction optical system 11, synthesizing element 12, lenses L11 to L15). is a surface number obtained by adding a to the end of the reference numeral of the optical component.
- the surface number 11a is the surface number of the surface of the correction optical system 11 on which the light from the light source 10 is incident.
- the surface number of the surface from which the light from the light source 10 or the measurement unit 23 is emitted is the surface number obtained by adding b to the end of the reference numeral of the optical component.
- the surface number L11b is the surface number of the surface of the lens L11 included in the condensing optical system 16 on the side of the lens L12.
- Surface numbers 13 and 14 indicate reflecting surfaces of the fixed mirror 13 and the oscillating mirror 14, respectively.
- the surface distance D represents the distance between the surface designated by the surface number and the next surface on the irradiated surface 17 side with respect to that surface. Note that the surface distance D shown in the row of the surface number L15b is the distance between the surface of the surface number L15b and the irradiated surface 17. FIG. Further, the surface distance D between the surface number 13 and the surface number 14 is expressed as a negative numerical value because the fixed mirror 13 is a mirror.
- the refractive index represents the refractive index of an optical member arranged between the surface specified by the surface number and the next surface on the illuminated surface 17 side with respect to that surface.
- the refractive index in the column labeled WL532 [nm] is the refractive index for light of 532 [nm], which is an example of the wavelength (first wavelength) of the first light flux R1.
- the refractive index in the column labeled WL1550 [nm] is the refractive index for light of 1550 [nm], which is an example of the wavelength (second wavelength) of the second light flux R2.
- the fixed mirror 13 and the oscillating mirror 14 have a refractive index of -1.
- the correction optical system 11 that is, the surface numbers 11a and 11b, is refracted at the second wavelength. rate is not shown.
- the optical device 2 shown in FIG. 1 in order to show the size of each optical member with a sufficient size necessary for explanation, of the third optical path P3, the front third optical path P3a and the middle third optical path P3a
- the length of the optical path P3b is displayed shorter than the design example shown in FIG. The same applies to the distance between the correction optical system 11 and the synthesizing element 12 .
- the transmitting members (the correcting optical system 11, the synthetic element 12, and the lenses L11 to L15) constituting the optical device 2 are all made of quartz glass, which is the same material. ing. Therefore, originally, it cannot be said that the optical system is suitable for correcting chromatic aberration, especially axial chromatic aberration D1.
- the first converging point FP1 (condensing position) of the first light beam R1 in the vicinity of the surface to be illuminated 17 is caused by the correction optical system 11 arranged on the first optical path P1. can be brought closer to the second condensing point FP2 (condensing position) of the second light beam R2.
- the correction optical system 11 has a negative refractive power, and the focal length fc at the first wavelength 532 [nm] is -1133.2 [mm].
- the condensing optical system 16 includes a lens L11 (first lens) arranged on the incident side and having negative refractive power, and a second lens group G20 including a plurality of lenses L12 to L15 and having positive refractive power as a whole. have.
- the condensing optical system 16 has positive refractive power as a whole, and the focal length fg at the first wavelength of 532 [nm] is 100.0 [mm].
- the focal length fc of the correcting optical system 11 and the focal length fg of the condensing optical system 16 are in the relationship of the following formula (1).
- the optical device 2 as a whole can appropriately correct chromatic aberration without causing the correcting optical system 11 to correct excessive chromatic aberration, and the longitudinal chromatic aberration D1 or the chromatic aberration of magnification D2 can be further reduced. It becomes possible.
- the correction optical system 11 and the condensing optical system 16 do not necessarily have to satisfy the formula (1).
- the back focus of the combined optical system of the condensing optical system 16 and the correction optical system 11 at the first wavelength is 144.7 mm
- the back focus of the condensing optical system 16 at the second wavelength is 144.7 mm.
- the back focus of the condensing optical system 16 at the first wavelength is 137.0 mm
- the back focus of the condensing optical system 16 at the second wavelength is 144.7 mm. Therefore, the absolute value of the difference between the back focus of the combined optical system of the condensing optical system 16 and the correction optical system 11 at the first wavelength and the back focus of the condensing optical system 16 at the second wavelength is 0 mm. It is set to be smaller than the absolute value (7.7 mm) of the difference between the back focus of the condensing optical system 16 at one wavelength and the back focus of the condensing optical system 16 at the second wavelength.
- the correction optical system 11 is not limited to an optical system having negative refractive power, as described above or later, and may be an optical system having positive refractive power.
- the positive focal point is placed on the second optical path P2 (for example, It may be arranged in the second optical path P2) between the measurement unit 23 and the combining element 12).
- the correction optical system 11 having a positive focal length may be arranged on the second optical path P2 between the measurement light source 23a and the synthesizing element 12.
- the focal length of the condensing optical system 16 is positive (positive refractive power) and the axial chromatic aberration of the condensing optical system 16 is insufficiently corrected (that is, the back focus of the condensing optical system 16 at the second wavelength is longer than the back focus of the condensing optical system 16 at the first wavelength)
- the focal length of the correcting optical system 11 arranged in the second optical path P2 on the incident side of the second light flux R2 of the combining element 12 is positive (refractive
- the absolute value of the difference between the back focus at the first wavelength and the absolute value of the difference between the back focus at the second wavelength of the condensing optical system 16 and the back focus at the first wavelength of the condensing optical system 16 is greater than can be made smaller.
- the condensing optical system 16 may be provided interchangeably with a second condensing optical system different from the illustrated condensing optical system 16 (hereinafter also referred to as "first condensing optical system”).
- the correction optical system 11 may be provided interchangeably with a second correction optical system different from the illustrated correction optical system 11 (hereinafter also referred to as "first correction optical system”).
- the first condensing optical system and the second condensing optical system are exchanged by a member exchange mechanism (not shown) such as a turret or an auto tool changer so that one of the optical systems is arranged in the optical path. It may be configured to be possible.
- the first correction optical system and the second correction optical system can be exchanged so that one of them is placed in the optical path by a member exchange mechanism (not shown) such as a turret or an auto tool changer. may be configured.
- the above-described second condensing optical system when used as the condensing optical system 16, the above-described second correcting optical system may be used as the correcting optical system 11.
- FIG. Back focal lengths may be different between the first condensing optical system and the second condensing optical system, and focal lengths may be different between the first correcting optical system and the second correcting optical system.
- the focal length of the second correcting optical system may be longer than the focal length of the first correcting optical system. If the back focus of the first condensing optical system is longer than the back focus of the second condensing optical system, the focal length of the second correcting optical system may be shorter than the focal length of the first correcting optical system.
- the optical processing device 1 of the first embodiment described above has a first optical path P1 for the first light flux R1 of the first wavelength and a second light flux R2 for the second wavelength longer than the first wavelength.
- the correction optical system 11 is arranged on the first optical path P1 on the incident side of the combining element 12, and one of the first light beam R1 and the second light beam R2 is a light beam for processing the workpiece 18.
- the other one of the first light beam R1 and the second light beam R2 is a light beam for measuring the workpiece 18 .
- FIG. 4 is a diagram schematically showing the configuration of the condensing optical system 16a of the optical device 2a provided in the optical processing apparatus of the second embodiment.
- the optical device 2a includes the optical device 2 provided in the optical processing device 1 of the first embodiment described above, except that the condensing optical system 16 is replaced with the condensing optical system 16a and the design data of the correction optical system 11 is changed. , the same reference numerals are given to the same configurations, and the description thereof will be omitted as appropriate.
- the optical processing device of the second embodiment is obtained by replacing the optical device 2 of the optical processing device 1 of the first embodiment with an optical device 2a.
- FIG. 4 shows only the correction optical system 11S, the oscillating mirror 14, and the condensing optical system 16a of the optical device 2a, and the rest of the configuration is omitted.
- the condensing optical system 16a is an optical system including a plurality of lenses (L21 to L28).
- the lens L21 arranged on the most incident side is, for example, a lens having a negative refractive power.
- the lens L21 is also called the first lens.
- the lenses (L22 to L28) arranged closer to the irradiated surface 17 side (downstream side) than the lens L21 constitute the second lens group G21 and have positive refractive power as a whole.
- the first light flux R1 and the second light flux R2 are generally condensed on the illuminated surface 17 by the refractive power of the condensing optical system 16a.
- FIG. 5 is a diagram showing an optical design example of the optical device 2a included in the optical processing device of the second embodiment.
- the items described in the numerical table shown in FIG. 5 are the same as the items shown in the numerical table shown in FIG.
- the surface number on the left end of the numerical table shown in FIG. 5 is the same as the surface number in FIG. It is obtained by adding b if it is a surface on the exit side.
- each of the transmitting members (the correction optical system 11, the synthetic element 12, and the lenses L11 to L15) constituting the optical device 2a is made of quartz glass and fluorite. made of any of the following materials:
- the optical device 2a has a configuration in which the chromatic aberration of magnification D2 is corrected more by the condensing optical system 16a, and the longitudinal chromatic aberration D1 is overcorrected.
- the correction optical system 11S arranged on the first optical path P1 can bring the overcorrection of the longitudinal chromatic aberration D1 of the condensing optical system 16a closer to a proper correction state. can be brought closer to the second condensing point FP2 (condensing position) of the second light flux R2. That is, in the optical processing device 1 (optical device 2a) of the second embodiment, the correction optical system 11S arranged in the first optical path P1 of the optical device 2a converges the first light flux R1 in the vicinity of the irradiated surface 17.
- the light position (the position of the first condensing point FP1) is brought closer to the condensing position of the second light flux R2 (the position of the second condensing point FP2). Therefore, compared with the case where the correction optical system 11S is not provided, the magnitude of the longitudinal chromatic aberration D1 described above is reduced.
- the focal length of the condensing optical system 16a is positive (positive refractive power) and the longitudinal chromatic aberration D1 of the condensing optical system 16a is overcorrected (that is, the back of the condensing optical system 16a at the first wavelength).
- the focal length of the correction optical system 11S arranged in the first optical path P1 of the optical device 2a is made positive (the refractive power is positive).
- the absolute value of the difference between the back focus at the first wavelength of the combined optical system of the condensing optical system 16a and the correcting optical system 11S and the back focus at the second wavelength of the condensing optical system 16a is It can be made smaller than the absolute value of the difference between the back focus of the optical system 16a at the first wavelength and the back focus of the condensing optical system 16a at the second wavelength.
- the chromatic aberration of magnification D2 occurring between the first light flux R1 and the second light flux R2 is corrected by the condensing optical system 16a.
- the chromatic aberration of magnification D2 can be easily corrected by overcorrecting the axial chromatic aberration D1 of the condensing optical system 16a.
- the principal ray R1p and the principal ray R2p are incident on the irradiated surface 17 at an incident angle within 1°.
- the angle of incidence of the principal ray R1p and the principal ray R2p on the irradiated surface 17 may be 1° or more. It can also be said that the angle of the principal ray R1p and the principal ray R2p with respect to the normal line (Z direction) at each condensing position is within 1°. It can also be said that the object side (the side of the processed surface 18s) of the optical device 2a has telecentric characteristics.
- the optical design example of the optical device 2a shown in FIG. 5 will be described in further detail below.
- the correction optical system 11S has positive refractive power
- the focal length fc at the first wavelength 532 [nm] is 6361.5 [mm].
- the condensing optical system 16a includes a lens L21 (first lens) arranged on the incident side and having negative refractive power, and a second lens group G21 including a plurality of lenses L22 to L28 and having positive refractive power as a whole. have.
- the condensing optical system 16a as a whole has positive refractive power, and the focal length fg at the first wavelength of 532 [nm] is 100.0 [mm]. Therefore, also in the optical device 2a, the focal length fc of the correcting optical system 11 and the focal length fg of the condensing optical system 16a satisfy the relationship of the above-described formula (1).
- the second lens group G21 has a positive refractive power and includes at least one positive lens such as a lens L28 made of fluorite, which is the first lens material. It includes at least one negative lens such as lens L27 made of some quartz glass.
- the Abbe number .nu.1 of the first lens material (fluorite) and the Abbe number .nu.2 of the second lens material (quartz glass) satisfy the relationship of formula (2). ⁇ 1 > ⁇ 2 (2)
- the chromatic aberration of the condensing optical system 16 can be satisfactorily corrected, and the axial chromatic aberration D1 or the chromatic aberration of magnification D2 can be further reduced.
- the Abbe number ⁇ 1 and the Abbe number ⁇ 2 do not necessarily have to satisfy the formula (2).
- the back focus of the combined optical system of the condensing optical system 16a and the correction optical system 11S at the first wavelength is 99.9 mm
- the back focus of the condensing optical system 16 at the second wavelength is 99.9 mm.
- the back focus of the condensing optical system 16 at the first wavelength is 101.5 mm
- the back focus of the condensing optical system 16 at the second wavelength is 100.0 mm. Therefore, the absolute value of the difference between the back focus of the combined optical system of the condensing optical system 16a and the correction optical system 11S at the first wavelength and the back focus of the condensing optical system 1a at the second wavelength is 0.1 mm.
- the condensing position of the first light flux R1 (the position of the first condensing point FP1) in the vicinity of the illuminated surface 17 is brought closer to the condensing position of the second light flux R2 (the position of the second condensing point FP2). becomes possible.
- the correcting optical system 11S having a positive focal length is positioned on the first optical path on the incident side of the first light beam R1 of the synthesizing element 12 of the optical processing device 1 (optical device 2a).
- the correction optical system 11S having a negative focal length is arranged in the second optical path P2 (for example, the measuring unit 23 and the combining element 12 in the second optical path P2).
- the correction optical system 11S having a negative focal length may be arranged on the second optical path P2 between the measurement light source 23a and the synthesizing element 12.
- the focal length of the condensing optical system 16a is positive (the refractive power is positive) and the axial chromatic aberration of the condensing optical system 16a is overcorrected (that is, the back focus of the condensing optical system 16a at the second wavelength is shorter than the back focus of the condensing optical system 16a at the first wavelength)
- the focal length of the correcting optical system 11S arranged in the second optical path P2 on the incident side of the second light beam R2 of the combining element 12 is negative (
- the back focus at the second wavelength of the combined optical system of the condensing optical system 16a and the correcting optical system 11S (correcting optical system having a negative focal length) and the condensing optical system 16a from the absolute value of the difference between the back focus at the first wavelength of the condensing optical system 16a and the back focus at the first wavelength of the condensing optical system 16a can be made smaller.
- the chromatic aberration of magnification D2 occurring between the first light beam R1 and the second light beam R2 is corrected by the condensing optical system 16a. Therefore, there is an advantage that it becomes easy to correct the chromatic aberration of magnification D2.
- the condensing optical system 16a may be provided interchangeably with a second condensing optical system different from the illustrated condensing optical system 16a (hereinafter also referred to as "first condensing optical system”).
- the correction optical system 11S may be provided interchangeably with a second correction optical system different from the illustrated correction optical system 11S (hereinafter also referred to as "first correction optical system”).
- the first condensing optical system and the second condensing optical system are exchanged by a member exchange mechanism (not shown) such as a turret or an auto tool changer so that one of the optical systems is arranged in the optical path. It may be configured to be possible.
- the first correction optical system and the second correction optical system can be exchanged so that one of them is placed in the optical path by a member exchange mechanism (not shown) such as a turret or an auto tool changer. may be configured.
- the second condensing optical system described above when used as the condensing optical system 16a, the second correcting optical system described above may be used as the correcting optical system 11S.
- Back focal lengths may be different between the first condensing optical system and the second condensing optical system, and focal lengths may be different between the first correcting optical system and the second correcting optical system.
- the focal length of the condensing optical system 16a is positive (the refractive power is positive), the axial chromatic aberration D1 of the condensing optical system 16a is overcorrected, and the first optical path P1 of the optical device 2a has
- the focal length of the correction optical system 11S to be arranged is positive (positive refractive power)
- the magnitude of the back focus at the first wavelength of the first condensing optical system at the first wavelength of the second condensing optical system is If it is shorter than the back focus, the focal length of the second correction optical system at the first wavelength may be longer than the focal length of the first correction optical system at the first wavelength.
- the focal length at the first wavelength of the first correcting optical system is longer than the focal length of the second condensing optical system
- the correction optical system may have a short focal length at the first wavelength
- the first correction optical system at the first wavelength may be larger than the absolute value of the focal length.
- the first correction optical system at the first wavelength may be smaller than the absolute value of the focal length.
- the focusing optical system 16a has a positive focal length (positive refractive power) and the longitudinal chromatic aberration D1 of the focusing optical system 16a is overcorrected.
- a correcting optical system 11S having a focal length (negative refractive power) is provided at the second beam R2 incident side of the combining element 12.
- the back focus at the second wavelength of the first condensing optical system is the second wavelength of the second condensing optical system.
- the focal length of the second correction optical system at the second wavelength may be longer than the focal length of the first correction optical system at the second wavelength.
- the focal length of the first correction optical system at the second wavelength is longer than the focal length of the second The correction optical system may have a short focal length at the second wavelength.
- the absolute value of the back focus at the second wavelength of the first condensing optical system is smaller than the absolute value of the back focus at the second wavelength of the second condensing optical system
- the absolute value of the focal length of the second correction optical system at the second wavelength may be larger than the absolute value of the focal length.
- the absolute value of the back focus at the second wavelength of the first condensing optical system is greater than the absolute value of the back focus at the second wavelength of the second condensing optical system
- the absolute value of the focal length of the second correction optical system at the second wavelength may be smaller than the absolute value of the focal length.
- the number of lenses constituting the condensing optical systems 16 and 16a is not limited to the number described above, and may be any other number. or may include mirrors or diffractive optical elements.
- the condensing optical systems 16 and 16a do not have a cemented lens, but may be an optical system having a cemented lens.
- the correction optical systems 11 and 11S may also have a plurality of lenses instead of a single lens, or may include mirrors or diffractive optical elements.
- the wavelengths of the first wavelength used for optical processing and the second wavelength used for measurement are not limited to the wavelengths described above, and may be other wavelengths.
- the first lens material and the second lens material are not limited to the above-described fluorite and quartz glass, respectively, and other translucent materials may be used.
- the oscillating mirror 14 may oscillate not only about the rotation axis parallel to the Y direction, but also about the rotation axis parallel to the XZ direction as described above. In this case, the position of the focal point FP on the illuminated surface 17 can be moved not only in the X direction described above but also in the Y direction. Note that the oscillating mirror 14 may oscillate about a rotation axis parallel to the XZ direction instead of the Y direction. In this case, the position of the focal point FP on the illuminated surface 17 can be moved in the Y direction. If it is sufficient to move the sample stage 19 with respect to the guide 20 to move the workpiece 18 and the focal point FP relative to each other in the X and Y directions, the oscillating mirror 14 may not be provided. .
- the swinging mirror 14 when the swinging mirror 14 is provided as described above, the X position (or further the Y position) of the focal point FP on the irradiated surface 17 can be moved at high speed. As a result, the focal point FP can be moved at high speed on the surface 18s to be processed of the workpiece 18, and the throughput of the optical processing apparatus 1 can be further improved.
- the oscillating mirror instead of the fixed mirror 13 may oscillate around the rotation axis parallel to the XZ direction, and the oscillation mirror 14 may oscillate around the rotation axis parallel to the Y direction as described above. It can swing.
- the first light beam R1 and the second light beam R2 are scanned in the X direction and the Y direction within the plane of the irradiated surface 17 .
- a plurality of oscillating mirrors may be arranged in the third optical path P3 (that is, an optical path in which at least a portion of the first optical path P1 and the second optical path P2 overlap).
- the fixed mirror 13 may be removed from the third optical path P3.
- the optical processing device 1 and the optical processing device of the second embodiment may not include the position information correction section 25 . Further, the optical processing device 1 does not have to include the calculator 24 . If the calculation unit 24 is not provided, the measurement unit 23 transmits information about the detected light amount signal of the second light flux R2 to an external calculation unit (not shown), and the external calculation unit determines the position of the surface to be processed 18. information should be calculated. It should be noted that the optical processing device 1a of a modified example, which will be described later, does not have to include the position information corrector 25 either.
- the optical processing device 1, the optical processing device of the second embodiment, the optical processing device 1a (described later), and the optical processing device of the third embodiment (described later) may not have the light source 10.
- the first light beam L1 may be supplied via the .
- the optical processing device 1, the optical processing device of the second embodiment, the optical processing device 1a (described later), and the optical processing device of the third embodiment (described later) may not have the measurement light source 23a.
- the optical processing device 1, the optical processing device of the second embodiment, the optical processing device 1a (described later), and the optical processing device of the third embodiment (described later) from the light source provided outside the light guide member such as an optical fiber may receive the supply of the second light beam L2 via.
- the optical processing device 1, the optical processing device of the second embodiment, the optical processing device 1a (described later), and the optical processing device of the third embodiment (described later) include a control unit 22, a calculation unit 24, and a position information correction unit. 25, for example, the optical processing device 1, the optical processing device of the second embodiment, the optical processing device 1a (described later), and the optical processing device of the third embodiment (described later) It may be provided outside.
- At least one of the light source 10 and the measurement unit 23 may be included in the optical device 2 and the optical device 2a.
- At least one of the control unit 22 and the calculation unit 24 may be included in the optical device 2 and the optical device 2a.
- the measuring unit 23 may not be an interferometric measuring device as described above.
- the measurement unit 23 may be an optical coherence tomography (OCT) type measurement device.
- OCT optical coherence tomography
- the measurement unit 23 may be a measurement device that includes a white confocal displacement meter.
- a white confocal displacement meter is described in JP-A-2020-085633.
- the measurement unit 23 may be a phase modulation type measurement device.
- An example of the phase modulation type measuring device is described in Japanese Patent Application Laid-Open No. 2010-025922.
- the measurement unit 23 may be an intensity modulation type measurement device.
- An example of the intensity modulation type measuring device is described in Japanese Patent Application Laid-Open No. 2016-510415 and US Patent Application Publication No. 2014/226145.
- the optical processing device 1 and the optical processing device of the second embodiment , the optical processing device 1a (described later), and the optical processing device of the third embodiment (described later) use the second beam R2 to detect and calculate the position information of the surface 18s to be processed by the measuring unit 23 and the calculating unit 24. At least one of the irradiation position of the first light flux R1 on the surface to be processed 18s, the number of times of irradiation, and irradiation conditions may be determined based on the above.
- the optical processing device 1, the optical processing device of the second embodiment, the optical processing device 1a (described later), and the third embodiment After processing the surface 18s to be processed by the first light beam R1, the optical processing device (described later) measures the portion processed by the first light beam R1 by the second light beam R2, and determines the quality of the portion processed by the first light beam R1. and quality.
- the optical processing device 1, the optical processing device of the second embodiment, the optical processing device 1a (described later), and the optical processing device of the third embodiment (described later) process the surface 18s to be processed by the first beam R1.
- the position information of the portion processed by the first beam R1 is calculated, and the calculated position information and predetermined reference position information (for example, CAD data of the workpiece 18) are compared to obtain the first beam R1 It may be determined whether to re-process or finish the processing of the portion processed in .
- the optical processing device 1, the optical processing device of the second embodiment, the optical processing device 1a (described later), and the optical processing device of the third embodiment (described later) are Based on the positional information of the portion processed by the first light beam R1, at least one of the irradiation position of the first light beam R1 on the surface 18s to be processed, the number of times of irradiation, and irradiation conditions is determined, and the portion processed by the first light beam R1 is determined. May be reworked.
- the optical processing apparatuses 1 and 1a calculate the position information of the portion processed by the first light flux R1 after processing the surface 18s to be processed by the first light flux R1, and the calculated position information and the predetermined reference position information (for example, CAD data of the workpiece 18) may be compared to determine whether or not the portion processed by the first beam R1 has been processed into the desired shape.
- the calculated position information and the predetermined reference position information For example, CAD data of the workpiece 18
- the optical processing device 1, the optical processing device of the second embodiment, and the optical processing device of the third embodiment process the workpiece 18 with the first beam R1. Meanwhile, measurement of the workpiece 18 (detection of detection light from the workpiece surface 18s and calculation of position information, etc.) may be performed using the second light flux R2. In this case, machining and measurement of the workpiece 18 can be performed simultaneously.
- the optical processing device 1, the optical processing device of the second embodiment, and the optical processing device of the third embodiment process the workpiece 18 with the first beam R1 and the workpiece with the second beam R2.
- the object 18 is processed by the first beam R1 and the detection light from the surface 18s to be processed is processed. It may be performed after the processing of 18.
- the optical processing apparatus of the second embodiment described above has a first optical path P1 for the first light flux R1 of the first wavelength and a second light path P1 for the second light flux R2 of the second wavelength longer than the first wavelength.
- a synthesizing element 12 for synthesizing the optical path P2 It comprises a system 16a and a correction optical system 11S having positive refractive power.
- the correction optical system 11S is arranged on the second optical path P2 on the incident side of the synthesizing element 12, and one of the first light flux R1 and the second light flux R2 is a light flux for processing the workpiece 18.
- the other one of the first light beam R1 and the second light beam R2 is a light beam for measuring the workpiece 18 .
- This configuration has the same effect as the optical processing device 1 of the first embodiment described above.
- the optical processing apparatus 1a of the modified example differs from the above-described first and second embodiments in that the variable mirror 26 is arranged on the second optical path P2 between the measurement unit 23 and the combining element 12. It differs from the optical processing device 1 .
- the second light flux R2 is second condensed at the first converging point FP1 of the first light flux R1 on the surface 18s of the workpiece 18 to be processed.
- the position of the point FP2 can be shifted by a predetermined distance in the XY plane direction.
- the variable mirror 26 may be configured such that the azimuth angle of the reflecting surface can be set to a predetermined angle around an axis parallel to the Y direction.
- the information about the position or state of the surface 18s to be processed can be detected at a position different from the position processed by the first light beam R1, so that deterioration in measurement accuracy due to fumes or the like can be prevented. can be prevented.
- the optical processing device 1a of the modified example may measure the workpiece 18 with the second beam R2 while machining the workpiece 18 with the first beam R1. In this case, machining and measurement of the workpiece 18 can be performed simultaneously while preventing deterioration of measurement accuracy due to fumes and the like.
- the optical processing apparatus 1a of the modified example processes the workpiece 18 with the first beam R1 and measures the workpiece 18 with the second beam R2 (detection of the detection light from the workpiece surface 18s and position information etc.) are performed at the same time, the workpiece 18 is processed by the first beam R1 and the detection light from the workpiece surface 18s is processed. It may be performed after the processing of 18.
- a relay lens system may be arranged in the second optical path P2, and parallel plate glass may be placed in the vicinity of the intermediate focal point formed by the relay lens system. Good to place.
- the position of the second condensing point FP2 with respect to the first condensing point FP1 on the surface to be processed 18s can be shifted by a predetermined distance in the XY plane direction.
- the position where the variable mirror 26 is arranged is not limited to the second optical path P2 between the measurement unit 23 and the combining element 12.
- the deformable mirror 26 may be placed in the first optical path P1 between the light source 10 and the combining element 12.
- FIG. 1 In addition to the variable mirror 26 arranged on the second optical path P2 between the measurement unit 23 and the combining element 12, another variable mirror is arranged on the first optical path P1 between the light source 10 and the combining element 12. may
- optical processing device of the third embodiment The optical processing apparatus of the third embodiment will be described below.
- the configuration of the optical processing apparatus of the third embodiment is substantially the same as the configuration of the optical processing apparatuses of the first and second embodiments shown in FIGS. 1 to 5.
- FIG. Therefore, hereinafter, with reference to FIGS. 1 and 2, the differences of the optical processing apparatus of the third embodiment with respect to the optical processing apparatuses of the first and second embodiments will be described, and common configurations will be described as appropriate. Description is omitted.
- the optical processing apparatus of the third embodiment does not have the correction optical system 11 . Therefore, the amount of longitudinal chromatic aberration D1 or chromatic aberration of magnification D2 in the vicinity of the illuminated surface 17 becomes a large value compared to the optical processing apparatuses of the first and second embodiments described above. Also in the optical processing apparatus of the third embodiment, the position of the surface to be processed 18s is calculated by the measuring unit 23 and the calculating unit 24 using the second light flux R2 of the second wavelength.
- the optical processing device of the third embodiment includes the position information corrector 25 described above.
- the position information correction unit 25 is a condensing optical system that is numerical data indicating the relationship between the rotation angle of the swing mirror 14 or the X position of the condensing point FP and at least one of the longitudinal chromatic aberration D1 and the chromatic aberration of magnification D2. 16 pieces of aberration information are stored.
- the position information correction unit 25 may also store information on the so-called telecentricity of the condensing optical system 16 .
- the position information correction unit 25 Based on the information on the rotation angle of the oscillating mirror 14 sent from the control unit 22 or the information on the X position of the focal point FP, the position information correction unit 25 corrects the information on the characteristics of the condensing optical system 16 to: At least one of the longitudinal chromatic aberration D1 and the lateral chromatic aberration D2 at the focal point FP is calculated.
- the position information correction unit 25 corrects the position information of the surface to be processed 18s calculated by the calculation unit 24 and transmitted as the signal S9 based on at least one of the axial chromatic aberration D1 and the chromatic aberration of magnification D2 calculated as described above. Then, the position information correction unit 25 sends back the corrected position information of the surface 18s to be processed to the calculation unit 24 as a signal S10.
- the optical processing apparatus of the third embodiment can accurately detect the position of the surface to be processed 18s even when using the optical apparatus 2 with relatively large longitudinal chromatic aberration D1 or chromatic aberration of magnification D2. 18s of surfaces to be processed can be processed with high precision. Note that, like the optical processing apparatuses of the first and second embodiments described above, both the position information correction unit 25 and the correction optical system 11 may be provided to correct chromatic aberration with higher accuracy.
- the first light flux R1 having the first wavelength supplied along the first optical path P1 and the first light flux R1 having the first wavelength supplied along the second optical path P2 are different from each other.
- a synthesizing element 12 for combining the second light flux R2 of two wavelengths, a condensing optical system 16 for condensing the first light flux R1 and the second light flux R2 combined by the synthesizing element 12 onto the illuminated surface 17;
- a holding unit 19 that holds the workpiece 18 so that the surface 18s to be processed matches the surface 17 to be irradiated, and the second light beam R2 is reflected or scattered by the surface 18s to be processed, and is combined with the condensing optical system 16.
- a measurement unit 23 that detects the detection light that has returned to the second optical path P2 via the element 12 .
- the present invention is not limited to the above contents. Other aspects conceivable within the scope of the technical idea of the present invention are also included in the scope of the present invention. This embodiment may combine all or part of the above aspects.
- (Section 1) a synthesizing element for synthesizing a first optical path of a first light beam having a first wavelength and a second optical path of a second light beam having a second wavelength longer than the first wavelength;
- a condensing optical system condensing the first light beam and the second light beam from the element, and a correction optical system having a negative refractive power, wherein the correction optical system is located on the incident side of the combining element.
- optical device arranged in the first optical path in
- (Section 2) a synthesizing element for synthesizing a first optical path of a first light beam having a first wavelength and a second optical path of a second light beam having a second wavelength longer than the first wavelength;
- the back focus of the combined optical system of the condensing optical system and the correcting optical system at the first wavelength and the back focus of the condensing optical system at the second wavelength is smaller than the absolute value of the difference between the back focus of the condensing optical system at the first wavelength and the back focus of the condensing optical system at the second wavelength.
- (Section 4) a synthesizing element for synthesizing a first optical path of a first light beam having a first wavelength and a second optical path of a second light beam having a second wavelength longer than the first wavelength;
- optical device arranged in the second optical path in
- (Section 5) a synthesizing element for synthesizing a first optical path of a first light beam having a first wavelength and a second optical path of a second light beam having a second wavelength longer than the first wavelength;
- the first condensing optical system and the second condensing optical system have different back focal lengths
- the first correcting optical system and the second correcting optical system are optical devices with different focal lengths.
- (Section 15) 15. The optical device according to any one of items 1 to 14, wherein the condensing optical system includes, in order from the combining element side, a first lens having negative refractive power and a lens having positive refractive power as a whole. and a second lens group having a power, wherein the focal length fc of the correction optical system at the first wavelength and the focal length fg of the condensing optical system at the first wavelength are
- the one beam is applied to the workpiece through the synthesizing element and the condensing optical system, and the other beam is applied to the synthesizing element and the condensing optical system.
- the apparatus further comprises a measurement unit that irradiates the workpiece through an optical system and detects detection light generated by the other light flux that irradiates the workpiece through the condensing optical system and the synthesizing element. , optical processing equipment.
- (Section 21) 21 The optical processing apparatus according to claim 20, further comprising a calculator that generates information about the measurement result of the workpiece based on the detected light detected by the measuring unit.
- (Section 22) 22 The optical processing apparatus according to claim 21, wherein the other light flux is emitted based on information on the measurement result.
- (Section 23) 23 The optical processing apparatus according to claim 22, wherein at least one of the irradiation position, the number of times of irradiation, and irradiation conditions of the other light beam on the workpiece is determined based on the information about the measurement result.
- (Section 26) 26 The optical processing device according to claim 25, wherein the other light beam is applied based on the information regarding the position.
- (Section 27) 27 The optical processing apparatus according to claim 26, wherein at least one of the irradiation position of the other light beam on the workpiece, the number of times of irradiation, and irradiation conditions is determined based on the information regarding the position.
- (Section 30) a condensing optical system that converges the first light beam and the second light beam from the synthesizing element; and a correction optical system that is arranged in the optical path of the first light flux on the incident side of the synthesizing element.
- the distance between the condensing position of the first light flux and the condensing position of the second light flux when the correction optical system is arranged in the optical path is equal to the distance between the convergence position of the first light flux and the convergence position of the second light flux when the correction optical system is not arranged in the optical path;
- An optical device wherein a distance between a condensing position of one light flux and a condensing position of the second light flux is shorter.
- the optical axis of the condensing optical system between the condensing position of the first light beam and the condensing position of the second light beam when the correction optical system is arranged in the optical path is shorter than the distance along the optical axis between the condensing position of the first light flux and the condensing position of the second light flux when the correcting optical system is not arranged in the optical path.
- a calculation unit for calculating position information of a portion of the surface to be processed irradiated with the second beam based on information on the intensity of the detection light detected by the measurement unit; and a position information correction unit that corrects the position information calculated by the calculation unit based on information about characteristics.
- (Section 33) 32 In the optical processing apparatus according to item 32, arranged on the first optical path, the condensing position of the first light flux in the vicinity of the surface to be illuminated is shifted in the optical axis direction of the condensing optical system to the second An optical processing device, further comprising a correction optical system that brings the light beam closer to the condensing position. (Section 34) 34.
- configurations of the 32nd to 34th items described above may further include the configuration described in any of the 1st to 9th items described above.
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Abstract
Description
第2の態様によると、光加工装置は、第1波長の第1光束の第1光路と、前記第1波長より長い波長の第2波長の第2光束の第2光路とを合成する合成素子と、正の屈折力を有し、前記合成素子からの前記第1光束と前記第2光束とをそれぞれ、被加工物に向けて集光させる集光光学系と、正の屈折力を有する補正光学系と、を備え、前記補正光学系は、前記合成素子の入射側における前記第1光路に配置され、前記第1波長における前記集光光学系のバックフォーカスは、前記第2波長における前記集光光学系のバックフォーカスよりも長く、前記第1光束及び前記第2光束の一方の光束は、前記被加工物を加工する光束であり、前記第1光束及び前記第2光束の他方の光束は、前記被加工物を計測する光束である。
第3の態様によると、光加工装置は、第1波長の第1光束の第1光路と、前記第1波長より長い波長の第2波長の第2光束の第2光路とを合成させる合成素子と、正の屈折力を有し、前記合成素子からの前記第1光束と前記第2光束とをそれぞれ、被加工物に向けて集光させる集光光学系と、正の屈折力を有する補正光学系と、を備え、前記補正光学系は、前記合成素子の入射側における前記第2光路に配置され、前記第1光束および前記第2光束の一方の光束は、前記被加工物を加工する光束であり、前記第1光束および前記第2光束の他方の光束は、前記被加工物を計測する光束である。
第4の態様によると、光加工装置は、第1波長の第1光束の第1光路と、前記第1波長より長い波長の第2波長の第2光束の第2光路とを合成する合成素子と、正の屈折力を有し、前記合成素子からの前記第1光束と前記第2光束とをそれぞれ、被加工物に向けて集光させる集光光学系と、負の屈折力を有する補正光学系と、を備え、前記補正光学系は、前記合成素子の入射側における前記第2光路に配置され、前記第1波長における前記集光光学系のバックフォーカスは、前記第2波長における前記集光光学系のバックフォーカスよりも長く、前記第1光束及び前記第2光束の一方の光束は、前記被加工物を加工する光束であり、前記第1光束及び前記第2光束の他方の光束は、前記被加工物を計測する光束である。
図1は、第1実施形態の光加工装置1の構成を概略的に示す図である。図1および後述する各図に矢印で示したX方向、Y方向およびZ方向はそれぞれ直交する方向であるとともに、X方向、Y方向およびZ方向のそれぞれは各図において同一の方向を示している。また、図1に矢印で示したXZ方向は、上述したX方向とZ方向との中間の方向であり、すなわちY方向と直交し、X方向およびZ方向からそれぞれ45°離れた方向を示している。以下では、各矢印の示す方向を、それぞれ+X方向、+Y方向、+Z方向、および+XZ方向と呼ぶ。また、X方向の位置をX位置、Y方向の位置をY位置、Z方向の位置をZ位置と呼ぶ。
試料台19を、試料を保持する保持部ということもできる。
計測部23、算出部24、および位置情報修正部25の詳細については、後述する。
光源10から一例として平行光束として供給され、+Z方向に進む第1光束R1は、1つまたは複数のレンズまたはミラーからなり、所定の屈折力(パワー)を有する補正光学系11に入射する。補正光学系11を射出した第1光束R1は、合成素子12に入射する。ここで、光学系又は光学素子の屈折力とは、その光学系又は光学素子の焦点距離の逆数とすることができる。
揺動ミラー14が基準位置からY方向に平行な回転軸を中心として左回りに回転すると、揺動ミラー14で反射した第1光束R1および第2光束R2は、右側光路P4bを通って被照射面17上の中央集光点Faよりも+X側にある右側集光点Fbに概ね集光する。
従って、揺動ミラー14を、第1光束R1および第2光束R2を偏向し、被照射面17の面内で走査させる偏向走査部であるということもできる。
制御部22は、駆動部材15に対して制御信号S3を送り、揺動ミラー14の向きを所定の向きに設定する。
なお、集光光学系16の射影特性はfθには限定されない。集光光学系16の射影特性は、例えば、等立体角射影特性や正射影特性であってもよい。
なお、本実施形態では、第2波長は第1波長よりも長い波長ではあるが、第2波長が第1波長よりも短い波長であってもよい。
なお、算出部24は、制御部22から送信される試料台19の位置情報または揺動ミラー14の回転角度に関する情報を含む信号S6にも基づいて、被加工面18sに関する位置情報を算出しても良い。
計測部23は、被加工面18sの位置に関する情報に代えて、あるいは加えて、被加工面18sの形状、被加工面18sの表面粗さ、被加工面18sの温度、被加工面18sの反射率、被加工面18sの透過率のうちの、少なくとも一つを検出しても良い。
集光光学系16には僅かではあるが色収差が残存する。このため、第4光路P4を通って被照射面17に照射される光の集光点FPは、第1波長の第1光束R1の第1集光点FP1と、第1波長とは異なる第2波長の第2光束R2の第2集光点FP2とに分離する。
なお、図2においては、一例として、第1集光点FP1が形成される面を、被照射面17として示している。なお、第1集光点FP1が形成される面を集光光学系16の像面と称してもよい。
なお、光学系のバックフォーカスは、当該光学系の最も射出側の光学部材の光学面から当該光学系の後側焦点位置までの、当該光学系の光軸に沿った距離とすることができる。
従って、計測部23および算出部24により検出および算出する被加工面18sの位置情報に含まれる、軸上色収差D1に起因する誤差が低減され、被加工面18sの位置情報をより正確に算出することができる。
なお、本明細書において、「主光線」とは、第1光束R1または第2光束R2のそれぞれにおいて、異なるZ位置における各光束の断面における光量重心を順次繋いだ線であっても良い。
また、第1光束R1と第2光束R2との間に生じる軸上色収差D1が補正光学系11によって十分に小さく抑えられており且つ倍率色収差D2が大きい場合には、位置情報修正部25を用いて被加工面18sの位置情報を修正しても良い。
図3は、光学装置2の光学設計例を示す図である。図3に示した設計例の光学装置2は、一例として、光源10および計測部23からそれぞれ供給される、直径10[mm]の平行光である第1光束R1および第2光束R2を、被照射面17上に概ね集光するものである。
なお、面番号13および面番号14は、それぞれ固定ミラー13、揺動ミラー14の反射面を示している。
また、面番号13と面番号14との間の面間隔Dは、固定ミラー13がミラーであるため、負の数値として表している。
WL532[nm]と記載された列における屈折率は、第1光束R1の波長(第1波長)の一例である532[nm]の光に対する屈折率である。
WL1550[nm]と記載された列における屈折率は、第2光束R2の波長(第2波長)の一例である1550[nm]の光に対する屈折率である。
なお、第2波長の第2光束R2は、補正光学系11が配置されている第1光路P1を通らないため、補正光学系11、すなわち面番号11a、11bについては、第2波長での屈折率を示していない。
ただし、図3に示した光学設計例においては、第1光路P1に配置された補正光学系11により、被照射面17の近傍における第1光束R1の第1集光点FP1(集光位置)を、第2光束R2の第2集光点FP2(集光位置)に近づけることができる。
補正光学系11は負の屈折力を有し、第1波長532[nm]における焦点距離fcは-1133.2[mm]である。集光光学系16は、入射側に配置され負の屈折力を有するレンズL11(第1レンズ)と、複数のレンズL12~L15を含み全体として正の屈折力を有する第2レンズ群G20とを有している。集光光学系16は、全体としては正の屈折力を有し、第1波長532[nm]における焦点距離fgは、100.0[mm]である。
|fc| > 10×fg ・・・(1)
すなわち、補正光学系11の焦点距離fcの絶対値は、集光光学系16の焦点距離fgの10倍以上に設定されており、換言すれば、補正光学系11の屈折力の絶対値(|1/fc|)は、集光光学系16の屈折力の1/10以下に設定されている。
なお、軸上色収差D1または倍率色収差D2がある程度残存していても良い場合には、補正光学系11および集光光学系16は、必ずしも式(1)を満たさなくても良い。
なお、補正光学系11は、上述した、或いは後述するように、負の屈折力を有する光学系には限られず、正の屈折力を有する光学系であっても良い。
なお、補正光学系11は、第1光路P1ではなく、第2光路P2に配置される場合には、補正光学系は、第1光路P1に配置されない、ということができる。
第1集光光学系と第2集光光学系とはバックフォーカスが異なっていても良く、第1補正光学系と第2補正光学系とは焦点距離が異なっていても良い。
そして、第1集光光学系のバックフォーカスが第2集光光学系のバックフォーカスよりも長い場合、第1補正光学系の焦点距離よりも第2補正光学系の焦点距離が短くても良い。
(1)以上で説明した第1実施形態の光加工装置1は、第1波長の第1光束R1の第1光路P1と、第1波長より長い波長の第2波長の第2光束R2の第2光路P2とを合成させる合成素子12と、正の屈折力を有し、合成素子12からの第1光束R1と第2光束R2とをそれぞれ、被加工物18に向けて集光させる集光光学系16と、負の屈折力を有する補正光学系11と、を備えている。そして、補正光学系11は、合成素子12の入射側における第1光路P1に配置され、第1光束R1および第2光束R2の一方の光束は、被加工物18を加工する光束であり、第1光束R1および第2光束R2の他方の光束は、被加工物18を計測する光束である。
この構成により、第2波長の第2光束R2で被加工物18の被加工面18sの位置を検出し、第1波長の第1光束R1により被加工面18sを加工することができる。従って、被加工面18sの位置を高精度に検出し、高精度な検出結果に基づいて被加工面18sを高精度に加工することができる。
図4は、第2実施形態の光加工装置が備える光学装置2aの集光光学系16aの構成を概略的に示す図である。なお、光学装置2aは、集光光学系16を集光光学系16aに置き換え、補正光学系11の設計データを変更する以外は、上述した第1実施形態の光加工装置1が備える光学装置2の同様であるので、同一の構成については同一の符号を付し、適宜説明を省略する。
なお、第2実施形態の光加工装置は、第1実施形態の光加工装置1の光学装置2を、光学装置2aに置き換えたものである。
図4には、光学装置2aのうちの、補正光学系11S、揺動ミラー14、集光光学系16aのみを示し、それ以外の構成については図示を省略している。
図5は、第2実施形態の光加工装置が備える光学装置2aの光学設計例を示す図である。図5に示した数表に記載された項目は、図3に示した数表に示した項目と同様である。図5に示した数表の左端の面番号は、図3での面番号と同様に、各レンズの符号の末尾に、光源10または計測部23からの光が入射する側の面であればaを、射出する側の面であればbを付加したものである。
つまり、第2実施形態の光加工装置1(光学装置2a)においては、光学装置2aの第1光路P1に配置された補正光学系11Sが、被照射面17の近傍における第1光束R1の集光位置(第1集光点FP1の位置)を、第2光束R2の集光位置(第2集光点FP2の位置)に近づける。従って、補正光学系11Sを設けない場合に比べ、上述した軸上色収差D1の大きさが低減される。
従って、光学装置2aにおいても、補正光学系11の焦点距離fcと集光光学系16aの焦点距離fgとは、上述した式(1)の関係を満たしている。
ν1 > ν2 ・・・(2)
これにより、集光光学系16の色収差を良好に補正することができ、軸上色収差D1または倍率色収差D2を一層低減することが可能となる。
なお、軸上色収差D1または倍率色収差D2がある程度残存していても良い場合には、アッベ数ν1とアッベ数ν2は、必ずしも式(2)を満たさなくても良い。
これにより、被照射面17の近傍における第1光束R1の集光位置(第1集光点FP1の位置)を、第2光束R2の集光位置(第2集光点FP2の位置)に近づけることが可能となる。
第1集光光学系と第2集光光学系とはバックフォーカスが異なっていても良く、第1補正光学系と第2補正光学系とは焦点距離が異なっていても良い。
一方、第1集光光学系の第1波長におけるバックフォーカスの絶対値が第2集光光学系の第1波長におけるバックフォーカスの絶対値よりも大きい場合、第1補正光学系の第1波長における焦点距離の絶対値よりも第2補正光学系の第1波長における焦点距離の絶対値が小さくてもよい。
一方、第1集光光学系の第2波長におけるバックフォーカスが第2集光光学系の第2波長におけるバックフォーカスよりも長い場合、第1補正光学系の第2波長における焦点距離よりも第2補正光学系の第2波長における焦点距離が短くてもよい。
一方、第1集光光学系の第2波長におけるバックフォーカスの絶対値が第2集光光学系の第2波長におけるバックフォーカスの絶対値よりも大きい場合、第1補正光学系の第2波長における焦点距離の絶対値よりも第2補正光学系の第2波長における焦点距離の絶対値が小さくてもよい。
また、集光光学系16、16aは、張合わせレンズを有していないが、張合わせレンズを有する光学系であってもよい。
補正光学系11、11Sについても、1枚のレンズではなく、複数枚のレンズを有するものであっても良く、あるいは、ミラーまたは回折光学素子を含んでいても良い。
また、第1レンズ材料および第2レンズ材料も、上述した蛍石および石英ガラスのそれぞれに限定されるものではなく、他の透光性の材料であっても良い。
なお、被加工物18と集光点FPのX方向およびY方向の相対位置を、試料台19のガイド20に対する移動により行えば十分である場合には、揺動ミラー14は設けなくても良い。
また、光加工装置1は、算出部24を備えていなくても良い。算出部24を備えていない場合、計測部23は、検出した第2光束R2の光量信号に関する情報を、外部の算出部(不図示)に送信し、外部の算出部が被加工面18の位置情報を算出すれば良い。なお、後述の変形例の光加工装置1aも位置情報修正部25を備えていなくても良い。
(2)以上で説明した第2実施形態の光加工装置は、第1波長の第1光束R1の第1光路P1と、第1波長より長い波長の第2波長の第2光束R2の第2光路P2とを合成させる合成素子12と、正の屈折力を有し、合成素子12からの第1光束R1と第2光束R2とをそれぞれ、被加工物18に向けて集光させる集光光学系16aと、正の屈折力を有する補正光学系11Sと、を備えている。そして、補正光学系11Sは、合成素子12の入射側における第2光路P2に配置され、第1光束R1および第2光束R2の一方の光束は、被加工物18を加工する光束であり、第1光束R1および第2光束R2の他方の光束は、被加工物18を計測する光束である。
この構成により、上述した第1実施形態の光加工装置1と同様の効果を有している。
以下、図6を参照して、変形例の光加工装置1aについて説明する。光加工装置1aの構成は、上述した第1実施形態および第2実施形態の光加工装置1と概ね共通しているため、同一の構成には同一の符号を付して、適宜説明を省略する。
変形例の光加工装置1aでは、被加工面18sの位置または状態に関する情報を、第1光束R1により加工される位置とは異なる位置で検出することができるため、ヒュームなどによる計測精度の低下を防ぐことができる。
以下、第3実施形態の光加工装置について説明する。
ただし、第3実施形態の光加工装置の構成は、図1から図5に示した、第1実施形態および第2実施形態の光加工装置の構成と概ね同様である。そこで、以下では、図1および図2を参照して、第1実施形態および第2実施形態の光加工装置に対する第3実施形態の光加工装置の相違点について説明し、共通する構成については適宜説明を省略する。
第3実施形態の光加工装置においても、第2波長の第2光束R2を用いて計測部23および算出部24により、被加工面18sの位置を算出する。
なお、上述した第1実施形態および第2実施形態の光加工装置のように、位置情報修正部25と補正光学系11との両方を備え、より高精度に色収差の補正を行っても良い。
(3)第3実施形態の光加工装置は、第1光路P1に沿って供給される第1波長の第1光束R1と、第2光路P2に沿って供給される第1波長とは異なる第2波長の第2光束R2とを合流させる合成素子12と、合成素子12により合流された第1光束R1と第2光束R2とをそれぞれ被照射面17に集光させる集光光学系16と、被加工物18をその被加工面18sが被照射面17に合致するように保持する保持部19と、第2光束R2のうち、被加工面18sで反射または散乱され集光光学系16および合成素子12を介して第2光路P2に戻った検出光を検出する計測部23と、を備えている。そして、計測部23が検出した検出光の強度に関する情報に基づいて、被加工面18sのうちの第2光束R2が照射された部分の位置情報を算出する算出部24と、集光光学系16の収差情報に基づいて、算出部24が算出した位置情報を修正する位置情報修正部25と、を備えている。
この構成により、軸上色収差D1または倍率色収差D2が比較的大きな光学装置2を用いても、被加工面18sの位置を正確に検出することができ、被加工面18sを高精度に加工することができる。
上述した複数の実施形態またはその変形例は、以下の態様の具体例であることが当業者により理解される。
第1波長の第1光束の第1光路と、前記第1波長より長い波長の第2波長の第2光束の第2光路とを合成させる合成素子と、正の屈折力を有し、前記合成素子からの前記第1光束と前記第2光束とをそれぞれ集光させる集光光学系と、負の屈折力を有する補正光学系と、を備え、前記補正光学系は、前記合成素子の入射側における前記第1光路に配置される、光学装置。
第1波長の第1光束の第1光路と、前記第1波長より長い波長の第2波長の第2光束の第2光路とを合成する合成素子と、正の屈折力を有し、前記合成素子からの前記第1光束と前記第2光束とをそれぞれ、被加工物に向けて集光させる集光光学系と、正の屈折力を有する補正光学系と、を備え、前記補正光学系は、前記合成素子の入射側における前記第1光路に配置され、前記第1波長における前記集光光学系のバックフォーカスは、前記第2波長における前記集光光学系のバックフォーカスよりも長い、光学装置。
第1項または第2項に記載の光学装置において、前記第1波長における前記集光光学系及び前記補正光学系の合成光学系のバックフォーカスと前記第2波長における前記集光光学系のバックフォーカスとの差の絶対値は、前記第1波長における前記集光光学系のバックフォーカスと前記第2波長における前記集光光学系のバックフォーカスとの差の絶対値よりも小さい、光学装置。
第1波長の第1光束の第1光路と、前記第1波長より長い波長の第2波長の第2光束の第2光路とを合成させる合成素子と、正の屈折力を有し、前記合成素子からの前記第1光束と前記第2光束とをそれぞれ集光させる集光光学系と、正の屈折力を有する補正光学系と、を備え、前記補正光学系は、前記合成素子の入射側における前記第2光路に配置される、光学装置。
第1波長の第1光束の第1光路と、前記第1波長より長い波長の第2波長の第2光束の第2光路とを合成する合成素子と、正の屈折力を有し、前記合成素子からの前記第1光束と前記第2光束とをそれぞれ、被加工物に向けて集光させる集光光学系と、負の屈折力を有する補正光学系と、を備え、前記補正光学系は、前記合成素子の入射側における前記第2光路に配置され、前記第1波長における前記集光光学系のバックフォーカスは、前記第2波長における前記集光光学系のバックフォーカスよりも長い、光学装置。
第4項または第5項に記載の光学装置において、前記第2波長における前記集光光学系及び前記補正光学系の合成光学系のバックフォーカスと前記第1波長における前記集光光学系のバックフォーカスとの差の絶対値は、前記第2波長における前記集光光学系のバックフォーカスと前記第1波長における前記集光光学系のバックフォーカスとの差の絶対値よりも小さい、光学装置。
第1項から第6項までのいずれか一項に記載の光学装置において、前記集光光学系を第1集光光学系とし、前記補正光学系を第1補正光学系とするとき、前記第1集光光学系は、前記第1集光光学系と異なる第2集光光学系と交換可能に設けられ、前記第1補正光学系は、前記第1補正光学系と異なる第2補正光学系と交換可能に設けられる、光学装置。
第7項に記載の光学装置において、前記集光光学系として前記第2集光光学系が使われるとき、前記補正光学系として前記第2補正光学系が使われる、光学装置。
第7項または第8項に記載の光学装置において、前記第1集光光学系と前記第2集光光学系とはバックフォーカスが異なり、前記第1補正光学系と前記第2補正光学系とは焦点距離が異なる、光学装置。
第1項から第3項のいずれか一項を引用する第7項から第9項のいずれか一項に記載の光学装置において、前記第1集光光学系のバックフォーカスが第2集光光学系のバックフォーカスよりも短い場合、前記第1補正光学系の焦点距離よりも前記第2補正光学系の焦点距離が長く、前記第1集光光学系のバックフォーカスが前記第2集光光学系のバックフォーカスよりも長い場合、前記第1補正光学系の焦点距離よりも前記第2補正光学系の焦点距離が短い、光学装置。
第2項を引用する第7項から第9項のいずれか一項に記載の光学装置において、前記第1集光光学系の前記第1波長におけるバックフォーカスが前記第2集光光学系の前記第1波長におけるバックフォーカスよりも短い場合、前記第1補正光学系の前記第1波長における焦点距離よりも前記第2補正光学系の前記第1波長における焦点距離が長く、前記第1集光光学系の前記第1波長におけるバックフォーカスが前記第2集光光学系の前記第1波長におけるバックフォーカスよりも長い場合、前記第1補正光学系の前記第1波長における焦点距離よりも前記第2補正光学系の前記第1波長における焦点距離が短い、光学装置。
第5項を引用する第7項から第9項のいずれか一項に記載の光学装置において、前記第1集光光学系の前記第2波長におけるバックフォーカスが前記第2集光光学系の前記第2波長におけるバックフォーカスよりも短い場合、前記第1補正光学系の前記第2波長における焦点距離よりも前記第2補正光学系の前記第2波長における焦点距離が長く、前記第1集光光学系の前記第2波長におけるバックフォーカスが前記第2集光光学系の前記第2波長におけるバックフォーカスよりも長い場合、前記第1補正光学系の前記第2波長における焦点距離よりも前記第2補正光学系の前記第2波長における焦点距離が短い、光学装置。
第1項から第3項のいずれか一項、または第1項から第3項のいずれか一項を引用する第7項から第11項のいずれか一項に記載の光学装置において、前記補正光学系は、前記第2光路に配置されない、光学装置。
第4項から第6項のいずれか一項、または第4項から第6項のいずれか一項を引用する第7項から第10項、第12項のいずれか一項に記載の光学装置において、前記補正光学系は、前記第1光路に配置されない、光学装置。
第1項から第14項までのいずれか一項に記載の光学装置において、前記集光光学系は、前記合成素子側から順に、負の屈折力を有する第1レンズと、全体として正の屈折力を有する第2レンズ群とを有し、前記第1波長における前記補正光学系の焦点距離fcと前記第1波長における前記集光光学系の焦点距離fgとは、|fc| > 10×fg の関係を満たす、光学装置。
第1項から第15項までのいずれか一項に記載の光学装置において、前記集光光学系は、前記合成素子側から順に、負の屈折力を有する第1レンズと、全体として正の屈折力を有する第2レンズ群とを有し、前記第2レンズ群は、正の屈折力を有し、第1レンズ材料からなる1以上の正レンズと、負の屈折力を有し、第2レンズ材料からなる1以上の負レンズと、を含み、レンズ材料のアッベ数νを、レンズ材料の前記第1波長に対する屈折率n1と、前記第2波長に対する屈折率n2に対して、ν=(n2-1)/(n2-n1)とするとき、前記第1レンズ材料のアッベ数ν1と、前記第2レンズ材料のアッベ数ν2とは、ν1 > ν2 の関係を満たす、光学装置。
第1項から第16項までのいずれか一項に記載の光学装置において、前記合成素子と前記集光光学系との間の第1光路及び第2光路に配置され、前記第1光束および前記第2光束を偏向させて、前記集光光学系から射出された前記第1光束および前記第2光束の集光位置を前記集光光学系の光軸に交差する軸に沿って移動させる偏向走査部を備える、光学装置。
第1項から第17項までのいずれか一項に記載の光学装置において、前記第1光束および前記第2光束の主光線の、それぞれの集光位置での法線に対する角度は、1°以内である、光学装置。
第1項から第18項までのいずれか一項に記載の光学装置と、被加工物を支持する支持部と、を備え、前記第1光束及び前記第2光束の一方の光束は、前記被加工物を加工する光束であり、前記第1光束及び前記第2光束の他方の光束は、前記被加工物を計測する光束である、光加工装置。
第19項に記載の光加工装置において、前記一方の光束は、前記合成素子および前記集光光学系を介して前記被加工物に照射され、前記他方の光束は、前記合成素子および前記集光光学系を介して前記被加工物に照射され、前記被加工物に照射される前記他方の光束によって生じる検出光を、前記集光光学系および前記合成素子を介して検出する計測部をさらに備える、光加工装置。
第20項に記載の光加工装置において、前記計測部が検出した検出光に基づいて、前記被加工物の計測結果に関する情報を生成する算出部をさらに備える、光加工装置。
(第22項)
第21項に記載の光加工装置において、前記計測結果に関する情報に基づいて前記他方の光束を照射する、光加工装置。
第22項に記載の光加工装置において、前記計測結果に関する情報に基づいて、前記被加工物に対する前記他方の光束の照射位置、照射回数、照射条件の少なくとも一つを決定する、光加工装置。
第23項に記載の光加工装置において、前記照射条件は、前記被加工物に照射する前記他方の光束の強度と波長の少なくとも一方の条件である、光加工装置。
(第25項)
第21項に記載の光加工装置において、前記計測結果に関する情報は、前記被加工物のうちの前記一方の光束が照射された部分の位置に関する情報を含む、光加工装置。
第25項に記載の光加工装置において、前記位置に関する情報に基づいて前記他方の光束を照射する、光加工装置。
(第27項)
第26項に記載の光加工装置において、前記位置に関する情報に基づいて、前記被加工物に対する前記他方の光束の照射位置、照射回数、照射条件の少なくとも一つを決定する、光加工装置。
第27項に記載の光加工装置において、前記照射条件は、前記被加工物に照射する前記他方の光束の強度と波長の少なくとも一方の条件である、光加工装置。
(第29項)
第19項から第28項までのいずれか一項に記載の光加工装置において、前記一方の光束は、第2光束であり、前記他方の光束は、第1光束である、光加工装置。
前記合成素子からの前記第1光束と前記第2光束とをそれぞれ集光させる集光光学系と、 前記合成素子の入射側における前記第1光束の光路に配置される補正光学系と、を備え、前記補正光学系が前記光路に配置される場合の前記第1光束の集光位置と前記第2光束の集光位置との距離は、前記補正光学系が前記光路に配置されない場合の前記第1光束の集光位置と前記第2光束の集光位置との距離よりも短い、光学装置。
第30項に記載の光学装置において、前記補正光学系が前記光路に配置される場合の前記第1光束の集光位置と前記第2光束の集光位置との前記集光光学系の光軸に沿う距離は、前記補正光学系が前記光路に配置されない場合の前記第1光束の集光位置と前記第2光束の集光位置との前記光軸に沿う距離よりも短い、光学装置。
第1光路に沿って供給される第1波長の第1光束と、第2光路に沿って供給される前記第1波長とは異なる第2波長の第2光束とを合成させる合成素子と、前記合成素子により合成された前記第1光束と前記第2光束とを、それぞれ被照射面に集光させる集光光学系と、被加工物をその被加工面が前記被照射面に合致するように保持する保持部と、前記第2光束のうち、前記被加工面で反射または散乱され、前記集光光学系および前記合成素子を介して、前記第2光路に戻った検出光を検出する計測部と、前記計測部が検出した検出光の強度に関する情報に基づいて、前記被加工面のうちの前記第2光束が照射された部分の位置情報を算出する算出部と、前記集光光学系の特性に関する情報に基づいて、前記算出部が算出した前記位置情報を修正する位置情報修正部と、を備える、光加工装置。
第32項に記載の光加工装置において、前記第1光路に配置され、前記被照射面の近傍における前記第1光束の集光位置を、前記集光光学系の光軸方向に、前記第2光束の集光位置に近づける補正光学系をさらに備える、光加工装置。
(第34項)
第32項または第33項に記載の光加工装置において、前記被加工面の前記位置情報に基づいて、前記被加工面に対する前記第1光束の照射位置を決定する、光加工装置。
Claims (22)
- 第1波長の第1光束の第1光路と、前記第1波長より長い波長の第2波長の第2光束の第2光路とを合成させる合成素子と、
正の屈折力を有し、前記合成素子からの前記第1光束と前記第2光束とをそれぞれ、被加工物に向けて集光させる集光光学系と、
負の屈折力を有する補正光学系と、を備え、
前記補正光学系は、前記合成素子の入射側における前記第1光路に配置され、
前記第1光束および前記第2光束の一方の光束は、前記被加工物を加工する光束であり、
前記第1光束および前記第2光束の他方の光束は、前記被加工物を計測する光束である、光加工装置。 - 第1波長の第1光束の第1光路と、前記第1波長より長い波長の第2波長の第2光束の第2光路とを合成する合成素子と、
正の屈折力を有し、前記合成素子からの前記第1光束と前記第2光束とをそれぞれ、被加工物に向けて集光させる集光光学系と、
正の屈折力を有する補正光学系と、を備え、
前記補正光学系は、前記合成素子の入射側における前記第1光路に配置され、
前記第1波長における前記集光光学系のバックフォーカスは、前記第2波長における前記集光光学系のバックフォーカスよりも長く、
前記第1光束及び前記第2光束の一方の光束は、前記被加工物を加工する光束であり、
前記第1光束及び前記第2光束の他方の光束は、前記被加工物を計測する光束である、光加工装置。 - 請求項1または請求項2に記載の光加工装置において、
前記第1波長における前記集光光学系および前記補正光学系の合成光学系のバックフォーカスと前記第2波長における前記集光光学系のバックフォーカスとの差の絶対値は、前記第1波長における前記集光光学系のバックフォーカスと前記第2波長における前記集光光学系のバックフォーカスとの差の絶対値よりも小さい、光加工装置。 - 第1波長の第1光束の第1光路と、前記第1波長より長い波長の第2波長の第2光束の第2光路とを合成させる合成素子と、
正の屈折力を有し、前記合成素子からの前記第1光束と前記第2光束とをそれぞれ、被加工物に向けて集光させる集光光学系と、
正の屈折力を有する補正光学系と、を備え、
前記補正光学系は、前記合成素子の入射側における前記第2光路に配置され、
前記第1光束および前記第2光束の一方の光束は、前記被加工物を加工する光束であり、
前記第1光束および前記第2光束の他方の光束は、前記被加工物を計測する光束である、光加工装置。 - 第1波長の第1光束の第1光路と、前記第1波長より長い波長の第2波長の第2光束の第2光路とを合成する合成素子と、
正の屈折力を有し、前記合成素子からの前記第1光束と前記第2光束とをそれぞれ、被加工物に向けて集光させる集光光学系と、
負の屈折力を有する補正光学系と、を備え、
前記補正光学系は、前記合成素子の入射側における前記第2光路に配置され、
前記第1波長における前記集光光学系のバックフォーカスは、前記第2波長における前記集光光学系のバックフォーカスよりも長く、
前記第1光束及び前記第2光束の一方の光束は、前記被加工物を加工する光束であり、
前記第1光束及び前記第2光束の他方の光束は、前記被加工物を計測する光束である、光加工装置。 - 請求項4または請求項5に記載の光加工装置において、
前記第2波長における前記集光光学系および前記補正光学系の合成光学系のバックフォーカスと前記第1波長における前記集光光学系のバックフォーカスとの差の絶対値は、前記第2波長における前記集光光学系のバックフォーカスと前記第1波長における前記集光光学系のバックフォーカスとの差の絶対値よりも小さい、光加工装置。 - 請求項1から請求項6までのいずれか一項に記載の光加工装置において、
前記集光光学系を第1集光光学系とし、前記補正光学系を第1補正光学系とするとき、
前記第1集光光学系は、前記第1集光光学系と異なる第2集光光学系と交換可能に設けられ、
前記第1補正光学系は、前記第1補正光学系と異なる第2補正光学系と交換可能に設けられる、光加工装置。 - 請求項7に記載の光加工装置において、
前記集光光学系として前記第2集光光学系が使われるとき、前記補正光学系として前記第2補正光学系が使われる、光加工装置。 - 請求項7または請求項8に記載の光加工装置において、
前記第1集光光学系と前記第2集光光学系とはバックフォーカスが異なり、
前記第1補正光学系と前記第2補正光学系とは焦点距離が異なる、光加工装置。 - 請求項1または請求項4のいずれか一項を引用する請求項7から請求項9までのいずれか一項に記載の光加工装置において、
前記第1集光光学系のバックフォーカスが前記第2集光光学系のバックフォーカスよりも短い場合、前記第1補正光学系の焦点距離よりも前記第2補正光学系の焦点距離が長く、
前記第1集光光学系のバックフォーカスが前記第2集光光学系のバックフォーカスよりも長い場合、前記第1補正光学系の焦点距離よりも前記第2補正光学系の焦点距離が短い、光加工装置。 - 請求項2を引用する請求項7から請求項9までのいずれか一項に記載の光加工装置において、
前記第1集光光学系の前記第1波長におけるバックフォーカスが前記第2集光光学系の前記第1波長におけるバックフォーカスよりも短い場合、前記第1補正光学系の前記第1波長における焦点距離よりも前記第2補正光学系の前記第1波長における焦点距離が長く、
前記第1集光光学系の前記第1波長におけるバックフォーカスが前記第2集光光学系の前記第1波長におけるバックフォーカスよりも長い場合、前記第1補正光学系の前記第1波長における焦点距離よりも前記第2補正光学系の前記第1波長における焦点距離が短い、光加工装置。 - 請求項5を引用する請求項7から請求項9までのいずれか一項に記載の光加工装置において、
前記第1集光光学系の前記第2波長におけるバックフォーカスが前記第2集光光学系の前記第2波長におけるバックフォーカスよりも短い場合、前記第1補正光学系の前記第2波長における焦点距離よりも前記第2補正光学系の前記第2波長における焦点距離が長く、
前記第1集光光学系の前記第2波長におけるバックフォーカスが前記第2集光光学系の前記第2波長におけるバックフォーカスよりも長い場合、前記第1補正光学系の前記第2波長における焦点距離よりも前記第2補正光学系の前記第2波長における焦点距離が短い、光加工装置。 - 請求項1から請求項3まで、または請求項1から請求項3までのいずれか一項を引用する請求項7から請求項11までのいずれか一項に記載の光加工装置において、
前記補正光学系は、前記第2光路に配置されない、光加工装置。 - 請求項4から請求項6まで、または請求項4から請求項6までのいずれか一項を引用する請求項7から請求項10まで、または請求項12のいずれか一項に記載の光加工装置において、
前記補正光学系は、前記第1光路に配置されない、光加工装置。 - 請求項1から請求項14までのいずれか一項に記載の光加工装置において、
前記集光光学系は、前記合成素子側から順に、負の屈折力を有する第1レンズと、全体として正の屈折力を有する第2レンズ群とを有し、
前記第1波長における前記補正光学系の焦点距離fcと前記第1波長における前記集光光学系の焦点距離fgとは、
|fc| > 10×fg の関係を満たす、
光加工装置。 - 請求項1から請求項15までのいずれか一項に記載の光加工装置において、
前記集光光学系は、前記合成素子側から順に、負の屈折力を有する第1レンズと、全体として正の屈折力を有する第2レンズ群とを有し、
前記第2レンズ群は、
正の屈折力を有し、第1レンズ材料からなる1以上の正レンズと、
負の屈折力を有し、第2レンズ材料からなる1以上の負レンズと、
を含み、
レンズ材料のアッベ数νを、レンズ材料の前記第1波長に対する屈折率n1と、前記第2波長に対する屈折率n2に対して、ν=(n2-1)/(n2-n1)とするとき、
前記第1レンズ材料のアッベ数ν1と、前記第2レンズ材料のアッベ数ν2とは、
ν1 > ν2 の関係を満たす、
光加工装置。 - 請求項1から請求項16までのいずれか一項に記載の光加工装置において、
前記合成素子と前記集光光学系との間の前記第1光路および前記第2光路に配置され、前記第1光束および前記第2光束を偏向させて、前記集光光学系から射出された前記第1光束および前記第2光束の集光位置を前記集光光学系の光軸に交差する軸に沿って移動させる偏向走査部を備える、光加工装置。 - 請求項1から請求項17までのいずれか一項に記載の光加工装置において、
前記第1光束および前記第2光束の主光線の、それぞれの集光位置での法線に対する角度は、1°以内である、光加工装置 - 請求項1から請求項18までのいずれか一項に記載の光加工装置において、
前記第1光束および前記第2光束の前記他方の光束は、前記合成素子および前記集光光学系を介して前記被加工物に照射され、
前記被加工物に照射される前記他方の光束によって生じる検出光を、前記集光光学系および前記合成素子を介して検出する計測部をさらに備える、光加工装置。 - 請求項19に記載の光加工装置において、
前記計測部が検出した検出光に基づいて、前記被加工物のうちの前記第1光束および前記第2光束の前記一方の光束が照射された部分の位置に関する位置情報を生成する算出部をさらに備える、光加工装置。 - 請求項20に記載の光加工装置において、
前記位置情報に基づいて前記第1光束および前記第2光束の前記一方の光束を照射する、光加工装置。 - 請求項1から請求項21までのいずれか一項に記載の光加工装置において、
前記一方の光束は、第2光束であり、
前記他方の光束は、第1光束である、光加工装置。
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